WO2013027936A3 - Composition de résine photosensible noire et dispositif d'affichage d'images présentant ladite composition - Google Patents

Composition de résine photosensible noire et dispositif d'affichage d'images présentant ladite composition Download PDF

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Publication number
WO2013027936A3
WO2013027936A3 PCT/KR2012/006083 KR2012006083W WO2013027936A3 WO 2013027936 A3 WO2013027936 A3 WO 2013027936A3 KR 2012006083 W KR2012006083 W KR 2012006083W WO 2013027936 A3 WO2013027936 A3 WO 2013027936A3
Authority
WO
WIPO (PCT)
Prior art keywords
resin composition
photosensitive resin
display device
same
image display
Prior art date
Application number
PCT/KR2012/006083
Other languages
English (en)
Korean (ko)
Other versions
WO2013027936A2 (fr
Inventor
배진영
김주성
Original Assignee
성균관대학교 산학협력단
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 성균관대학교 산학협력단 filed Critical 성균관대학교 산학협력단
Publication of WO2013027936A2 publication Critical patent/WO2013027936A2/fr
Publication of WO2013027936A3 publication Critical patent/WO2013027936A3/fr

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)

Abstract

L'invention concerne une composition de résine photosensible noire contenant un pigment organique noir, des particules d'oxyde métallique isolantes, une résine de liaison soluble dans les alcalis, un composé photopolymérisable, un initiateur de photopolymérisation, et un solvant. La matière organique noire est une composition de résine photosensible contenant un pigment noir pérylène pour former une couche formant barrière optique.
PCT/KR2012/006083 2011-08-22 2012-07-31 Composition de résine photosensible noire et dispositif d'affichage d'images présentant ladite composition WO2013027936A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020110083475A KR20130021128A (ko) 2011-08-22 2011-08-22 흑색 감광성 수지 조성물 및 이를 구비한 화상표시장치
KR10-2011-0083475 2011-08-22

Publications (2)

Publication Number Publication Date
WO2013027936A2 WO2013027936A2 (fr) 2013-02-28
WO2013027936A3 true WO2013027936A3 (fr) 2013-05-10

Family

ID=47746955

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/006083 WO2013027936A2 (fr) 2011-08-22 2012-07-31 Composition de résine photosensible noire et dispositif d'affichage d'images présentant ladite composition

Country Status (2)

Country Link
KR (1) KR20130021128A (fr)
WO (1) WO2013027936A2 (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108137443B (zh) * 2015-07-31 2021-06-08 克美 芴衍生物、包含其的光聚合引发剂及光致抗蚀剂组合物
KR101832097B1 (ko) 2016-10-31 2018-02-23 롬엔드하스전자재료코리아유한회사 착색 감광성 수지 조성물 및 이로부터 제조된 차광성 스페이서
WO2018194262A1 (fr) * 2017-04-17 2018-10-25 삼성에스디아이 주식회사 Film optique d'amélioration du rapport de contraste, plaque polarisante le comprenant et appareil d'affichage à cristaux liquides le comprenant
KR102184231B1 (ko) * 2017-04-17 2020-11-27 삼성에스디아이 주식회사 명암비 개선 광학 필름, 이를 포함하는 편광판 및 이를 포함하는 액정표시장치
KR102063203B1 (ko) * 2017-07-11 2020-01-07 삼성에스디아이 주식회사 명암비 개선 광학필름, 이를 포함하는 편광판 및 이를 포함하는 액정표시장치
KR102383518B1 (ko) * 2018-02-06 2022-04-06 동우 화인켐 주식회사 흑색 감광성 수지 조성물, 이를 이용하여 제조된 화소정의막, 유기발광소자 및 화상 표시 장치
KR20220106151A (ko) * 2019-11-29 2022-07-28 쇼와덴코머티리얼즈가부시끼가이샤 차광용 자외선 경화성 조성물, 차광막, 및, 차광막을 갖는 물품을 제조하는 방법
KR20210106824A (ko) * 2020-02-21 2021-08-31 동우 화인켐 주식회사 흑색 감광성 수지 조성물, 블랙 매트릭스 및 화상표시장치

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10268121A (ja) * 1997-03-21 1998-10-09 Sumitomo Rubber Ind Ltd ブラックマトリックス用インキとこれを用いたブラックマトリックス
JP2001115043A (ja) * 1998-10-08 2001-04-24 Toppan Printing Co Ltd 着色組成物とその製法およびそれを用いたカラーフィルタ、電極基板および液晶表示装置
KR20070026004A (ko) * 2005-09-05 2007-03-08 도오꾜오까고오교 가부시끼가이샤 흑색 감광성 수지 조성물
KR20100066197A (ko) * 2008-12-09 2010-06-17 제일모직주식회사 흑색 감광성 수지 조성물, 및 이를 이용한 차광층 및 칼럼 스페이서

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10268121A (ja) * 1997-03-21 1998-10-09 Sumitomo Rubber Ind Ltd ブラックマトリックス用インキとこれを用いたブラックマトリックス
JP2001115043A (ja) * 1998-10-08 2001-04-24 Toppan Printing Co Ltd 着色組成物とその製法およびそれを用いたカラーフィルタ、電極基板および液晶表示装置
KR20070026004A (ko) * 2005-09-05 2007-03-08 도오꾜오까고오교 가부시끼가이샤 흑색 감광성 수지 조성물
KR20100066197A (ko) * 2008-12-09 2010-06-17 제일모직주식회사 흑색 감광성 수지 조성물, 및 이를 이용한 차광층 및 칼럼 스페이서

Also Published As

Publication number Publication date
KR20130021128A (ko) 2013-03-05
WO2013027936A2 (fr) 2013-02-28

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