WO2012157871A3 - Appareil d'hydrogénation de plasma - Google Patents
Appareil d'hydrogénation de plasma Download PDFInfo
- Publication number
- WO2012157871A3 WO2012157871A3 PCT/KR2012/003476 KR2012003476W WO2012157871A3 WO 2012157871 A3 WO2012157871 A3 WO 2012157871A3 KR 2012003476 W KR2012003476 W KR 2012003476W WO 2012157871 A3 WO2012157871 A3 WO 2012157871A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- plasma
- based compound
- supply portion
- generated
- hydrogenation apparatus
- Prior art date
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/24—Stationary reactors without moving elements inside
- B01J19/2405—Stationary reactors without moving elements inside provoking a turbulent flow of the reactants, such as in cyclones, or having a high Reynolds-number
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/10—Compounds containing silicon, fluorine, and other elements
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0873—Materials to be treated
- B01J2219/0881—Two or more materials
- B01J2219/0883—Gas-gas
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Silicon Compounds (AREA)
Abstract
L'invention concerne un appareil d'hydrogénation de plasma. Selon un mode de réalisation de la présente invention, l'appareil d'hydrogénation de plasma comprend : une partie d'alimentation en ondes électromagnétiques permettant de faire osciller des ondes électromagnétiques de fréquence prédéfinie ; un tube à décharge permettant de générer un plasma à partir des ondes électromagnétiques produites par la partie d'alimentation en ondes électromagnétiques et de l'hydrogène gazeux ou un mélange gazeux contenant de l'hydrogène ; une partie d'alimentation en gaz permettant d'injecter en volute l'hydrogène gazeux ou le mélange gazeux contenant de l'hydrogène dans le tube à décharge ; une partie d'alimentation en réactif permettant d'alimenter en un composé à base de Si-Cl le plasma généré à l'intérieur du tube à décharge ; un réacteur dans lequel un composé à base de Si-H-Cl est généré par la réaction d'atomes d'hydrogène ou d'ions dissociés par le plasma généré et le composé à base de Si-Cl ; et une partie de décharge de produit permettant de décharger le composé à base de Si-H-Cl généré dans le réacteur.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2011-0047020 | 2011-05-18 | ||
KR1020110047020A KR101329750B1 (ko) | 2011-05-18 | 2011-05-18 | 플라즈마 수소화 반응 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2012157871A2 WO2012157871A2 (fr) | 2012-11-22 |
WO2012157871A3 true WO2012157871A3 (fr) | 2013-01-24 |
Family
ID=47177434
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2012/003476 WO2012157871A2 (fr) | 2011-05-18 | 2012-05-03 | Appareil d'hydrogénation de plasma |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR101329750B1 (fr) |
WO (1) | WO2012157871A2 (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013207447A1 (de) | 2013-04-24 | 2014-10-30 | Evonik Degussa Gmbh | Verfahren und Vorrichtung zur Herstellung von Octachlortrisilan |
KR20210030040A (ko) * | 2019-09-09 | 2021-03-17 | 엄환섭 | 일산화질소 발생장치 |
CN112479212B (zh) * | 2020-12-16 | 2022-06-28 | 亚洲硅业(青海)股份有限公司 | 一种六氯乙硅烷提纯装置及方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3933985A (en) * | 1971-09-24 | 1976-01-20 | Motorola, Inc. | Process for production of polycrystalline silicon |
US4102985A (en) * | 1977-01-06 | 1978-07-25 | Westinghouse Electric Corp. | Arc heater production of silicon involving a hydrogen reduction |
US4309259A (en) * | 1980-05-09 | 1982-01-05 | Motorola, Inc. | High pressure plasma hydrogenation of silicon tetrachloride |
JP2727728B2 (ja) * | 1990-03-19 | 1998-03-18 | 三菱マテリアル株式会社 | 純物質の製造装置および純物質の製造方法 |
KR20070056965A (ko) * | 2005-11-29 | 2007-06-04 | 칫소가부시키가이샤 | 고순도 다결정 실리콘의 제조 방법 및 제조 장치 |
-
2011
- 2011-05-18 KR KR1020110047020A patent/KR101329750B1/ko active IP Right Grant
-
2012
- 2012-05-03 WO PCT/KR2012/003476 patent/WO2012157871A2/fr active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3933985A (en) * | 1971-09-24 | 1976-01-20 | Motorola, Inc. | Process for production of polycrystalline silicon |
US4102985A (en) * | 1977-01-06 | 1978-07-25 | Westinghouse Electric Corp. | Arc heater production of silicon involving a hydrogen reduction |
US4309259A (en) * | 1980-05-09 | 1982-01-05 | Motorola, Inc. | High pressure plasma hydrogenation of silicon tetrachloride |
JP2727728B2 (ja) * | 1990-03-19 | 1998-03-18 | 三菱マテリアル株式会社 | 純物質の製造装置および純物質の製造方法 |
KR20070056965A (ko) * | 2005-11-29 | 2007-06-04 | 칫소가부시키가이샤 | 고순도 다결정 실리콘의 제조 방법 및 제조 장치 |
Also Published As
Publication number | Publication date |
---|---|
WO2012157871A2 (fr) | 2012-11-22 |
KR101329750B1 (ko) | 2013-11-14 |
KR20130027616A (ko) | 2013-03-18 |
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