WO2012105785A3 - 기판 지지용 보트 및 이를 사용한 지지유닛 - Google Patents

기판 지지용 보트 및 이를 사용한 지지유닛 Download PDF

Info

Publication number
WO2012105785A3
WO2012105785A3 PCT/KR2012/000714 KR2012000714W WO2012105785A3 WO 2012105785 A3 WO2012105785 A3 WO 2012105785A3 KR 2012000714 W KR2012000714 W KR 2012000714W WO 2012105785 A3 WO2012105785 A3 WO 2012105785A3
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
boat
support unit
same
supporting substrate
Prior art date
Application number
PCT/KR2012/000714
Other languages
English (en)
French (fr)
Other versions
WO2012105785A2 (ko
Inventor
강호영
박경완
조병호
박주영
Original Assignee
주식회사 테라세미콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020110030216A external-priority patent/KR101284105B1/ko
Application filed by 주식회사 테라세미콘 filed Critical 주식회사 테라세미콘
Priority to JP2013551915A priority Critical patent/JP6006734B2/ja
Priority to CN201280010669.8A priority patent/CN103392228B/zh
Publication of WO2012105785A2 publication Critical patent/WO2012105785A2/ko
Publication of WO2012105785A3 publication Critical patent/WO2012105785A3/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67303—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
    • H01L21/67309—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements characterized by the substrate support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6734—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders specially adapted for supporting large square shaped substrates

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

기판 지지용 보트 및 이를 사용한 지지유닛이 개시된다. 본 발명에 따른 기판 지지용 보트 및 이를 사용한 지지유닛은 복수의 제 1 및 제 2 지지핀에 의하여 기판의 전체면이 균일하게 지지되므로, 기판의 처리시 기판이 자중에 의하여 처지는 것이 방지된다. 그러므로, 기판을 처리 하여도, 기판의 특성 변화가 없으므로, 기판의 처리공정의 신뢰성이 향상되는 효과가 있다.
PCT/KR2012/000714 2011-02-01 2012-01-31 기판 지지용 보트 및 이를 사용한 지지유닛 WO2012105785A2 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2013551915A JP6006734B2 (ja) 2011-02-01 2012-01-31 基板支持用ボートおよびこれを用いた支持ユニット
CN201280010669.8A CN103392228B (zh) 2011-02-01 2012-01-31 基板支撑用的晶舟以及使用该晶舟的支撑单元

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR10-2011-0010132 2011-02-01
KR20110010132 2011-02-01
KR1020110030216A KR101284105B1 (ko) 2011-04-01 2011-04-01 기판 지지용 보트
KR10-2011-0030216 2011-04-01

Publications (2)

Publication Number Publication Date
WO2012105785A2 WO2012105785A2 (ko) 2012-08-09
WO2012105785A3 true WO2012105785A3 (ko) 2012-11-29

Family

ID=46603197

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/000714 WO2012105785A2 (ko) 2011-02-01 2012-01-31 기판 지지용 보트 및 이를 사용한 지지유닛

Country Status (4)

Country Link
JP (1) JP6006734B2 (ko)
CN (1) CN103392228B (ko)
TW (1) TWI600105B (ko)
WO (1) WO2012105785A2 (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016002978A1 (ko) * 2014-06-30 2016-01-07 주식회사 테라세미콘 보트
CN205608389U (zh) * 2016-05-11 2016-09-28 重庆京东方光电科技有限公司 一种缓存装置及设有该缓存装置的涂胶显影机
CN106216317A (zh) * 2016-08-10 2016-12-14 宁夏高创特能源科技有限公司 一种平面靶材清洗防护用模块化组合插片花篮
CN108103481B (zh) * 2018-01-25 2023-07-18 无锡盈芯半导体科技有限公司 衬底自动挟式石英舟
CN208157378U (zh) * 2018-04-09 2018-11-27 深圳市捷佳伟创新能源装备股份有限公司 一种pevcd卧式石墨舟结构

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100554631B1 (ko) * 2002-07-15 2006-02-22 샤프 가부시키가이샤 기판용 카세트
KR100600515B1 (ko) * 2005-01-20 2006-07-13 (주)상아프론테크 크로스바 설치용 연결구가 구비된 기판 적재용 카세트
JP3977481B2 (ja) * 1997-04-11 2007-09-19 淀川ヒューテック株式会社 基板用トレイカセット
KR20100064504A (ko) * 2008-12-05 2010-06-15 주식회사 에스에프에이 기판 보관용 카세트 및 그를 구비한 기판 보관용 카세트 시스템

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3977491B2 (ja) * 1997-07-16 2007-09-19 淀川ヒューテック株式会社 基板用カセット
JP2001127147A (ja) * 1999-10-27 2001-05-11 Kanegafuchi Chem Ind Co Ltd 熱処理用キャリア
JP2001223262A (ja) * 2000-02-07 2001-08-17 Kanegafuchi Chem Ind Co Ltd 熱処理用キャリア
CN100344513C (zh) * 2005-03-04 2007-10-24 友达光电股份有限公司 基板搬运架
US7822324B2 (en) * 2006-08-14 2010-10-26 Applied Materials, Inc. Load lock chamber with heater in tube
JP4317883B2 (ja) * 2007-04-18 2009-08-19 国立大学法人東北大学 支持ピンの製造方法、支持ピン、熱処理装置および基板焼成炉

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3977481B2 (ja) * 1997-04-11 2007-09-19 淀川ヒューテック株式会社 基板用トレイカセット
KR100554631B1 (ko) * 2002-07-15 2006-02-22 샤프 가부시키가이샤 기판용 카세트
KR100600515B1 (ko) * 2005-01-20 2006-07-13 (주)상아프론테크 크로스바 설치용 연결구가 구비된 기판 적재용 카세트
KR20100064504A (ko) * 2008-12-05 2010-06-15 주식회사 에스에프에이 기판 보관용 카세트 및 그를 구비한 기판 보관용 카세트 시스템

Also Published As

Publication number Publication date
TWI600105B (zh) 2017-09-21
TW201243984A (en) 2012-11-01
CN103392228A (zh) 2013-11-13
CN103392228B (zh) 2016-09-21
WO2012105785A2 (ko) 2012-08-09
JP6006734B2 (ja) 2016-10-12
JP2014511558A (ja) 2014-05-15

Similar Documents

Publication Publication Date Title
ZA201308335B (en) Process for treating microfibrillated cellulose and microfibrillated cellulose treated according to the process
EP2864364A4 (en) METHOD AND DEVICE FOR TREATING BIOMASS SUBSTRATES
WO2012105785A3 (ko) 기판 지지용 보트 및 이를 사용한 지지유닛
EP3390636A4 (en) ANTISENSE OLIGOMERS FOR THE TREATMENT OF DOMINANT AUTOSOMAL MENTAL DELAY 5 AND DRAVET SYNDROME
TWI561672B (en) Film deposition apparatus, substrate processing apparatus and film deposition method
MY163030A (en) Methods and systems for coating granular substrates
EP4379578A3 (en) Learning situations via pattern matching
EP2921574A4 (en) SURFACE TREATMENT METHOD FOR MONOCRYSTALLINE SiC SUBSTRATE, AND MONOCRYSTALLINE SiC SUBSTRATES
EP2449046A4 (en) SURFACE TREATMENT PROCEDURE AND TREATED ITEMS
PL2747722T3 (pl) System i sposób leczenia owrzodzeń nóg
ZA201304350B (en) Process for treating water intritation-denitration comprising at least one aerated step and one step controlling the oxygen input during the aerated step
WO2012030703A3 (en) Apparatus and method for heat treating a glass substrate
EP2704537A4 (en) WELDING SUBSTRATE, MULTIPLE WIRE SUBSTRATE AND MANUFACTURING METHOD THEREFOR
BR112014011095A2 (pt) reator de secagem e torrefação, instalação de tratamento de biomassa, processo de secagem e aplicação do reator
ZA201407411B (en) Process for treating biomass
EP3187579A4 (en) Composition, support, wastewater treatment system, wastewater treating method, deodorization method, and batch wastewater treating method
EP2921575A4 (en) SILICON CARBIDE MONOCRYSTAL SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
SG11201407086TA (en) Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
SG11201502378PA (en) Method for treating substrate that supports catalyst particles for plating processing
EP2534824A4 (en) METHODS, DEVICES AND COMPUTER PROGRAM PRODUCTS FOR DETERMINING THE MOST PLAYED ELEMENTS OF MEDIA DATA AS RINGING TONE ALARMS
EP2879177A4 (en) PROCESS FOR PRODUCING SOS SUBSTRATES AND SOS SUBSTRATE
PH12017500087A1 (en) Apparatus and method for reducing substrate sliding in process chambers
GB2554624B (en) Process for the Treatment of Ashes and Digestates, Treated Ashes and Digestates thus obtained and uses thereof.
HK1245410A1 (zh) 偏振光分束器及使用了該偏振光分束器的基板處理裝置
EP2712027A4 (en) DIELECTRIC SUBSTRATE OF METAMATERIAL, AND PROCESSING METHOD THEREOF

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 12742126

Country of ref document: EP

Kind code of ref document: A2

ENP Entry into the national phase

Ref document number: 2013551915

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 12742126

Country of ref document: EP

Kind code of ref document: A2