WO2013149482A1 - New normal-pressure dual radio frequency electrode plasma free radical cleaning spray gun - Google Patents

New normal-pressure dual radio frequency electrode plasma free radical cleaning spray gun Download PDF

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Publication number
WO2013149482A1
WO2013149482A1 PCT/CN2012/086419 CN2012086419W WO2013149482A1 WO 2013149482 A1 WO2013149482 A1 WO 2013149482A1 CN 2012086419 W CN2012086419 W CN 2012086419W WO 2013149482 A1 WO2013149482 A1 WO 2013149482A1
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Prior art keywords
spray gun
electrode
electrodes
plasma
radio frequency
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PCT/CN2012/086419
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French (fr)
Chinese (zh)
Inventor
贾少霞
王守国
赵玲利
吴元伟
杨景华
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中国科学院微电子研究所
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Publication of WO2013149482A1 publication Critical patent/WO2013149482A1/en

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric

Definitions

  • the present invention relates to a plasma atmospheric radical cleaning spray gun of a novel atmospheric double RF electrode.
  • the spray gun generates a plasma by a dielectric barrier discharge of a dual RF electrode, and the active radical in the plasma is under a certain pressure from the spray gun.
  • the nozzles After the nozzles are ejected, they reach the surface of the substrate such as silicon wafer or glass, and react with the organic matter on the surface of the substrate to achieve the purpose of cleaning the surface of the substrate.
  • the invention introduces a novel plasma radical cleaning spray gun of atmospheric double RF electrodes.
  • the spray gun comprises two RF electrodes, two ground electrodes, two adjacent RF electrodes between the two ground electrodes, and the plasma radical cleaning spray gun of the atmospheric double RF electrode adopts a dielectric barrier RF discharge form, with argon
  • the mixed gas of gas and oxygen is a working gas, which generates a glow discharge.
  • the plasma radical beam is ejected from three nozzles.
  • the main components of the beam are active radicals, free radicals and Photoresist or other organic matter reacts to produce carbon dioxide, water, etc.
  • the spray gun can also improve the adhesion of the surface.
  • the advantage of the plasma radical cleaning spray gun of the atmospheric double RF electrode is that the discharge between the RF electrodes increases the discharge area, reduces the introduced metal impurities, and simplifies the structure of the spray gun.
  • a new type of atmospheric plasma free radical cleaning spray gun consists of two RF electrodes, a dielectric barrier, two ground electrodes and an RF power supply.
  • the plasma atmospheric radical cleaning spray gun of the novel atmospheric double RF electrode is characterized in that: the spray gun has a rectangular parallelepiped shape, wherein one side is connected to the air inlet, and the opposite surface is a nozzle, except for the nozzle surface, the remaining surfaces of the spray gun are all
  • the metal plate the two ground electrodes are covered by the dielectric barrier layer, and two RF electrodes are formed between the two ground electrodes to form three nozzles, the two RF electrodes are covered by the dielectric barrier layer, and the working gas is ejected from the nozzle of the spray gun. Under normal pressure, after the power is turned on, glow plasma is generated in all three nozzles, and free radicals in the plasma are ejected outward under the airflow.
  • the plasma radical cleaning spray gun of the atmospheric double RF electrode is characterized in that: the grounding electrode and the RF electrode are made of a metal material such as aluminum.
  • the plasma radical cleaning spray gun of the atmospheric double RF electrode is characterized in that: the grounding electrode and the RF electrode and the three nozzles formed between the RF electrode and the RF electrode are equal in size, and the width ranges from 0.5 to 2.0 mm.
  • the plasma radical cleaning spray gun of the atmospheric double RF electrode is characterized in that: two adjacent RF electrodes are between the two ground electrodes.
  • the plasma free radical beam generated by the plasma radical cleaning spray gun of the novel atmospheric double RF electrode is sprayed onto the surface of the substrate such as silicon wafer, and the beam component is mainly free radical, and the activity is high. Free radicals react with photoresist or other organic substances on the surface of the substrate to form carbon dioxide and water. Etc., it can be directly discharged into the atmosphere. In addition to cleaning the substrate such as a liquid crystal glass plate, the spray gun can also improve the adhesion of the surface.
  • the advantage of the plasma radical cleaning spray gun of the atmospheric double RF electrode is that the discharge between the RF electrodes increases the discharge area, reduces the introduced metal impurities, and simplifies the structure of the spray gun.
  • the plasma radical cleaning spray gun of the atmospheric double RF electrode comprises two RF electrodes 107, a dielectric barrier layer 106 covering the RF electrode, two ground electrodes 108, and a dielectric barrier covering the ground electrode. 109.
  • Two grounding electrodes are connected to the gun housing, and the dielectric barrier layer is an insulating material such as quartz or ceramic.
  • the gas supply source 101 supplies argon gas and oxygen gas.
  • the gas passes through the flow meter 102, the gas is mixed to form a mixed gas.
  • the gas mixture passes through the gas supply line 103, it uniformly enters the gap between the ground electrode 108 and the RF electrode 107 and the two RFs.
  • the gap between the electrodes when the RF electrode 107 is connected to the RF power source 105, generates plasma in the three nozzles, and the plasma radical beam is ejected from the nozzle by the airflow when reaching the substrate surface.
  • the beam component is mainly composed of radicals 110
  • the radicals react with photoresist or other organic substances on the surface of the substrate to form products such as carbon dioxide and water.
  • the spray gun also The surface of the substrate such as a liquid crystal panel can be modified.
  • the plasma free radical cleaning spray gun of the atmospheric double RF electrode, the gas supply line 103 is connected to the air inlet 202 of the spray gun, and the working gas enters the inside of the spray gun through the air inlet 202.
  • the outer surface of the frequency electrode 107 is covered with a dielectric barrier layer
  • the outer surface of the ground electrode 108 is covered with a dielectric barrier layer
  • three nozzles are arranged between the RF electrodes and between the RF electrode and the ground electrode.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Plasma Technology (AREA)

Abstract

A normal-pressure dual radio frequency electrode plasma free radical cleaning spray gun comprises two radio frequency electrodes (107), a medium barrier layer, two grounding electrodes (108) and a radio frequency power (105). The spray gun is a cuboid; one surface is connected to a gas inlet, an opposite surface is a spout, and the other surfaces of the spray gun except the spout surface are metal plates. Two grounding electrodes (108) are wrapped by the medium barrier layer (109). The two radio frequency electrodes (107) are arranged between the two grounding electrodes (108) to form three sprouts. The two radio frequency electrodes (107) are also wrapped by the medium barrier layer (106), and working gas sprays from the sprouts of the spray gun. Under normal pressure, after the power is on, glow plasma is generated at the three sprouts, and free radical in the plasma is carried by the air flow and sprays outwards. The spray gun is used for cleaning organics on a surface of a substrate, such as a silicon slice and glass.

Description

一种新型常压双射频电极的等离子体自由基清洗喷枪  Plasma free radical cleaning spray gun for a new type of atmospheric double RF electrode
技术领域 本发明涉及到一种新型常压双射频电极的等离子体自由基清洗喷枪， 喷 枪由双射频电极的介质阻挡放电产生等离子体，等离子体中的活性自由基在 一定压力下从喷枪的三个喷口喷出， 到达硅片、 玻璃等衬底表面后， 与衬底 表面的有机物发生反应， 达到清洗衬底表面的目的。 BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma atmospheric radical cleaning spray gun of a novel atmospheric double RF electrode. The spray gun generates a plasma by a dielectric barrier discharge of a dual RF electrode, and the active radical in the plasma is under a certain pressure from the spray gun. After the nozzles are ejected, they reach the surface of the substrate such as silicon wafer or glass, and react with the organic matter on the surface of the substrate to achieve the purpose of cleaning the surface of the substrate.
背景技术 Background technique
半导体生产中， 硅片必须严格清洗， 即使是微量的污染也会导致器件失 效， 另外， 其他衬底例如液晶玻璃平板等表面除了需要清洗有机污染物外， 还需要改善材料表面的性能， 增加材料表面的附着性。传统清洗方式是湿法 化学方法， 湿法化学方法存在不能精确控制、 清洗不彻底、 清洗溶液易对环 境造成污染； 已经出现的干法方法大多数是工作在真空状态下， 设备操作复 杂、 成本高， 而且在真空室中由于存在离子溅射， 很容易使真空壁面上溅出 金属原子； 已出现的常压清洗技术存在易引入新的杂质， 电极结构复杂等缺 点。 本发明介绍了一种新型的常压双射频电极的等离子体自由基清洗喷枪。 喷枪包括两个射频电极、 两个接地电极， 两个接地电极之间是两个相邻的射 频电极， 常压双射频电极的等离子体自由基清洗喷枪采用了介质阻挡的射频 放电形式， 以氩气和氧气的混合气体为工作气体， 产生辉光放电， 等离子体 自由基束流从三个喷口喷出， 在到达硅片等衬底表面上， 束流主要成分为活 性自由基， 自由基与光刻胶或其它有机物发生反应， 生成二氧化碳、 水等产 物， 达到清洗目的， 该喷枪除了可以对液晶玻璃平板等衬底进行清洗外，还 可以改善其表面的粘附性。 In semiconductor production, silicon wafers must be cleaned strictly. Even a small amount of contamination can cause device failure. In addition, other substrates such as liquid crystal glass plates need to improve the surface properties of materials in addition to cleaning organic pollutants. Adhesion of the surface. The traditional cleaning method is wet chemical method. The wet chemical method cannot be accurately controlled, the cleaning is not thorough, and the cleaning solution is easy to cause environmental pollution. Most of the dry methods that have appeared are working under vacuum, and the equipment operation is complicated and costly. High, and in the vacuum chamber due to the existence of ion sputtering, it is easy to splash metal atoms on the vacuum wall surface; the existing atmospheric pressure cleaning technology has the disadvantages of easy introduction of new impurities, complicated electrode structure and the like. The invention introduces a novel plasma radical cleaning spray gun of atmospheric double RF electrodes. The spray gun comprises two RF electrodes, two ground electrodes, two adjacent RF electrodes between the two ground electrodes, and the plasma radical cleaning spray gun of the atmospheric double RF electrode adopts a dielectric barrier RF discharge form, with argon The mixed gas of gas and oxygen is a working gas, which generates a glow discharge. The plasma radical beam is ejected from three nozzles. On the surface of the substrate such as a silicon wafer, the main components of the beam are active radicals, free radicals and Photoresist or other organic matter reacts to produce carbon dioxide, water, etc. In addition to cleaning the substrate such as a liquid crystal glass plate, the spray gun can also improve the adhesion of the surface.
常压双射频电极的等离子体自由基清洗喷枪的优点是射频电极之间的 放电增大了放电面积、 减少了引入的金属杂质、 喷枪结构简单化。  The advantage of the plasma radical cleaning spray gun of the atmospheric double RF electrode is that the discharge between the RF electrodes increases the discharge area, reduces the introduced metal impurities, and simplifies the structure of the spray gun.
发明内容 Summary of the invention
一种新型的常压等离子体自由基清洗喷枪， 包括两个射频电极、 介质阻 挡层、 两个接地电极和一个射频电源。  A new type of atmospheric plasma free radical cleaning spray gun consists of two RF electrodes, a dielectric barrier, two ground electrodes and an RF power supply.
所述的新型常压双射频电极的等离子体自由基清洗喷枪， 其特征在于： 该喷枪呈长方体， 其中一面接进气口， 相对的面为喷口， 除喷口面外， 喷 枪其余各面均为金属板， 两个接地电极被介质阻挡层包覆， 两个接地电极 之间为两个射频电极， 形成三个喷口， 两个射频电极被介质阻挡层包覆， 工作气体从喷枪喷口喷出， 在常压下， 电源接通后， 在三个喷口中均产生 辉光等离子体， 等离子体中的自由基在气流的携带下向外喷出。  The plasma atmospheric radical cleaning spray gun of the novel atmospheric double RF electrode is characterized in that: the spray gun has a rectangular parallelepiped shape, wherein one side is connected to the air inlet, and the opposite surface is a nozzle, except for the nozzle surface, the remaining surfaces of the spray gun are all The metal plate, the two ground electrodes are covered by the dielectric barrier layer, and two RF electrodes are formed between the two ground electrodes to form three nozzles, the two RF electrodes are covered by the dielectric barrier layer, and the working gas is ejected from the nozzle of the spray gun. Under normal pressure, after the power is turned on, glow plasma is generated in all three nozzles, and free radicals in the plasma are ejected outward under the airflow.
所述的常压双射频电极的等离子体自由基清洗喷枪， 其特征在于： 接地 电极与射频电极的制作材料均为铝等金属材料。  The plasma radical cleaning spray gun of the atmospheric double RF electrode is characterized in that: the grounding electrode and the RF electrode are made of a metal material such as aluminum.
所述的常压双射频电极的等离子体自由基清洗喷枪， 其特征在于： 接地 电极与射频电极以及射频电极与射频电极之间形成的三个喷口大小相等， 宽 度范围为 0.5-2.0 mm。  The plasma radical cleaning spray gun of the atmospheric double RF electrode is characterized in that: the grounding electrode and the RF electrode and the three nozzles formed between the RF electrode and the RF electrode are equal in size, and the width ranges from 0.5 to 2.0 mm.
所述的常压双射频电极的等离子体自由基清洗喷枪， 其特征在于： 两个 接地电极之间是两个相邻的射频电极。  The plasma radical cleaning spray gun of the atmospheric double RF electrode is characterized in that: two adjacent RF electrodes are between the two ground electrodes.
本发明一种新型的常压双射频电极的等离子体自由基清洗喷枪产生的 等离子体自由基束流，在喷射到硅片等衬底表面时，束流成分以自由基为主， 高活性的自由基与衬底表面的光刻胶或其它有机物反应生成二氧化碳、 水 等， 可以直接排放到大气中， 该喷枪除了可以对液晶玻璃平板等衬底进行清 洗， 还可以改善其表面的粘附性。 常压双射频电极的等离子体自由基清洗喷 枪的优点是射频电极之间的放电增大了放电面积、 减少了引入的金属杂质、 喷枪结构简单化。 The plasma free radical beam generated by the plasma radical cleaning spray gun of the novel atmospheric double RF electrode is sprayed onto the surface of the substrate such as silicon wafer, and the beam component is mainly free radical, and the activity is high. Free radicals react with photoresist or other organic substances on the surface of the substrate to form carbon dioxide and water. Etc., it can be directly discharged into the atmosphere. In addition to cleaning the substrate such as a liquid crystal glass plate, the spray gun can also improve the adhesion of the surface. The advantage of the plasma radical cleaning spray gun of the atmospheric double RF electrode is that the discharge between the RF electrodes increases the discharge area, reduces the introduced metal impurities, and simplifies the structure of the spray gun.
附图说明 DRAWINGS
图 1为本发明一种新型的常压双射频电极的等离子体自由基清洗喷枪原 理示意图。 图 2为本发明一种新型的常压双射频电极的等离子体自由基清洗喷枪外 形图。 请参阅图 1，该常压双射频电极的等离子体自由基清洗喷枪，包括两个射 频电极 107、包覆射频电极的介质阻挡层 106、两个接地电极 108、包覆接地 电极的介质阻挡层 109、 一个射频电源 105、 喷枪壳体 104、 供气源 101、流 量计 102以及供气管路 103。 两个接地电极与喷枪壳体连接， 介质阻挡层为 石英或陶瓷等绝缘材料。 供气源 101提供氩气和氧气， 气体经过流量计 102 时按一定比例形成混合气体， 混合气体经供气管路 103后， 均匀的进入接地 电极 108与射频电极 107之间的间隙以及两个射频电极之间的间隙， 当射频 电极 107与射频电源 105接通后， 在三个喷口内都产生等离子体， 等离子体 自由基束流在气流的带动下， 从喷口喷射出来， 当到达衬底表面时， 束流成 分以自由基 110为主， 自由基与衬底表面的光刻胶或其它有机物反应， 生成 二氧化碳、 水等产物， 除了去除衬底表面光刻胶或其它有机物外， 该喷枪还 可以对液晶平板等衬底表面进行改性。  1 is a schematic diagram showing the principle of a plasma radical cleaning spray gun of a novel atmospheric double RF electrode of the present invention. 2 is a schematic view of a plasma radical cleaning spray gun of a novel atmospheric double RF electrode of the present invention. Referring to FIG. 1, the plasma radical cleaning spray gun of the atmospheric double RF electrode comprises two RF electrodes 107, a dielectric barrier layer 106 covering the RF electrode, two ground electrodes 108, and a dielectric barrier covering the ground electrode. 109. An RF power source 105, a gun housing 104, a gas supply source 101, a flow meter 102, and a gas supply line 103. Two grounding electrodes are connected to the gun housing, and the dielectric barrier layer is an insulating material such as quartz or ceramic. The gas supply source 101 supplies argon gas and oxygen gas. When the gas passes through the flow meter 102, the gas is mixed to form a mixed gas. After the gas mixture passes through the gas supply line 103, it uniformly enters the gap between the ground electrode 108 and the RF electrode 107 and the two RFs. The gap between the electrodes, when the RF electrode 107 is connected to the RF power source 105, generates plasma in the three nozzles, and the plasma radical beam is ejected from the nozzle by the airflow when reaching the substrate surface. When the beam component is mainly composed of radicals 110, the radicals react with photoresist or other organic substances on the surface of the substrate to form products such as carbon dioxide and water. In addition to removing photoresist or other organic substances on the surface of the substrate, the spray gun also The surface of the substrate such as a liquid crystal panel can be modified.
请参阅图 2， 该常压双射频电极的等离子体自由基清洗喷枪， 供气管路 103与喷枪的进气口 202连接， 工作气体通过进气口 202进入喷枪内部， 射 频电极 107外面包覆着介质阻挡层， 接地电极 108外面包覆着介质阻挡层， 射频电极之间以及射频电极与接地电极之间为三个喷口， 喷枪工作时， 在喷 口喷出高密度的自由基束流， 射频电极与壳体 104之间由绝缘块 201隔离。 Referring to FIG. 2, the plasma free radical cleaning spray gun of the atmospheric double RF electrode, the gas supply line 103 is connected to the air inlet 202 of the spray gun, and the working gas enters the inside of the spray gun through the air inlet 202. The outer surface of the frequency electrode 107 is covered with a dielectric barrier layer, the outer surface of the ground electrode 108 is covered with a dielectric barrier layer, and three nozzles are arranged between the RF electrodes and between the RF electrode and the ground electrode. When the spray gun is in operation, a high density is sprayed at the nozzle. The radical beam is separated from the housing 104 by an insulating block 201.
上面参考附图结合具体的实施例对本发明进行了描述， 然而， 需要说明 的是，对于本领域的技术人员而言，在不脱离本发明的精神和范围的情况下， 可以对上述实施做出许多改变和修改，这些改变和修改都落在本发明的权利 要求限定的范围内。  The present invention has been described above with reference to the accompanying drawings, and it is to be understood that those skilled in the art can make the above-described implementation without departing from the spirit and scope of the invention. Many changes and modifications are intended to be included within the scope of the appended claims.

Claims

^ ^tl ¾ ^ ^ ^ ^tl 3⁄4 ^ ^
1、 一种新型常压双射频电极的等离子体自由基清洗喷枪， 包括两个 射频电极、 介质阻挡层、 两个接地电极和一个射频电源， 其特征在 于： 该喷枪呈长方体， 其中一面接进气口， 相对的面为喷口， 除喷 口面外， 喷枪其余各面均为金属板， 两个接地电极被介质阻挡层包 覆， 两个接地电极之间为两个射频电极， 形成三个喷口， 两个射频 电极被介质阻挡层包覆， 工作气体从喷枪喷口喷出， 在常压下， 电 源接通后， 在三个喷口中均产生辉光等离子体， 等离子体中的自由 基在气流的携带下向外喷出。 1. A plasma radical cleaning spray gun of a novel atmospheric double RF electrode, comprising two RF electrodes, a dielectric barrier layer, two ground electrodes and an RF power source, wherein: the spray gun has a rectangular parallelepiped shape, one side of which is connected The air port, the opposite surface is the nozzle, except for the nozzle surface, the other surfaces of the spray gun are metal plates, the two ground electrodes are covered by the dielectric barrier layer, and two RF electrodes are formed between the two ground electrodes to form three nozzles. The two RF electrodes are covered by the dielectric barrier layer, and the working gas is ejected from the nozzle of the spray gun. Under normal pressure, after the power is turned on, a glow plasma is generated in the three nozzles, and the free radical in the plasma is in the airflow. Carry it out and spray it out.
2、如权利 1所述的常压双射频电极的等离子体自由基清洗喷枪， 其特征在于： 接地电极与射频电极的制作材料均为铝等金属材料。  2. The plasma radical cleaning spray gun of the atmospheric double RF electrode according to claim 1, wherein: the ground electrode and the RF electrode are made of a metal material such as aluminum.
3、如权利 1所述的常压双射频电极的等离子体自由基清洗喷枪， 其特征在于：接地电极与射频电极以及射频电极与射频电极之间形成 的三个喷口大小相等， 宽度范围为 0.5-2.0 mm。  3. The plasma radical cleaning spray gun of the atmospheric double RF electrode according to claim 1, wherein the grounding electrode and the RF electrode and the three nozzles formed between the RF electrode and the RF electrode are equal in size, and the width ranges from 0.5. -2.0 mm.
4、如权利 1所述的常压双射频电极的等离子体自由基清洗喷枪， 其特征在于： 两个接地电极之间是两个相邻的射频电极。  4. The plasma radical cleaning spray gun of the atmospheric double RF electrode according to claim 1, wherein: between the two ground electrodes are two adjacent RF electrodes.
PCT/CN2012/086419 2012-04-05 2012-12-12 New normal-pressure dual radio frequency electrode plasma free radical cleaning spray gun WO2013149482A1 (en)

Applications Claiming Priority (2)

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CN2012100971393A CN103357618A (en) 2012-04-05 2012-04-05 Novel plasma free radical cleaning spray gun with normal-pressure double radio-frequency electrodes
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KR102609895B1 (en) * 2020-08-06 2023-12-05 주식회사 에이피피 Apparatus for generating plasma atmosphericpressure and plasma cleaning equipment

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CN102085520A (en) * 2009-12-04 2011-06-08 中国科学院微电子研究所 Normal-pressure double-medium blocking flat-opening type active free radical cleaning system
CN102310063A (en) * 2010-06-29 2012-01-11 中国科学院微电子研究所 Honeycomb-shaped plasma free radical cleaning system
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US4088926A (en) * 1976-05-10 1978-05-09 Nasa Plasma cleaning device
CN2604847Y (en) * 2003-02-26 2004-02-25 王守国 Atmospheric radio-frequency cylinder injective cold plasma generator
CN1525803A (en) * 2003-02-27 2004-09-01 王守国 Normal pressure radio frequency and DC mixed type cold plasma system and spray gun thereof
JP2007026981A (en) * 2005-07-20 2007-02-01 Iwasaki Electric Co Ltd Plasma processing device
CN102085520A (en) * 2009-12-04 2011-06-08 中国科学院微电子研究所 Normal-pressure double-medium blocking flat-opening type active free radical cleaning system
CN102310063A (en) * 2010-06-29 2012-01-11 中国科学院微电子研究所 Honeycomb-shaped plasma free radical cleaning system
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