WO2012175651A1 - Dispositif et procédé pour revêtir un substrat - Google Patents

Dispositif et procédé pour revêtir un substrat Download PDF

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Publication number
WO2012175651A1
WO2012175651A1 PCT/EP2012/062048 EP2012062048W WO2012175651A1 WO 2012175651 A1 WO2012175651 A1 WO 2012175651A1 EP 2012062048 W EP2012062048 W EP 2012062048W WO 2012175651 A1 WO2012175651 A1 WO 2012175651A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
coating
mask
different
coating material
Prior art date
Application number
PCT/EP2012/062048
Other languages
German (de)
English (en)
Inventor
Frank Ficker
Jörg Krumeich
Original Assignee
Frank Ficker
Krumeich Joerg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Frank Ficker, Krumeich Joerg filed Critical Frank Ficker
Priority to DE112012002616.0T priority Critical patent/DE112012002616A5/de
Publication of WO2012175651A1 publication Critical patent/WO2012175651A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Definitions

  • the present invention relates to a device for coating a substrate, in particular a metal, a plastic and / or a textile, with a coating source for emitting coating material in the direction of the substrate, a substrate carrier on which the substrate provided for static or dynamically attachable and a mask disposed between the substrate carrier and the coating source. Furthermore, the invention relates to a method for coating a substrate and such a substrate.
  • Typical goals or properties of the layers of different thickness and composition produced are the increase in wear resistance and corrosion resistance, especially in the tool coating and applications under special physico-chemical media, antistatic effect, antireflection, the light and / or heat protection, a special decorative effect and much more.
  • a method and a device for coating a belt is known.
  • the tape is transported within a coating chamber along a tape guide.
  • At least two guide elements of the tape guide are positioned at a distance relative to each other and are tilted with their longitudinal axes to each other such that changes a distance of the guide elements along the longitudinal axes.
  • the tape is passed within the coating chamber along the guide members such that at least two portions of the tape substantially run side by side and are coated.
  • the disadvantage here is that the coating material is exclusively homo- gene on the tape is attachable. There can be no specific influencing of the coating thickness or structure.
  • US 2006/019780 A1 also discloses a method for producing a thin film by selectively coating a substrate, wherein a mask is arranged between the coating agent and the substrate.
  • the PVD or CVD coating device for coating a substrate, in particular a metal, a plastic and / or a textile, has a coating source for emitting coating material in the direction of the substrate, a substrate carrier, on which the substrate provided for this purpose, in particular statically or dynamically attachable is on.
  • a manipulation device is provided in order to apply the coating material unevenly to the substrate.
  • the substrate has an inhomogeneous substrate surface. The coating material is thus at least partially unevenly applied to the substrate. This takes place essentially in that the coating material is not emitted exclusively along an axis of action of the coating source, but has a certain scattering.
  • the angle of incidence of the coating material or some of the other measures described below more or less coating material can reach the substrate in certain areas.
  • targeted control of the coating thickness or effect on the substrate can be achieved.
  • soft transitions from areas with maximum coating thickness to areas without or with little coating material can be produced on the substrate. It is thus a targeted inhomogeneous coating of the substrate possible.
  • a similar effect can be achieved if the substrate has an inhomogeneous substrate surface and, for example, this causes a nonuniform surface appearance.
  • a manipulation device many facilities come into question. Anything that prevents or interferes with the uniform PVD or CVD coating or a uniform coating effect can be considered a manipulation device.
  • Embodiments and particularly advantageous embodiments are in this description, but not exhaustive executed.
  • the manipulation device is a mask, which is arranged between the substrate carrier and the coating source.
  • the mask can cover individual areas of the substrate and open other areas for the coating.
  • the mask may cause the boundaries between the covered and uncovered areas to become blurred. The transition is thus fluent or uneven.
  • the distance (a; b) and / or the angle of the surfaces of at least two of the elements mask, substrate carrier and coating source can be changed. This is how the over- Transitions formed on the substrate between areas with much coating material and areas with little coating material softer, for example, the greater the distance between the mask and the substrate carrier is selected. Conversely, of course, a very hard transition can be generated if the distance between the mass and the substrate carrier is chosen to be very small. Soft transitions are also favored when the coating source is positioned very close to the mask.
  • the distance between the coating source and the mask is chosen to be very large, the transitions from uncoated regions on the substrate to areas with a high layer thickness are made sharper. If, for example, the angle between the mask and the substrate is not infinite, ie the two elements are not parallel to one another and / or it is changed during the coating, an uneven coating is also produced.
  • the elements coating source, mask and substrate carrier are arranged along an axis of action and at least one of these elements is designed to be movable transversely and / or longitudinally to the axis of action.
  • a targeted influencing of the coating process can take place.
  • the device can thereby be changed quickly and easily to produce different coating structures.
  • a targeted structuring of the coating can be brought about by a transverse and / or longitudinal adjustment of the mask during the coating process.
  • the mask is arranged rigidly and has openings, which in particular extend substantially in the direction of substrate movement, then a predetermined structure can be applied to the substrate.
  • the manipulation device is the substrate carrier, in particular a frame and / or a conveyor device.
  • the substrate carrier in particular a frame and / or a conveyor device.
  • the conveying device by means of the conveying device, a suitably designed substrate, in particular in strip form, can be guided past the mask and / or the coating source.
  • the substrate carrier is uneven, in particular arcuate.
  • the substrate is partially positioned at different distances from the coating source or is guided past this at a variable distance, so that there is an inhomogeneous coating of the substrate.
  • the mask and the substrate carrier are designed as a unit which can be displaced with respect to the coating source.
  • a change in distance between mask and substrate carrier can be eliminated, so that only a change in distance between the unit and the coating source influences the coating result.
  • the unit is formed longitudinally and / or transversely displaceable to the axis of action.
  • the mask which is present in particular in the form of a grid, grid and / or mesh, has openings through which the coating material can penetrate to the substrate.
  • the coating material due to the mask shape at certain areas of the substrate completely or only partially retained.
  • the opening width of the openings can be changed from completely open to complete closure. This eliminates changeover times, since a replacement of the mask with a differently structured mask deleted. Rather, the mask can be adjusted accordingly before the coating process by the opening width of at least one opening is changed. Alternatively or additionally, the adjustment of the opening width can of course also take place during the coating process, so that a targeted influencing of the coating structure is made possible. The blurring in the passages can then be caused, for example, by a change in the openings without the mask or the substrate itself moving.
  • the mask has at least one scattering area. This preferably adjoins at least one opening of the mask. Furthermore, this can in particular be designed such that the coating material is diffusely scattered in the direction of the substrate carrier.
  • the scattering area in the mask cross-section is designed in particular as an inclined surface to the action axis.
  • This can also be designed adjustable. Depending on the radiation angle of the coating material starting from the coating source, this impinges at different angles on the scattering regions of the mask. Due to the inclination of the scattering areas, the coating material is deflected differently. As a result, areas are created on the substrate in which more coating material impinges, whereas in other areas, in turn, the coating material is retained due to the deflection.
  • the scattering regions can be concave and / or convex. It is also conceivable that these are designed as free-form surfaces. are formed.
  • the scattering regions can also be designed as a scattering edge.
  • the coating thickness can be formed in areas of different thickness. Furthermore, it is advantageous if at least two masks and / or at least two layers of a mask are designed to be displaceable relative to one another, which in turn makes it possible to influence the coating process with regard to a desired, inhomogeneous coating of the substrate.
  • the device according to the invention advantageously also makes it possible for several masks to be subjected to the same or different voltages. Thus, different deflections of the ions are also possible within a coating process.
  • the manipulation device is advantageously a magnet for deflecting the coating material or for partially magnetizing the substrate, an uneven coating of the substrate can be carried out, for example, by a partial and / or an alternating magnetic field.
  • the manipulation device or the substrate advantageously has an element of material applied to the coating, in particular evaporation material, in addition to the coating material, then in PVD or CVD coating, in addition to the actual evaporation material of the coating, further material evaporating the coating on the substrate.
  • a PVD or CVD coating process according to the invention for coating a substrate in particular a metal, plastic and / or textile, coating material is emitted from a coating source to the substrate, which is arranged on a substrate carrier, in particular statically or dynamically.
  • the coating material is applied during the coating process, at least in some embodiments of the invention wholly or partially unevenly on the substrate.
  • the coating material is unevenly applied to the substrate by means of a manipulation device and / or an inhomogeneous substrate surface is used, so that the coating material is applied at least partially unevenly on the substrate during the coating process. Accordingly, there is no homogeneous coating of the substrate in the areas to be coated, and essentially no hard transitions from coated to uncoated areas. On the contrary, soft transitions can be caused by, for example, a continuously increasing coating thickness on the substrate between strongly coated and less heavily coated
  • the process is a PVD (Physical Vapor Deposition) coating process with physical vapor deposition or a CVD (Chemical Vapor Deposition) coating process.
  • the coating material is at least partially retained by a mask which acts as a manipulation device and is arranged between the coating source and the substrate, an uneven coating is effected.
  • this advantageous coating method also causes the material applied to the substrate to be distributed unevenly.
  • the distance between at least two of the elements mask, substrate carrier and coating source before, during and / or after the coating process is changed.
  • a targeted influencing of the coating structure is also possible during the process by a corresponding change in the distance between mask and substrate carrier and / or between mask and coating source and / or between substrate carrier and coating source.
  • the coating material is emitted from the coating source directed toward the substrate and deflected by the mask in such a way that it impinges on the substrate at a, in particular variable, angle of incidence so that the coating material is applied to the substrate in different thickness , This results in different coverage, color and / or reflection effects from different angles. Likewise, this also different conductivities can be achieved.
  • the coating material does not impinge perpendicular to the substrate. It is also advantageous if a plurality of layers with different angles of incidence are applied to the substrate in succession. Thus, a targeted influencing of the coating result can be effected.
  • an influence on the coating process by the conveying speed of the substrate can be excluded if the substrate is conveyed from the substrate carrier at a constant speed.
  • the coating of the substrate can also be influenced by means of a variable speed profile of the substrate over time.
  • an uneven coating can be effected in particular by a non-uniform speed course.
  • the substrate is conveyed by the substrate carrier on an uneven, in particular arcuate, path past the coating source, so that an inhomogeneous coating of the substrate results depending on the distance from the coating source.
  • a particularly good coating result with a very good structure can be produced if the mask is carried along with the substrate, in particular synchronously and / or oscillatingly. Thus, influences can be excluded by relative movement between the mask and substrate.
  • the substrate is heated and / or cooled in regions in such a way that it is set in oscillation due to the temperature differences in the substrate.
  • the coating result can be specifically influenced by the substrate properties.
  • the mask is subjected to a voltage which is changed during the coating process, since thus an uneven layer thickness of the coating material is produced on the substrate.
  • This variable voltage can also be alternated with a constant voltage during the coating. If a plurality of coating operations are carried out successively, an uneven coating on the substrate can also be produced in an advantageous manner.
  • the substrate is deformed before or during coating, in particular folded, compressed or stretched. This also causes the coating material to be applied to the substrate in uneven density.
  • fibers and / or threads are joined together.
  • at least some of the fibers and / or threads are at least partially coated prior to bonding.
  • the fibers and / or threads may be provided with one or more layers.
  • these may be similar or different coatings, which are applied in particular in a PVD, CVD or another directed coating process.
  • a substrate can be produced which has different properties depending on its fibers and / or threads.
  • the substrate in particular a metal, plastic and / or textile, for coating with a coating material is formed such that it causes a non-uniform coating in a coating process.
  • the substrate has at least two materials with different layer adhesion and / or temperature behavior.
  • a different thickness coating thickness can be caused when the substrate is cooled and / or heated during the coating process.
  • the substrate is composed of different parts, it is in particular a textile which consists of different fibers and / or threads, so that uneveness effects can also be achieved thereby.
  • the different parts of the substrate in particular a textile consisting of different fibers or threads, have a different surface structure and / or different shapes, dimensions or diameters, so that a different color effect and / or a different luster is formed after the coating, then may also provide a beneficial, non-uniform coating hereby.
  • the substrate is in particular a metal, plastic and / or textile, for coating with a coating material and if it is designed such that it has a different shrinkage behavior at the temperatures occurring during a coating process, then an additional parameter for the change of the coating can be obtained become.
  • the substrate has different colors, which are not completely covered by the coating, so that forms a different color effect and or gloss after coating.
  • the substrate is a textile consisting of different fibers and / or threads
  • the textile itself may have a structure resulting therefrom which is further favorably influenced by the coating.
  • the absorption behavior of the textile compared to the coating can be influenced and change the coated textile with it.
  • the substrate in particular the threads, is advantageously at least partially luminous, then in the case of a translucent equivalent moderate or non-uniform PVD or CVD coating achieved particularly advantageous effects.
  • the substrate has a surface structure and if the structure is preferably emphasized and / or enhanced by the uneven coating and / or a subsequent treatment, a special coating effect can also be obtained.
  • the substrate is deformed for coating, in particular folded, compressed or stretched, so that the coating material does not impinge perpendicularly on the substrate at unequal angles and / or unevenly distributed, very particularly advantageous coating results are achieved.
  • the substrate has a plurality of layers applied in particular with different angles of incidence, this is likewise advantageous.
  • the structure is particularly emphasized and / or enhanced by the uneven coating of the invention and / or post-processing.
  • the substrates according to the invention can be all materials which can be coated by means of PVD or CVD methods.
  • plastics, wood, metal, textiles, lacquer surfaces, glass, ceramics or even organic materials come into question.
  • the coating can be used both in the industrial sector and in the consumer sector.
  • decorative items, interior trim on vehicles, furniture and many other applications for the substrates or articles of the invention may be provided.
  • the layer structures according to the invention can be influenced by the to obtain uneven coatings.
  • the PVD and / or CVD layers can be applied in different structure and / or sequence.
  • the structure can be varied via the process parameters. It can be from amorphous to semi-crystalline to crystalline and / or porous columnar over dense-columnar to dense-closed.
  • Multi-layer layers can be applied as single layers on top of each other, sharply separated or graded, gradual transitions (blend transitions). Many layers may be followed or alternately (multilayer layers), e.g. Multi-layer layers of TiN and NbN in a few hundred individual layers (each 5 to 20 nm) are applied to the substrate.
  • Mixtures can be deposits of particles or domains or alloyed.
  • mixed structures can be embedded particles of one material in a matrix of another material (eg TiN crystalline in an amorphous Si 3 N 4 matrix).
  • oxides eg Al 2 O 3 , TiO 2 , Ti 2 O 3 , SiO 2 , ...
  • Nitrides eg TiN, CrN, AlN, TiAIN, Si 3 N 4 , ...
  • Carbides e.g. TiC, CrC, WC, SiC, ...
  • Oxynitrides e.g. TiON, ...
  • Carbonitrides e.g. TiCN, WCN, SiCN, ...
  • the connections do not necessarily have to be stoichiometric with PVD layers; depending on the coating parameters, overstoichiometric or substoichiometric layers, for example TiN 0 , 7, are also formed. Therefore, the above examples are not to be regarded as a chemical stoichiometric formula, but only as a description of the general components in the layer.
  • the layers can be amorphous, semi-crystalline or crystalline.
  • the invention produces a variation (disturbance, modulation) of the coating process in order to produce a different, preferably color effect. This is done for example by
  • FIG. 1 shows a device for coating a substrate with a statically arranged mask between see coating source and substrate carrier in side view
  • FIG. 2 shows a device for coating a substrate with a movably arranged mask and a substrate movably arranged on a conveying device
  • FIG. 3 shows a device for coating a substrate with a mask which has two layers spaced apart from one another.
  • FIG. 1 shows a device 1 for coating a substrate 2, which is arranged statically on a substrate carrier 3.
  • the substrate carrier 3 is formed in the present embodiment as a frame.
  • the substrate 2 to be coated is in particular a metal, a plastic and / or a textile.
  • the device 1 further comprises a coating source 4, is emitted from the coating material 5 substantially in the direction of the substrate 2.
  • a mask 6 is arranged between the coating source 4 and the substrate carrier 3 or the substrate 2.
  • the coating source 4, the mask 6 and the substrate carrier 3 with the substrate 2 mounted thereon are arranged along an axis of action W.
  • the mask 6 has openings 7 through which the coating material 5 can penetrate to the substrate 2.
  • the mask 6 is designed in particular in the form of a grid, a grate and / or a net.
  • the opening width of the individual openings 7 is formed differently large. Alternatively, the openings may also be formed identically. Furthermore, at least some of the openings 7 may have a closing mechanism, not shown here, by means of which the opening width of at least one opening tion 7 may be formed changeable until complete closure.
  • the mask 6 has in the region of each opening 7 scattering regions 8a, 8b, which adjoin the respective opening 7 and are formed such that the coating material 5 is diffusely scattered in the direction of the substrate 2 or substrate carrier 3.
  • the scattering regions 8a, 8b are formed in the present embodiment as inclined to the action axis W surfaces.
  • the inclinations of the surfaces 8a, 8b is formed differently at each opening 7 as a function of the distance to the action axis W.
  • the scattering regions 8a, 8b are formed, in particular in the outer region of the mask 6, in such a way that the coating material 5 is deflected in the direction of the action axis W.
  • the mask 6 is further acted upon by a first voltage 9. This causes a positive charge of the mask 6.
  • the coating material 5, which is in ionized form is not guided to the mask 6, but rather repelled therefrom.
  • the course of the coating material 5 is not influenced by the coating source 4 in the direction of the substrate 2 such that a substantially inhomogeneous coating of the substrate 2 takes place.
  • the substrate 2 and / or the substrate carrier 3 are subjected to a second voltage 10. This causes in particular a negative charge of the substrate 2, so that the coating material 5 is attracted to the substrate 2.
  • the mask 6 is arranged at a distance from the substrate carrier 3 and / or from the substrate 2 such that the coating material 5 can be applied to the substrate 2 at least partially unevenly.
  • the distance a between mask 6 and substrate 2 or substrate carrier 3 is chosen to be so large, the coating material 5 can be applied to the substrate 2 not only in the direct projection axis of the openings 7, but also at least partially in the areas covered by the mask 6.
  • the substrate 2 thus has soft transition regions 11 between coating-rich regions 12 and coating-poor regions 13. The smaller the distance a between mask 6 and substrate 2 or substrate carrier 3, the harder the transitions between the coating-rich regions 12 and the coating-poor regions 13.
  • the mask 6 has a distance b from the coating source 4. The greater the distance b chosen, the harder the transition regions 11 on the substrate 2. On the other hand, if the coating source 4 is attached very close to the mask 6, softer transition regions 1 can be produced.
  • the mask 6 is designed to be movable along the axis of action W.
  • the distance a and the distance b before, during and / or after the coating process can be changed in order to effect an uneven coating of the substrate 2 can.
  • the mask 6 or the substrate 2 can also be moved transversely to the action axis W in order to influence the coating process.
  • the substrate 2 furthermore has at least 2 materials of different temperature behavior. Upon cooling and / or heating of the substrate during the coating process, an inhomogeneous coating of the substrate 2 can thus be produced. Preferably soft transition regions 1 1 can thus be generated between coating-rich regions 12 and coating-poor regions 13.
  • the mask 6 can be designed to be movable along the axis of action W, but also the coating source 4 and / or the substrate 2 or the substrate carrier 3 by a corresponding movement of the coating source 4 and / or the substrate 2 or substrate support 3, a change in the distance a and / or the distance b are caused.
  • the mask 6, the coating source 4 and / or the substrate carrier 3 can form a unit 14.
  • the unit 14 may be formed transversely and / or longitudinally to the axis of action W movable.
  • the coating source 4 and the mask 6 form the unit 14.
  • the mask 6 is designed as a circulating belt, which is moved across three deflection rollers 15a, 15b, 15c in the region between the coating source 4 and substrate carrier 3 or substrate 2 transversely to the action axis W.
  • the coating source 4 is arranged in the inner region, which is designed as a circulating belt mask 6, the coating source 4 is arranged.
  • the substrate carrier 3 is formed in the embodiment shown in Figure 2 as a conveyor. This promotes the substrate 2 during the coating process at the coating source 4 preferably in the transverse direction to the longitudinal axis W over.
  • the movement of substrate 2 and mask 6 can be formed in the transverse direction to the action axis W equal or opposite.
  • the mask 6 and / or the substrate 2 can be moved at a constant or varying speed during the coating process transversely to the longitudinal axis.
  • the mask 6 can be carried synchronously and / or oscillating with the substrate 2.
  • the unit 14 is preferably designed to be movable transversely and / or longitudinally with respect to the conveying axis W relative to the conveying device or the substrate carrier 3.
  • the unit 15 may also be designed to be static and the conveying device or the substrate carrier 3 with the substrate 2 to be transversely and / or longitudinally to the axis of action W movable.
  • the mask 6 and the substrate carrier 3 can also form the unit 14.
  • either the unit 14 with respect to the coating source 2 or the coating source 2 with respect to the unit 14 transversely and / or longitudinally to the axis of action W is designed to be movable.
  • the mask 6 is formed comparable to the embodiment in Figure 2 as a circulating belt. However, this time the mask 6 comprises only two deflection rollers 15a, 15b. Further, the coating source 4 is not disposed within the circulating belt, but outside. The mask 6 accordingly has two spaced-apart layers 16a, 16b, through which the coating material 5 must penetrate from the coating source 4 in order to reach the substrate 2.
  • the mask 6 and / or the substrate carrier 3 can also be designed to be movable within the unit 14 along the axis of action W in order to be able to change the distance a between substrate carrier 3 or substrate 2 and the mask 6.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

L'invention concerne un dispositif PVD ou CVD (1) pour revêtir un substrat (2), en particulier un métal, un plastique et/ou un textile, comprenant une source de revêtement (4) pour émettre du matériau de revêtement (5) en direction du substrat (2), un porte-substrat (3) sur lequel le substrat (2) destiné à cet effet peut être placé de manière statique ou dynamique. Selon l'invention, pour produire une apparence superficielle au moins en partie inégale du substrat revêtu, ledit dispositif comporte un dispositif de manipulation servant à appliquer le matériau de revêtement de manière inégale sur le substrat et/ou le substrat présente une surface non homogène. L'invention concerne également un procédé de revêtement et un substrat correspondants.
PCT/EP2012/062048 2011-06-24 2012-06-22 Dispositif et procédé pour revêtir un substrat WO2012175651A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE112012002616.0T DE112012002616A5 (de) 2011-06-24 2012-06-22 Vorrichtung und Verfahren zum Beschichten eines Substrates

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE102011051314.0 2011-06-24
DE102011051314 2011-06-24
DE102011057079.9 2011-12-28
DE102011057079 2011-12-28

Publications (1)

Publication Number Publication Date
WO2012175651A1 true WO2012175651A1 (fr) 2012-12-27

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PCT/EP2012/062048 WO2012175651A1 (fr) 2011-06-24 2012-06-22 Dispositif et procédé pour revêtir un substrat

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DE (1) DE112012002616A5 (fr)
WO (1) WO2012175651A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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DE102016114282A1 (de) * 2016-08-02 2018-02-08 Von Ardenne Gmbh Prozessieranordnung und Verfahren

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EP1132980A2 (fr) * 2000-03-06 2001-09-12 Sel Semiconductor Energy Laboratory Co., Ltd. Méthode pour la formation d'une couche mince pour des dispositifs émetteurs de lumière
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CN106894252A (zh) * 2015-12-17 2017-06-27 睿想科技有限公司 一种纺织品无水染色技术
DE102016114282A1 (de) * 2016-08-02 2018-02-08 Von Ardenne Gmbh Prozessieranordnung und Verfahren

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