201216013 六、發明說明： ！ 【發明所屬之技術領域】 i 本發明係關於一種膜片之曝光裝置， 度地設定在則_開始之際的遮罩之位可高精 光的膜片之曝光裝置。 』私疋進行膜片曝 【先前技術】 以往，在對例如平板狀的基板等構件進之^ t或在載置基板的托板上設置位 構件的曝光中之對位it膜為:述平板狀 所示的步驟中，雖在整捲連續製造方式ii轰i的 對平板狀的基板_曝光之=、， 田於八柔祕，運达中2容易產生波浪形。 所有力 的整捲連續製造方式的膜片生產線中，在 ，，泉於刖處理邛3中施以例如乾洗以及 ίΐ ίίϋ 以狹縫式塗布機4對表面塗布既定材料，然 ϋ片my吏所塗布的材料乾燥。而於表面上形成了材料膜 此時膜>；?曝光裝置1，鱗光裝置1對材制進行曝光。 運送之。κι’μ· ^裝置之間藉由例如滾輪9所支撐，藉由其旋轉來 之曝光。，專利文獻1及2所揭示的技術難以適用於膜片2 =片的曝光中遮罩的對位技術，係例如專利文獻3所揭示 ^專利文獻3_’揭示了對1片則分成2次來進行絲之技術， 以下技術對膜片施以第1次曝絲形成圖案’後在第2 本一之際以線性CCD (Charge-coupled Device，電荷搞合元件） ⑧ 201216013 摘測5細案’依據此侧結絲瓣遮罩的位置。 次眼ΪΓ利文獻3的技術，雖在膜片係以既定圖宰進㈣1 夂，先之情财，#由拍攝該_，可調 仃過1 於未進行曝光處理的膜片首^ :、，但在對 設定遮罩的位置。膜片瓦人進订曝先之情形中’無法高精度地 裝署’係以一例顯示以下型式的習知曝光裝置之圖，祕来 二^ —對射出曝光光線的光源11對應於並面對著1個^ 12 而配置，對於曝光對象例如基板2()，從==個遮罩12 光線。此種型式的γ不烟的方向照射曝光 上形成定向膜i以ίΐ驟:：如=:=板 藉此’使於玻璃基板間所夾持的液晶之分 、=臈的定向方向’藉此可擴大液晶顯示角了= 術近來受到人們的注目。 視角此種技201216013 Sixth, invention description: ! BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure apparatus for a diaphragm, which is characterized in that an exposure apparatus for a film having a high precision in the position of a mask at the beginning of the invention is set. "Purchase exposure" [Prior Art] In the past, in the case of a member such as a flat substrate or a substrate on which a substrate is placed, the alignment of the alignment film is In the step shown in the figure, although the flat-plate continuous substrate is embossed in the entire roll, the image is easily formed in a wave shape. In the diaphragm production line of the whole roll continuous manufacturing method of all the forces, for example, dry cleaning and ίΐ ίίϋ are applied to the surface of the 刖 刖 邛 3, and the surface is coated with the predetermined material by the slit coater 4, and then the 吏 吏 my吏The coated material is dry. On the other hand, a material film is formed on the surface. At this time, the film >; exposure apparatus 1 exposes the material to the material. Shipping it. The κι'μ·^ devices are supported by, for example, a roller 9 by which they are rotated. The technique disclosed in Patent Documents 1 and 2 is difficult to apply to the alignment technique of the mask in the exposure of the patch 2 = sheet, which is disclosed, for example, in Patent Document 3, and the patent document 3_' discloses that the sheet is divided into 2 times. In the technique of silk, the following technique applies the pattern of the first exposure to the film, and then in the second one, a linear CCD (Charge-coupled Device) 8 201216013 According to the position of the side knot wire flap. The technique of the second eye ΪΓ利篇3, although the diaphragm is slaughtered by the established figure (4) 1 夂, the first of the money, # by shooting the _, can be adjusted 1 over the first film without exposure processing ^ :, , but in the position where the mask is set. In the case of the film tile, the 'impossible high-precision installation' is an example of a conventional exposure device that displays the following type, and the light source 11 that emits the exposure light corresponds to and faces With 1 ^ 12 configured, for an exposure object such as substrate 2 (), from == a mask 12 rays. In this type of gamma-free illuminating direction, an alignment film i is formed on the exposure surface: such as: === the plate is used to 'make the liquid crystal between the glass substrates, and the orientation direction of the 臈' The LCD display angle can be enlarged. The technique has recently attracted attention. Perspective technique
在藉由此種曝光裝置對膜片進行曝光之 巧个波浪形，從而發生曝光位置的偏移，以上為 g J =少該曝光健的偏移之影響，例如，在於如上述= 將ΞΚΐιΐ數道光源之構造之曝光裝置中，例如如®11、1片所1， 將^罩分割成複數個，更配置成交錯狀。而如圖^斤胺 X供給而來的上游側，藉由互相隔離而配置 f膜= ^區域AK_ 2進行曝光；在下^ „域八及c之間的區域Bit行曝光，藉由遮以以： 二所鄰接的區域D進行曝光。藉此，可於膜片 乎二二 成疋向分割的圖案。 戍乎整面ft/ [習知技術文獻] [專利文獻] 專利文獻1 :日本特開昭62-294252號公報 專利文獻2 :國際公開第〇8/139643號 專利文獻3 :日本特開2006-292919號公報 201216013 【發明内容】 [發明所欲解決的問題] 以高精度第2次以後為曝光之脉 未被提及。因士，、—、#人進仃ψ光之際的遮罩位置之技術，尚 仍未獲解決。，在則的曝細始之際曝光位置偏移之問題， 曝光？詈的於膜片移動方向配置了複數道筅源的構造之 π的框體部分:=所二曝光用的光源11之部分(光源 左右的長度；所膜片的移動方向上具有約2m 之間的距離，至:長幸所;^光區域“C與曝光區域… 之運送中，膜片不單是容易產生 域Uctt f域中曝光位置的偏移之外，於上游侧的曝光區 置偏移，從而之間’則於寬方向發生位 問題點。、光區或重®，或產生未曝光的區域，以上皆為其 的曝問題點所製成’目的在於提供一種在膜片 膜ji稃精度地設定遮罩的位置，以高曝光精度對 膜片穩疋進仃曝光之膜片之曝光裝置。 [解決問題之技術手段] 依本發明的膜片之曝光裝置，具有：！ 光源，射出曝光光線； ’ 桃形ΐί既定的光透射區域之圖案，使乾自該光源的曝 光先線對應亚透射該圖案； ！！ 供給部’將曝光對象的膜片從其前端部連:續地供給至透 射^遮罩的光透射區域之光的光路上；以及 遮罩支樓部，支撐該遮罩； 在將透射該遮罩的歧射區域之細射在形成於該膜片表面 201216013 之曝光材料，來對該膜片進行曝光之膜片之曝光裴置中， 為具有：. ，、将徵 導入標誌形成部’於該膜片的前端部形成作為該遮星 位置之基準之導入標誌； 、、、 '初° 债測部’偵測在對於該膜片的移動方向垂直的方向 標諸'與該遮罩上的標諸之間的距離；以及 Λ 遮罩位置控制部，依據由該偵測部測出的偵測結果， 在對於S亥膜片的移動方向垂直的方向中該遮罩的位置。 。正 ，該則之曝絲置中，例如該鮮上的縣，形成 光透射區域更靠近該膜片供給部側之位置。 人In the wavy shape in which the diaphragm is exposed by such an exposure device, the offset of the exposure position occurs, and the above is g J = less the influence of the offset of the exposure, for example, as described above = ΞΚΐ ΐ ΐ In the exposure apparatus having the structure of the light source, for example, as the "11" or the 1st sheet, the mask is divided into a plurality of pieces and arranged in a staggered shape. On the upstream side of the supply of the amine X, the f film = ^ region AK_ 2 is disposed by being isolated from each other for exposure; in the region between the fields VIII and c, the line is exposed by exposure. : Two adjacent regions D are exposed. Thereby, the film can be divided into two or two layers. The entire surface is ft/[Purpose technical literature] [Patent Literature] Patent Document 1: Japanese Special Opening Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. The pulse of exposure has not been mentioned. The technique of the mask position of the people, Shi, and # people entering the dawn is still unresolved. At the beginning of the exposure, the position of the exposure is shifted. The problem is that the frame portion of the structure of the plurality of turns is arranged in the direction in which the film is moved: the portion of the light source 11 for the second exposure (the length of the left and right sides of the light source; the moving direction of the film has A distance of about 2m, to: fortunately; ^ light area "C and exposure area... The diaphragm is not only easy to generate the offset of the exposure position in the domain Uctt f domain, but also the exposure region on the upstream side is offset, so that there is a problem in the width direction, the light region or the weight, or The unexposed area is produced, and all of the above are made by the problem of the exposure. The purpose of the invention is to provide a film in which the mask film is accurately set to the position of the mask, and the film is stably exposed to the film with high exposure precision. [Experimental means for solving the problem] The exposure device for a diaphragm according to the present invention has: a light source for emitting exposure light; The first line corresponds to the sub-transmission pattern; !! The supply portion 'connects the film of the exposure target from the front end portion thereof: continuously to the optical path of the light transmitted through the light transmission region of the mask; and the mask branch portion, Supporting the mask; in the exposure device of the film which is exposed to the exposure material formed on the surface of the film surface 201216013, the film is exposed to the film, and has: , will be introduced into the standard The forming portion 'forms an introduction mark as a reference of the position of the occultation at the front end portion of the diaphragm; and the 'first-degree debt detecting portion' detects the direction perpendicular to the moving direction of the diaphragm. a distance between the marks on the mask; and a position of the mask in the direction perpendicular to the moving direction of the S-chip according to the detection result detected by the detecting portion The positive exposure is placed in the middle, for example, the fresh county, forming a position where the light transmission region is closer to the diaphragm supply portion side.
該遮罩，例如在對於該膜片的移動方向垂直的 複，個；該導入標誌形成•，對應各遮罩而於該膜 酉山U t數個導入標誌。在此情形’例如該複數個遮夺^ 膑片的移動方向垂直的方向上配置成交錯狀。 綠對於5亥 在該膜片之曝光裝置中， 例如該導入標誌形成部，具有： Ϊ台Γ在對於該則的移動方向垂直的方向上延伸. 才示圮邛，形成該導入標誌；以及 申， 運送’使该標記部沿著該The mask is, for example, perpendicular to the direction of movement of the diaphragm; the introduction mark is formed, and a plurality of introduction marks are provided on the film Ut. In this case, for example, the direction in which the plurality of occlusion films are perpendicular to each other is arranged in a staggered manner. For the exposure apparatus of the diaphragm, for example, the introduction mark forming portion has: the cymbal cymbal extends in a direction perpendicular to the moving direction of the diaphragm. The yoke is formed to form the introduction mark; , shipping 'make the marking part along the
之曝光裝置，具有H 在從該膜給靠近該膜片供給部側， 以及 膜片的邊緣部上’形成對準標誌； 置；弟2伽部，在膜片的移動方向下游側_該對準標誌的位 該遮罩位置控制部 來調整在連續地供給該膜片時，之偵測結果， 方向中該遮罩之位置。 對衣5亥膜片的移動方向垂直的 [對照先前技術之功效j 依本發明的臈片之曝光梦 、置，、具有於骐片的前端部形成作 201216013 為遮^的初始位置之基準之導入標誌之導入標誌形成部；藉由偵 t 1 在對於該膜片的移動方向垂直的方向中導入標諸與遮 的標誌之間的距離，而依據此偵測結果，遮罩位置控制部， ί 於膜片的移動方向垂直的方向中遮罩的位置。藉此，在 社端部，以高精度形成定位用的導人標認，藉由該導入標 :使在膜片之曝光開始之際，亦能高精疼地設定遮罩 it根據本發明，能以高曝光精度穩定膜p來進行曝光。 【實施方式】 明。ΐΓ 的圖式來針對本發明的實施形態進行具體說 行說ϊ圖iitf r月的實施形態的膜片之曝絲置之構造進 導士；二’”不在依本發明的實施形態的膜片之曝光裝置中 膜本發，的實施形態的 標總之步驟之圖。如圖2及^所圖3係顯示對於膜片形成導入 光裝置，係由以下元件所構依本貫施形態的膜片之曝 遮罩平台17(遮軍支撐部11 ’射出曝光光線；遮罩12 ； 註器13(導入;^士形可移動的方式支擇遮罩12 ;雷射標 置；線性運送滾輪等膜片供給部而配 的下方往膜片2的?方===)晋例如= 列如遮罩12 30，控制遮罩12的位置。在 ^配置，以及遮罩位置控制部 從膜片供給部所供給的膜片2 = ’藉由雷射標註器13，對於 入標誌、2a。在本實施形態巾^^為麟12定㈣基準之導 割方式的曝«置之_妨n情本侧咖於定向分 方式的曝絲置，可翻於所有稀蚊向分割 曝光對象的膜片2，例如’腰月之曝先裝置。 輥機2〇捲出而供給至狹縫式 不’攸整捲連續製造方式的 塗布既定的材料，例如定狭縫式塗布機4對表面 後藉由運送滾輪9,供給至爆、=^乾峨置5:使其乾燥，然 設有藉由例如馬達所驅動的運^^ 201216013 - 在例如水平方向供給至雷射標註器13側。例如，於曝光筆 亦設有其他運送滾輪等之膜片運送部，在曝光裝置 邊方向運送皞片2。 &者其長 雷射標註器13，如圖1所示，由構架台13a、運送 、 及標記部13c；所構成；構架台13a ’係以在膜片受供給而 = 之上方對於膜片的移動方向垂直地(往膜片的寬方向 1刀 配置。運送部13b’係由構架台13a所支撐，且可在構架么13式 沿著其長邊方向移動。又，運送部13b，係藉由未圖示的^ ^ 來控制其位査，藉此可調整標記部13c的位置。 工衣置 標記部】3c，係從例如 Nd-YAG(neodymiumd()ped_yttriuin alummumgarnet，摻鈦-釔鋁石榴石）雷射等雷射光源射出带 如圖1所示，於從膜片供給部供給而來的膜片2之前田’ 十字狀的導人標諸&。標記部13C，係固定於^送 f 13b ’由控制裝置來控制運送部13b的位置，藉此可調 1 片2上的導入標誌2a之形成位置。在本實施形態中 _ ;、 係以分別對應後述的4個遮罩12之方式，於膜片2 === 如一定間隔形成4個導入標魏2a。 相例 料向分割方式_林置中射出紫外光之 先源，可使用例如水銀燈、氣氣燈、準分子燈以及紫 =之 ，光源1々1射出的曝光光線之光路上，分別配置}列如‘ 或反射鏡等，俾⑽定光4賴如則2的表面之定 膜昭 f曝光光線，光源11，可藉由例如未圖*的控制裝置，來調敫遇、 光光線的射出方向’藉此可調整對於則2的曝光光線之ϋ 2施形態的曝光裝置！，對於！的曝光區域分別面對配置有2 ^光源11，俵從各光源u射出的曝光光線透射遮罩12， f膜片2上的·作為！像素的區域，分別 =二 光，使定向臈材料成為在各區域定向於互不\ 曝 此可使液晶傾角不同的2道曝光光線，藉 - 201216013 大液晶顯示器等^ 並不限於2道，亦# =外，光源11，對於1處的曝光區域， 向之曝光雜，跑自p相同的方 從光源11 設置1道歧11，藉祕光板等分割 線偏光之曝光絲i tii 將曝林線分割成？偏光的直 的方向進行照ί 錄偏光之曝絲線，分別從不同 隔離S 別於膜片2的移動方向之上游側及下游側’互相 122)^t4S^ 121 ' 121 ：122 游側的遮罩!23、124所形成之曝光區域膜 鄰接之方式，亦即配¥^績·仙☆ ^則:的移動方向而 的圖3所示’使來自光源11的曝光光線透射膜片2 侧之遮罩121及122 ’在曝光區域Α及C對膜 ^上的疋向膜材料進行曝光。又，使來自光源11:的曝光光線透 射下游側之遮罩123及124，在曝紋域B&d對料^ 向膜材料進行曝光。 t腰月2上的疋 ΐφίίϊϊ形態中’遮罩12 ’如圖4所示’由例>框體1触 其中央的圖案形成部121所構成；於圖案形成部121，形成有既定 的光透射區域之圖案121a。亦即，對應在膜片2所欲形成的 雜而形成有透射曝光光線的形狀之開口，或是設置有光透射性 的構件。而在例如定向分割方式的曝光裝置中，藉.击透射過圖案 形成部121的光，對平台10上所配置的膜片2的表面之定向材>料 膜進行曝光。在本實施形態中，對每個遮罩12配置1對光源Μ , 來分別射出入射角不同的曝光光線。因此，在本實碑形雜中、，圖 案121a，係以於膜片的寬方向並列之複數個狹縫，舞膜^的移^力 方向並排2列之方式形成。 : ' 夕 在本實施形態中’遮罩12 ’在圖案121a的更為游側，以在對 201216013 於膜片2的移動方向垂直甯 右，長250職左右的線性CCD用設=寬300师左 的線狀的遮fit光ff行遮光的例如寬15障左右 胸位置，來用於遮罩= 的由=的線性cc⑽偵測遮光圖案 遮罩12的框體12所設置，支撐例如 位置控制修藉著如I6所示的遮罩 位置於例如水平方向㈣的寬制，可令其 長邊方向)移動。藉此，可於水平一二膜片的寬方向及膜片的 片2的曝光位置精遮千方^周整藉由遮罩U所實行的膜 可調整成膜片2上的g亦可於例如鉛直方向移動，藉此 如如 ==所設的觀察窗12a及遮= 二 == CCD 15°的卜式配置，當膜片2的前端部係運送至位於線性 前端部形成的導入標諸2a之位f 2 於膜片\的 12的觀察窗12a的中間所設逆 ff CCD 15 ’將於遮罩 ^ CCD 15，!] 標==案12b的位丄的導入 算r則面平行之面中兩者之 為基準，所應設定的遮罩(遮光圖 線性CCD 15侧到的導怎：2不的，:立置控制部30，以藉由 罩平△ 17的Γ罢古^ 的位置為基準位置，來移動遮 定之“你使猎由侦測到的遮光圖案12b的位置所決 &。藉此’在本實施形態的曝光裝 D的位置為基準，來調整遮罩12的位置，能以高精度決定 201216013 膜片的應曝光之位置。 圖 6 LV _ Jjr > 03- _ 示，遮罩位置㈣3 =罩位置控制部％的構造之圖。如圖6所 膜片捲取用的it ί昭t接至例如遮罩平台驅動部、光源11及 制部3〇，具有:影像處理部31、演算部心憶 36、控命^7動控制部34、光源驅動部35、遮罩,台驅動控制部 準桿進行由後㈣對準標如貞測部丨6所拍攝的對 i。^=里，侧例如解麟2b在膜片寬方向中的 中心位置夹」Λ由影像處理部31所偵測到的對準標誌2b的 標認2b的巾準麟❿的中錢置與實際的對準 影像處理^ Ή俗^膜片寬方向的偏移。記憶體33，記憶例如 淹管的偏移詈=到的對準標諸、％的中心位置及演算部32所 咬切八1 了止或疋在驅動之際的旋轉速度。 光源驅動部35，控觀源u的亮燈歧媳燈 頻率。遮軍平台驅動控制部36 輸*或振盛 如遮軍平台17 二1:产严罩千口 17的驅動’控制例 理部t 動量。控制部37 ’控制此等影像處 部35、以及遮罩平、馬達魏控卿34、光源驅動 及遮罩千σ驅動控制部36之驅動。藉此，膜μ =，調整例如遮罩12的位置，或切換藉由光源u 先線之照射的ON/QFF，或是可控制於捲取 ^^仃的曝先 之馬達的旋轉速度等。 、：纟輥機8所設 在本實施形態中，雖於膜片2的移動方 . 源11、遮罩12、遮罩平台17、線性CCD亦設有光 30，但因為此等的構造與上游側的構造_ f 3^位置控制部 接著，針對本實施賴賴4之曝紐 細說明。 首先，藉由如圖9所示的狹縫式塗布機4及乾燥H作進行說明。 木衣.置5專，施加 ⑧ 12 201216013 • 了既定加工的膜片2，伯—+ 曝光裝置1内。供給至曝^ 運送滾輪9，從其前端部供給至 送滾輪所實行的膜片2之_。而ϋΛ暫時停止 貫仃的控制，使雷射標註 ^仏，，.°而藉者由控制裝置所 藉此將標記部13C運送至°既定付达部13b移動至構架台13a上， 在例如4個遮罩12分別$ 二因此，標記部13c，係配置於 當確認了標記部13= 的位=12a的上游側中任意的位置。 而在膜片2的前端邱开… 丄則從標記部13c射出雷射光， 膜片2係處於狀的導入標認2a。此時，因為 膜片2的前端滾輪等所支撐之狀態，所以 樣地照射雷射;^μ ΑΑι Λ匕使‘5己^13C移動，然後同 干，山f片的前端部形成導入標誌2a。而如圖3所 .不田膜片的則端部上4個導入標諸2a的形 ㈡戶二 標註STS作：恢復藉由運送滾輪等所‘的膜片？之運送 I Μ片2,猎者由運送滾輪等所實行的運送，如圖5 史 則化部對應曝棘域Α及C來配置的鮮12(遮罩12卜|2 g 罩12的下*之觀察窗l2a(以及遮光圖案既)之: L ΐΓ，ΪΪ片1的寬方向延伸之方式配置有線性CCD 15，·線性 ^辜入標誌2&運送至位於線性CCD 15的上方時，偵測 V入軚‘ 2a的位置。又，線性CCD 15，偵測於遮罩12的觀疚窗 12a，中間所設之遮光圖案12b之位置。藉此測定導入標諸^與 遮f 12的遮光圖案12b之間的距離。而線性CCD 15，將偵測到 的導入標誌2a與遮光圖案12b之間的距離之信號傳送至遮罩位置 控制部30。另外’從藉由線性CCD〗5所實行的偵測步驟到遮罩 位置的調整結束之前，例如先停止例如膜片2的運送，或不啟 對於膜片2的曝光。 接著，若從線性CCD 15輸入導入標誌2a與遮光圖案12b之 .\ 13 201216013 ===罩位置控制部災，首先對4平行於膜片面 為基準之遮罩預，儲存的資料(以導人標諸2a的位置 么17銘叙古s，應。又的初始位置之資料)進行比較。而使遮罩平 二既定的初始位的位置賴定之遮罩位置位 之前，以膣Η 9 藉在曝光區域AAC：中的曝光開始 的初始位置。為土準，來高精度地決定遮罩12(遮罩12卜122) 2，始位置確定，則藉由例如運送滾輪等運送膜片 11刚立於曝光光線的照射區域為』，使來自光源 Ζίίίίί遮罩12，來對膜片2進行曝光。藉此，膜片2 向於既定的方向。當1處的曝光結束，則依序 二二r^’又序對曝光對象部位進行曝光。藉此，於膜片2，藉 由U域A及C所曝光的圖案係形成為2根細長條狀。 嚴·^、·^’藉由運送’如圖7所示，其前端部送達至對應下游的 而配置的遮罩12(遮罩123、124)的下方。於對應 各U 12的下方之觀察窗12a(以及遮光圖案既)之位置，與上游 /二月科目同’以沿著臈片2的寬方向延伸之方式‘置有線性 5 ;線性CCD 15，當導入標誌2a運送至位於線性CCD 15 =上方（線性CCD15和遮罩12之間）時，侧導入標誌、2a的位 扣而與上游侧的情形相同，線性CCD 15，將於遮罩12的觀察 窗12a的中間所設之遮光圖案12b偵測為遮罩12的實際位置，藉 此測定導入標誌2a與遮罩12的遮光圖案12b之㈣的距離。而將日 偵測到的導入標誌2a與遮光圖案12b之間的距離之信號傳送至遮 罩位置控制部30。另外，從藉由線性CCD 15所實>亍的偵測步驟 到遮罩位置的調整結束之前，例如先停止例如膜片：2的運送，或 不啟動對於膜片2的曝光。 ； 若從線性CCD 15輸入導入標誌2a與遮光圖案12b之間的距 離之信號，則遮罩位置控制部30，首先對在平行於膜片面的面中 兩者之間的距離，與預先儲存的資料(以導入標誌2a;的位置為基準 之遮罩〗2應設定的初始位置之資料)進行比較。而像遮罩平台17 14 ⑧ 201216013 •:初=ί5ΐ遮，案12b的位置所決定之遮罩位置位於既 以膜片其進^此，在曝光區域6及〇中的曝光開始之前， 位置。〜準’來南精度地決定遮罩12(遮罩123、124)的初始 2，直當ίίΐ始位置較’則藉由例如運送滾輪等運送膜片 、、语對象部位於曝光光線的照射區域為止，而使來自光 '’、光光線透射遮罩12，以對膜片2進行曝光。|&此，膜gAn exposure device having H on the side of the film supply portion from the film and on the edge portion of the film to form an alignment mark; the second gamma portion, on the downstream side in the moving direction of the film _ the pair The mask position control unit adjusts the position of the mask in the direction of the detection result when the diaphragm is continuously supplied. The direction of movement of the film is perpendicular to the movement of the film. [Compared with the effect of the prior art, the exposure of the film according to the present invention is set, and the front end portion of the film is formed as a reference for the initial position of the cover of 201216013. Importing a mark forming portion of the mark; by detecting t 1 to introduce a distance between the mark and the mark in a direction perpendicular to a moving direction of the film, according to the detection result, the mask position control unit, ί The position of the mask in the direction perpendicular to the direction of movement of the diaphragm. In this way, in the social end, the guide mark for positioning is formed with high precision, and the guide mark can be used to set the mask at the start of the exposure of the film, according to the present invention. The film p can be stabilized with high exposure precision for exposure. [Embodiment] It is clear. The embodiment of the present invention is specifically described in the embodiment of the present invention. The structure of the film of the embodiment of the present invention is introduced into the guide; the second is not in the embodiment of the present invention. FIG. 2 and FIG. 3 show a film for introducing a light guide device into a film forming apparatus according to the present embodiment. Exposure mask platform 17 (covering support 11' emits exposure light; mask 12; injector 13 (introduction; ^ shape movable method to select mask 12; laser marking; linear transport roller film The lower side of the film supply unit is disposed to the diaphragm 2, such as the mask 1230, and controls the position of the mask 12. The arrangement and the mask position control unit are supplied from the diaphragm supply unit. The supplied diaphragm 2 = 'by the laser marker 13, for the entry mark, 2a. In the present embodiment, the towel is set to be the basis of the guidance of the cutting method. The exposure of the directional splitting method can be turned over to all the thin mosquitoes to the film 2 of the segmented exposure object, for example, the exposure of the waist The roll machine 2 is unwound and supplied to a slit type non-rolling continuous application method for coating a predetermined material. For example, the slit coater 4 is applied to the surface and then supplied to the explosion by the transport roller 9. ^ Drying device 5: drying it, but provided with a motor driven by, for example, a motor, 201216013 - for example, horizontally supplied to the laser marker 13 side. For example, the exposure pen is also provided with other transport rollers, etc. The diaphragm transporting portion transports the cymbal sheet 2 in the direction of the exposure device. The long laser marker 13 is composed of a framing frame 13a, a transporting portion, and a marking portion 13c as shown in Fig. 1; 13a' is perpendicular to the moving direction of the diaphragm above the diaphragm supply (the blade is arranged in the width direction of the diaphragm. The transport portion 13b' is supported by the frame table 13a, and can be in the frame 13 The movement is moved along the longitudinal direction. Further, the conveyance portion 13b is controlled by a position (not shown), whereby the position of the marker portion 13c can be adjusted. For example, Nd-YAG (neodymiumd () ped_yttriuin alummumgarnet, titanium-yttrium aluminum garnet) The laser light source emitting belt is as shown in Fig. 1. Before the diaphragm 2 supplied from the diaphragm supply unit, the cross-shaped guide numeral & the marking portion 13C is fixed to the ^f 13b ' The position of the conveyance portion 13b is controlled by the control device, whereby the position at which the introduction mark 2a is formed on the sheet 2 can be adjusted. In the present embodiment, the respective masks 12 are respectively associated with the four masks 12 to be described later. Diaphragm 2 === If there are 4 intervals to form the standard Wei 2a at a certain interval. The phase material is used to separate the source of ultraviolet light into the forest, such as mercury lamp, gas lamp, excimer lamp and purple = The light path of the exposure light emitted by the light source 1々1 is respectively arranged as a column such as 'or a mirror, 俾 (10) fixed light 4 depends on the surface of the film 2, and the light source 11 can be, for example, not The control device of Fig.* adjusts the direction in which the light rays are emitted, so that the exposure device for the exposure light of 2 can be adjusted. ,for! The exposure areas are respectively disposed with 2 ^ light sources 11 , and the exposure light emitted from each of the light sources u is transmitted through the mask 12 and the film on the f film 2 as! The area of the pixel, respectively = two light, so that the directional enamel material is oriented in each area and is not exposed to the two exposure light which can make the liquid crystal tilt angle different, by -201216013 large liquid crystal display, etc. ^ is not limited to 2 channels, # = outside, the light source 11, for the exposure area at 1 point, to expose the impurity, run from the same side of p from the light source 11 to set a 1 disparity 11, by the secret light board and other dividing line polarized exposure wire i tii will expose the forest line separated into? In the straight direction of the polarized light, the exposed wire of the polarized light is taken from the upstream side and the downstream side of the different isolation S from the moving direction of the diaphragm 2 to each other 122. ^t4S^121 '121 : 122 In the case where the exposure region film formed by the 23 and the 124 is adjacent to each other, that is, the movement direction of the light source 11 is transmitted as shown in FIG. The covers 121 and 122' expose the film to the film on the film in the exposed areas C and C. Further, the exposure light from the light source 11 is transmitted through the masks 123 and 124 on the downstream side, and the film material is exposed to the film in the exposure region B&d. In the 疋ΐφίίϊϊ form on the waist month 2, the 'mask 12' is formed by the pattern forming portion 121 in the center of the frame 1 as shown in FIG. 4, and the pattern forming portion 121 is formed with a predetermined light. A pattern 121a of the transmissive area. That is, an opening having a shape for transmitting the exposure light or a member having a light transmissive property is formed corresponding to the impurity to be formed in the diaphragm 2. On the other hand, in the exposure apparatus of the directional division type, for example, the light transmitted through the pattern forming portion 121 is used to expose the target material of the surface of the film 2 disposed on the stage 10. In the present embodiment, a pair of light sources 配置 are disposed for each of the masks 12 to emit exposure light having different incident angles. Therefore, in the present embodiment, the pattern 121a is formed by a plurality of slits juxtaposed in the width direction of the diaphragm, and the moving direction of the dancer film is arranged in two rows. In the present embodiment, the 'shield 12' is located on the more visible side of the pattern 121a, and is perpendicular to the direction of the movement of the diaphragm 2 in 201216013. The left linear illuminating light ff is light-shielded, for example, the width of the left and right chest positions, and is used for the mask =0 (the linear cc (10) of the mask = Detecting the frame 12 of the opaque pattern mask 12, such as position control The mask can be moved in the longitudinal direction by the width of the mask as shown in I6, for example, in the horizontal direction (four). Thereby, the film can be adjusted to the g on the film 2 by the film implemented by the mask U in the width direction of the horizontal film and the exposure position of the film 2 of the film. For example, moving in the vertical direction, whereby the front end portion of the diaphragm 2 is transported to the introduction of the leading end portion formed at the linear front end portion, such as the observation window 12a provided with == and the blister configuration of the cover = 2 == CCD 15°. The position f2 of 2a is set in the middle of the observation window 12a of the film \12. The inverse ff CCD 15 'will be the mask ^ CCD 15,! The mask is set as the reference, and the mask to be set (the shader linear CCD 15 side to the guide: 2 no, the vertical control unit 30, by the cover flat △ 17 The position is the reference position, and the movement of the occlusion is determined. "You make the hunting determined by the position of the detected opaque pattern 12b. By this, the position of the exposure device D of the present embodiment is used as a reference to adjust the mask 12. Position, the position of the exposure of the 201216013 diaphragm can be determined with high precision. Fig. 6 LV _ Jjr > 03- _, mask position (4) 3 = construction of the cover position control unit % As shown in Fig. 6, the diaphragm winding is connected to, for example, the mask platform driving unit, the light source 11 and the manufacturing unit 3, and has an image processing unit 31, a calculation unit, and a control unit. The control unit 34, the light source driving unit 35, the mask, and the stage drive control unit are aligned by the rear (four) alignment mark 贞6, which is taken by the detection unit 丨6. The side is, for example, the stalk 2b is in the film width. The center position clip in the direction Λ the mark 2b of the alignment mark 2b detected by the image processing unit 31, and the actual alignment image processing ^ Ή ^ ^ film width direction The offset of the memory 33, such as the offset of the flooding tube 詈 = the alignment of the target, the center position of %, and the rotational speed of the calculation unit 32 when the bit is cut or the drive is driven. The driving unit 35 controls the lighting frequency of the lighting source of the source u. The shielding platform driving control unit 36 transmits the current or the vibration of the platform such as the shelter platform 17 2: the drive of the production of the mask 17 is controlled by the control unit t The momentum control unit 37' controls the driving of the image portion 35, the mask flat, the motor control 34, the light source driving, and the mask σ drive control unit 36. The film μ =, for example, adjusts the position of the mask 12, or switches the ON/QFF of the light that is irradiated by the light source u, or the rotational speed of the motor that can be controlled by the winding of the coil. In the present embodiment, the roller machine 8 is provided with light 30 in the movement of the diaphragm 2, the source 11, the mask 12, the mask platform 17, and the linear CCD. However, because of the configuration and the upstream side, Structure _ f 3^ Position Control Unit Next, the exposure of the present embodiment will be described. First, the slit coater 4 and the dry H shown in Fig. 9 will be described. Wood clothes. Set 5, apply 8 12 201216013 • The diaphragm 2 of the given process, inside the Bo-+ exposure device 1. It is supplied to the exposure roller 9 and supplied from the front end portion to the diaphragm 2 which is carried by the roller. And ϋΛ temporarily stops the control of the ,, so that the laser is marked, ., and the borrower is transported by the control device to the predetermined payment portion 13b to move to the frame table 13a, for example, 4 Therefore, each of the masks 12 is $2, and the marker portion 13c is disposed at any position on the upstream side of the bit = 12a where the marker portion 13 = is confirmed. On the other hand, at the front end of the diaphragm 2, the laser beam is emitted from the mark portion 13c, and the film 2 is in the form of the introduction mark 2a. At this time, because the front end roller of the diaphragm 2 is supported, the laser is irradiated as it is; ^μ ΑΑι Λ匕 causes '5 hex^13C to move, and then the same, the front end portion of the mountain f piece forms the introduction mark 2a . As shown in Fig. 3, the four films on the end of the film are imported into the shape of 2a. (2) Household 2 Marking STS: Restoring the diaphragm by transporting rollers or the like? The transport of the cymbal 2, the hunter is carried by the transport roller, etc., as shown in Fig. 5, the syllabus corresponds to the exposure of the spine Α and C to the fresh 12 (mask 12 b | 2 g hood 12 under the * The observation window l2a (and the light-shielding pattern): L ΐΓ, the linear direction of the cymbal 1 extending in the width direction is arranged with a linear CCD 15, · linear ^ 辜 mark 2 & when transported to the top of the linear CCD 15, detection V is located at the position of 2a. Further, the linear CCD 15 is detected at the position of the viewing window 12a of the mask 12, and the position of the light-shielding pattern 12b is provided in the middle, thereby measuring the light-shielding pattern of the labeling and the mask 12 The distance between 12b and the linear CCD 15 transmits a signal of the detected distance between the introduction mark 2a and the light-shielding pattern 12b to the mask position control unit 30. Further, 'from the linear CCD〗 5 Before the end of the adjustment of the mask position to the mask position, for example, the transport of the diaphragm 2 is stopped first, or the exposure of the diaphragm 2 is not initiated. Next, if the mark 2a and the light-shielding pattern 12b are input from the linear CCD 15, 13 201216013 ===The cover position control unit is catastrophic. First, the pre-preparation of 4 is parallel to the diaphragm surface. The stored data (in the position of the leader marked 2a, 17 Ming sui s, should be. the initial position of the data) for comparison, and the position of the mask before the position of the initial position of the mask is determined. By 膣Η 9 by the initial position of the exposure start in the exposure area AAC:. For the ground, the mask 12 (mask 12 122) is determined with high precision, and the initial position is determined by, for example, a transport roller. When the transporting film 11 is just standing in the irradiation area of the exposure light, the light source is covered by the light source 12 to expose the film 2. Thereby, the film 2 is oriented in a predetermined direction. When the exposure at one end is finished Then, the exposure target portion is exposed in order, and the pattern exposed by the U domains A and C is formed into two elongated strips in the film 2. ^' is transported' as shown in Fig. 7, the front end portion of which is delivered to the lower side of the mask 12 (masks 123, 124) disposed below. The observation window 12a corresponding to each U 12 (and The position of the shading pattern is both) and the same as the upstream/February subject 'to extend along the width of the sepal 2' There is a linear 5; linear CCD 15, when the lead-in mark 2a is transported above the linear CCD 15 = (between the linear CCD 15 and the mask 12), the side-introducing mark, the buckle of 2a is the same as the case of the upstream side, the linear CCD 15. The light-shielding pattern 12b provided in the middle of the observation window 12a of the mask 12 is detected as the actual position of the mask 12, thereby measuring the distance between the introduction mark 2a and the (four) of the light-shielding pattern 12b of the mask 12. A signal of the distance between the detected flag 2a and the light-shielding pattern 12b detected on the day is transmitted to the mask position control unit 30. Further, from the detection step by the linear CCD 15 to the end of the adjustment of the mask position, for example, the transport of, for example, the film 2 is stopped, or the exposure to the diaphragm 2 is not started. When the signal of the distance between the mark 2a and the light-shielding pattern 12b is input from the linear CCD 15, the mask position control unit 30 firstly pairs the distance between the two faces parallel to the diaphragm face with the pre-stored The data (the data of the initial position to be set by the mask based on the position of the introduction mark 2a; 2) is compared. Like the mask platform 17 14 8 201216013 •: initial = ί5 ΐ cover, the position of the mask determined by the position of the case 12b is located at the position before the exposure of the film in the exposure area 6 and the 既. ~Quasi' South determines the initial 2 of the mask 12 (mask 123, 124) accurately, and the film is transported by, for example, a transport roller, and the target portion is located in the irradiation area of the exposure light. Thus, the light from the light is transmitted through the mask 12 to expose the film 2. |& this, membrane g
上向於既定的方向。當1處的曝=則S …口膜片2，依序對曝光對象部位進行曝光。 成二藉由曝光區域B&d所曝光的圖案曰、域及二 之間所形成的圖案之間係受由曝光區 ;以鄰接於藉由曝光區域c所形成的圖案 域D所形成的圖案。 开^成由曝光區 形上游側與下游側之情 疊，或產生未曝光的區造f，域重 ί: 位置，係以_2的前端 ，亦可高精度 ，案與藉由曝締域BAD所形成的圖案° 所形成的 t曝光的部分，能高精度地於则的全 胃重®，不會殘留 來進行曝光。. ^攻圖案，旎穩定膜片 接著，綱在本實施形態的曝光裝置 ，之際的膜片2的寬方向的位置偏移所導二H連續地進行曝 知正之機構。在本實施形態中，如圖5所示，^' 1立置偏移進行 ，片的移動方向上游側的遮罩12卜122在膜片、二3置卜以與 式，设有對罕用雷射標註器14(對準標 、寬方向並排之方 器Μ，於從膜片供=對準用 ^準U。又，於曝光裝置1，以盥膜片、纟邊緣部形成 .遮㈣、叫膜㈣方峨之 15 201216013 寬方向中之位置。緣部卿朗對準標誌、2b在膜片 細，將偵測到^接至上述的遮罩位置控 對準用雷射ΐ傳到遮罩位置控制部30。 如圖7所示，於膜片光燈等脈衝光源射出脈衝雷射光， 右，長15mm的對準標誌2b如寬¥左 在膜片2的移動方尚由^、+&/耵早用田射私注态14，於對應例如 t 121 ：122 區域形成對準標誌、2b。例如Mmm以下的 光區域A及曝光區域c 2的祕方向之上游側的曝 準標認2b之距離，係常案’與在膜U的邊緣部中對 為例如CCD攝影機t準標誌偵測部16， 124的觀察窗12a心罢I所f於對應例如下游側遮罩123、 誌处在膜片寬方向中之位置部所形成的對準標 準標誌、2b在膜片寬方向中之上6 ’,將_嶋 置控制部30 :遮罩位置控制部30傳6所示的遮罩位 來對，的移動方向下游側的遮罩的位J， 在藉由如以上的構造之眼f # 、置進行5周整。 ^，於錢爾以上的距 $邊，部所形成的對準標tt2b的位置，亦在㈣$ =片2 。在此情形，遮罩位置控制部3 、他見《產生偏 測到的對準標誌2b之寬方南的位置部％所伯 使遮罩平台17移動，俾修正膜片2m^轉控制部36 對於膜片2的遮軍12之位置。亦即，如圖=偏移^藉此修正相 3S==ff片的寬方_偏移之情形，標 使下軸遮㈣請的•伽對的 201216013 里矛夕動至膜片的寬方向外側。相 位置_片的寬方向内側偏移之H 標tt2b的 至膜片的寬方向内側。因此，在膜，偏移的量移動 對準=2,的遮罩123 。 使在膜片，i連續曝光之際，如圖8所示，即 此相=膜片2的曝光位置不會偏移，可i行立置’藉 另外’雖說明了在本實施形能中° 曝光之定向分割方式的“藉割 道光源的曝光光線，例如，若對 1=^片齡亦即’藉由來自2 為晝素之區域，交互昭射片的寬方向所鄰接的作 則可在每個藉由複數二偏定 =到在膜片面中-定向方向相差二 1/从板相_功能之定向膜’可將戶斤得之膜 用。亦即，若使直線偏光的影像顯示用的光透射過光5 素所構成並於膜片的寬方向“之顯示歹: 的圓偏光之透射光。可將該圓偏光的2道 J射先刀別作為例如3D顯示器的右眼用及左眼用的顯示光使 1 [產業Ji利用性] 本發明，在對整捲連續製造方式的膜 的膜片曝光裝·置中，能以高精度設定曝光開始時=罩‘=置案 【圖式簡單說明】 導 體 圖1係顯示在依本發_實麵態的膜片之曝光裝 入標諸形成部之立體圖。 、 =係顯示在依本發_實施的則之曝絲置的全 之立體園。 17 201216013 於膜施形態的膜片之曝光裝置中,對 罩的=顯示在依本發明的實施形態的膜片之曝光裝置中，遮 由導膜片之曝光裝置中’藉 圖6係以一例顯示膜片位置的控制部 圖7係顯示在依本發明 光 由下，的遮罩所實行之曝光步驟片之^裝置中’糟 ，3顯示膜>;的寬方向偏移的修正之圖。 H顯示整捲連續製造方式的則生產線的例之圖。 mil 以—例顯不定向分割方式的曝光裝置之立體圖。 係以一例顯示在對膜片進行曝光之際的遮罩配置之圖。 【主要元件符號說明】 1:曝光裝置 2 ： 膜片 2a :導入標誌 2b :對準標誌 2c :圖案 3 ： 4 : 前處理部 狹縫式塗布機 5 : 乾燥裝置 6 ： 溫度調節裝置 8 ： 輥機 9 : 滾輪 10 •平台 11 :光源 12 :遮罩 12a :觀察窗 201216013 12b :遮光圖案 13 :雷射標註器 13a :構架台 13b :運送部 13c :標記部 14 :對準用雷射標註器 15 :膜片導入位置偵測部(線性CCD ) 16 :對準標誌偵測部 17 :遮罩平台 20 :輥機 30 :遮罩位置控制部 31 :影像處理部 32 :演算部 33 :記憶體 34 :馬達驅動控制部 35 :光源驅動部 36 :遮罩平台驅動控制部 37 :控制部 120 :框體/遮罩圖案 121 :圖案形成部/第1遮罩 121a .既定的光透射區域之圖案 122 :第2遮罩 123 :第3遮罩 124 :第4遮罩 A、B、C、D:曝光區域 19Upward in the given direction. When the exposure at one place is then the S film 2, the exposure target portion is sequentially exposed. The pattern formed between the pattern 曰, the domain and the two exposed by the exposed region B&d is exposed by the exposed region; the pattern formed adjacent to the pattern region D formed by the exposed region c . The opening is formed by the upstream side and the downstream side of the exposed area, or the unexposed area is created, the domain is ί: the position, and the front end of the _2 is used, and the high precision can also be achieved by the exposure domain. The portion of the exposure formed by the pattern formed by the BAD can be exposed with high precision to the total weight of the stomach. ^Tapping pattern, yttrium-stabilized film Next, in the exposure apparatus of the present embodiment, the positional deviation of the film 2 in the width direction is continuously guided to expose the positive mechanism. In the present embodiment, as shown in FIG. 5, the vertical displacement is performed, and the mask 12 122 on the upstream side in the moving direction of the sheet is provided in the diaphragm, the second and the third. The laser marker 14 (aligns the target and the side of the square in the width direction), and supplies the alignment from the diaphragm. In addition, in the exposure device 1, the edge of the diaphragm and the edge of the crucible are formed. Called film (4) square 峨 15 201216013 The position in the width direction. The edge of the Qing Lang alignment mark, 2b is thin in the diaphragm, will detect the connection to the above-mentioned mask position control alignment laser to the mask The position control unit 30. As shown in Fig. 7, the pulsed light source such as a diaphragm lamp emits pulsed laser light, and the right side, the alignment mark 2b of 15 mm in length, such as the width of the left side of the diaphragm 2, is moved by ^, +& / / 耵 田 田 田 私 , , , , , , 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 形成 对准 对准 对准 对准 对准 对准 对准 对准 对准 对准 对准 对准The distance of 2b is the normal case 'and the observation window 12a of the CCD camera t-mark detecting portion 16, 124 in the edge portion of the film U corresponds to, for example, the downstream. The alignment standard mark 2b formed by the position of the mask 123 in the width direction of the film, 2b is 6' above the width direction of the film, and the control unit 30: the mask position control unit 30 transmits The position J of the mask on the downstream side in the moving direction of the mask position shown in Fig. 6 is set to 5 weeks by the eye f # of the above structure. ^, the distance from the $ side of the money The position of the alignment mark tt2b formed by the portion is also at (4) $ = slice 2. In this case, the mask position control portion 3, see the position portion of the wide south of the alignment mark 2b which is detected. % 所 使 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮 遮In the case of the width _ offset, the lower axis is shielded (four). • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • The width direction of the inside of the sheet. Therefore, in the film, the amount of offset moves the mask 123 with the alignment = 2. For the continuous exposure of the diaphragm, i, as shown in Fig. 8, that is, the phase = the diaphragm 2 of The position of the light does not shift, and the i-line is set to 'borrow another'. Although the directional segmentation method of the exposure in the present embodiment is described, the exposure light of the slash source is, for example, if the pair is 1=^ That is, by the region from 2 as the pixel, the adjacent direction of the width direction of the interactive photographic film can be made by the complex two-bias = to the plane of the diaphragm - the orientation direction is different by two / The plate phase _ functional orientation film can be used for the film of the household. That is, if the linearly polarized image display light is transmitted through the light and is displayed in the width direction of the film 歹: Transmitted light with circular polarization. In the case of the right-eye and the left-eye display light of the 3D display, the two-dimensional J-rays can be used as the film for the whole-volume continuous production method. In the exposure and setting of the film, it is possible to set the exposure start with high precision = hood '= 置 【 [Simple description of the drawing] The conductor Figure 1 shows the exposure of the film according to the present invention. A perspective view of the department. , = is displayed in the full three-dimensional garden of the exposure of the hair. In the exposure apparatus of the film according to the embodiment of the present invention, in the exposure apparatus of the film according to the embodiment of the present invention, in the exposure apparatus which shields the film of the guide film, FIG. Control section showing the position of the diaphragm Fig. 7 is a diagram showing the correction of the width direction shift of the "dark, 3 display film" in the apparatus of the exposure step performed by the mask according to the present invention. . H shows an example of a production line of a continuous roll manufacturing process. The mil is a perspective view of an exposure apparatus that exhibits a non-directional division. A diagram showing a mask arrangement at the time of exposing the diaphragm is shown as an example. [Explanation of main component symbols] 1: Exposure device 2: Diaphragm 2a: Introduction mark 2b: Alignment mark 2c: Pattern 3: 4: Pretreatment section slit coater 5: Drying device 6: Temperature adjusting device 8: Roller Machine 9: Roller 10 • Platform 11: Light source 12: Mask 12a: Observation window 201216013 12b: Light-shielding pattern 13: Laser marker 13a: Frame stage 13b: Transport part 13c: Marking part 14: Alignment laser marker 15 : diaphragm introduction position detecting unit (linear CCD) 16 : alignment mark detecting unit 17 : mask stage 20 : roll machine 30 : mask position control unit 31 : image processing unit 32 : calculation unit 33 : memory 34 Motor drive control unit 35: light source drive unit 36: mask stage drive control unit 37: control unit 120: housing/mask pattern 121: pattern forming unit/first mask 121a. Pattern 122 of a predetermined light transmitting area : 2nd mask 123 : 3rd mask 124 : 4th mask A, B, C, D: exposure area 19