WO2013069440A1 - Abrasion method and device, and die - Google Patents

Abrasion method and device, and die Download PDF

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Publication number
WO2013069440A1
WO2013069440A1 PCT/JP2012/077210 JP2012077210W WO2013069440A1 WO 2013069440 A1 WO2013069440 A1 WO 2013069440A1 JP 2012077210 W JP2012077210 W JP 2012077210W WO 2013069440 A1 WO2013069440 A1 WO 2013069440A1
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WO
WIPO (PCT)
Prior art keywords
peeling
die
workpiece
tool
hole
Prior art date
Application number
PCT/JP2012/077210
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French (fr)
Japanese (ja)
Inventor
岩本 正己
大塚 保之
関 正行
Original Assignee
株式会社 アマダ
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Publication of WO2013069440A1 publication Critical patent/WO2013069440A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21DWORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS OR PROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21D28/00Shaping by press-cutting; Perforating
    • B21D28/02Punching blanks or articles with or without obtaining scrap; Notching
    • B21D28/12Punching using rotatable carriers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21DWORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS OR PROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21D28/00Shaping by press-cutting; Perforating
    • B21D28/24Perforating, i.e. punching holes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00Component parts such as frames, beds, carriages, headstocks
    • B24B41/04Headstocks; Working-spindles; Features relating thereto
    • B24B41/047Grinding heads for working on plane surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B55/00Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
    • B24B55/06Dust extraction equipment on grinding or polishing machines
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D13/00Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
    • B24D13/14Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by the front face
    • B24D13/145Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by the front face having a brush-like working surface

Definitions

  • the present invention relates to a peeling method [abrasion method] for peeling a surface layer of a plate-shaped workpiece punched by a punch press such as a turret punch press, a peeling processing device [abrasion apparatus] used in this method, It relates to a die used in the apparatus.
  • burrs When punching a plate-like workpiece with a punch press, burrs may be formed on the lower surface of the workpiece. Further, when nibbling is performed, burrs may be formed on the inner periphery of the punched hole.
  • Patent Document 1 discloses a deburring machine.
  • the lower surface of the workpiece is deburred by a rotating tool [rotating tool] (deburring tool) attached to a die of a punch press. Further, the lower surface of the workpiece is deburred by the deburring tool, and the swarf is sucked downward by the vacuum device. Therefore, scattering of the chips around is prevented.
  • rotating tool rotating tool
  • Patent Document 2 discloses a rotary cutting tool [rotational cutting tool].
  • This rotary cutting tool is a reamer or an end mill mounted on a punch holder of a punch press.
  • a chip scattering prevention mechanism is provided around the rotary cutting tool, and a mechanism for sucking and removing chips from an opening formed in the die is also provided. By these mechanisms, scattering of the chips around is prevented.
  • the die is perpendicularly opposed to the workpiece machining position, and the workpiece machining position and the die opening communicate with each other. Therefore, the chips generated at the processing position are quickly sucked and removed through the opening of the die.
  • the surface layer (oxide film layer, etc.) of the plate workpiece may be peeled off.
  • the surface layer of the workpiece is removed by a peeling processing tool [abrasion unit] attached to a punch holder of a punch press.
  • the peeling powder [abraded swarf] generated by the peeling processing is scattered on the workpiece surface unlike the devices and tools described in Patent Documents 1 and 2 described above.
  • the release powder scattered on the work surface falls from the punched hole onto the lower die holder. Therefore, it is necessary to clean the peeling powder that has dropped onto the die holder, which has been an obstacle to improving the operating rate of the punch press.
  • An object of the present invention is to provide a peeling processing method capable of collecting the peeling powder generated by the peeling processing without being scattered around, a peeling processing apparatus used in the method, and a die used in the peeling processing apparatus. It is in.
  • a first feature of the present invention is a peeling processing method for peeling a surface layer of a workpiece by a punch press having a punch holder having a vertically movable peeling tool and a die holder having a die having a die hole, The workpiece is held in a state in which a through-hole formed in the vicinity of the peeling processing portion on the workpiece is communicated with the die hole of the die, and is peeled to the peeling processing portion of the workpiece by the peeling processing tool.
  • a peeling processing method characterized in that, simultaneously with the processing, the peeling powder generated by the peeling processing is sucked into the die hole through the through hole.
  • a second feature of the present invention is a punch holder having a vertically movable peeling processing tool having a rotatable peeling tool and a scattering prevention portion provided so as to surround the peeling tool, and a die having a die hole
  • the peeling powder generated by the above is attached to the scattering prevention part, the work is moved so as to open at least a part of the die hole of the die, and a suction force is applied to the die to adhere to the scattering prevention part.
  • a release processing method is provided, wherein the release powder is sucked into the die hole.
  • the peeling powder is sucked by the suction force every predetermined time or every time the peeling portion of the workpiece is changed.
  • the release powder scattering prevention unit is brought close to the die hole. It is preferable that the peeling tool is lowered.
  • a peeling apparatus for use in the peeling method according to the first or second feature, wherein the punch holder includes a vertically movable peeling tool, and a die having a die hole.
  • a die holder having a cylindrical tool holder capable of moving vertically with respect to the punch holder, a rotary actuator provided inside the tool holder, and rotating by the rotary actuator.
  • the peeling tool provided at the lower part of the tool holder and the peeling tool which is provided so as to surround the peeling tool and rotated by the rotary actuator are brought into contact with the peeling processing portion of the workpiece to perform the peeling processing.
  • a scatter preventing portion for preventing scatter of the delamination powder generated during application, and the die supports the delamination portion of the workpiece from below. It is provided on a center of the die holes, to provide a release processing apparatus characterized by.
  • the scattering prevention part is configured as an annular body whose lower end can contact the work, and the outer diameter or maximum width of the work support part is smaller than the inner diameter of the annular body. preferable.
  • a third feature of the present invention is a die used for the peeling processing method of the first or second feature, wherein a die hole opened upward is formed in the die.
  • a die characterized in that a workpiece support portion for supporting a workpiece peeling process portion from below is provided at the center.
  • the die is provided with a flange extended outward, and the inner diameter of the die hole is increased by an inclined peripheral surface formed in the flange.
  • the work support portion is connected to the inner peripheral surface of the die hole by at least one connecting portion, and an upper edge of the connecting portion is set lower than an upper surface of the die. .
  • an exfoliation processing apparatus 1 includes an exfoliation processing tool [abrasion unit] 5 attached to a vertically movable punch holder (upper turret) 3 of a turret punch press, and a die holder (lower turret) of a punch press. And a die 9 attached to 7.
  • the peeling tool 5 has a cylindrical tool holder 11.
  • the tool holder 11 is supported by a lifter spring 13 provided in the punch holder 3 so as to be vertically movable.
  • a rotary actuator 12 such as a fluid pressure motor is provided so as to be vertically movable.
  • the rotary actuator 12 is biased upward with respect to the tool holder 11.
  • a rotation axis [rotary shaft] 12A of the rotary actuator 12 is connected to a tool attachment shaft [tool attachment shaft] 12B that can move vertically relative to the rotation axis 12A.
  • the tool attachment shaft 12B rotates integrally with the rotation shaft 12A.
  • a peeling tool [abrading rad tool] 15 is attached to the tool mounting shaft 12B in a replaceable manner.
  • the peeling tool 15 has a peeling part 16 such as a wire brush or a grindstone at its tip (lower end).
  • an annular elevating body 17 surrounding the peeling tool 15 is mounted so as to be vertically movable.
  • the elevating body 17 is urged downward by a coil spring (elastic member) 19 provided inside the tool holder 11.
  • the lifting body 17 has a scatter prevention part [scatter [prevention portion] 21 on its lower surface for preventing the scattering of the peeling powder generated when the peeling part 16 of the peeling tool 15 peels the surface of the workpiece W.
  • the scattering prevention part 21 of the present embodiment is configured such that a nylon brush is planted in an annular shape, and its tip (lower end) is in contact with the upper surface of the workpiece W.
  • the scattering prevention part 21 formed in an annular shape is also referred to as a ring-shaped element.
  • the scattering prevention part 21 is not limited to a brush, The material is not limited to nylon even if it is a brush.
  • the scattering prevention part 21 may be a cylindrical body in which a plurality of holes or slits for allowing air to flow from the outside to the inside are formed.
  • the cylindrical body is preferably formed of an elastic member such as rubber or resin.
  • the punch press is provided with a vertically movable striker (ram) ST for lowering the peeling tool 5 against the biasing force of the lifter spring 13 described above.
  • the vertical position of the striker ST can be adjusted.
  • a head portion [head] 23 that is pressed downward by the striker ST is provided on the upper part of the peeling processing tool 5.
  • the head unit 23 is connected to the rotary actuator 12.
  • the peeling tool 5 When the head part 23 is pressed downward by the striker ST, the peeling tool 5 is stroked downward against the lifter spring 13. And the scattering prevention part 21 contacts the upper surface of the workpiece
  • FIG. The peeling tool 15 is rotated in advance by the rotary actuator 12, and the surface layer of the workpiece W is peeled by the rotation of the peeling portion 16.
  • peeling powder is generated on the surface of the workpiece W.
  • the peeling powder scatters on the surface of the workpiece W and falls onto the die holder 7 from the through hole H punched into the workpiece W in advance.
  • the die 9 is detachably mounted in a die mounting hole 25 formed in the die holder 7 facing the peeling processing tool 5.
  • the die 9 has a cylindrical die body 27, and a die hole 29 penetrating vertically is formed in the die body 27.
  • a workpiece support portion 31 is provided that supports a portion of the workpiece W that contacts the peeling portion 16 from below.
  • the work support portion 31 of this embodiment has a solid cylindrical shape.
  • the work support part 31 is made smaller than the annular region of the scattering prevention part 21 (annular body).
  • the upper surface of the work support portion 31 is set to a height equal to the upper surface 27U of the die body 27.
  • the upper edge of the connecting portion [bridging portions] 33 that connects the workpiece support portion 31 and the inner surface of the die hole 29 is set lower than the upper surface of the workpiece support portion 31 and the upper surface 27U of the die body 27.
  • the upper edge of the connecting portion 33 may be set at the same height as the upper surface of the work support portion 31 (the upper surface 27U of the die body 27).
  • the die mounting hole 25 is connected to a vacuum device 30.
  • a suction force is generated in the die hole 29.
  • a circumferential groove 35 is formed on the outer periphery of the die body 27, and a plurality of inclined through holes 37 penetrating from the circumferential groove 35 to the vicinity of the lower end of the inner periphery of the die body 27 are formed.
  • an air supply device [air ⁇ ⁇ ⁇ supply device] 36 for supplying air to the circumferential groove 35 of the die body 27 mounted on the die holder 7 is provided.
  • suction force is generated at the opening of the die hole 29.
  • the first mechanism and the second mechanism described above are operated simultaneously, but only one of them may be operated. Alternatively, only one of the first mechanism and the second mechanism may be provided.
  • a through-hole H is required in the vicinity of the peeling processing portion on the workpiece W in order to collect the peeling. If the hole formed in the workpiece W communicates with the die hole 29 when the peeled portion on the workpiece W is set on the workpiece support portion 31, the hole may be used as the through hole H. If there is no such hole, a through hole H communicating with the die hole 29 is previously formed in the vicinity of the peeling portion on the workpiece W for the peeling processing.
  • the size of the through hole H is preferably substantially equal to the outer diameter of the peeling portion 16 of the peeling tool 15.
  • the through-hole H is formed in the workpiece W in advance (Step S0). Note that the through hole H is formed in the vicinity of the peeling portion of the workpiece W so as to communicate with the die hole 29 when the peeling portion on the workpiece W is set on the workpiece support 31.
  • the punch holder (upper turret) 3 and the die holder (lower turret) 7 are rotated to prepare the peeling tool 5 and the die 9 (step S1).
  • step S2 the peeled portion on the workpiece W is set on the workpiece support portion 31 (step S2).
  • step S2 the through hole H formed in the vicinity of the peeled portion of the workpiece W is in a state of communicating with the die hole 29.
  • the rotation of the peeling tool 15 is started, the vacuum device 30 is operated, and air is supplied from the air supply device 36 to the circumferential groove 35 (step S3).
  • a suction force is generated in the die hole 29 by the operation of the vacuum device 30 and the supply of air to the circumferential groove 35.
  • the stripping tool 5 is moved downward by the striker ST, and the stripping process on the workpiece W is performed by the stripping tool 15 (step S4).
  • the surface layer of the workpiece W is peeled off by the peeling portion 16 of the peeling tool 15 to generate peeling powder.
  • the exfoliated powder is collected (prevented from scattering) by the scattering prevention unit 21, and is sucked into the die hole 29 through the through hole H by the suction force generated in the die hole 29 (step S5).
  • the through hole H is located between the outer periphery of the work support portion 31 and the inner periphery of the die hole 29 and communicates with the die hole 29. Therefore, the peeling powder immediately after being generated by the peeling portion 16 and the peeling powder collected by the scattering prevention portion 21 are sucked into the die hole 29 through the through hole H. In this way, the release powder is collected through the die hole 29, and scattering onto the workpiece W is prevented.
  • step S6 it is determined whether or not there is another peeling processed part.
  • step 6 it is determined whether or not there is another peeling processed part.
  • step 6 is affirmed, the workpiece W is moved, the next separation processing portion is set to the workpiece support 31, and the same processing is performed (processing returns to step S2).
  • step 6 is negative, the peeling process is terminated, the rotation of the peeling tool 15 is stopped, and the vacuum device 30 and the air supply device 36 are also stopped (step S7).
  • the lower surface of the peeling process part of the work W is supported by the work support part 31. For this reason, even if the workpiece W is thin, the peeling process can be performed satisfactorily without bending the workpiece W. Further, since the upper edge of the connecting portion 33 is set lower than the upper surface of the die 9 (that is, the upper surface 27U of the die body 27 and the upper surface of the work support portion 31), the workpiece W is removed by the peeling powder adhering to the connecting portion 33. There is no scratch on the lower surface of the.
  • the die 9 may be provided with an [expanded outward] flange F extended outward.
  • the flange F is in contact with the upper surface of the die holder 7.
  • the inclined peripheral surface FO can be formed, and the die hole 29 having an inner diameter larger than the die hole 29 shown in FIG. 1 described above can be formed.
  • a suction force can be applied in a wider range, so that it is possible to cope with a long distance to the through hole H formed in the vicinity of the peeling processed portion. Therefore, it can suppress forming the through-hole H only for peeling processing.
  • step S1 the punch holder (upper turret) 3 and the die holder (lower turret) 7 are rotated to prepare the peeling tool 5 and the die 9 (step S1).
  • step S2 the peeling process part on the workpiece
  • work W is set to the workpiece
  • step S3A The stripping tool 5 is moved downward by the striker ST, and the stripping process on the workpiece W is performed by the stripping tool 15 (step S4A).
  • step S4 in the peeling processing shown in FIG. 3 the peeling processing of one peeling processing portion was performed, but in step S4A in this modified example, the peeling processing of a plurality of peeling processing portions is continuously performed. Can be broken.
  • step S50 it is determined whether or not a predetermined time has elapsed from the start of the peeling process (step S50). If step S50 is negative, the peeling process is continued as it is (the treatment continues the process of step S4A). On the other hand, if step S50 is negative, the workpiece W is moved after the rotation of the peeling tool 15 is stopped and the peeling tool 5 is moved upward in order to collect the collected peeling powder. Thus, at least a part (preferably all) of the die hole 29 is opened (step S51). For opening the die hole 29, a punched hole formed by punching may be used, or an outline of the workpiece W may be used.
  • step S52 the vacuum device 30 is operated, and air is supplied from the air supply device 36 to the circumferential groove 35 (step S52).
  • the operation of the vacuum device 30 and the air supply device 36 may be performed prior to step S52.
  • the rotation of the peeling tool 15 is performed in step S3A in the same manner as in step S3 of the peeling processing shown in FIG. It may be started at the same time.
  • the stripping tool 5 is again moved downward by the striker ST (step S53), and the stripped powder collected in the scattering prevention unit 21 is sucked into the opened die hole 29 by the suction force generated in the die hole 29. (Step S5A). At this time, the scattering prevention part 21 is directly above the die hole 29. Therefore, the peeling powder collected by the scattering prevention unit 21 is sucked into the opened die hole 29. In this way, the release powder is collected through the die hole 29, and scattering onto the workpiece W is prevented. In step S5A, it is preferable that the stripping tool 5 is vibrated vertically by the striker ST to promote the detachment of the stripped powder from the scattering prevention unit 21.
  • step S6A it is determined whether or not a part to be processed remains to be processed.
  • step 6A the workpiece W 31 is set by moving the workpiece W to be processed, and the same processing is performed (the processing returns to step S2).
  • Step 6A is denied, the peeling processing is finished, and the vacuum device 30 and the air supply device 36 are stopped (Step S7A).
  • the peeling powder was collected every time the peeling process was performed. Instead of such a process, the peeling powder may be collected every time one peeling processing part is finished (another modified example).
  • Another modification of the peeling processing will be described with reference to the flowchart of FIG.
  • This other modified example is a modified example of the process of FIG. 3 described above and a modified example of the process of FIG.
  • step S1 the punch holder (upper turret) 3 and the die holder (lower turret) 7 are rotated to prepare the peeling tool 5 and the die 9 (step S1).
  • step S2 the peeling process part on the workpiece
  • work W is set to the workpiece
  • the stripping tool 5 is moved downward by the striker ST, and the stripping process on the workpiece W is performed by the stripping tool 15 (step S4).
  • the release powder is collected (prevented from scattering) by the scattering prevention unit 21. Note that in step S4 in the present modification, a peeling process for one peeling part is performed as in step S4 in the peeling process shown in FIG.
  • step S51 After the peeling process of one peeling part is completed, in order to collect the collected peeling powder, first, after the rotation of the peeling tool 15 is stopped and the peeling tool 5 is moved upward, The workpiece W is moved, and at least a part (preferably all) of the die hole 29 is opened (step S51).
  • a punched hole formed by punching may be used, or an outline of the workpiece W may be used.
  • step S52 the vacuum device 30 is operated, and air is supplied from the air supply device 36 to the circumferential groove 35 (step S52).
  • the operation of the vacuum device 30 and the air supply device 36 may be performed prior to step S52.
  • the rotation of the peeling tool 15 is performed in step S3A in the same manner as in step S3 of the peeling processing shown in FIG. It may be started at the same time.
  • the stripping tool 5 is again moved downward by the striker ST (step S53), and the stripped powder collected in the scattering prevention unit 21 is sucked into the opened die hole 29 by the suction force generated in the die hole 29. (Step S5A). At this time, the scattering prevention part 21 is directly above the die hole 29. Therefore, the peeling powder collected by the scattering prevention unit 21 is sucked into the opened die hole 29. In this way, the release powder is collected through the die hole 29, and scattering onto the workpiece W is prevented. In step S5A, it is preferable that the stripping tool 5 is vibrated vertically by the striker ST to promote the detachment of the stripped powder from the scattering prevention unit 21.
  • step S6A it is determined whether or not there is another peeling processing part.
  • step S6 it is determined whether or not there is another peeling processing part.
  • step 6 it is affirmed, the workpiece W is moved, the next separation processing portion is set to the workpiece support 31, and the same processing is performed (processing returns to step S2).
  • step 6 is negative, the peeling process is terminated, and the vacuum device 30 and the air supply device 36 are stopped (step S7A).
  • the workpiece W is moved to open at least a part of the die hole 29 to release the release powder into the die hole 29.
  • sucking it is not necessary to form the through hole H only for the peeling process. Accordingly, the appearance of the work W is improved.
  • a large amount of exfoliated powder adheres to the anti-scattering unit 21 by collecting the exfoliating powder attached to the anti-scattering unit 21 every predetermined time or for each exfoliation processing part. It can prevent, and scattering of peeling powder can be prevented effectively.

Abstract

In this abrasion method for abrading the surface layer of a workpiece by means of a punch press which is provided with a punch holder having a vertically moveable abrasion tool and with a die holder having a die with a die hole, the workpiece is held in a state in which a through-hole pre-formed in the vicinity of the abrasion portion of the workpiece is made to communicate with the die hole of the die, and, at the same time as the abrasion portion of the workpiece is abraded by means of the abrasion tool, abrasion dust generated by the abrasion is sucked into the die hole via the through-hole. This abrasion method makes it possible to recover abrasion dust generated by abrasion without scattering said dust in the surroundings.

Description

剥離加工方法及び装置、並びに、ダイPeeling method and apparatus, and die
 本発明は、例えばタレットパンチプレスなどのごときパンチプレスによって打抜き加工される板状ワークの表層を剥離する剥離加工方法[abrasion method]と、この方法に使用する剥離加工装置[abrasion apparatus]と、この装置で使用されるダイに関する。 The present invention relates to a peeling method [abrasion method] for peeling a surface layer of a plate-shaped workpiece punched by a punch press such as a turret punch press, a peeling processing device [abrasion apparatus] used in this method, It relates to a die used in the apparatus.
 パンチプレスで板状ワークに打抜き加工[punching]を行うと、ワーク下面にバリ[burr]が形成されることがある。また、ニブリング加工[nibbling]を行うと、打抜かれた孔の内周にバリが形成されることがある。 When punching a plate-like workpiece with a punch press, burrs may be formed on the lower surface of the workpiece. Further, when nibbling is performed, burrs may be formed on the inner periphery of the punched hole.
 下記特許文献1は、バリ取り装置[deburring machine]を開示している。このバリ取り装置では、パンチプレスのダイに取り付けられた回転工具[rotating tool](バリ取り工具[deburring tool])によって、ワーク下面のバリ取りが行われる。また、バリ取り工具によってワーク下面のバリ取りが行われると共に、バキューム装置によって切粉[swarf]が下方に吸引される。従って、切粉の周囲への飛散が防止される。 The following Patent Document 1 discloses a deburring machine. In this deburring apparatus, the lower surface of the workpiece is deburred by a rotating tool [rotating tool] (deburring tool) attached to a die of a punch press. Further, the lower surface of the workpiece is deburred by the deburring tool, and the swarf is sucked downward by the vacuum device. Therefore, scattering of the chips around is prevented.
 下記特許文献2は、回転切削工具[rotational cutting tool]を開示している。この回転切削工具は、パンチプレスのパンチホルダに装着されるリーマ[reamer]やエンドミル[end mill]である。回転切削工具の周囲には切粉飛散防止機構が設けられ、かつ、ダイに形成された開口から切粉を吸引除去する機構も設けられている。これらの機構によって、切粉の周囲への飛散が防止される。 The following Patent Document 2 discloses a rotary cutting tool [rotational cutting tool]. This rotary cutting tool is a reamer or an end mill mounted on a punch holder of a punch press. A chip scattering prevention mechanism is provided around the rotary cutting tool, and a mechanism for sucking and removing chips from an opening formed in the die is also provided. By these mechanisms, scattering of the chips around is prevented.
 特許文献1及び2に記載の装置や工具において、ダイはワークの加工位置に対して垂直に対向しており、かつ、ワークの加工位置とダイの開口とは連通している。従って、加工位置で発生した切粉は、ダイの開口を通して速やかに吸引されて除去される。 In the apparatuses and tools described in Patent Documents 1 and 2, the die is perpendicularly opposed to the workpiece machining position, and the workpiece machining position and the die opening communicate with each other. Therefore, the chips generated at the processing position are quickly sucked and removed through the opening of the die.
日本国特開平10-235434号公報Japanese Patent Laid-Open No. 10-235434 日本国特開2006-123063号公報Japanese Laid-Open Patent Publication No. 2006-123063
 一方、スポット溶接やスタッド溶接のための前処理として、板状ワークの表層(酸化膜層など)が剥離される場合がある。この剥離加工では、パンチプレスのパンチホルダに取り付けられた剥離加工工具[abrasion unit](剥離工具[abrasion tool])によってワークの表層を除去する。このような場合は、剥離加工によって生じた剥離粉[abraded swarf]は、上述した特許文献1及び2に記載の装置や工具とは異なり、ワーク表面に飛散する。ワーク表面に飛散した剥離粉は、打抜かれた孔から下方のダイホルダ上に落下する。従って、ダイホルダ上に落下した剥離粉を清掃が必要となり、パンチプレスの稼働率向上の障害となっていた。 On the other hand, as a pretreatment for spot welding or stud welding, the surface layer (oxide film layer, etc.) of the plate workpiece may be peeled off. In this peeling processing, the surface layer of the workpiece is removed by a peeling processing tool [abrasion unit] attached to a punch holder of a punch press. In such a case, the peeling powder [abraded swarf] generated by the peeling processing is scattered on the workpiece surface unlike the devices and tools described in Patent Documents 1 and 2 described above. The release powder scattered on the work surface falls from the punched hole onto the lower die holder. Therefore, it is necessary to clean the peeling powder that has dropped onto the die holder, which has been an obstacle to improving the operating rate of the punch press.
 本発明の目的は、剥離加工によって発生した剥離粉を周囲に飛散させることなく回収できる剥離加工方法と、この方法に使用する剥離加工装置と、この剥離加工装置で使用されるダイを提供することにある。 An object of the present invention is to provide a peeling processing method capable of collecting the peeling powder generated by the peeling processing without being scattered around, a peeling processing apparatus used in the method, and a die used in the peeling processing apparatus. It is in.
 本発明の第1の特徴は、垂直動可能な剥離加工工具を備えたパンチホルダ及びダイ孔を有するダイを備えたダイホルダを有するパンチプレスによってワークの表層を剥離する剥離加工方法であって、前記ワーク上の剥離加工部分の近傍に予め形成された貫通孔を、前記ダイの前記ダイ孔に連通させた状態で、前記ワークを保持し、前記剥離加工工具による前記ワークの前記剥離加工部分に剥離加工を施すと同時に、前記剥離加工によって生じた剥離粉を前記貫通孔を通して前記ダイ孔に吸引する、ことを特徴とする剥離加工方法を提供する。 A first feature of the present invention is a peeling processing method for peeling a surface layer of a workpiece by a punch press having a punch holder having a vertically movable peeling tool and a die holder having a die having a die hole, The workpiece is held in a state in which a through-hole formed in the vicinity of the peeling processing portion on the workpiece is communicated with the die hole of the die, and is peeled to the peeling processing portion of the workpiece by the peeling processing tool. Provided is a peeling processing method characterized in that, simultaneously with the processing, the peeling powder generated by the peeling processing is sucked into the die hole through the through hole.
 本発明の第2の特徴は、回転可能な剥離工具及び前記剥離工具を囲うように設けられた飛散防止部を有する、垂直動可能な剥離加工工具を備えたパンチホルダと、ダイ孔を有するダイを備えたダイホルダと、を有するパンチプレスによってワークの表層を剥離する剥離加工方法であって、前記剥離加工工具の前記剥離工具による前記ワークの剥離加工部分に剥離加工を施すと同時に、前記剥離加工によって生じた剥離粉を前記飛散防止部に付着させ、前記ダイの前記ダイ孔の少なくとも一部を開放するように前記ワークを移動し、前記ダイに吸引力を作用させて前記飛散防止部に付着させた前記剥離粉を前記ダイ孔に吸引する、ことを特徴とする剥離加工方法を提供する。 A second feature of the present invention is a punch holder having a vertically movable peeling processing tool having a rotatable peeling tool and a scattering prevention portion provided so as to surround the peeling tool, and a die having a die hole A peeling process method for peeling a surface layer of a workpiece by a punch press having a die holder, and simultaneously performing the peeling process on the peeling process portion of the workpiece by the peeling tool of the peeling tool. The peeling powder generated by the above is attached to the scattering prevention part, the work is moved so as to open at least a part of the die hole of the die, and a suction force is applied to the die to adhere to the scattering prevention part. A release processing method is provided, wherein the release powder is sucked into the die hole.
 ここで、前記吸引力による前記剥離粉の吸引を、所定時間毎、又は、前記ワークの前記剥離加工部分の変更毎に行う、ことが好ましい。 Here, it is preferable that the peeling powder is sucked by the suction force every predetermined time or every time the peeling portion of the workpiece is changed.
 また、前記ダイ孔の少なくとも一部を開放するように前記ワークを移動させた後で、かつ、前記吸引力による前記剥離粉の吸引の前に、前記剥離粉飛散防止部を前記ダイ孔に近づけるように前記剥離加工工具を下降させる、ことが好ましい。 In addition, after the workpiece is moved so as to open at least a part of the die hole, and before the release powder is sucked by the suction force, the release powder scattering prevention unit is brought close to the die hole. It is preferable that the peeling tool is lowered.
 本発明の第3の特徴は、前記第1又は第2の特徴の剥離加工方法に使用する剥離加工装置であって、垂直動可能な剥離加工工具を備えたパンチホルダと、ダイ孔を有するダイを備えたダイホルダと、を備え、前記剥離加工工具が、前記パンチホルダに対して垂直動可能な筒状の工具ホルダと、前記工具ホルダの内部に設けられた回転アクチュエータと、前記回転アクチュエータによって回転される、前記工具ホルダの下部に設けられた剥離工具と、前記剥離工具を囲うように設けられ、前記回転アクチュエータによって回転された前記前記剥離工具をワークの剥離加工部分に接触させて剥離加工を施す際に生じた剥離粉の飛散を防止する飛散防止部と、を備え、前記ダイが、前記ワークの前記剥離加工部分を下方から支持するワーク支持部を前記ダイ孔の中央に備えている、ことを特徴とする剥離加工装置を提供する。 According to a third aspect of the present invention, there is provided a peeling apparatus for use in the peeling method according to the first or second feature, wherein the punch holder includes a vertically movable peeling tool, and a die having a die hole. A die holder having a cylindrical tool holder capable of moving vertically with respect to the punch holder, a rotary actuator provided inside the tool holder, and rotating by the rotary actuator The peeling tool provided at the lower part of the tool holder and the peeling tool which is provided so as to surround the peeling tool and rotated by the rotary actuator are brought into contact with the peeling processing portion of the workpiece to perform the peeling processing. A scatter preventing portion for preventing scatter of the delamination powder generated during application, and the die supports the delamination portion of the workpiece from below. It is provided on a center of the die holes, to provide a release processing apparatus characterized by.
 ここで、前記飛散防止部が、下端をワークに接触可能な環状体として構成されており、前記ワーク支持部の外径又は最大幅が、前記環状体の内径よりも小さくされている、ことが好ましい。 Here, the scattering prevention part is configured as an annular body whose lower end can contact the work, and the outer diameter or maximum width of the work support part is smaller than the inner diameter of the annular body. preferable.
 本発明の第3の特徴は、前記第1又は第2の特徴の剥離加工方法に使用するダイであって、前記ダイには上方に開口されたダイ孔が形成されており、前記ダイ孔の中央にワークの剥離加工部分を下方から支持するワーク支持部が設けられている、ことを特徴とするダイを提供する。 A third feature of the present invention is a die used for the peeling processing method of the first or second feature, wherein a die hole opened upward is formed in the die. There is provided a die characterized in that a workpiece support portion for supporting a workpiece peeling process portion from below is provided at the center.
 ここで、前記ダイが、外方に拡設されたフランジを上部に備えており、前記ダイ孔の内径が、前記フランジに形成された傾斜周面によって拡径されている、ことが好ましい。 Here, it is preferable that the die is provided with a flange extended outward, and the inner diameter of the die hole is increased by an inclined peripheral surface formed in the flange.
 また、前記ワーク支持部が、前記ダイ孔の内周面と少なくとも一つの連結部によって連結されており、前記連結部の上縁が、前記ダイの上面よりも低く設定されている、ことが好ましい。 Further, it is preferable that the work support portion is connected to the inner peripheral surface of the die hole by at least one connecting portion, and an upper edge of the connecting portion is set lower than an upper surface of the die. .
 上記特徴によれば、ワークの剥離加工時に、剥離加工部分で発生された剥離粉をワーク上面に飛散させることなく回収することができる。 According to the above feature, it is possible to collect the peeling powder generated at the peeling processing portion without scattering on the upper surface of the workpiece during the workpiece peeling processing.
剥離加工装置の実施形態を示す側面図(一部断面図)である。It is a side view (partial sectional view) showing an embodiment of a peeling processing apparatus. 上記装置におけるダイの斜視図である。It is a perspective view of the die | dye in the said apparatus. 上記装置による剥離加工処理のフローチャートである。It is a flowchart of the peeling process process by the said apparatus. ダイの変形例を示す断面図である。It is sectional drawing which shows the modification of die | dye. 上記装置による剥離加工処理(変形例)のフローチャートである。It is a flowchart of the peeling process process (modification) by the said apparatus. 上記装置による剥離加工処理(別の変形例)のフローチャートである。It is a flowchart of the peeling process process (another modification) by the said apparatus.
 以下、図面を参照しつつ剥離加工装置(加工方法、及び、ダイ)の実施形態について説明する。図1に示されるように、剥離加工装置1は、タレットパンチプレスの垂直動可能なパンチホルダ(上部タレット)3に取り付けられた剥離加工工具[abrasion unit]5と、パンチプレスのダイホルダ(下部タレット)7に取り付けられたダイ9とを備えている。 Hereinafter, embodiments of a peeling processing apparatus (processing method and die) will be described with reference to the drawings. As shown in FIG. 1, an exfoliation processing apparatus 1 includes an exfoliation processing tool [abrasion unit] 5 attached to a vertically movable punch holder (upper turret) 3 of a turret punch press, and a die holder (lower turret) of a punch press. And a die 9 attached to 7.
 剥離加工工具5は、円筒形の工具ホルダ11を有している。工具ホルダ11は、パンチホルダ3に設けられたリフタースプリング13によって、垂直動可能に支持されている。工具ホルダ11内には、流体圧モータなどの回転アクチュエータ[rotary actuator]12が垂直動可能に設けられている。回転アクチュエータ12は、工具ホルダ11に対して上方にむけて付勢されている。回転アクチュエータ12の回転軸[rotary shaft]12Aには、回転軸12Aに対して相対的に垂直動可能な工具取付軸[tool attachment shaft]12Bが連結されている。工具取付軸12Bは、回転軸12Aと一体的に回転する。工具取付軸12Bには、剥離工具[abrading tool]15が交換可能に取り付けられている。剥離工具15は、その先端(下端)にワイヤブラシや砥石などの剥離部[abrading portion]16を有している。 The peeling tool 5 has a cylindrical tool holder 11. The tool holder 11 is supported by a lifter spring 13 provided in the punch holder 3 so as to be vertically movable. In the tool holder 11, a rotary actuator 12 such as a fluid pressure motor is provided so as to be vertically movable. The rotary actuator 12 is biased upward with respect to the tool holder 11. A rotation axis [rotary shaft] 12A of the rotary actuator 12 is connected to a tool attachment shaft [tool attachment shaft] 12B that can move vertically relative to the rotation axis 12A. The tool attachment shaft 12B rotates integrally with the rotation shaft 12A. A peeling tool [abrading rad tool] 15 is attached to the tool mounting shaft 12B in a replaceable manner. The peeling tool 15 has a peeling part 16 such as a wire brush or a grindstone at its tip (lower end).
 工具ホルダ11の下端内部には、剥離工具15を囲う環状の昇降体[elevation body]17が垂直動可能に装着されている。昇降体17は、工具ホルダ11の内部に設けられたコイルスプリング(弾性部材)19によって下方に付勢されている。昇降体17は、その下面に、剥離工具15の剥離部16によるワークWの表層への剥離加工時に生じる剥離粉の飛散を防止する飛散防止部[scatter prevention portion]21を有している。 In the lower end of the tool holder 11, an annular elevating body 17 surrounding the peeling tool 15 is mounted so as to be vertically movable. The elevating body 17 is urged downward by a coil spring (elastic member) 19 provided inside the tool holder 11. The lifting body 17 has a scatter prevention part [scatter [prevention portion] 21 on its lower surface for preventing the scattering of the peeling powder generated when the peeling part 16 of the peeling tool 15 peels the surface of the workpiece W.
 本実施形態の飛散防止部21は、ナイロンブラシが環状に植設されて構成されており、その先端(下端)がワークWの上面に接触される。以下、環状に形成された飛散防止部21を環状体[ring-shaped element]とも呼ぶ。なお、飛散防止部21は、ブラシに限定されないし、ブラシであってもその材質はナイロンに限定されない。例えば、飛散防止部21は、外側から内側へ空気を流入させる複数の孔又はスリットが形成された筒状体であってもよい。この場合、筒状体は、ゴムや樹脂などの弾性部材によって形成されることが好ましい。 The scattering prevention part 21 of the present embodiment is configured such that a nylon brush is planted in an annular shape, and its tip (lower end) is in contact with the upper surface of the workpiece W. Hereinafter, the scattering prevention part 21 formed in an annular shape is also referred to as a ring-shaped element. In addition, the scattering prevention part 21 is not limited to a brush, The material is not limited to nylon even if it is a brush. For example, the scattering prevention part 21 may be a cylindrical body in which a plurality of holes or slits for allowing air to flow from the outside to the inside are formed. In this case, the cylindrical body is preferably formed of an elastic member such as rubber or resin.
 パンチプレスは、上述したリフタースプリング13の付勢力に抗して剥離加工工具5を下降させるための垂直動可能なストライカ(ラム)STを備えている。ストライカSTの垂直位置は調節可能である。剥離加工工具5の上部には、ストライカSTによって下方に押圧されるヘッド部[head]23が設けられている。ヘッド部23は、回転アクチュエータ12と連結されている。 The punch press is provided with a vertically movable striker (ram) ST for lowering the peeling tool 5 against the biasing force of the lifter spring 13 described above. The vertical position of the striker ST can be adjusted. A head portion [head] 23 that is pressed downward by the striker ST is provided on the upper part of the peeling processing tool 5. The head unit 23 is connected to the rotary actuator 12.
 ストライカSTによってヘッド部23が下方に押圧されると、剥離加工工具5はリフタースプリング13に抗して下方にストロークされる。そして、飛散防止部21がワークWの上面に接触すると共に、剥離工具15の剥離部16もワークWの上面に接触する。剥離工具15は回転アクチュエータ12によって予め回転されており、剥離部16の回転によってワークWの表層が剥離される。 When the head part 23 is pressed downward by the striker ST, the peeling tool 5 is stroked downward against the lifter spring 13. And the scattering prevention part 21 contacts the upper surface of the workpiece | work W, and the peeling part 16 of the peeling tool 15 also contacts the upper surface of the workpiece | work W. FIG. The peeling tool 15 is rotated in advance by the rotary actuator 12, and the surface layer of the workpiece W is peeled by the rotation of the peeling portion 16.
 上述したように、剥離工具15によってワークWの表層を剥離すると、ワークWの表面に剥離粉が生じる。剥離粉はワークWの表面に飛散し、ワークWに予め打抜き加工された貫通孔Hからダイホルダ7上に落下する。 As described above, when the surface layer of the workpiece W is peeled off by the peeling tool 15, peeling powder is generated on the surface of the workpiece W. The peeling powder scatters on the surface of the workpiece W and falls onto the die holder 7 from the through hole H punched into the workpiece W in advance.
 そこで、本実施形態では、剥離粉の飛散を防止する機構が設けられている。この飛散防止機構機構を以下に説明する。ダイ9は、剥離加工工具5と対向するダイホルダ7に形成されたダイ装着孔25に着脱可能に装着されている。ダイ9は円筒状のダイ本体27を有しており、ダイ本体27には垂直に貫通するダイ孔29が形成されている。ダイ孔29の上部中央には、ワークWの剥離部16が接触する部分を下方から支持するワーク支持部31が設けられている。 Therefore, in the present embodiment, a mechanism for preventing the release powder from scattering is provided. This scattering prevention mechanism mechanism will be described below. The die 9 is detachably mounted in a die mounting hole 25 formed in the die holder 7 facing the peeling processing tool 5. The die 9 has a cylindrical die body 27, and a die hole 29 penetrating vertically is formed in the die body 27. In the upper center of the die hole 29, a workpiece support portion 31 is provided that supports a portion of the workpiece W that contacts the peeling portion 16 from below.
 図1及び図2に示されるように、本実施形態のワーク支持部31は中実円柱形状を有している。ワーク支持部31は、飛散防止部21(環状体)の環状領域よりも小さくされている。また、ワーク支持部31の上面は、ダイ本体27の上面27Uと等しい高さに設定されている。なお、ワーク支持部31とダイ孔29の内面とを連結する連結部[bridging portions]33の上縁は、ワーク支持部31の上面及びダイ本体27の上面27Uよりも低く設定することが望ましが、必ずしも低くしなければならないものではない。連結部33の上縁は、ワーク支持部31の上面(ダイ本体27の上面27U)と同じ高さに設定されてもよい。 As shown in FIGS. 1 and 2, the work support portion 31 of this embodiment has a solid cylindrical shape. The work support part 31 is made smaller than the annular region of the scattering prevention part 21 (annular body). Further, the upper surface of the work support portion 31 is set to a height equal to the upper surface 27U of the die body 27. In addition, it is desirable that the upper edge of the connecting portion [bridging portions] 33 that connects the workpiece support portion 31 and the inner surface of the die hole 29 is set lower than the upper surface of the workpiece support portion 31 and the upper surface 27U of the die body 27. However, it does not necessarily have to be low. The upper edge of the connecting portion 33 may be set at the same height as the upper surface of the work support portion 31 (the upper surface 27U of the die body 27).
 前記ダイ9におけるダイ孔29に吸引作用を生じさせるために、下記の二つの機構が設けられている。第1の機構では、ダイ装着孔25が、バキューム装置[vacuum device]30に接続されている。バキューム装置30を作動させると、ダイ孔29に吸引力が生じる。第2の機構では、ダイ本体27の外周に周溝35が形成されており、周溝35からダイ本体27の内周下端近傍まで貫通する複数の傾斜貫通孔37が形成されている。また、ダイホルダ7に装着されたダイ本体27の周溝35にエアーを供給するエアー供給装置[air supply device]36が設けられている。エアー供給装置36から周溝35にエアーを供給して、傾斜貫通孔37からダイ本体27内部下方に向けてエアーを噴射することで、ダイ孔29の開口に吸引力が生じる。本実施形態では、上述した第1の機構及び第2の機構が同時に作動されるが、いずれか一方のみが作動されてもよい。あるいは、第1の機構及び第2の機構いずれか一方のみしか設けられなくてもよい。 In order to cause the die hole 29 in the die 9 to have a suction action, the following two mechanisms are provided. In the first mechanism, the die mounting hole 25 is connected to a vacuum device 30. When the vacuum device 30 is operated, a suction force is generated in the die hole 29. In the second mechanism, a circumferential groove 35 is formed on the outer periphery of the die body 27, and a plurality of inclined through holes 37 penetrating from the circumferential groove 35 to the vicinity of the lower end of the inner periphery of the die body 27 are formed. Further, an air supply device [air 供給 す る supply device] 36 for supplying air to the circumferential groove 35 of the die body 27 mounted on the die holder 7 is provided. By supplying air from the air supply device 36 to the circumferential groove 35 and injecting air from the inclined through-hole 37 toward the inside of the die body 27, suction force is generated at the opening of the die hole 29. In the present embodiment, the first mechanism and the second mechanism described above are operated simultaneously, but only one of them may be operated. Alternatively, only one of the first mechanism and the second mechanism may be provided.
 上述した剥離加工装置によって剥離加工処理を行う場合には、剥離分の回収のために、ワークW上の剥離加工部分の近傍に貫通孔Hが必要となる。ワークW上の剥離加工部分がワーク支持部31にセットされたときに、ワークWに形成される孔がダイ孔29と連通する場合は、その孔を貫通孔Hとして活用すればよい。そのような孔がない場合は、剥離加工処理のために、ダイ孔29と連通する貫通孔HをワークW上の剥離加工部分の近傍に予め形成しておく。 When the peeling processing is performed by the above-described peeling processing apparatus, a through-hole H is required in the vicinity of the peeling processing portion on the workpiece W in order to collect the peeling. If the hole formed in the workpiece W communicates with the die hole 29 when the peeled portion on the workpiece W is set on the workpiece support portion 31, the hole may be used as the through hole H. If there is no such hole, a through hole H communicating with the die hole 29 is previously formed in the vicinity of the peeling portion on the workpiece W for the peeling processing.
 貫通孔Hは、ワークW上の剥離加工部分を間に介在させるように、二つ設けられることが好ましい。そして、貫通孔Hの大きさは、剥離工具15の剥離部16の外径にほぼ等しいことが好ましい。 It is preferable that two through holes H are provided so as to interpose a part to be peeled on the workpiece W. The size of the through hole H is preferably substantially equal to the outer diameter of the peeling portion 16 of the peeling tool 15.
 上述した剥離加工装置によって剥離加工処理について、図3のフローチャートを参照しつつ説明する。上述したように、ワークWには予め貫通孔Hが形成される(ステップS0)。なお、貫通孔Hは、ワークW上の剥離加工部分がワーク支持部31にセットされたときにはダイ孔29と連通するように、ワークWの剥離加工部分近傍に形成される。次いで、パンチホルダ(上部タレット)3及びダイホルダ(下部タレット)7が回転されて、剥離加工工具5及びダイ9が準備される(ステップS1)。 The peeling processing by the above-described peeling processing apparatus will be described with reference to the flowchart of FIG. As described above, the through-hole H is formed in the workpiece W in advance (Step S0). Note that the through hole H is formed in the vicinity of the peeling portion of the workpiece W so as to communicate with the die hole 29 when the peeling portion on the workpiece W is set on the workpiece support 31. Next, the punch holder (upper turret) 3 and the die holder (lower turret) 7 are rotated to prepare the peeling tool 5 and the die 9 (step S1).
 次に、ワークW上の剥離加工部分がワーク支持部31にセットされる(ステップS2)。このとき、上述したように、ワークWの剥離加工部分近傍に形成された貫通孔Hは、ダイ孔29と連通した状態となる。剥離工具15の回転が開始されると共に、バキューム装置30が作動され、エアー供給装置36から周溝35にエアーが供給される(ステップS3)。バキューム装置30の作動、及び、周溝35へのエアーの供給によって、ダイ孔29に吸引力が生じる。ストライカSTによって剥離加工工具5が下方に移動され、剥離工具15によってワークW上の剥離加工部分に剥離加工が施される(ステップS4)。 Next, the peeled portion on the workpiece W is set on the workpiece support portion 31 (step S2). At this time, as described above, the through hole H formed in the vicinity of the peeled portion of the workpiece W is in a state of communicating with the die hole 29. The rotation of the peeling tool 15 is started, the vacuum device 30 is operated, and air is supplied from the air supply device 36 to the circumferential groove 35 (step S3). A suction force is generated in the die hole 29 by the operation of the vacuum device 30 and the supply of air to the circumferential groove 35. The stripping tool 5 is moved downward by the striker ST, and the stripping process on the workpiece W is performed by the stripping tool 15 (step S4).
 ワークW上の剥離加工部分に剥離加工時には、剥離工具15の剥離部16によってワークWの表層が剥離されて剥離粉が生じる。剥離粉は、飛散防止部21によって捕集(飛散が防止)され、ダイ孔29に生じる吸引力によって、貫通孔Hを通してダイ孔29に吸引される(ステップS5)。このとき、貫通孔Hは、ワーク支持部31の外周とダイ孔29の内周との間に位置しており、かつ、ダイ孔29と連通している。従って、剥離部16によって発生された直後の剥離粉や、飛散防止部21によって捕集された剥離粉は、貫通孔Hを通してダイ孔29に吸引される。このように、剥離粉は、ダイ孔29を通して回収され、ワークW上への飛散が防止される。 At the time of peeling processing on the peeling portion on the workpiece W, the surface layer of the workpiece W is peeled off by the peeling portion 16 of the peeling tool 15 to generate peeling powder. The exfoliated powder is collected (prevented from scattering) by the scattering prevention unit 21, and is sucked into the die hole 29 through the through hole H by the suction force generated in the die hole 29 (step S5). At this time, the through hole H is located between the outer periphery of the work support portion 31 and the inner periphery of the die hole 29 and communicates with the die hole 29. Therefore, the peeling powder immediately after being generated by the peeling portion 16 and the peeling powder collected by the scattering prevention portion 21 are sucked into the die hole 29 through the through hole H. In this way, the release powder is collected through the die hole 29, and scattering onto the workpiece W is prevented.
 その後、他の剥離加工部分があるか否か判断される(ステップS6)。ステップ6が肯定される場合は、ワークWが移動されて次の剥離加工部分がワーク支持部31セットされ、同様の処理が行われる(処理がステップS2に戻る)。一方、ステップ6が否定される場合は、剥離加工処理が終了し、剥離工具15の回転が停止されると共に、バキューム装置30及びエアー供給装置36も停止される(ステップS7)。 Thereafter, it is determined whether or not there is another peeling processed part (step S6). When step 6 is affirmed, the workpiece W is moved, the next separation processing portion is set to the workpiece support 31, and the same processing is performed (processing returns to step S2). On the other hand, if step 6 is negative, the peeling process is terminated, the rotation of the peeling tool 15 is stopped, and the vacuum device 30 and the air supply device 36 are also stopped (step S7).
 なお、剥離加工時には、ワークWの剥離加工部分の下面はワーク支持部31によって支持される。このため、ワークWが薄くても、ワークWを撓ませることなく良好に剥離加工を行うことができる。また、連結部33の上縁がダイ9の上面(即ち、ダイ本体27の上面27U及びワーク支持部31の上面)よりも低く設定されているので、連結部33に付着した剥離粉によってワークWの下面に傷が付けられることもない。 In the peeling process, the lower surface of the peeling process part of the work W is supported by the work support part 31. For this reason, even if the workpiece W is thin, the peeling process can be performed satisfactorily without bending the workpiece W. Further, since the upper edge of the connecting portion 33 is set lower than the upper surface of the die 9 (that is, the upper surface 27U of the die body 27 and the upper surface of the work support portion 31), the workpiece W is removed by the peeling powder adhering to the connecting portion 33. There is no scratch on the lower surface of the.
 なお、本発明は上記実施形態に限定されず、発明の範囲内で適宜変更が可能である。例えば、図4に示されるように、ダイ9に、外方に拡設された[expanded outward]フランジFが設けられてもよい。フランジFは、ダイホルダ7の上面に接触する。フランジFを設けることによって傾斜周面FOを形成でき、上述した図1に示されるダイ孔29よりも大きな内径を有するダイ孔29を形成できる。このようなダイ孔29によれば、より広範囲に吸引力を作用させることができるので、剥離加工部分近傍に形成される貫通孔Hまでの距離が長くても対応できる。従って、剥離加工のためだけに貫通孔Hを形成することを抑制できる。 In addition, this invention is not limited to the said embodiment, In the range of invention, it can change suitably. For example, as shown in FIG. 4, the die 9 may be provided with an [expanded outward] flange F extended outward. The flange F is in contact with the upper surface of the die holder 7. By providing the flange F, the inclined peripheral surface FO can be formed, and the die hole 29 having an inner diameter larger than the die hole 29 shown in FIG. 1 described above can be formed. According to such a die hole 29, a suction force can be applied in a wider range, so that it is possible to cope with a long distance to the through hole H formed in the vicinity of the peeling processed portion. Therefore, it can suppress forming the through-hole H only for peeling processing.
 次に、上述した剥離加工装置を用いた剥離加工処理の変形例について、図5のフローチャートを参照しつつ説明する。ただし、本変形例では、剥離加工のためだけに用いられるための貫通孔Hを予め形成する必要はない。まず、パンチホルダ(上部タレット)3及びダイホルダ(下部タレット)7が回転されて、剥離加工工具5及びダイ9が準備される(ステップS1)。次に、ワークW上の剥離加工部分がワーク支持部31にセットされ(ステップS2)、剥離工具15の回転が開始される(ステップS3A)。ストライカSTによって剥離加工工具5が下方に移動され、剥離工具15によってワークW上の剥離加工部分に剥離加工が施される(ステップS4A)。このとき、剥離粉は、飛散防止部21によって捕集(飛散が防止)される。なお、図3に示される剥離加工処理におけるステップS4では一つの剥離加工部分の剥離加工処理が行われたが、本変形例におけるステップS4Aでは複数の剥離加工部分の剥離加工処理が連続して行われ得る。 Next, a modified example of the peeling processing using the peeling processing apparatus described above will be described with reference to the flowchart of FIG. However, in this modification, it is not necessary to previously form the through hole H to be used only for the peeling process. First, the punch holder (upper turret) 3 and the die holder (lower turret) 7 are rotated to prepare the peeling tool 5 and the die 9 (step S1). Next, the peeling process part on the workpiece | work W is set to the workpiece | work support part 31 (step S2), and rotation of the peeling tool 15 is started (step S3A). The stripping tool 5 is moved downward by the striker ST, and the stripping process on the workpiece W is performed by the stripping tool 15 (step S4A). At this time, the release powder is collected (prevented from scattering) by the scattering prevention unit 21. In addition, in step S4 in the peeling processing shown in FIG. 3, the peeling processing of one peeling processing portion was performed, but in step S4A in this modified example, the peeling processing of a plurality of peeling processing portions is continuously performed. Can be broken.
 次に、剥離加工開始から所定時間が経過したか否かが判断される(ステップS50)。ステップS50が否定される場合は、そのまま、剥離加工が続行される(処置はステップS4Aの処理を継続)。一方、ステップS50が否定される場合は、捕集された剥離粉を回収するために、まず、剥離工具15の回転が停止されて剥離加工工具5が上方に移動された後にワークWが移動されて、ダイ孔29の少なくとも一部(好ましくは全部)が開放される(ステップS51)。ダイ孔29の開放は、打抜き加工で形成された打ち抜き孔が利用されてもよいし、ワークWの外郭[outline]が利用されてもよい。 Next, it is determined whether or not a predetermined time has elapsed from the start of the peeling process (step S50). If step S50 is negative, the peeling process is continued as it is (the treatment continues the process of step S4A). On the other hand, if step S50 is negative, the workpiece W is moved after the rotation of the peeling tool 15 is stopped and the peeling tool 5 is moved upward in order to collect the collected peeling powder. Thus, at least a part (preferably all) of the die hole 29 is opened (step S51). For opening the die hole 29, a punched hole formed by punching may be used, or an outline of the workpiece W may be used.
 次に、バキューム装置30が作動され、エアー供給装置36から周溝35にエアーが供給される(ステップS52)。なお、バキューム装置30及びエアー供給装置36の作動は、ステップS52に先立って行われてもよく、例えば、図3に示される剥離加工処理のステップS3と同様に、ステップS3Aで剥離工具15の回転と同時に開始されてもよい。 Next, the vacuum device 30 is operated, and air is supplied from the air supply device 36 to the circumferential groove 35 (step S52). The operation of the vacuum device 30 and the air supply device 36 may be performed prior to step S52. For example, the rotation of the peeling tool 15 is performed in step S3A in the same manner as in step S3 of the peeling processing shown in FIG. It may be started at the same time.
 ストライカSTによって剥離加工工具5が再度下方に移動され(ステップS53)、飛散防止部21に捕集されていた剥離粉が、ダイ孔29に生じる吸引力によって、開放されたダイ孔29に吸引される(ステップS5A)。このとき、飛散防止部21はダイ孔29の直上にある。従って、飛散防止部21によって捕集された剥離粉は、開放されたダイ孔29に吸引される。このように、剥離粉は、ダイ孔29を通して回収され、ワークW上への飛散が防止される。なお、ステップS5Aでは、ストライカSTによって、剥離加工工具5を垂直に振動させて、飛散防止部21からの剥離粉の脱離を促進することが好ましい。 The stripping tool 5 is again moved downward by the striker ST (step S53), and the stripped powder collected in the scattering prevention unit 21 is sucked into the opened die hole 29 by the suction force generated in the die hole 29. (Step S5A). At this time, the scattering prevention part 21 is directly above the die hole 29. Therefore, the peeling powder collected by the scattering prevention unit 21 is sucked into the opened die hole 29. In this way, the release powder is collected through the die hole 29, and scattering onto the workpiece W is prevented. In step S5A, it is preferable that the stripping tool 5 is vibrated vertically by the striker ST to promote the detachment of the stripped powder from the scattering prevention unit 21.
 ステップS5Aの後、処理されるべき剥離加工部分が残っているか否か判断される(ステップS6A)。ステップ6Aが肯定される場合は、ワークWが移動されて処理されるべき剥離加工部分がワーク支持部31セットされ、同様の処理が行われる(処理がステップS2に戻る)。一方、ステップ6Aが否定される場合は、剥離加工処理が終了し、バキューム装置30及びエアー供給装置36が停止される(ステップS7A)。 After step S5A, it is determined whether or not a part to be processed remains to be processed (step S6A). When step 6A is affirmed, the workpiece W 31 is set by moving the workpiece W to be processed, and the same processing is performed (the processing returns to step S2). On the other hand, when Step 6A is denied, the peeling processing is finished, and the vacuum device 30 and the air supply device 36 are stopped (Step S7A).
 なお、上述した剥離加工処理の変形例では、剥離加工が所定時間経過毎に剥離粉の回収が行われた。このような処理に代えて、一つの剥離加工部分が終わる毎に剥離粉の回収が行われてもよい(別の変形例)。剥離加工処理の別の変形例について、図6のフローチャートを参照しつつ説明する。この別の変形例は、上述した図3の処理の変形例でもあるし、図5の処理の変形例でもある。 In addition, in the modified example of the peeling process described above, the peeling powder was collected every time the peeling process was performed. Instead of such a process, the peeling powder may be collected every time one peeling processing part is finished (another modified example). Another modification of the peeling processing will be described with reference to the flowchart of FIG. This other modified example is a modified example of the process of FIG. 3 described above and a modified example of the process of FIG.
 まず、パンチホルダ(上部タレット)3及びダイホルダ(下部タレット)7が回転されて、剥離加工工具5及びダイ9が準備される(ステップS1)。次に、ワークW上の剥離加工部分がワーク支持部31にセットされ(ステップS2)、剥離工具15の回転が開始される(ステップS3A)。ストライカSTによって剥離加工工具5が下方に移動され、剥離工具15によってワークW上の剥離加工部分に剥離加工が施される(ステップS4)。このとき、剥離粉は、飛散防止部21によって捕集(飛散が防止)される。なお、本変形例におけるステップS4では、図3に示される剥離加工処理におけるステップS4と同様に、一つの剥離加工部分の剥離加工処理が行われる。 First, the punch holder (upper turret) 3 and the die holder (lower turret) 7 are rotated to prepare the peeling tool 5 and the die 9 (step S1). Next, the peeling process part on the workpiece | work W is set to the workpiece | work support part 31 (step S2), and rotation of the peeling tool 15 is started (step S3A). The stripping tool 5 is moved downward by the striker ST, and the stripping process on the workpiece W is performed by the stripping tool 15 (step S4). At this time, the release powder is collected (prevented from scattering) by the scattering prevention unit 21. Note that in step S4 in the present modification, a peeling process for one peeling part is performed as in step S4 in the peeling process shown in FIG.
 次に、一つの剥離加工部分の剥離加工処理が終了したら、捕集された剥離粉を回収するために、まず、剥離工具15の回転が停止されて剥離加工工具5が上方に移動された後にワークWが移動されて、ダイ孔29の少なくとも一部(好ましくは全部)が開放される(ステップS51)。ダイ孔29の開放は、打抜き加工で形成された打ち抜き孔が利用されてもよいし、ワークWの外郭[outline]が利用されてもよい。 Next, after the peeling process of one peeling part is completed, in order to collect the collected peeling powder, first, after the rotation of the peeling tool 15 is stopped and the peeling tool 5 is moved upward, The workpiece W is moved, and at least a part (preferably all) of the die hole 29 is opened (step S51). For opening the die hole 29, a punched hole formed by punching may be used, or an outline of the workpiece W may be used.
 次に、バキューム装置30が作動され、エアー供給装置36から周溝35にエアーが供給される(ステップS52)。なお、バキューム装置30及びエアー供給装置36の作動は、ステップS52に先立って行われてもよく、例えば、図3に示される剥離加工処理のステップS3と同様に、ステップS3Aで剥離工具15の回転と同時に開始されてもよい。 Next, the vacuum device 30 is operated, and air is supplied from the air supply device 36 to the circumferential groove 35 (step S52). The operation of the vacuum device 30 and the air supply device 36 may be performed prior to step S52. For example, the rotation of the peeling tool 15 is performed in step S3A in the same manner as in step S3 of the peeling processing shown in FIG. It may be started at the same time.
 ストライカSTによって剥離加工工具5が再度下方に移動され(ステップS53)、飛散防止部21に捕集されていた剥離粉が、ダイ孔29に生じる吸引力によって、開放されたダイ孔29に吸引される(ステップS5A)。このとき、飛散防止部21はダイ孔29の直上にある。従って、飛散防止部21によって捕集された剥離粉は、開放されたダイ孔29に吸引される。このように、剥離粉は、ダイ孔29を通して回収され、ワークW上への飛散が防止される。なお、ステップS5Aでは、ストライカSTによって、剥離加工工具5を垂直に振動させて、飛散防止部21からの剥離粉の脱離を促進することが好ましい。 The stripping tool 5 is again moved downward by the striker ST (step S53), and the stripped powder collected in the scattering prevention unit 21 is sucked into the opened die hole 29 by the suction force generated in the die hole 29. (Step S5A). At this time, the scattering prevention part 21 is directly above the die hole 29. Therefore, the peeling powder collected by the scattering prevention unit 21 is sucked into the opened die hole 29. In this way, the release powder is collected through the die hole 29, and scattering onto the workpiece W is prevented. In step S5A, it is preferable that the stripping tool 5 is vibrated vertically by the striker ST to promote the detachment of the stripped powder from the scattering prevention unit 21.
 ステップS5Aの後、他の剥離加工部分があるか否か判断される(ステップS6)。ステップ6が肯定される場合は、ワークWが移動されて次の剥離加工部分がワーク支持部31セットされ、同様の処理が行われる(処理がステップS2に戻る)。一方、ステップ6が否定される場合は、剥離加工処理が終了し、バキューム装置30及びエアー供給装置36が停止される(ステップS7A)。 After step S5A, it is determined whether or not there is another peeling processing part (step S6). When step 6 is affirmed, the workpiece W is moved, the next separation processing portion is set to the workpiece support 31, and the same processing is performed (processing returns to step S2). On the other hand, if step 6 is negative, the peeling process is terminated, and the vacuum device 30 and the air supply device 36 are stopped (step S7A).
 図5及び図6に示される変形例のように、飛散防止部21に剥離粉を付着させた後に、ワークW移動してダイ孔29の少なくとも一部を開放して剥離粉をダイ孔29に吸引することで、剥離加工のためだけの貫通孔Hを形成する必要がなくなる。従って、ワークWの外観が向上する。なお、この際、飛散防止部21に付着させた剥離粉の回収を、所定時間毎、又は、一つの剥離加工部分毎に行うことで、飛散防止部21に大量の剥離粉が付着することを防止でき、剥離粉の飛散を効果的に防止できる。 5 and FIG. 6, after the release powder is attached to the anti-scattering portion 21, the workpiece W is moved to open at least a part of the die hole 29 to release the release powder into the die hole 29. By sucking, it is not necessary to form the through hole H only for the peeling process. Accordingly, the appearance of the work W is improved. At this time, a large amount of exfoliated powder adheres to the anti-scattering unit 21 by collecting the exfoliating powder attached to the anti-scattering unit 21 every predetermined time or for each exfoliation processing part. It can prevent, and scattering of peeling powder can be prevented effectively.

Claims (9)

  1.  垂直動可能な剥離加工工具を備えたパンチホルダ及びダイ孔を有するダイを備えたダイホルダを有するパンチプレスによってワークの表層を剥離する剥離加工方法であって、
     前記ワーク上の剥離加工部分の近傍に予め形成された貫通孔を、前記ダイの前記ダイ孔に連通させた状態で、前記ワークを保持し、
     前記剥離加工工具による前記ワークの前記剥離加工部分に剥離加工を施すと同時に、前記剥離加工によって生じた剥離粉を前記貫通孔を通して前記ダイ孔に吸引する、ことを特徴とする剥離加工方法。
    A peeling processing method for peeling a surface layer of a workpiece by a punch press having a punch holder having a vertically movable peeling processing tool and a die holder having a die having a die hole,
    Holding the workpiece in a state where a through-hole formed in the vicinity of the peeled portion on the workpiece is communicated with the die hole of the die,
    A peeling processing method comprising: performing peeling processing on the peeling processing portion of the workpiece by the peeling processing tool, and simultaneously sucking release powder generated by the peeling processing into the die hole through the through hole.
  2.  回転可能な剥離工具及び前記剥離工具を囲うように設けられた飛散防止部を有する、垂直動可能な剥離加工工具を備えたパンチホルダと、ダイ孔を有するダイを備えたダイホルダと、を有するパンチプレスによってワークの表層を剥離する剥離加工方法であって、
     前記剥離加工工具の前記剥離工具による前記ワークの剥離加工部分に剥離加工を施すと同時に、前記剥離加工によって生じた剥離粉を前記飛散防止部に付着させ、
     前記ダイの前記ダイ孔の少なくとも一部を開放するように前記ワークを移動し、
     前記ダイに吸引力を作用させて前記飛散防止部に付着させた前記剥離粉を前記ダイ孔に吸引する、ことを特徴とする剥離加工方法。
    Punch having a rotatable peeling tool and a punch holder having a vertically movable peeling tool having a scattering prevention portion provided so as to surround the peeling tool, and a die holder having a die having a die hole It is a peeling processing method for peeling the surface layer of a workpiece by pressing,
    At the same time as performing the peeling process on the peeling part of the workpiece by the peeling tool of the peeling tool, the peeling powder generated by the peeling process is attached to the scattering prevention part,
    Moving the workpiece to open at least a portion of the die hole of the die;
    A peeling processing method, wherein a suction force is applied to the die to suck the peeling powder adhered to the scattering prevention portion into the die hole.
  3.  請求項2に記載の剥離加工方法であって、
     前記吸引力による前記剥離粉の吸引を、所定時間毎、又は、前記ワークの前記剥離加工部分の変更毎に行う、ことを特徴とする剥離加工方法。
    It is the peeling processing method of Claim 2, Comprising:
    The peeling processing method characterized by performing suction of the peeling powder by the suction force every predetermined time or every change of the peeling processing portion of the workpiece.
  4.  請求項2又は3に記載の剥離加工方法であって、
     前記ダイ孔の少なくとも一部を開放するように前記ワークを移動させた後で、かつ、前記吸引力による前記剥離粉の吸引の前に、前記剥離粉飛散防止部を前記ダイ孔に近づけるように前記剥離加工工具を下降させる、ことを特徴とする剥離加工方法。
    It is the peeling processing method of Claim 2 or 3,
    After the workpiece is moved so as to open at least a part of the die hole and before the peeling powder is sucked by the suction force, the peeling powder scattering prevention unit is brought close to the die hole. A peeling processing method, wherein the peeling processing tool is lowered.
  5.  請求項1~4のいずれかに記載の剥離加工方法に使用する剥離加工装置であって、
     垂直動可能な剥離加工工具を備えたパンチホルダと、
     ダイ孔を有するダイを備えたダイホルダと、を備え、
     前記剥離加工工具が、前記パンチホルダに対して垂直動可能な筒状の工具ホルダと、
     前記工具ホルダの内部に設けられた回転アクチュエータと、前記回転アクチュエータによって回転される、前記工具ホルダの下部に設けられた剥離工具と、前記剥離工具を囲うように設けられ、前記回転アクチュエータによって回転された前記前記剥離工具をワークの剥離加工部分に接触させて剥離加工を施す際に生じた剥離粉の飛散を防止する飛散防止部と、を備え、
     前記ダイが、前記ワークの前記剥離加工部分を下方から支持するワーク支持部を前記ダイ孔の中央に備えている、ことを特徴とする剥離加工装置。
    A peeling processing apparatus for use in the peeling processing method according to any one of claims 1 to 4,
    A punch holder with a vertically movable peeling tool;
    A die holder including a die having a die hole,
    The peeling tool is a cylindrical tool holder that can move vertically with respect to the punch holder;
    A rotary actuator provided inside the tool holder, a peeling tool rotated by the rotary actuator, provided at a lower portion of the tool holder, and provided to surround the peeling tool, and rotated by the rotary actuator. The anti-scattering part prevents the exfoliation powder generated when the exfoliation tool is brought into contact with the exfoliation processing part of the workpiece to perform exfoliation processing, and
    The peeling processing apparatus according to claim 1, wherein the die includes a workpiece support portion that supports the peeling portion of the workpiece from below at the center of the die hole.
  6.  請求項5に記載の剥離加工装置であって、
     前記飛散防止部が、下端をワークに接触可能な環状体として構成されており、
     前記ワーク支持部の外径又は最大幅が、前記環状体の内径よりも小さくされている、ことを特徴とする剥離加工装置。
    It is a peeling processing apparatus of Claim 5, Comprising:
    The scattering prevention part is configured as an annular body whose lower end can contact the workpiece,
    An exfoliation processing device, wherein an outside diameter or maximum width of the work support part is made smaller than an inside diameter of the annular body.
  7.  請求項1~4のいずれかに記載の剥離加工方法に使用するダイであって、
     前記ダイには上方に開口されたダイ孔が形成されており、
     前記ダイ孔の中央にワークの剥離加工部分を下方から支持するワーク支持部が設けられている、ことを特徴とするダイ。
    A die for use in the peeling method according to any one of claims 1 to 4,
    The die has a die hole opened upward,
    A die characterized in that a workpiece support portion is provided in the center of the die hole for supporting a workpiece peeled portion from below.
  8.  請求項7に記載のダイであって、
     外方に拡設されたフランジを上部に備えており、
     前記ダイ孔の内径が、前記フランジに形成された傾斜周面によって拡径されている、ことを特徴とするダイ。
    A die according to claim 7,
    It has a flange that expands outwards at the top,
    The die characterized in that an inner diameter of the die hole is expanded by an inclined peripheral surface formed in the flange.
  9.  請求項7又は8に記載のダイであって、
     前記ワーク支持部が、前記ダイ孔の内周面と少なくとも一つの連結部によって連結されており、
     前記連結部の上縁が、前記ダイの上面よりも低く設定されている、ことを特徴とするダイ。
    A die according to claim 7 or 8,
    The work support portion is connected to the inner peripheral surface of the die hole by at least one connecting portion;
    The die characterized in that the upper edge of the connecting portion is set lower than the upper surface of the die.
PCT/JP2012/077210 2011-11-08 2012-10-22 Abrasion method and device, and die WO2013069440A1 (en)

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Citations (4)

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JPH10235434A (en) * 1997-02-24 1998-09-08 Amada Metrecs Co Ltd Punch press, and method and device for deburring
JP2006123063A (en) * 2004-10-28 2006-05-18 Amada Co Ltd Cutting method and rotary cutting tool
JP2007000901A (en) * 2005-06-24 2007-01-11 Murata Mach Ltd Deburring tool for punch press
JP2010069615A (en) * 2008-09-18 2010-04-02 Trumpf Werkzeugmaschinen Gmbh & Co Kg Machine for processing sheet type workpiece, especially for metal sheet, tool set for machine for processing the workpiece, thread milling tool assembly and use of thread milling tool

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Publication number Priority date Publication date Assignee Title
JPH10235434A (en) * 1997-02-24 1998-09-08 Amada Metrecs Co Ltd Punch press, and method and device for deburring
JP2006123063A (en) * 2004-10-28 2006-05-18 Amada Co Ltd Cutting method and rotary cutting tool
JP2007000901A (en) * 2005-06-24 2007-01-11 Murata Mach Ltd Deburring tool for punch press
JP2010069615A (en) * 2008-09-18 2010-04-02 Trumpf Werkzeugmaschinen Gmbh & Co Kg Machine for processing sheet type workpiece, especially for metal sheet, tool set for machine for processing the workpiece, thread milling tool assembly and use of thread milling tool

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