WO2012157871A3 - Plasma hydrogenation apparatus - Google Patents

Plasma hydrogenation apparatus Download PDF

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Publication number
WO2012157871A3
WO2012157871A3 PCT/KR2012/003476 KR2012003476W WO2012157871A3 WO 2012157871 A3 WO2012157871 A3 WO 2012157871A3 KR 2012003476 W KR2012003476 W KR 2012003476W WO 2012157871 A3 WO2012157871 A3 WO 2012157871A3
Authority
WO
WIPO (PCT)
Prior art keywords
plasma
based compound
supply portion
generated
hydrogenation apparatus
Prior art date
Application number
PCT/KR2012/003476
Other languages
French (fr)
Korean (ko)
Other versions
WO2012157871A2 (en
Inventor
홍용철
이봉주
신동훈
Original Assignee
(주)그린사이언스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by (주)그린사이언스 filed Critical (주)그린사이언스
Publication of WO2012157871A2 publication Critical patent/WO2012157871A2/en
Publication of WO2012157871A3 publication Critical patent/WO2012157871A3/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/24—Stationary reactors without moving elements inside
    • B01J19/2405—Stationary reactors without moving elements inside provoking a turbulent flow of the reactants, such as in cyclones, or having a high Reynolds-number
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/10—Compounds containing silicon, fluorine, and other elements
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0873—Materials to be treated
    • B01J2219/0881—Two or more materials
    • B01J2219/0883—Gas-gas

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Silicon Compounds (AREA)

Abstract

Disclosed is a plasma hydrogenation apparatus. According to one embodiment of the present invention, the plasma hydrogenation apparatus comprises: an electromagnetic wave supply portion for oscillating electromagnetic waves of preset frequency; a discharge tube for generating plasma from the electromagnetic waves supplied from the electromagnetic wave supply portion and a hydrogen gas or a mixture gas containing hydrogen; a gas supply portion for volutedly injecting the hydrogen gas or the mixture gas containing hydrogen into the discharge tube; a reactant supply portion for supplying a Si-Cl-based compound to the plasma generated inside the discharge tube; a reactor in which a Si-H-Cl-based compound is generated through the reaction of hydrogen atoms or ions dissociated by the generated plasma and the Si-Cl-based compound; and a product discharge portion for discharging the Si-H-Cl-based compound generated at the reactor.
PCT/KR2012/003476 2011-05-18 2012-05-03 Plasma hydrogenation apparatus WO2012157871A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020110047020A KR101329750B1 (en) 2011-05-18 2011-05-18 Plasma hydrogenation apparatus
KR10-2011-0047020 2011-05-18

Publications (2)

Publication Number Publication Date
WO2012157871A2 WO2012157871A2 (en) 2012-11-22
WO2012157871A3 true WO2012157871A3 (en) 2013-01-24

Family

ID=47177434

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/003476 WO2012157871A2 (en) 2011-05-18 2012-05-03 Plasma hydrogenation apparatus

Country Status (2)

Country Link
KR (1) KR101329750B1 (en)
WO (1) WO2012157871A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013207447A1 (en) * 2013-04-24 2014-10-30 Evonik Degussa Gmbh Process and apparatus for the preparation of octachlorotrisilane
KR20210030040A (en) * 2019-09-09 2021-03-17 엄환섭 Apparatus of nitrogen monoxide generation
CN112479212B (en) * 2020-12-16 2022-06-28 亚洲硅业(青海)股份有限公司 Hexachlorodisilane purification device and method

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3933985A (en) * 1971-09-24 1976-01-20 Motorola, Inc. Process for production of polycrystalline silicon
US4102985A (en) * 1977-01-06 1978-07-25 Westinghouse Electric Corp. Arc heater production of silicon involving a hydrogen reduction
US4309259A (en) * 1980-05-09 1982-01-05 Motorola, Inc. High pressure plasma hydrogenation of silicon tetrachloride
JP2727728B2 (en) * 1990-03-19 1998-03-18 三菱マテリアル株式会社 Pure substance production apparatus and pure substance production method
KR20070056965A (en) * 2005-11-29 2007-06-04 칫소가부시키가이샤 Production process for high purity polycrystal silicon and production apparatus for the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3933985A (en) * 1971-09-24 1976-01-20 Motorola, Inc. Process for production of polycrystalline silicon
US4102985A (en) * 1977-01-06 1978-07-25 Westinghouse Electric Corp. Arc heater production of silicon involving a hydrogen reduction
US4309259A (en) * 1980-05-09 1982-01-05 Motorola, Inc. High pressure plasma hydrogenation of silicon tetrachloride
JP2727728B2 (en) * 1990-03-19 1998-03-18 三菱マテリアル株式会社 Pure substance production apparatus and pure substance production method
KR20070056965A (en) * 2005-11-29 2007-06-04 칫소가부시키가이샤 Production process for high purity polycrystal silicon and production apparatus for the same

Also Published As

Publication number Publication date
KR20130027616A (en) 2013-03-18
KR101329750B1 (en) 2013-11-14
WO2012157871A2 (en) 2012-11-22

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