WO2013082796A1 - 玻璃基板的清洗装置及清洗方法 - Google Patents

玻璃基板的清洗装置及清洗方法 Download PDF

Info

Publication number
WO2013082796A1
WO2013082796A1 PCT/CN2011/083735 CN2011083735W WO2013082796A1 WO 2013082796 A1 WO2013082796 A1 WO 2013082796A1 CN 2011083735 W CN2011083735 W CN 2011083735W WO 2013082796 A1 WO2013082796 A1 WO 2013082796A1
Authority
WO
WIPO (PCT)
Prior art keywords
cleaning
frequency generator
frequency
glass substrate
substrate
Prior art date
Application number
PCT/CN2011/083735
Other languages
English (en)
French (fr)
Inventor
寇浩
Original Assignee
深圳市华星光电技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 深圳市华星光电技术有限公司 filed Critical 深圳市华星光电技术有限公司
Priority to US13/381,300 priority Critical patent/US20130146085A1/en
Publication of WO2013082796A1 publication Critical patent/WO2013082796A1/zh

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields

Definitions

  • the present invention relates to the field of substrate cleaning, and in particular to an efficient and low-cost glass substrate cleaning apparatus and cleaning method.
  • the current glass substrate cleaning device has the following disadvantages:
  • the cleaning principle of the cleaning machine is mainly physical impact, and the cleaning effect on the small-sized and stubbornly attached particles is not obvious, and the distillation water and the added solvent which are required for cleaning are consumed.
  • ultrasonic cleaning technology has been developed to remove particles on the surface of the glass substrate, that is, the glass substrate is cleaned using ultrasonic waves in the cleaning liquid.
  • the ultrasonic cleaning technology utilizes the cavitation effect, which refers to the cleaning of the surface of the glass substrate by the implosion of the microbubbles in the cleaning liquid.
  • the implosion of the microbubbles is caused by the pressure change of the liquid in the cleaning liquid.
  • the liquid When the liquid is in a negative pressure state, the boiling point of the liquid is lowered, thereby generating many small bubbles; when the liquid is in a positive pressure state, the small bubbles are A violent internal burst will occur, so the cavitation will cause the cleaning solution to agitate and wash, which can better clean the surface of the glass substrate.
  • the ultrasonic waves emitted from the vibrator of the ultrasonic frequency generator easily cause a coherent effect such as standing waves in the cleaning liquid to affect the cleaning of the surface of the glass substrate by the ultrasonic waves.
  • An object of the present invention is to provide an ultrasonic cleaning apparatus and a cleaning method for a glass substrate which are efficient and low-cost, and to solve the technical problem of high cost and poor cleaning effect of the conventional glass substrate cleaning apparatus and cleaning method.
  • the present invention relates to a glass substrate cleaning apparatus including a cleaning tank, wherein the cleaning apparatus includes: a first frequency generator for emitting ultrasonic waves of a first frequency; and a second frequency for emitting ultrasonic waves of a second frequency a generator; the first frequency generator and the second frequency generator are disposed on both sides of the cleaning tank; the first frequency generator and the second frequency generator each have a vibrator, the vibrator Exposed to an inner wall of the cleaning tank, and the vibrator of the first frequency generator and the vibrator of the second frequency generator are distributed in a row; the first frequency ranges from 40 to 70 kHz, and the The two frequencies range from 120-170 kHz.
  • the interval between the first frequency generator and the adjacent vibrators of the second frequency generator is 15-50 cm.
  • the cleaning device for the glass substrate further includes a substrate placement support, and the substrate placement support is placed in the cleaning tank for placing the substrate to be cleaned, so that the The angle between the cleaning substrate and the bottom plane of the cleaning tank is 30-45 degrees.
  • the substrate placement support includes a bottom support frame for contacting the bottom of the cleaning tank and at least one inclined support frame for tilting the substrate to be cleaned.
  • the angle between the plane where the bottom support frame is located and the plane where the inclined support frame is located is 30-45 degrees.
  • the present invention also relates to a cleaning apparatus for a glass substrate, comprising a cleaning tank, wherein the cleaning apparatus includes a first frequency generator for emitting ultrasonic waves of a first frequency and a second frequency for generating ultrasonic waves of a second frequency
  • the first frequency generator and the second frequency generator are disposed on both sides of the cleaning tank.
  • the first frequency ranges from 40 to 70 kHz
  • the second frequency ranges from 120 to 170 kHz.
  • the first frequency generator and the second frequency generator each have a vibrator, the vibrator is exposed on an inner wall of the cleaning tank, and the first frequency The vibrator of the generator and the vibrator of the second frequency generator are spaced apart in a row.
  • the interval between the first frequency generator and the adjacent vibrators of the second frequency generator is 15-50 cm.
  • the cleaning device for the glass substrate further includes a substrate placement support, and the substrate placement support is placed in the cleaning tank for placing the substrate to be cleaned, so that the The angle between the cleaning substrate and the bottom plane of the cleaning tank is 30-45 degrees.
  • the substrate placement support includes a bottom support frame for contacting the bottom of the cleaning tank and at least one inclined support frame for tilting the substrate to be cleaned.
  • the angle between the plane where the bottom support frame is located and the plane where the inclined support frame is located is 30-45 degrees.
  • the invention also relates to a method for cleaning a glass substrate, comprising the steps of: A, placing a substrate to be cleaned on a substrate placement support in the cleaning tank; B, injecting a cleaning liquid into the cleaning tank and causing the cleaning liquid Covering the substrate to be cleaned; C. simultaneously emitting ultrasonic waves of a first frequency and ultrasonic waves of a second frequency in the cleaning tank to ultrasonically clean the substrate to be cleaned.
  • the first frequency ranges from 40 to 70 kHz and the second frequency ranges from 120 to 170 kHz.
  • the step A further includes the steps of: providing a first frequency generator for emitting ultrasonic waves of a first frequency on both sides of the cleaning tank; a second frequency generator of ultrasonic waves of two frequencies, the vibrators of the first frequency generator and the vibrators of the second frequency generator are distributed in a row, the first frequency generator and the second frequency generator The spacing of adjacent vibrators is 15-50 cm.
  • the step A is specifically: placing a substrate placement holder in the cleaning tank, and then placing the substrate to be cleaned into the substrate in the cleaning tank.
  • the bracket is placed so that the angle between the substrate to be cleaned and the bottom plane of the cleaning tank is 30-45 degrees.
  • the cleaning time of the step C is 200 to 280 seconds.
  • the cleaning device has low cost and good cleaning effect, and solves the technical problems of high cost and poor cleaning effect of the conventional glass substrate cleaning device and cleaning method.
  • FIG. 1 is a schematic structural view of a preferred embodiment of a cleaning apparatus for a glass substrate of the present invention
  • Figure 2 is a schematic view showing the structure of the A-A section of Figure 1;
  • Figure 3 is a schematic view showing the structure of the B-B section of Figure 1;
  • FIG. 4 is a graph showing the relationship between the vibrator spacing of the ultrasonic frequency generator of the preferred embodiment of the glass substrate cleaning apparatus of the present invention and the number of remaining particles having a particle diameter of 2.0 ⁇ m and 2.5 ⁇ m;
  • Figure 5 is a graph showing the relationship between the vibrator spacing of the ultrasonic frequency generator of the preferred embodiment of the glass substrate cleaning apparatus of the present invention and the number of remaining particles having a particle diameter of 1.2 ⁇ m and 2.2 ⁇ m;
  • FIG. 6 is a graph showing the relationship between the plane angle of the substrate to be cleaned and the bottom of the cleaning tank and the number of remaining particles having a particle diameter of 2.0 ⁇ m and 2.5 ⁇ m in a preferred embodiment of the cleaning apparatus for a glass substrate of the present invention
  • FIG. 7 is a graph showing the relationship between the plane angle of the substrate to be cleaned and the bottom of the cleaning tank and the number of remaining particles having a particle diameter of 1.2 ⁇ m and 2.2 ⁇ m in a preferred embodiment of the cleaning apparatus for a glass substrate of the present invention
  • Fig. 8 is a flow chart showing a preferred embodiment of the method for cleaning a glass substrate of the present invention.
  • FIG. 1 is a schematic structural view of a preferred embodiment of a cleaning apparatus for a glass substrate of the present invention
  • FIG. 2 is a schematic structural view of a cross section taken along line A-A of FIG. 1
  • FIG. 3 is a schematic structural view of a cross section taken along line B-B of FIG.
  • the present invention relates to a glass substrate cleaning apparatus 100.
  • the glass substrate cleaning apparatus 100 includes a cleaning tank 110 and a first frequency generator 121 and a second frequency generator 122 disposed on both sides of the cleaning tank 110, wherein the first frequency
  • the generator 121 is for emitting ultrasonic waves of a first frequency
  • the second frequency generator 122 is for emitting ultrasonic waves of a second frequency.
  • the substrate 130 to be cleaned is placed in the cleaning tank 110, and the cleaning liquid is injected into the cleaning tank 110, and the cleaning liquid covers the substrate to be cleaned 130, and is disposed on both sides of the cleaning tank 110.
  • the first frequency generator 121 and the second frequency generator 122 simultaneously emit ultrasonic waves of a first frequency and ultrasonic waves of a second frequency to ultrasonically clean the substrate to be cleaned 130.
  • the first frequency of the ultrasonic wave emitted by the first frequency generator 121 preferably ranges from 40 to 70 kHz
  • the second frequency of the ultrasonic wave emitted by the second frequency generator 122 preferably ranges from 120 to 170 thousand. hertz.
  • the first frequency generator 121 of 40-70 kHz is mainly used to remove particles having a particle diameter of 2.0 to 2.5 ⁇ m
  • the second frequency generator 122 of 120-170 kHz is mainly used for removing particles having a particle diameter of 1.0 to 1.8 ⁇ m.
  • Each of the first frequency generator 121 and the second frequency generator 122 includes an ultrasonic generating device and a vibrator exposed on an inner wall of the cleaning tank 110.
  • the vibrator of the first frequency generator 121 and the vibrator of the second frequency generator 122 are arranged.
  • the interval distribution is as shown in FIG. 2, wherein the first frequency generator 121 and the second frequency generator 122 are each represented by a vibrator exposed on the inner wall of the cleaning tank 110.
  • any two adjacent vibrators of the frequency generator are spaced 15-50 cm apart.
  • the cleaning effect of the dual-frequency ultrasonic wave is also closely related to the vibrator spacing of the ultrasonic frequency generator. It has been experimentally proved that when the vibrator of the first frequency generator 121 and the vibrator of the second frequency generator 122 are spaced apart, the frequency generator The best cleaning effect can be achieved when the spacing of adjacent vibrators is 15-50 cm. See the experimental data below for details.
  • FIG. 4 is a graph showing the relationship between the vibrator spacing of the frequency generator and the number of remaining particles having a particle diameter of 2.0 micrometers and 2.5 micrometers
  • FIG. 5 is a diagram showing the oscillator spacing and particle diameter of the frequency generator.
  • LPC liquid particle counter
  • the glass substrate cleaning apparatus 100 further includes a substrate placement bracket 140 for placing the substrate 130 to be cleaned, the substrate placement bracket 140 including a bottom support frame 141 and at least one inclined support frame 142 for the cleaning tank 110 In the bottom contact, the inclined support frame 142 is used for tilting the substrate 130 to be cleaned, and a predetermined angle is formed between the plane of the bottom support frame 141 and the plane of the cleaning support frame 142, so that the substrate to be cleaned placed on the cleaning support frame 142 A corresponding angle is also formed between the 130 and the bottom plane of the cleaning tank 110.
  • the plane between the bottom support frame 141 and the plane of the cleaning support frame 142 is 30-45 degrees, so that the substrate to be cleaned 130 and the bottom plane of the cleaning tank 110 are also 30-45 degrees.
  • the cleaning effect of the dual-frequency ultrasonic wave is also closely related to the angle between the substrate 130 to be cleaned and the bottom plane of the cleaning tank 110. It has been experimentally proved that the angle between the substrate to be cleaned 130 and the bottom plane of the cleaning tank 110 is 30-45 degrees. The best cleaning results can be achieved, see the experimental data below.
  • FIG. 6 is a graph showing the relationship between the angle of the substrate to be cleaned 130 and the bottom plane of the cleaning bath 110 and the number of remaining particles having a particle diameter of 2.0 ⁇ m and 2.5 ⁇ m
  • FIG. 7 is a substrate to be cleaned.
  • the amount of remaining particles of 2.0 ⁇ m, Y1 is the number of remaining particles having a particle diameter of 2.5 ⁇ m, Y2 is the number of remaining particles having a particle diameter of 2.2 ⁇ m, and Y3 is the number of remaining particles having a particle diameter of 1.2 ⁇ m.
  • the liquid particle counter is used to count the number of particles of different particle sizes in the liquid to characterize the cleanliness of the surface of the glass substrate sample. As can be seen from FIG. 6, when the other experimental parameters are the same, when the substrate 130 is to be cleaned When the angle between the plane of the bottom of the cleaning tank 110 is greater than 45 degrees or less than 30 degrees, the number of remaining particles of 2.0 microns and the number of remaining particles of 2.5 microns are increased to a large extent.
  • FIG. 8 is a flow chart of a preferred embodiment of a method for cleaning a glass substrate of the present invention.
  • the cleaning method of the glass substrate begins with:
  • Step 801 the substrate 130 to be cleaned is placed on the substrate placement bracket 140 in the cleaning tank 110,
  • Step 802 injecting a cleaning liquid into the cleaning tank 110 and covering the substrate to be cleaned with the cleaning liquid.
  • step 803 ultrasonic waves of the first frequency and ultrasonic waves of the second frequency are simultaneously emitted in the cleaning tank 110 to ultrasonically clean the substrate to be cleaned.
  • Step 801 is specifically:
  • Step 8011 a first frequency generator 121 for emitting ultrasonic waves of a first frequency and a second frequency generator 122 for emitting ultrasonic waves of a second frequency are provided on both sides of the cleaning tank 110, the first frequency generator
  • the vibrator of 121 and the vibrator of the second frequency generator 122 are spaced apart in a row, and the interval between adjacent vibrators of the frequency generator (the first frequency generator 121 and the second frequency generator 122) is 15-50 cm, wherein
  • the range of one frequency is preferably 40-70 kHz, and the range of the second frequency is preferably 120-170 kHz.
  • Step 8012 the substrate placement bracket 140 is placed in the cleaning tank 110, wherein the plane between the bottom support frame 141 of the substrate placement bracket 140 and the plane of the inclined support frame 142 is 30-45 degrees, and then the substrate to be cleaned is The 130 is placed on the inclined support frame 142 such that the angle between the substrate 130 to be cleaned and the bottom plane of the cleaning tank 110 is 30-45 degrees.
  • Step 802 is specifically to inject a cleaning liquid (for example, deionized water) into the cleaning tank 110 to cover the entire substrate 130 to be cleaned.
  • a cleaning liquid for example, deionized water
  • Step 803 specifically: the start frequency generator sends out an ultrasonic wave to be cleaned to the substrate 130 for cleaning, wherein the vibrator of the first frequency generator 121 emits ultrasonic waves of the first frequency for ultrasonic cleaning of the substrate 130 to be cleaned, and the vibrator of the second frequency generator 122 simultaneously emits The ultrasonic waves of the second frequency are ultrasonically cleaned to the substrate 130 to be cleaned.
  • the cleaning time of step 803 is preferably 200-280 seconds, and can be washed once for 200-280 seconds, which can save the operation process. Alternatively, it can be washed several times, for example, three times, 90 seconds each time, so that a better cleaning effect can be achieved. Users can choose the appropriate method as needed.
  • the cleaning device and the cleaning method for the glass substrate of the present invention use a frequency generator provided with two frequencies, and ultrasonic waves of different frequencies can effectively remove particles of different particle sizes. Moreover, the ultrasonic cleaning of the surface of the glass substrate by using the ultrasonic waves of two frequencies can superimpose the ultrasonic waves of different frequencies, effectively eliminating the coherent effects of standing waves generated by single-frequency ultrasonic cleaning.
  • the power of the frequency generator is adjustable, and the user can control the output power of the ultrasonic wave according to the degree of dirt on the surface of the glass substrate.
  • the ultrasonic frequency range of the invention is wide, so that the particle size range of the removable particles is also large, thereby saving the cost of the cleaning device and the process time consumed, and the production cost saved.

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Liquid Crystal (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

一种玻璃基板的清洗装置以及清洗方法。该清洗装置（100）包括清洗槽（110）以及设置在清洗槽（110）两侧的用于发出第一频率的超声波的第一频率发生器（121）和用于发出第二频率的超声波的第二频率发生器（122）。第一频率发生器（121）的振子和第二频率发生器（122）的振子成行间隔分布。第一频率的范围为40-70千赫兹，第二频率的范围为120-170千赫兹。该清洗装置（100）和清洗方法通过同时利用不同频率的超声波清洗玻璃基板（130），可使成本降低，并达到良好的清洗效果。

Description

玻璃基板的清洗装置及清洗方法 技术领域
本发明涉及基板清洗领域，特别是涉及一种高效、低成本的玻璃基板的清洗装置及清洗方法。
 背景技术
在当前液晶显示领域中，用于制作液晶显示面板的玻璃基板的清洗方面，对于不同粒径的颗粒是采用不同的清洗技术，一般采用等离子体清洗（Plasma）来清除玻璃基板上的有机物残留，采用毛刷喷淋（brush+shower）来清除玻璃基板上粒径为10微米以上的颗粒，采用压力喷射来清除玻璃基板上粒径为1-10微米的颗粒，采用双流体喷射来清除玻璃基板上粒径为1-5微米的颗粒。
但是随着液晶显示面板的大尺寸、高开口率以及低线宽的发展要求，为了避免断线、短路等缺陷的产生，对玻璃基板的清洗技术的要求越来越高。而目前的玻璃基板的清洗装置存在以下的不足：
1、针对不同粒径的颗粒采用不同的清洗机台，造成了机台的高成本投入，并在各种机台的转换过程中会浪费较多的工时且易引入新的颗粒；
2、目前清洗机台的清洗原理主要为物理冲击，对于尺寸较小并顽固附着的颗粒的清洗效果并不明显，且对清洗需要使用的蒸馏水和添加溶剂消耗较大。
针对以上清洗装置的不足，又开发了采用超声波清洗技术来清除玻璃基板表面的颗粒，也即是在清洗液中使用超声波对玻璃基板进行清洗。相对于原有清洗装置的物理冲击的清洗原理，超声波清洗技术利用了空蚀作用，空蚀作用是指利用清洗液中的微型气泡的内爆裂进行玻璃基板表面的清洗。其中微型气泡的内爆裂是由于清洗液中的液体的压力变化导致的，当液体处于负压状态时，液体的沸点会降低，从而产生许多小气泡；当液体处于正压状态时，小气泡就会发生猛烈的内爆裂，因此空蚀现象使清洗液产生了搅拌和洗涤作用，这样可以较好的清洗玻璃基板的表面。但采用超声波对玻璃基板表面进行清洗时，超声波频率发生器的振子发出的超声波容易在清洗液中产生驻波等相干效应而影响超声波对玻璃基板表面的清洗。
故，有必要提供一种高效、低成本的玻璃基板的清洗装置及清洗方法，以解决现有技术所存在的问题。
 技术问题
本发明的目的在于提供一种高效、低成本的玻璃基板的超声波清洗装置及清洗方法，以解决现有的玻璃基板的清洗装置及清洗方法成本较高、清洗效果差的技术问题。
 技术解决方案
本发明提供的技术方案如下：
本发明涉及一种玻璃基板的清洗装置，包括清洗槽，其中所述清洗装置包括：用于发出第一频率的超声波的第一频率发生器；以及用于发出第二频率的超声波的第二频率发生器；所述第一频率发生器与所述第二频率发生器设置在所述清洗槽的两侧；所述第一频率发生器与所述第二频率发生器均具有振子，所述振子露出于所述清洗槽的内壁，且所述第一频率发生器的振子和所述第二频率发生器的振子成行间隔分布；所述第一频率的范围为40-70千赫兹，所述第二频率的范围为120-170千赫兹。
在本发明所述的玻璃基板的清洗装置中，所述第一频率发生器与所述第二频率发生器的相邻振子的间隔为15-50厘米。
在本发明所述的玻璃基板的清洗装置中，所述玻璃基板的清洗装置还包括基板放置支架，所述基板放置支架置于所述清洗槽中，用于放置待清洗基板，使所述待清洗基板与所述清洗槽的底部平面的夹角为30-45度。
在本发明所述的玻璃基板的清洗装置中，所述基板放置支架包括用于与所述清洗槽的底部接触的底部支撑架以及至少一个用于倾斜放置所述待清洗基板的倾斜支撑架，所述底部支撑架所在平面与所述倾斜支撑架所在平面之间的夹角为30-45度。
本发明还涉及一种玻璃基板的清洗装置，包括清洗槽，其中所述清洗装置包括用于发出第一频率的超声波的第一频率发生器和用于发出第二频率的超声波的第二频率发生器；所述第一频率发生器与所述第二频率发生器设置在所述清洗槽的两侧。
在本发明所述的玻璃基板的清洗装置中，所述第一频率的范围为40-70千赫兹，所述第二频率的范围为120-170千赫兹。
在本发明所述的玻璃基板的清洗装置中，所述第一频率发生器与所述第二频率发生器均具有振子，所述振子露出于所述清洗槽的内壁，且所述第一频率发生器的振子和所述第二频率发生器的振子成行间隔分布。
在本发明所述的玻璃基板的清洗装置中，所述第一频率发生器与所述第二频率发生器的相邻振子的间隔为15-50厘米。
在本发明所述的玻璃基板的清洗装置中，所述玻璃基板的清洗装置还包括基板放置支架，所述基板放置支架置于所述清洗槽中，用于放置待清洗基板，使所述待清洗基板与所述清洗槽的底部平面的夹角为30-45度。
在本发明所述的玻璃基板的清洗装置中，所述基板放置支架包括用于与所述清洗槽的底部接触的底部支撑架以及至少一个用于倾斜放置所述待清洗基板的倾斜支撑架，所述底部支撑架所在平面与所述倾斜支撑架所在平面之间的夹角为30-45度。
本发明还涉及一种玻璃基板的清洗方法，其中包括步骤：A、将待清洗基板放置到清洗槽中的基板放置支架上；B、在所述清洗槽中注入清洗液并使所述清洗液覆盖所述待清洗基板；C、在所述清洗槽中同时发出第一频率的超声波和第二频率的超声波对所述待清洗基板进行超声波清洗。
在本发明所述的玻璃基板的清洗方法中，所述第一频率的范围为40-70千赫兹，所述第二频率的范围为120-170千赫兹。
在本发明所述的玻璃基板的清洗方法中，所述步骤A之前还包括步骤：在所述清洗槽的两侧设置用于发出第一频率的超声波的第一频率发生器以及用于发出第二频率的超声波的第二频率发生器，所述第一频率发生器的振子和所述第二频率发生器的振子成行间隔分布，所述第一频率发生器与所述第二频率发生器的相邻振子的间隔为15-50厘米。
在本发明所述的玻璃基板的清洗方法中，所述步骤A具体为：将基板放置支架置于所述清洗槽中，随后将所述待清洗基板放置到所述清洗槽中的所述基板放置支架上使所述待清洗基板与所述清洗槽的底部平面的夹角为30-45度。
在本发明所述的玻璃基板的清洗方法中，所述步骤C的清洗时间为200-280秒。
 有益效果
清洗装置的成本低、清洗效果好，解决了现有的玻璃基板的清洗装置及清洗方法成本较高、清洗效果差的技术问题。
 附图说明
图1为本发明的玻璃基板的清洗装置的优选实施例的结构示意图；
图2为图1的A-A截面的结构示意图；
图3为图1的B-B截面的结构示意图；
图4为本发明的玻璃基板的清洗装置的优选实施例的超声波频率发生器的振子间隔与粒径为2.0微米和2.5微米的剩余颗粒的数量的关系曲线图；
图5为本发明的玻璃基板的清洗装置的优选实施例的超声波频率发生器的振子间隔与粒径为1.2微米和2.2微米的剩余颗粒的数量的关系曲线图；
图6为本发明的玻璃基板的清洗装置的优选实施例的待清洗基板与清洗槽底部平面夹角与粒径为2.0微米和2.5微米的剩余颗粒的数量的关系曲线图；
图7为本发明的玻璃基板的清洗装置的优选实施例的待清洗基板与清洗槽底部平面夹角与粒径为1.2微米和2.2微米的剩余颗粒的数量的关系曲线图；
图8为本发明的玻璃基板的清洗方法的优选实施例的流程图。
 本发明的最佳实施方式
以下各实施例的说明是参考附加的图式，用以例示本发明可用以实施的特定实施例。
图1为本发明的玻璃基板的清洗装置的优选实施例的结构示意图，图2为图1的A-A截面的结构示意图，图3为图1的B-B截面的结构示意图。本发明涉及一种玻璃基板的清洗装置100，该玻璃基板的清洗装置100包括清洗槽110以及设置在清洗槽110两侧的第一频率发生器121和第二频率发生器122，其中第一频率发生器121用于发出第一频率的超声波，第二频率发生器122用于发出第二频率的超声波。
清洗时，将待清洗基板130放置到清洗槽110中，并在所述清洗槽110中注入清洗液并使所述清洗液覆盖所述待清洗基板130，通过设置在所述清洗槽110两侧的第一频率发生器121与第二频率发生器122同时发出第一频率的超声波和第二频率的超声波从而对所述待清洗基板130进行超声波清洗。
在本实施例中，第一频率发生器121发出的超声波的第一频率的范围优选为40-70千赫兹，第二频率发生器122发出的超声波的第二频率的范围优选为120-170千赫兹。40-70千赫兹的第一频率发生器121主要用于清除粒径2.0-2.5微米的颗粒，120-170千赫兹的第二频率发生器122主要用于清除粒径1.0-1.8微米的颗粒。
每一个第一频率发生器121和第二频率发生器122均包括超声波产生装置以及露出于所述清洗槽110内壁的振子，第一频率发生器121的振子和第二频率发生器122的振子成行间隔分布，如图2所述，其中第一频率发生器121和第二频率发生器122各以露出于清洗槽110内壁的振子表示。
优选的，频率发生器的任两个相邻振子的间隔为15-50厘米。双频率超声波的清洗效果与超声波频率发生器的振子间隔也有很大的联系，经试验证明，当第一频率发生器121的振子和第二频率发生器122的振子成行间隔分布，频率发生器的相邻振子的间隔为15-50厘米时可以达到最佳的清洗效果，具体可参见下述的实验数据。
具体参见图4和图5，其中图4为频率发生器的振子间隔与粒径为2.0微米和2.5微米的剩余颗粒的数量的关系曲线图，图5为频率发生器的振子间隔与粒径为1.2微米和2.2微米的剩余颗粒的数量的关系曲线图，其中X0为振子间隔，Y0为粒径为2.0微米的剩余颗粒的数量，Y1为粒径为2.5微米的剩余颗粒的数量，Y2为粒径为2.2微米的剩余颗粒的数量，Y3为粒径为1.2微米的剩余颗粒的数量。采用液体粒子计数仪（LPC，Liquid particle count）对液体中不同粒径的颗粒数量进行统计来表征玻璃基板样品表面的洁净程度，从图4中可以看出，在其它的实验参数均相同的情况下，当振子的间隔大于50厘米或小于20厘米时，2.0微米的剩余颗粒和2.5微米的剩余颗粒的数量都有较大程度的增加。从图5中也可以看出当振子的间隔大于50厘米或小于15厘米时，1.2微米的剩余颗粒和2.2微米的剩余颗粒的数量也有较大程度的增加。因此可以得出当频率发生器的相邻振子的间隔为15-50厘米时可以达到双频率超声波清洗的最佳清洗效果。
玻璃基板的清洗装置100还包括用于放置待清洗基板130的基板放置支架140，该基板放置支架140包括底部支撑架141和至少一个倾斜支撑架142，底部支撑架141用于与清洗槽110的底部接触，倾斜支撑架142用于倾斜放置待清洗基板130，底部支撑架141所在平面与清洗支撑架142所在平面之间形成一预定的夹角，使得放置在清洗支撑架142上的待清洗基板130与清洗槽110底部平面之间也形成一相应的夹角。优选的，底部支撑架141所在平面与清洗支撑架142所在平面之间为30-45度，使得待清洗基板130与清洗槽110底部平面之间亦为30-45度。双频率超声波的清洗效果与待清洗基板130与清洗槽110底部平面夹角也有很大的联系，经实验证明，当待清洗基板130与清洗槽110底部平面之间的夹角为30-45度时可以达到最佳的清洗效果，具体可参见下述的实验数据。
下面通过实验数据说明当待清洗基板130与清洗槽110底部平面之间的夹角为30-45度时可以达到最佳的清洗效果。具体参见图6和图7，其中图6为待清洗基板130与清洗槽110底部平面的夹角与粒径为2.0微米和2.5微米的剩余颗粒的数量的关系曲线图，图7为待清洗基板130与清洗槽110底部平面的夹角与粒径为1.2微米和2.2微米的剩余颗粒的数量的关系曲线图，其中X1为待清洗基板130与清洗槽110底部平面的夹角，Y0为粒径为2.0微米的剩余颗粒的数量，Y1为粒径为2.5微米的剩余颗粒的数量，Y2为粒径为2.2微米的剩余颗粒的数量，Y3为粒径为1.2微米的剩余颗粒的数量。采用液体粒子计数仪对液体中不同粒径的颗粒数量进行统计来表征玻璃基板样品表面的洁净程度，从图6中可以看出，在其它的实验参数均相同的情况下，当待清洗基板130与清洗槽110底部平面之间的夹角大于45度或小于30度时，2.0微米的剩余颗粒和2.5微米的剩余颗粒的数量都有较大程度的增加。从图7中也可以看出当待清洗基板130与清洗槽110底部平面之间的夹角大于45度或小于30度时，1.2微米的剩余颗粒和2.2微米的剩余颗粒的数量也有较大程度的增加，而其他的实验参数均相同。因此可以得出当待清洗基板130与清洗槽110底部平面之间的夹角为30-45度时可以达到双频率超声波清洗的最佳清洗效果。
本发明还涉及一种玻璃基板的清洗方法，具体请参加图8，图8为本发明的玻璃基板的清洗方法的优选实施例的流程图。该玻璃基板的清洗方法开始于：
步骤801，将待清洗基板130放置到清洗槽110中的基板放置支架140上，
步骤802，在所述清洗槽110中注入清洗液并使所述清洗液覆盖所述待清洗基板130,
步骤803，在清洗槽110中同时发出第一频率的超声波和第二频率的超声波对所述待清洗基板130进行超声波清洗。
步骤801具体为：
步骤8011，在清洗槽110的两侧设置用于发出第一频率的超声波的第一频率发生器121以及用于发出第二频率的超声波的第二频率发生器122，所述第一频率发生器121的振子和所述第二频率发生器122的振子成行间隔分布，频率发生器（第一频率发生器121与第二频率发生器122）的相邻振子的间隔为15-50厘米，其中第一频率的范围优选为40-70千赫兹，第二频率的范围优选为120-170千赫兹。
步骤8012，将基板放置支架140放到清洗槽110中，其中基板放置支架140的底部支撑架141所在平面和倾斜支撑架142所在平面之间的夹角为30-45度，然后将待清洗基板130放置到倾斜支撑架142上使得待清洗基板130与清洗槽110的底部平面之间的夹角为30-45度。
步骤802具体为在清洗槽110中注入清洗液（例如去离子水）使清洗液覆盖整个待清洗基板130。
步骤803具体为启动频率发生器发出超声波对待清洗基板130进行清洗，其中第一频率发生器121的振子发出第一频率的超声波对待清洗基板130进行超声波清洗，第二频率发生器122的振子同时发出第二频率的超声波对待清洗基板130进行超声波清洗。
步骤803的清洗时间优选为200-280秒，可以一次性清洗200-280秒，这样可以节省操作工序。或者也可以分多次清洗，例如清洗3次，每次90秒，这样可以达到更佳的清洗效果。使用者可以根据需要选择适当的方式。
本发明的玻璃基板的清洗装置及清洗方法使用设置有两种频率的频率发生器，不同频率的超声波可以有效的去除不同粒径尺寸的颗粒。并且采用两种频率的超声波同时进行玻璃基板表面的清洗可以使得不同频率的超声波进行相互叠加，有效的消除了单频率超声波清洗时产生的驻波等相干效应。同时频率发生器的功率可调，使用者可以根据玻璃基板表面的脏污程度控制超声波的输出功率。
这里优选采用两种差异较大的频率的超声波同时进行玻璃基板的清洗不仅可以有效的去除多种不同粒径尺寸的颗粒，而且两种超声波的频率差异较大可以较好的消除超声波清洗时产生的驻波等相干效应。本发明的超声波频率范围较广，因此可清除的颗粒的粒径范围也较大，从而可节省清洗装置的费用投入以及所消耗的制程时间，节约的生产成本。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。
 本发明的实施方式
工业实用性
序列表自由内容

Claims (15)

  1. 一种玻璃基板的清洗装置，包括清洗槽，其特征在于，所述清洗装置包括：
    用于发出第一频率的超声波的第一频率发生器；以及
    用于发出第二频率的超声波的第二频率发生器；
    所述第一频率发生器与所述第二频率发生器设置在所述清洗槽的两侧；
    所述第一频率发生器与所述第二频率发生器均具有振子，所述振子露出于所述清洗槽的内壁，且所述第一频率发生器的振子和所述第二频率发生器的振子成行间隔分布；
    所述第一频率的范围为40-70千赫兹，所述第二频率的范围为120-170千赫兹。
  2. 根据权利要求1所述的玻璃基板的清洗装置，其特征在于，所述第一频率发生器与所述第二频率发生器的相邻振子的间隔为15-50厘米。
  3. 根据权利要求1所述的玻璃基板的清洗装置，其特征在于，所述玻璃基板的清洗装置还包括基板放置支架，所述基板放置支架置于所述清洗槽中，用于放置待清洗基板，使所述待清洗基板与所述清洗槽的底部平面的夹角为30-45度。
  4. 根据权利要求3所述的玻璃基板的清洗装置，其特征在于，所述基板放置支架包括用于与所述清洗槽的底部接触的底部支撑架以及至少一个用于倾斜放置所述待清洗基板的倾斜支撑架，所述底部支撑架所在平面与所述倾斜支撑架所在平面之间的夹角为30-45度。
  5. 一种玻璃基板的清洗装置，包括清洗槽，其特征在于，所述清洗装置包括：
    用于发出第一频率的超声波的第一频率发生器；以及
    用于发出第二频率的超声波的第二频率发生器；
    所述第一频率发生器与所述第二频率发生器设置在所述清洗槽的两侧。
  6. 根据权利要求5所述的玻璃基板的清洗装置，其特征在于，所述第一频率的范围为40-70千赫兹，所述第二频率的范围为120-170千赫兹。
  7. 根据权利要求5所述的玻璃基板的清洗装置，其特征在于，所述第一频率发生器与所述第二频率发生器均具有振子，所述振子露出于所述清洗槽的内壁，且所述第一频率发生器的振子和所述第二频率发生器的振子成行间隔分布。
  8. 根据权利要求7所述的玻璃基板的清洗装置，其特征在于，所述第一频率发生器与所述第二频率发生器的相邻振子的间隔为15-50厘米。
  9. 根据权利要求5所述的玻璃基板的清洗装置，其特征在于，所述玻璃基板的清洗装置还包括基板放置支架，所述基板放置支架置于所述清洗槽中，用于放置待清洗基板，使所述待清洗基板与所述清洗槽的底部平面的夹角为30-45度。
  10. 根据权利要求9所述的玻璃基板的清洗装置，其特征在于，所述基板放置支架包括用于与所述清洗槽的底部接触的底部支撑架以及至少一个用于倾斜放置所述待清洗基板的倾斜支撑架，所述底部支撑架所在平面与所述倾斜支撑架所在平面之间的夹角为30-45度。
  11. 一种玻璃基板的清洗方法，其特征在于，包括步骤：
    A、将待清洗基板放置到清洗槽中；
    B、在所述清洗槽中注入清洗液并使所述清洗液覆盖所述待清洗基板；
    C、在所述清洗槽中同时发出第一频率的超声波和第二频率的超声波对所述待清洗基板进行超声波清洗。
  12. 根据权利要求11所述的玻璃基板的清洗方法，其特征在于，所述第一频率的范围为40-70千赫兹，所述第二频率的范围为120-170千赫兹。
  13. 根据权利要求11所述的玻璃基板的清洗方法，其特征在于，所述步骤A之前还包括步骤：
    在所述清洗槽的两侧设置用于发出第一频率的超声波的第一频率发生器以及用于发出第二频率的超声波的第二频率发生器，所述第一频率发生器的振子和所述第二频率发生器的振子成行间隔分布，所述第一频率发生器与所述第二频率发生器的相邻振子的间隔为15-50厘米。
  14. 根据权利要求11所述的玻璃基板的清洗方法，其特征在于，所述步骤A具体为：将基板放置支架置于所述清洗槽中，随后将所述待清洗基板放置到所述清洗槽中的所述基板放置支架上使所述待清洗基板与所述清洗槽的底部平面的夹角为30-45度。
  15. 根据权利要求11所述的玻璃基板的清洗方法，其特征在于，所述步骤C的清洗时间为200-280秒。
PCT/CN2011/083735 2011-12-07 2011-12-09 玻璃基板的清洗装置及清洗方法 WO2013082796A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US13/381,300 US20130146085A1 (en) 2011-12-07 2011-12-09 Glass substrate cleaning apparatus and cleaning method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201110403570.1 2011-12-07
CN2011104035701A CN102489470A (zh) 2011-12-07 2011-12-07 玻璃基板的清洗装置及清洗方法

Publications (1)

Publication Number Publication Date
WO2013082796A1 true WO2013082796A1 (zh) 2013-06-13

Family

ID=46181354

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2011/083735 WO2013082796A1 (zh) 2011-12-07 2011-12-09 玻璃基板的清洗装置及清洗方法

Country Status (2)

Country Link
CN (1) CN102489470A (zh)
WO (1) WO2013082796A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113441473A (zh) * 2021-07-02 2021-09-28 中国科学院长春光学精密机械与物理研究所 一种清洗工装
CN114147000A (zh) * 2021-11-12 2022-03-08 彩虹（合肥）液晶玻璃有限公司 一种玻璃板a型架清理装置

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2703094B1 (en) * 2012-08-27 2019-10-02 IMEC vzw A system for delivering ultrasonic energy to a liquid and its use for cleaning of solid parts
CN104338725A (zh) * 2013-07-31 2015-02-11 南昌欧菲光科技有限公司 板状物手工清洗装置
CN103736690B (zh) * 2013-12-31 2018-12-18 上海集成电路研发中心有限公司 硅片清洗方法
CN104241541B (zh) 2014-09-15 2016-12-14 京东方科技集团股份有限公司 有机电致发光器件及显示装置
CN104923534B (zh) * 2015-05-22 2017-11-14 合肥京东方光电科技有限公司 面板配向膜清除设备
CN106391557A (zh) * 2015-07-28 2017-02-15 中国科学院微电子研究所 一种用于半导体基片兆声波清洗装置
CN106623237B (zh) * 2016-11-17 2022-04-22 天津滨海光热反射技术有限公司 应用于厚度1-4mm的薄玻璃基板的转举式连续清洗系统及清洗方法
CN106670180B (zh) * 2016-11-17 2022-04-22 天津滨海光热反射技术有限公司 应用于厚度1-4mm的薄玻璃基板的清洗装置及清洗方法
CN106623238B (zh) * 2016-11-17 2022-04-22 天津滨海光热反射技术有限公司 应用于厚度1-4mm的薄玻璃基板吸取转移式连续清洗系统及清洗方法
CN108188099A (zh) * 2018-01-30 2018-06-22 长江大学 一种家用柔性结构水垢清除装置及方法
CN112007908A (zh) * 2020-09-07 2020-12-01 成都光明光电股份有限公司 光学成像非球面透镜模仁清洗方法及其装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6019852A (en) * 1997-10-31 2000-02-01 Pedziwiatr; Michael P. Ultrasonic cleaning method in which ultrasonic energy of different frequencies is utilized simultaneously
CN101052478A (zh) * 2004-10-12 2007-10-10 株式会社日立工业设备技术 超声波清洗装置
CN101084586A (zh) * 2003-11-05 2007-12-05 顶峰集团有限公司 采用多个频率的换能器的超声波处理方法和设备
CN101373706A (zh) * 2007-08-21 2009-02-25 大日本网屏制造株式会社 基板清洗装置及基板清洗方法
CN201959950U (zh) * 2011-01-07 2011-09-07 浙江宝纳钢管有限公司 一种超声波清洗设备

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2832443B2 (ja) * 1988-11-22 1998-12-09 本多電子株式会社 マルチ周波数超音波洗浄方法及び洗浄装置
JPH08141527A (ja) * 1994-11-21 1996-06-04 Otsuka Giken Kogyo Kk 超音波洗浄装置
JPH10277508A (ja) * 1997-04-08 1998-10-20 Toppan Printing Co Ltd 超音波洗浄装置
CN101143363A (zh) * 2007-09-25 2008-03-19 鄞云光 超声波多频清洗机
CN101884986A (zh) * 2010-07-16 2010-11-17 上海集成电路研发中心有限公司 半导体器件清洗装置及方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6019852A (en) * 1997-10-31 2000-02-01 Pedziwiatr; Michael P. Ultrasonic cleaning method in which ultrasonic energy of different frequencies is utilized simultaneously
CN101084586A (zh) * 2003-11-05 2007-12-05 顶峰集团有限公司 采用多个频率的换能器的超声波处理方法和设备
CN101052478A (zh) * 2004-10-12 2007-10-10 株式会社日立工业设备技术 超声波清洗装置
CN101373706A (zh) * 2007-08-21 2009-02-25 大日本网屏制造株式会社 基板清洗装置及基板清洗方法
CN201959950U (zh) * 2011-01-07 2011-09-07 浙江宝纳钢管有限公司 一种超声波清洗设备

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113441473A (zh) * 2021-07-02 2021-09-28 中国科学院长春光学精密机械与物理研究所 一种清洗工装
CN114147000A (zh) * 2021-11-12 2022-03-08 彩虹（合肥）液晶玻璃有限公司 一种玻璃板a型架清理装置

Also Published As

Publication number Publication date
CN102489470A (zh) 2012-06-13

Similar Documents

Publication Publication Date Title
WO2013082796A1 (zh) 玻璃基板的清洗装置及清洗方法
CN102601074B (zh) Tft-lcd玻璃基板清洗方法
CN204638638U (zh) 一种口服液瓶超声波洗涤干燥装置
CN203356124U (zh) 超声波清洗架
US20130146085A1 (en) Glass substrate cleaning apparatus and cleaning method
CN107096782A (zh) 一种MicroLED玻璃基板超声波清洗方法
KR20160008535A (ko) 초음파 세정장치 및 세정방법
KR100979568B1 (ko) 초음파 정밀세정장치
JP3997150B2 (ja) 基板製造装置および製造方法
JP2019145672A (ja) 洗浄装置
CN206375824U (zh) 一种玻璃清洗镀膜装置
CN103691714B (zh) 一种清洗装置和清洗方法
KR100652040B1 (ko) 유리기판 식각장치
JP3153717B2 (ja) バッチ型ブラシ洗浄装置
CN205557086U (zh) 一种微型超声波清洗装置
CN211629045U (zh) 一种双晶圆反应腔式去胶机
CN102430543B (zh) 晶圆的清洗装置及清洗方法
KR100694798B1 (ko) 기판의 세정 방법
CN201459429U (zh) 用于玻纤布生产过程中使用的水洗槽装置
JP2009231668A (ja) 基板処理装置および基板処理方法
JP2009231667A (ja) 基板処理方法および基板処理装置
CN211437265U (zh) 一种导电膜玻璃清洗装置
CN217665106U (zh) 一种医疗器械零部件的浸泡清洗设备
CN217141499U (zh) 一种玻璃残胶超声波强力去除装置
JP6043084B2 (ja) 半導体基板の洗浄方法および洗浄装置

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 13381300

Country of ref document: US

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 11877065

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 11877065

Country of ref document: EP

Kind code of ref document: A1