WO2013141580A1

WO2013141580A1 - Extreme ultraviolet light generating device for stabilization and improving energy efficiency through laser beam correction

Info

Publication number: WO2013141580A1
Application number: PCT/KR2013/002253
Authority: WO
Inventors: 임재원; 유부엽; 최종립
Original assignee: 주식회사 에프에스티
Priority date: 2012-03-20
Filing date: 2013-03-19
Publication date: 2013-09-26

Abstract

The present invention relates to an extreme ultraviolet (EUV) light generating device for stabilization and improving energy efficiency through laser beam correction. The EUV plasma generation device according to the present invention includes: a laser source which outputs a laser beam; a correction part correcting a wave front of the laser beam which is output from the laser source; a tunable laser mirror (TLM) once again reflecting the reflected laser beam of which the wave front is corrected in the correction part; a focusing mirror (FM) focusing the laser beam reflected by the TLM; a gas cell which receives the focused laser beam from the FM, receives a reaction gas supplied from a gas supply path, and generates extreme ultraviolet light by forming plasma using the laser beam and the reaction gas with respect to a plasma induction path corresponding to a section at which focus is made; and a vacuum chamber accommodating the TLM, the FM, and the gas cell in a vacuum state. As mentioned above, according to the present invention, the wave front of the laser beam which is output from the laser source through the correction part can be corrected to resultantly provide a stable light source. In addition, it is possible to efficiently output an EUV beam even with a simple structure.

Description

Extreme ultraviolet generator for stabilization and energy efficiency through laser beam compensation

The present invention relates to a stabilized extreme ultraviolet generator through laser beam correction, and more particularly, to an extreme ultraviolet generator capable of generating an ultra-ultraviolet beam with improved efficiency while maximizing the structure.

As the degree of integration of a semiconductor integrated circuit increases, the circuit pattern becomes finer, and the resolution of the exposure apparatus using visible light or ultraviolet rays, which have been conventionally used, is insufficient. In the semiconductor manufacturing process, the resolution of the exposure apparatus is proportional to the numerical aperture (NA) of the transfer optical system and inversely proportional to the wavelength of light used for exposure. For this reason, as an attempt to increase the resolution, an attempt has been made to use an Extreme Ultraviolet (EUV) light source having a short wavelength instead of visible or ultraviolet light for exposure transfer. As the EUV light generating device used in such an exposure transfer device, there are a laser plasma EUV light source and a discharge plasma EUV light source.

The wavelength used in the EUV exposure apparatus is 20 nm or less, and a typical 13.5 nm light source has been widely researched and developed using Ne plasma using Ne gas as a reaction material of a laser plasma light source. It has efficiency (ratio of EUV light intensity obtained with respect to input energy). Since Ne is a gaseous material at room temperature, the problem of debris is difficult. However, in order to obtain a high output EUV light source, there is a limit to using Ne gas as a target, and it is also desired to use other materials.

In the vacuum ultraviolet region where the light wavelength is 200 nm to 10 nm, the region of 200 nm to 100 nm corresponding to half of the long wavelength side is called VUV light and the region of 100 nm to 10 nm corresponding to half of the short wavelength side is generally called EUV light. Separate. EUV light with a center wavelength of less than 100 nm from plasma is absorbed by the optical system such as air or condenser mirror (applied with a general reflective coating), and thus is not absorbed by the optical system. Follow.

In the short wavelength region such as the EUV laser, many unsolved problems such as laser oscillation method, measurement method, and optical material to be used, and the development of the application field is also a future problem. In order to solve the problem that EUV light is extinguished in the air or in the optical system, a vacuum environment (<10 ^-3 torr) below a certain pressure is required and a condensing mirror and a lens coated with a special material should be used.

Therefore, it is necessary to develop an EUV light generator using laser plasma more efficiently by applying such conditions.

Accordingly, the applicant of the present invention, Korean Patent Application No. 10-2011-0017579, name of the invention: when looking at the stabilized extreme ultraviolet light generating apparatus using a plasma through Figure 1, the laser source 10 for outputting a laser, in the laser source The gas cell 20, which generates extreme ultraviolet rays by generating a plasma by a laser and a gas by receiving a gas from a gas supply path to a plasma induction path corresponding to a section in which the output laser is incident and focused. The first vacuum chamber unit 30 which maintains a constant vacuum degree, the second vacuum chamber which maintains a constant vacuum degree as a space for injecting extreme ultraviolet rays generated from the gas cell and emitting the extreme ultraviolet rays to the outside. The unit 40, a gas supply unit for supplying a gas for inducing the laser and the plasma to the gas supply path of the gas cell and the first dust And a first vacuum pump and a second vacuum pump for forming vacuum degrees of the empty chamber portion and the second vacuum chamber portion, respectively, and a plurality of optical systems 71 to 75 transferring light output from the race source.

With the above configuration, the extreme ultraviolet ray generating apparatus corresponds to a very excellent technology capable of generating stabilized extreme ultraviolet ray through the plasma reaction as the invention filed by the present applicant.

However, as the structure is very complicated, the design is difficult and the laser alignment or instrument placement process is complicated. In addition, there is a problem in that the production cost is high because many parts are required according to the complicated structure.

In addition, in the case of the existing extreme ultraviolet generator, the wavefront of the laser beam output from the laser source is often distorted, and there is a need for a system capable of providing a stable and optimal light source.

The present invention for solving the above problems is generated by providing a generator capable of generating stable, energy-efficient ultra-ultraviolet light by correcting the wavefront distortion or shape of the light output from the laser beam as desired. It is an object of the present invention to provide an extreme ultraviolet generator that can simplify the structure of the device as much as possible.

In addition, it is an object of the present invention to provide a stabilized extreme ultraviolet light generating apparatus using a plasma that can minimize the decrease in efficiency and effectively collect the EUV light source generated from the plasma.

The present invention for achieving the above object, a laser source for outputting a laser, a correction unit for correcting the wavefront of the laser beam output from the laser source, the reflected laser beam is corrected wavefront of the laser beam in the correction unit TLM (Tunable Laser Mirror) for reflecting back light, Focusing Mirror (FM) for focusing the laser beam reflected by the TLM, Gas for the plasma induction path corresponding to the section in which the laser beam focused in the FM is focused It comprises a gas cell for receiving the reaction gas from the supply path to form a plasma by the laser beam and the reaction gas to generate extreme ultraviolet rays, and a vacuum chamber for receiving the TLM, FM, gas cells in a vacuum state.

The correction unit includes a DM (Deformable mirror) and a drive unit for controlling the shape deformation of the DM.

In addition, the first aperture is provided for the alignment of the laser beam focused in the FM, and the second aperture for transmitting only the central wavelength in the extreme ultraviolet beam generated in the gas cell.

In addition, the vacuum chamber is divided into a first vacuum chamber portion and a second vacuum chamber portion, the second vacuum chamber portion maintains a higher vacuum than the first vacuum chamber portion, the first vacuum chamber portion, TLM, FM And a gas cell, a first aperture, and the second vacuum chamber portion to receive the second aperture.

The apparatus may further include a beamsplitter for partially reflecting light reflected from the TLM, and an image sensor for detecting a wavefront of the beams reflected through the beamsplitter.

The present invention constructed and operated as described above outputs more effective extreme ultraviolet light by correcting the distortion of the laser beam wavefront output from the laser source through a deformable mirror (DM) configured by a correction unit under conditions for generating EUV light. There is an advantage to this.

In addition, since the structure is very simple, it is easy to manufacture and the cost reduction can be realized, and the beam alignment is very easy by simplifying the optical system structure. There is an advantage that can be stably output of extreme ultraviolet rays.

1 is a configuration diagram of an extreme ultraviolet ray generating apparatus using a plasma according to the prior art,

2 is a configuration diagram of an extreme ultraviolet generator for stabilization and energy efficiency improvement through laser beam correction according to the present invention;

3 is a schematic configuration diagram of a correction unit according to the present invention;

Figure 4 is a detailed view of a stabilized extreme ultraviolet light generating apparatus through laser beam correction according to the present invention.

5 is a configuration diagram of an extreme ultraviolet ray generating apparatus using a simplified plasma structure according to the present invention,

6 is a schematic configuration diagram of an alignment mirror according to the present invention;

7 is a view showing a driving example of an alignment mirror according to the present invention;

Hereinafter, with reference to the accompanying drawings will be described in detail a preferred embodiment of the extreme ultraviolet generating device for stabilization and energy efficiency improvement through laser beam correction according to the present invention.

The extreme ultraviolet generator for stabilization and energy efficiency through laser beam correction according to the present invention, a laser source for outputting a laser, a correction unit for correcting the wavefront of the laser beam output from the laser source, the laser in the correction unit TLM (Tunable Laser Mirror) for reflecting the corrected reflected laser beam back to the wavefront of the beam, Focusing Mirror (FM) for focusing the laser beam reflected from the TLM, and is focused by receiving the laser focused on the FM Receiving the reaction gas from the gas supply path to the plasma induction path corresponding to the section to form a plasma by the laser beam and the reaction gas to generate the extreme ultraviolet rays and the TLM, FM, gas cells to receive the vacuum state It comprises a vacuum chamber.

The extreme ultraviolet generator according to the present invention is stable as a result of correcting the wavefront distortion of the source laser beam for generating the extreme ultraviolet light through the correction unit consisting of DM (Deforable mirror) of the wavefront of the laser beam output from the laser source It is a main technical point of the present invention to provide an extreme ultraviolet light generating device capable of generating highly efficient ultraviolet light and satisfying the efficiency of extreme ultraviolet light while simplifying the structure.

2 is a block diagram of a stabilized extreme ultraviolet light generating apparatus through laser beam correction according to the present invention.

The extreme ultraviolet generator using the plasma according to the present invention includes a laser source 100 for outputting a laser beam, a TLM (Tunable Laser Mirror) 220 for reflecting the laser beam, and a FM (Focusing Mirror) for focusing the reflected laser beam; 230, a gas cell 240 generating extreme ultraviolet light through a plasma reaction, and a vacuum chamber accommodating the TLM, FM, and gas cells.

The laser source 100 is a source source for outputting a laser having an arbitrary wavelength. The laser source 100 generates extreme ultraviolet rays having a wavelength of 50 nm or less through plasma induction of the laser output from the laser source. The source laser beam supplied from the outside to generate the extreme ultraviolet light is an IR laser of 800 nm class, and the source laser may be an IR laser of 800 nm or more. In this case, an IR laser is used, but a pulse width laser of Femto second is used. That is, an IR femtosecond laser should be used, and a pulse width of 50 femto second laser is preferable.

The light output from the laser source first enters the correction unit 210 to correct the wavefront of the output beam. As mentioned above, the correction unit is formed of a deformable mirror (DM). The DM is composed of a shape deformation mirror and a drive unit for controlling the mirror.

3 is a schematic configuration diagram of a correction unit according to the present invention, Figure 4 is a screen showing before and after the laser beam correction according to the present invention. First, in order to measure the laser wavefront, the IR wavefront sensor is used to detect the distortion of the laser wavefront. In addition, the DM corresponds to a configuration capable of transforming the shape of the source laser beam into a beam shape most suitable for processing so that not only the distortion of the beam shape but also the most stable and efficient EUV beam can be generated.

The detected beam shape information calculates a signal to be corrected based on the measured laser wavefront, and controls the shape deformation mirror in the driver. As shown in FIG. 3, the first distorted laser wavefront is corrected.

As shown in FIG. 3, a mirror 211 and a driver 212 are largely configured as an example of a correction unit, and are reflected by the beam splitter 213 and the beam splitter to reflect the beam to measure the wavefront of the incident laser beam. It consists of an image sensor 214 that measures the wavefront of the beam. The image sensor may be, for example, a shack hartmann sensor or a wavefront measurement image sensor. The laser wavefront is detected by the image sensor, and the driver feeds back the detected value to control the DM to output a desired beam shape.

The TLM 220 is a mirror that reflects a laser beam output from a laser source located outside the vacuum chamber. The TLM 220 reflects the incident laser beam disposed on an incident path output from the laser source to the focusing mirror 230 to be described later. At this time, the TLM is reflected such that the angle reflected by the focusing mirror has an angle of incidence of approximately 2 °, that is, the angle of the source beam incident into the focusing mirror is reflected by approximately 2 °.

The FM 230 focuses the incident light for generating extreme ultraviolet light. The laser beam output from the laser source is reflected by the TLM mirror and reflected by the focusing mirror, and the focusing mirror FM focuses the incident laser beam into a gas cell that generates EUV light through plasma induction.

The gas cell is made of a transparent material, preferably made of quartz, a through path through which a laser can pass is formed, and in the center thereof, a plasma induction furnace 330 which is a focal region where a laser output from a laser source is focused. ), An exhaust path 320 is formed at both sides of the plasma induction furnace, and a gas supply path 310 for supplying gas to the plasma induction furnace is connected to the plasma induction furnace.

The gas cell 240 is formed of a transparent material, and a light induction path is formed at both sides, and a plasma induction path is formed at the center to connect the light induction paths. The light reflected by the focusing mirror is focused to be focused on the center portion of the plasma induction furnace and reacts with the reaction gas supplied to the plasma induction furnace to generate EUV light. That is, the plasma induction furnace corresponding to the central portion is focused by focusing the laser output from the laser source, and the external gas supply unit 290 supplies Ne gas through the plasma induction furnace and through the gas supply passage. In addition, exhaust paths are provided on both sides of the plasma induction furnace to exhaust the supplied gas to the outside and maintain the degree of vacuum in the plasma induction furnace. If the gas supplied through the gas supply path is diffused outside the region where the laser focus is focused, smooth plasma induction may not be possible due to the scattering of gas particles. In addition, a constant degree of vacuum should be maintained in the plasma induction furnace. If the constant degree of vacuum cannot be maintained due to various problems of the vacuum system (vacuum chamber sealing, impurities, etc.), this exhaust gas may also be an obstacle to EUV light generation. Maintain gas evacuation and vacuum through the furnace. The exhaust passage exhausts through an external drain pump 291 (a device for evacuating gas).

On the other hand, a vacuum chamber is configured to receive a component for generating extreme ultraviolet light in a vacuum state. The vacuum chamber is divided into a first vacuum chamber 200 region and a second vacuum chamber 210 region.

The first vacuum chamber part 200 is an area in which extreme ultraviolet rays are generated, and the second vacuum chamber part 210 corresponds to an area for stably supplying extreme ultraviolet rays generated in the first vacuum chamber part. In the present invention, the plasma is induced by the laser beam and the gas supplied from the outside to generate the extreme ultraviolet rays, the extreme ultraviolet rays are generated through the gas cell to be described later. At this time, since a gas such as Ne, Xe, He, etc. is supplied into the gas cell from the outside, it is difficult to maintain a constant vacuum degree, and thus, in the chamber where the gas cell is located, EUV light efficiency generated in the gas cell may be reduced. Therefore, the gas cell is positioned in the first vacuum chamber portion maintaining a constant vacuum degree, and EUV light generated in the gas cell is transferred directly to the second vacuum chamber portion having a higher vacuum degree to prevent the efficiency from falling.

The first vacuum chamber part and the second vacuum chamber part are configured with a first vacuum pump 300 and a second vacuum pump 310 to maintain different vacuum degrees, respectively, and to form a lower vacuum degree in the second vacuum chamber. A plurality of vacuum pumps suitable for this can be installed. For example, it consists of Medium Vacuum class vacuum pumps, such as a Cryo pump, a Diffusion Pump, and a Turbo Pump. Vacuum chambers each portion is preferably first the 10 ^-3 torr or less, a second vacuum chamber maintained in a vacuum chamber to a vacuum degree of less than 10 ^-6 torr.

Therefore, the first vacuum chamber is configured to generate extreme ultraviolet light, and the second vacuum chamber is configured to prevent deterioration of efficiency so that the finally generated EUV light is supplied to the application. At this time, the vacuum chamber is divided into a partition formed by forming a partition in one chamber, the partition is composed of a small tube of about 1mm so that the extreme ultraviolet rays generated in the gas cell can be transmitted through the first vacuum chamber through The beam passes through to the second vacuum chamber.

On the other hand, it is installed in the optical path reflected from the TLM for wave front detection of the light output through the laser source, and the amount of incident light can react to a predetermined amount (a wavefront image sensor (Shack hartmann sensor) can react). The light reflected by the beam splitter further includes a beam splitter 270 for reflecting, and is configured to detect a wavefront of incident light in an image sensor 280 (Shack hartmann sensor) installed outside the vacuum chamber.

Figure 4 is a detailed view of a stabilized extreme ultraviolet light generating apparatus through laser beam correction according to the present invention. In the gas cell in which the extreme ultraviolet light is generated through plasma induction, a gas supply path is formed to communicate with the outside to supply gas to the plasma induction path, and a gas exhaust path communicating with the light induction path is provided at both sides of the gas supply path. Formed. Therefore, the gas supply passage is connected to the external gas supply unit 290 to supply the reaction gas required for the plasma reaction, and the gas exhaust passage is connected to the external drain pump 291 (a device for exhausting the gas) to react. It is configured to exhaust the gas afterwards.

5 illustrates another embodiment of the present invention.

The extreme ultraviolet generator according to the present invention includes a race source 100 for outputting an infrared laser, a pinhole for passing only the center wavelength of the light output from the laser source, a TLM (Tunable Laser Mirror; 211) for reflecting light passing through the pinhole, An alignment mirror 221 for aligning the direction of the light reflected by the TLM, a focusing mirror (FM) for focusing the light reflected by the alignment mirror, and a gas cell 240 generating extreme ultraviolet light through a plasma reaction. And a vacuum chamber accommodating the TLM, alignment mirror, FM, and gas cells.

The laser source 100 is a source source for outputting an infrared laser having an arbitrary wavelength. The laser source 100 generates extreme ultraviolet rays having a wavelength of 20 nm or less through plasma induction of the laser output from the laser source. In the present invention, it is preferable to use a femtosencond laser source having a pulse width of 100 fs or less as an example. As a detailed specification, a titanium sapphire amplified laser system is used as a medium. It is preferable to have a pulse width of 25 fs to 60 fs and IR wave 800 nm to 1600 nm. However, as the laser energy increases to 5mj 6mj, the EUV generating power also increases. In addition, the center wavelength is preferably 800 nm, but in some cases, the center wavelength may be changed to 1600 nm long.

The pinhole passes only the light of the center wavelength in the output light from the infrared laser source and spatially removes the remaining outer light so that the laser beam can pass.

The light passing through the pinhole is incident to the TLM (Tunable Laser Mirror) 211. The TLM is a mirror that reflects a laser beam output from a laser source located outside the vacuum chamber. The TLM reflects a laser beam disposed on an incident path output from the laser source to a focusing mirror 230 to be described later.

The focusing mirror 230 focuses and reflects incident light for generating extreme ultraviolet light. The laser beam output from the laser source is reflected by the TLM, and then the beam direction is accurately aligned through the alignment mirror 221, and then reflected by the focusing mirror. The focusing mirror FM focuses the incident laser beam to guide the plasma. Focusing on the gas cell to generate the EUV light through.

Figure 6 is a schematic configuration diagram of an alignment mirror according to the present invention, Figure 7 is a view showing a driving example of the alignment mirror according to the present invention. As shown in the alignment mirror, the alignment mirror is positioned in a structure in which vertical rotation and horizontal rotation can be implemented. The alignment mirror controls the vertical driving and the horizontal driving by the driving motor (unsigned) and controls the direction of the reflected beam. In this case, the driving motor is precisely controlled by the control unit 241 for controlling it, and the beam reflected through the alignment mirror is measured through measuring means (eg, an image sensor, etc.) for checking the position of the beam on the optical path. Detect and control the beam direction. In FIG. 8, (a) illustrates a horizontally rotated state of the alignment mirror, and (b) illustrates a vertically rotated state. Therefore, the position of the beam can be accurately aligned by automatically controlling the alignment mirror 221.

Gas cell 240 is a means for generating extreme ultraviolet light through a plasma reaction, the configuration is made of a transparent material, preferably made of quartz to form a through passage through which a laser can pass, the center of the A plasma induction furnace, which is a focal region in which a laser output from a laser source is focused, is provided, and exhaust paths are formed at both sides of the plasma induction furnace, and a gas supply path for supplying gas to the plasma induction furnace is a plasma induction furnace. Connected with

The gas cell 240 is formed of a transparent material, and a light induction path is formed at both sides, and a plasma induction path is formed at the center to connect the light induction paths. The light reflected by the focusing mirror is focused to be focused on the center portion of the plasma induction furnace and reacts with the reaction gas supplied to the plasma induction furnace to generate EUV light. That is, the plasma induction furnace corresponding to the center portion is focused by focusing the laser output from the laser source, and the external gas supply unit 270 supplies Ne gas through the plasma induction furnace and through the gas supply passage. In addition, exhaust paths are provided on both sides of the plasma induction furnace to exhaust the supplied gas to the outside and maintain the degree of vacuum in the plasma induction furnace. If the gas supplied through the gas supply path is diffused outside the region where the laser focus is focused, smooth plasma induction may not be possible due to the scattering of gas particles. In addition, although a constant degree of vacuum is maintained in the plasma induction furnace, if the constant degree of vacuum cannot be maintained due to various problems of the vacuum system (vacuum chamber sealing, impurities, etc.), this exhaust gas may also be an obstacle to EUV light generation. Maintain gas evacuation and vacuum through the furnace. The exhaust passage exhausts through an external drain pump 291 (a device for evacuating gas).

The first vacuum chamber part 200 is an area in which extreme ultraviolet rays are generated, and the second vacuum chamber part 201 corresponds to an area for stably supplying extreme ultraviolet rays generated in the first vacuum chamber part. In the present invention, the plasma is induced by the laser beam and the gas supplied from the outside to generate the extreme ultraviolet rays, the extreme ultraviolet rays are generated through the gas cell to be described later. In this case, since a gas such as Ne, Xe, He, etc. is supplied into the gas cell from the outside, it is difficult to maintain a constant vacuum degree, and thus, in the chamber in which the gas cell is located, EUV light efficiency generated in the gas cell may decrease. Therefore, the gas cell is located in the first vacuum chamber portion which maintains a constant vacuum degree, and EUV light generated in the gas cell is transferred directly to the second vacuum chamber portion having a lower vacuum degree to prevent the efficiency from falling.

The first vacuum chamber part and the second vacuum chamber part are configured with a first vacuum pump 300 and a second vacuum pump 310 to maintain different vacuum degrees, respectively, and to form a lower vacuum degree in the second vacuum chamber. A plurality of vacuum pumps suitable for this can be installed. For example, it consists of Medium Vacuum class vacuum pumps such as Cryo pump, Diffusion Pump, Turbo Pump and Ion pump. Vacuum chambers each portion is preferably first the 10 ^-3 torr or less, a second vacuum chamber maintained in a vacuum chamber to a vacuum degree of less than 10 ^-6 torr.

Therefore, the first vacuum chamber is configured to generate extreme ultraviolet light, and the second vacuum chamber is configured to prevent deterioration of efficiency so that the final light is supplied to the application. At this time, the vacuum chamber is divided into partitions formed by forming a partition in one chamber, and the partition wall and the partition wall is connected to a long pipe having a hole of about 1mm or less through which the extreme ultraviolet rays generated in the gas cell can pass. It is configured to maintain the degree of vacuum in each chamber.

The present invention configured as described above improves the wavefront of the source beam through a compensator composed of a deformable mirror, changes the shape of the beam so that the desired EUV beam is generated as much as possible, and changes the shape of the source beam so that the EUV beam is generated as much as possible. By increasing the efficiency as possible, the overall structure of the optical system is very simplified, there is an advantage that easy light alignment and cost reduction can be realized.

As described above and illustrated with reference to a preferred embodiment for illustrating the principles of the invention, the invention is not limited to the configuration and operation as shown and described as such. Rather, it will be apparent to those skilled in the art that many changes and modifications to the present invention are possible without departing from the spirit and scope of the appended claims. Accordingly, all such suitable changes and modifications and equivalents should be considered to be within the scope of the present invention.

Claims

A laser source for outputting a laser;

A correction unit for correcting a wavefront of the laser beam output from the laser source;

A TLM (Tunable Laser Mirror) for reflecting the reflected laser beam whose wavefront of the laser beam is corrected in the corrector;

Focusing Mirror (FM) for focusing the laser beam reflected from the TLM;

A gas cell generating extreme ultraviolet rays by receiving a reaction gas from a gas supply path to a plasma induction furnace corresponding to a section in which the laser focused in the FM is focused and generating plasma by a laser beam and the reaction gas; And

And a vacuum chamber accommodating the TLM, FM, and gas cells in a vacuum state. The extreme ultraviolet generator for stabilization and energy efficiency improvement through laser beam correction.
The method of claim 1, wherein the correction unit,

An apparatus for generating extreme ultraviolet rays for stabilization and energy efficiency through laser beam correction, comprising a DM (Deformable mirror) and a driving unit for controlling the shape deformation of the DM.
The method of claim 1,

Stabilization through laser beam correction including a first aperture lens for transmitting the laser beam focused in the FM and a second aperture lens for transmitting the extreme ultraviolet beam generated in the gas cell to the outside of the vacuum chamber; Extreme ultraviolet generator for energy efficiency.
The method of claim 3, wherein the vacuum chamber,

The first vacuum chamber portion is divided into a second vacuum chamber portion, wherein the second vacuum chamber portion maintains a higher vacuum than the first vacuum chamber portion, the first vacuum chamber portion, TLM, FM, gas cell, first upper To accommodate the lens,

The second vacuum chamber unit is configured to receive the second aperture is extreme ultraviolet ray generating device for stabilization and energy efficiency through the laser beam correction.
The method of claim 1,

A beam splitter for partially reflecting the light reflected by the TLM; and

And an image sensor detecting a wavefront of a beam reflected through the beam splitter. The extreme ultraviolet generator for stabilization and energy efficiency improvement through laser beam correction.
A laser source for outputting an infrared femtosecond laser;

Tunable Laser Mirror (TLM) for reflecting the laser beam output from the laser source;

An alignment mirror for aligning the beam reflected from the TLM;

Focusing Mirror (FM) for focusing the laser beam reflected from the alignment mirror;

A gas cell generating extreme ultraviolet rays by receiving a reaction gas from a gas supply path to a plasma induction furnace corresponding to a section in which the laser focused in the FM is focused and generating plasma by a laser beam and the reaction gas;

A vacuum chamber accommodating the TLM, alignment mirror, FM, and gas cells in a vacuum state; And

And a controller configured to control the alignment mirror to control the direction of the traveling light.
The method of claim 6,

And a pinhole is provided inside the vacuum chamber so that only the beam in the center region of the beam output from the laser source passes, through which the beam output to the laser source passes.
The method of claim 6,

The gas supplied to the gas cell is an extreme ultraviolet generator for implementing the beam alignment, characterized in that the Ne gas.
The method of claim 6, wherein the laser source,

Extreme ultraviolet generator that implements beam alignment with IR wave length 800nm ~ 1600nm, pulse width 45fs ~ 60fs.
The method of claim 6, wherein the vacuum chamber,

Divided into a first vacuum chamber portion and a second vacuum chamber portion,

The second vacuum chamber portion maintains a higher vacuum than the first vacuum chamber portion,

The first vacuum chamber unit, accommodates the TLM, alignment mirror, FM, gas cell,

And the second vacuum chamber unit provides a vacuum space for outputting EUV light generated from the gas cell to the outside.