WO2012091424A3 - 광분해성 전자재료,이로부터 형성된 절연막 및 유기발광소자 - Google Patents

광분해성 전자재료,이로부터 형성된 절연막 및 유기발광소자 Download PDF

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Publication number
WO2012091424A3
WO2012091424A3 PCT/KR2011/010178 KR2011010178W WO2012091424A3 WO 2012091424 A3 WO2012091424 A3 WO 2012091424A3 KR 2011010178 W KR2011010178 W KR 2011010178W WO 2012091424 A3 WO2012091424 A3 WO 2012091424A3
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WO
WIPO (PCT)
Prior art keywords
electronic
photodegradable material
insulating layer
emitting diode
organic light
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Application number
PCT/KR2011/010178
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English (en)
French (fr)
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WO2012091424A2 (ko
Inventor
박세형
이병일
김병기
Original Assignee
코오롱인더스트리 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 코오롱인더스트리 주식회사 filed Critical 코오롱인더스트리 주식회사
Publication of WO2012091424A2 publication Critical patent/WO2012091424A2/ko
Publication of WO2012091424A3 publication Critical patent/WO2012091424A3/ko

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/06—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • H10K71/231—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers
    • H10K71/233—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers by photolithographic etching

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

본 발명은 광분해성 전자재료, 이로부터 형성된 절연막 및 유기발광소자에 관한 것으로, 구체적으로는 알칼리 가용성 수지로서 폴리이미드 수지, 디아지드계 감광성 화합물 및 감도증진제를 포함하여 패턴공정에서 현상성이 우수하고 가시광선 파장 영역(400nm ~ 650nm)에서 90% 이상의 광투과율을 가져 고해상도 패턴이 요구되는 평판디스플레이 분야, 특히 유기발광소자의 유기 절연막 형성에 유용한 장점을 가진다.
PCT/KR2011/010178 2010-12-29 2011-12-27 광분해성 전자재료,이로부터 형성된 절연막 및 유기발광소자 WO2012091424A2 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2010-0138154 2010-12-29
KR1020100138154A KR20120076129A (ko) 2010-12-29 2010-12-29 광분해성 전자재료，이로부터 형성된 절연막 및 유기발광소자

Publications (2)

Publication Number Publication Date
WO2012091424A2 WO2012091424A2 (ko) 2012-07-05
WO2012091424A3 true WO2012091424A3 (ko) 2012-10-18

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Application Number Title Priority Date Filing Date
PCT/KR2011/010178 WO2012091424A2 (ko) 2010-12-29 2011-12-27 광분해성 전자재료,이로부터 형성된 절연막 및 유기발광소자

Country Status (3)

Country Link
KR (1) KR20120076129A (ko)
TW (1) TW201232181A (ko)
WO (1) WO2012091424A2 (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102478471B1 (ko) 2015-07-03 2022-12-19 삼성디스플레이 주식회사 표시 장치
KR102602153B1 (ko) * 2018-11-22 2023-11-15 (주)이녹스첨단소재 Rdl 형성 공정용 양면 접착 테이프, 이를 포함하는 적층체 및 이를 이용한 팬-아웃 패키지 제작 공정
CN113429623B (zh) * 2021-06-17 2022-05-31 中国科学院山西煤炭化学研究所 一种降解聚酰亚胺树脂制备聚酰胺酸的方法
CN113416346B (zh) * 2021-06-17 2022-05-31 中国科学院山西煤炭化学研究所 一种微波可控断裂碳氮键制备聚酰胺酸的方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06208222A (ja) * 1992-11-18 1994-07-26 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
KR20080030115A (ko) * 2005-09-05 2008-04-03 아사히 가세이 일렉트로닉스 가부시끼가이샤 포지티브형 감광성 수지 조성물
US20100216070A1 (en) * 2006-12-04 2010-08-26 Central Glass Co., Ltd. Photosensitive Polyimides and Methods of Making the Same
KR20100102058A (ko) * 2009-03-10 2010-09-20 주식회사 엘지화학 폴리이미드계 중합체와 이들의 공중합체 및 이들을 포함하는 포지티브형 감광성 수지 조성물

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06208222A (ja) * 1992-11-18 1994-07-26 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
KR20080030115A (ko) * 2005-09-05 2008-04-03 아사히 가세이 일렉트로닉스 가부시끼가이샤 포지티브형 감광성 수지 조성물
US20100216070A1 (en) * 2006-12-04 2010-08-26 Central Glass Co., Ltd. Photosensitive Polyimides and Methods of Making the Same
KR20100102058A (ko) * 2009-03-10 2010-09-20 주식회사 엘지화학 폴리이미드계 중합체와 이들의 공중합체 및 이들을 포함하는 포지티브형 감광성 수지 조성물

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Publication number Publication date
WO2012091424A2 (ko) 2012-07-05
TW201232181A (en) 2012-08-01
KR20120076129A (ko) 2012-07-09

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