WO2013117130A1 - Écran tactile capacitif intégré de non-rodage sans couche d'électrode métallique et son procédé de fabrication - Google Patents

Écran tactile capacitif intégré de non-rodage sans couche d'électrode métallique et son procédé de fabrication Download PDF

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Publication number
WO2013117130A1
WO2013117130A1 PCT/CN2013/070866 CN2013070866W WO2013117130A1 WO 2013117130 A1 WO2013117130 A1 WO 2013117130A1 CN 2013070866 W CN2013070866 W CN 2013070866W WO 2013117130 A1 WO2013117130 A1 WO 2013117130A1
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Prior art keywords
electrode
ito
touch screen
layer
thickness
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PCT/CN2013/070866
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English (en)
Chinese (zh)
Inventor
曹晓星
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深圳市宝明科技股份有限公司
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Publication of WO2013117130A1 publication Critical patent/WO2013117130A1/fr

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Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Definitions

  • the present invention relates to the field of capacitive touch screen technologies, and in particular, to a non-lapped integrated capacitive touch screen without a metal electrode layer and a method of fabricating the same. Background technique
  • touch screens With the development of electronic technology, keyboards or mice for mobile phones, digital cameras, handheld game consoles, car DVDs, MP3s, instrumentation, etc. are gradually being replaced by touch screens.
  • the products of touch screens were not very hot a few years ago, and with the increasing contact with touch screen products, they have been recognized by more people in the past two years, and the speed of development has gradually accelerated.
  • the rapid growth of the touch screen has not only stimulated more intense industry competition, but also indirectly promoted the development of technology. Its multi-touch operation method has increased the influence of touch screen products to a new height, and has gradually been adopted by people. Concerned.
  • the touch screen is mainly composed of a touch detecting component and a touch screen controller.
  • the touch detecting component is installed in front of the display screen for detecting the touch position of the user, and is sent to the touch screen controller after receiving; and the main function of the touch screen controller is to receive from the touch point detecting device. Touch the information, convert it to the contact coordinates, and send it to the CPU. It can also receive commands from the CPU and execute them.
  • the touch screen can be divided into four types: resistive type, capacitive sensing type, infrared type and surface acoustic wave type.
  • resistive type capacitive sensing type
  • infrared type infrared type
  • surface acoustic wave type Currently, a resistive touch screen is widely used, which uses pressure sensing. Resistively controlled; Resistive touch screen is a multi-layer composite film, the main part of which is a resistive film screen that closely matches the surface of the display.
  • the resistive film screen is a layer of glass or hard plastic plate as a base layer coated with a transparent oxidized metal (transparent conductive resistor) ITO (Indium Tin Oxide) conductive layer, which is covered with an outer surface hardened smooth anti-scratch
  • ITO Indium Tin Oxide
  • the plastic layer whose inner surface is also coated with an ITO coating, has a number of small (less than 1/1000 inch) transparent isolation points between them to insulate the two conductive layers, when the finger touches the screen, two
  • the layer conductive layer has contact at the touch point position, the resistance changes, and a signal is generated in both X and Y directions, and then sent to the touch screen controller, and the controller detects the contact and calculates (X, Y) Position, then operate according to the way the mouse is simulated.
  • the basic principle of the capacitive touch screen is to use the current sensing of the human body.
  • the capacitive touch screen is a two-layer composite glass screen.
  • the inner surface of the glass screen is coated with a bismuth (indium tin oxide) conductive film (coated conductive glass).
  • the outer layer is a thin layer of bauxite glass protective layer, the ⁇ coating is used as the working surface, and four electrodes are led out at the four corners.
  • the capacitor is a direct conductor, so the finger sucks a small current from the contact point, which flows out from the electrodes on the four corners of the touch screen, and the current flowing through the four electrodes and the fingers to the four corners In proportion to the distance, the controller calculates the position of the touch point by accurately calculating the ratio of the four currents.
  • the projected capacitive touch screen is a widely used one, which has the characteristics of simple structure and high light transmittance.
  • a touch sensing component of a projected capacitive touch screen typically has a plurality of row and column electrodes staggered to form an inductive matrix.
  • the commonly used design method includes disposing the row electrode and the column electrode on both sides of the same transparent substrate to prevent short circuit at the staggered position; or disposing the row electrode and the column electrode on the same side of the same transparent substrate to form the same conductive film ( Generally, it is an ITO conductive film), and the row electrode and the column electrode are separated by providing an insulating layer at a position where the row electrode and the column electrode are staggered, and the row electrode and the column electrode are separated to ensure conduction in respective directions, which is effective. Prevent it from shorting in the staggered position.
  • a commonly adopted design is: one of the row electrodes or the column electrodes is continuously disposed on the conductive film, and the other electrode is disposed on the conductive film at intervals of electrodes arranged in a plurality of electrode blocks, and the conductive bridge is disposed at the position of the staggered point.
  • the adjacent electrode blocks are electrically connected to form a continuous electrode in the other direction; the conductive bridge is separated from the continuously disposed electrodes by an insulating layer, thereby effectively preventing the row electrode and the column electrode from being short-circuited at the staggered point.
  • the commonly adopted design scheme is as follows: (1) The laminated structure is a transparent substrate, a first direction electrode, an insulating layer, and a conductive bridge; or (2) the laminated structure is a transparent substrate, a conductive bridge, an insulating layer, and a first direction electrode.
  • the capacitive touch screen adopting the traditional design scheme may have the defects of low light transmittance and poor working stability.
  • the transmittance of the capacitive touch screen of the conventional design scheme is difficult to break through 80%, and the whole force is bent and deformed easily. Separation occurs at the interface, causing the electrode to open the touch to fail and the touch sensing component to be damaged.
  • One of the objectives of the present invention is to provide a non-lapped integrated capacitive touch screen without a metal electrode layer, which can effectively reduce the production cost and improve the reliability of the capacitive touch screen by rationally designing the laminated structure and the conduction mode of the capacitive touch screen. Sex, work stability.
  • the present invention adopts the following technical solutions:
  • a non-lapped integrated capacitive touch screen without a metal electrode layer comprising a transparent substrate, a black resin layer, an ITO electrode and an insulating layer laminated on the transparent substrate in sequence; wherein the ITO electrode is a horizontal or vertical conduction electrode;
  • the ITO electrode is composed of an ITO conductive electrode 1 and an ITO conductive electrode 2, and the ITO conductive electrode 1 and the ITO conductive electrode 2 are on the same layer, independent of each other, insulated from each other, and staggered;
  • the transparent substrate includes In the window area and non-window area, the black resin layer is distributed in the non-window area of the display.
  • the non-lap-on integrated touch screen is simplified in structure and production process, reducing the bridge or through-hole process required for the traditional lap-type integrated capacitive screen, reducing production costs and shortening process time .
  • the touch mode that can be realized by the non-lap-on integrated touch screen is single-touch and gesture recognition, and the lap-connected integrated (cross-bridge and through-hole) can achieve multi-touch (two or more points) and Gesture Recognition.
  • the non-lapped integrated capacitive touch screen and the non-lapped integrated touch screen without metal electrode layer are simplified in structure and production process, eliminating metal electrodes, reducing material cost, reducing the production process, and the touch function. Single touch and gesture recognition are available on both.
  • the maximum value of the conductive surface resistance of the ⁇ is much smaller than that of the non-lapped integrated touch screen.
  • the transparent substrate is a chemically strengthened glass substrate or a resin material substrate having a thickness of between 0.5 and 2.0 mm; the regular structure of the ITO electrode is triangular, or strip-shaped, or elliptical.
  • the black resin region has a trapezoidal structure with an intermediate thickness of 0.3um ⁇ 5um, and the edge bevel angle is between 6 and 60 degrees, and the angle is gentle.
  • the purpose is that the ITO electrode (ITO conduction electrode 1 and ITO conduction electrode 2) pass through the slope.
  • the ITO electrode is not broken due to a large difference in thickness.
  • the black resin layer can effectively block non- The visible area of the layer can be shaded, visible under the product such as wires.
  • the insulating layer protects the ITO electrode from being insulated from air.
  • a second object of the present invention is to provide a method for manufacturing a non-overlap integrated capacitive touch screen, which adopts the following technical solutions:
  • the black resin is uniformly coated on a transparent substrate by a spin coating method or a doctor coating method, and the coating thickness is 0.3 um to 5 um, and is pre-baked, exposed, and developed by a heater to form a black resin.
  • the desired black resin area; the black resin area has a trapezoidal structure with an intermediate thickness of
  • the edge bevel angle is between 6 ⁇ 60 degrees, and the angle is gentle.
  • the purpose is that the ITO electrode (ITO conduction electrode 1 and ITO conduction electrode 2) will not break due to the thickness difference when the ITO electrode passes through the slope.
  • the black resin area is a non-window area of the display screen, and the purpose is to block the visible object underneath; the black resin is a photosensitive protective layer photoresist (commercially produced by Taiwan Everlight Chemical Institute EK410), which is a black negative photoresist material.
  • a transparent substrate forming a black resin layer is subjected to ITO coating to form a transparent and uniform thickness ITO film layer on the glass substrate, the thickness of which is 80 to 2000 angstroms (face resistance is 10 to 270 ohms); after ITO coating
  • the transparent substrate is coated on the surface of the ITO with a uniform thickness of the positive photoresist material, and the photoresist coating thickness is lum ⁇ 5um;
  • a thickness of 80 to 2000 angstroms (face resistance of 10 to 270 ohms) and a regular ITO pattern or electrode are formed;
  • the ITO electrode is a horizontal or vertical conduction electrode and has a regular pattern structure; the ITO electrode is composed of an ITO conduction electrode 1 and an ITO conduction electrode 2, and the ITO conduction electrode 1 and the ITO conduction electrode 2 are on the same level. , independent of each other, insulated from each other, staggered design;
  • the transparent substrate after the ITO electrode is coated with a uniform thickness of the negative photoresist material on the surface of the metal film, and the photoresist coating thickness is 0.5 um ⁇ 3 um;
  • the ITO is composed of In203 and Sn02, and the mass ratio thereof is 85 to 95: 5 to 15.
  • the ITO coating method can be vacuum magnetron sputtering, chemical vapor deposition, thermal evaporation, or sol gel.
  • the main component of the positive photoresist material is propylene glycol monomethyl ether acetate, epoxy resin and positive photosensitive agent (trade name is TR400 produced by Taiwan New Materials Co., Ltd.); the main component of negative photoresist material is acetic acid Propylene glycol monomethyl ether ester, acrylic resin, epoxy resin and negative photosensitive agent (trade name: Taiwan Daxing Co., Ltd. POC A46) Coating photoresist materials are roller coating, spin coating, scraping and other methods.
  • the present invention has the following advantages and beneficial effects:
  • the invention realizes the touch function signal electrode and the black resin covering layer on a transparent substrate by reasonably setting the laminated structure, thereby greatly improving the yield of the product, reducing the cost, and improving the reliability of the product.
  • the thickness of the substrate is between 0.5mm and 2.0mm, and has the advantages of thin thickness and light weight; and the reasonable design of each layer makes the product reliability stable and the product yield is high.
  • the non-lapped integrated capacitive touch screen and the non-lapped integrated touch screen without the metal electrode layer are simplified in structure and production process, the metal electrode is eliminated, the material cost is reduced, and the production process is reduced.
  • Single touch and gesture recognition are available on the touch function.
  • FIG. 1 is a schematic structural view of a capacitive touch screen according to the present invention.
  • FIG. 2 is a schematic structural view of a glass substrate according to an embodiment of the present invention.
  • Figure 3 is a partial enlarged structural view
  • Figure 4 is a schematic cross-sectional structure
  • Fig. 5 is a cross-sectional view showing the structure of a metal-free electrode layer non-overlap integrated capacitive touch panel according to the present invention. detailed description
  • the non-lapped integrated capacitive touch screen capacitive touch screen of the metal-free electrode layer comprises a chemically strengthened glass substrate or a resin material substrate having a thickness of between 0.5 mm and 2.0 mm.
  • the black resin layer 12, the ITO electrode 13, and the insulating layer 14 are sequentially laminated on the transparent substrate; the ITO electrode is a horizontal or vertical conduction electrode, and has a regular pattern structure; the ITO electrode is an ITO conduction electrode 1 and
  • the ITO conduction electrode 2 is composed of the ITO conduction electrode 1 and the ITO conduction electrode 2 on the same layer, independent of each other, insulated from each other, and staggered.
  • the transparent substrate includes a window area and a non-window area, and the black resin layer is distributed in the non-window area of the display screen.
  • the black resin layer effectively blocks the layers in the non-visible area, and can be shielded from visible objects under the product such as wires and wires.
  • FIG. 3 to FIG. 5 are schematic diagrams showing a partial structure or a cross-sectional structure of the capacitive touch screen according to the embodiment: the ITO electrode 13 includes an ITO conductive electrode 1 42 and an ITO conductive electrode 2 43; and the insulating layer 45 protects the ITO conductive layer.
  • the edges of the through electrode 1 42 and the ITO via electrode 2 43 are routed to be insulated from the air.
  • the preparation process is as follows:
  • the black resin is uniformly coated on a transparent substrate by a spin coating method or a doctor coating method, and the coating thickness is 0.3 um to 5 um, and is pre-baked, exposed, and developed by a heater to form a black resin.
  • the black resin is uniformly coated on the transparent glass substrate 41 ( 11 ) by a spin coating method or a doctor coating method, and the coating thickness is 0.3 um to 5 ⁇ m, and is pre-baked, exposed, and developed by a heater to form a black resin.
  • the black resin area is required; the black resin area has a trapezoidal structure with an intermediate thickness of 0.3um ⁇ 5um, and the edge bevel angle is between 6 ⁇ 60 degrees, and the angle is gentle.
  • the purpose is ITO electrode (ITO conduction electrode 1 and ITO conduction) When the electrode 2) passes through the slope, the ITO electrode is not broken due to the large difference in thickness.
  • the black resin area is a non-window area of the display screen, and the purpose is to block the metal electrode;
  • the pre-baking temperature and time range are: 60 degrees to 150 degrees, 50 seconds to 200 seconds, the exposure energy is from lOOmj to 500mj, the developer is Na-based or Ka-based alkaline solution, and the developing temperature is operated at a constant temperature of 20 to 40 degrees.
  • Hard baked through the black resin layer the condition is 200 degrees to 300 degrees, the time is half an hour to 3 small
  • a black resin layer 51 having a thickness of 0.3 um to 5 um and having a regular pattern is finally formed.
  • a transparent substrate forming a black resin layer is formed by ITO coating to form a transparent and uniform thickness ITO film layer having a thickness of 80 to 2000 angstroms (face resistance is 10 to 270 ohms); ITO material is composed of In203 It is composed of Sn02 and its mass ratio is 85 ⁇ 95: 5 ⁇ 15.
  • the ITO coating methods include vacuum magnetron sputtering, chemical vapor deposition, thermal evaporation, and sol gel.
  • the ITO coated glass substrate is coated with a uniform thickness of positive photoresist material on the surface of the ITO.
  • the main component of the positive photoresist material is propylene glycol monomethyl ether acetate, epoxy resin and photosensitive material;
  • the thickness of the cloth is lum ⁇ 5um. Coating photoresist materials are by roller coating, spin coating, and scraping.
  • the product is pre-baked, exposed, developed, etched, and stripped to a thickness of 80 to 2000 angstroms (face resistance of 10 to 270 ohms) and a regular ITO pattern or electrode.
  • the pre-bake temperature and time range is from 60 degrees to 150 degrees, from 50 seconds to 200 seconds, and the exposure energy is from lOOmj to 500mj.
  • the developer is made of Na-based or Ka-based alkaline solution, and the developing temperature is operated at a constant temperature of 20 to 40 degrees.
  • the ITO etching solution is a mixture of hydrochloric acid and nitric acid in a certain ratio, so that the pH of the acid falls between 1 and 3, and the etching temperature is between 40 and 50 degrees.
  • the photo-resist film solution is prepared by mixing dimethyl sulfoxide and ethanolamine in a certain ratio, the percentage is 70%: 30%, and the release temperature is between 40 and 80 degrees.
  • the ITO electrode is a horizontal or vertical conduction electrode and has a regular pattern structure; the ITO electrode is composed of an ITO conduction electrode 1 and an ITO conduction electrode 2, and the ITO conduction electrode 1 and the ITO conduction electrode 2 are on the same level. , independent of each other, insulated from each other, staggered design.
  • the glass substrate after passing through the ITO electrode is coated with a uniform thickness of negative photoresist material on the surface of the metal film.
  • the main components of the negative photoresist material are propylene glycol monomethyl ether acetate, acrylic resin, epoxy resin and negative photosensitive agent; the photoresist coating thickness is 0.5um ⁇ 3um.
  • the method of applying the negative photoresist material is spin coating, scraping, and the like.
  • the product is pre-baked, exposed, and developed by photoresist, and finally forms a pattern of a thickness of 0.5 to 3 um and a regular insulating layer.
  • Pre-bake temperature and time range: 60 degrees to 150 degrees, 50 seconds to 200 seconds, The exposure energy is from 100m to 500mj, the developer is Na-based or Ka-based alkaline solution, and the development temperature is operated at a constant temperature of 20 to 40 degrees. After hard baking through the insulating layer, the condition is 200 to 300 degrees, and the time is 0.5 hours to 3 hours. After the above process, a second insulating layer having a thickness of 0.5 um to 3 um and a regular pattern is finally formed.
  • the non-lapped integrated capacitive touch screen and the non-lapped integrated touch screen without metal electrode layer are simplified in structure and production process, eliminating metal electrodes, reducing material cost, reducing the production process, and the touch function. Single touch and gesture recognition are available on both.
  • the maximum value of the ITO conductive surface resistance is much smaller than that of the non-lapped integrated touch screen ITO surface resistance.

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)

Abstract

La présente invention concerne un écran tactile capacitif intégré de non-rodage sans couche d'électrode métallique et son procédé de fabrication. L'écran tactile capacitif intégré de non-rodage sans couche d'électrode métallique comprend un substrat transparent, une couche de résine noire, une électrode en oxyde d'indium-étain (ITO) et une couche isolante qui sont successivement stratifiées sur le substrat transparent; l'électrode ITO est une électrode à conduction horizontale ou une électrode à conduction verticale et a une structure graphique régulière; l'électrode ITO est composée d'une électrode 1 de conduction ITO et d'une électrode 2 de conduction ITO et l'électrode 1 de conduction ITO et l'électrode 2 de conduction ITO étant agencées sur la même surface de couche, sont indépendantes l'une de l'autre, isolées l'une de l'autre et dans un mode de conception en quinconce; le substrat transparent comprend une zone de fenêtre et une zone de non-fenêtre, et la couche de résine noire est répartie dans la zone de non-fenêtre d'un écran d'affichage. La conception raisonnable du mode de conduction et la structure de la couche de l'écran tactile capacitif réduit efficacement le coût de production, et la fiabilité et la stabilité de travail de l'écran tactile capacitif sont améliorées de manière efficace.
PCT/CN2013/070866 2012-02-09 2013-01-23 Écran tactile capacitif intégré de non-rodage sans couche d'électrode métallique et son procédé de fabrication WO2013117130A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201210028557.7 2012-02-09
CN201210028557.7A CN102541383B (zh) 2012-02-09 2012-02-09 无金属电极层非搭接一体式电容触摸屏及其制造方法

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CN102830880A (zh) * 2012-08-21 2012-12-19 深圳市宝明科技股份有限公司 新型ito层非搭接一体式电容触摸屏及其制造方法
CN102955615B (zh) * 2012-11-09 2016-04-06 北京京东方光电科技有限公司 一种触摸屏、触控显示装置及一种触摸屏的制造方法
CN103926809B (zh) * 2014-03-24 2016-08-17 京东方科技集团股份有限公司 一种基板的制备方法
CN104716144B (zh) * 2015-03-06 2018-02-16 京东方科技集团股份有限公司 阵列基板及其制作方法、显示装置
CN111952246A (zh) * 2020-08-19 2020-11-17 惠科股份有限公司 阵列基板的制造方法
CN112078266B (zh) * 2020-09-16 2022-05-06 台州星星光电科技有限公司 一种3d表盖的表面一体黑的加工方法

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