WO2012032903A1 - フィルムの露光装置 - Google Patents

フィルムの露光装置 Download PDF

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Publication number
WO2012032903A1
WO2012032903A1 PCT/JP2011/068573 JP2011068573W WO2012032903A1 WO 2012032903 A1 WO2012032903 A1 WO 2012032903A1 JP 2011068573 W JP2011068573 W JP 2011068573W WO 2012032903 A1 WO2012032903 A1 WO 2012032903A1
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WO
WIPO (PCT)
Prior art keywords
film
mask
exposure
mark
exposure apparatus
Prior art date
Application number
PCT/JP2011/068573
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
水村　通伸
Original Assignee
株式会社ブイ・テクノロジー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社ブイ・テクノロジー filed Critical 株式会社ブイ・テクノロジー
Priority to CN201180053457.3A priority Critical patent/CN103189801B/zh
Priority to KR1020137008832A priority patent/KR101798694B1/ko
Publication of WO2012032903A1 publication Critical patent/WO2012032903A1/ja

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0008—Apparatus or processes for manufacturing printed circuits for aligning or positioning of tools relative to the circuit board
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09—Shape and layout
    • H05K2201/09818—Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
    • H05K2201/09918—Optically detected marks used for aligning tool relative to the PCB, e.g. for mounting of components
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0548—Masks
    • H05K2203/0557—Non-printed masks

Definitions

  • the present invention relates to a film exposure apparatus, and more particularly to a film exposure apparatus that can accurately set the position of a mask when starting film exposure and can stably perform film exposure.
  • a substrate with a predetermined marking on the surface is used, and this marking is used for exposure.
  • the position of a mask to be determined is determined, or positioning pins are placed on a pallet on which a substrate is placed (for example, Patent Documents 1 and 2).
  • the exposure target is a film
  • processing using the flexibility of the film is performed in every processing step. That is, the film 2 is fed unwound from the roll 20 in the line, prior to pretreatment, such as, for example, dry cleaning and surface modification in the processing section 3 is performed, a predetermined material to the surface at a slit coater 4 is coated After being worked, the coated material is dried by the drying device 5. Then, the film 2 having the material film formed on the surface is supplied to the exposure apparatus 1, and the material film is exposed by the exposure apparatus 1. At this time, the film 2 is supported by, for example, the rollers 9 between the apparatuses and is conveyed by the rotation. Therefore, it is difficult to apply the techniques disclosed in Patent Documents 1 and 2 to the exposure of the film 2.
  • Patent Document 3 discloses a technique in which exposure is performed twice on a single film, and after the first exposure is performed on the film to form a pattern, in the second exposure, A technique is disclosed in which this pattern is detected by a line CCD and the position of the mask is adjusted based on the detection result.
  • FIG. 10 shows a type in which light sources 11 that emit exposure light are arranged to face each other in correspondence with one mask 12 and irradiate the exposure light, for example, to the substrate 20 from different directions. It is a figure which shows this conventional exposure apparatus as an example.
  • Such a type of exposure apparatus is used in an exposure process when forming an alignment film on a glass substrate such as a liquid crystal display, for example, and divides a region to be a picture element on the glass substrate into two regions. In each region, the alignment films are aligned in different directions, whereby the liquid crystal molecules sandwiched between the glass substrates are aligned according to the alignment direction of the alignment film, thereby increasing the viewing angle of a liquid crystal display or the like.
  • a type of exposure apparatus is used in an exposure process when forming an alignment film on a glass substrate such as a liquid crystal display, for example, and divides a region to be a picture element on the glass substrate into two regions. In each region, the alignment films are aligned in different directions, whereby
  • the film 2 is exposed in the exposure areas A and C by the masks 121 and 122 arranged separately from each other on the upstream side where the film is supplied, and on the downstream side, A region B between the exposure regions A and C is exposed by a mask 123, and a region D adjacent to the exposure region C is exposed by a mask 124.
  • segmentation can be formed in the substantially whole surface of the film 2.
  • Patent Document 3 is a technique that can perform the second and subsequent exposures with high accuracy only when a predetermined pattern is formed on the film with high accuracy in advance.
  • a technique for setting the position of the mask at the time of the first exposure with high accuracy has not yet been proposed. Therefore, the problem that the exposure position shifts when starting exposure of the film remains unsolved.
  • a portion in which the light source 11 for exposure is incorporated (a housing portion of the light source 11).
  • the film is not only easily waved but also easily displaced in the width direction during conveyance from the upstream exposure areas A and C to the downstream exposure areas B and D. Therefore, in addition to the shift of the exposure position in one exposure area, the film is displaced in the width direction between the exposure areas A and C on the upstream side and the exposure areas B and D on the downstream side. Overlap, or unexposed areas occur.
  • the present invention has been made in view of such a problem, and when starting exposure of a film, the position of the mask can be accurately set, and the film can be stably exposed with high exposure accuracy.
  • An object is to provide an exposure apparatus.
  • An exposure apparatus for a film according to the present invention includes a light source that emits exposure light, a mask in which a pattern of a predetermined light transmission region is formed and transmits exposure light from the light source corresponding to the pattern, and light of the mask Formed on the surface of the film, having a film supply unit for continuously supplying the film to be exposed from the tip to the optical path of the light transmitted through the transmission region, and a mask support unit for supporting the mask
  • a lead-in mark that forms a lead-in mark serving as a reference for the initial position of the mask at the leading edge of the film
  • a detection unit for detecting a distance between the forming mark and the mark on the mask in a direction perpendicular to the moving direction of the film; The detection result by the detection unit, and having a mask position control unit for adjusting the position of the mask in a direction perpendicular to the moving direction of the film.
  • the mark on the mask is formed at a position closer to the film supply unit than the light transmission region.
  • a plurality of the masks are arranged in a direction perpendicular to the moving direction of the film, and the pull-in mark forming portion has a plurality of pull-in marks at the leading end of the film corresponding to each mask.
  • the plurality of masks are arranged in a staggered manner in a direction perpendicular to the moving direction of the film.
  • the pull-in mark forming unit includes a stage unit extending in a direction perpendicular to the moving direction of the film, a marking unit for forming the pull-in mark, and the marking unit as the stage unit. And a transport section that moves along the longitudinal direction of the.
  • An exposure device of the film according to the present invention and the alignment mark formation unit for forming an alignment mark on the edge of for example the mask the film is disposed on the supply side supplied from the film supply part than the film, the alignment A second detection unit that detects a mark position downstream in the movement direction of the film, and the mask position control unit continuously detects the film based on a detection result of the second detection unit. During the feeding, the position of the mask in the direction perpendicular to the moving direction of the film is adjusted.
  • the film exposure apparatus has a pull-in mark forming portion for forming a pull-in mark serving as a reference for the initial position of the mask at the leading end of the film, and the detection unit in a direction perpendicular to the moving direction of the film.
  • the distance between the pull-in mark and the mark on the mask is detected, and the mask position control unit adjusts the position of the mask in the direction perpendicular to the moving direction of the film based on the detection result.
  • a pull-in mark for positioning is formed with high accuracy at the leading end of the film, and the position of the mask can be set with high accuracy even when starting exposure of the film by the position of the pull-in mark. . Therefore, according to the present invention, the film can be stably exposed with high exposure accuracy.
  • FIG. 1 It is a perspective view which shows a drawing mark formation part in the exposure apparatus of the film which concerns on embodiment of this invention. It is a perspective view which shows the whole exposure apparatus of the film which concerns on embodiment of this invention. It is a figure which shows the process of forming a drawing mark with respect to a film in the film exposure apparatus which concerns on embodiment of this invention. It is a top view which shows a mask in the exposure apparatus of the film which concerns on embodiment of this invention. It is a figure which shows correction
  • FIG. 1 is a perspective view showing a pull-in mark forming portion in a film exposure apparatus according to an embodiment of the present invention
  • FIG. 2 is a perspective view showing the entire film exposure apparatus according to the embodiment of the present invention
  • FIG. It is a figure which shows the process of forming a drawing mark with respect to.
  • the film exposure apparatus according to this embodiment includes a light source 11 that emits exposure light, a mask 12, and a mask stage 17 (mask support unit) that supports the mask 12 so as to be movable.
  • the pull-in mark 2a serving as a reference for positioning the mask 12 is formed by the laser marker 13 with respect to the film 2 supplied from the film supply unit.
  • the present invention is not limited to an alignment-dividing exposure apparatus, and may be applied to any film exposure apparatus. Can do.
  • the film 2 to be exposed is wound from a roll-to-roll type roll 20 and supplied to the slit coater 4, and a predetermined material such as an alignment film material is applied to the surface by the slit coater 4.
  • a predetermined material such as an alignment film material
  • the toner is supplied into the exposure device 1 by the transport roller 8.
  • the entrance of the exposure apparatus 1 is provided with a film supply unit such as a transport roller driven by a motor, for example, and is configured to supply the film 2 to the laser marker 13 side, for example, in the horizontal direction.
  • the exposure apparatus 1 is further provided with a film transport unit such as a transport roller, and is configured to transport the film 2 along the longitudinal direction in the exposure apparatus 1.
  • the laser marker 13 is composed of a gantry stage 13a, a transport unit 13b, and a marking unit 13c.
  • the gantry stage 13a is located above the portion where the film is supplied with respect to the moving direction of the film. Are arranged so as to extend vertically (in the width direction of the film).
  • the transport unit 13b is supported by the gantry stage 13a and is configured to be able to move along the longitudinal direction on the gantry stage 13a. Further, the position of the transport unit 13b is controlled by a control device (not shown), and thereby the position of the marking unit 13c can be adjusted.
  • the marking unit 13c emits laser light from a laser light source such as an Nd: YAG laser, for example, and has a predetermined shape, for example, a cross shape, at the leading end of the film 2 supplied from the film supply unit as shown in FIG.
  • the pull-in mark 2a is formed.
  • the marking unit 13c is fixed to the conveyance unit 13b, and is configured to be able to adjust the formation position of the pull-in mark 2a on the film 2 by controlling the position of the conveyance unit 13b by a control device.
  • the marking portion 13c is configured to form, for example, four lead-in marks 2a at the front end of the film 2 at regular intervals so as to correspond to each of four masks 12 described later. Has been.
  • Light source 11 for example, in the exposure apparatus of the orientation dividing type is a light source that emits ultraviolet light, for example a mercury lamp, a xenon lamp, excimer lamp, and ultraviolet LED or the like is used.
  • a collimator lens and / or a reflecting mirror are arranged so that the exposure light is irradiated with a predetermined light amount on the alignment material film on the surface of the film 2, for example.
  • the light source 11 can adjust the emission direction of exposure light by, for example, a control device (not shown), and is configured to be able to adjust the incident angle of exposure light to the film 2.
  • two light sources 11 are arranged so as to face one exposure region, and the exposure light emitted from each light source 11 is transmitted through the mask 12, and then the film 2.
  • the region to be one picture element is divided and exposed with different exposure light to form alignment films in which alignment film materials are aligned in different directions in the respective areas.
  • the alignment directions of the liquid crystal molecules can be made different from each other. For example, in one pixel, the alignment direction of the alignment film is followed.
  • the viewing angle of a liquid crystal display or the like is widened by setting the directions of liquid crystal molecules aligned in two directions.
  • the light source 11 is not limited to two for the exposed regions of the one location may be provided three or more, the exposure light from different directions, for example may be oriented alignment film material in three or more directions. Further, for example, one light source 11 is provided for one exposure area, and the exposure light emitted from the light source 11 is divided by a polarizing plate or the like, and the two divided exposure lights are irradiated from different directions. May be. For example, by using a polarizing plate, exposure light can be divided into P-polarized linearly-polarized exposure light and S-polarized linearly-polarized exposure light and irradiated from different directions.
  • a plurality of masks 12 are arranged separately from each other on the upstream side and the downstream side in the moving direction of the film 2.
  • the plurality of masks 12 are arranged such that the exposure area by the upstream masks 121 and 122 and the exposure area by the downstream masks 123 and 124 are adjacent to each other along the moving direction of the film. That is, they are arranged in a zigzag pattern, and the above-described pair of light sources 11 is provided for each mask 12. Then, as shown in FIG.
  • the exposure light from the light source 11 is transmitted through the masks 121 and 122 on the upstream side in the moving direction of the film 2 to expose the alignment film material on the film 2 in the exposure areas A and C. . Further, the exposure light from the light source 11 is transmitted through the masks 123 and 124 on the downstream side, and the alignment film material on the film 2 is exposed in the exposure regions B and D.
  • the mask 12 includes, for example, a frame body 120 and a pattern forming unit 121 at the center thereof.
  • the pattern forming unit 121 includes a pattern 121 a of a predetermined light transmission region. Is formed. That is, an opening having a shape that transmits exposure light corresponding to the pattern shape to be formed on the film 2 is formed, or a light transmissive member is provided.
  • the alignment material film on the surface of the film 2 disposed on the stage 10 is exposed by light transmitted through the pattern forming unit 121.
  • a pair of light sources 11 is arranged for each mask 12 and emits exposure light having different incident angles. Therefore, in the present embodiment, the pattern 121a is formed so that a plurality of slits arranged in the width direction of the film are arranged in two rows in the movement direction of the film.
  • the mask 12 has a width of about 300 ⁇ m and a length of about 250 mm so as to extend in the width direction perpendicular to the moving direction of the film 2 upstream of the pattern 121a. Is provided in the middle of the longitudinal direction of the viewing window 12a. For example, a linear light shielding pattern 12b having a width of about 15 ⁇ m is provided. Then, the position of the light shielding pattern 12 b is detected by a line CCD 15 to be described later and used for positioning the mask 12.
  • the mask stage 17 (mask support section) is provided for each of the masks 12 and supports, for example, the frame body 120 of the mask 12.
  • the mask stage 17 is connected to, for example, a mask position control unit 30 as shown in FIG. 6, and the position thereof is controlled, for example, in the horizontal direction (film width direction or film width direction) under the control of the mask position control unit 30. And the longitudinal direction of the film). Thereby, the exposure position of the film 2 by the mask 12 can be adjusted to a horizontal direction.
  • the mask stage 17 can be moved in the vertical direction, for example, and can be adjusted so that, for example, the alignment film material on the film 2 is exposed to a predetermined size.
  • the line CCD 15 (film drawing position detection unit) is arranged to extend in the width direction of the film 2 below the viewing window 12 a and the light shielding pattern 12 b provided in each mask 12.
  • the position of the pull-in mark 2a formed at the leading end of the film 2 is determined.
  • the line CCD 15 detects a light shielding pattern 12 b provided in the middle of the viewing window 12 a of the mask 12 as an actual position of the mask 12.
  • the line CCD 15 is connected to the mask position control unit 30 and is configured to transmit the detected positions of the pull-in mark 2 a and the light shielding pattern 12 b to the mask position control unit 30.
  • the mask position control unit 30 is configured to adjust the position of the mask 12 based on the distance between the drawing mark 2a transmitted from the line CCD 15 and the plane parallel to the film surface calculated from the position of the light shielding pattern 12b.
  • the mask position control unit 30 stores in advance the position data of the mask (light shielding pattern 12b) to be set with reference to the position of the pull-in mark 2a.
  • the unit 30 moves the position of the mask stage 17 using the position of the pull-in mark 2a detected by the line CCD 15 as a reference position until the mask position determined by the detected position of the light shielding pattern 12b reaches a predetermined position.
  • the position of the mask 12 when starting the exposure, the position of the mask 12 can be adjusted with reference to the position of the pull-in mark 2a previously formed on the film 2 with high accuracy.
  • the position to be exposed can be determined with high accuracy.
  • FIG. 6 is a diagram showing the configuration of the mask position control unit 30 as an example.
  • the mask position control unit 30 is connected to a motor control unit provided in, for example, a mask stage driving unit, the light source 11, and a film winding roll 8 (see FIG. 9).
  • the mask position control unit 30 includes an image processing unit 31, a calculation unit 32, a memory 33, a motor drive control unit 34, a light source drive unit 35, a mask stage drive control unit 36, And a control unit 37.
  • the image processing unit 31 performs image processing of the alignment mark 2b imaged by the alignment mark detection unit 16 described later, and detects, for example, the center position of the alignment mark 2b in the film width direction.
  • the calculation unit 32 calculates, for example, a deviation between the distance between the center positions of the pull-in mark 2a and the light shielding pattern 12b and the distance to be set between both stored in advance.
  • the calculation unit 32 also calculates a shift in the film width direction between the center position of the alignment mark 2b to be set and the actual center position of the alignment mark 2b based on the center position of the alignment mark 2b detected by the image processing unit 31. To do.
  • the memory 33 stores, for example, the center position of the alignment mark 2b detected by the image processing unit 31 and the shift amount calculated by the calculation unit 32.
  • the motor drive control unit 34 controls, for example, driving or stopping of the motor of the film take-up roll 8 or the rotational speed when being driven.
  • the light source drive unit 35 controls the turning on / off of the light source 11, the output, or the oscillation frequency.
  • the mask stage drive control unit 36 controls the drive of the mask stage 17 and controls, for example, the movement direction and the movement amount of the mask stage 17.
  • the control unit 37 controls driving of the image processing unit 31, the calculation unit 32, the memory 33, the motor drive control unit 34, the light source drive unit 35, and the mask stage drive control unit 36.
  • the film exposure apparatus 1 adjusts the position of the mask 12, for example, switches on / off the irradiation of the exposure light by the light source 11, or the rotational speed of the motor provided in the roll 8 that winds the film 2 or the like. It can be controlled.
  • the light source 11, the mask 12, the mask stage 17, the line CCD 15, and the mask position control unit 30 are also provided on the downstream side in the moving direction of the film 2, but these configurations are arranged on the upstream side. Since it is the same as the configuration, detailed description is omitted.
  • the slit coater 4 and drying device 5 such as shown in FIG. 9, the film 2 which predetermined processing has been performed, for example, by the conveying roller 8 is supplied to the exposure apparatus 1 from the tip portion.
  • the film 2 supplied into the exposure apparatus 1 is supplied at the leading end thereof below the laser marker 13 by a film supply unit such as a transport roller.
  • the marking part 13c is conveyed to a predetermined position by moving the conveyance part 13b of the laser marker 13 on the gantry stage 13a by control by a control apparatus. Thereby, the marking part 13c is arrange
  • a laser beam is emitted from the marking portion 13c to form, for example, a cross-shaped pull-in mark 2a at the tip of the film 2.
  • the control device moves the marking unit 13c, for example, by moving the transport unit 13b on the gantry stage 13a.
  • a pull-in mark 2a is formed at the leading end of the film. Then, as shown in FIG. 3, when the formation of the four pull-in marks 2a at the leading end of the film is completed, the operation of the laser marker 13 is stopped and the conveyance of the film 2 by the conveyance roller or the like is resumed.
  • the film 2 reaches below the mask 12 (masks 121 and 122) arranged corresponding to the exposure areas A and C, as shown in FIG.
  • a line CCD 15 is arranged at a position corresponding to the viewing window 12a (and the light shielding pattern 12b) below each mask 12 so as to extend in the width direction of the film 2.
  • the line CCD 15 has a pull-in mark 2a with a line CCD 15 The position of the pull-in mark 2a is detected when the sheet is conveyed until it is positioned above. Further, the line CCD 15 detects the position of the light shielding pattern 12 b provided in the middle of the viewing window 12 a of the mask 12.
  • the line CCD 15 transmits a signal indicating the distance between the detected pull-in mark 2 a and the light shielding pattern 12 b to the mask position control unit 30. Note that, until the adjustment of the mask position is completed after the detection process by the line CCD 15, for example, the conveyance of the film 2 is stopped or the exposure on the film 2 is not started.
  • the mask position control unit 30 first stores the distance between the two in a plane parallel to the film surface. It is compared with the data (data of the initial position to be set on the mask 12 with reference to the position of the pull-in mark 2a). Then, the mask stage 17 is moved until the mask position determined by the position of the light shielding pattern 12b reaches a predetermined initial position. Thereby, before the start of exposure in the exposure areas A and C, the initial position of the mask 12 (masks 121 and 122) is accurately determined with reference to the film 2.
  • the film 2 is transported by, for example, a transport roller until the exposure target portion is located in the exposure light irradiation region, and the exposure light from the light source 11 is transmitted through the mask 12 to Exposure. Thereby, the alignment film material on the film 2 is aligned in a predetermined direction.
  • the film 2 is sequentially supplied, and the exposure target portions are sequentially exposed. As a result, two patterns exposed in the exposure areas A and C are formed on the film 2 in a strip shape.
  • the film 2 is transported to reach the lower end of the mask 12 (masks 123 and 124) arranged corresponding to the downstream exposure regions B and D as shown in FIG.
  • a line CCD 15 is arranged at a position corresponding to the viewing window 12a (and the light shielding pattern 12b) below each mask 12 so as to extend in the width direction of the film 2, as in the upstream case.
  • the line CCD 15 detects the light shielding pattern 12b provided in the middle of the observation window 12a of the mask 12 as the actual position of the mask 12, and thereby the pull-in mark 2b and the mask 12 The distance from the light shielding pattern 12b is measured. Then, a signal of the distance between the detected pull-in mark 2b and the light shielding pattern 12b is transmitted to the mask position control unit 30. Note that, until the adjustment of the mask position is completed after the detection process by the line CCD 15, for example, the conveyance of the film 2 is stopped or the exposure on the film 2 is not started.
  • the mask position control unit 30 When the signal of the distance between the pull-in mark 2a and the light shielding pattern 12b is input from the line CCD 15, the mask position control unit 30 first stores the distance between the two in a plane parallel to the film surface (the pull-in). The data of the initial position to be set on the mask 12 with respect to the position of the mark 2a is compared. Then, the position of the mask stage 17 is moved until the mask position determined by the position of the light shielding pattern 12b becomes a predetermined initial position. Thereby, before the start of exposure in the exposure regions B and D, the initial position of the mask 12 (masks 123 and 124) is accurately determined with reference to the film 2.
  • the film 2 is transported by, for example, a transport roller until the exposure target portion is located in the exposure light irradiation region, and the exposure light from the light source 11 is transmitted through the mask 12 to Exposure. Thereby, the alignment film material on the film 2 is aligned in a predetermined direction.
  • the film 2 is sequentially supplied, and the exposure target portions are sequentially exposed.
  • a pattern exposed by the exposure areas B and D is formed on the film 2, and the pattern formed between the exposure areas A and C is filled with the pattern exposed by the exposure area B.
  • a pattern by the exposure region D is formed so as to be adjacent to the pattern formed by.
  • the exposure areas are overlapped or unexposed areas are generated due to the waviness of the film 2 and the shift in the width direction.
  • the downstream pattern is also added to the upstream pattern. It can be formed with high accuracy. That is, the pattern already formed by the exposure areas A and C and the pattern formed by the exposure areas B and D do not overlap or leave an unexposed part, and the pattern is accurately formed on the entire surface of the film. Is formed, and the film can be stably exposed.
  • the exposure apparatus 1 has an alignment laser marker 14 (alignment mark forming portion) aligned with the masks 121 and 122 on the upstream side in the film movement direction and in the film width direction. Is provided. Then, the alignment mark 2 b is formed on the edge of the film 2 supplied from the film supply unit by the alignment laser marker 14. Further, the exposure apparatus 1 is provided with an alignment mark detector 16 so as to be aligned with the masks 123 and 124 on the downstream side in the film moving direction and the film width direction.
  • an alignment laser marker 14 alignment mark forming portion
  • the alignment mark detection unit 16 is disposed above or below the film 2 and detects the position in the film width direction of the alignment mark 2 a formed by the alignment laser marker 14 on the edge of the film 2.
  • the alignment mark detection unit 16 is connected to the mask position control unit 30 described above, and transmits the detected signal to the mask position control unit 30.
  • the alignment laser marker 14 is a laser light source that irradiates, for example, an Nd: YAG laser or ultraviolet light, and emits pulsed laser light from a pulse light source such as a xenon flash lamp, for example, as shown in FIG.
  • a pulse light source such as a xenon flash lamp
  • alignment marks 2b having a width of 20 ⁇ m and a length of 15 mm are formed at regular intervals on the edge.
  • the alignment laser marker 14 is, for example, an alignment mark in a region corresponding to, for example, 25 mm or less from the edge of the film 2 at a position corresponding to the viewing window 12a (and the light shielding pattern 12b) of the upstream masks 121 and 122 in the moving direction of the film 2. 2b is formed. Thereby, the distance between the pattern formed in the area A and the area C on the upstream side in the moving direction of the film 2 and the alignment mark 2b at the edge of the film 2 is always constant.
  • the alignment mark detection unit 16 disposed on the downstream side in the moving direction of the film 2 is, for example, a CCD camera, and, for example, at a position corresponding to the viewing window 12a of the downstream masks 123 and 124, as shown in FIG.
  • the position of the alignment mark 2b formed on the edge of the film 2 in the film width direction is detected.
  • the alignment mark detection unit 16 transmits the detected position of the alignment mark 2b in the film width direction to a mask position control unit 30 as shown in FIG. 6, for example, and the mask position control unit 30 is based on the position of the alignment mark 2a.
  • the position of the masks 123 and 124 on the downstream side in the moving direction of the film is adjusted.
  • the mask position control unit 30 corrects the shift in the width direction of the film 2 based on the position of the alignment mark 2b detected by the alignment mark detection unit 16 in the film width direction.
  • the mask stage 17 is moved, and thereby the position of the mask 12 with respect to the film 2 is corrected. That is, as shown in FIG.
  • the mask position control section 30 a position on the downstream side of the mask 123 and 124, the alignment mark 2b is shifted Move the film outward in the width direction by the amount.
  • the mask position control unit 30 shifts the position of the downstream masks 123 and 124 by the amount of the shift of the alignment mark 2b. Move inward direction. Therefore, the distance between the alignment mark 12b and the downstream masks 123 and 124 is maintained at a constant interval on the downstream side in the moving direction of the film 2.
  • the polarizing film for 3D displays is comprised, for example by configuring the exposure apparatus as follows. Can be manufactured. In other words, when exposure light from two light sources, for example, exposure light of P-polarized light and S-polarized linearly polarized light is alternately applied to each region that becomes a pixel adjacent in the width direction of the film, a plurality of picture elements can be obtained.
  • the alignment direction of the alignment material film can be made different for each pixel constituted by the above.
  • the orientation direction in a film surface differs 90 degrees mutually, and the orientation film
  • the present invention can set the position of a mask at the start of exposure with high accuracy in a film exposure apparatus that forms a pattern by exposing a roll-to-roll film.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Structure Of Printed Boards (AREA)
PCT/JP2011/068573 2010-09-06 2011-08-16 フィルムの露光装置 WO2012032903A1 (ja)

Priority Applications (2)

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CN201180053457.3A CN103189801B (zh) 2010-09-06 2011-08-16 膜曝光装置
KR1020137008832A KR101798694B1 (ko) 2010-09-06 2011-08-16 필름의 노광 장치

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JP2010199359A JP5481736B2 (ja) 2010-09-06 2010-09-06 フィルムの露光装置
JP2010-199359 2010-09-06

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CN104647905B (zh) * 2014-12-27 2017-06-06 东莞市光博士激光科技股份有限公司 一种适用于大小幅面的多功能打标机

Citations (7)

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Publication number Priority date Publication date Assignee Title
JPH01295261A (ja) * 1988-02-22 1989-11-28 Nippon Seiko Kk 露光装置の位置合わせ方法及び装置
JP2001060008A (ja) * 1999-08-23 2001-03-06 Sumitomo Metal Mining Co Ltd 露光方法およびこれを用いた電子部品の製造方法
JP2004523101A (ja) * 2000-11-08 2004-07-29 オルボテック リミテッド 複層プリント回路基板製造システム及び方法
JP2006098727A (ja) * 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd 伸縮状態の検出手段を設けた長尺の可撓性記録媒体と、この可撓性記録媒体に伸縮状態を補正して画像を描画可能な描画方法及び装置
JP2006235533A (ja) * 2005-02-28 2006-09-07 Nikon Corp 露光装置及びマイクロデバイスの製造方法
JP2006259715A (ja) * 2005-02-21 2006-09-28 Fuji Photo Film Co Ltd 描画方法、描画装置、描画システムおよび補正方法
JP2007310209A (ja) * 2006-05-19 2007-11-29 Nsk Ltd 露光装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01295261A (ja) * 1988-02-22 1989-11-28 Nippon Seiko Kk 露光装置の位置合わせ方法及び装置
JP2001060008A (ja) * 1999-08-23 2001-03-06 Sumitomo Metal Mining Co Ltd 露光方法およびこれを用いた電子部品の製造方法
JP2004523101A (ja) * 2000-11-08 2004-07-29 オルボテック リミテッド 複層プリント回路基板製造システム及び方法
JP2006098727A (ja) * 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd 伸縮状態の検出手段を設けた長尺の可撓性記録媒体と、この可撓性記録媒体に伸縮状態を補正して画像を描画可能な描画方法及び装置
JP2006259715A (ja) * 2005-02-21 2006-09-28 Fuji Photo Film Co Ltd 描画方法、描画装置、描画システムおよび補正方法
JP2006235533A (ja) * 2005-02-28 2006-09-07 Nikon Corp 露光装置及びマイクロデバイスの製造方法
JP2007310209A (ja) * 2006-05-19 2007-11-29 Nsk Ltd 露光装置

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KR101798694B1 (ko) 2017-11-16
CN103189801A (zh) 2013-07-03
TW201216013A (en) 2012-04-16
KR20130102586A (ko) 2013-09-17
TWI536115B (zh) 2016-06-01
JP5481736B2 (ja) 2014-04-23
CN103189801B (zh) 2015-07-22

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