WO2013046495A1 - Dispositif de production de plasma sous pression atmosphérique et procédé de production de plasma sous pression atmosphérique - Google Patents

Dispositif de production de plasma sous pression atmosphérique et procédé de production de plasma sous pression atmosphérique Download PDF

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Publication number
WO2013046495A1
WO2013046495A1 PCT/JP2012/003564 JP2012003564W WO2013046495A1 WO 2013046495 A1 WO2013046495 A1 WO 2013046495A1 JP 2012003564 W JP2012003564 W JP 2012003564W WO 2013046495 A1 WO2013046495 A1 WO 2013046495A1
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Prior art keywords
antenna
atmospheric pressure
antenna unit
discharge tube
frequency power
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PCT/JP2012/003564
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English (en)
Japanese (ja)
Inventor
正史 松森
中塚　茂樹
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パナソニック株式会社
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Publication of WO2013046495A1 publication Critical patent/WO2013046495A1/fr

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2242/00—Auxiliary systems
    • H05H2242/20—Power circuits
    • H05H2242/26—Matching networks

Definitions

  • the present invention relates to an atmospheric pressure plasma generation apparatus and an atmospheric pressure plasma generation method, and more particularly to an atmospheric pressure plasma generation apparatus and an atmospheric pressure plasma generation method having a compact configuration in which a discharge tube is disposed in the vicinity of an antenna.
  • a plasma generator is formed by providing two electrodes facing each other, and high-frequency power is supplied to the matching circuit from a high-frequency power source.
  • a capacitively coupled plasma (CCP) generator is known in which plasma is generated in a discharge tube by supplying a gas for generating a plasma to a discharge tube (reaction vessel) disposed (capacitively coupled plasma: CCP).
  • CCP capacitively coupled plasma
  • a winding-shaped or wave-shaped antenna continuously connected to the matching circuit is provided to form a plasma generator, and a high-frequency power is supplied from the high-frequency power source to the matching circuit, and a discharge tube disposed in the vicinity of the antenna
  • An inductively coupled plasma (ICP) generator is known in which plasma is generated in a discharge tube by supplying a gas for generating plasma (see, for example, Patent Document 2).
  • the parameters of the matching circuit for example, the capacitance of the capacitor.
  • the plasma generator having such a configuration can generate plasma under atmospheric pressure and has a simple configuration, it performs local cleaning and surface modification of a substrate terminal as a work object. It is suitable for small-scale plasma processing.
  • the antenna and the matching circuit are continuously wired to the discharge tube, and the state of the matching circuit does not vary greatly depending on the presence or absence of plasma. It becomes unnecessary and the unit can be downsized.
  • the plasma generation efficiency is low.
  • an object of the present invention is to provide an atmospheric pressure plasma generation apparatus and an atmospheric pressure plasma generation method capable of generating a small and highly efficient plasma.
  • an atmospheric pressure plasma generator is an atmospheric pressure plasma generator that generates plasma under atmospheric pressure, in which discharge gas flows and high-frequency power from a high-frequency power source. And a matching circuit disposed between the high-frequency power source and the antenna unit, the discharge tube generating plasma by being supplied, an antenna unit for transmitting the high-frequency power to the discharge tube, and the matching circuit
  • the circuit includes a capacitor unit composed of a plurality of capacitor elements connected in series between one end which is a reference terminal of the high frequency power source and one end of the antenna unit, and a plurality of capacitors constituting the capacitor unit At least one of the elements is a variable capacitor element.
  • the atmospheric pressure plasma generating apparatus having the above-described configuration, it is possible to adjust the capacitance value of the capacitor unit by the variable capacitor element of the capacitor unit configured by the plurality of capacitor elements, and further, the plurality of capacitor elements. By connecting these in series, the capacitance value of the capacitor portion can be reduced.
  • the lower the capacitance of the capacitor unit the larger the ground voltage applied to the antenna unit. This ground voltage and the plasma generated in the discharge tube are irradiated from the discharge tube to the end point of the discharge tube. Since the potential difference from the assumed ground voltage corresponding to 0 V becomes large, it is possible to improve the generation efficiency of the capacitively coupled plasma.
  • the breakdown voltage required for the capacitor section can be divided and the breakdown voltage performance of each of the plurality of capacitor elements can be relaxed. It is possible to reduce the component cost of the capacitor portion.
  • the matching circuit further includes an inductor element connected in series between the other end of the high-frequency power source and the other end of the antenna unit.
  • an atmospheric pressure plasma generator is an atmospheric pressure plasma generator that generates plasma under atmospheric pressure.
  • a discharge tube that generates plasma when high-frequency power is supplied; an antenna unit that transmits the high-frequency power to the discharge tube; and a matching circuit disposed between the high-frequency power source and the antenna unit,
  • the matching circuit includes a capacitor unit including a plurality of capacitor elements connected in series to either one of both end sides continuously connected to the antenna unit.
  • the capacitance value of the capacitor unit is reduced by the capacitor unit including a plurality of capacitor elements connected in series to either one of both end sides that are continuously connected to the antenna unit. It becomes possible to make it.
  • the lower the capacitance of the capacitor unit the larger the ground voltage applied to the antenna unit. This ground voltage and the plasma generated in the discharge tube are irradiated from the discharge tube to the end point of the discharge tube. Since the potential difference from the assumed ground voltage corresponding to 0 V becomes large, it is possible to improve the generation efficiency of the capacitively coupled plasma.
  • the breakdown voltage required for the capacitor section can be divided and the breakdown voltage performance of each of the plurality of capacitor elements can be relaxed. It is possible to reduce the component cost of the capacitor portion.
  • the antenna unit has a continuous wiring in which both ends are connected to the matching circuit.
  • the antenna section has a continuous wiring connected at both ends to the matching circuit, so that a closed electric circuit is formed, and the variation in the matching degree of the matching circuit due to the presence or absence of plasma generation is relatively small. No adjustment circuit is required.
  • the antenna unit includes a wiring that is continuous with the matching circuit, and includes a first antenna unit through which a high-frequency current from the high-frequency power source flows and a portion that contacts the discharge tube. You may comprise with a linear 2nd antenna part.
  • the discharge tube, the antenna unit, and the matching circuit may be arranged on the same substrate.
  • the first antenna unit is disposed in proximity to the discharge tube, both ends thereof are connected to the matching circuit, and the second antenna unit is in a normal direction with respect to the substrate. From the above, it may have a portion intersecting with the discharge tube, one end connected to the first antenna portion, and the other end open.
  • the antenna unit may further include a grounded first unit that has a portion that faces the second antenna unit and intersects the discharge tube when viewed from a normal direction to the substrate.
  • a grounded first unit that has a portion that faces the second antenna unit and intersects the discharge tube when viewed from a normal direction to the substrate.
  • Three antenna units may be provided.
  • the first antenna unit includes the second antenna unit, and the second antenna unit overlaps with the discharge tube when viewed from the normal direction to the substrate.
  • the both ends of the first antenna unit may be connected to the matching circuit.
  • the first antenna unit includes the second antenna unit, and the second antenna unit is disposed in proximity to the discharge tube, and is in a normal direction of the substrate As seen from the above, both ends of the first antenna portion may be connected to the matching circuit.
  • the first antenna unit includes the second antenna unit, and the second antenna unit traverses the discharge tube when viewed from the normal direction of the substrate.
  • the both ends of the first antenna unit may be connected to the matching circuit.
  • the antenna unit is not a conventional wire-wound type or plane wave type, but has a simple linear shape. Therefore, it must be easily and inexpensively manufactured by punching, cutting, or etching a metal material such as a copper plate. Can do.
  • An atmospheric pressure plasma generation method is an atmospheric pressure plasma generation method for generating plasma under atmospheric pressure, in which a discharge tube arranged to be supplied with high-frequency power from an antenna unit.
  • the step of supplying gas for generating plasma inside is disposed between the high frequency power source and the antenna unit, and is connected between the reference terminal of the high frequency power source and one end of the antenna unit in series with the inductor element.
  • a high frequency voltage is applied from the high frequency power source to the antenna unit through a matching circuit including a capacitor unit including a plurality of capacitor elements to generate capacitively coupled plasma, and a high frequency current is generated from the high frequency power source.
  • the atmospheric pressure plasma generation method described above by supplying high-frequency power to an inductor element or a matching circuit having a capacitor portion formed by connecting a plurality of capacitor elements in series, grounding is applied to the antenna portion. Since the voltage can be increased and the potential difference between this ground voltage and the ground voltage assumed at the infinity point in the end of the discharge tube can be increased, the generation efficiency of capacitively coupled plasma can be improved. Is possible. On the other hand, since a high-frequency current is supplied to the antenna unit to generate a stable inductively coupled plasma, variation in the matching degree of the matching circuit is relatively small, and an automatic adjustment circuit is not necessary.
  • the atmospheric pressure plasma generation apparatus and the atmospheric pressure plasma generation method of the present invention by using the current flowing through the antenna unit and the ground voltage of the antenna unit in a hybrid manner, an automatic matching circuit is not required, and the size is high.
  • the output plasma can be generated under atmospheric pressure.
  • FIG. 1 is a configuration diagram as a schematic circuit diagram of an atmospheric pressure plasma generator according to Embodiment 1 of the present invention.
  • FIG. 2A is a graph showing the relationship between high-frequency power and antenna current in the VHF band when the Tun capacitance is changed.
  • FIG. 2B is a graph showing the relationship between the high-frequency power and the antenna voltage in the VHF band when the Tun capacitance is changed.
  • FIG. 3 is a configuration diagram of an atmospheric pressure plasma generator according to a modification of the first embodiment.
  • FIG. 4A is a first configuration diagram as a schematic circuit diagram of an atmospheric pressure plasma generation apparatus according to Embodiment 2 of the present invention.
  • FIG. 4B is a second configuration diagram as a schematic circuit diagram of the atmospheric pressure plasma generation apparatus according to Embodiment 2 of the present invention.
  • FIG. 5 is a configuration diagram of an atmospheric pressure plasma generator according to Embodiment 3 of the present invention.
  • FIG. 6A is a configuration diagram showing a first modification of the antenna provided in the atmospheric pressure plasma generation apparatus according to Embodiment 3 of the present invention.
  • FIG. 6B is a configuration diagram showing a second modification of the antenna provided in the atmospheric pressure plasma generation apparatus according to Embodiment 3 of the present invention.
  • FIG. 6C is a configuration diagram illustrating a third modification of the antenna included in the atmospheric pressure plasma generation apparatus according to Embodiment 3 of the present invention.
  • FIG. 6D is a configuration diagram illustrating a fourth modification example of the antenna included in the atmospheric pressure plasma generation device according to Embodiment 3 of the present invention.
  • FIG. 6E is a configuration diagram illustrating a fifth modification of the antenna included in the atmospheric pressure plasma generation device according to Embodiment 3 of the present invention.
  • FIG. 6F is a configuration diagram illustrating a sixth modification of the antenna included in the atmospheric pressure plasma generation device according to Embodiment 3 of the present invention.
  • FIG. 7A is a circuit configuration diagram of a conventional capacitively coupled atmospheric pressure plasma generator.
  • FIG. 7B is a circuit configuration diagram of a conventional inductively coupled atmospheric pressure plasma generator.
  • FIG. 1 is a configuration diagram as a schematic circuit diagram of an atmospheric pressure plasma generator according to Embodiment 1 of the present invention.
  • the atmospheric pressure plasma generator 1 described in this configuration diagram includes variable capacitors 12 and 14, an inductor 13, an antenna 15, and a discharge tube 16 on a substrate 30.
  • the antenna 15 is an antenna unit that is connected to the variable capacitor 14 and the inductor 13 and transmits high-frequency power to the discharge tube 16.
  • the discharge tube 16 generates plasma when the discharge gas flows and the high frequency power from the high frequency power supply 11 is supplied.
  • the variable capacitor 12 is connected to the high-frequency power supply 11 in parallel.
  • the variable capacitor 14 is a reference terminal of the variable capacitor 12 and is a capacitor unit including a plurality of capacitor elements connected in series between one end that is a ground terminal and one end of the antenna 15.
  • the inductor 13 is an inductor element connected in series between the other end of the high frequency power supply 11 and the other end of the antenna 15.
  • the variable capacitor 14, the inductor 13 and the variable capacitor 12 constitute a matching circuit for impedance matching between the high frequency power supply 11 and the antenna 15.
  • the variable capacitors 12 and 14 can perform impedance matching of the matching circuit by changing the capacitance.
  • the capacitances of the variable capacitors 12 and 14 are C 12 and C 14
  • the inductance of the inductor 13 is L 13
  • the inductance of the antenna 15 is L 15
  • the circuit resistance of the series part of the above circuit (FIG. 1) is Assuming R, the parallel impedance of the circuit (FIG. 1) is ( ⁇ 1 / j ⁇ C 12 ), and the series impedance of the circuit is (R + j ⁇ L 13 + j ⁇ L 15 ⁇ 1 / j ⁇ C 14 ).
  • the high frequency power output from the high frequency power source 11 is supplied to the antenna 15 with high efficiency. Is possible.
  • the variable capacitor 14 which is a variable-adjustable capacitor unit is composed of a plurality of capacitor elements connected in series, arranged between a ground terminal which is a reference terminal of the variable capacitor 12 and one end of the antenna 15.
  • the plurality of capacitor elements include, for example, a trimmer capacitor 141 that is a variable capacitor, and fixed capacitors 142, 143, and 144.
  • the capacitance value of the variable capacitor 14 composed of a plurality of capacitor elements can be adjusted by the trimmer capacitor 141. Furthermore, by connecting a plurality of capacitor elements in series, the capacitance value of the variable capacitor 14 (hereinafter also referred to as a Tun capacitance) can be reduced. As the Tune capacity of the variable capacitor 14 is lower, the antenna voltage applied to the antenna 15 increases, and this antenna voltage and the plasma generated in the discharge tube are at an infinite point in the end direction of the discharge tube irradiated from the discharge tube. Since the potential difference from the assumed ground voltage corresponding to 0 V becomes large, it is possible to improve the generation efficiency of the capacitively coupled plasma.
  • At least one of the plurality of capacitive elements (capacitor elements) constituting the variable capacitor 14 may be a variable capacitor, and at least one other fixed capacitor may be provided.
  • the variable capacitor 12 is adjusted unless the sum of reactance components of the antenna 15, the inductor 13, and the variable capacitor 14 is changed. Without matching, impedance matching with the antenna 15 is continued. Therefore, the current flowing through the antenna 15 having the continuous wiring continuously connected to the matching circuit is constant, and stable inductively coupled plasma can be generated. In addition, since the fluctuation of the matching degree of the matching circuit is relatively small depending on the presence or absence of the capacitively coupled plasma, an automatic adjustment circuit is unnecessary.
  • hybrid plasma in which inductively coupled plasma generated by the current flowing through the antenna 15 and capacitively coupled plasma generated by the large ground voltage applied to the antenna 15 is generated, and efficient plasma is generated.
  • variable capacitor 14 which is one capacitor portion, thereby reducing the capacity and dividing the withstand voltage required for the variable capacitor 14 to thereby divide the plurality of capacitors. Since the withstand voltage performance of each element can be relaxed, the component cost of the variable capacitor 14 can be reduced, and a small capacitor section having a high withstand voltage performance can be configured.
  • the antenna 15 is disposed on the substrate 30.
  • a connector for connecting to the high frequency power supply 11 is disposed on the substrate.
  • a discharge tube 16 made of a dielectric material is disposed in the vicinity of the antenna 15 at the site of the antenna 15 disposed on the substrate.
  • the upper end of the discharge tube 16 in the longitudinal direction (tube axis direction) is arranged near the upper end of the substrate so as to supply gas from the upper end, and the lower end of the discharge tube 16 in the longitudinal direction (tube axis direction) is the substrate.
  • the plasma processing is performed by blowing out plasma generated from the lower end and blowing out plasma generated from the lower end.
  • a ground electrode (reference terminal for a reference potential) to which the ground side of the high-frequency voltage in the connector 31 is connected is disposed at the position of the connector on the board.
  • the matching circuit is disposed between the antenna 15 and the connector.
  • the inductor 13 has one end electrically connected to the antenna 15 and the other end electrically connected to the variable capacitor 12.
  • both end electrodes of the variable capacitors 12 and 14 are electrically connected to the ground electrode, the inductor 13 or the antenna 15.
  • the metal material constituting the antenna 15 and the inductor 13 is a metal having a low specific resistance value, such as copper (specific resistance: 17.2 n ⁇ m (20 ° C.), temperature coefficient: 0.004 / ° C.), silver (specific resistance: 16). 0.2 n ⁇ m (20 ° C., temperature coefficient: 0.004 / ° C.), gold (specific resistance: 24.0 n ⁇ m (20 ° C.), temperature coefficient: 0.0034 / ° C.), aluminum (specific resistance: 28.2 n ⁇ m (20 ° C), temperature coefficient: 0.004 / ° C), etc., which are formed by punching, cutting, or etching a thin metal plate or metal foil, but copper is most preferred. is there.
  • the thickness is preferably 2 to 3 times the depth ⁇ from the surface through which the high-frequency current flows.
  • ⁇ is the high-frequency angular frequency
  • ⁇ is the magnetic permeability
  • ⁇ is the conductivity
  • FIG. 2A is a graph showing the relationship between the high frequency power (VHF power) in the VHF band and the antenna current when the Tun capacity of the variable capacitor 14 for Tuning (adjustment) is changed
  • FIG. 2B shows the Tun capacity. It is a graph showing the relationship between the high frequency electric power (VHF electric power) and antenna voltage in a VHF band when changing.
  • the antenna 15 has a continuous wiring continuously connected to the matching circuit, and even if matching is performed by changing the Tun capacitance and the inductor 13, as shown in FIG.
  • the antenna current flowing through the antenna 15 does not change. Further, the variation of the matching degree of the matching circuit is relatively small depending on whether or not plasma is generated.
  • the antenna voltage which is the ground voltage applied to the antenna 15, increases as the Tun capacitance of the variable capacitor 14 matches with a lower value.
  • the capacitance value of the variable capacitor 14 is preferably 10 pF or less. As shown in FIG. 2B, when the capacitance value of the variable capacitor 14 is 10 pF or less, the antenna voltage also increases due to the increase of the high-frequency input power (VHF power), so that plasma can be generated stably.
  • the capacitance value of the variable capacitor 14 is larger than 10 pF, the antenna voltage is not sufficiently increased even if the high frequency input power (VHF power) is increased, and the contribution of the capacitively coupled plasma (CCP) is small, so that the plasma is weak. .
  • the antenna voltage decreases as the frequency of the high-frequency input power increases. Therefore, in the 40.68 MHz band described above, the upper limit value of the variable capacitor 14 is set to 10 pF. However, the upper limit value of the variable capacitor 14 becomes stricter (lower) as the high frequency input power becomes higher, and the variable capacitor 14 becomes lower as the frequency becomes lower. The upper limit of is relaxed (increased).
  • FIG. 7A is a circuit configuration diagram of a conventional capacitively coupled atmospheric pressure plasma generator
  • FIG. 7B is a circuit configuration diagram of a conventional inductively coupled atmospheric pressure plasma generator.
  • the conventional atmospheric pressure plasma generator 500 illustrated in FIG. 7B includes a variable capacitor 612 and 613, an antenna 615, and a discharge tube 616.
  • a high frequency voltage is applied from a high frequency power source 511 via a discharge tube 516, and plasma is generated in the discharge tube 516 supplied with gas.
  • the discharge tube constitutes a part of the current path of the plasma generation circuit
  • the state of the matching circuit composed of the variable capacitors 512 and 513 varies greatly depending on the presence or absence of plasma in the discharge tube 516.
  • the impedance of the circuit varies greatly depending on the presence or absence of plasma, the plasma cannot be maintained without an automatic matching circuit. Therefore, an adjustment motor is required, and the unit becomes large.
  • an antenna 615 and a matching circuit composed of variable capacitors 612 and 613 are continuously wired to the discharge tube 616.
  • the state of the matching circuit does not vary greatly depending on the presence or absence of plasma, and only the coupling between the plasma in the discharge tube 616 and the radio wave of the antenna 615 changes, so that the matching circuit is almost affected compared to the capacitive coupling type. Absent. Therefore, there is an advantage that the automatic matching circuit is unnecessary and the unit can be miniaturized.
  • the plasma generation efficiency decreases.
  • the atmospheric pressure plasma generator 1 connects a plurality of capacitor elements in series between the antenna 15 and the ground terminal that is the reference terminal of the variable capacitor 12.
  • a variable capacitor 14 is provided as a capacitor unit that realizes a low capacity and a high withstand voltage, and the voltage applied to the antenna 15 is increased.
  • an inductor 13 is provided on the opposite side of the variable capacitor 14 to adjust the sum of reactance components of the variable capacitor 14, the inductor 13, and the antenna 15 wired in series, and the variable capacitor 12 connected in parallel with the high-frequency power source 11. Matching with reactance component.
  • the current flowing through the antenna 15 and the ground voltage of the antenna 15 can be efficiently used by the generation of plasma by the discharge tube 16 in which the discharge gas flows in a hybrid state. Therefore, it is possible to generate a small and highly efficient plasma under atmospheric pressure without the need for an automatic matching circuit.
  • FIG. 3 is a circuit configuration diagram of an atmospheric pressure plasma generator according to a modification of the first embodiment.
  • the circuit of the atmospheric pressure plasma generator described in FIG. 1 has added wiring inductance components (l 1 to l 6 ). Is different.
  • the same points as the circuit of the atmospheric pressure plasma generator described in FIG. 1 will not be described, and only different points will be described.
  • inductances l 1 and l 2 are added to the wiring connecting the variable capacitor 12, and inductances l 3 and l 6 are connected to the wiring connecting the inductor 13. Are added, and inductances l 4 and l 5 are added to the wiring connecting the variable capacitor 14.
  • the impedance Zp on the parallel side is (j ⁇ (l 1 + l 2 ) ⁇ 1 / j ⁇ C 12 ), and the impedance Zs on the series side is (R + j ⁇ (L 13 + L 15 + l 3 + l 4 + l 5 + l 6 ) ⁇ 1 / j ⁇ C 14 ).
  • the reactance component of Zp is capacitive
  • the value of the inductor 13 is set so that the reactance component of Zs is inductive
  • the variable capacitor 14 is adjusted.
  • the reactance component of Zp is inductive
  • the value of the inductor 13 is set and the variable capacitor 14 is adjusted so that the reactance component of Zs is capacitive.
  • the capacitance of the capacitor unit is adjusted to increase the potential difference between the ground voltage applied to the antenna unit and the ground voltage corresponding to a potential of 0 V assumed at the infinity point in the end direction of the discharge tube. This improves the generation efficiency of capacitively coupled plasma.
  • an antenna is provided by disposing a capacitor unit composed of a plurality of capacitor elements connected in series on either side of the antenna unit continuously connected to the matching circuit. The potential difference between the ground voltage applied to the section and the ground voltage corresponding to the potential of 0 V assumed at the infinity point in the terminal direction of the discharge tube is increased, and the generation efficiency of the capacitively coupled plasma is improved.
  • FIG. 4A is a first configuration diagram as a schematic circuit diagram of an atmospheric pressure plasma generator according to Embodiment 2 of the present invention.
  • the atmospheric pressure plasma generator 300 described in this configuration diagram includes variable capacitors 12 and 313, an inductor 314, an antenna 315, and a discharge tube 316 on a substrate.
  • the atmospheric pressure plasma generation apparatus 300 according to the present embodiment includes a variable capacitor 313 and an inductor 314 that are connected in series with the antenna 315 at both ends of the antenna 315.
  • the inductor 314 is an inductor element connected in series between one end which is a reference terminal and a ground terminal of the variable capacitor 12 and one end of the antenna 315.
  • the variable capacitor 313 is a plurality of capacitor elements (not shown) connected in series between the other end of the high frequency power supply 11 and the other end of the antenna 315.
  • Inductor 314, variable capacitor 313, and variable capacitor 12 constitute a matching circuit for impedance matching between high-frequency power supply 11 and antenna 315.
  • the variable capacitors 12 and 313 can perform impedance matching of the matching circuit by changing the capacitance.
  • variable capacitor 313 composed of a plurality of capacitor elements (not shown) connected in series to the other end of the antenna 315 increases the antenna voltage applied to the antenna 315, and this antenna voltage is generated in the discharge tube. Since the potential difference with the ground voltage corresponding to the potential of 0 V assumed at the infinity point in the end direction of the discharge tube irradiated with plasma from the discharge tube becomes large, it is possible to improve the generation efficiency of capacitively coupled plasma. Become.
  • the variable capacitor 12 is not adjusted. Impedance matching with the antenna 315 is continued. Therefore, the current flowing through the antenna 315 having continuous wiring continuously connected to the matching circuit is constant, and stable inductively coupled plasma can be generated. In addition, since the fluctuation of the matching degree of the matching circuit is relatively small depending on the presence or absence of the capacitively coupled plasma, an automatic adjustment circuit is unnecessary.
  • FIG. 4B is a second configuration diagram as a schematic circuit diagram of the atmospheric pressure plasma generator according to Embodiment 2 of the present invention.
  • the atmospheric pressure plasma generator 400 described in this configuration diagram includes variable capacitors 12 and 413, an inductor 414, an antenna 415, and a discharge tube 416 on a substrate.
  • the atmospheric pressure plasma generation apparatus 400 differs in the configuration of the antenna 415.
  • description of the same points as those of the atmospheric pressure plasma generator 300 will be omitted, and only different points will be described below.
  • the antenna 415 is a continuous winding type wire connected to a matching circuit composed of an inductor 414, a variable capacitor 413, and a variable capacitor 12 at both ends.
  • a matching circuit composed of an inductor 414, a variable capacitor 413, and a variable capacitor 12 at both ends.
  • inductively coupled plasma is generated in the discharge tube 416.
  • the antenna voltage applied to the antenna 415 is increased by a variable capacitor 413 composed of a plurality of capacitor elements (not shown) connected in series to the other end of the antenna 415.
  • the antenna voltage and the discharge tube Since the generated plasma has a large potential difference from the ground voltage corresponding to a potential of 0 V assumed at an infinite point in the end direction of the discharge tube irradiated from the discharge tube, it becomes possible to generate a capacitively coupled plasma. .
  • the capacitor portion made up of a plurality of capacitor elements connected in series is arranged on either end of the antenna 415 that is continuously connected to the matching circuit, thereby inducing the current flowing through the antenna 415.
  • Hybrid plasma is generated by combining the coupled plasma and the capacitively coupled plasma with a large grounding voltage applied to either end of the antenna 415, and an efficient plasma is generated.
  • FIG. 5 is a block diagram of an atmospheric pressure plasma generator according to Embodiment 3 of the present invention.
  • the atmospheric pressure plasma generator 2 shown in the configuration diagram includes a variable capacitor 22 connected in parallel to a high-frequency power source 21 and a variable capacitor 24 including a plurality of capacitor elements on a substrate 30, and an inductor. 23, an antenna 25, and a discharge tube 26.
  • the variable capacitor 24, the inductor 23, and the antenna wiring 251 of the antenna 25 are connected in series.
  • the atmospheric pressure plasma generator 2 differs from the atmospheric pressure plasma generator 1 according to Embodiment 1 only in the configuration of the antenna.
  • description of the same points as those of the atmospheric pressure plasma generator 1 will be omitted, and only different points will be described.
  • variable capacitors 22 and 24, inductor 23, and discharge tube 26 have the same structure and function as the high-frequency power source 11, variable capacitors 12 and 14, inductor 13, and discharge tube 16 according to the first embodiment. is there.
  • the antenna 25 is connected to both ends of a matching circuit composed of an inductor 23 and a variable capacitor 24.
  • the antenna 25 is a continuous wiring with the matching circuit.
  • a high-frequency current from the high-frequency power source 21 flows, and the antenna 25 is a first linear shape arranged parallel to the longitudinal direction (tube axis direction) of the discharge tube 26.
  • a first antenna wiring 251 that is an antenna section, and is connected to the first antenna wiring 251 and is perpendicular to the longitudinal direction (tube axis direction) of the discharge tube 26 and is normal to the substrate (illustrated, Y-axis direction).
  • the second antenna wiring 252 which is a second antenna portion having a portion intersecting with and in contact with the discharge tube 26, and a normal line facing the second antenna wiring 252 (parallel to the substrate).
  • a third antenna portion which is a third antenna portion having a portion intersecting with the discharge tube 26 when viewed from the direction (Y-axis direction in the figure), and being a grounding wiring arranged opposite to and spaced apart from the second antenna wiring 252 3 antenna wiring 253 and A.
  • the second antenna wiring 252 has one end connected to the first antenna wiring 251 and the other end open. Further, the third antenna wiring 253 facing the second antenna wiring 252 is located on the plasma blowing (irradiation) side of the discharge tube 26 with respect to the second antenna wiring 252.
  • the atmospheric pressure plasma generator 2 having the antenna 25 is configured as follows, for example.
  • the antenna 25 is formed on the substrate 30 by patterning with a flat metal material, for example.
  • a connector for connecting to the high frequency power source 21 is disposed on the substrate.
  • As the material of the substrate alumina, sapphire, aluminum nitride, silicon nitride, boron nitride, silicon carbide, or the like having high thermal conductivity is preferable.
  • a discharge tube 26 made of a dielectric material is disposed near the first antenna wiring 251 and in parallel with the first antenna wiring 251 at the upper part of the antenna 25 (the front side in FIG. 5).
  • the upper end of the discharge tube 26 is arranged in the vicinity of the upper end of the substrate and is configured to supply gas from the upper end, and the lower end of the discharge tube 26 extends below the lower end of the substrate by an appropriate distance.
  • the plasma generated from is blown out to perform plasma processing.
  • the inductor 23 is electrically connected to the first antenna wiring 251 at one end and the variable capacitor 22 at the other end.
  • variable capacitor 22 is soldered to the ground electrode side and the other end is soldered to the inductor 23 side.
  • the electrodes of the capacitor elements 241 and 244 outside the variable capacitor 24 composed of a plurality of capacitor elements are respectively The first antenna wiring 251 and the ground electrode on the variable capacitor 22 side are connected.
  • a high-frequency current flows from the high-frequency power source 21 to the first antenna wiring 251 through the inductor 23 and the variable capacitor 24 that form the matching circuit. Since the matching circuit is impedance-matched in the same manner as in the first embodiment, inductively coupled plasma is stably generated in the discharge tube 26 by the high-frequency current. Furthermore, since the capacitance value of the variable capacitor 24 composed of a plurality of capacitor elements is set low as in the first embodiment, the ground voltage applied to the second antenna wiring 252 increases. As a result, the potential difference between the voltage to ground and the ground voltage of the third antenna wiring 253 increases, so that capacitively coupled plasma is generated stably and with high efficiency.
  • the first antenna wiring 251 is configured by a matching circuit and a continuous wiring, fluctuations in the matching degree of the matching circuit are relatively small depending on the presence or absence of the capacitively coupled plasma. It is unnecessary.
  • the antenna 25 is not a winding type or a plane wave type, but is formed of a simple linear shape arranged in a direction along the discharge tube 26, for example, punching, cutting processing or etching of a metal material such as a copper plate It can be manufactured easily and inexpensively by processing.
  • FIG. 6A is a configuration diagram illustrating a first modification of the antenna included in the atmospheric pressure plasma generation apparatus according to Embodiment 3 of the present invention.
  • the antenna 35 described in the figure is different from the antenna 25 described in FIG. 5 only in that the grounded third antenna wiring 253 is not configured.
  • a high-frequency current flows from the high-frequency power source 21 to the first antenna wiring 351. Due to the high frequency current, inductively coupled plasma is stably generated in the discharge tube 26. Furthermore, since the capacitance value of the variable capacitor 24 is set low, the ground voltage applied to the second antenna wiring 352 is increased. As a result, the potential difference between the voltage to ground and the ground voltage assumed at the infinity point in the end direction of the discharge tube 26 irradiated with the plasma generated in the discharge tube 26 is increased. Plasma is generated stably and with high efficiency. Therefore, since the fluctuation of the matching degree of the matching circuit is relatively small, the automatic adjustment circuit is unnecessary. Furthermore, since the antenna 35 is not a winding type or a plane wave type, but has a simple linear shape, it can be easily and inexpensively manufactured by punching, cutting, or etching a metal material such as a copper plate. .
  • the second antenna wiring 352 intersecting the discharge tube 26 is a single wiring, but a plurality of wirings may be used. Specifically, for example, each of the plurality of second antenna wirings 352 intersects with the discharge tube 26, one end is connected to the first antenna wiring 351, and the other end is opened.
  • the plurality of second antenna wirings 352 are arranged at equal intervals and in parallel. Even with such a configuration, the same effect as that of the antenna 35 described in FIG. 6A is achieved, and the generation efficiency of capacitively coupled plasma is improved as compared with the antenna 35.
  • FIG. 6B is a configuration diagram showing a second modification of the antenna provided in the atmospheric pressure plasma generation apparatus according to Embodiment 3 of the present invention.
  • the antenna 45 shown in FIG. 5 has the first antenna wiring 451 not in the vicinity of the discharge tube 26 but in the normal direction of the substrate (Y-axis direction, plane). The point of contact with and overlapping with the discharge tube 26 is different.
  • both ends of the second antenna wiring 452 connected to both ends of the first antenna wiring 451 are continuously connected to the matching circuit.
  • the first antenna wiring 451 and the second antenna wiring 452 constitute a first antenna portion that constitutes a closed circuit through which a high-frequency current from the high-frequency power source 21 flows.
  • the first antenna wiring 451 has a linear shape having at least a portion in contact with the discharge tube 26 along the longitudinal direction of the discharge tube 26, or the short side of the discharge tube 26 continuously along the longitudinal direction of the discharge tube 26.
  • a second antenna portion that contacts the discharge tube 26 within the width of the direction is configured.
  • a high-frequency current flows from the high-frequency power source 21 to the first antenna wiring 451 and the second antenna wiring 452. Due to the high frequency current, inductively coupled plasma is stably generated in the discharge tube 26. Furthermore, since the capacitance value of the variable capacitor 24 is set low, the ground voltage applied to the second antenna wiring 452 and the first antenna wiring 451 increases. As a result, the potential difference between the voltage to ground and the ground voltage assumed at the infinity point in the end direction of the discharge tube 26 irradiated with the plasma generated in the discharge tube 26 is increased. Plasma is generated stably and with high efficiency.
  • the antenna 45 is not a winding type or a plane wave type, but has a simple linear shape. Therefore, the antenna 45 can be easily and inexpensively manufactured by punching, cutting or etching a metal material such as a copper plate. .
  • FIG. 6C is a configuration diagram illustrating a third modification of the antenna included in the atmospheric pressure plasma generation apparatus according to Embodiment 3 of the present invention.
  • the first antenna wiring 551 as the second antenna portion is arranged close to the longitudinal direction of the discharge tube 26.
  • at least a part of the second antenna wiring 552 arranged opposite to each other is in contact with and intersects the discharge tube 26 as viewed from the normal direction of the substrate (Y-axis direction, plan view). It is different in the arrangement.
  • both ends of the second antenna wiring 552 connected to both ends of the first antenna wiring 551 are connected to a matching circuit.
  • the first antenna wiring 551 and the second antenna wiring 552 constitute a first antenna portion through which a high-frequency current from the high-frequency power source 21 flows.
  • a high-frequency current flows from the high-frequency power source 21 to the first antenna wiring 551 through the second antenna wiring 552. Due to the high frequency current, inductively coupled plasma is stably generated in the discharge tube 26. Furthermore, since the capacitance value of the variable capacitor 24 is set low, the ground voltage applied to the second antenna wiring 552 increases. As a result, the potential difference between the voltage to ground and the ground voltage assumed at the infinity point in the end direction of the discharge tube 26 irradiated with the plasma generated in the discharge tube 26 is increased. Plasma is generated stably and with high efficiency. Therefore, since the fluctuation of the matching degree of the matching circuit is relatively small, the automatic adjustment circuit is unnecessary. Furthermore, the antenna 55 is not a winding type or a plane wave type, but has a simple linear shape. Therefore, the antenna 55 can be easily and inexpensively manufactured by punching, cutting, or etching a metal material such as a copper plate. .
  • FIG. 6D is a configuration diagram showing a fourth modification of the antenna provided in the atmospheric pressure plasma generation apparatus according to Embodiment 3 of the present invention.
  • the antenna 75 shown in the figure is different from the antenna 25 shown in FIG. 5 in that the grounded third antenna wiring 253 is not configured, and the first antenna wiring 751 is connected to the discharge tube 26. The difference is that the second antenna wiring 752 connected to the first antenna wiring 751 and connected in parallel to the discharge tube 26 in parallel is not provided.
  • a high-frequency current flows from the high-frequency power source 21 to the first antenna wiring 751 which is the first antenna unit. Further, when the first antenna wiring 751 and the discharge tube 26 are disposed in the vicinity, inductively coupled plasma is generated in the discharge tube 26 by the high-frequency current.
  • the capacitance value of the variable capacitor 24 is set low, the isolation voltage applied to the second antenna wiring 752 which is the second antenna portion becomes large. As a result, the potential difference between the voltage to ground and the ground voltage assumed at the infinity point in the end direction of the discharge tube 26 irradiated with the plasma generated in the discharge tube 26 is increased.
  • the antenna 75 is not a winding type or a plane wave type, but has a simple linear shape. Therefore, the antenna 75 can be easily and inexpensively manufactured by punching, cutting, or etching a metal material such as a copper plate. .
  • FIG. 6E is a configuration diagram illustrating a fifth modification of the antenna included in the atmospheric pressure plasma generation device according to Embodiment 3.
  • the antenna 85 shown in the figure is different from the antenna 25 shown in FIG. 5 in that the grounded third antenna wiring 253 is not configured, and the first antenna wiring 851 is connected to the discharge tube 26. The difference is that they are not arranged close to each other and a cylindrical second antenna wiring 852 that is connected to the first antenna wiring 751 so as to cover the discharge tube 26 is provided.
  • a high-frequency current flows from the high-frequency power source 21 to the first antenna wiring 851 which is the first antenna unit.
  • the first antenna wiring 851 and the discharge tube 26 are disposed in the vicinity, inductively coupled plasma is generated in the discharge tube 26 by the high-frequency current.
  • the capacitance value of the variable capacitor 24 is set to be low, the ground voltage applied to the second antenna wiring 852 which is the second antenna portion becomes large. As a result, the potential difference between the voltage to ground and the ground voltage assumed at the infinity point in the end direction of the discharge tube 26 irradiated with the plasma generated in the discharge tube 26 is increased. Plasma is generated stably and with high efficiency.
  • FIG. 6F is a configuration diagram illustrating a sixth modification of the antenna included in the atmospheric pressure plasma generation device according to Embodiment 3 of the present invention.
  • the antenna 95 shown in the figure is different from the antenna 45 shown in FIG. 6B in that the second antenna wiring 952 is arranged obliquely in the discharge tube 26 at one intersection. . Furthermore, both ends of the first antenna wiring 951 connected to both ends of the second antenna wiring 952 are connected to a matching circuit.
  • the first antenna wiring 951 and the second antenna wiring 952 constitute a first antenna portion through which a high-frequency current from the high-frequency power source 21 flows.
  • a high-frequency current flows from the high-frequency power source 21 to the first antenna wiring 951 and the second antenna wiring 952. Due to the high frequency current, inductively coupled plasma is stably generated in the discharge tube 26. Furthermore, since the capacitance value of the variable capacitor 24 is set low, the voltage to ground applied to the second antenna wiring 952 that is the second antenna portion increases. As a result, the potential difference between the voltage to ground and the ground voltage assumed at the infinity point in the end direction of the discharge tube 26 irradiated with the plasma generated in the discharge tube 26 is increased. Plasma is generated stably and with high efficiency.
  • the antenna 95 is not a winding type or a plane wave type, but has a simple linear shape, it can be easily and inexpensively manufactured by punching, cutting, or etching a metal material such as a copper plate. .
  • the atmospheric pressure plasma generation apparatus of the present invention has been described based on the first to third embodiments.
  • the atmospheric pressure plasma generation apparatus according to the present invention is not limited to the first to third embodiments. Absent.
  • the present invention can be realized not only as an atmospheric pressure plasma generation apparatus provided with such characteristic means but also as an atmospheric pressure plasma generation method. That is, an atmospheric pressure plasma generation method for generating plasma under atmospheric pressure, the step of supplying a plasma generating gas into a discharge tube arranged to be supplied with high frequency power from an antenna unit; A plurality of capacitors arranged in series between a ground terminal which is a reference terminal as a reference potential of a circuit of an atmospheric pressure plasma generator of a high-frequency power source and one end of the antenna unit, which is disposed between the power source and the antenna unit A high frequency voltage is applied to the antenna unit from the high frequency power supply to the antenna unit through a matching circuit having a capacitor unit composed of elements, and a high frequency current is supplied from the high frequency power source to the antenna unit for induction. Generating a coupled plasma.
  • the ground voltage applied to the antenna portion is increased. It is possible to increase the potential difference between the ground voltage and the ground voltage assumed at the infinity point in the end direction of the discharge tube where the plasma generated in the discharge tube is irradiated from the discharge tube. It is possible to improve the generation efficiency.
  • a high frequency current is supplied to the antenna section to generate a stable inductively coupled plasma, the variation of the matching degree of the matching circuit is small and an automatic adjustment circuit is not necessary.
  • first antenna wiring and the second antenna wiring and the longitudinal direction (tube axis direction) of the discharge tube have a parallel or vertical (intersection) positional relationship.
  • Parallel and perpendicular (intersection) are not limited to the angle between the first antenna wiring and the second antenna wiring and the tube axis direction of the discharge tube being strictly 180 degrees and 90 degrees, respectively. It includes an error within a range that is commonly accepted.
  • the atmospheric pressure plasma generation apparatus and the atmospheric pressure plasma generation method of the present invention are useful for small and high-efficiency plasma processing performed for local cleaning or surface modification of a substrate terminal.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)

Abstract

La présente invention concerne un dispositif de production de plasma sous pression atmosphérique (1) pourvu : d'un tube de décharge (16) dans lequel un gaz de décharge circule et un courant haute fréquence provenant d'une alimentation haute fréquence (11) est amené, un plasma étant produit ; d'une antenne (15) destinée à transmettre un courant haute fréquence au tube de décharge (16) ; et d'un circuit d'équilibrage disposé entre l'alimentation haute fréquence (11) et l'antenne (15). Le circuit d'équilibrage est pourvu d'un condensateur (14) formé par une pluralité d'éléments de condensateur connectés en série entre une extrémité de l'alimentation haute fréquence (11) qui est une borne de référence et une extrémité de l'antenne (15). Au moins un élément de la pluralité d'éléments de condensateur formant le condensateur(14) est un élément de condensateur variable.
PCT/JP2012/003564 2011-09-30 2012-05-30 Dispositif de production de plasma sous pression atmosphérique et procédé de production de plasma sous pression atmosphérique WO2013046495A1 (fr)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106304596A (zh) * 2016-10-24 2017-01-04 大连理工大学 一种细长管射频感应耦合等离子体源反应器

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Publication number Priority date Publication date Assignee Title
JPH0646359U (ja) * 1984-03-02 1994-06-24 ザ パーキン−エルマー コーポレイション プラズマ放出源
JPH09232293A (ja) * 1995-12-19 1997-09-05 Seiko Epson Corp 表面処理方法及び装置、圧電素子の製造方法、インクジェット用プリントヘッドの製造方法、液晶パネルの製造方法、並びにマイクロサンプリング方法
JP2001176858A (ja) * 1999-12-20 2001-06-29 Hitachi Ltd 半導体装置の製造装置及び製造方法
WO2007129520A1 (fr) * 2006-05-08 2007-11-15 Panasonic Corporation Procédé et appareil de génération d'un plasma à la pression atmosphérique
JP2009259626A (ja) * 2008-04-17 2009-11-05 Panasonic Corp 大気圧プラズマ発生装置
JP2010225308A (ja) * 2009-03-19 2010-10-07 Kanazawa Univ 誘導熱プラズマ発生方法及び装置
JP2011146721A (ja) * 1998-06-30 2011-07-28 Lam Research Corp プラズマ発生装置

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0646359U (ja) * 1984-03-02 1994-06-24 ザ パーキン−エルマー コーポレイション プラズマ放出源
JPH09232293A (ja) * 1995-12-19 1997-09-05 Seiko Epson Corp 表面処理方法及び装置、圧電素子の製造方法、インクジェット用プリントヘッドの製造方法、液晶パネルの製造方法、並びにマイクロサンプリング方法
JP2011146721A (ja) * 1998-06-30 2011-07-28 Lam Research Corp プラズマ発生装置
JP2001176858A (ja) * 1999-12-20 2001-06-29 Hitachi Ltd 半導体装置の製造装置及び製造方法
WO2007129520A1 (fr) * 2006-05-08 2007-11-15 Panasonic Corporation Procédé et appareil de génération d'un plasma à la pression atmosphérique
JP2009259626A (ja) * 2008-04-17 2009-11-05 Panasonic Corp 大気圧プラズマ発生装置
JP2010225308A (ja) * 2009-03-19 2010-10-07 Kanazawa Univ 誘導熱プラズマ発生方法及び装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106304596A (zh) * 2016-10-24 2017-01-04 大连理工大学 一种细长管射频感应耦合等离子体源反应器
CN106304596B (zh) * 2016-10-24 2018-11-20 大连理工大学 一种细长管射频感应耦合等离子体源反应器

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