200941323 九、發明說明： 【發明所屬之技術領域】 本發明係關於一種觸控面板之感測結構，特別是關於 一種電容式觸控面板的二維感測結構。 【先前技術】 目前的各式電子裝置已廣泛應用觸控技術作為其輸入 方式，藉此，使用只要以手指或觸控筆輕壓顯示器面板， Φ 即可閱讀資訊或進行資訊的傳輸，可省去傳統電子裝置上 必須配置的按鈕、鍵盤或滑桿。 觸控面板依其感應原理的不同主要可分為電阻式、電 容式、紅外線式以及超音波式等，其中紅外線式與超音波 式觸控面板係於螢幕之X轴及γ軸之一側設置紅外線或超 音波的發射源，並在另一侧安裝接收源，當使用者接觸螢 幕時，紅外線或超音波的運動即受到干擾，經由測量與確 認受干擾的位置座標即完成觸控輸入。電阻式觸控面板係 由上下兩組ITO (氧化銦錫）導電薄膜疊合而成，利用壓力 ® 而使上下電極導通後，經由控制器測知面板的電壓變化而 計算接觸點位置以進行輸入。至於電容式觸控面板則由表 面鍍製有氧化金屬之透明玻璃所構成，其感測結構一般係 由分別電連接於X軸方向與y軸方向之兩電極層所組成， 兩電極層之間則具有一絕緣層（Insulating Spacer )，由其四 個角落提供電壓並於玻璃表面形成均勻電場，利用使用者 手指與電場之間的靜電反應所產生的電容變化來檢測輸入 座標。 由於習知電容式觸控面板的感測結構具有較複雜的多 200941323 層結構設計，在整體製作上需要包括多次圖樣化 (Patterning)、蝕刻（Etching)、剝離（Uft-Off)、去光阻 等五至十層的製作程序，且於製程中需使用兩塊以上的基 板以及一至三層的全面性絕緣層，不符目前電子裝置尺寸 輕薄短小之發展趨勢。此外，由於上述電容式感測結構係 以IT0作為上下導電電極，其阻值較高，亦有導電性不佳 進而影響感測靈敏度之虞。 職是之故，申請人經悉心試驗與研究，並一本鍥而不 φ 捨之精神’提出本案「觸控面板之感測結構及觸控面板」。 藉由本發明，可減少絕緣層材料之使用、降低觸控面板的 厚度’亦可減少所需基板數量、並進一步簡化觸控面板之 感測結構以及其整體製作程序；此外，本發明更具有低製 作成本之優勢。 【發明内容】 上述構想可藉由本發明而實現。 ® 本發明之一第一構想在於提供一種電容式觸控面板之 二雉感測結構，其係形成於一基板之一第一表面上；該二 維感測結構係由一第一電極層、一絕緣層與一第二電極層 所構成，該第一電極層係位於該第一表面上且包括複數第 /感測單元，該絕緣層係位於該第一電極層上且包括複數 絕緣單元’而該第二電極層係位於該絕緣層上且包括複數 第二感測單元；其中該等第一感測單元係彼此電連接於一 第一方向，而該等第二感測單元係彼此電連接於與該第一 方甸不同之一第二方向且分別具有與該等複數單元相同的 200941323 形狀。 在一較佳實施例中，該二維感測結構更包括複數導電 體，在該等導電體中至少一個導電體係串聯於該等第一感 測單元之間。 在一較佳實施例中，該二維感測結構更包括複數導電 體，在該等導電體中至少一個導電體係串聯於該等第二感 測單元之間。 在一較佳實施例中，該二維感測結構更包括一保護 層，其位於該第二電極層上。 根據上述構想，其中該基板係一透明基板。 根據上述構想，其中該基板於與該第一表面相對之一 第二表面上形成有一彩色遽光層。 根據上述構想，其中該基板於與該第一表面相對之一 第二表面上形成有一黑框（Black Matrix )層。 根據上述構想，其中該第一電極層係選自一金屬層與 一氧化銦鍚層其中之一。 根據上述構想，其中該第二電極層係選自一金屬層與 一氧化銦錫層其中之一。 根據上述構想，其中該絕緣層係二氧化矽（Si02)層。 本發明之一第二構想在於提供一種觸控式感測結構， 其係建構於一基板之一第一表面上。所提供之觸控式感測 結構包括具有複數第一感測單元之一第一電極層、位於該 第一電極層上之一絕緣層、以及具有複數第二感測單元之 一第二電極層，其中該等第一感測單元係彼此電連接於一 200941323 第一方向’而該等第二感測單元係電連接於與該第一方向 不同之一第二方向。在本發明之構想中，觸控式感測結構 之絕緣層與第二電極層係經一次圖樣化而成為形狀完全相 同之規則陣列。 在一較佳實施例中，該觸控式感測結構更包括複數導 電體’在該等導電體中至少兩個導電體係串聯於該等第一 感測單元之間。 β 在一較佳實施例中，該觸控式感測結構更包括複數導 電體’在該等導電體中至少兩個導電體係串聯於該等第二 感測單元之間。 在一較佳實施例中，該觸控式感測結構更包括一保護 層，其位於該第二電極層上。 根據上述構想，其中該基板係一透明基板。 根據上述構想，其中該基板於與該第一表面相對之一 第二表面上形成有一彩色濾光層。 ❹ 根據上述構想，其中該基板於與該第一表面相對之一 第一表面上形成有一黑框（Black Matrix, BM)層。 根據上述構想，其中該第一電極層係選自一金屬層與 一氧化銦錫（Indium Tin Oxide, ITO)層其中之一。 根據上述構想，其十該第二電極層係選自一金屬層與 一氧化銦錫層其中之一。 根據上述構想，其中該絕緣層係二氧化矽（Si〇2)層。 本發明之一第三構想在於提供一種電容式觸控面板， 其包括：一基板，其具有位於該基板相對兩侧之一第一表 200941323 面與一第二表面；一黑框層，其位於部份之該第一表面上； 一彩色濾光層，其位於該第一表面與該黑框層上；以及一 感測結構層，其位於該第二表面上。在本發明中，該感測 結構層包括複數第一感測單元與複數第二感測單元，該等 第一感測單元與該等第二感測單元係位於該第二表面上之 不同層平面中且分別排列為一規則陣列，該等第一感測單 元係彼此電連接於一第一方向而該等第二感測結構係彼此 電連接於與該第一方向不同之一第二方向；一絕緣陣列 Φ 層，其位於該等第一感測單元之層平面與該等第二感測單 元之層平面之間，以使該等第一感測單元與該等第二感測 單元絕緣，該絕緣陣列層之複數絕緣體係對應各該等第二 感測單元並與其具有完全相同的形狀。 在一較佳實施例中，該電容式觸控面板更包括一保護 層，其位於該等第二感測單元之層平面上。 根據上述構想，其中該等第一感測單元係藉由至少兩 個導電體而彼此電連接於該第一方向，且該等第二感測單 Φ 元係藉由至少兩個導電體而彼此電連接於該第二方向。 根據上述構想，其中該基板係一透明基板。 根據上述構想，其中該等第一感測單元與該等第二感 測單元係由金屬與氧化銦錫其中之一所製成。 根據上述構想，其中該等絕緣體係由二氧化矽（Si02) 所形成。 本發明之一第四構想在於提供一種觸控式感測結構的 製造方法，其包括的步驟為：提供一基板；於該基板上形 成一第一電極層；圖樣化該第一電極層為電連接於一第一 200941323 方向之複數第一感測單元；提供一光阻層於該第一電極層 上，其中該光阻層係具有一規則陣列圖樣；通過該光阻層 而形成一絕緣層於該第一電極層上；通過該光阻層而形成 一第二電極層於該絕緣層上，藉以形成電連接於一第二方 向之複數導電體；以及移除該光阻層。在本發明中，藉由 該光阻層之該規則陣列圖樣之作用，該絕緣層具有與該第 二電極層完全相同的形狀。 在一較佳實施例中，該製造方法更包括：形成複數金 ❹ 屬導線於該絕緣層上，以供外部之電性連接。 在一較佳實施例中，該製造方法更包括：形成一保護 層於該第二電極層上。 本案得藉由下列圖式及詳細說明，俾得以令讀者更深 入了解： 【實施方式】 請參閱第一 A圖至第一 D圖，其說明本發明之觸控式 φ 面板感測結構的製造方法。 首先，提供一玻璃基板100，於該玻璃基板100上形成 一第一電極層並將其圖樣化為具有電連接於一第一方向之 複數第一感測單元110,如第一 A圖所示。根據本發明之一 較佳實施例，可藉由濺鍍方式於玻璃基板上沉積一氧化銦 錫（Indium Tin Oxide，ITO)層作為第一電極層，所沉積之 IT0層係經圖樣化而形成連接於χ軸方向之複數感測單 元；該等感測單元可藉由同樣經圖樣化而形成之單一導電 體而彼此電連接’亦可藉由圖樣化而形成之兩個以上的導 電體而彼此電連接，以避免發生因單一橋接中斷而導致斷 200941323 線的情形。 接著’如第- B圖所示’提供 極層上，並通過光阻層12G而於第 ^ 12G於第一電 130;然後，通過同一弁>12n 七層上形成絕緣層 二電極層⑽，如4 ^層 於絕緣層13〇上形成第 式ΐ:二阻；C圖所示。舉例而言，可利用缝方 第二電極層，由於光且廢沾菌楼別/儿積絕緣層與 雷炼居在越同嫌>〇^層的圖樣狄什’使得所沉積之第二 元；該等感測單元可藉由同樣 ==二感：： 體而彼此電連接，亦可囍由關：：化而形成之皁-導電 電體而彼此電連接，以避免1生形成之兩個以上的導 線的情形。此外，早一橋接中斷而導致斷 田η 於在形成絕緣層與第-雷極層時#使 用同-光阻層，因而絕綾層盘笛1:、第一電極盾時係使 形狀；在本發明之—較二施例·;，層具有完全相同的 材料作為絕緣層，而以氧 ’ fn氧化々（Sl〇2) 極層。 虱化銦錫或是其他金屬作為第二電 ❹ 後續的;線移除光阻廣，並進行 之感測結構，而完成本咖以保護所形成 第一 D圖所示。 控式面板感測結構10，如 法所製得之感測結構局部丄:第圖"^圖至第- C圖所示方 測結構係由連接於x軸方 由圖可知，所形成之感 110以及連接於y軸方向之°第一雷：!極層的複數感測單元 建構而成，由於絕緣層的複數感測單元140 乐一電極層具有完全相同的形 200941323 狀，因而未能視於第二圖中。 在本，明中，第一電極層與第二電極層之複數感測單 元係分別藉由同樣經圖樣化而形成之單一導電體而彼此電 連接；然在一較佳實施例中，第一電極層之複數感測單元 110亦可藉由圖樣化而形成之兩個以上的導電體1U而彼此 電連接於X軸方向；同樣地，第二電極層之複數感測單元 140係藉由兩個以上的導電體141而彼此電連接於y軸方 向，以避免發生因早一橋接中斷而導致斷線的情形，如第 β 三圖所示。 請參閱第四圖，其係沿第二圖中ΑΑ，線所示之感測結構 局部截面圖；如圖所示，所形成之感測結構係由第一電極 層之複數感測單元110以及第二電極層之複數感測單元140 建構而成之二維感測結構，其中絕緣層130與第二電極層 係具有完全相同的形狀。 請參閱第五圖，其係一戴面圖，說明根據本發明之另 —實施例所形成之二維感測結構50。如圖所示，其與前一 ® 實施例不同處在於’二維感測結構50係以金屬層510與ΙΤΟ 層515作為第一電極層，而同樣地，絕緣層13〇與第二電 極層140係具有完全相同的圖樣，且為保護所形成之感測 結構，第二電極層140上係具有一保護層15〇。 上述實施例僅為說明本發明原理之用，而非用以具體 限制本發明之範，；舉例而言，除第二電極層之外，亦可 藉由本發明而使第一電極層具有與二氧化♦絕緣層完全相 同的形狀與圖樣’且除-氧化石夕外，亦可使用可行的其他 絕緣層材料，其同樣可實現本發明之構想。 12 200941323 成二氧化’利用單—光阻層而於不同濺鍍腔室中形 樣與形狀· ϋ層與⑽電極層’使其具有完全相同的圓 亦少所ϊί本發明’不但可減少絕緣層材料之使用量 约化觸板數量H步降_控面板的厚度並 感測結構以及其整體製作程序。此外’由 ϊίί太ίί係與本領域中習知製程相容，因而具有低 製作成本之優勢。 進步且具產業實用性與 e ❹ 綜上所述，本案實為一新穎 競命性之發明，深具發展價值。 、侍由熟悉該項技藝之人士任施匠思而為諸般修 飾’然不脫如附中請範圍所欲保護者。 【圖式簡單說明】 圖至第一 D圖說明本發明之觸控面板感測結構 的製造方法步驟； 第一圖’其係根據第一 Α圖至第一 c圖所示方法所製 得之感測結構局部上視圖； 第二圖係根據本發明另一實施例之感測結構局部上視 圖； 第四圈係沿第二圖中AA，線所示之感測結構局部截面 圖；以及 第五圖係根據本發明之另一實施例所形成之二維感測 結構截面圖。 感測結構 【主要元件符號說明】 10、50 13 200941323 100 基板 110、510、515 第一電極層 120 光阻層 130 絕緣層 140 第二電極層 150 保護層200941323 IX. Description of the Invention: [Technical Field] The present invention relates to a sensing structure of a touch panel, and more particularly to a two-dimensional sensing structure of a capacitive touch panel. [Prior Art] At present, various types of electronic devices have widely used touch technology as their input method. Therefore, by simply pressing the display panel with a finger or a stylus, Φ can read information or transmit information, which can save Go to buttons, keyboards or sliders that must be configured on traditional electronic devices. Touch panels are mainly classified into resistive, capacitive, infrared, and ultrasonic based on their sensing principles. Infrared and ultrasonic touch panels are placed on one side of the X-axis and γ-axis of the screen. Infrared or ultrasonic source, and the receiving source is installed on the other side. When the user touches the screen, the movement of the infrared or ultrasonic wave is disturbed, and the touch input is completed by measuring and confirming the disturbed position coordinates. The resistive touch panel is formed by laminating two sets of upper and lower ITO (Indium Tin Oxide) conductive films. After the upper and lower electrodes are turned on by the pressure ®, the position of the contact point is calculated by the controller to detect the voltage change of the panel for input. . The capacitive touch panel is composed of transparent glass coated with an oxidized metal on the surface, and the sensing structure is generally composed of two electrode layers electrically connected to the X-axis direction and the y-axis direction, respectively, between the two electrode layers. There is an insulating layer (Insulating Spacer), which provides voltage from its four corners and forms a uniform electric field on the surface of the glass, and detects the input coordinates by the capacitance change caused by the electrostatic reaction between the user's finger and the electric field. Since the sensing structure of the conventional capacitive touch panel has a more complicated multi-200941323 layer structure design, it needs to include multiple patterning, etching, peeling (Uft-Off), and de-lighting in the overall fabrication. It is necessary to block five to ten layers of production processes, and two or more substrates and one to three layers of comprehensive insulating layers are required in the process, which is inconsistent with the current trend of thin and light electronic devices. In addition, since the above capacitive sensing structure uses IT0 as the upper and lower conductive electrodes, the resistance value is high, and the conductivity is poor, which in turn affects the sensitivity of the sensing sensitivity. For the sake of his post, the applicant has carefully tested and researched, and has put forward the "sensing structure and touch panel of the touch panel" in this case. According to the present invention, the use of the insulating layer material can be reduced, the thickness of the touch panel can be reduced, the number of required substrates can be reduced, and the sensing structure of the touch panel and the overall fabrication process thereof can be further simplified. Moreover, the present invention is further low. The cost of production costs. SUMMARY OF THE INVENTION The above concept can be achieved by the present invention. The first concept of the present invention is to provide a second sensing structure of a capacitive touch panel, which is formed on a first surface of a substrate; the two-dimensional sensing structure is composed of a first electrode layer, An insulating layer and a second electrode layer are disposed on the first surface and include a plurality of sensing/sensing units on the first electrode layer and including a plurality of insulating units The second electrode layer is disposed on the insulating layer and includes a plurality of second sensing units; wherein the first sensing units are electrically connected to each other in a first direction, and the second sensing units are electrically connected to each other Connected to one of the second directions different from the first radix and has the same 200941323 shape as the plurality of units. In a preferred embodiment, the two-dimensional sensing structure further includes a plurality of electrical conductors, at least one of the electrically conductive systems being connected in series between the first sensing units. In a preferred embodiment, the two-dimensional sensing structure further includes a plurality of electrical conductors, at least one of the electrically conductive systems being connected in series between the second sensing units. In a preferred embodiment, the two-dimensional sensing structure further includes a protective layer on the second electrode layer. According to the above concept, the substrate is a transparent substrate. According to the above concept, the substrate is formed with a color light-emitting layer on a second surface opposite to the first surface. According to the above concept, the substrate is formed with a black matrix layer on a second surface opposite to the first surface. According to the above concept, the first electrode layer is selected from one of a metal layer and an indium bismuth oxide layer. According to the above concept, the second electrode layer is selected from one of a metal layer and an indium tin oxide layer. According to the above concept, the insulating layer is a layer of cerium oxide (SiO 2 ). A second aspect of the present invention provides a touch sensing structure that is constructed on a first surface of a substrate. The touch sensing structure includes a first electrode layer having a plurality of first sensing units, an insulating layer on the first electrode layer, and a second electrode layer having one of the plurality of second sensing units The first sensing units are electrically connected to each other in a first direction '200941323' and the second sensing units are electrically connected to a second direction different from the first direction. In the concept of the present invention, the insulating layer and the second electrode layer of the touch sensing structure are patterned once to form a regular array of exactly the same shape. In a preferred embodiment, the touch sensing structure further includes a plurality of conductive bodies in which at least two conductive systems are connected in series between the first sensing units. In a preferred embodiment, the touch sensing structure further includes a plurality of conductive bodies in which at least two conductive systems are connected in series between the second sensing units. In a preferred embodiment, the touch sensing structure further includes a protective layer on the second electrode layer. According to the above concept, the substrate is a transparent substrate. According to the above concept, the substrate is formed with a color filter layer on a second surface opposite to the first surface. According to the above concept, the substrate is formed with a black matrix (BM) layer on a first surface opposite to the first surface. According to the above concept, the first electrode layer is selected from one of a metal layer and an indium tin oxide (ITO) layer. According to the above concept, the second electrode layer is selected from one of a metal layer and an indium tin oxide layer. According to the above concept, the insulating layer is a layer of cerium oxide (Si 2 ). A third aspect of the present invention provides a capacitive touch panel including: a substrate having a first surface 200941323 surface and a second surface on opposite sides of the substrate; a black frame layer located at a portion of the first surface; a color filter layer on the first surface and the black frame layer; and a sensing structure layer on the second surface. In the present invention, the sensing structure layer includes a plurality of first sensing units and a plurality of second sensing units, and the first sensing units and the second sensing units are located on different layers of the second surface. In a plane, and arranged in a regular array, the first sensing units are electrically connected to each other in a first direction and the second sensing structures are electrically connected to each other in a second direction different from the first direction. An insulating array Φ layer between the layer planes of the first sensing units and the layer planes of the second sensing units, such that the first sensing units and the second sensing units Insulation, the plurality of insulating systems of the insulating array layer correspond to and have exactly the same shape as each of the second sensing units. In a preferred embodiment, the capacitive touch panel further includes a protective layer on a layer plane of the second sensing units. According to the above concept, the first sensing units are electrically connected to each other in the first direction by at least two electrical conductors, and the second sensing single Φ elements are connected to each other by at least two electrical conductors. Electrically connected to the second direction. According to the above concept, the substrate is a transparent substrate. According to the above concept, the first sensing unit and the second sensing unit are made of one of metal and indium tin oxide. According to the above concept, the insulating systems are formed of cerium oxide (SiO 2 ). A fourth aspect of the present invention provides a method for manufacturing a touch sensing structure, comprising the steps of: providing a substrate; forming a first electrode layer on the substrate; and patterning the first electrode layer to be electrically a plurality of first sensing units connected to a first direction of 200941323; providing a photoresist layer on the first electrode layer, wherein the photoresist layer has a regular array pattern; forming an insulating layer through the photoresist layer On the first electrode layer, a second electrode layer is formed on the insulating layer through the photoresist layer, thereby forming a plurality of electrical conductors electrically connected to a second direction; and removing the photoresist layer. In the present invention, the insulating layer has exactly the same shape as the second electrode layer by the action of the regular array pattern of the photoresist layer. In a preferred embodiment, the method further includes forming a plurality of metal wires on the insulating layer for external electrical connection. In a preferred embodiment, the manufacturing method further includes: forming a protective layer on the second electrode layer. The present invention can be further understood by the following drawings and detailed descriptions: [Embodiment] Please refer to the first A to the first D, which illustrate the manufacture of the touch type φ panel sensing structure of the present invention. method. First, a glass substrate 100 is provided, and a first electrode layer is formed on the glass substrate 100 and patterned into a plurality of first sensing units 110 electrically connected to a first direction, as shown in FIG. . According to a preferred embodiment of the present invention, an indium tin oxide (ITO) layer is deposited on the glass substrate as a first electrode layer by sputtering, and the deposited IT0 layer is formed by patterning. a plurality of sensing units connected to the x-axis direction; the sensing units can be electrically connected to each other by a single conductor formed by patterning, and can be formed by patterning two or more conductors Electrically connected to each other to avoid a situation where the 200941323 line is broken due to a single bridge interruption. Then, 'as shown in FIG. B' is provided on the pole layer, and passes through the photoresist layer 12G at the first electrode 130; then, the insulating layer is formed on the seventh layer by the same layer of >12n (10) For example, the 4^ layer forms a first type of ΐ: two resistance on the insulating layer 13〇; C is shown. For example, the second electrode layer of the slit can be utilized, because the light and the waste stained floor/child insulation layer and the refinery are in the same pattern, the pattern of the layer is made to make the second deposited The sensing units can be electrically connected to each other by the same == two senses:: body, or can be electrically connected to each other by a soap-conducting electric body formed by turning off: The case of more than two wires. In addition, the early break of the bridge causes the broken field η to use the same-photoresist layer when forming the insulating layer and the first-thunder layer, so that the first layer of the whistle 1: the first electrode shield is shaped; In the present invention, the second embodiment has a completely identical material as the insulating layer and an oxygen 'fn yttrium oxide (Sl〇2) electrode layer. Indium tin oxide or other metals are used as the second electrode; the line removes the photoresist and performs the sensing structure, and the first D picture is formed by the protection of the coffee. The control panel sensing structure 10, the sensing structure obtained by the method is partially: the graph structure shown in the figure "^ to the C-th diagram is connected to the x-axis, and the formed The sense 110 and the complex sensing unit connected to the first ray of the y-axis direction are constructed. Since the complex sensing unit 140 of the insulating layer has the same shape 200941323, it cannot be See the second picture. In the present invention, the plurality of sensing units of the first electrode layer and the second electrode layer are electrically connected to each other by a single conductor formed by patterning; respectively; in a preferred embodiment, the first The plurality of sensing units 110 of the electrode layer may be electrically connected to each other in the X-axis direction by two or more conductors 1U formed by patterning; likewise, the plurality of sensing units 140 of the second electrode layer are provided by two More than one conductor 141 is electrically connected to each other in the y-axis direction to avoid a situation in which disconnection occurs due to an interruption of the bridge, as shown in FIG. Please refer to the fourth figure, which is a partial cross-sectional view of the sensing structure shown along the line 第二 in the second figure; as shown, the sensing structure is formed by the plurality of sensing units 110 of the first electrode layer and The plurality of sensing units 140 of the second electrode layer are constructed as a two-dimensional sensing structure, wherein the insulating layer 130 and the second electrode layer have exactly the same shape. Referring to the fifth drawing, which is a front view, a two-dimensional sensing structure 50 formed in accordance with another embodiment of the present invention is illustrated. As shown, it differs from the previous embodiment in that the 'two-dimensional sensing structure 50 has the metal layer 510 and the germanium layer 515 as the first electrode layer, and similarly, the insulating layer 13 and the second electrode layer. The 140 series has exactly the same pattern, and to protect the formed sensing structure, the second electrode layer 140 has a protective layer 15〇. The above embodiments are merely illustrative of the principles of the present invention, and are not intended to specifically limit the scope of the present invention; for example, in addition to the second electrode layer, the first electrode layer may be provided with two by the present invention. The oxidized ♦ insulating layer has exactly the same shape and pattern 'and in addition to - oxidized stone, other feasible insulating layer materials can be used, which can also realize the concept of the present invention. 12 200941323 Dioxide oxidized 'with a single-photoresist layer in different sputter chambers in shape and shape · ϋ layer and (10) electrode layer 'has exactly the same circle 亦 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本The amount of layer material used reduces the number of touch panels by H step _ the thickness of the control panel and senses the structure and its overall fabrication process. In addition, ϊ ίίίί is compatible with processes known in the art, and thus has the advantage of low production cost. Progress and industrial practicability and e ❹ In summary, this case is a novel and experiential invention with profound development value. The person who is familiar with the skill is able to modify it for the sake of the craftsmanship. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1D is a diagram illustrating a method of manufacturing a touch panel sensing structure of the present invention; FIG. 1 is a method according to the method of the first to the first c. a top view of the sensing structure according to another embodiment of the present invention; a fourth section is a partial cross-sectional view of the sensing structure shown along line AA in the second figure; Five figures are cross-sectional views of a two-dimensional sensing structure formed in accordance with another embodiment of the present invention. Sensing structure [Description of main components] 10, 50 13 200941323 100 Substrate 110, 510, 515 First electrode layer 120 Photoresist layer 130 Insulating layer 140 Second electrode layer 150 Protective layer