CN202591170U - Normal-pressure dual RF radio frequency electrode plasma free radical cleaning spray gun - Google Patents
Normal-pressure dual RF radio frequency electrode plasma free radical cleaning spray gun Download PDFInfo
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- CN202591170U CN202591170U CN 201220139232 CN201220139232U CN202591170U CN 202591170 U CN202591170 U CN 202591170U CN 201220139232 CN201220139232 CN 201220139232 CN 201220139232 U CN201220139232 U CN 201220139232U CN 202591170 U CN202591170 U CN 202591170U
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Abstract
A normal-pressure dual RF radio frequency electrode plasma free radical cleaning spray gun comprises two RF electrodes, medium barrier layers, two grounding electrodes and a RF power supply, wherein the spray gun is a cuboid; one surface of the spray gun is connected with gas inlets; spouts are formed in another surface of the spray gun, which is opposite to the surface connected with the gas inlets; all the surfaces of the spray gun, except the surface with the spouts, are metal plates; the two grounding electrodes are coated with medium barrier layers; the two RF electrodes are arranged between the two grounding electrodes, so as to form the three spouts; the two RF electrodes are also coated with medium barrier layers; working gas is sprayed out through the spouts of the spray gun; under normal pressure, after the power supply is connected, the three spout all generate glow plasmas, the free radicals in the plasmas are carried by gas flow to be sprayed outward; and the spray gun is used for cleaning organic matters on the surfaces of substrates of silicon chips, glass and the like.
Description
Technical field
The utility model relates to a kind of normal pressure dijection plasma free radical cleaning spray gun of electrode frequently; Spray gun produces plasma by the dielectric barrier discharge of dijection frequency electrode; Living radical in the plasma three spouts from spray gun under certain pressure spray; After arriving substrate surfaces such as silicon chip, glass, react, reach the purpose of cleaning substrate surface with the organic matter of substrate surface.
Background technology
In the semiconductor production, silicon chip must strictly clean, even the pollution of trace also can cause component failure; In addition; Other substrates for example surface such as liquid-crystalline glasses flat board clean the organic contamination beyond the region of objective existence except needs, also need improve the performance of material surface, increase the tack of material surface.The conventional clean mode is a wet chemistry methods, and the wet chemistry methods existence can not accurately be controlled, clean thoroughly, cleaning solution is prone to environment is polluted; The dry method method great majority that occurred are to be operated under the vacuum state, and equipment complicated operation, cost are high, and in vacuum chamber owing to there is ion sputtering, be easy to make on the vacuum wall spill metallic atom; There is easy new impurity, the shortcomings such as electrode structure complicacy introduced in the normal pressure cleaning technique that has occurred.
The utility model has been introduced a kind of normal pressure dijection plasma free radical cleaning spray gun of electrode frequently.Spray gun comprises two radio-frequency electrodes, two earth electrodes, is two adjacent radio-frequency electrodes between two earth electrodes, and the plasma free radical cleaning spray gun of normal pressure dijection frequency electrode has adopted the radio frequency discharge form of dielectric impedance; Mist with argon gas and oxygen is a working gas; Produce glow discharge, plasma free radical line sprays from three spouts, on substrate surfaces such as arrival silicon chip; The line main component is a living radical; Free radical and photoresist or other organic matter react, and generate products such as carbon dioxide, water, reach the cleaning purpose; This spray gun can also improve its surperficial adhesiveness except can cleaning substrates such as liquid-crystalline glasses flat boards.
The normal pressure dijection frequently advantage of the plasma free radical cleaning spray gun of electrode is that discharge between the radio-frequency electrode has increased machining area, reduced the metal impurities of introducing, spray gun structure is oversimplified.
The utility model content
The normal pressure dijection is the plasma free radical cleaning spray gun of electrode frequently, comprises two radio-frequency electrodes, dielectric barrier, two earth electrodes and a radio-frequency power supply, and it is characterized in that: this spray gun is cuboid; Wherein one side connects air inlet, and relative face is a spout, except that the spout face; All the other each faces of spray gun are metallic plate, and two earth electrodes are coated by dielectric barrier, are two radio-frequency electrodes between two earth electrodes; Form three spouts, two radio-frequency electrodes are coated by dielectric barrier, and working gas sprays from the spray gun spout; Under normal pressure; Behind the power connection, in three spouts, all produce glow plasma, the free radical in the plasma is outwards ejection under the carrying of air-flow.
Described normal pressure dijection is the plasma free radical cleaning spray gun of electrode frequently, and it is characterized in that: the manufacturing materials of earth electrode and radio-frequency electrode is metal material.
Described normal pressure dijection is the plasma free radical cleaning spray gun of electrode frequently, and it is characterized in that: three spout equal and opposite in directions that form between earth electrode and radio-frequency electrode and radio-frequency electrode and the radio-frequency electrode, width range is 0.5-2.0mm.
Described normal pressure dijection is the plasma free radical cleaning spray gun of electrode frequently, it is characterized in that: be two adjacent radio-frequency electrodes between two earth electrodes.
A kind of normal pressure dijection of the utility model is the plasma free radical line of the plasma free radical cleaning spray gun generation of electrode frequently; When being ejected into substrate surfaces such as silicon chip; Beam component is main with free radical, and the photoresist of highly active free radical and substrate surface or the reaction of other organic matter generate carbon dioxide, water etc., can directly be discharged in the atmosphere; This spray gun can also improve its surperficial adhesiveness except cleaning substrates such as liquid-crystalline glasses flat boards.
The normal pressure dijection frequently advantage of the plasma free radical cleaning spray gun of electrode is that discharge between the radio-frequency electrode has increased machining area, reduced the metal impurities of introducing, spray gun structure is oversimplified.The main application of the utility model is photoresist and the organic pollution on the cleaning silicon chip, or the organic pollution of other substrate surfaces such as glass cleaning.
Description of drawings
Fig. 1 is a kind of normal pressure dijection of the utility model plasma free radical cleaning spray gun principle schematic of electrode frequently.
Fig. 2 is a kind of normal pressure dijection of the utility model plasma free radical cleaning spray gun outline drawing of electrode frequently.
The specific embodiment
See also Fig. 1; This normal pressure dijection is the plasma free radical cleaning spray gun of electrode frequently, comprises two radio-frequency electrodes 107, coats dielectric barrier 106, two earth electrodes 108 of radio-frequency electrode, the dielectric barrier 109 that coats earth electrode, radio-frequency power supply 105, gun case 104, air supply source 101, flowmeter 102 and a supply air line 103.Two earth electrodes are connected with gun case, and dielectric barrier is insulating materials such as quartz or pottery.Air supply source 101 provides argon gas and oxygen, forms mist by a certain percentage during gas process flowmeter 102, and mist is behind supply air line 103; Get into uniformly gap and the gap between two radio-frequency electrodes between earth electrode 108 and the radio-frequency electrode 107, after radio-frequency electrode 107 and radio-frequency power supply 105 connections, in three spouts, all produce plasma; Plasma free radical line is under the drive of air-flow; Eject from spout, when arriving substrate surface, beam component is main with free radical 110; The photoresist of free radical and substrate surface or the reaction of other organic matter; Generate products such as carbon dioxide, water, except removing substrate surface photoresist or other organic matter, this spray gun can also carry out modification to substrate surfaces such as liquid crystal flat-panels.
See also Fig. 2; This normal pressure dijection is the plasma free radical cleaning spray gun of electrode frequently, and supply air line 103 is connected with the air inlet 202 of spray gun, and it is inner that working gas gets into spray gun through air inlet 202; Radio-frequency electrode 107 outsides are coating dielectric barrier; Earth electrode 108 outsides are coating dielectric barrier, are three spouts between the radio-frequency electrode and between radio-frequency electrode and the earth electrode, during spray gun work; Spray highdensity free radical line at spout, isolate by collets 201 between radio-frequency electrode and the housing 104.
Combine concrete embodiment that the utility model is described with reference to accompanying drawing above; Yet; Need to prove, for a person skilled in the art, under the situation of spirit that does not break away from the utility model and scope; Can make many changes and modification to above-mentioned enforcement, these changes and modification all drop in the scope thereof of the utility model.
Claims (4)
1. the plasma free radical cleaning spray gun of a normal pressure dijection frequency electrode comprises two radio-frequency electrodes, dielectric barrier, two earth electrodes and a radio-frequency power supply, and it is characterized in that: this spray gun is cuboid; Wherein one side connects air inlet, and relative face is a spout, except that the spout face; All the other each faces of spray gun are metallic plate, and two earth electrodes are coated by dielectric barrier, are two radio-frequency electrodes between two earth electrodes; Form three spouts, two radio-frequency electrodes are coated by dielectric barrier, and working gas sprays from the spray gun spout; Under normal pressure; Behind the power connection, in three spouts, all produce glow plasma, the free radical in the plasma is outwards ejection under the carrying of air-flow.
2. like the plasma free radical cleaning spray gun of right 1 described normal pressure dijection frequency electrode, it is characterized in that: the manufacturing materials of earth electrode and radio-frequency electrode is metal material.
3. like the plasma free radical cleaning spray gun of right 1 described normal pressure dijection frequency electrode, it is characterized in that: three spout equal and opposite in directions that form between earth electrode and radio-frequency electrode and radio-frequency electrode and the radio-frequency electrode, width range is 0.5-2.0mm.
4. like the plasma free radical cleaning spray gun of right 1 described normal pressure dijection frequency electrode, it is characterized in that: be two adjacent radio-frequency electrodes between two earth electrodes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220139232 CN202591170U (en) | 2012-04-05 | 2012-04-05 | Normal-pressure dual RF radio frequency electrode plasma free radical cleaning spray gun |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220139232 CN202591170U (en) | 2012-04-05 | 2012-04-05 | Normal-pressure dual RF radio frequency electrode plasma free radical cleaning spray gun |
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| Publication Number | Publication Date |
|---|---|
| CN202591170U true CN202591170U (en) | 2012-12-12 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220139232 Expired - Fee Related CN202591170U (en) | 2012-04-05 | 2012-04-05 | Normal-pressure dual RF radio frequency electrode plasma free radical cleaning spray gun |
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| CN (1) | CN202591170U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013149482A1 (en) * | 2012-04-05 | 2013-10-10 | 中国科学院微电子研究所 | New normal-pressure dual radio frequency electrode plasma free radical cleaning spray gun |
| CN103889138A (en) * | 2012-12-24 | 2014-06-25 | 中国科学院微电子研究所 | Plasma discharge device |
-
2012
- 2012-04-05 CN CN 201220139232 patent/CN202591170U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013149482A1 (en) * | 2012-04-05 | 2013-10-10 | 中国科学院微电子研究所 | New normal-pressure dual radio frequency electrode plasma free radical cleaning spray gun |
| CN103889138A (en) * | 2012-12-24 | 2014-06-25 | 中国科学院微电子研究所 | Plasma discharge device |
| CN103889138B (en) * | 2012-12-24 | 2016-06-29 | 中国科学院微电子研究所 | Plasma discharge apparatus |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20121212 Termination date: 20140405 |