WO2013145233A1 - 切削工具用硬質被膜及び硬質被膜被覆切削工具 - Google Patents

切削工具用硬質被膜及び硬質被膜被覆切削工具 Download PDF

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WO2013145233A1
WO2013145233A1 PCT/JP2012/058450 JP2012058450W WO2013145233A1 WO 2013145233 A1 WO2013145233 A1 WO 2013145233A1 JP 2012058450 W JP2012058450 W JP 2012058450W WO 2013145233 A1 WO2013145233 A1 WO 2013145233A1
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coating layer
coating
cutting tool
hard coating
range
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PCT/JP2012/058450
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English (en)
French (fr)
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正俊 櫻井
功基 村澤
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オーエスジー株式会社
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Priority to JP2014507199A priority Critical patent/JP5762626B2/ja
Priority to EP12873015.7A priority patent/EP2832479B1/en
Priority to PCT/JP2012/058450 priority patent/WO2013145233A1/ja
Publication of WO2013145233A1 publication Critical patent/WO2013145233A1/ja

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/067—Borides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/341—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one carbide layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/347—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with layers adapted for cutting tools or wear applications
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
    • C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target

Definitions

  • the present invention relates to a hard coating for a cutting tool provided on the surface of a cutting tool and a hard coating coated cutting tool provided with the hard coating, and in particular, an improvement for improving both wear resistance and welding resistance. About.
  • Cutting tools such as drills and taps are provided with a hard coating to improve wear resistance.
  • a hard coating for cutting tools TiN-based, TiCN-based, TiAlN-based, and AlCrN-based coatings are widely used, and improvements are made to further improve the performance.
  • it is the hard laminated film described in Patent Document 1.
  • the welding resistance may be insufficient depending on the type of the work material and the cutting conditions. That is, the tool life may be shortened by welding of the work material or the like, and there is room for improvement. For this reason, the development of a hard coating for a cutting tool and a hard coating coated cutting tool having both excellent wear resistance and welding resistance has been demanded.
  • the present invention has been made in the background of the above circumstances, and its object is to provide a hard coating for a cutting tool and a hard coating-coated cutting tool having excellent wear resistance and welding resistance. There is.
  • the gist of the first invention is a hard coating for a cutting tool provided on the surface of the cutting tool, the first coating layer made of Ag, and Al 1.
  • -ab Cr a M b is a multilayer film in which two or more second coating layers made of nitride, oxide, carbide, carbonitride, or boride are alternately laminated, and the second coating layer M includes at least one of Si, V, and W, the atomic ratio a relating to the second coating layer is in the range of 0.2 to 0.5, and b is greater than 0 and 0.3 or less.
  • the lamination period of the first coating layer and the second coating layer is in the range of 0.2 nm to 100 nm, and the total film thickness is in the range of 0.2 ⁇ m to 10.0 ⁇ m. It is characterized by being within.
  • the gist of the second invention is a hard film-coated cutting tool characterized in that the hard film for a cutting tool according to the first invention is provided on the surface. .
  • a first coating layer made of Ag, nitrides of Al 1-ab Cr a M b , oxides, carbides, carbonitrides, or a second coating of boride
  • the layer is a multilayer film in which two or more layers are alternately stacked, M related to the second coating layer includes at least one of Si, V, and W, and the atomic ratio related to the second coating layer a is in the range of 0.2 or more and 0.5 or less, b is in the range of greater than 0 and 0.3 or less, and the lamination period of the first coating layer and the second coating layer is 0.2 nm or more and 100 nm.
  • the friction coefficient and cutting resistance can be reduced by containing Ag in the coating, A film having excellent lubricity and welding resistance and a high hardness can be obtained. That is, it is possible to provide a hard coating for a cutting tool that has both excellent wear resistance and welding resistance.
  • the hard coating for a cutting tool of the first invention is provided on the surface, the friction coefficient and cutting resistance are reduced by containing Ag in the coating. It is possible to obtain a coating film having excellent lubricity and welding resistance and having high hardness. That is, it is possible to provide a hard coating coated cutting tool having both excellent wear resistance and welding resistance.
  • the hard coating for a cutting tool of the present invention is a surface coating of various cutting tools such as a rotating cutting tool such as an end mill, a drill, a face mill, a total mill, a reamer, a tap, and a non-rotating cutting tool such as a bite. It is preferably applied to.
  • Cemented carbide or high-speed tool steel is preferably used as the material of the tool base, that is, the member on which the hard coating is provided, but other materials may be used, such as cermet, ceramics, polycrystalline diamond, single crystal diamond,
  • the hard coating for cutting tools of the present invention is widely applied to cutting tools composed of various materials such as crystal CBN and single crystal CBN.
  • the hard coating for a cutting tool of the present invention is provided so as to cover a part or all of the surface of the cutting tool, and is preferably provided on a blade part involved in cutting in the cutting tool. More preferably, it is provided so as to cover at least the cutting edge or rake face of the blade portion.
  • the second membrane layer is, when the M Si, V, intended to contain at least one of W, a nitride of Al 1-ab Cr a M b , oxides, carbides, carbonitrides, or borides Or a mutual solid solution thereof. Specifically, it is made of AlCrSiN, AlCrSiO, AlCrSiB, AlCrSiVN, AlCrSiWCN, AlCrSiVWB, AlCrVN, AlCrVC, AlCrVWO, AlCrWN, AlCrWCN, or the like.
  • the film thicknesses of the first film layer and the second film layer are individually determined according to the composition, etc., but when they are repeatedly laminated, the film thickness may be constant, It can also be changed in stages.
  • the average film thickness of the first coating layer and the second coating layer varies depending on the member to be coated, the composition of the coating, and the like, but is preferably in the range of about 0.1 to 50 nm, for example.
  • the first coating layer and the second coating layer may be formed by, for example, arc ion plating, ion beam deposition, sputtering, PLD (Pulse Laser Deposition), IBAD (Ion Beam Assisted Deposition), or the like. Although it is suitably provided by the PVD method, other film forming methods can also be adopted.
  • FIG. 1 is a view showing a drill 10 which is an embodiment of a hard film-coated cutting tool of the present invention, and is a front view seen from a direction perpendicular to an axis O.
  • FIG. FIG. 2 is an enlarged bottom view of the drill 10 shown in FIG. 1 as viewed from the tip side where the cutting edge 12 is provided (that is, in the direction indicated by the arrow II).
  • the drill 10 of this embodiment shown in FIGS. 1 and 2 is a two-blade twist drill, and is integrally provided with a shank 14 and a body 16 in the direction of the axis O. In the body 16, a pair of grooves 18 twisted clockwise around the axis O are formed.
  • a pair of cutting edges 12 are provided at the tip of the body 16 corresponding to the pair of grooves 18, and the drill 10 is driven to rotate clockwise around the axis O as viewed from the shank 14 side. Accordingly, a hole is cut in the work material by the cutting edge 12, and chips generated when the hole is cut are discharged through the groove 18 to the shank 14 side. .
  • FIG. 3 is an enlarged sectional view of the vicinity of the surface of the body 16 of the drill 10 and illustrates the configuration of the hard coating 22 which is an embodiment of the hard coating for a cutting tool of the present invention.
  • the drill 10 is configured, for example, by coating the surface of a tool base material (tool base material) 20 made of high-speed tool steel (high speed) with a hard coating 22 as shown in FIG.
  • the hard coating 22 is a multilayer film in which two or more first coating layers 24 and second coating layers 26 are alternately stacked on the surface of the tool base 20.
  • the first coating layer 24 is the lowermost layer provided on the surface of the tool base 20, and the second coating layer 26 is the uppermost layer corresponding to the surface (outer surface) of the hard coating 22.
  • the said 2nd coating layer 26 may comprise a lowermost layer, and the said 1st coating layer 24 may comprise an uppermost layer, respectively.
  • the first coating layer 24 is made of Ag containing inevitable impurities.
  • the second coating layer 26, a nitride of Al 1-ab Cr a M b including unavoidable impurities, oxides, carbides, carbonitrides, or borides, or a their mutual solid solutions.
  • This M includes at least one of Si, V, and W.
  • the second coating layer 26 is made of AlCrSiN, AlCrSiO, AlCrSiB, AlCrSiVN, AlCrSiWCN, AlCrSiVWB, AlCrVN, AlCrVC, AlCrVWO, AlCrWN, AlCrWCN, or the like.
  • the atomic ratio (mixed crystal ratio) a of the second coating layer 26 is in the range of 0.2 to 0.5 (0.2 ⁇ a ⁇ 0.5), and b is greater than 0 and 0.3 or less. (0 ⁇ b ⁇ 0.3).
  • the first coating layer 24 and the second coating layer 26 are preferably formed with a predetermined constant film thickness (average film thickness).
  • the average film thickness of each of the first coating layer 24 and the second coating layer 26 is individually set according to the member to be coated, the composition of the coating, and the like.
  • the average film thickness of the first coating layer 24 is The thickness d1 is appropriately determined within the range of 0.1 to 25.0 nm, and the average film thickness d2 of the second coating layer 26 is appropriately determined within the range of 0.1 to 75.0 nm.
  • the lamination period d3 of the first coating layer 24 and the second coating layer 26 is in the range of 0.2 nm to 100 nm.
  • the number of layers of the first coating layer 24 and the second coating layer 26 (the total number of layers of the first coating layer 24 and the second coating layer 26) is preferably in the range of 44 to 6500. That is, the number of layers of the first coating layer 24 and the second coating layer 26 is preferably in the range of 22-3250.
  • the total film thickness D of the hard coating 22 is in the range of 0.2 ⁇ m to 10.0 ⁇ m.
  • FIG. 4 is a diagram for explaining an example of the coating method of the hard film 22.
  • the hard film 22 is coated on the drill 10 and the like under the control of the controller 36 using, for example, a sputtering apparatus 30 as shown in FIG.
  • a negative bias voltage is applied to the tool base material 20 disposed in the chamber 32 of the sputtering apparatus 30 by a bias power source 34.
  • positive argon ions Ar + collide with the tool base 20 and the surface of the tool base 20 is roughened.
  • a constant negative bias voltage for example, about ⁇ 50 to ⁇ 60 V
  • a target 38 such as AlCrSi constituting the second coating layer 26 of the hard coating 22.
  • a negative constant bias voltage for example, about ⁇ 100 V
  • argon ions Ar + are caused to collide with the target 38, thereby causing a constituent material such as AlCrSi. Is beaten.
  • a reactive gas such as nitrogen gas (N 2 ) or hydrocarbon gas (CH 4 , C 2 H 2 ) is introduced into the chamber 32 at a predetermined flow rate, and the nitrogen atom N or carbon atom C is introduced.
  • N 2 nitrogen gas
  • CH 4 , C 2 H 2 hydrocarbon gas
  • the second coating layer 26 made of AlCrSiN or the like is formed by forming a target corresponding to each of simple substances such as Al, Cr, and Si and performing sputtering simultaneously using the plurality of targets. May be.
  • a positive voltage may be applied to the tool base 20.
  • the first coating layer 24 and the second coating layer 26 are alternately attached to the surface of the tool base 20, whereby the hard coating 22 is applied to the surface of the tool base 20. Is formed.
  • FIG. 5 is a diagram showing the coating structure of the product of the present invention and the test product used in this test and the respective test results (number of processed holes and determination).
  • the inventors of the present invention have prepared a sample of the present invention 1 to 11 and test samples 1 to 6 by coating a hard drill having a tool diameter of 8.3 mm ⁇ with each coating structure and film thickness shown in FIG. Then, a cutting test was performed on each test product under the following cutting conditions. Among the samples shown in FIG.
  • the products 1 to 11 of the present invention correspond to the products of the present invention to which the hard coating 22 of this example is applied, and the samples 1 to 6 do not satisfy the requirements of the present invention (claims).
  • This corresponds to a non-invention product to which a hard coating is applied.
  • “A layer” and “B layer” in FIG. 5 correspond to the first coating layer 24 and the second coating layer 26, respectively.
  • the number of processed holes shown in FIG. 5 is the number of holes when the flank wear width is 0.2 mm, and the acceptance criterion is that the number of processed holes when the flank wear width is 0.2 mm is 20 or more. .
  • the present invention products 1 to 11, both the first coating layer made of Ag and (A layer) 24, a nitride of Al 1-ab Cr a M b , oxides, carbides, carbonitrides
  • the second coating layer (B layer) 26 made of nitride or boride is a multilayer film in which two or more layers are alternately stacked, and M related to the second coating layer 26 is at least one of Si, V, and W 1 is included, the atomic ratio a related to the second coating layer 26 is in the range of 0.2 to 0.5, b is greater than 0 and in the range of 0.3 or less, the first The lamination period d3 of the coating layer 24 and the second coating layer 26 is in the range of 0.2 nm to 100 nm, and the total film thickness D is in the range of 0.2 ⁇ m to 10.0 ⁇ m.
  • the hard coating 22 satisfying the requirements of claim 1 of the present invention is applied.
  • the flank wear width is 0.2 mm in any sample.
  • the number of processed holes is 20 holes or more, which satisfies the acceptance criteria.
  • the second coating layer 26 is made of AlCrSiN (composition Al 0.2 Cr 0.5 Si 0.3 ), the average thickness of the first coating layer 24 and the second coating layer 26 is 8.5 nm, and the stacking cycle is 17.
  • the invention product 5 having 0 nm, the number of layers of 650, and the total film thickness of 5.5 ⁇ m has 40 processed holes, and the second coating layer 26 is made of AlCrSiO (composition Al 0.3 Cr 0.5 Si 0.2 ), and the first coating
  • the product according to the present invention in which the average thickness of the layer 24 is 0.5 nm, the average thickness of the second coating layer 26 is 3.5 nm, the stacking period is 4.0 nm, the number of layers is 1000, and the total thickness is 2.0 ⁇ m.
  • the number of processed holes is 35
  • the second coating layer 26 is made of AlCrWCN (composition Al 0.6 Cr 0.3 SiW 0.1 )
  • the average thickness of the first coating layer 24 is 5.0 nm
  • the average of the second coating layer 26 Film thickness is 15.0 nm
  • stacking cycle is 20.0 nm
  • layer In the present invention 3 having a number of 325 and a total film thickness of 3.2 ⁇ m
  • the number of processed holes is 34
  • the second coating layer 26 is made of AlCrSiVWB (composition Al 0.5 Cr 0.3 SiVW 0.2 ).
  • Processed with Product 4 of the present invention having an average film thickness of 6.0 nm, an average film thickness of the second coating layer 26 of 3.0 nm, a stacking period of 9.0 nm, a number of layers of 545, and a total film thickness of 2.5 ⁇ m.
  • the number of holes is 32
  • the second coating layer 26 is made of AlCrVN (composition Al 0.3 Cr 0.4 V 0.3 )
  • the average thickness of the first coating layer 24 is 20.0 nm
  • the average thickness of the second coating layer 26 is Processing of the present invention product 6 with 40.0 nm, stacking cycle 60.0 nm, number of layers 44, and total film thickness 1.3 ⁇ m, and processing when both flank wear width is 0.2 mm
  • the number of holes is 30 holes or more, and especially shows good cutting performance Hunt.
  • the test product 1 has a total film thickness of 10.5 ⁇ m, and deviates from the range of the total film thickness of 0.2 ⁇ m or more and 10.0 ⁇ m or less, which is a requirement of claim 1 of the present invention.
  • the test product 2 has a total film thickness of 0.15 ⁇ m, and deviates from the range of the total film thickness of 0.2 ⁇ m or more and 10.0 ⁇ m or less which is a requirement of claim 1 of the present invention.
  • the second coating layer 26 is made of AlCrSiC (composition Al 0.6 Cr 0.1 Si 0.3 ), and the Cr atomic ratio a which is a requirement of claim 1 of the present invention is 0.2 or more and 0. It deviates from the range of 5 or less.
  • the test product 5 has a stacking period of 120.0 nm, which deviates from the range of the stacking period of 0.2 nm to 100 nm, which is a requirement of claim 1 of the present invention.
  • the second coating layer 26 is made of AlCrSiCN (composition Al 0.5 Cr 0.1 Si 0.4 ), and the atomic ratio a of Cr, which is a requirement of claim 1 of the present invention, is 0.2 or more and 0. It deviates from the range of 5 or less.
  • the number of holes processed was less than 20 when the flank wear width was 0.2 mm. It turns out that it is inferior to cutting performance compared with. This is considered to be because a hard coating that does not satisfy the requirements of claim 1 of the present invention has insufficient welding resistance, leading to an early life due to welding or peeling.
  • the first coating layer 24 made of Ag, nitrides of Al 1-ab Cr a M b , oxides, carbides, carbonitrides, or a second coating of boride
  • the layer 26 is a multilayer film in which two or more layers are alternately stacked, and M related to the second coating layer 26 includes at least one of Si, V, and W.
  • the atomic ratio a is in the range of 0.2 or more and 0.5 or less
  • b is in the range of greater than 0 and 0.3 or less
  • the lamination period d3 of the first coating layer 24 and the second coating layer 26 Is in the range of 0.2 nm or more and 100 nm or less
  • the total film thickness D is in the range of 0.2 ⁇ m or more and 10.0 ⁇ m or less. Therefore, the friction coefficient and cutting resistance can be obtained by containing Ag in the coating. , Which provides excellent lubricity and adhesion resistance and a high hardness coating. . That is, it is possible to provide a hard coating 22 for a cutting tool that has both excellent wear resistance and welding resistance.
  • the hard coating 22 is a drill 10 as a super hard coating coated cutting tool provided on the surface, the friction coefficient and cutting resistance can be reduced by containing Ag in the coating. It can be reduced, and a coating with high hardness and excellent lubricity and welding resistance can be obtained. That is, it is possible to provide the drill 10 having both excellent wear resistance and welding resistance.

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Abstract

　優れた耐摩耗性及び耐溶着性を兼ね備えた切削工具用硬質被膜及び硬質被膜被覆切削工具を提供する。　Ａｇから成る第１被膜層（２４）と、Ａｌ1-a-bＣｒaＭb の窒化物、酸化物、炭化物、炭窒化物、又は硼化物から成る第２被膜層（２６）とが、交互に２層以上積層した多層膜であり、第２被膜層（２６）に係るＭはＳｉ、Ｖ、Ｗのうち少なくとも１種類を含むものであり、第２被膜層（２６）に係る原子比ａは０．２以上０．５以下の範囲内、ｂは０より大きく０．３以下の範囲内であり、第１被膜層（２４）と第２被膜層（２６）との積層周期ｄ３は０．２ｎｍ以上１００ｎｍ以下の範囲内であり、且つ、総膜厚Ｄは０．２μｍ以上１０．０μｍ以下の範囲内であることから、被膜中にＡｇを含有することで摩擦係数及び切削抵抗を軽減させることができ、潤滑性及び耐溶着性に優れると共に高硬度の被膜が得られる。

Description

切削工具用硬質被膜及び硬質被膜被覆切削工具
　本発明は、切削工具の表面に被覆して設けられる切削工具用硬質被膜及びその硬質被膜が設けられた硬質被膜被覆切削工具に関し、特に、耐摩耗性及び耐溶着性を共に向上させるための改良に関する。
　ドリルやタップ等の切削工具には、耐摩耗性を向上させるために硬質被膜が被覆して設けられる。この切削工具用硬質被膜としては、ＴｉＮ系、ＴｉＣＮ系、ＴｉＡｌＮ系、及びＡｌＣｒＮ系のコーティングが広く用いられており、その性能を更に向上させるために改良が図られている。例えば、特許文献１に記載された硬質積層被膜がそれである。
特開２０１０－７６０８２号公報
　しかし、前述したような従来の技術により硬質被膜が形成された切削工具では、その切削加工に際して被削材の種類や切削条件によっては耐溶着性が不十分となるおそれがあった。すなわち、被削材等の溶着により工具の寿命が短くなる場合があり、改良の余地があった。このため、優れた耐摩耗性及び耐溶着性を兼ね備えた切削工具用硬質被膜及び硬質被膜被覆切削工具の開発が求められていた。
　本発明は、以上の事情を背景として為されたものであり、その目的とするところは、優れた耐摩耗性及び耐溶着性を兼ね備えた切削工具用硬質被膜及び硬質被膜被覆切削工具を提供することにある。
　斯かる目的を達成するために、本第１発明の要旨とするところは、切削工具の表面に被覆して設けられる切削工具用硬質被膜であって、Ａｇから成る第１被膜層と、Ａｌ1-a-bＣｒaＭbの窒化物、酸化物、炭化物、炭窒化物、又は硼化物から成る第２被膜層とが、交互に２層以上積層した多層膜であり、前記第２被膜層に係るＭはＳｉ、Ｖ、Ｗのうち少なくとも１種類を含むものであり、前記第２被膜層に係る原子比ａは０．２以上０．５以下の範囲内、ｂは０より大きく０．３以下の範囲内であり、前記第１被膜層と前記第２被膜層との積層周期は０．２ｎｍ以上１００ｎｍ以下の範囲内であり、且つ、総膜厚は０．２μｍ以上１０．０μｍ以下の範囲内であることを特徴とするものである。
　前記目的を達成するために、本第２発明の要旨とするところは、上記第１発明の切削工具用硬質被膜が表面に被覆して設けられたことを特徴とする硬質被膜被覆切削工具である。
　このように、前記第１発明によれば、Ａｇから成る第１被膜層と、Ａｌ1-a-bＣｒaＭbの窒化物、酸化物、炭化物、炭窒化物、又は硼化物から成る第２被膜層とが、交互に２層以上積層した多層膜であり、前記第２被膜層に係るＭはＳｉ、Ｖ、Ｗのうち少なくとも１種類を含むものであり、前記第２被膜層に係る原子比ａは０．２以上０．５以下の範囲内、ｂは０より大きく０．３以下の範囲内であり、前記第１被膜層と前記第２被膜層との積層周期は０．２ｎｍ以上１００ｎｍ以下の範囲内であり、且つ、総膜厚は０．２μｍ以上１０．０μｍ以下の範囲内であることから、被膜中にＡｇを含有することで摩擦係数及び切削抵抗を軽減させることができ、潤滑性及び耐溶着性に優れると共に高硬度の被膜が得られる。すなわち、優れた耐摩耗性及び耐溶着性を兼ね備えた切削工具用硬質被膜を提供することができる。
　前記第２発明によれば、前記第１発明の切削工具用硬質被膜が表面に被覆して設けられたものであるため、被膜中にＡｇを含有することで摩擦係数及び切削抵抗を軽減させることができ、潤滑性及び耐溶着性に優れると共に高硬度の被膜が得られる。すなわち、優れた耐摩耗性及び耐溶着性を兼ね備えた硬質被膜被覆切削工具を提供することができる。
本発明の硬質被膜被覆切削工具の一実施例であるドリルを軸心に垂直な方向から見た正面図である。 図１に示すドリルを切れ刃が設けられた先端側から見た拡大底面図である。 図１のドリルのボデーにおける表面付近の拡大断面図であり、本発明の切削工具用硬質被膜の一実施例である硬質被膜の構成を例示するものである。 図３の硬質被膜のコーティング方法の一例を説明する図である。 本発明の効果を検証するために本発明者等が行った穴空け試験に用いられた各試料の被膜構造及びそれぞれの試験結果を併せて示す図である。
　本発明の切削工具用硬質被膜は、エンドミル、ドリル、正面フライス、総型フライス、リーマ、タップ等の回転切削工具の他、バイト等の非回転式の切削工具等、種々の切削工具の表面コーティングに好適に適用される。工具基材すなわち硬質被膜が設けられる部材の材質としては、超硬合金や高速度工具鋼が好適に用いられるが、他の材料でもよく、例えばサーメット、セラミックス、多結晶ダイヤモンド、単結晶ダイヤモンド、多結晶ＣＢＮ、単結晶ＣＢＮ等、種々の材料から構成された切削工具に本発明の切削工具用硬質被膜は広く適用される。
　本発明の切削工具用硬質被膜は、切削工具の一部乃至全部の表面に被覆して設けられるものであり、好適には、その切削工具において切削加工に関与する刃部に設けられる。更に好適には、少なくともその刃部における切れ刃乃至すくい面を被覆するように設けられる。
　前記２被膜層は、ＭをＳｉ、Ｖ、Ｗのうち少なくとも１種類を含むものとした場合に、Ａｌ1-a-bＣｒaＭbの窒化物、酸化物、炭化物、炭窒化物、又は硼化物、或いはこれらの相互固溶体にて構成される。具体的には、ＡｌＣｒＳｉＮ、ＡｌＣｒＳｉＯ、ＡｌＣｒＳｉＢ、ＡｌＣｒＳｉＶＮ、ＡｌＣｒＳｉＷＣＮ、ＡｌＣｒＳｉＶＷＢ、ＡｌＣｒＶＮ、ＡｌＣｒＶＣ、ＡｌＣｒＶＷＯ、ＡｌＣｒＷＮ、ＡｌＣｒＷＣＮ等から成るものである。
　前記第１被膜層及び第２被膜層の膜厚は、組成等に応じて個々に定められるが、それ等を複数層繰り返し積層する場合には、それぞれ一定の膜厚でも良いし、連続的或いは段階的に変化させることもできる。前記第１被膜層、第２被膜層の各平均膜厚は、コーティングする部材や被膜の組成等によって異なるが、例えば０．１～５０ｎｍ程度の範囲内が適当である。
　前記第１被膜層、第２被膜層は、例えばアークイオンプレーティング法やイオンビーム蒸着法、スパッタリング法、ＰＬＤ（Pulse Laser Deposition) 法、ＩＢＡＤ（Ion Beam Assisted Deposition；イオンビーム支援蒸着）法等のＰＶＤ法によって好適に設けられるが、他の成膜法を採用することもできる。
　以下、本発明の好適な実施例を図面に基づいて詳細に説明する。以下の説明に用いる図面に関して、各部の寸法比等は必ずしも正確に描かれていない。
　図１は、本発明の硬質被膜被覆切削工具の一実施例であるドリル１０を示す図であり、軸心Ｏに垂直な方向から見た正面図である。図２は、図１に示すドリル１０を、切れ刃１２が設けられた先端側から（すなわち矢印IIで示す方向に）見た拡大底面図である。これら図１及び図２に示す本実施例のドリル１０は、２枚刃のツイストドリルであり、シャンク１４及びボデー１６を軸心Ｏ方向に一体に備えている。斯かるボデー１６には、軸心Ｏの右まわりにねじれた一対の溝１８が形成されている。前記ボデー１６の先端には、前記一対の溝１８に対応して一対の切れ刃１２が設けられており、前記ドリル１０が前記シャンク１４側から見て軸心Ｏの右まわりに回転駆動されることにより、前記切れ刃１２によって被削材に穴が切削加工されると共に、その穴を切削加工する際に生じる切屑が前記溝１８を通ってシャンク１４側へ排出されるように構成されている。
　図３は、前記ドリル１０のボデー１６における表面付近の拡大断面図であり、本発明の切削工具用硬質被膜の一実施例である硬質被膜２２の構成を例示するものである。前記ドリル１０は、例えば、高速度工具鋼（ハイス）製の工具基材（工具母材）２０の表面に、図３に示すような硬質被膜２２がコーティングされて構成されたものである。この硬質被膜２２は、例えば図３に示すように、前記工具基材２０の表面に第１被膜層２４と、第２被膜層２６とが、交互に２層以上積層した多層膜である。図３においては、前記第１被膜層２４が前記工具基材２０の表面に設けられる最下層を、前記第２被膜層２６が前記硬質被膜２２の表面（外表面）に相当する最上層をそれぞれ構成する例を示しているが、前記第２被膜層２６が最下層、前記第１被膜層２４が最上層をそれぞれ構成するものであってもよい。
　前記第１被膜層２４は、不可避的不純物を含むＡｇから成るものである。前記第２被膜層２６は、不可避的不純物を含むＡｌ1-a-bＣｒaＭbの窒化物、酸化物、炭化物、炭窒化物、又は硼化物、或いはこれらの相互固溶体である。このＭは、Ｓｉ、Ｖ、Ｗのうち少なくとも１種類を含むものである。すなわち、前記第２被膜層２６は、具体的には、ＡｌＣｒＳｉＮ、ＡｌＣｒＳｉＯ、ＡｌＣｒＳｉＢ、ＡｌＣｒＳｉＶＮ、ＡｌＣｒＳｉＷＣＮ、ＡｌＣｒＳｉＶＷＢ、ＡｌＣｒＶＮ、ＡｌＣｒＶＣ、ＡｌＣｒＶＷＯ、ＡｌＣｒＷＮ、ＡｌＣｒＷＣＮ等から成るものである。前記第２被膜層２６に係る原子比（混晶比）ａは、０．２以上０．５以下の範囲内（０．２≦ａ≦０．５）、ｂは０より大きく０．３以下の範囲内（０＜ｂ≦０．３）である。
　前記硬質被膜２２において、好適には、前記第１被膜層２４及び第２被膜層２６がそれぞれ予め定められた一定の膜厚（平均膜厚）で形成される。前記第１被膜層２４及び第２被膜層２６それぞれの平均膜厚は、コーティングする部材や被膜の組成等に応じて個別に設定されるが、好適には、前記第１被膜層２４の平均膜厚ｄ１は、０．１～２５．０ｎｍの範囲内で、前記第２被膜層２６の平均膜厚ｄ２は、０．１～７５．０ｎｍの範囲内で、それぞれ適宜定められる。前記第１被膜層２４と前記第２被膜層２６との積層周期ｄ３は、０．２ｎｍ以上１００ｎｍ以下の範囲内である。前記第１被膜層２４及び前記第２被膜層２６の積層数（第１被膜層２４及び第２被膜層２６の層数の合計）は、好適には、４４～６５００の範囲内である。すなわち、前記第１被膜層２４及び前記第２被膜層２６それぞれの層数は、好適には、２２～３２５０の範囲内である。前記硬質被膜２２の総膜厚Ｄは、０．２μｍ以上１０．０μｍ以下の範囲内である。
　図４は、前記硬質被膜２２のコーティング方法の一例を説明する図である。前記ドリル１０等に対する前記硬質被膜２２のコーティングは、例えば図４に示すようなスパッタリング装置３０を用いてコントローラ３６の制御により行われる。好適には、先ず、前処理としてのエッチング工程において、前記スパッタリング装置３０のチャンバ３２内に配置された前記工具基材２０に、バイアス電源３４により負のバイアス電圧が印加される。これにより、正のアルゴンイオンＡｒ+が前記工具基材２０に衝突させられ、その工具基材２０の表面が粗面化させられる。
　次に、スパッタリング工程において、例えば前記硬質被膜２２の第２被膜層２６を構成するＡｌＣｒＳｉ等のターゲット３８に電源４０により負の一定のバイアス電圧（例えば－５０～－６０Ｖ程度）が印加されるとともに、前記バイアス電源３４により工具基材２０に負の一定のバイアス電圧（例えば－１００Ｖ程度）が印加されることにより、アルゴンイオンＡｒ+が前記ターゲット３８に衝突させられ、これによりＡｌＣｒＳｉ等の構成物質が叩き出される。前記チャンバ３２内には、アルゴンガスの他に窒素ガス（Ｎ2）や炭化水素ガス（ＣＨ4、Ｃ2Ｈ2）の反応ガスが所定の流量で導入され、その窒素原子Ｎや炭素原子Ｃが前記ターゲット３８から叩き出されたＡｌＣｒＳｉ等と結合してＡｌＣｒＳｉＮ等となり、前記工具基材２０の表面に前記硬質被膜２２における第２被膜層２６等として付着させられる。或いは、Ａｌ、Ｃｒ、Ｓｉ等の単体それぞれに対応してターゲットを構成し、それら複数のターゲットを用いて同時にスパッタリングを行うことで、ＡｌＣｒＳｉＮ等から成る前記第２被膜層２６を形成するものであってもよい。前記スパッタリング工程においては、前記工具基材２０に正の電圧を印加するようにしてもよい。以上のようにして、前記第１被膜層２４と、前記第２被膜層２６とが交互に前記工具基材２０の表面に付着させられることで、その工具基材２０の表面に前記硬質被膜２２が形成される。
　続いて、本発明の効果を検証するために本発明者等が行った穴空け試験について説明する。図５は、この試験に用いられた本発明品及び試験品の被膜構造と、それぞれの試験結果（加工穴数及び判定）とを、併せて示す図である。本発明者等は、工具径８．３ｍｍφの超硬ドリルに図５に示す各被膜構造及び膜厚の硬質被膜をコーティングして試料である本発明品１～１１及び試験品１～６を作成し、各試験品について以下の切削条件で切削試験を行った。この図５に示す試料のうち、本発明品１～１１が本実施例の硬質被膜２２が適用された本発明品に相当し、試験品１～６が本発明の要件を満たさない（請求項１の要件から外れている）硬質被膜が適用された非発明品に相当する。図５における「Ａ層」、「Ｂ層」は、それぞれ前記第１被膜層２４、第２被膜層２６に対応する。図５に示す加工穴数は、逃げ面摩耗幅０．２ｍｍであるときの穴数であり、合格判定基準は、逃げ面摩耗幅０．２ｍｍであるときの加工穴数が２０穴以上である。
［加工条件］
・工具形状：φ８．３超硬ドリル
・被削材：インコネル（登録商標）７１８
・切削機械：立型Ｍ／Ｃ
・切削速度：１０ｍ／ｍｉｎ
・送り速度：０．１ｍｍ／ｒｅｖ
・加工深さ：３３ｍｍ（止まり）
・ステップ量：ノンステップ
・切削油：油性
　図５に示すように、前記本発明品１～１１は、何れもＡｇから成る第１被膜層（Ａ層）２４と、Ａｌ1-a-bＣｒaＭbの窒化物、酸化物、炭化物、炭窒化物、又は硼化物から成る第２被膜層（Ｂ層）２６とが、交互に２層以上積層した多層膜であり、前記第２被膜層２６に係るＭはＳｉ、Ｖ、Ｗのうち少なくとも１種類を含むものであり、前記第２被膜層２６に係る原子比ａは０．２以上０．５以下の範囲内、ｂは０より大きく０．３以下の範囲内であり、前記第１被膜層２４と前記第２被膜層２６との積層周期ｄ３は０．２ｎｍ以上１００ｎｍ以下の範囲内であり、且つ、総膜厚Ｄは０．２μｍ以上１０．０μｍ以下の範囲内である。すなわち、本発明の請求項１の要件を満たす硬質被膜２２が適用されたものである。図５に示す試験結果から明らかなように、斯かる本実施例の硬質被膜２２が適用された本発明品１～１１においては、何れの試料においても逃げ面摩耗幅０．２ｍｍであるときの加工穴数が２０穴以上となり、合格基準を満たしている。
　特に、前記第２被膜層２６がＡｌＣｒＳｉＮ（組成Ａｌ0.2Ｃｒ0.5Ｓｉ0.3）から成り、前記第１被膜層２４及び第２被膜層２６の平均膜厚が何れも８．５ｎｍ、積層周期が１７．０ｎｍ、層数が６５０、総膜厚が５．５μｍである本発明品５で加工穴数４０、前記第２被膜層２６がＡｌＣｒＳｉＯ（組成Ａｌ0.3Ｃｒ0.5Ｓｉ0.2）から成り、前記第１被膜層２４の平均膜厚が０．５ｎｍ、前記第２被膜層２６の平均膜厚が３．５ｎｍ、積層周期が４．０ｎｍ、層数が１０００、総膜厚が２．０μｍである本発明品８で加工穴数３５、前記第２被膜層２６がＡｌＣｒＷＣＮ（組成Ａｌ0.6Ｃｒ0.3ＳｉＷ0.1）から成り、前記第１被膜層２４の平均膜厚が５．０ｎｍ、前記第２被膜層２６の平均膜厚が１５．０ｎｍ、積層周期が２０．０ｎｍ、層数が３２５、総膜厚が３．２μｍである本発明品３で加工穴数３４、前記第２被膜層２６がＡｌＣｒＳｉＶＷＢ（組成Ａｌ0.5Ｃｒ0.3ＳｉＶＷ0.2）から成り、前記第１被膜層２４の平均膜厚が６．０ｎｍ、前記第２被膜層２６の平均膜厚が３．０ｎｍ、積層周期が９．０ｎｍ、層数が５４５、総膜厚が２．５μｍである本発明品４で加工穴数３２、前記第２被膜層２６がＡｌＣｒＶＮ（組成Ａｌ0.3Ｃｒ0.4Ｖ0.3）から成り、前記第１被膜層２４の平均膜厚が２０．０ｎｍ、前記第２被膜層２６の平均膜厚が４０．０ｎｍ、積層周期が６０．０ｎｍ、層数が４４、総膜厚が１．３μｍである本発明品６で加工穴数３１と、何れも逃げ面摩耗幅０．２ｍｍであるときの加工穴数が３０穴以上となり、とりわけ良好な切削性能を示していることがわかる。
　前記試験品１は、総膜厚が１０．５μｍであり、本発明の請求項１の要件である総膜厚０．２μｍ以上１０．０μｍ以下の範囲を逸脱している。前記試験品２は、総膜厚が０．１５μｍであり、本発明の請求項１の要件である総膜厚０．２μｍ以上１０．０μｍ以下の範囲を逸脱している。前記試験品３は、前記第２被膜層２６がＡｌＣｒＳｉＣ（組成Ａｌ0.6Ｃｒ0.1Ｓｉ0.3）から成るものであり、本発明の請求項１の要件であるＣｒの原子比ａが０．２以上０．５以下である範囲を逸脱している。前記試験品４は、前記第２被膜層２６がＡｌＣｒＶＯ（組成Ａｌ0.4Ｃｒ0.2Ｖ0.4）から成るものであり、本発明の請求項１の要件であるＭ（＝Ｖ）の原子比ｂが０より大きく０．３以下である範囲を逸脱すると共に、積層周期が０．１８ｎｍであり、本発明の請求項１の要件である積層周期０．２ｎｍ以上１００ｎｍ以下の範囲を逸脱している。前記試験品５は、積層周期が１２０．０ｎｍであり、本発明の請求項１の要件である積層周期０．２ｎｍ以上１００ｎｍ以下の範囲を逸脱している。前記試験品６は、前記第２被膜層２６がＡｌＣｒＳｉＣＮ（組成Ａｌ0.5Ｃｒ0.1Ｓｉ0.4）から成るものであり、本発明の請求項１の要件であるＣｒの原子比ａが０．２以上０．５以下である範囲を逸脱している。図５に示す試験結果から明らかなように、これら試験品１～６においては、何れも逃げ面摩耗幅０．２ｍｍであるときの加工穴数が２０未満となり、前記本発明品１～１１と比べて切削性能に劣るものであることがわかる。これは、本発明の請求項１の要件を満たさない硬質被膜では、耐溶着性が十分ではなく、溶着や剥離等により早期寿命に至るためであると考えられる。
　このように、本実施例によれば、Ａｇから成る第１被膜層２４と、Ａｌ1-a-bＣｒaＭbの窒化物、酸化物、炭化物、炭窒化物、又は硼化物から成る第２被膜層２６とが、交互に２層以上積層した多層膜であり、前記第２被膜層２６に係るＭはＳｉ、Ｖ、Ｗのうち少なくとも１種類を含むものであり、前記第２被膜層２６に係る原子比ａは０．２以上０．５以下の範囲内、ｂは０より大きく０．３以下の範囲内であり、前記第１被膜層２４と前記第２被膜層２６との積層周期ｄ３は０．２ｎｍ以上１００ｎｍ以下の範囲内であり、且つ、総膜厚Ｄは０．２μｍ以上１０．０μｍ以下の範囲内であることから、被膜中にＡｇを含有することで摩擦係数及び切削抵抗を軽減させることができ、潤滑性及び耐溶着性に優れると共に高硬度の被膜が得られる。すなわち、優れた耐摩耗性及び耐溶着性を兼ね備えた切削工具用硬質被膜２２を提供することができる。
　本実施例によれば、前記硬質被膜２２が表面に被覆して設けられた超硬被膜被覆切削工具としてのドリル１０であることから、被膜中にＡｇを含有することで摩擦係数及び切削抵抗を軽減させることができ、潤滑性及び耐溶着性に優れると共に高硬度の被膜が得られる。すなわち、優れた耐摩耗性及び耐溶着性を兼ね備えたドリル１０を提供することができる。
　以上、本発明の好適な実施例を図面に基づいて詳細に説明したが、本発明はこれに限定されるものではなく、その趣旨を逸脱しない範囲内において種々の変更が加えられて実施されるものである。
　１０：ドリル（硬質被膜被覆切削工具）、１２：切れ刃、１４：シャンク、１６：ボデー、１８：溝、２０：工具基材、２２：硬質被膜（切削工具用硬質被膜）、２４：第１被膜層、２６：第２被膜層、３０：スパッタリング装置、３２：チャンバ、３４：バイアス電源、３６：コントローラ、３８：ターゲット、４０：電源

Claims (2)

  1. 　切削工具の表面に被覆して設けられる切削工具用硬質被膜であって、
    　Ａｇから成る第１被膜層と、
    　Ａｌ1-a-bＣｒaＭbの窒化物、酸化物、炭化物、炭窒化物、又は硼化物から成る第２被膜層とが、交互に２層以上積層した多層膜であり、
    　前記第２被膜層に係るＭはＳｉ、Ｖ、Ｗのうち少なくとも１種類を含むものであり、
    　前記第２被膜層に係る原子比ａは０．２以上０．５以下の範囲内、ｂは０より大きく０．３以下の範囲内であり、
    　前記第１被膜層と前記第２被膜層との積層周期は０．２ｎｍ以上１００ｎｍ以下の範囲内であり、
    　且つ、総膜厚は０．２μｍ以上１０．０μｍ以下の範囲内である
    　ことを特徴とする切削工具用硬質被膜。
  2. 　請求項１に記載の切削工具用硬質被膜が表面に被覆して設けられた硬質被膜被覆切削工具。
PCT/JP2012/058450 2012-03-29 2012-03-29 切削工具用硬質被膜及び硬質被膜被覆切削工具 WO2013145233A1 (ja)

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