WO2011118619A1 - Appareil pour le traitement de surface des films - Google Patents

Appareil pour le traitement de surface des films Download PDF

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Publication number
WO2011118619A1
WO2011118619A1 PCT/JP2011/056950 JP2011056950W WO2011118619A1 WO 2011118619 A1 WO2011118619 A1 WO 2011118619A1 JP 2011056950 W JP2011056950 W JP 2011056950W WO 2011118619 A1 WO2011118619 A1 WO 2011118619A1
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WIPO (PCT)
Prior art keywords
film
electrode
roll electrode
roll
discharge space
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PCT/JP2011/056950
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English (en)
Japanese (ja)
Inventor
崇 佐藤
光秀 野上
良憲 中野
真一 川崎
Original Assignee
積水化学工業株式会社
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Application filed by 積水化学工業株式会社 filed Critical 積水化学工業株式会社
Priority to CN201180015223XA priority Critical patent/CN102812073B/zh
Priority to KR1020127027571A priority patent/KR101257655B1/ko
Publication of WO2011118619A1 publication Critical patent/WO2011118619A1/fr

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C08J7/16—Chemical modification with polymerisable compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C08J7/16—Chemical modification with polymerisable compounds
    • C08J7/18—Chemical modification with polymerisable compounds using wave energy or particle radiation

Definitions

  • the present invention relates to an apparatus for surface treatment of a continuous film, for example, a film surface treatment apparatus suitable for a treatment for improving the adhesion of a protective film of a polarizing plate.
  • a polarizing plate is incorporated in a liquid crystal display device.
  • the polarizing plate is obtained by bonding a protective film made of a resin film containing triacetate cellulose (TAC) as a main component to a polarizing film made of a resin film containing polyvinyl alcohol (PVA) as a main component using an adhesive.
  • TAC triacetate cellulose
  • PVA polyvinyl alcohol
  • As the adhesive water-based adhesives such as polyvinyl alcohol and polyether are used. PVA films have good adhesion to these adhesives, but TAC films do not have good adhesion.
  • a saponification treatment is generally used. In the saponification treatment, the TAC film is immersed in a high-temperature, high-concentration alkaline solution. Therefore, problems of workability and waste liquid treatment have been pointed out.
  • Patent Document 1 describes that a polymerizable monomer is coated on the surface of a protective film and irradiated with atmospheric pressure plasma before the bonding step.
  • the atmospheric pressure plasma irradiation apparatus one roll electrode is accommodated in a sealed container, and a plurality of plate electrodes are arranged at intervals along the outer periphery of the roll electrode.
  • the protective film coated with the polymerizable monomer is wound around the roll electrode.
  • discharge gas such as nitrogen
  • the plasma processing apparatus of Patent Document 2 has a pair of roll electrodes and a processing gas blowing nozzle.
  • the blowing nozzle faces the gap between the roll electrodes.
  • a continuous film is wound around a pair of roll electrodes, and plasma treatment is performed in the gap between the roll electrodes.
  • a pair of roll electrodes rotate in synchronization with each other to convey a continuous film.
  • the roll electrode of the plasma irradiation apparatus is covered with a protective film, but the flat plate electrode is directly exposed to plasma. For this reason, dirt composed of a polymer of a polymerizable monomer or the like tends to adhere to the plate electrode. This dirt component causes particles and causes a decrease in yield.
  • the present invention activates a reactive component such as a polymerizable monomer and plasma-treats a film to be treated such as a protective film for a polarizing plate while preventing the contamination of the electrode while reacting the reactive component.
  • a reactive component such as a polymerizable monomer
  • plasma-treats a film to be treated such as a protective film for a polarizing plate while preventing the contamination of the electrode while reacting the reactive component.
  • the purpose is to ensure sufficient and enhance treatment effects such as adhesion.
  • the present invention is a film surface treatment apparatus that activates a reaction component to react on the surface of the film to be treated while conveying a continuous film to be treated,
  • a main processing unit disposed relatively upstream in the transport direction; and a reactivation unit disposed relatively downstream in the transport direction;
  • the main processing part is arranged in parallel so as to form a main discharge space near atmospheric pressure between each other, and the transport direction from the main discharge space in the film to be processed, the first roll electrode and the second roll electrode
  • a nozzle that blows out a reaction gas containing the reaction component toward a portion on the upstream side or toward the main discharge space, and the film to be processed is wound around the first roll electrode, and After being passed through the main discharge space, it is folded and wound around the second roll electrode, and the first roll electrode and the second roll electrode are rotated around their own axes and in the same direction.
  • the film to be treated is conveyed from the first roll electrode to the second roll electrode,
  • the reactivation unit includes a pair of rear electrodes in which a redischarge space near atmospheric pressure is formed between each other, and a gas supply unit that supplies a discharge generation gas that does not contain the reaction component between the rear electrodes.
  • the film to be processed is passed through the re-discharge space, and the opposing surfaces of the pair of subsequent electrodes are flat surfaces, a flat surface and a convex cylindrical surface, or a concave cylindrical surface and a convex cylindrical surface, To do.
  • reaction components are reacted to some extent by plasma irradiation in the main discharge space.
  • it can prevent that a to-be-processed film covers a 1st roll electrode and a 2nd roll electrode, and a dirt adheres to a 1st, 2nd roll electrode.
  • production of a particle can be prevented and a yield can be improved.
  • the film to be treated is again irradiated with plasma in the re-discharge space between the pair of subsequent electrodes of the reactivation unit.
  • the opposing surfaces of the pair of subsequent electrodes are configured by planes, or one opposing surface is configured as a plane and the other opposing surface is configured as a convex cylindrical surface, or one opposing surface is configured as a concave cylindrical surface and the other opposing surface.
  • the path length along the transport direction of the re-discharge space can be made longer than the path length along the transport direction of the main discharge space. Therefore, sufficient energy can be imparted to the surface molecules and reaction components of the film to be treated in the reactivation part, and preferably greater energy than in the main treatment part.
  • the reaction component is a polymerizable monomer
  • a polymerization reaction can be sufficiently caused, and an odor due to an unpolymerized polymerizable monomer can be prevented from being generated from a treated film after treatment.
  • the said to-be-processed film is a protective film of a polarizing plate
  • an adhesive promotion layer can be reliably formed in this protective film, and adhesiveness with a polarizing film can be improved. Since the reaction product is not included in the discharge product gas of the reactivation part, it is possible to prevent the dirt from adhering to the electrode in the reactivation part and to prevent generation of particles. Therefore, the yield can be improved reliably.
  • One of the pair of post-stage electrodes of the reactivation unit has an opposing surface formed of a flat surface or a concave cylindrical surface and is opposed to the second roll electrode, and the second roll electrode is formed of the reactivation unit. It is preferably provided as the other latter-stage electrode.
  • the outer peripheral surface of the second roll electrode constitutes an opposing surface composed of the convex cylindrical surface.
  • the power supplied to the reactivation unit is larger than the power supplied to the main processing unit. Thereby, the reactivity in the reactivation part can fully be raised.
  • the present invention is a film surface treatment apparatus that activates a reaction component to react on the surface of the film to be treated while conveying a continuous film to be treated, A main processing unit disposed relatively upstream in the transport direction; and a reactivation unit disposed relatively downstream in the transport direction;
  • the main processing part is arranged in parallel so as to form a main discharge space near atmospheric pressure between each other, and the transport direction from the main discharge space in the film to be processed, the first roll electrode and the second roll electrode
  • a nozzle that blows out a reaction gas containing the reaction component toward a portion on the upstream side or toward the main discharge space, and the film to be processed is wound around the first roll electrode, and After being passed through the main discharge space, it is folded and wound around the second roll electrode, and the first roll electrode and the second roll electrode are rotated around their own axes and in the same direction.
  • the film to be treated is conveyed from the first roll electrode to the second roll electrode,
  • the second feature is that the reactivation unit includes light energy
  • reaction components are reacted to some extent by plasma irradiation. At this time, it can prevent that a to-be-processed film covers a 1st roll electrode and a 2nd roll electrode, and a dirt adheres to a 1st, 2nd roll electrode. As a result, generation
  • the reaction component is a polymerizable monomer
  • a polymerization reaction can be sufficiently caused, and an odor caused by an unpolymerized polymerizable monomer can be prevented from being generated from a treated film after processing.
  • the said to-be-processed film is a protective film of a polarizing plate
  • an adhesive promotion layer can be reliably formed in this protective film, and adhesiveness with a polarizing film can be improved.
  • light energy it is preferable to use ultraviolet light energy or infrared light energy.
  • the surface treatment is preferably performed near atmospheric pressure.
  • the vicinity of atmospheric pressure refers to a range of 1.013 ⁇ 10 4 to 50.663 ⁇ 10 4 Pa, and considering the ease of pressure adjustment and the simplification of the apparatus configuration, 1.333 ⁇ 10 4 to 10.664 ⁇ 10 4 Pa is preferable, and 9.331 ⁇ 10 4 to 10.9797 ⁇ 10 4 Pa is more preferable.
  • the present invention is suitable for processing difficult-to-adhere optical resin films.
  • the adhesiveness of the hardly-adhesive optical resin film is improved. It is suitable for improving.
  • the main component of the hardly adhesive optical resin film include triacetate cellulose (TAC), polypropylene (PP), polyethylene (PE), cycloolefin polymer (COP), cycloolefin copolymer (COC), and polyethylene terephthalate. (PET), polymethyl methacrylate (PMMA), polyimide (PI) and the like.
  • Examples of the main component of the easily adhesive optical resin film include polyvinyl alcohol (PVA) and ethylene vinyl acetate copolymer (EVA).
  • PVA polyvinyl alcohol
  • EVA ethylene vinyl acetate copolymer
  • a polymerizable monomer As the reaction component, it is preferable to use a polymerizable monomer as the reaction component.
  • the polymerizable monomer include monomers having an unsaturated bond and a predetermined functional group.
  • the predetermined functional group is preferably selected from a hydroxyl group, a carboxyl group, an acetyl group, a glycidyl group, an epoxy group, an ester group having 1 to 10 carbon atoms, a sulfone group, and an aldehyde group.
  • a hydrophilic group is preferred.
  • Examples of the monomer having an unsaturated bond and a hydroxyl group include ethylene glycol methacrylate, allyl alcohol, and hydroxyethyl methacrylate.
  • Examples of the monomer having an unsaturated bond and a carboxyl group include acrylic acid, methacrylic acid, itaconic acid, maleic acid, 2-methacryloylpropionic acid and the like.
  • Examples of the monomer having an unsaturated bond and an acetyl group include vinyl acetate.
  • Examples of the monomer having an unsaturated bond and a glycidyl group include glycidyl methacrylate.
  • Monomers having an unsaturated bond and an ester group include methyl acrylate, ethyl acrylate, butyl acrylate, t-butyl acrylate, 2-ethylhexyl acrylate, octyl acrylate, methyl methacrylate, ethyl methacrylate, methacrylic acid
  • Examples include butyl, t-butyl methacrylate, isopropyl methacrylate and 2-ethyl methacrylate.
  • Examples of the monomer having an unsaturated bond and an aldehyde group include acrylic aldehyde and crotonaldehyde.
  • the polymerizable monomer is a monomer having an ethylenically unsaturated double bond and a carboxyl group.
  • examples of such monomers include acrylic acid (CH 2 ⁇ CHCOOH) and methacrylic acid (CH 2 ⁇ C (CH 3 ) COOH).
  • the polymerizable monomer is preferably acrylic acid or methacrylic acid. Thereby, the adhesiveness of a hardly-adhesive resin film can be improved reliably. More preferably, the polymerizable monomer is acrylic acid.
  • the polymerizable monomer may be conveyed by a carrier gas.
  • the carrier gas is preferably selected from an inert gas such as nitrogen, argon or helium. From the economical viewpoint, it is preferable to use nitrogen as the carrier gas.
  • Many polymerizable monomers such as acrylic acid and methacrylic acid are in a liquid phase at normal temperature and pressure. Such a polymerizable monomer may be vaporized in a carrier gas such as an inert gas.
  • a method of vaporizing the polymerizable monomer into the carrier gas a method of extruding a saturated vapor on the surface of the polymerizable monomer solution with the carrier gas, a method of bubbling the carrier gas into the polymerizable monomer solution, a polymerizable monomer solution
  • a method of promoting evaporation by heating can be used. Extrusion and heating, or bubbling and heating may be used in combination.
  • the reaction of the reactive component can be sufficiently ensured while preventing contamination of the electrode, and the processing effect is improved. Can be increased.
  • FIG. 1 shows a first embodiment of the present invention.
  • the film 9 to be processed has a continuous sheet shape.
  • a protective film for a polarizing plate is applied as the film 9 to be processed.
  • the protective film 9 contains triacetate cellulose (TAC) as a main component.
  • TAC triacetate cellulose
  • the components of the film 9 are not limited to TAC, but polypropylene (PP), polyethylene (PE), cycloolefin polymer (COP), cycloolefin copolymer (COC), polyethylene terephthalate (PET), polymethyl methacrylate (PMMA), polyimide (PI), or the like may be used.
  • the thickness of the film 9 is, for example, about 100 ⁇ m.
  • a polarizing film made of a PVA film and a protective film are bonded together with an adhesive to constitute a polarizing plate.
  • an aqueous adhesive such as an aqueous PVA solution is used.
  • the protective film is surface-treated by the film surface treatment apparatus 1 to improve the adhesion of the protective film.
  • the film surface treatment apparatus 1 includes a main treatment unit 10 and a reactivation unit 30.
  • the protective film 9 to be processed is conveyed in a substantially right direction with the width direction orthogonal to the paper surface in FIG.
  • the main processing unit 10 is arranged on the upstream side (left side in FIG. 1) of the film 9 to be processed, and the reactivation unit 30 is arranged on the downstream side (right side in FIG. 1) of the film 9 to be processed. ing.
  • the main processing unit 10 includes a pair of electrodes 11 and 12 and gas nozzles 21, 22 and 23.
  • the electrodes 11 and 12 have a roll shape (cylindrical shape). Roll electrodes 11 and 12 are arranged in parallel to each other with their respective axes oriented in a horizontal direction perpendicular to the paper surface of FIG.
  • a direction along the axis of the electrodes 11 and 12 is appropriately referred to as a “process width direction” (see FIG. 2).
  • the left first roll electrode 11 is connected to a power source 18.
  • the second roll electrode 12 on the right side is electrically grounded.
  • the power source 18 supplies, for example, pulsed high frequency power to the electrode 11.
  • a plasma discharge is generated between the electrodes 11 and 12 under a pressure near atmospheric pressure.
  • a space between the portions of the roll electrodes 11 and 12 facing each other becomes a main discharge space 19 near atmospheric pressure.
  • the narrowest portion between the roll electrodes 11 and 12 and the space in the vicinity thereof become the main discharge space 19.
  • the main discharge space 19 is defined by the outer peripheral surfaces formed by the convex cylindrical surfaces of the roll electrodes 11 and 12, the path length in the vertical direction (vertical direction) is short. For example, when the diameter of the roll electrodes 11 and 12 is about 310 mm, the vertical path length of the main discharge space 19 is about 40 mm.
  • the film 9 to be treated is wound around the upper peripheral surface of the first roll electrode 11 about a half turn.
  • the film to be processed 9 is passed through the main discharge space 19 along the peripheral surface of the first roll electrode 11, is hung below the main discharge space 19, and is folded up by the guide rolls 16 and 16. Further, the film 9 to be processed is passed through the main discharge space 19 along the peripheral surface of the second roll electrode 12, and is wound around the upper peripheral surface of the second roll electrode 12 about a half turn. About half a circumference including a portion defining the main discharge space 19 of both roll electrodes 11 and 12 is covered with the film 9 to be processed.
  • the rotation mechanism includes a drive unit such as a motor or an internal combustion engine, and a transmission unit that transmits the driving force of the drive unit to the shafts of the roll electrodes 11 and 12.
  • the transmission means is constituted by, for example, a belt / pulley mechanism or a gear train.
  • the roll electrodes 11 and 12 are rotated around their own axes and in the same direction (clockwise in FIG. 1) in synchronization with each other by the rotation mechanism. . Thereby, the to-be-processed film 9 is conveyed from the 1st roll electrode 11 to the 2nd roll electrode 12.
  • Temperature control means (not shown) is incorporated in each roll electrode 11, 12.
  • the temperature adjusting means is constituted by a temperature adjusting path formed in the roll electrodes 11 and 12, for example.
  • the temperature of the roll electrodes 11 and 12 can be controlled by flowing a temperature-controlled medium such as water through the temperature control path.
  • a temperature-controlled medium such as water
  • Discharge generation gas nozzles 21 and 22 are arranged above and below the main discharge space 19 between the roll electrodes 11 and 12, respectively.
  • a discharge generated gas supply source 24 is connected to each of the nozzles 21 and 22.
  • the upper nozzle 21 extends long in the processing width direction, and a cross section perpendicular to the extending direction tapers downward.
  • the outlet at the lower end (tip) of the nozzle 21 faces the main discharge space 19.
  • the upper end of the main discharge space 19 is blocked to some extent by the nozzle 21.
  • a rectifying unit (not shown) is provided on the upper side of the nozzle 21, and the discharge generating gas is made uniform in the processing width direction by this rectifying unit and introduced into the nozzle 21. This discharge generated gas is blown out from the blowout port at the lower end of the nozzle 21 into the main discharge space 19.
  • the discharge flow of the discharge product gas is a uniformly distributed flow in the processing width direction.
  • the lower nozzle 22 has a shape obtained by inverting the upper nozzle 21 up and down. That is, the lower nozzle 22 extends long in the processing width direction, and a cross section perpendicular to the extending direction tapers upward. An outlet at the upper end (tip) of the nozzle 22 faces the main discharge space 19. The lower end portion of the main discharge space 19 is blocked to some extent by the nozzle 22.
  • a rectification unit (not shown) is provided at the lower end of the nozzle 22, and the rectification unit makes the discharge generated gas uniform in the processing width direction and introduces it into the nozzle 22. This discharge generated gas is blown out from the outlet of the nozzle 22 into the main discharge space 19.
  • the discharge flow of the discharge product gas is a uniformly distributed flow in the processing width direction.
  • the discharge generated gas may be blown out from the upper and lower nozzles 21 and 22 at the same time.
  • the gas is blown out from only one of the upper and lower nozzles 21 and 22, and the other nozzle is used as a closing member for closing the upper end or the lower end of the main discharge space 19. It may be used.
  • the discharge generated gas may be blown out only from the lower nozzle 22 and the gas may not be blown out from the upper nozzle 21.
  • An inert gas is used as the discharge product gas.
  • nitrogen (N 2) can be mentioned as an inert gas for discharge product gas, not limited to this, Ar, may be used a noble gas such as He.
  • the reaction gas nozzle 23 is disposed above the first roll electrode 11 so as to face the electrode 11.
  • the reactive gas nozzle 23 is separated from the main discharge space 19 along the circumferential direction of the first roll electrode 11 by about a quarter of the turn in the electrode rotation direction and thus upstream in the film transport direction.
  • the reactive gas nozzle 23 faces the film 9 to be processed on the electrode 11 on the upstream side in the transport direction from the main discharge space 19.
  • the reactive gas nozzle 23 extends long in the processing width direction and has a certain width in the circumferential direction of the first roll electrode 11 (left and right in FIG. 1).
  • a rectification unit is incorporated in the reaction gas nozzle 23.
  • An outlet is provided on the lower surface of the reactive gas nozzle 23. The outlets are formed so as to be distributed over a wide range (the processing width direction and the electrode circumferential direction) of the lower surface of the nozzle 23.
  • the reaction gas supply source 20 is connected to the nozzle 23.
  • the reaction gas from the supply source 20 is supplied to the nozzle 23.
  • the reaction gas is made uniform by the rectifying unit and blown out from the blowout port on the lower surface of the nozzle 23.
  • the blow-out flow of the reaction gas is a flow that is uniformly distributed in the processing width direction.
  • the reaction gas contains a polymerizable monomer as a reaction component.
  • acrylic acid AA is used as the polymerizable monomer.
  • Acrylic acid has an acetic acid-like odor and has explosive properties, and therefore requires appropriate management.
  • the polymerizable monomer is not limited to acrylic acid, and may be methacrylic acid, itaconic acid, maleic acid, or the like.
  • the reaction gas further includes a carrier gas in addition to the reaction component (polymerizable monomer).
  • An inert gas is used as the carrier gas.
  • nitrogen (N 2 ) is used as the inert gas for the carrier gas, but the present invention is not limited to this, and a rare gas such as Ar or He may be used.
  • the reactive gas supply source 20 is constituted by a vaporizer.
  • Acrylic acid AA is stored in the vaporizer as a polymerizable monomer in a liquid state.
  • Nitrogen (N 2 ) is introduced into the vaporizer as a carrier gas.
  • Acrylic acid is vaporized and mixed with this carrier gas (N 2 ) to generate a reaction gas (acrylic acid AA + N 2 ).
  • the carrier gas may be introduced above the liquid acrylic acid level in the vaporizer, or may be introduced into the liquid acrylic acid and bubbled. A part of the carrier gas may be introduced into the vaporizer and the remaining part may not be passed through the vaporizer, and the part of the carrier gas and the remaining part may be merged on the downstream side of the vaporizer.
  • the acrylic acid concentration in the reaction gas can be adjusted according to the temperature of the vaporizer and the distribution ratio of the part and the remainder of the carrier gas.
  • the reaction gas supply line from the reaction gas supply source 20 to the nozzle 23 is temperature-controlled by a reaction gas temperature adjusting means (not shown) such as a ribbon heater.
  • a shielding member 40 is provided at the bottom of the reaction gas nozzle 23.
  • the shielding member 40 has a curved plate shape extending in the processing width direction substantially the same length as the electrode 11 and having a cross section orthogonal to the extending direction forming an arc shape along the circumferential direction of the first roll electrode 11.
  • the reaction gas nozzle 23 is connected to the central portion of the shielding member 40 in the arc direction (left and right in FIG. 1). Both ends of the shielding member 40 in the arc direction extend from the nozzle 23 in the circumferential direction of the electrode 11.
  • the end of the shielding member 40 on the nozzle 21 side (right side in FIG. 1) is abutted against and connected to the side of the nozzle 21.
  • the shielding member 40 is placed slightly above the first roll electrode 11.
  • the shielding member 40 covers the upper peripheral surface of the first roll electrode 11 to some extent.
  • a shielding space 41 is formed between the shielding member 40 and the peripheral surface of the first roll electrode 11.
  • the shielding space 41 is along the upper peripheral surface of the first roll electrode 11.
  • the outlet on the lower surface of the reactive gas nozzle 23 penetrates the shielding member 40 and communicates with the shielding space 41.
  • An end portion of the shielding space 41 on the nozzle 21 side (right side in FIG. 1) is connected to the main discharge space 19 through a space between the nozzle 21 and the peripheral surface of the first roll electrode 11.
  • the end of the shielding space 41 opposite to the nozzle 21 (left side in FIG. 1) is open to the outside.
  • the film surface treatment apparatus 1 is provided with a reactivation unit 30 in addition to the main treatment unit 10.
  • the reactivation unit 30 is disposed downstream of the main discharge space 19 in the transport direction of the film 9 to be processed.
  • the reactivation unit 30 includes one or a plurality of (two in the drawing) rear electrodes 31.
  • the rear electrode 31 has a flat plate shape extending in the processing width direction.
  • Each subsequent-stage electrode 31 is disposed above the second roll electrode 12 and faces the peripheral surface on the upper side of the second roll electrode 12.
  • a plurality of subsequent electrodes 31, 31 are arranged at intervals in the circumferential direction of the second roll electrode 12.
  • each post-stage electrode 31 in the processing width direction is substantially equal to the axial length of the second roll electrode 12.
  • the dimension of each rear electrode 31 along the circumferential direction of the electrode 12 is, for example, about 20 mm to 40 mm.
  • the arrangement pitch of the adjacent rear electrodes 31 and 31 is, for example, about 20 mm to 40 mm.
  • each rear electrode 31 is a surface 31 a facing the second roll electrode 12.
  • the facing surface 31a is a flat surface.
  • a solid dielectric 32 is provided on the facing surface 31a.
  • the solid dielectric 32 is configured by a flat plate made of ceramic such as alumina, but may be a film coated on the opposing surface 31a by thermal spraying or the like.
  • the solid dielectric 32 is not limited to ceramic but may be other dielectrics such as resin.
  • a reactivation power supply 38 is connected to each post-stage electrode 31.
  • the power supply 38 supplies, for example, pulsed power to each electrode 31.
  • an electric field is applied between the grounded second roll electrode 12 and each subsequent electrode 31 to generate a plasma discharge near atmospheric pressure.
  • a space between the solid dielectric 32 and the second roll electrode 12 of each rear electrode 31 becomes a re-discharge space 39 near atmospheric pressure.
  • the second roll electrode 12 is provided as the other rear electrode that is paired with the rear electrode 31 in the reactivation unit 30.
  • one second roll electrode 12 is paired with a plurality of electrodes 31, 31.
  • the opposing surface 31a of one rear electrode 31 constituting the reactivation unit 30 is a flat surface, and the opposing surface of the other rear electrode 12 is a convex cylindrical surface. Therefore, the path length along the circumferential direction of the electrode 12 in each redischarge space 39 is larger than the path length of the main discharge space 19. Therefore, the total path length of the plurality of redischarge spaces 39 of the reactivation unit 30 is larger than the path length of the main discharge space 19.
  • the power supplied to the reactivation unit 30 is larger than the power supplied to the main processing unit 10.
  • the power supplied to the reactivation unit 30 refers to the total power supplied to the plurality of electrodes 31 and 31.
  • the power supplied to the reactivation unit 30 is, for example, 1.5 to 2.0 times the power supplied to the main processing unit 10.
  • a gas supply unit 33 is connected to each re-discharge space 39.
  • the gas supply unit 33 supplies the discharge generated gas to the redischarge space 39.
  • the gas supply unit 33 includes a rectification unit and a nozzle.
  • the nozzle of the supply unit 33 faces the re-discharge space 39 and extends in the processing width direction.
  • the discharge generated gas is made uniform in the processing width direction by the rectifying unit of the supply unit 33 and then blown out from the nozzle to the re-discharge space 39.
  • the discharge flow of the discharge product gas is uniformly distributed in the processing width direction.
  • Nitrogen (N 2 ) is used as the discharge product gas of the gas supply unit 33.
  • An inert gas other than nitrogen for example, a rare gas such as Ar or He
  • the discharge generated gas of the gas supply unit 33 does not contain a polymerizable monomer.
  • the discharge generated gas supply source of the gas supply unit 33 may be shared with the discharge generated gas supply source of the nozzles 21 and 22.
  • a supply path extending from one discharge generation gas supply source may be branched and connected to the nozzles 21 and 22 and the gas supply unit 33.
  • a method for surface-treating the film 9 to be processed by the film surface treatment apparatus 1 having the above configuration will be described.
  • the film to be treated 9 is wound around the roll electrodes 11 and 12.
  • the roll electrodes 11 and 12 are rotated clockwise in FIG. 1, and the film 9 to be processed is conveyed substantially rightward in FIG.
  • a reactive gas (acrylic acid + N 2 ) is introduced from the supply source 20 into the nozzle 23 and blown out from the nozzle 23 into the shielding space 41. This reaction gas comes into contact with the film to be processed 9 on the upper peripheral surface of the first roll electrode 11, and acrylic acid (reaction component) in the reaction gas is condensed and adheres to the film to be processed 9.
  • the shielding member 40 can confine the reaction gas in the shielding space 41 and can prevent or suppress the leakage of acrylic acid into the external atmosphere. As a result, the opportunity for acrylic acid to contact the film 9 to be processed can be increased, and acrylic acid can be reliably attached to the film 9 to be processed. In addition, atmospheric gas containing oxygen such as external air can be prevented from entering the shielded space 41.
  • the portion of the film 9 to which the acrylic acid adheres is introduced into the main discharge space 19 by the conveyance of the film 9 to be processed.
  • a discharge generated gas (N 2 ) is supplied to the main discharge space 19 from the nozzle 21 or 22.
  • power is supplied to the electrode 11 to generate an atmospheric pressure plasma discharge in the main discharge space 19.
  • the nitrogen of the discharge product gas is turned into plasma and nitrogen plasma is generated.
  • the nitrogen plasma or plasma light is irradiated to the film 9 to be processed, and the bonds such as CC, C—O, and C—H of the surface molecules of the film 9 are cut.
  • the acrylic acid on the surface of the film to be processed 9 is activated by the plasma, the double bond is cleaved, polymerized, etc., and the polymer of acrylic acid is bonded to the bond cutting part of the film to be processed 9 (graft polymerization).
  • graft polymerization it is considered that a COOH group decomposed from acrylic acid is bonded.
  • an adhesion promoting layer is formed on the surface of the film 9 to be processed. Since the shielding member 40 can prevent the outside atmosphere from entering, the reaction in the main discharge space 19 can be prevented or suppressed by oxygen in the outside atmosphere.
  • the film 9 to be processed passes through the main discharge space 19 in contact with the first roll electrode 11, is turned back by the guide roll 16, and passes through the main discharge space 19 again in contact with the second roll electrode 12. Therefore, the film to be processed 9 is processed twice in the main discharge space 19.
  • the film 9 to be processed moves in the circumferential direction of the second roll electrode 12 and is introduced into the redischarge space 39 of the reactivation unit 30.
  • a discharge generated gas (N 2 ) is supplied from the gas supply unit 33 to the re-discharge space 39.
  • power is supplied to the electrode 31 to generate an atmospheric pressure plasma discharge in the redischarge space 39.
  • nitrogen in the discharge generated gas is turned into plasma in the redischarge space 39 to generate nitrogen plasma.
  • the bond molecules such as C—C—C—O—C—H, etc. of the surface molecules of the film to be processed 9 again occur.
  • unpolymerized acrylic acid on the surface of the film 9 to be processed and acrylic acid having a low degree of polymerization are activated, and polymerization proceeds. It is considered that this polymer of acrylic acid is bonded (graft polymerization) to the bond cutting portion of the film 9 to be processed, or a COOH group decomposed from acrylic acid is bonded.
  • the film to be processed 9 and the acrylic acid on the surface thereof can be exposed to the plasma for a longer time than the main discharge space 19.
  • Sufficient energy can be imparted to the surface molecules and acrylic acid. Thereby, it can fully polymerize without remaining acrylic acid, and can form an adhesion promotion layer on the surface of the to-be-processed film 9 reliably. Accordingly, it is possible to prevent an acetic acid-like odor peculiar to acrylic acid from being processed.
  • the film to be processed 9 and the PVA film can be reliably bonded with the water-based adhesive, and an unbonded portion can be prevented from being formed. Therefore, a polarizing plate having good adhesive strength can be manufactured.
  • the film 9 to be processed covers the roll electrodes 11 and 12, particularly the portions that define the discharge space 19, it is possible to prevent the electrodes 11 and 12 from being contaminated. Further, since acrylic acid (reaction component) is not supplied to the reactivation unit 30, contamination of the electrode 31 can be prevented or suppressed. Accordingly, generation of particles can be prevented or suppressed, and the yield can be improved.
  • the second roll electrode 12 as an electrode element of the reactivation unit 30, the number of parts can be reduced and the device configuration can be simplified.
  • one roll electrode 12 is paired with a plurality of subsequent electrodes 31, 31, the number of parts can be further reduced, and the device configuration can be further simplified. Since the number of roll electrodes in the entire film surface treatment apparatus 1 is two and the electrode 31 can be composed of a metal flat plate or the like, an increase in manufacturing cost of the film surface treatment apparatus 1 can be suppressed.
  • FIG. 3 shows a film surface treatment apparatus 1A according to the second embodiment of the present invention.
  • the film surface treatment apparatus 1A of the second embodiment is different from the film surface treatment apparatus 1 (FIG. 1) of the first embodiment in that the reaction gas nozzle 23 and the shielding member 40 of the main processing unit 10 are omitted.
  • a reactive gas supply source 20 is connected to the upper nozzle 21.
  • the reactive gas supply source 20 may be connected to the lower nozzle 22 instead of the upper nozzle 21, or may be connected to both the upper nozzle 21 and the lower nozzle 22.
  • the reaction gas (acrylic acid AA + N 2 ) is sent from the supply source 20 to the nozzle 21 and blown out from the nozzle 21 into the main discharge space 19. Therefore, the acrylic acid is sprayed onto the film 9 to be treated and the polymerization reaction is performed almost simultaneously, and an adhesion promoting layer is formed.
  • the carrier gas (N 2 ) in the reaction gas also serves as a discharge product gas and is converted into plasma in the main discharge space 19, thereby contributing to the formation of the adhesion promoting layer.
  • FIG. 4 shows a film surface treatment apparatus 1B according to the third embodiment of the present invention.
  • the film surface treatment apparatus 1B includes three roll electrodes 11, 12, and 34 as a whole. Three roll electrodes 11, 12, and 34 are arranged in a line in this order. A film to be processed 9 is wound around these roll electrodes 11, 12 and 34.
  • the electrode rotation mechanism is connected to the third roll electrode 34 in addition to the first and second roll electrodes 11 and 12.
  • the three roll electrodes 11, 12, and 34 rotate in synchronization with each other, and the film 9 to be processed is conveyed rightward in FIG. 4 in the order of the first roll electrode 11, the second roll electrode 12, and the third roll electrode 34.
  • the power source 18 is connected not to the first roll electrode 11 but to the central second roll electrode 12.
  • the first roll electrode 11 and the third roll electrode 34 are electrically grounded. Therefore, the ground electrode 11, the hot electrode 12, and the ground electrode 34 are arranged in this order along the transport direction of the film 9 to be processed.
  • a main discharge space 19 is formed between the first and second roll electrodes 11 and 12. Furthermore, a discharge space is also formed between the second roll electrode 12 and the third roll electrode 34.
  • a discharge generated gas such as nitrogen may be supplied also to the discharge space between the electrodes 12 and 34.
  • the third roll electrode 34 constitutes the other rear electrode paired with the rear electrode 31 in the reactivation unit 30.
  • One or a plurality of (two in the figure) rear electrodes 31 are disposed above the roll electrode 34 instead of the second roll electrode 12.
  • a facing surface 31 a forming a flat surface of each electrode 31 faces a circumferential surface forming a convex cylindrical surface of the roll electrode 34.
  • a redischarge space 39 is formed between each electrode 31 and the roll electrode 34.
  • the discharge between the second and third roll electrodes 12 and 34 is performed.
  • Plasma treatment can be performed again in the space.
  • the to-be-processed film 9 can be introduce
  • acrylic acid can be more fully polymerized and an adhesion promoting layer can be reliably formed. Since the to-be-processed film 9 has covered all (three) roll electrodes 11, 12, and 34, it can prevent that these electrodes 11, 12, and 34 become dirty.
  • FIG. 5 shows a film surface treatment apparatus 1C according to the fourth embodiment of the present invention.
  • a light energy irradiation unit 50 is provided as a reactivation unit subsequent to the main processing unit 10 in place of the plasma processing unit 30.
  • the light energy irradiation means 50 is constituted by an infrared lamp or an ultraviolet lamp.
  • the light energy irradiation means 50 is arranged to face the film 9 to be processed on the downstream side in the transport direction from the second roll electrode 12.
  • the light emitting part of the light energy irradiation means 50 extends in the processing width direction (direction orthogonal to the paper surface of FIG. 5) for substantially the same length as the film 9.
  • the light energy irradiation means 50 may be disposed so as to face the peripheral surface of the second roll electrode 12.
  • the infrared light or ultraviolet light 51 (light energy) from the light energy irradiation means 50 is irradiated almost uniformly in the processing width direction on the film 9 after passing through the main processing portion 10. Thereby, energy can be provided again to the surface molecules of the film to be processed 9 and acrylic acid, and the polymerization reaction of acrylic acid can be caused again.
  • acrylic acid can be sufficiently polymerized to reliably form the adhesion promoting layer on the surface of the film 9 to be processed, and the adhesion can be improved.
  • the number of the rear electrodes 31 of the reactivation unit 30 may be one or may be three or more.
  • the electrode structure of the reactivation unit 30 may be such that the path length of the redischarge space 39 is longer than the path length of the discharge space 19 of the electrodes 11 and 12 with the convex cylindrical surfaces of the main processing unit 10 facing each other. It is not limited to the combination of the electrode 31 and the electrodes 12 and 34 in which the plane and the convex cylindrical surface are opposed to each other.
  • the reactivation part 30 may be comprised with the parallel plate electrode with which both electrodes 35 and 35 made plane 35a, 35a and each face each other.
  • the film to be processed 9 is passed between the electrodes 35 and 35.
  • the opposing surface of one electrode 36 of the reactivation unit 30 may be a concave cylindrical surface 36a, and the opposing surface of the other electrode 37 may be a convex cylindrical surface 37a.
  • the electrode 37 is preferably composed of a roll electrode.
  • the film to be processed 9 is wound around the electrode 37.
  • a concave cylindrical surface electrode 36 may be used instead of the flat plate electrode 31.
  • the reactivation unit may include a plasma processing unit 30 including a pair of electrodes and a light energy irradiation unit 50.
  • the present invention is not limited to the surface treatment of the protective film for a polarizing plate, but can be applied to the surface treatment of various resin films. Furthermore, the present invention is not limited to the plasma polymerization treatment of polymerizable monomers, but can be applied to various plasma surface treatments such as plasma CVD, plasma cleaning, and plasma surface modification. In these various plasma surface treatments, a sufficient degree of treatment can be obtained, dirt can be prevented from adhering to the roll electrodes 11 and 12 of the main treatment unit 10, and the electrode 31 of the reactivation unit 30 and the like. Can be suppressed or prevented from being contaminated by the reaction component, and as a result, generation of particles can be prevented and yield can be improved.
  • the reaction component of the reaction gas is appropriately selected according to the processing content. For example, as a reaction component used in plasma CVD, TMOS (tetramethoxysilane), TEOS (tetraethoxysilane), and the like can be given.
  • Example 1 using the film surface treatment apparatus 1 shown in FIG. 1, following the plasma treatment by the main treatment unit 10, re-plasma treatment by the reactivation unit 30 was performed.
  • a TAC film was used as the film 9 to be processed.
  • the width of the TAC film 9 was 330 mm.
  • the conveyance speed of the TAC film 9 was 15 m / min.
  • the temperature of the electrodes 11 and 12, and thus the temperature of the TAC film 9, was set to 25 ° C.
  • Acrylic acid was used as the polymerizable monomer for the reaction gas, and nitrogen was used as the carrier gas.
  • the temperature of the liquid acrylic acid in the vaporizer 20 was set to 70 ° C.
  • the discharge generated gas (N 2 ) was blown out only from the lower nozzle 22 among the upper and lower nozzles 21, 22 and supplied to the main discharge space 19.
  • the gas blowing width of the nozzle 22 was 325 mm.
  • the N 2 supply flow rate from the nozzle 22 was 20 slm.
  • the diameter of each roll electrode 11 and 12 was 320 mm.
  • the axial length of each roll electrode 11 and 12 was 340 mm.
  • the gap (the thickness of the main discharge space 19) at the narrowest portion between the roll electrodes 11 and 12 was 1 mm.
  • the power supplied to the electrode 11 was 1100W.
  • each post-stage electrode 31 in the processing width direction was 340 mm.
  • latter stage electrode 31 was 20 mm.
  • the distance between the lower surface 31a of each electrode 31 and the outer peripheral surface of the second roll electrode 12 was 1 mm.
  • the thickness of the solid dielectric 32 was 1 mm.
  • the power supplied to each electrode 31 was 600W. Therefore, the total supply power of the two electrodes 31 was 1200 W.
  • the supply flow rate of the discharge generated gas (N 2 ) to each redischarge space 39 was 20.0 L / min.
  • the TAC film after the surface treatment did not have an acetic acid odor peculiar to acrylic acid.
  • pH 7.
  • a pH meter manufactured by Testo Co., Ltd., model number TETO230 was used for pH measurement. The above pH measurement results indicate that almost no acrylic acid remains as a monomer on the surface of the TAC film, and the polymerization reaction has been sufficiently performed.
  • the to-be-treated TAC film 9 after the surface treatment was bonded to one side of the PVA film.
  • an aqueous solution obtained by mixing (A) a 5 wt% PVA aqueous solution with a polymerization degree of 500 and (B) a 2 wt% aqueous sodium carboxymethylcellulose solution was used.
  • the adhesive was dried at 80 ° C. for 5 minutes.
  • a saponified TAC film was bonded to the opposite surface of the PVA film with the same adhesive as described above. Thereby, a polarizing plate sample having a three-layer structure was produced.
  • the width of the polarizing plate sample was 25 mm.
  • the adhesive strength between the treated TAC film 9 and the PVA film was measured by the floating roller method (JIS K6854). As a result of the measurement, the adhesive strength was 9.8 N / 25 mm.
  • Example 1 a polarizing plate sample was produced and the adhesive strength was measured. As a result of the measurement, the adhesive strength was 8.5 N / 25 mm. According to the present invention, by providing the reactivation part 30 and performing the replasma treatment, it was possible to increase the adhesive strength by 1 N / 25 mm or more compared to the case where the replasma treatment was not performed (Comparative Example 1).
  • Example 2 the film surface treatment apparatus 1 ⁇ / b> C shown in FIG. 5 was used, and light irradiation by the light energy irradiation means 50 was performed following the plasma processing by the main processing unit 10.
  • the plasma processing conditions in the main processing unit 10 are the same as those in the first embodiment.
  • an infrared lamp manufactured by Hybek, model number HYP45
  • the distance between the light exit surface of the light energy irradiation means 50 and the TAC film 9 was 10 mm.
  • the wavelength of the irradiation light from the light energy irradiation means 50 was 0.8 ⁇ m, and the illuminance was 15 W / cm 2 .
  • the TAC film after the surface treatment did not give an acetic acid odor peculiar to acrylic acid.
  • a sample was prepared and the adhesive strength was measured. As a result of the measurement, the adhesive strength was 9.5 N / 25 mm.
  • the present invention is applicable, for example, to the manufacture of flat panel display (FPD) polarizing plates and various semiconductor devices.
  • FPD flat panel display

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  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
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  • Chemical Kinetics & Catalysis (AREA)
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Abstract

L'appareil pour le traitement de surface des films selon l'invention fait suffisamment réagir les composants réactionnels et empêche la contamination d'adhérer aux électrodes pendant le traitement de surface d'un film en cours de traitement par activation d'un gaz réactionnel contenant les composants réactionnels. Un film (9) en cours de traitement est sous la forme d'un enroulement autour d'une première électrode rouleau (11) et d'une seconde électrode rouleau (12) dans une section de traitement principal (10). Le film (9) en cours de traitement est déplacé de l'électrode (11) à l'électrode (12) par rotation des électrodes rouleaux (11, 12). Le gaz réactionnel est insufflé sur le film (9) à partir d'une buse (23) qui se trouve côté amont dans le sens du déplacement par rapport à un espace de décharge principal (19) qui se trouve entre les électrodes (11, 12) ou dans l'espace de décharge (19). Une section de réactivation (30) est prévue en aval dans le sens du déplacement par rapport à la section de traitement principal (10). De préférence, l'électrode de dernier étage (31) de la section de réactivation (30) est en regard de la seconde électrode rouleau (12), et la seconde électrode rouleau (12) est également utilisée comme autre électrode de dernier étage pour la section de réactivation (30). Le gaz produisant la décharge et qui ne contient pas de composants réactionnels est injecté entre les électrodes (31, 12) par une section d'alimentation en gaz (33).
PCT/JP2011/056950 2010-03-24 2011-03-23 Appareil pour le traitement de surface des films WO2011118619A1 (fr)

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CN201180015223XA CN102812073B (zh) 2010-03-24 2011-03-23 膜表面处理装置
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Cited By (3)

* Cited by examiner, † Cited by third party
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WO2017115614A1 (fr) * 2015-12-28 2017-07-06 住友化学株式会社 Procédé de fabrication d'élément optique avec film en résine
JP2017120313A (ja) * 2015-12-28 2017-07-06 住友化学株式会社 樹脂フィルム付光学部材の製造方法
JP2017120328A (ja) * 2015-12-28 2017-07-06 住友化学株式会社 樹脂フィルム付光学部材の製造方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6183870B1 (ja) * 2016-05-31 2017-08-23 春日電機株式会社 表面改質装置
JP6403227B2 (ja) * 2016-11-18 2018-10-10 日東電工株式会社 光学フィルムの活性化処理方法および製造方法、光学フィルムならびに画像表示装置
JP6581269B2 (ja) * 2018-09-25 2019-09-25 日東電工株式会社 光学フィルムの活性化処理方法および製造方法、光学フィルムならびに画像表示装置
CN109967019A (zh) * 2019-04-19 2019-07-05 华东理工大学 一种颗粒干法连续表面改性反应器
JP2019215574A (ja) * 2019-08-29 2019-12-19 日東電工株式会社 光学フィルムの活性化処理方法および製造方法、光学フィルムならびに画像表示装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09241409A (ja) * 1996-03-04 1997-09-16 Sekisui Chem Co Ltd プラズマを利用した表面処理方法
JP2000080184A (ja) * 1998-06-26 2000-03-21 Dainippon Printing Co Ltd フィルムシ―トの多段階表面改質方法及びその装置
WO2009008284A1 (fr) * 2007-07-09 2009-01-15 Sekisui Chemical Co., Ltd. Procédé pour traiter une surface de film, procédé pour produire une plaque de polarisation, et appareil de traitement de surface
JP2009035724A (ja) * 2007-07-12 2009-02-19 Sekisui Chem Co Ltd プラズマ処理方法及び装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2330496Y (zh) * 1998-07-27 1999-07-28 北京理工大学 塑料薄膜等离子体表面改性装置
JP2009543862A (ja) * 2006-07-14 2009-12-10 ザ リージェンツ オブ ザ ユニバーシティ オブ カリフォルニア ガンのバイオマーカーおよびその使用方法
CN101583233A (zh) * 2009-03-24 2009-11-18 新奥光伏能源有限公司 一种常压等离子体装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09241409A (ja) * 1996-03-04 1997-09-16 Sekisui Chem Co Ltd プラズマを利用した表面処理方法
JP2000080184A (ja) * 1998-06-26 2000-03-21 Dainippon Printing Co Ltd フィルムシ―トの多段階表面改質方法及びその装置
WO2009008284A1 (fr) * 2007-07-09 2009-01-15 Sekisui Chemical Co., Ltd. Procédé pour traiter une surface de film, procédé pour produire une plaque de polarisation, et appareil de traitement de surface
JP2009035724A (ja) * 2007-07-12 2009-02-19 Sekisui Chem Co Ltd プラズマ処理方法及び装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017115614A1 (fr) * 2015-12-28 2017-07-06 住友化学株式会社 Procédé de fabrication d'élément optique avec film en résine
JP2017120313A (ja) * 2015-12-28 2017-07-06 住友化学株式会社 樹脂フィルム付光学部材の製造方法
WO2017115615A1 (fr) * 2015-12-28 2017-07-06 住友化学株式会社 Procédé de fabrication d'élément optique avec film en résine
JP2017120328A (ja) * 2015-12-28 2017-07-06 住友化学株式会社 樹脂フィルム付光学部材の製造方法
WO2017115613A1 (fr) * 2015-12-28 2017-07-06 住友化学株式会社 Procédé de fabrication d'élément optique avec film en résine

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KR20120128163A (ko) 2012-11-26
CN102812073B (zh) 2013-10-09
TWI435123B (zh) 2014-04-21
TW201202760A (en) 2012-01-16
KR101257655B1 (ko) 2013-04-29
CN102812073A (zh) 2012-12-05
JP2011201079A (ja) 2011-10-13

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