WO2012169858A3 - Buffer sheet used in vacuum chuck that adsorbs object to be processed - Google Patents

Buffer sheet used in vacuum chuck that adsorbs object to be processed Download PDF

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Publication number
WO2012169858A3
WO2012169858A3 PCT/KR2012/004597 KR2012004597W WO2012169858A3 WO 2012169858 A3 WO2012169858 A3 WO 2012169858A3 KR 2012004597 W KR2012004597 W KR 2012004597W WO 2012169858 A3 WO2012169858 A3 WO 2012169858A3
Authority
WO
WIPO (PCT)
Prior art keywords
processed
vacuum chuck
buffer sheet
sheet used
adsorbs
Prior art date
Application number
PCT/KR2012/004597
Other languages
French (fr)
Korean (ko)
Other versions
WO2012169858A2 (en
Inventor
이재덕
최일환
김승렬
Original Assignee
(주)탑나노시스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by (주)탑나노시스 filed Critical (주)탑나노시스
Priority to CN201280028646.XA priority Critical patent/CN103608912B/en
Publication of WO2012169858A2 publication Critical patent/WO2012169858A2/en
Publication of WO2012169858A3 publication Critical patent/WO2012169858A3/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q3/00Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
    • B23Q3/02Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine for mounting on a work-table, tool-slide, or analogous part
    • B23Q3/06Work-clamping means
    • B23Q3/08Work-clamping means other than mechanically-actuated
    • B23Q3/088Work-clamping means other than mechanically-actuated using vacuum means
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices

Abstract

Disclosed is a buffer sheet used in a vacuum chuck that adsorbs an object to be processed. The buffer sheet of the present invention is coupled to the upper side of the vacuum chuck which adsorbs and fixes the object to be processed, and includes a non-woven sheet and an ESD coating layer comprising carbon nanotube on the non-woven sheet so that the object to be processed is mounted. According to the present invention, an antistatic effect is excellent since the ESD coating layer comprising the carbon nanotube with electrical conductivity is applied.
PCT/KR2012/004597 2011-06-10 2012-06-11 Buffer sheet used in vacuum chuck that adsorbs object to be processed WO2012169858A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201280028646.XA CN103608912B (en) 2011-06-10 2012-06-11 Buffer substrate tablet in the vacuum cup adsorbing pending object

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020110056292A KR101347358B1 (en) 2011-06-10 2011-06-10 Buffer sheet used in a suction chuck sucting a workability body
KR10-2011-0056292 2011-06-10

Publications (2)

Publication Number Publication Date
WO2012169858A2 WO2012169858A2 (en) 2012-12-13
WO2012169858A3 true WO2012169858A3 (en) 2013-04-04

Family

ID=47296647

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/004597 WO2012169858A2 (en) 2011-06-10 2012-06-11 Buffer sheet used in vacuum chuck that adsorbs object to be processed

Country Status (3)

Country Link
KR (1) KR101347358B1 (en)
CN (1) CN103608912B (en)
WO (1) WO2012169858A2 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101454902B1 (en) * 2013-01-25 2014-11-03 (주)탑나노시스 Functionality sheet with carbon nanotube coating and the method for manufacturing the same
CN106715112B (en) * 2014-08-07 2018-11-30 日本宝翎株式会社 Air permeable sheet
CN106826510A (en) * 2016-12-30 2017-06-13 郑州晶润光电技术有限公司 A kind of chip clears off technique
WO2019022293A1 (en) * 2017-07-27 2019-01-31 주식회사 스마테크 Composite sheet for protecting flexible substrate during suction
CN107283448B (en) * 2017-08-01 2024-02-06 南京协辰电子科技有限公司 Substrate adsorption device
CN110640510A (en) * 2019-08-21 2020-01-03 成都飞机工业(集团)有限责任公司 Method for fixing honeycomb core-carbon tube assembly
KR102440148B1 (en) * 2019-10-25 2022-09-05 (주)에스티아이 Substrate supporting apparatus and substrate transperring method using the same
CN114952359A (en) * 2022-07-28 2022-08-30 江苏沛泽机械科技有限公司 Modular combined workpiece clamping mechanism for large machine tool

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20070031892A (en) * 2004-07-13 2007-03-20 닛토덴코 가부시키가이샤 Sheet for suction and fixation, and method of producing the same
JP2007308666A (en) * 2006-05-22 2007-11-29 Chuko Kasei Kogyo Kk Buffer sheet for adsorptive fixation
KR20100109098A (en) * 2009-03-31 2010-10-08 주식회사 탑 엔지니어링 Working stage with antistatic treatment

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7611628B1 (en) * 2004-05-13 2009-11-03 University Of Kentucky Research Foundation Aligned nanotubule membranes

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20070031892A (en) * 2004-07-13 2007-03-20 닛토덴코 가부시키가이샤 Sheet for suction and fixation, and method of producing the same
JP2007308666A (en) * 2006-05-22 2007-11-29 Chuko Kasei Kogyo Kk Buffer sheet for adsorptive fixation
KR20100109098A (en) * 2009-03-31 2010-10-08 주식회사 탑 엔지니어링 Working stage with antistatic treatment

Also Published As

Publication number Publication date
CN103608912A (en) 2014-02-26
KR101347358B1 (en) 2014-01-07
CN103608912B (en) 2016-10-05
WO2012169858A2 (en) 2012-12-13
KR20120137450A (en) 2012-12-21

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