WO2013073734A1 - Procédé de revêtement de diamant des deux surfaces latérales d'un insert et insert revêtu de diamant fabriqué par ledit procédé - Google Patents

Procédé de revêtement de diamant des deux surfaces latérales d'un insert et insert revêtu de diamant fabriqué par ledit procédé Download PDF

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Publication number
WO2013073734A1
WO2013073734A1 PCT/KR2011/009648 KR2011009648W WO2013073734A1 WO 2013073734 A1 WO2013073734 A1 WO 2013073734A1 KR 2011009648 W KR2011009648 W KR 2011009648W WO 2013073734 A1 WO2013073734 A1 WO 2013073734A1
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WO
WIPO (PCT)
Prior art keywords
insert
diamond
coating
filament
diamond coating
Prior art date
Application number
PCT/KR2011/009648
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English (en)
Korean (ko)
Inventor
홍성필
강재훈
이성구
안승수
박제훈
안선용
Original Assignee
한국야금 주식회사
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Application filed by 한국야금 주식회사 filed Critical 한국야금 주식회사
Publication of WO2013073734A1 publication Critical patent/WO2013073734A1/fr

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only
    • C23C16/27Diamond only
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23BTURNING; BORING
    • B23B27/00Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
    • B23B27/14Cutting tools of which the bits or tips or cutting inserts are of special material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582Rigid and flat substrates, e.g. plates or discs
    • C23C16/4587Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially vertically
    • C23C16/4588Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially vertically the substrate being rotated
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23BTURNING; BORING
    • B23B2226/00Materials of tools or workpieces not comprising a metal
    • B23B2226/31Diamond
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23BTURNING; BORING
    • B23B2226/00Materials of tools or workpieces not comprising a metal
    • B23B2226/31Diamond
    • B23B2226/315Diamond polycrystalline [PCD]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23BTURNING; BORING
    • B23B2228/00Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
    • B23B2228/10Coatings

Definitions

  • the present invention relates to a method for performing a wear-resistant diamond coating on the surface of an insert for cutting tools and a double-sided diamond coating insert manufactured by the method, and more specifically, to a diamond coating that has been conventionally performed on only one side of the insert.
  • the present invention relates to a coating method and a double-sided diamond coating insert manufactured thereby, which can form a diamond coating film on both sides at almost the same cost, thereby dramatically increasing the utilization of the insert.
  • Diamond is one of the hardest materials in the world.
  • Today, diamond-coated cutting tools artificially produced by CVD are used as tools suitable for machining difficult-to-machine, aluminum-silicon or magnesium alloys and graphite materials.
  • a diamond coating film is formed by chemical vapor deposition (CVD) which is converted into plasma or thermal energy by various power sources (direct current, alternating current, high frequency, microwave) in a mixed gas atmosphere including hydrocarbons.
  • CVD chemical vapor deposition
  • power sources direct current, alternating current, high frequency, microwave
  • examples include hot filament, combustion flame, DC glow discharge plasma, arc glow discharge plasma jet, microwave plasma method, and the like.
  • the thermal filament method is generally used for the coating for cemented carbide cutting tools.
  • a plurality of copper plates disposed at a predetermined interval in the chamber as shown in FIG.
  • the heat filament device including tungsten wires (W wires) arranged in parallel, inserts are arranged at predetermined intervals using vertical jigs, and then the copper plate is powered to provide high temperature resistance to the tungsten wires.
  • a reaction gas containing a hydrocarbon was injected into the CVD apparatus to form a diamond coating film on the upper surface of the insert.
  • the present invention is to solve the above-mentioned problems of the prior art, to solve the problem to provide a coating method that can form a diamond coating film on both sides of the insert relatively uniformly at the same cost as the conventional coating method. do.
  • Another object of the present invention is to provide an insert in which a diamond coating film is formed on both surfaces manufactured by the above method.
  • the present invention is a method of coating a diamond thin film on the surface of the insert, in the CVD apparatus, by performing diamond coating while rotating one or more inserts, diamond coating layers are formed on both sides of the insert It provides a method characterized in that.
  • the CVD apparatus includes a hot filament, a combustion flame, a dc glow discharge plasma, an arc glow discharge plasma jet, It may be one using a method selected from microwave plasma and high frequency.
  • the CVD apparatus is a thermal filament type apparatus, and the one or more inserts are preferably arranged in parallel with the filament with a major cut face.
  • the rotation of the insert may be continuous or intermittent.
  • the one or more inserts are fixed to a jig, the jig being formed extending in the longitudinal direction and connected to the axis of rotation drive provided in the CVD apparatus, It may include a spacer which is inserted to form a predetermined interval between the insert, and a fixing means provided on one side or both sides of the shaft to press-fix the insert and the spacer.
  • the jig may be made of alumina, zirconia, graphite or metal.
  • the diamond coating by the thermal filament method when the diamond coating by the thermal filament method, the diamond coating, filament temperature 1900 ⁇ 2100 °C, insert temperature 750 ⁇ 900 °C, reaction gas CH 4 and H 2 mixed gas (CH 4 1 ⁇ 10%, H 2 90 ⁇ 99%) can be carried out under the conditions of the gas pressure 10 ⁇ 100 Torr, the distance between the insert and the filament 5 ⁇ 45mm, the filament applied current 130 ⁇ 160A, the insert rotation speed 1rpm or less.
  • the diamond coating layer has a sp3 structure of 60% or more, the layer thickness may be 0.1 ⁇ 25 ⁇ m.
  • the insert rotation speed is preferably 1 rpm or less, more preferably 0.01-0.5 rpm.
  • the insert is characterized in that a hole is formed.
  • Diamond coating method according to the present invention can be evenly coated on both sides of the insert at a time, it is possible to double the utilization compared to the conventional diamond coating insert consisting of only one-side coating.
  • the diamond coating method according to the present invention costs substantially the same coating cost as the conventional one-side diamond coating, thereby significantly increasing the efficiency of the insert.
  • FIG. 1 is a schematic view showing a diamond coating method according to the prior art.
  • FIG. 2 is a schematic view showing a diamond coating method according to the present invention.
  • FIG 3 is an exploded perspective view of a jig used for diamond coating according to an embodiment of the present invention.
  • FIG. 4 is a perspective view of an insert in which a hole used for diamond coating according to an embodiment of the present invention is formed.
  • FIG. 5 is a photograph showing a state after the insert is mounted on the diamond coating jig according to an embodiment of the present invention.
  • Figure 6 is a graph showing the Raman analysis results of the diamond coating film prepared according to an embodiment of the present invention.
  • Figure 7 is a graph showing the Raman analysis results of the diamond coating film prepared according to another embodiment of the present invention.
  • FIG. 8 is a scanning electron micrograph of the cross section and the surface of each corner portion of the insert coated with a diamond coating method according to an embodiment of the present invention.
  • the jig 1 used in the preferred embodiment of the present invention is arranged between the shaft 10 through the hole formed in the center of the insert, and between the insert and the insert fitted in the shaft.
  • the spacer 20 is formed, and the fixing means 30 for pressing and fixing the insert and the spacer 20 from one side or both sides of the shaft.
  • the shaft 10 has a circular cross section and has a circular rod shape whose diameter is slightly smaller than the diameter of a hole formed in the center of the insert, and a protruding spiral portion 11 is formed at one end of the shaft 10.
  • a circular rod was used in accordance with the shape of the hole of the insert as the shaft 10, it can be formed in various cross-sectional shapes, such as a polygonal shape, such as a triangle, a square.
  • the spacer 20 has a tubular shape with a hollow portion formed therein.
  • the diameter of the hollow portion is slightly larger than the diameter of the shaft 10 so that the spacer 20 can be inserted into the shaft 10, and the outer diameter of the spacer portion 20 is inserted into the center of the insert. It is larger than the diameter of the formed hole so that both sides of an insert can be contacted.
  • the surface 21 in contact with the insert of the side end portion of the spacer 20 is preferably made to have a predetermined surface roughness or more in order to provide frictional force, and if necessary, the surface may be uneven.
  • the fixing means 30 is composed of a member having a spiral formed therein that can be screwed with the spiral portion 11 of the shaft 10, the screwing direction is opposite to the rotation direction of the shaft 10 The screwing is prevented from loosening when the shaft 10 rotates.
  • any method can be used as long as it can fix the insert and the spacer 20, such as a clamp method.
  • Jig 1 according to the embodiment of the present invention having the above structure, as shown in Figure 2, first fastening the fixing means 30 to one end of the shaft 10, the spacer 20 And insert the insert 40 is formed in the center of the shaft alternately as shown in Figure 4, the other fixing means 30 is fixed by pressing the fixing means 30 on one side through the screw coupling. . Accordingly, the insert 40 is fixed to the shaft at intervals as long as the spacer 20.
  • the rotary drive means By rotating the jig (1) through the rotating the insert, the diamond coating is performed.
  • the rotation of the jig 1 can be continuously or intermittently, when performing intermittently, for example, coating can be performed while rotating in a step method such as a one-minute stop after 90 ° rotation. have.
  • the intermittent method has the advantage of being able to concentrate on the corners of the insert used for cutting, compared to the continuous method.
  • Diamond coating is made of filament temperature 1900 ⁇ 2100 °C, insert temperature 750 ⁇ 900 °C, reaction gas CH 4 and H 2 mixed gas (CH 4 1 ⁇ 10%, H 2 90 ⁇ 99%), gas pressure 10 ⁇ 100Torr, insert and The distance between the filament 5 ⁇ 45mm, filament applied current 130 ⁇ 160A, jig rotation speed of 1rpm or less, it is preferable to carry out under the conditions of the coating time 8 ⁇ 16 hours.
  • the reaction gas uses a mixed gas of methane and hydrogen and the mixing ratio is preferably mixed in a ratio of 1 to 10% methane, 90 to 99% hydrogen by volume ratio.
  • the gas pressure of the mixed gas is less than 10 Torr, it is difficult to control the temperature of the insert, diamond growth is unstable, and if it exceeds 100 Torr, 10 ⁇ 100 Torr is preferable because there is a difficulty in the front or bottom coating of the insert.
  • the insert when the insert is mounted, when the distance between the insert and the filament is less than 5 mm, the diamond growth is hindered by the strong electric field around the filament due to the application of the current. Do.
  • the applied current is less than 130A, graphite grows, and when it exceeds 160A, since it hinders diamond growth by a strong electric field, it is preferable to maintain 130 to 160A.
  • the jig rotation speed exceeds 1 rpm
  • the jig rotation speed is preferably set to 1 rpm or less, more preferably 0.01 to 0.5 rpm to prevent diamond growth.
  • the cutting tool insert which consists of cemented carbide and a hole with a diameter of about 5 mm, was placed together with a bulk diamond of 60 to 80 mesh and polished for 30 minutes using an ultrasonic cleaner to form a scratch on the tool surface. Thereafter, after etching for 30 minutes in Murakami solution and 10 seconds in aqua regia solution, ultrasonic cleaning using acetone as a medium was performed for 30 minutes and ultrasonic cleaning using distilled water for 30 minutes, respectively, to remove impurities.
  • the inserts from which impurities are removed are mounted on the jig 1 in the above-described manner, and as shown in FIG. 5, six inserts are held on one jig 1 by using the spacer 20 to maintain a predetermined interval.
  • the four jigs thus prepared were connected to the shaft of a rotation drive motor (not shown) inside the chamber of the thermal filament CVD apparatus as shown in FIG. 2 and mounted in parallel to the bottom of the thermal filament.
  • the spacing between the highest height of the insert and the thermal filament was maintained at 20 mm.
  • the CVD apparatus was operated while rotating the rotary drive motor at a speed of 0.5 rpm.
  • the specific CVD process conditions are maintained at 20 Torr by injecting hydrogen gas 990sccm and methane gas 10sccm, and the filament current is applied to 150A to generate a mixed gas plasma of hydrogen and methane to maintain the insert temperature at about 850 °C CVD coated diamond synthesis was carried out for 16 hours.
  • Table 1 a diamond coating film was obtained on the double-sided insert.
  • Example 2 a diamond coating film having an average thickness of 6 ⁇ m was formed in the same manner as in Example 1 except that the gas pressure of the mixed gas of the reaction gas, methane and hydrogen, was 80 Torr.
  • the coating film formed according to the embodiment of the present invention is made of diamond, specifically, the diamond coating film according to Example 1 was 92% of the sp3 structure, Example 2 The diamond coating film according to the sp3 structure was 73%.
  • the reason why the intensity of the sp3 peak of the diamond coating film according to Example 2 is low seems to be due to the relative increase in the intensity of the graphite peak of sp2 due to the increase in the interfacial area with the decrease in the particle size.
  • the diamond coating film is formed on both sides of the insert in one coating process.
  • the thicknesses of the coating films on the top and side of the corner 1 were measured at 12.6 ⁇ m and 12 ⁇ m, respectively, and the thicknesses of the coating films on the top and side of the corner 2 were measured at 5.7 ⁇ m and 7.1 ⁇ m, respectively.
  • the thicknesses of the coating films were measured to be 11.4 ⁇ m and 12 ⁇ m, and the thicknesses of the top and side surfaces of the corner 4 were 9.7 ⁇ m and 10.6 ⁇ m, respectively. That is, in the case of corners 1, 3, and 4, a coating film having a relatively even thickness was formed, and in the case of corner 2, it was confirmed that a film thickness enough to be used for a cutting tool was formed.
  • the diamond particle size of the formed thin film is formed in a relatively similar size of corners 1 to 4, respectively, 3.4 ⁇ m, 2.1 ⁇ m, 3.2 ⁇ m and 1.8 ⁇ m.
  • a diamond coating film can be formed on both sides of the insert to the extent that can be suitably used for cutting tools in a single coating process.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)

Abstract

La présente invention concerne un procédé de revêtement de diamant et un insert revêtu de diamant fabriqué par ledit procédé. Selon l'invention, un film de revêtement relativement uniforme peut être formé sur les deux surfaces latérales d'un insert d'un outil de coupe par exécution du revêtement de diamant, qui a été exécuté de façon classique sur une surface latérale de l'insert en raison de problèmes économiques, sur les deux surfaces latérales à un faible coût, de sorte que l'utilité de l'insert peut être augmentée. Le procédé de revêtement de diamant selon la présente invention exécute un revêtement de diamant, tout en faisant tourner un ou plusieurs inserts dans un dispositif à CVD, de sorte que la couche de revêtement de diamant peut être formée sur les deux surfaces latérales des inserts.
PCT/KR2011/009648 2011-11-14 2011-12-15 Procédé de revêtement de diamant des deux surfaces latérales d'un insert et insert revêtu de diamant fabriqué par ledit procédé WO2013073734A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020110118279A KR101329097B1 (ko) 2011-11-14 2011-11-14 인써트의 양면 다이아몬드 코팅방법과 이 방법으로 제조한 다이아몬드 코팅 인써트
KR10-2011-0118279 2011-11-14

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113913781A (zh) * 2021-10-11 2022-01-11 久钻科技(成都)有限公司 一种金刚石薄膜加工方法及装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101713379B1 (ko) 2014-10-14 2017-03-08 한국야금 주식회사 다이아몬드 코팅 절삭공구, 절삭공구의 다이아몬드 코팅방법, 및 이 코팅방법에 사용되는 코팅장치

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07150358A (ja) * 1993-12-01 1995-06-13 Shin Etsu Chem Co Ltd マイクロ波プラズマcvdによるダイヤモンド被覆方法
JP3249013B2 (ja) * 1994-06-06 2002-01-21 神港精機株式会社 プラズマcvd装置
JP2002239832A (ja) * 2001-02-13 2002-08-28 Kyowa Seisakusho:Kk 軸体における挿入物の移動装置及び移動方法
JP3750083B2 (ja) * 2002-08-20 2006-03-01 株式会社川瀬工具店 ダイヤモンドコーティング工業用刃物の製造方法
KR20070056580A (ko) * 2005-11-30 2007-06-04 주식회사 진우엔지니어링 Dlc 코팅장치
JP4232198B2 (ja) * 2003-12-24 2009-03-04 三菱マテリアル株式会社 非鉄材料の高速切削加工ですぐれた耐摩耗性を発揮する表面被覆超硬合金製切削工具の製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07150358A (ja) * 1993-12-01 1995-06-13 Shin Etsu Chem Co Ltd マイクロ波プラズマcvdによるダイヤモンド被覆方法
JP3249013B2 (ja) * 1994-06-06 2002-01-21 神港精機株式会社 プラズマcvd装置
JP2002239832A (ja) * 2001-02-13 2002-08-28 Kyowa Seisakusho:Kk 軸体における挿入物の移動装置及び移動方法
JP3750083B2 (ja) * 2002-08-20 2006-03-01 株式会社川瀬工具店 ダイヤモンドコーティング工業用刃物の製造方法
JP4232198B2 (ja) * 2003-12-24 2009-03-04 三菱マテリアル株式会社 非鉄材料の高速切削加工ですぐれた耐摩耗性を発揮する表面被覆超硬合金製切削工具の製造方法
KR20070056580A (ko) * 2005-11-30 2007-06-04 주식회사 진우엔지니어링 Dlc 코팅장치

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113913781A (zh) * 2021-10-11 2022-01-11 久钻科技(成都)有限公司 一种金刚石薄膜加工方法及装置

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