WO2012069475A1 - Coated cutting tool insert - Google Patents
Coated cutting tool insert Download PDFInfo
- Publication number
- WO2012069475A1 WO2012069475A1 PCT/EP2011/070685 EP2011070685W WO2012069475A1 WO 2012069475 A1 WO2012069475 A1 WO 2012069475A1 EP 2011070685 W EP2011070685 W EP 2011070685W WO 2012069475 A1 WO2012069475 A1 WO 2012069475A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- cutting tool
- hkl
- tool insert
- layer
- insert according
- Prior art date
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
- B23B27/148—Composition of the cutting inserts
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T407/00—Cutters, for shaping
- Y10T407/27—Cutters, for shaping comprising tool of specific chemical composition
Definitions
- the present invention relates to a cutting tool insert comprising of a body of a hard alloy of cemented carbide, cermet, ceramics and cubic boron nitride based materials and a coating designed to be used in metal cutting applications generating high tool temperatures.
- Said coating comprises at least one thermally stable, textured
- Ti,Al,Cr,Me based nitride, carbonitride, oxynitride and/or oxycarbonitride layer, where Me is one or more of the elements: Zr, Hf, V, Nb, Ta, Mo, W or Si.
- the coating is grown by physical vapour deposition (PVD) and preferably by cathodic arc evaporation.
- JP 7237010 discloses a coated cutting tool at least one layer selected from
- Ti,Al,Cr (Ti,Al,Cr)C, (Ti,Al,Cr)N or (Ti,Al,Cr)(C,N) and at least one layer of Ti, TiC, TiN or TiCN.
- JP 4128363 discloses a (Tiigoing x grease y Al x Cr y )N layer where x ⁇ 0.8 and 0.2 ⁇ y ⁇ 0.7.
- JP 2000038653 discloses a (Tii_ x _ y Cr x Al y )N layer where 0.02 ⁇ x ⁇ 1.0 and 0.02 ⁇ y ⁇ 0.7.
- EP 1219723 discloses a hard coating for cutting tools composed of (Tii_ a _b- C - d Al a Cr b Si c B d )(Ci_ e Ne) where 0.5 ⁇ a ⁇ 0.8, 0.06 ⁇ b, 0 ⁇ c ⁇ 0.1, 0 ⁇ d ⁇ 0.1, 0 ⁇ c + d ⁇ 0.1, a + b + c + d ⁇ 1 and
- EP 1947209 discloses a first layer of (Cri_ x M x )(B a C b Ni_ a -b) where 0 ⁇ x ⁇ 0.7, 0 ⁇ a ⁇ 0.2 and 0 ⁇ b ⁇ 0.5 and M is at least one of the elements W, V, Mo, Nb, Ti and Al and a second layer of (Tii_x_YCrxAlYLz)(B B CANi_A-B) where 0 ⁇ 1-X-Y ⁇ 0.5, 0 ⁇ X ⁇ 0.5 , 0.4 ⁇ Y ⁇ 0.7, 0 ⁇ Z ⁇ 0.15, 0 ⁇ A ⁇ 0.5, and 0 ⁇ B ⁇ 0.2 and L is at least either of Si and Y.
- the metal cutting industry is continuously looking for new hard coatings with improved high temperature wear resistance and is partly biased by the ongoing development of advanced work material as well as the need for an increased productivity.
- these aspects typically results in an increase of the tool temperature during a cutting operation.
- the problem to be solved by the present invention focuses on how to provide an alternative method for making a coated cutting tool insert, drill or endmill.
- Fig 1 SEM micrograph of a fractured cross section (Tio . i 7 Alo.5 3 Cro .3 o)N layer, marked with I, on a cemented carbide insert, marked with II.
- Fig 2 TEM micrograph of a (Tio . i 7 Alo.53Cro.3o)N layer in cross section. The image is obtained close to the middle of the layer thickness. The growth direction is marked with an arrow.
- Fig 3 Grazing incidence X-ray diffraction patterns of a (Tio . i 7 Alo.53Cro.3o)N layer obtained with an incidence angle of 1°.
- the diffraction peaks are indexed as a NaCl- structure.
- Fig 4 X-ray diffraction patterns of (Ti,Al,Cr)N layers with (A) a layer with ⁇ 111 ⁇ fiber texture having a Cr content of 30 at% and (B) a layer with ⁇ 200 ⁇ fiber textured having a Cr content of 10 at%.
- a cutting tool insert for machining by chip removal comprising a body of a hard alloy of cemented carbide, cermet, ceramics, polycrystalhne- diamond or cubic boron nitride based materials onto which is deposited a hard and wear resistant coating comprising at least one layer of a NaCl-structured (Ti c Al a Cr b Me d )(C z O y N x ) with a thickness between 0.5 and 10 ⁇ , preferably between 1.5 and 5 ⁇ , where Me is one or more of the elements: Zr, Hf, V, Nb, Ta, Mo, W or Si, preferably Zr, Nb and Ta, and
- c > 0.05, preferably 0.05 ⁇ c ⁇ b + d,
- Said layer has a fiber texture with texture coefficients, TC(hkl), according to:
- TC m eas(hkl) is the measured texture coefficient for a given (hkl) reflection
- ⁇ ( ⁇ " 1 ) is the linear absorption coefficient
- x ( ⁇ ) is the layer thickness
- QtM is half the diffraction angle for the same (hkl) reflection.
- ⁇ vary between 0.053 and 0.11 ⁇ 1 using CuKoc radiation, ⁇ increases with an increasing Cr content of the layers.
- TC m eas(hkl) is determined from X-ray diffraction data in a ⁇ - 2 ⁇ configuration as:
- Imeas(hkl) is the intensity of the (hkl) reflection
- I 0 (hkl) is the standard intensity for the same (hkl) reflection
- I 0 (l 11) 72
- I o (200) 100
- I o (220) 45, respectively
- n 3, i.e., the number of (hkl) reflections used in the calculations.
- only the first order reflections (hkl) are used, i.e., (I l l), (200) and (220), respectively.
- Said layer has a columnar microstructure with an average column width of ⁇ 1 ⁇ , preferably ⁇ 0.6 ⁇ , as determined by cross sectional transmission electron microscopy of a middle region of the layer, i.e., a region within 30 to 70 % of the layer thickness in the growth direction, and said average columnar width is the average of at least 10 adjacent columns.
- Said layer has a compressive stress level -6.0 ⁇ ⁇ ⁇ -0.5 GPa, preferably -4.0 ⁇ ⁇ ⁇ -1.5 GPa.
- Said layer has a nanohardness >25 GPa, preferably between 25 GPa and 40 GPa, as measured by nanoindentation experiments.
- Said layer may comprise an inner single- and/or laminated coating structure of, e.g., TiN, TiC, Ti(C,N) or (Ti,Al)N, preferably TiN or (Ti,Al)N, and/or an outer single- and/or laminated coating structure of, e.g., TiN, TiC, Ti(C,N), (Ti,Al)N or oxides, preferably TiN or (Ti,Al)N, to a total thickness of 0.7 to 20 ⁇ , preferably 2 to 10 ⁇ , and most preferably 2 to 7 ⁇ , according to prior art.
- TiN, TiC, Ti(C,N) or (Ti,Al)N preferably TiN or (Ti,Al)N
- oxides preferably TiN or (Ti,Al)N
- the deposition method for the layers of the present invention is based on PVD techniques, e.g., cathodic arc evaporation or magnetron sputtering using one or more pure and/or alloyed metal (Ti c Al a Cr Me d ) cathodes/targets.
- PVD techniques e.g., cathodic arc evaporation or magnetron sputtering using one or more pure and/or alloyed metal (Ti c Al a Cr Me d ) cathodes/targets.
- the layers according to the invention are grown with an evaporation current between 50 and 200 A depending on the cathode size. A higher evaporation current is needed for larger cathodes in order to achieve comparable deposition conditions.
- the layers are grown using one or more pure, composite and/or alloyed metal cathodes, where Me is one or more of the elements: Zr, Hf, V, Nb, Ta, Mo, W or Si, in a reactive atmosphere containing N 2 and optionally 0 2 and/or C-containing gases, with or without a carrier gas such as, e.g. Ar, at a total gas pressure between 1.0 and 7.0 Pa, preferably between 1.5 and 4.0 Pa.
- a carrier gas such as, e.g. Ar
- the C-containing gas may, e.g., be selected from CH 4 and/or C 2 H 2 .
- the desired layer composition is obtained by selecting adequate (Ti c Al a Cr Me d ) cathode compositions and gas atmosphere.
- the negative substrate bias is between 0 and 300 V, preferably between 10 and 150 V, most preferably between 15 and 60 V.
- the deposition temperature is between 200 and 800 °C, preferably between 300 and 600 °C.
- the layers according to the invention are grown with a power density applied to the sputter target between 0.5 and 15 W/cm , preferably between 1 and 5 W/cm .
- the layers are grown using one or more pure, composite and/or alloyed metal cathodes, where Me is one or more of the elements: Zr, Hf, V, Nb, Ta, Mo, W or Si, in a reactive atmosphere containing N 2 and optionally 0 2 and/or C-containing gases, with or without a carrier gas such as, e.g. Ar, at a total pressure between 0.13 and 7.0 Pa, preferably between 0.13 and 2.5 Pa.
- a carrier gas such as, e.g. Ar
- the C-containing gas may, e.g., be selected from CH 4 and/or C 2 H 2 .
- the desired layer composition is obtained by selecting adequate (Ti c Al a CrbMed) cathode compositions and gas atmosphere.
- the negative substrate bias is between 0 and 300 V, preferably between 10 and 150 V, most preferably between 20 and 100 V.
- the deposition temperature is between 200 and 800 °C, preferably between 300 and 600 °C.
- the invention also relates to the use of cutting tool insert according to the above for metal machining generating high temperatures, e.g., super alloys and hardened steel at cutting speeds of 50 - 500 m/min, preferably 50 - 300 m/min, with an average feed of 0.08 - 0.5 mm/rev, preferably 0.1 - 0.4 mm/rev, depending on cutting speed and insert geometry.
- the present invention has been described with reference to a cutting tool insert but it is evident that it also can be applied to other metal cutting tools, e.g., drills and endmills.
- compositions as shown in Table 1. The layers were grown at 400 °C, in pure N 2 atmosphere at a total pressure of 2.5 Pa, using a substrate bias of -40 V and an
- the as-deposited layers were characterized with respect to composition, microstructure and hardness by scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray diffraction (XRD) and nanoindentation, respectively.
- SEM scanning electron microscopy
- TEM transmission electron microscopy
- XRD X-ray diffraction
- the average composition of the layers was estimated by energy dispersive spectroscopy (EDS) analysis area using a LEO Ultra 55 scanning electron microscope operated at 10 kV equipped with a Thermo Noran EDS. Industrial standards and ZAF correction were used for the quantitative analysis.
- the metal composition was evaluated using a Noran System Six (NSS ver 2) software (see Table 1).
- Figure 1 is a SEM micrograph of sample #23 in Table 1 showing a fractured cross section of the (Tio . i 7 Alo.53Cro.3o)N layer, marked as I, and the cemented carbide insert, marked as II.
- I the cemented carbide insert
- II the cemented carbide insert
- Figure 2 shows a TEM micrograph of the ( ⁇ .17 ⁇ 1 ⁇ .53 ⁇ 3 ⁇ 4.3 0 ) ⁇ layer in cross section. The image is obtained close to the middle of the layer thickness and the growth direction is marked with an arrow. Said layer has a columnar microstructure with an average columnar width of about 0.5 ⁇ . The average column width was determined by averaging the width of more than 10 adjacent columns.
- the NaCl-structure of the layers was confirmed by XRD in both ⁇ -2 ⁇ and grazing incidence (GI) configuration.
- XRD patterns were obtained using a Bruker AXS D8- advanced x-ray diffractometer with Cu K a radiation.
- Figure 3 shows the GI pattern, 1° incidence angle, of sample #23 from which the NaCl layer structure is verified.
- the XRD data was also used to determine the texture relations of the samples.
- the residual stresses, ⁇ , of the (Ti,Al,Cr)N layers were evaluated by XRD measurements using the sin ⁇ method.
- the stress measurements were obtained using the 220-reflection.
- Data was obtained using the side-inclination technique ( ⁇ -geometry) with 11, ⁇ -angles (positive and negative), equidistant within a sin ⁇ range of 0 to 0.82 ( ⁇ 65°).
- Example 1 was repeated but using an alloyed (Tio .33AI0 .33 03 ⁇ 4 .34 ) cathode for growth of samples 1-4 in, an alloyed (Tio.25Alo.45Cro.30) cathode for growth of samples 5-8 and an alloyed (Tio.15Alo.55Cro.30) cathode for growth of samples 9-12 in Table 6, respectively.
- Said layers were grown in a mixed reactive N2 + O2 + CH 4 gas mixture at a total gas pressure of 2.5 Pa. The partial pressures of N 2 , O2 and CH 4 were individually set to yield the desired layer composition as shown in Table 5.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
Abstract
Description
Claims
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020137016278A KR101831014B1 (en) | 2010-11-23 | 2011-11-22 | Coated cutting tool insert |
CN201180056410.2A CN103249869B (en) | 2010-11-23 | 2011-11-22 | Coated cutting tool insert |
BR112013012688A BR112013012688A2 (en) | 2010-11-23 | 2011-11-22 | coated cutting tool insert |
US13/989,139 US9180522B2 (en) | 2010-11-23 | 2011-11-22 | Coated cutting tool insert |
RU2013128471/02A RU2013128471A (en) | 2010-11-23 | 2011-11-22 | COATED CUTTING PLATE |
EP11784719.4A EP2643498B1 (en) | 2010-11-23 | 2011-11-22 | Coated cutting tool insert for metal machining that generates high temperatures |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP10192235.9 | 2010-11-23 | ||
EP10192235 | 2010-11-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2012069475A1 true WO2012069475A1 (en) | 2012-05-31 |
Family
ID=43821795
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2011/070685 WO2012069475A1 (en) | 2010-11-23 | 2011-11-22 | Coated cutting tool insert |
Country Status (7)
Country | Link |
---|---|
US (1) | US9180522B2 (en) |
EP (1) | EP2643498B1 (en) |
KR (1) | KR101831014B1 (en) |
CN (1) | CN103249869B (en) |
BR (1) | BR112013012688A2 (en) |
RU (1) | RU2013128471A (en) |
WO (1) | WO2012069475A1 (en) |
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RU2553778C1 (en) * | 2013-12-03 | 2015-06-20 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Ульяновский государственный технический университет" | Method for obtaining multi-layered coating for cutting tool |
RU2553767C1 (en) * | 2013-12-03 | 2015-06-20 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Ульяновский государственный технический университет" | Method for multi-layer coating obtaining for cutting tool |
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Also Published As
Publication number | Publication date |
---|---|
EP2643498B1 (en) | 2018-10-10 |
EP2643498A1 (en) | 2013-10-02 |
KR20130121884A (en) | 2013-11-06 |
KR101831014B1 (en) | 2018-02-21 |
US20130287507A1 (en) | 2013-10-31 |
CN103249869B (en) | 2016-05-18 |
US9180522B2 (en) | 2015-11-10 |
RU2013128471A (en) | 2014-12-27 |
BR112013012688A2 (en) | 2016-09-06 |
CN103249869A (en) | 2013-08-14 |
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