WO2011118005A1 - Transfer apparatus and method, and computer program - Google Patents

Transfer apparatus and method, and computer program Download PDF

Info

Publication number
WO2011118005A1
WO2011118005A1 PCT/JP2010/055248 JP2010055248W WO2011118005A1 WO 2011118005 A1 WO2011118005 A1 WO 2011118005A1 JP 2010055248 W JP2010055248 W JP 2010055248W WO 2011118005 A1 WO2011118005 A1 WO 2011118005A1
Authority
WO
WIPO (PCT)
Prior art keywords
transfer
support
mold
support means
force
Prior art date
Application number
PCT/JP2010/055248
Other languages
French (fr)
Japanese (ja)
Inventor
正 藤縄
孝幸 糟谷
房男 原川
Original Assignee
パイオニア株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by パイオニア株式会社 filed Critical パイオニア株式会社
Priority to PCT/JP2010/055248 priority Critical patent/WO2011118005A1/en
Publication of WO2011118005A1 publication Critical patent/WO2011118005A1/en

Links

Images

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/855Coating only part of a support with a magnetic layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/12Moulds or cores; Details thereof or accessories therefor with incorporated means for positioning inserts, e.g. labels
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0827Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B29C2059/023Microembossing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C37/00Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
    • B29C37/0003Discharging moulded articles from the mould
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/263Preparing and using a stamper, e.g. pressing or injection molding substrates

Definitions

  • the present invention relates to a technical field of a transfer apparatus, a transfer method, and a computer program that transfer a concavo-convex pattern onto a surface of a transfer target by pressing a mold having a concavo-convex pattern on the surface of the transfer target.
  • Patent Documents 1 to 3 each disclose a transfer device capable of realizing such double-sided transfer.
  • the transfer target is held from below by a support member fixed to the transfer device, and can be sandwiched by two molds.
  • the two-sided transfer of the pattern can be performed by pressing the object to be transferred held by the support member from the upper side and the lower side and then pressing it so as to be sandwiched. Thereafter, by separating the mold from the transfer target to the upper side and the lower side, so-called mold release is performed, and the transfer operation is completed.
  • the transfer target is simply held by the support member from the lower side, the transfer target is damaged by a pressing force applied from the mold when the mold is pressed or released. May occur.
  • the present invention has been made in view of the above-described technical problems, and provides a transfer apparatus and method, and a computer program that can realize suitable holding of a transferred object without causing distortion or the like. Is an issue.
  • a first transfer device of the present invention is a transfer device that transfers a pattern formed on a mold to a transfer target, and supports the transfer target from a first direction. A force applied to the transfer body from a second direction different from the first direction with respect to the support body and the transfer body supported by the first support means; The second support means for fixing the first support means to the first support means, and the fixing means for fixing the position of the first support means while the second support means applies a force to the transfer target.
  • the second transfer apparatus of the present invention transfers the pattern formed on the first mold to the first surface of the transfer target, and the pattern formed on the second mold
  • a transfer device for transferring to a second surface of a transfer object the transfer object holding means for holding the transfer object, a first support means for supporting the transfer object from a first direction, A force is applied to the transferred object from a second direction different from the first direction with respect to the transferred object supported by the first supporting means, thereby to move the transferred object to the first supporting means.
  • a fixing means for fixing the position of the first support means while the second support means applies a force to the transfer target.
  • a third transfer device of the present invention is a transfer device that operates in accordance with an instruction from a control device and transfers a pattern formed on a mold to a transfer target.
  • a first support means for supporting the object to be transferred from a first direction and to the object to be transferred supported by the first support means in accordance with an instruction from the control device , Applying a force to the transferred body from a second direction different from the first direction to fix the transferred body to the first supporting means, and following the instructions of the control device
  • the second support means includes a fixing means for fixing the position of the first support means while applying a force to the transfer target.
  • a first transfer method of the present invention is a transfer method in a transfer apparatus that transfers a pattern formed on a mold to a transfer target, and the first transfer means is used to transfer the pattern to the transfer target.
  • the first support step for supporting the transfer body from the first direction and the transfer target body supported by the first support means from the second direction different from the first direction.
  • a second supporting step for fixing the transferred body to the first supporting means by applying a force to the first supporting means, and during applying a force to the transferred body in the second supporting step, A fixing step of fixing the position.
  • the second transfer method of the present invention transfers the pattern formed on the first mold to the first surface of the transfer object, and the pattern formed on the second mold
  • the transfer target is fixed to the first support unit by applying a force to the transfer target from a second direction different from the first direction with respect to the transfer target supported by the unit.
  • a computer program of the present invention is a computer program for operating a transfer device that transfers a pattern formed on a mold to a transfer target, using a first support means, and A first support step for supporting the transfer object from a first direction and the transfer object supported by the first support means from a second direction different from the first direction.
  • a fixing step of fixing the position of the transfer device is a computer program for operating a transfer device that transfers a pattern formed on a mold to a transfer target, using a first support means, and A first support step for supporting the transfer object from a first direction and the transfer object supported by the first support means from a second direction different from the first direction.
  • FIG. 6 is a schematic diagram showing the operation of each part of the imprint apparatus in a transfer operation.
  • FIG. 6 is a schematic diagram showing the operation of each part of the imprint apparatus in a transfer operation.
  • 1st Embodiment which concerns on the transfer apparatus of this invention is a transfer apparatus which transfers the pattern formed in the mold to a to-be-transferred body, Comprising: The 1st support means which supports the said to-be-transferred body from a 1st direction, A force is applied to the transfer object from a second direction different from the first direction with respect to the transfer object supported by the first support means, thereby supporting the transfer object to the first support. Second support means for fixing to the means, and fixing means for fixing the position of the first support means while the second support means applies a force to the transfer target.
  • a mold which is an imprint mold having a pattern formed on the surface thereof, is pressed against the transfer target, so that the pattern on the mold surface is applied to the transfer target. Transcribed.
  • the first support means supports the object to be transferred from the first direction, and the second support means presses the object to be transferred from the second direction, whereby the object to be transferred is held.
  • the “first direction” is intended to indicate that it is arranged in a predetermined direction which is the “first direction” with respect to the transfer object. That is, the first support means is configured to approach the transfer target from the first direction and to contact and press the transfer target.
  • the “first direction” is a vertically downward direction with respect to the transfer target.
  • the “second direction” is intended to indicate a direction different from the first direction when viewed from the transfer target.
  • the transferred body is fixed to the first supporting means by exerting a force on the transferred body from the second direction while the second supporting means is in contact with the transferred body.
  • the second support unit is configured to press the transfer target member in the first support unit direction from a second direction that is opposite to the first direction in which the first support unit supports the transfer target member.
  • the transferred object is fixed to the first support means.
  • the position of the first support means is fixed by the operation of the fixing means at least while the second support means applies a force to the transfer target in this way.
  • the fixing means includes a servo unit including a position sensor that detects the position of the first support means and an actuator that moves the first support means, and fixes the position so that the first support means does not move.
  • Such an operation of the fixing means not only does the first support means not move so that the position of the first support means changes, but also suppresses a change in position due to an external force applied to the first support means.
  • an external force applied to the first support means for example, as described in detail later, there is a force applied by the second support means to the transfer target.
  • the fixing unit fixes the position of the first support unit, so that the transfer target simultaneously applies the force from a plurality of directions. By receiving it, it is possible to suppress an excessively strong force from acting.
  • the thickness that is, the first support means and the second support means It is possible to always realize holding with an appropriate pressing force even for a transfer object having different thicknesses in the sandwiching direction.
  • the fixing means is arranged such that the position of the first support means is such that the first support means does not move due to the force applied by the second support means. Fix it.
  • the fixing means fixes the position of the first support means so that the first support means does not move by the force applied from the second support means to the first support means via the transfer target.
  • the fixing means holds the first support means with a stronger force than the force applied from the second support means to the first support means via the transfer medium, thereby suppressing the movement of the first support means.
  • the fixing means has the same strength as the force applied from the second support means to the first support means via the transfer target, and the force in the direction from the first support means toward the transfer target is the first.
  • the first support means may be fixed by adding to the support means.
  • the first support means is prevented from being pushed and moved by the second support means, and the object to be held is held as the first support means and the second support means move. It can suppress suitably that a transfer body moves. For this reason, it is possible to suitably prevent the transfer from being performed during the transfer operation or the release operation so that appropriate transfer cannot be performed.
  • the first direction and the second direction are opposite to each other.
  • the object to be transferred supported by the first support means is pressed in the direction of the first support means by the second support means, so that the object to be transferred can be held and a suitable holding can be realized. For this reason, it is possible to hold the transfer object firmly with a relatively simple configuration.
  • the transfer target is a disk substrate having a through hole
  • the first support means is configured to provide the through hole on one surface of the disk substrate.
  • the second support means applies a force at the peripheral portion of the through hole on the other surface of the disk substrate in contact with the peripheral portion to support the transferred object.
  • the first support means and the second support means make contact with and support the peripheral portion of the through hole formed in the transfer body to hold the transfer body.
  • the through-hole is an opening formed continuously from one surface of the transfer target to the other surface on the opposite side.
  • the first support means is configured such that the first support means supports the peripheral portion of the through hole on one surface, and the second support means is the first support means from the peripheral portion of the through hole on the opposite surface.
  • the object to be transferred is held by pressing in the direction. For this reason, it is possible to hold the transfer object firmly with a relatively simple configuration.
  • the transfer device further includes a first drive unit that moves the first support unit, and a second drive unit that moves the second support unit.
  • the second driving unit moves the second support unit in the direction of the transfer target, thereby pressing the transfer target against the first support and fixing the transfer target to the first support.
  • the first supporting means moved by the first driving means supports the transfer target body from the first direction
  • the second supporting means moved by the second driving means is covered by the second direction.
  • the first driving means of this aspect includes an actuator configured to move the first support means
  • the second driving means includes an actuator configured to move the second support means in the same manner. It is the composition which includes.
  • the position of the first support means moved by the first drive means is fixed, The fixing is performed by pressing the transfer medium against the first support means by the second support means moved by the two drive means.
  • the force applied to the transfer object is basically due to the second driving means, and it is possible to suitably suppress the transfer object from being distorted or damaged by the action of excessive force.
  • the first driving means includes a braking unit for braking the operation of the first driving means itself or the operation of the first supporting means moved by the first driving means, and fixing the first supporting means. May be.
  • a braking unit is, for example, an electromagnetic brake or the like provided in the actuator of the first drive means, and applies a frictional force to the rotor in the actuator in response to the supply of current to brake the actuator drive.
  • Support means is fixed.
  • the second driving means may include a control unit for controlling the force applied by the second support means to the transfer target.
  • a control part controls the rotational torque of the actuator of the 2nd drive means by adjusting the electric current supplied to the actuator of the 2nd drive means, for example, and controls the force which a 2nd support means applies.
  • each of the first driving unit and the second driving unit in this aspect is not limited to the configuration as long as the various operations described above can be realized, and may have a configuration other than the above, and any known It may be configured as follows.
  • the transfer device further includes control means for controlling the force applied to the transfer target by the second support means.
  • control unit controls the force applied by the second support unit to the transfer target so that it typically does not exceed a preset threshold value.
  • the first support means whose position is fixed in the first direction is arranged, and the object to be transferred is transferred by the second support means in which the pressing force is appropriately adjusted from the direction opposite to the first direction. By pressing the body, the object to be transferred can be held by being sandwiched.
  • the force that the second support means applies to the transfer target is preferably capable of holding the transfer target sufficiently and being held between the first support and the second support. It is set to such an extent that distortion and damage do not occur on the transfer body. Therefore, the threshold value that is the upper limit of such force is set with a sufficient margin for the upper limit force that causes distortion or damage to the transferred body, at least according to the characteristics of the material and structure of the transferred body. It is preferable.
  • control means controls the position of the second support means so that the second support means approaches a predetermined distance from the transfer target. And after the second support means approaches the predetermined distance, control of the pressing force of the second support means is started.
  • control means is configured such that the force that the second support means applies to the transferred body until the second support means approaches a predetermined distance from the transferred body (in other words, the second support means is transferred to the transferred body). Do not start control of thrust to move in the body direction. Therefore, the control unit controls the movement of the second support unit by, for example, position control based on the position of the second support unit until the second support unit approaches a predetermined distance from the transfer target.
  • the second support unit moves by position control of the control unit until it approaches the vicinity of the transfer target. Further, when approaching to a predetermined distance, the control unit controls the operation so that the force controlled as described above is applied to the second support unit.
  • the pattern formed on the first mold is transferred to the first surface of the transfer object, and the pattern formed on the second mold is transferred to the first surface of the transfer object.
  • a transfer device for transferring to the second surface a transfer object holding means for holding the transfer object, a first support means for supporting the transfer object from a first direction, and a first support means.
  • a second force fixing the transferred body to the first support means by applying a force to the transferred body from a second direction different from the first direction with respect to the supported transferred body.
  • the transfer apparatus of the present invention has means for holding two molds, a first mold holding means for holding the first mold and a second mold holding means for holding the second mold. .
  • the first mold was pressed against the first surface of the transferred body and the second mold was pressed against the second surface of the transferred body, thereby forming each mold.
  • Pattern transfer is performed on both sides of the transfer object.
  • each pressing may be performed in succession, or may be performed simultaneously.
  • the transfer object is sandwiched between the first mold and the second mold, and the transfer is performed simultaneously by pressing from both surfaces. You may do it.
  • the third embodiment according to the transfer device of the present invention is a transfer device that operates in accordance with an instruction from a control device and transfers a pattern formed on a mold to a transfer target, and in response to an instruction from the control device.
  • the first support means for supporting the transfer body from the first direction, and the first transfer means supported by the first support means in response to an instruction from the control device A second support means for fixing the transfer body to the first support means by applying a force to the transfer body from a second direction different from the direction; and the second support means according to an instruction from the control device.
  • a fixing unit that fixes the position of the first supporting unit while the supporting unit applies a force to the transfer target.
  • Embodiment which concerns on the transfer method of this invention is a transfer method in the transfer apparatus which transfers the pattern formed in the mold to a to-be-transferred body, Comprising:
  • the said to-be-transferred object is 1st using a 1st support means. Applying a force to the transferred object from a second direction different from the first direction with respect to the first supporting step of supporting from the first direction and the transferred object supported by the first supporting means.
  • the pattern formed on the first mold is transferred to the first surface of the transfer object, and the pattern formed on the second mold is transferred to the first surface of the transfer object.
  • a transfer method in a transfer device for transferring to a second surface wherein a first support step is used to support the transfer object from a first direction by using a first support means, and the first support means supports the transfer object.
  • An embodiment according to the computer program of the present invention is a computer program for operating a transfer device that transfers a pattern formed on a mold to a transfer object, and the transfer object is transferred using a first support means.
  • a force is applied to the transferred object from a second direction different from the first direction, with respect to the first supporting step of supporting from the first direction and the transferred object supported by the first supporting means.
  • the position of the first support means is fixed while a force is applied to the transfer object in the second support process, and a second support process for fixing the transfer object to the first support means.
  • a fixing process to be executed by the transfer device.
  • the computer program is read from a recording medium such as a ROM, a CD-ROM, a DVD-ROM, and a hard disk that stores the computer program, and executed. If the computer program is executed after being downloaded to a computer via communication means, the transfer device can execute the various operations in the above-described transfer method according to the present invention relatively easily.
  • the first embodiment, the second embodiment, and the third embodiment according to the transfer apparatus of the present invention include the first support means, the second support means, and the fixing means.
  • the first and second embodiments according to the transfer method of the present invention include a first support step, a second support step, and a fixing step.
  • the embodiment according to the computer program of the present invention causes the transfer apparatus to execute the first support process, the second support process, and the fixing process. Therefore, it is possible to appropriately adjust the holding mode so that various transfer materials having various thicknesses are not damaged.
  • FIG. 1 is a schematic diagram schematically showing a configuration of an imprint apparatus 1 used in a manufacturing process of a hard disk such as a discrete track medium (DTM) or a bit patterned medium (BPM), which is an embodiment of a transfer apparatus of the present invention.
  • DTM discrete track medium
  • BPM bit patterned medium
  • the imprint apparatus 1 shown in FIG. 1 is a UV-type transfer apparatus that transfers a pattern on a mold to a transfer target having a transfer layer that is cured by UV irradiation. Further, the imprint apparatus 1 uses the lower mold 200a and the upper mold 200b on which patterns such as unevenness to be transferred are formed, and the lower transfer layer 301a and the upper surface formed on the lower surface of the substrate 300 that is a transfer target. In this configuration, transfer is performed on both of the upper transfer layer 301b formed on the substrate.
  • FIG. 1 shows the imprint apparatus 1 in a state where the lower mold 200a, the upper mold 200b, and the substrate 300 are installed.
  • the lower mold 200a has a disk shape having a center hole in the center or a shape similar to the disk, and a pattern such as irregularities is formed near the center hole on the pattern surface.
  • a pattern area is constructed.
  • At least a portion corresponding to the pattern region of each mold is made of a material that transmits UV light, such as quartz glass, and is preferably hardly affected by a change in character due to irradiation with UV light.
  • the outside of the pattern area on the pattern surface is referred to as a non-pattern area.
  • the upper mold 200b has the same configuration as the lower mold 200a.
  • the pattern surface of the lower mold 200a and the upper mold 200b is subjected to a surface treatment for the purpose of improving mold releasability of the mold and the substrate at the time of mold release described later, for example, a surface treatment with a silane coupling agent or the like, A release layer having a thickness of a single molecule to several molecules is formed.
  • the lower mold 200a is a specific example of the “mold” or “second mold” of the present invention
  • the upper mold 200b is a specific example of the “mold” or “first mold” of the present invention. It is an example.
  • the substrate 300 has a disk shape having a center hole having a diameter smaller than that of the center hole of the mold at the center.
  • the lower transfer layer 301a and the upper transfer layer 301a made of a material that is cured by UV irradiation are formed on the lower and upper surfaces of the glass substrate.
  • the transfer layer 301b is applied.
  • the imprint apparatus 1 connects a lower mechanism part A including a lower base 110a, an upper mechanism part B including an upper base 110b, and the lower base 110a and the upper base 110b.
  • a ball screw 101 that rotates
  • an actuator 104 that rotates the ball screw
  • a control unit 102 that controls the operation of the lower mechanism unit A and the upper mechanism unit B
  • an operation unit that can input user instructions to the control unit 102 103.
  • the lower mechanism A is provided on the upper surface of the lower base 110a, and includes a lower center pin 120a, a lower UV irradiation unit 130a, a lower center pin driving unit 140a, a lower mounting table 150a, A side mold holding part 152a and a lower mold clamp 153a are provided. A plurality of lower mold clamps 153a are provided, and are arranged at positions shown in FIG.
  • the lower base 110a is a member on the board.
  • the lower base 110a is provided with a lower mounting table 150a and a lower opening 151a, and has a screw hole portion in which a screw groove into which the ball screw 101 is screwed is cut. .
  • the lower center pin 120a is a member that constitutes a specific example of the “transfer object holding unit” of the present invention, and includes a cylindrical tip portion 121a, a substrate support portion 122a, and a mold support portion 123a having different diameters. It is a member having.
  • the lower center pin 120a is connected to a lower center pin driving unit 140a, which will be described later, and penetrates a center hole and a lower opening 151a of the lower mounting table 150a, which will be described later. It is supported so as to be perpendicular to the surface Sa.
  • the diameter of the tip 121a of the lower center pin 120a is smaller than the diameter of the substrate support 122a and the center hole of the substrate 300 described later.
  • the diameter of the substrate support portion 122a is larger than the diameter of the center hole of the substrate 300, and smaller than the diameters of the center holes of the mold support portion 123a, the lower mold 200a and the upper mold 200b described later.
  • the diameter of the mold support part 123a is larger than the diameters of the center holes of the lower mold 200a and the upper mold 200b and smaller than the diameters of the center hole and the lower opening 151a of the lower mounting table 150a.
  • the lower UV irradiation unit 130a is electrically connected to the control unit 102 via a signal line (not shown), and the lower transfer layer 301a of the substrate 300 is applied in accordance with a control signal supplied from the control unit 102.
  • the lower transfer layer 301a of the substrate 300 is irradiated with UV light to be cured through the lower opening 151a and the UV light transmission region of the lower mounting table 150a described later.
  • the lower UV irradiation unit 130a may be configured to be retracted except when necessary, such as when UV light is irradiated in the transfer operation.
  • the lower center pin driving unit 140a constitutes a part of a specific example of the “transfer object holding unit” of the present invention in the lower mechanism unit A, and the lower center pin driving unit 140a corresponds to a lower control signal supplied from the controller 102.
  • the side center pin 120a is moved in the axial direction, that is, in a direction perpendicular to the lower mold holding surface Sa of the lower mounting table 150a.
  • the lower center pin driving unit 140a moves the lower center pin 120a vertically upward when releasing the lower mold 200a and the substrate 300 after a transfer operation described later.
  • the mold 200a is released from the mold 200a, and is also a specific example of "release means” or “second release means” in this embodiment.
  • the lower center pin driving unit 140a of the present embodiment includes a lower pressure sensor 141a.
  • the lower pressure sensor 141a is a specific example of “detecting means” in the lower mechanism portion A of the present embodiment, and detects the pressure applied to the lower center pin 120a connected to the lower center pin driving portion 140a. Then, the detected pressure information is transmitted to the control unit 102.
  • the pressure applied to the lower center pin 120a is, for example, a force that resists the upward movement of the lower center pin 120a in contact with the substrate 300 in close contact with the lower mold 200a. In other words, the pressure applied to the lower center pin 120a due to the force acting on the contact surface between the lower mold 200a and the substrate 300 is shown.
  • the lower mounting table 150a has a flat lower mold holding surface Sa for holding the lower mold 200a, and the lower mold holding surface Sa is provided with a center hole in the center portion, and a lower side. A mold holding part 152a and a lower mold clamp 153a are provided. Further, the lower mold holding surface Sa of the lower mounting table 150a is typically configured wider than the pattern area of the lower mold 200a. The lower mounting table 150a is configured to be capable of alignment adjustment in the direction of the lower mold holding surface Sa in order to align the lower mold 200a with the substrate 300.
  • the region corresponding to the region where the pattern of the lower mold 200a to be mounted is formed is transparent to UV light such as quartz glass, and has a phenotypic change by irradiation with UV light. This is a UV light transmission region made of a material that is difficult to generate.
  • the opening 151a of the lower base 110a is formed in a region corresponding to the UV light transmission region of the lower mounting table 150a.
  • the lower mold holding part 152a is a specific example of the "mold holding means” or “second mold holding means” of the present invention in the lower mechanism part A, and holds the lower mold 200a by vacuum suction or the like.
  • a suction portion 154a having a suction groove 155a and an elastic member 156a that supports the suction portion 154a.
  • FIG. 2B shows the lower mounting table 150a upward (more specifically, vertically upward with respect to the lower mold holding surface Sa.
  • the vertical upper direction or simply upward will be described.
  • It is a schematic diagram which shows arrangement
  • the suction portion 154a is a groove formed in a corresponding region of the lower mold holding surface Sa so as to perform suction at the outer peripheral edge portion of the lower mold 200a to be placed. Placed inside.
  • the suction portion 154a is preferably configured with, for example, a flexible resin member so as not to damage the lower mold 200a at the contact portion.
  • the suction groove 155a is configured to be able to suck the lower mold 200a to the suction portion 154a by reducing the atmospheric pressure in the groove by the operation of a decompression mechanism (not shown) such as a connected vacuum pump.
  • the elastic member 156a is disposed in a groove formed in the lower mold holding surface Sa and supports the suction portion 154a.
  • the elastic member 156a is configured to be able to bias an elastic force between the adsorbing portion 154a and the lower mounting table 150a by a member having elasticity such as a resin or a mechanical structure such as a spring. Due to the presence of the elastic member 156a, the suction portion 154a is pressed vertically downward by, for example, a lower mold clamp 153a to be described later, so that the force for pressing and the elastic force from the elastic member 156a are balanced. Moving.
  • the shape of the lower mold holding part 152a and the lower mounting table 150a is a shape suitable for deformation of the lower mold 200a described later, and such a shape will be described in detail later.
  • the lower mold clamp 153a is a specific example of the “mold holding unit” or the “second mold holding unit” of the present invention in the lower mechanism portion A, and the lower mold 200a on the lower mounting table 150a is placed on the lower mold clamp 153a.
  • a plurality of clamping mechanisms are provided on the outer peripheral edge portion further than the position to be provided.
  • the lower mold clamp 153a is configured to hold the lower mold 200a by pressing the non-pattern area of the lower mold 200a downward with pressure according to a control signal from the control unit 102. Further, the lower mold clamp 153a presses the lower mold 200a with a force stronger than the pressing force required to hold the lower mold 200a in accordance with a control signal from the control unit 102, thereby lowering the lower mold.
  • the lower mold 200a can be elastically deformed together with the elastic member 156a of the holding portion 152a.
  • the pressing force for holding the mold is described as holding force
  • the pressing force for deforming the mold is described as deformation force.
  • FIG. 2C is a schematic view of the lower mold clamp 153a in a state where the lower mold 200a is being pressed as viewed from the vertically upward direction, and further illustrates the arrangement position of the upper mold clamp 153b described later. It is a figure.
  • the lower mold clamp 153a is composed of a plurality of arc-shaped members arranged concentrically with the lower mold 200a in accordance with the disk shape in order to press the lower mold 200a.
  • the upper mold clamp 153b is also composed of a plurality of arc-shaped members arranged on the same circle. Further, as shown in FIG. 2C, the lower mold clamp 153a and the upper mold clamp 153b are configured such that respective arc-shaped fan-shaped members are mutually inserted and are parallel to the lower mold holding surface Sa. Even when projecting onto a surface, they are arranged so as not to overlap each other.
  • the upper mechanism B is provided on the lower surface of the upper base 110b, and includes an upper center pin 120b, an upper UV irradiation unit 130b, an upper center pin driving unit 140b, an upper mounting table 150b, an upper mold holding unit 152b, And an upper mold clamp 153b.
  • the upper base 110b is a member on the board, and is provided with an upper mounting table 150b and an upper opening 151b, and there is a screw hole portion in which a screw groove into which the ball screw 101 is screwed is cut.
  • the upper center pin 120b is a member that constitutes a specific example of the “transfer object holding unit” of the present invention, and has a cylindrical shape having a tip portion having a diameter similar to that of the substrate support portion 122a of the lower center pin 120a. It is a member.
  • the upper center pin 120b is connected to an upper center pin driving unit 140b, which will be described later, and penetrates a center hole and an upper opening 151b of the upper mounting table 150b, which will be described later. It is supported so as to be perpendicular to the mold holding surface Sb.
  • the upper UV irradiation unit 130b is electrically connected to the control unit 102 via a signal line (not shown) and the like, and the upper transfer layer 301b of the substrate 300 is cured in accordance with a control signal supplied from the control unit 102.
  • the upper transfer layer 301b of the substrate 300 is irradiated with UV light through the upper opening 151b and a UV light transmission region of the upper mounting table 150b described later.
  • the upper UV irradiation unit 130b may be retracted except when necessary, such as when UV light is irradiated in the transfer operation.
  • the upper center pin driving unit 140b constitutes a part of a specific example of the “transfer object holding unit” of the present invention in the upper mechanism unit B, and the upper center pin driving unit 140b corresponds to a control signal supplied from the control unit 102. 120b is moved in the axial direction, that is, in a direction perpendicular to the upper mold holding surface Sb of the upper mounting table 150b.
  • the upper center pin driving unit 140b presses the upper center pin 120b in the vertical downward direction when the upper mold 200b and the substrate 300 after the transfer operation described later are released, thereby causing the vertical position of the substrate 300 to move.
  • the upper center pin driving unit 140b includes an upper pressure sensor 141b.
  • the upper pressure sensor 141b is a specific example of “detection means” in the upper mechanism B of the present embodiment, and detects and detects the pressure applied to the upper center pin 120b connected to the upper center pin driving unit 140b.
  • the pressure information is transmitted to the control unit 102.
  • the pressure applied to the upper center pin 120b is, for example, a force that resists the downward movement of the upper center pin 120b in contact with the substrate 300 in close contact with the upper mold 200b.
  • the purpose is to indicate the pressure applied to the upper center pin 120b by the force acting on the contact surface between 200b and the substrate 300.
  • the upper mounting table 150b has a flat upper mold holding surface Sb for holding the upper mold 200b.
  • the upper mold holding surface Sb is provided with a center hole in the center portion, and the upper mold holding portion 152b.
  • An upper mold clamp 153b is provided.
  • the upper mold holding surface Sb of the upper mounting table 150b is typically configured to be wider than the pattern region of the upper mold 200b.
  • the upper mounting table 150b is configured to be capable of alignment adjustment in the direction of the upper mold holding surface Sb in order to align the upper mold 200b with the substrate 300.
  • the upper mounting table 150b At least a region corresponding to a region where the pattern of the upper mold 200b to be mounted is formed transmits UV light such as quartz glass, and changes in characteristics are caused by irradiation of the UV light. This is a UV light transmission region made of a difficult material.
  • the opening 151b of the upper base 110b is formed in a region corresponding to the UV light transmission region of the upper mounting table 150b.
  • the upper mold holding part 152b is a specific example of the “mold holding means” or “first mold holding means” of the present invention in the upper mechanism part B, and is a suction groove for holding the upper mold 200b by vacuum suction or the like.
  • a suction portion 154b having 155b and an elastic member 156b that supports the suction portion 154b are provided.
  • Each of the suction portion 154b, the suction groove 155b, and the elastic member 156b has the same configuration as the suction portion 154a, the suction groove 155a, and the elastic member 156a of the upper mechanism portion A.
  • the upper mold clamp 153b is a specific example of the “mold holding unit” or the “first mold holding unit” of the present invention in the upper mechanism B, and is from a position where the upper mold 200b on the upper mounting table 150b is mounted. Furthermore, it is a clamp mechanism provided at the outer peripheral edge. Similar to the lower mold clamp, a plurality of upper mold clamps 153b are also provided. The upper mold clamp 153b is configured to hold the upper mold 200b by pressing the non-pattern area of the upper mold 200b upward with pressure according to a control signal from the control unit 102.
  • the upper mold clamp 153b presses the upper mold 200b with a force stronger than the pressing force necessary to hold the upper mold 200b in accordance with a control signal from the control unit 102, so that the upper mold holding unit 152b
  • the upper mold 200b can be elastically deformed together with the elastic member 156b.
  • the control unit 102 is an information processing device such as a CPU (Central Processing Unit), for example, and the lower UV irradiation unit of the lower mechanism unit A according to an input signal indicating a user instruction supplied from the operation unit 103. 130a, the lower center pin driving unit 140a and the lower mold clamp 153a, the upper UV irradiation unit 130b of the upper mechanism B, the upper center pin driving unit 140a and the upper mold clamp 153b, and the control for controlling the operation of each part of the actuator 104. Supply the signal.
  • a CPU Central Processing Unit
  • the operation unit 103 includes a plurality of buttons or a keyboard that can input an instruction by the user, and supplies an input signal corresponding to the input user instruction to the control unit 102.
  • the control unit 102 reads an operation processing program stored in an internal memory or the like according to the input signal, generates a control signal according to the instruction, and supplies the control signal to each unit.
  • the actuator 104 is a mechanism such as a motor that can move the upper mounting table 150b toward or away from the lower mounting table 150a in accordance with a control signal supplied from the control unit 102. Specifically, the actuator 104 rotates the ball screw 101 in accordance with a control signal supplied from the control unit 102, whereby the upper base 110b engaged with the ball screw 101 is changed to the upper mounting base 150b and the lower mounting base. It moves in the vertical direction while maintaining the parallel positional relationship with 150a. At this time, for example, four ball screws 101 are provided so as to connect the four corners of the lower base 110a and the upper base 110b, and a plurality of actuators 104 are also provided to rotate the corresponding ball screws 101. Yes.
  • the actuator 104 by moving the upper base 110b in the vertical upward direction, the upper mounting base 150b is separated from the lower mounting base 150a, and the upper base 110b is moved in the vertical downward direction.
  • the upper mounting table 150b comes close to the lower mounting table 150a.
  • the actuator 140 moves the upper mounting table 150b vertically downward in a transfer operation described later, thereby pressing the upper mold 200b and the substrate 300 to each other, and further pressing the lower mold 200a and the substrate 300 to each other. To do.
  • the actuator 104 is also a specific example of the “mold release unit” or “first mold release unit” of the present invention.
  • the upper mold is used.
  • the upper mold 200b is released from the substrate 300 by moving the upper mounting table 150b in the vertical upward direction while holding 200b.
  • FIG. 3 is a schematic transmission diagram when the lower base 110a, the lower mechanism A, and the surrounding configuration are viewed from the vertically upward direction. Note that FIG. 3 does not show the lower mold holding portion 152a and the lower mold clamp 153a provided on the lower mounting table 150a.
  • the actuator 104 is connected to each of the pole screws 101 arranged at the four corners of the lower base 110a, and the pole screws are rotated based on a control signal from the control unit 102.
  • the upper base 110b and the upper mechanism B are also configured in the same manner as the lower base 110a and the lower mechanism A, and are vertically upward from the lower base 110a at the four corners of the square upper base 110b.
  • Four pole screws 101 extending in the direction are screwed together.
  • FIG. 4 is a schematic diagram showing a detailed configuration example of the center pin driving unit 140a.
  • the center pin drive unit 140a of this embodiment includes a motor 141, a shaft 142, an electromagnet 143, a brake plate 144, and a disk 145.
  • the motor 141 rotates in a manner capable of at least rotational speed control and torque control in accordance with the supplied current.
  • the shaft 142 is engaged so as to be able to rotate together with the rotation shaft of the motor 141 and is screwed so that the center pin 120 can be moved in the axial direction according to the rotation.
  • the electromagnet 143 is, for example, an electromagnetic coil that generates a magnetic field according to a supplied current.
  • the brake plate 144 When a magnetic field is not generated in the electromagnet 143, the brake plate 144 is pressed against the disk 145 by an unillustrated elastic member or the like to brake the rotation of the disk 145 by friction, and when a magnetic field is generated in the electromagnet 143, The electromagnet 143 is pulled away from the disk 145. The disk 145 is engaged with the shaft 142 so as to be able to rotate together with the rotation of the motor 141.
  • the control unit 102 may control the torque output of the motor 141 by adjusting the amount of current supplied to the motor 141. If comprised in this way, the pressing force of the lower center pin 120a which changes typically according to the torque output of the motor 141 can be controlled suitably.
  • the center pin driving unit 140a may be configured to notify the control unit 102 of the position of the lower center pin 120a detected by a position sensor (not shown) or the like.
  • the control unit 102 detects the position of the lower center pin 120a according to the position information notified in this way or some other information, and rotates the motor 141 to move or fix the lower center pin 120a.
  • the magnetic field of the electromagnet 143 is controlled. For this reason, it is possible to appropriately control the position of the lower center pin 120a.
  • a center pin driving unit 140'a shown in FIG. 4B may be employed as another configuration example of the center pin driving unit 140a.
  • the center pin drive unit 140'a includes a motor 141, a shaft 142, and a brake 146.
  • the same components as those in FIG. 4A are denoted by the same reference numerals and description thereof is omitted.
  • the brake 146 is an electrical or mechanical brake mechanism, and is pressed against the shaft 142 based on a control signal from the control unit 102, brakes the rotation of the shaft 142 by friction, and the lower center pin 120a Brakes movement.
  • the upper center pin 120b and the center pin drive unit 140b also have the same configuration as that of the lower center pin 120a and the center pin drive unit 140a unless otherwise specified.
  • FIG. 5 is a flowchart showing a series of transfer operations by the imprint apparatus 1.
  • 6 to 7 are schematic views showing the operation of each part of the imprint apparatus 1 in each process during the transfer operation.
  • FIG. 8 is a graph showing changes in the position of the lower center pin 120a and the upper center pin 120b in the vertical direction during the transfer operation.
  • FIGS. 6 to 7 the same components as those in the schematic diagram shown in FIG. 1 are denoted by the same reference numerals, and some of the thin members related to the operation to be described are partially described. The illustration is omitted.
  • the upper mold 200b is attached to the initial imprint apparatus 1 (FIG. 6 [state 1]) in which none of the upper mold 200b, the lower mold 200a, and the substrate 300 is installed.
  • Step S101 More specifically, in step S101, first, the upper mold 200b is moved by the operation of a mold conveying device (not shown) such that the tip 121a of the lower center pin 120a penetrates the center hole of the upper mold 200b. It is installed on the mold support part 123a of the side center pin 120a (FIG. 6 [state 2]).
  • the control unit 102 operates the actuator 104 to vertically move the upper mounting table 150b so that the upper mold holding surface Sb of the upper mounting table 150b is in contact with the upper surface of the upper mold 200b (that is, the back surface of the pattern surface). Move down.
  • the control unit 102 operates a decompression unit (not shown) to adsorb and hold the upper mold 200b on the adsorption unit 154b of the upper mounting table 150b.
  • a control signal is transmitted to the upper mold clamp 153b, and the upper mold 200b is pressed vertically upward to be fixed to the upper mounting table 150b (FIG. 6 [State 3]).
  • the control unit 102 operates the actuator 104 to move the upper mounting table 150b to the initial position in the vertical upward direction (FIG. 6 [state 4]).
  • step S102 the lower mold 200a is attached to the imprint apparatus 1 (step S102). More specifically, in step S102, first, the lower mold 200a is moved in such a manner that the front end portion 121a of the lower center pin 120a penetrates the center hole of the lower mold 200a by an operation of a not-shown mold conveyance device or the like. Then, the lower center pin 120a is installed on the mold support part 123a (FIG. 6 [state 5]).
  • the control unit 102 operates the lower center pin driving unit 140a so that the lower mold holding surface Sa of the lower mounting table 150a contacts the lower surface of the lower mold 200a (that is, the back surface of the pattern surface).
  • the lower center pin 120a is moved vertically downward.
  • the control unit 102 operates a decompression means such as a vacuum pump (not shown) to cause the upper mold 200a to move to the suction unit 154a of the lower mounting table 150a. Is adsorbed and retained.
  • a control signal is transmitted to the lower mold clamp 153a, and the lower mold 200a is pressed vertically downward to be fixed to the lower mounting table 150a (FIG. 6 [State 6]).
  • the substrate 300 is placed on the substrate support portion 122a of the lower center pin 120a so that the tip 121a of the lower center pin 120a penetrates the center hole of the substrate 300. (Step S103, FIG. 6 [State 7]).
  • the control unit 102 may align the lower mold 200a and the upper mold 200b with the substrate 300 as necessary.
  • control unit 102 transmits a control signal to the lower mold clamp 153a, and gradually increases the force pressing the lower mold 200a from the holding force to the deforming force, thereby deforming the lower mold 200a.
  • control unit 102 transmits a control signal to the upper mold clamp 153b, and gradually increases the force pressing the upper mold 200b from the pressing force to the deformation force, thereby deforming the upper mold 200b. (Step S104, FIG. 6 [State 8]).
  • control unit 102 operates the lower center pin driving unit 140a to move the lower center pin 120a vertically downward, and the pattern of the lower transfer layer 301a and the lower mold 200a to be supported is supported. The surface is brought into contact (step S105, FIG. 7 [state 9]). Further, the control unit 102 operates the actuator 104 to move the upper mounting table 150b vertically downward to bring the pattern surface of the upper mold 200b into contact with the upper transfer layer 301b of the substrate 300 (FIG. 7 [state] 10]).
  • each mold and the contact with the substrate 300 may be performed in the above-described order. Also, the deformation of the lower mold 200a, the contact between the lower mold 200a and the substrate 300, the deformation of the upper mold 200b, You may perform from one side in the order of contact with the upper mold 200b and the board
  • control unit 102 After the contact between each mold and the substrate 300, the control unit 102 transmits a control signal to the lower mold clamp 153a and the upper mold clamp 153b, and gradually reduces the pressing force pressing each mold from the deformation force to the holding force. The deformation of each mold is released (step S106, FIG. 7 [state 11]).
  • control unit 102 operates the actuator 104 to move the upper mounting table 150 b vertically downward, and the upper mold 200 b is moved to the upper transfer layer 301 b on the upper surface of the substrate 300, and the lower mold 200 a is moved to the lower surface of the substrate 300.
  • the lower transfer layer 301a is pressed with a predetermined pressing force (step S107).
  • control unit 102 emits UV light from the lower UV irradiation unit 130a and the upper UV irradiation unit 130b in order to cure the lower transfer layer 301a and the upper transfer layer 301b of the substrate 300 while maintaining the pressed state.
  • the lower transfer layer 301a and the upper transfer layer 301b of the substrate 300 are cured in accordance with the pattern formed on the surface of each mold, and the pattern is transferred (step S108).
  • the pressure and pressing time during pressing, the intensity of UV irradiation, and the irradiation time are appropriately set according to the characteristics of the transfer layer.
  • a mold release process for releasing the lower mold 200a and the upper mold 200b from the substrate 300 is performed.
  • the control unit 102 first stops the operation of the actuator 104 that presses the upper mounting table 150b, and releases the pressing state between each mold and the substrate 300. At the same time or before and after, the control unit 102 operates the upper center pin driving unit 140b so that the tip of the upper center pin presses the substrate 300 vertically downward at a predetermined pressure (Step S109, FIG. 7 [ State 12]).
  • the control unit 102 controls the driving modes of the lower center pin driving unit 140a and the upper center pin driving unit 140b so that excessive pressure is not applied to the sandwiched substrate 300.
  • the control unit 102 performs position control for fixing the position of the lower center pin 120a with respect to the lower center pin driving unit 140a from the start of the mold release operation. Specifically, the control unit 102 supplies electric power to the brake mechanism (for example, the electromagnet 143 or the brake 146) in the lower center pin driving unit 140a, and the like. The driving is stopped and the lower center pin 120a is fixed so as not to move. Further, the control unit 102 may fix the lower center pin 120a by more simply controlling the amount of power supplied to the lower center pin driving unit 140a.
  • the brake mechanism for example, the electromagnet 143 or the brake 146
  • control unit 102 moves vertically downward to a position where the tip of the upper center pin 120b contacts the substrate 300 (FIG. 8, upper center pin substrate holding position). Position control is performed on the upper center pin driving unit 140b.
  • the control unit 102 changes the operation mode of the upper center pin driving unit 140b from the position control according to the position of the upper center pin 120b to the upper center pin.
  • the torque control is switched according to the pressing force exerted by the pin 120b in the vertical downward direction.
  • the center pin drive unit 140b controls the drive torque so that the pressing force with which the upper center pin 120 presses the substrate 300 vertically downward does not exceed a predetermined threshold.
  • the threshold value of the pressing force at this time is an upper limit value that is set sufficiently low with respect to the pressing force that causes distortion or damage to the substrate 300 held by the pressing of the upper center pin 120b, for example.
  • the substrate 300 is pressed between the lower center pin 120a whose position is fixed by pressing the substrate 300 vertically downward with a pressing force that does not exceed the threshold value. Hold 300.
  • control unit 102 performs deformation of the lower mold 200a and the upper mold 200b by the same operation as the above-described step S104 (step S110, FIG. 7 [state 13]). At this time, the pressing force of each mold clamp is controlled to gradually increase from the holding force to the deformation force.
  • the control unit 102 operates the upper center pin 120b actuator 104 to move the upper mounting table 150b to the initial position in the vertical upward direction.
  • the upper mold 200b moves vertically upward while being held by the upper mounting table 150b, while the substrate 300 is pressed vertically downward (in other words, fixed) by the upper center pin 120b. Therefore, the upper mold 200b and the upper transfer layer 301b of the substrate 300 are released (Step S111, FIG. 7 [State 14]).
  • the control unit 102 fixes the position of the lower center pin 120a and controls the force with which the upper center pin 120b presses the substrate 300 in the vertical downward direction by torque control.
  • the control unit 102 holds the upper center pin 120b and the lower center pin 120a holding the substrate 300 up to the initial position of the lower center pin 120a in the vertical upward direction while maintaining the state in which the substrate 300 is held.
  • the lower mold 200a and the substrate 300 are released from each other (step S112, FIG. 7 [state 15]).
  • the control unit 102 controls the position of the lower center pin driving unit 140a so that the lower center pin 120a moves to the lower center pin initial position.
  • the control unit 102 moves the upper center pin 120b so as to move to a position corresponding to the lower center pin initial position (that is, above the lower center pin initial position by the thickness of the substrate 300).
  • the mode of operation of the drive unit 140a is switched from torque control to position control.
  • control unit 102 changes the pressing force of the upper mold clamp 153b and the lower mold clamp 153a to the holding force for holding the mold, and releases the deformation of the lower mold 200a and the upper mold 200b. (Step S113, FIG. 7 [State 16]).
  • step S114 The substrate 300 released from the lower mold 200a and the upper mold 200b is removed from the lower center pin 120a by an operation of a substrate transfer device (not shown) (step S114).
  • step S115: No when performing transfer using the same lower mold 200a and upper mold 200b for another substrate 300 (step S115: No), the steps from step S103 to step S114 for placing the substrate 300 are performed. Run repeatedly. After all the transfer is completed (step S115: Yes), the lower mold 200a is removed (step S116) and the upper mold 200b is removed (step S117) by an operation of a mold conveyance device (not shown).
  • the lower mold 200a and the upper mold 200b are placed on the surfaces of the transfer surfaces 301a and 301b of the substrate 300.
  • the formed pattern is transferred.
  • the substrate is formed by the lower center pin 120a whose position is fixed under the control of the control unit 102 and the upper center pin 120b that presses the substrate 300 with a predetermined pressing force during the mold release operation. 300 is pinched. For this reason, the board
  • appropriate holding of the substrate can be realized by changing a threshold value or the like in torque control of the upper center pin 120b according to the characteristics of the substrate.
  • the control unit 102 moves the upper stage 150b, to which the upper mold 200b is fixed, in the vertical upward direction, so that the upper mold 200b and the substrate 300 can be separated relatively easily. A mold can be realized. Further, the control unit 102 moves the lower center pin 120a and the upper center pin 120b in the vertical upward direction while maintaining the state of holding the substrate 300, so that the lower mold 200a and the substrate 300 can be relatively easily moved. Can be realized.
  • FIG. 9 is a schematic diagram schematically showing a configuration of an imprint apparatus 1 ′ which is a first modification of the transfer apparatus of the present invention.
  • the imprint apparatus 1 shown in FIG. 9 has a lower mold 200a with respect to a lower transfer layer 301a configured on the lower surface of a substrate 300 ′ that is a transfer target (in other words, arranged facing downward).
  • 2 is a transfer device for transferring a pattern formed on the substrate. Note that, in this modification and FIG. 9, the same components as those of the imprint apparatus 1 shown in FIG.
  • the imprint apparatus 1 includes a lower mechanism part A including a lower base 110a, an upper mechanism part B ′ including an upper base 110b, a lower base 110a and an upper base 110b.
  • a ball screw 101 to be connected an actuator 104 for rotating the ball screw, a control unit 102 for controlling the operation of the lower mechanism unit A and the upper mechanism unit B, and an operation capable of inputting a user instruction to the control unit 102 Unit 103.
  • the imprint apparatus 1 ′ shown in FIG. 9 shows a state where the lower mold 200 a and the substrate 300 ′ are installed.
  • the lower mold 200a is held on the lower mounting table 150a of the lower mechanism portion A so that the surface on which the pattern is formed faces upward.
  • the upper base 110b has a pressing portion 120b so as to form a convex portion with respect to the lower mold holding surface Sa of the lower mounting table 150a.
  • the lower mechanism part A has the same configuration as the lower mechanism part A of the imprint apparatus 1 shown in FIG.
  • the upper mechanism part B 'of the present modification is provided on the lower surface of the upper base 110b, and includes a pressing part 112b, an upper center pin 120b, and an upper center pin driving part 140b.
  • the pressing portion 112b is a portion provided to form a convex portion downward on the lower surface of the upper base 110b. During the transfer operation, the pressing portion 112b presses the substrate 300 ′ downward by the operation of the actuator 104, so that the lower side Adhere to the mold 200a.
  • the pressing part 112b has a center hole for placing the upper center pin 120b.
  • the pressing portion 112b is flat and preferably has a lower surface that is wider than at least a region where the lower transfer layer 301a of the substrate 300 'is formed.
  • the actuator 104 moves the upper base 110b vertically downward, so that the lower surface of the pressing portion 112b presses the substrate 300' vertically downward. Therefore, the lower transfer layer 301a of the substrate 300 'is brought into close contact with the pattern surface of the lower mold 200a, and the pattern is transferred. Further, the actuator 102 moves the upper base 110b vertically upward, so that the pressing force for mutual pressing between the lower mold 200a and the substrate 300 'is released.
  • the lower center pin 120a and the upper center pin 120b are moved vertically upward while holding the substrate 300 ′, so that the substrate 300 ′ is released from the lower mold 200a. To do.
  • the position of the lower center pin 120a is controlled under the control of the control unit 102, and the force with which the upper center pin 120b presses the substrate 300 is controlled by torque control. Is done. According to such position control and torque control, it is possible to suitably suppress the occurrence of distortion and damage due to the substrate 300 being held between the lower center pin 120a and the upper center pin 120b with an excessive force.
  • the pattern formed on the surface of the lower mold 200a is transferred to the transfer layer 301a of the substrate 300 ′ while enjoying the same effect as the imprint apparatus 1 described above. I can do it.
  • FIG. 10 is a schematic diagram schematically showing a configuration of an imprint apparatus 1 ′′ and a control apparatus 400, which is a second modification of the transfer apparatus of the present invention. Note that, in this modification and FIG. 10, the same components as those of the imprint apparatus 1 shown in FIG.
  • the imprint apparatus 1 ′′ has a configuration that does not include the control unit 102 and the operation unit 103 in the imprint apparatus 1 illustrated in FIG. 1. Other parts may be equivalent to the imprint apparatus 1.
  • the control device 400 includes a control unit 102 ′ and an operation unit 103 ′ having the same configuration as the control unit 102 and the operation unit 103 of the imprint apparatus 1, and is electrically connected to each unit of the imprint apparatus 1 ′′. Is done. In this configuration, the control unit 102 ′ of the control device 400 controls the operation by supplying a control signal to each unit of the imprint apparatus 1 ′′.
  • the imprinting device 1 ′′ and the control device 400 are arranged at separate positions, and the same effect as that obtained by the imprinting device 1 described above is obtained. You can enjoy it.
  • one control device 400 is connected to a plurality of imprint devices and controls the operation of each imprint device.
  • one control device 400 is provided for n imprint devices 1 ′′ -1, 2,...
  • the operation of each imprint apparatus is controlled by supplying control signals to the imprint apparatuses 1 ′′ -1, 2,... N.
  • one control device 400 supplies control signals to a plurality of n imprint devices 1 ′′ -1, 2,... N, and the like, as shown in FIGS. Centralized control is performed so that each process related to the transfer operation is performed.
  • a fourth modified example there is an apparatus configuration in which a user's instruction for controlling operations is input by a single operation unit to a plurality of control units respectively connected to a plurality of imprint apparatuses. is there.
  • the individual control units 102′-1, 2,. are connected to control the operation of each imprint apparatus 1 ′′ -1, 2,... N.
  • the operation unit 103 ′ is connected to each of the control units 102 ′-1, 2,... N, and inputs an instruction by a user operation.
  • the user concentrates settings such as operation start, operation stop, and the number of substrates to be transferred in each imprint apparatus 1 ′′ -1, 2,... N by using one operation unit 103 ′.
  • the operation unit 103 ′ inputs the set instruction contents to the control units 102′-1, 2,... N of the imprint apparatuses 1 ′′ -1, 2,.
  • the control units 102′-1, 2,... N of the respective imprint apparatuses 1 ′′ -1, 2,... N respectively correspond to the corresponding imprint apparatuses 1 ′′ -1, 2,.
  • a control signal is supplied so that n performs each step related to the transfer operation shown in FIGS.
  • one control device 400 or operation unit 103 ′ is used for each of the plurality of imprint devices 1 ′′ -1, 2,.
  • User instructions can be input. For this reason, centralized management is possible in a factory where many imprint apparatuses are required to operate simultaneously. Moreover, it is useful also in terms of apparatus configuration and cost.
  • the UV type imprint apparatus has been described as an example.
  • the present invention is not limited to the above-described embodiments, and can be appropriately changed without departing from the gist or concept of the invention that can be read from the claims and the entire specification, and a transfer apparatus accompanying such a change. And methods, computer programs, and the like are also included in the technical scope of the present invention.
  • 1 imprint device 101 ball screw, 102 control unit, 103 operation unit, 104 actuator, 110a Lower base, 110b upper base, 120a Lower center pin, 120b upper center pin, 130a UV irradiation unit, 130b UV irradiation unit, 140a Center pin drive unit, 140b center pin drive unit, 150a lower stage, 150b upper stage, 151a lower opening, 151b upper opening, 152a Lower mold holding part, 152b Upper mold holding part, 153a Lower mold clamp, 153b Upper mold clamp, 154a adsorption part, 154b adsorption part, 155a suction groove, 155b suction groove, 156a elastic member, 156b elastic member, 200a lower mold, 200b Upper mold, 300 substrates, 301a transfer layer, 301b Transfer layer.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)

Abstract

Disclosed is a transfer apparatus (1) which transfers a pattern formed on a mold (200a) to a subject to which the pattern is to be transferred (300). The transfer apparatus is provided with: a first supporting means (120a) which supports the subject from the first direction; a second supporting means (120b) which fixes the subject to the first supporting means by applying a force to the subject, which is supported by means of the first supporting means, from the second direction different from the first direction; and fixing means (102, 144, 146) which fix the position of the first supporting means, while the second supporting means is applying the force to the subject.

Description

転写装置及び方法並びにコンピュータプログラムTransfer apparatus and method, and computer program
 本発明は、表面に凹凸パターンが形成されるモールドを被転写体に押圧することで凹凸パターンを被転写体表面に転写する転写装置及び転写方法並びにコンピュータプログラムの技術分野に関する。 The present invention relates to a technical field of a transfer apparatus, a transfer method, and a computer program that transfer a concavo-convex pattern onto a surface of a transfer target by pressing a mold having a concavo-convex pattern on the surface of the transfer target.
 この種の転写装置では、モールド表面に形成された凹凸パターンなどが被転写体表面に転写される。特に、ナノインプリント技術と呼ばれる一分野においては、ナノスケールの微細な凹凸パターンについても転写可能とされている。また、被転写体の両面に同時にパターンを転写する転写装置も近年知られている。特許文献1乃至3には、このような両面転写を実現可能な転写装置が夫々公開されている。 In this type of transfer device, the uneven pattern formed on the mold surface is transferred to the surface of the transfer target. In particular, in one field called nanoimprint technology, it is possible to transfer nano-scale fine uneven patterns. In recent years, a transfer apparatus that simultaneously transfers a pattern onto both surfaces of a transfer target is also known. Patent Documents 1 to 3 each disclose a transfer device capable of realizing such double-sided transfer.
特開2009-60091号公報JP 2009-60091 A 国際公開第2007/067488号公報International Publication No. 2007/067488 特開2008-12859号公報JP 2008-12859 A
 上述した特許文献に開示される構成においては、例えば、転写装置に固定される支持部材によって被転写体が下側から保持され、二つのモールドによる挟み込みを可能としている。このような構成においては、支持部材に保持される被転写体に対して、上側及び下側から接近させた後、挟み込むように押圧することで、パターンの両面転写を可能としている。その後、モールドを夫々被転写体から上側及び下側へ離間させることで、所謂離型を行ない、転写動作を終了する。 In the configuration disclosed in the above-mentioned patent document, for example, the transfer target is held from below by a support member fixed to the transfer device, and can be sandwiched by two molds. In such a configuration, the two-sided transfer of the pattern can be performed by pressing the object to be transferred held by the support member from the upper side and the lower side and then pressing it so as to be sandwiched. Thereafter, by separating the mold from the transfer target to the upper side and the lower side, so-called mold release is performed, and the transfer operation is completed.
 しかしながら、上述したように被転写体を単に下側から支持部材で保持する構成では、モールドの押圧時や離型時に付加されるモールドからの押圧力などにより、被転写体に歪みなどの損傷が生じる虞がある。 However, as described above, in the configuration in which the transfer target is simply held by the support member from the lower side, the transfer target is damaged by a pressing force applied from the mold when the mold is pressed or released. May occur.
 本発明は、上述した技術的な問題に鑑みて為されたものであり、歪みなどを生じさせることなく、好適な被転写体の保持を実現可能な転写装置及び方法並びにコンピュータプログラムを提供することを課題とする。 The present invention has been made in view of the above-described technical problems, and provides a transfer apparatus and method, and a computer program that can realize suitable holding of a transferred object without causing distortion or the like. Is an issue.
 上記課題を解決するために、本発明の第1の転写装置は、モールドに形成されたパターンを被転写体に転写する転写装置であって、前記被転写体を第1の方向から支持する第1支持手段と、前記第1支持手段に支持された前記被転写体に対して、前記第1の方向とは異なる第2の方向から前記被転写体に力を加えることで、前記被転写体を前記第1支持手段に固定する第2支持手段と、前記第2支持手段が前記被転写体に力を加えている間、前記第1支持手段の位置を固定する固定手段とを備える。 In order to solve the above-described problems, a first transfer device of the present invention is a transfer device that transfers a pattern formed on a mold to a transfer target, and supports the transfer target from a first direction. A force applied to the transfer body from a second direction different from the first direction with respect to the support body and the transfer body supported by the first support means; The second support means for fixing the first support means to the first support means, and the fixing means for fixing the position of the first support means while the second support means applies a force to the transfer target.
 上記課題を解決するために、本発明の第2の転写装置は、第1モールドに形成されたパターンを被転写体の第1の面に転写し、且つ第2モールドに形成されたパターンを前記被転写体の第2の面に転写する転写装置であって、前記被転写体を保持する被転写体保持手段と、前記被転写体を第1の方向から支持する第1支持手段と、前記第1支持手段に支持された前記被転写体に対して、前記第1の方向とは異なる第2の方向から前記被転写体に力を加えることで、前記被転写体を前記第1支持手段に固定する第2支持手段と、前記第2支持手段が前記被転写体に力を加えている間、前記第1支持手段の位置を固定する固定手段とを備える。 In order to solve the above problems, the second transfer apparatus of the present invention transfers the pattern formed on the first mold to the first surface of the transfer target, and the pattern formed on the second mold A transfer device for transferring to a second surface of a transfer object, the transfer object holding means for holding the transfer object, a first support means for supporting the transfer object from a first direction, A force is applied to the transferred object from a second direction different from the first direction with respect to the transferred object supported by the first supporting means, thereby to move the transferred object to the first supporting means. And a fixing means for fixing the position of the first support means while the second support means applies a force to the transfer target.
 上記課題を解決するために、本発明の第3の転写装置は、制御装置からの指示に応じて動作し、モールドに形成されたパターンを被転写体に転写する転写装置であって、前記制御装置の指示に応じて、前記被転写体を第1の方向から支持する第1支持手段と、前記制御装置の指示に応じて、前記第1支持手段に支持された前記被転写体に対して、前記第1の方向とは異なる第2の方向から前記被転写体に力を加えることで、前記被転写体を前記第1支持手段に固定する第2支持手段と、前記制御装置の指示に応じて、前記第2支持手段が前記被転写体に力を加えている間、前記第1支持手段の位置を固定する固定手段とを備える。 In order to solve the above-described problem, a third transfer device of the present invention is a transfer device that operates in accordance with an instruction from a control device and transfers a pattern formed on a mold to a transfer target. In response to an instruction from the apparatus, a first support means for supporting the object to be transferred from a first direction, and to the object to be transferred supported by the first support means in accordance with an instruction from the control device , Applying a force to the transferred body from a second direction different from the first direction to fix the transferred body to the first supporting means, and following the instructions of the control device Accordingly, the second support means includes a fixing means for fixing the position of the first support means while applying a force to the transfer target.
 上記課題を解決するために、本発明の第1の転写方法は、モールドに形成されたパターンを被転写体に転写する転写装置における転写方法であって、第1支持手段を用いて、前記被転写体を第1の方向から支持する第1支持工程と、前記第1支持手段に支持された前記被転写体に対して、前記第1の方向とは異なる第2の方向から前記被転写体に力を加えることで、前記被転写体を前記第1支持手段に固定する第2支持工程と、前記第2支持工程において前記被転写体に力を加えている間、前記第1支持手段の位置を固定する固定工程とを備える。 In order to solve the above problems, a first transfer method of the present invention is a transfer method in a transfer apparatus that transfers a pattern formed on a mold to a transfer target, and the first transfer means is used to transfer the pattern to the transfer target. The first support step for supporting the transfer body from the first direction and the transfer target body supported by the first support means from the second direction different from the first direction. A second supporting step for fixing the transferred body to the first supporting means by applying a force to the first supporting means, and during applying a force to the transferred body in the second supporting step, A fixing step of fixing the position.
 上記課題を解決するために、本発明の第2の転写方法は、第1モールドに形成されたパターンを被転写体の第1の面に転写し、且つ第2モールドに形成されたパターンを前記被転写体の第2の面に転写する転写装置における転写方法であって、第1支持手段を用いて、前記被転写体を第1の方向から支持する第1支持工程と、前記第1支持手段に支持された前記被転写体に対して、前記第1の方向とは異なる第2の方向から前記被転写体に力を加えることで、前記被転写体を前記第1支持手段に固定する第2支持工程と、前記第2支持工程において前記被転写体に力を加えている間、前記第1支持手段の位置を固定する固定工程とを備える。 In order to solve the above-described problems, the second transfer method of the present invention transfers the pattern formed on the first mold to the first surface of the transfer object, and the pattern formed on the second mold A transfer method in a transfer device for transferring to a second surface of a transfer object, the first support step of supporting the transfer object from a first direction using a first support means, and the first support The transfer target is fixed to the first support unit by applying a force to the transfer target from a second direction different from the first direction with respect to the transfer target supported by the unit. A second support step; and a fixing step of fixing a position of the first support means while applying a force to the transfer target in the second support step.
 上記課題を解決するために、本発明のコンピュータプログラムは、モールドに形成されたパターンを被転写体に転写する転写装置を動作させるためのコンピュータプログラムであって、第1支持手段を用いて、前記被転写体を第1の方向から支持する第1支持工程と、前記第1支持手段に支持された前記被転写体に対して、前記第1の方向とは異なる第2の方向から前記被転写体に力を加えることで、前記被転写体を前記第1支持手段に固定する第2支持工程と、前記第2支持工程において前記被転写体に力を加えている間、前記第1支持手段の位置を固定する固定工程とを前記転写装置に実行させる。 In order to solve the above problems, a computer program of the present invention is a computer program for operating a transfer device that transfers a pattern formed on a mold to a transfer target, using a first support means, and A first support step for supporting the transfer object from a first direction and the transfer object supported by the first support means from a second direction different from the first direction. A second supporting step of fixing the transferred body to the first supporting means by applying a force to the body, and the first supporting means while applying a force to the transferred body in the second supporting step. And a fixing step of fixing the position of the transfer device.
 本発明の作用及び他の利得について、以下に示す実施の形態とともに説明する。 The operation and other gains of the present invention will be described together with embodiments shown below.
本発明のインプリント装置の基本的な構成例を示す模式図であるIt is a schematic diagram which shows the basic structural example of the imprint apparatus of this invention. モールド保持手段によるモールドの保持の態様を示す模式図である。It is a schematic diagram which shows the aspect of a mold holding | maintenance by a mold holding means. インプリント装置の基台の形状を示す模式図である。It is a schematic diagram which shows the shape of the base of an imprint apparatus. 下側センターピン及びセンターピン駆動部の構成及び動作の例を示す模式図である。It is a schematic diagram which shows the example of a structure and operation | movement of a lower side center pin and a center pin drive part. インプリント装置による転写動作の一連の流れを示すフローチャートである。It is a flowchart which shows a series of flows of the transfer operation by an imprint apparatus. 転写動作におけるインプリント装置の各部の動作を示す模式図である。FIG. 6 is a schematic diagram showing the operation of each part of the imprint apparatus in a transfer operation. 転写動作におけるインプリント装置の各部の動作を示す模式図である。FIG. 6 is a schematic diagram showing the operation of each part of the imprint apparatus in a transfer operation. 転写動作における下側センターピン及び上側センターピン制御部の位置の時間的な変化を示すグラフである。It is a graph which shows the time change of the position of the lower center pin and upper center pin control part in transfer operation. インプリント装置の第1の変形例の基本的な構成例を示す模式図である。It is a schematic diagram which shows the basic structural example of the 1st modification of an imprint apparatus. インプリント装置の第2の変形例の基本的な構成例を示す模式図である。It is a schematic diagram which shows the basic structural example of the 2nd modification of an imprint apparatus. インプリント装置の第3及び第4の変形例の基本的な構成例を示す模式図である。It is a schematic diagram which shows the basic structural example of the 3rd and 4th modification of an imprint apparatus.
 本発明の転写装置に係る第1実施形態は、モールドに形成されたパターンを被転写体に転写する転写装置であって、前記被転写体を第1の方向から支持する第1支持手段と、前記第1支持手段に支持された前記被転写体に対して、前記第1の方向とは異なる第2の方向から前記被転写体に力を加えることで、前記被転写体を前記第1支持手段に固定する第2支持手段と、前記第2支持手段が前記被転写体に力を加えている間、前記第1支持手段の位置を固定する固定手段とを備える。 1st Embodiment which concerns on the transfer apparatus of this invention is a transfer apparatus which transfers the pattern formed in the mold to a to-be-transferred body, Comprising: The 1st support means which supports the said to-be-transferred body from a 1st direction, A force is applied to the transfer object from a second direction different from the first direction with respect to the transfer object supported by the first support means, thereby supporting the transfer object to the first support. Second support means for fixing to the means, and fixing means for fixing the position of the first support means while the second support means applies a force to the transfer target.
 本発明の転写装置に係る第1実施形態によれば、表面にパターンが形成されるインプリント金型であるモールドが、被転写体に押圧されることで、モールド表面のパターンが被転写体に転写される。 According to the first embodiment of the transfer device of the present invention, a mold, which is an imprint mold having a pattern formed on the surface thereof, is pressed against the transfer target, so that the pattern on the mold surface is applied to the transfer target. Transcribed.
 本実施形態においては、第1支持手段が第1の方向より被転写体を支持し、第2支持手段が第2の方向より被転写体を押圧することで、被転写体が狭持される。尚、「第1の方向」とは、被転写体に対して「第1の方向」たる所定の方向に配置されることを示す趣旨である。つまり、第1支持手段は、被転写体に対して該第1の方向から接近し、被転写体に接触及び押圧が可能な構成である。例えば、「第1の方向」は、被転写体に対して鉛直下方向である。他方で、「第2の方向」とは、被転写体から見て、第1の方向とは異なる方向を示す趣旨である。 In the present embodiment, the first support means supports the object to be transferred from the first direction, and the second support means presses the object to be transferred from the second direction, whereby the object to be transferred is held. . The “first direction” is intended to indicate that it is arranged in a predetermined direction which is the “first direction” with respect to the transfer object. That is, the first support means is configured to approach the transfer target from the first direction and to contact and press the transfer target. For example, the “first direction” is a vertically downward direction with respect to the transfer target. On the other hand, the “second direction” is intended to indicate a direction different from the first direction when viewed from the transfer target.
 また、本実施形態においては、第2支持手段が被転写体に接する状態で第2の方向から被転写体に力を及ぼすことで、被転写体を第1支持手段に固定する。例えば、第2支持手段は、第1支持手段が被転写体を支持する第1の方向とは反対の方向である第2の方向から被転写体を第1支持手段方向に押圧することで、被転写体を第1支持手段に抑えつけて固定する。 Further, in the present embodiment, the transferred body is fixed to the first supporting means by exerting a force on the transferred body from the second direction while the second supporting means is in contact with the transferred body. For example, the second support unit is configured to press the transfer target member in the first support unit direction from a second direction that is opposite to the first direction in which the first support unit supports the transfer target member. The transferred object is fixed to the first support means.
 また、少なくともこのように第2支持手段が被転写体に力を加えている間、第1支持手段は、固定手段の動作により位置が固定される。例えば固定手段は、第1支持手段の位置を検出する位置センサと、第1支持手段の移動を行なうアクチュエータとを含むサーボユニットなどにより構成され、第1支持手段が移動しないよう位置を固定する。 Also, the position of the first support means is fixed by the operation of the fixing means at least while the second support means applies a force to the transfer target in this way. For example, the fixing means includes a servo unit including a position sensor that detects the position of the first support means and an actuator that moves the first support means, and fixes the position so that the first support means does not move.
 このような固定手段の動作は、第1支持手段は、自らの位置が変更するような移動を行なわないだけでなく、第1支持手段に外力が加えられることによって位置が変動することをも抑制する。第1支持手段に付加される外力の例として、例えば後に詳述するように、第2支持手段が被転写体に加える力などがある。 Such an operation of the fixing means not only does the first support means not move so that the position of the first support means changes, but also suppresses a change in position due to an external force applied to the first support means. To do. As an example of the external force applied to the first support means, for example, as described in detail later, there is a force applied by the second support means to the transfer target.
 仮に、上述した本実施形態の態様を採用しない構成、特に固定手段により、第1支持手段の位置が固定されない構成においては、被転写体は第1の方向から第1支持手段による押圧を受け、更に第2の方向から第2支持手段による押圧を受ける状況が考えられる。このため、被転写体には第1の方向と第2の方向とから押圧のための力が加えられ、被転写体の材質や構造によっては、歪みや損傷が生じる可能性がある。 Temporarily, in a configuration that does not employ the aspect of the present embodiment described above, in particular, a configuration in which the position of the first support means is not fixed by the fixing means, the transferred object is pressed by the first support means from the first direction, Furthermore, the situation which receives the press by the 2nd support means from the 2nd direction can be considered. For this reason, a pressing force is applied to the transferred body from the first direction and the second direction, and distortion or damage may occur depending on the material or structure of the transferred body.
 然るに、本実施形態においては、第2支持手段が被転写体に力を加えている間、固定手段が第1支持手段の位置を固定することで、被転写体が同時に複数の方向から力を受けることで、過度に強い力が作用することを抑制出来る。また、一方の第1支持手段を固定した上で、第2支持手段が被転写体を第1支持手段に押しつける構成であるため、厚さ(つまり、第1支持手段と第2支持手段とにより挟み込まれる方向の厚さ)の異なる被転写体に対しても、常に適切な押圧力による保持を実現出来る。 However, in this embodiment, while the second support unit applies a force to the transfer target, the fixing unit fixes the position of the first support unit, so that the transfer target simultaneously applies the force from a plurality of directions. By receiving it, it is possible to suppress an excessively strong force from acting. In addition, since one of the first support means is fixed and the second support means presses the transfer medium against the first support means, the thickness (that is, the first support means and the second support means It is possible to always realize holding with an appropriate pressing force even for a transfer object having different thicknesses in the sandwiching direction.
 本発明の転写装置に係る第1実施形態の一の態様では、前記固定手段は、前記第2支持手段によって加えられる力により前記第1支持手段が移動しないよう、前記第1支持手段の位置を固定する。 In one aspect of the first embodiment of the transfer apparatus according to the present invention, the fixing means is arranged such that the position of the first support means is such that the first support means does not move due to the force applied by the second support means. Fix it.
 この態様によれば、固定手段は、第1支持手段に対して被転写体を介して第2支持手段より加えられる力によって、第1支持手段が移動しないよう、第1支持手段の位置の固定を行なう。例えば、固定手段は、第1支持手段に対して被転写体を介して第2支持手段より加えられる力より、強い力により第1支持手段を保持することで第1支持手段の移動を抑制する。また、固定手段は、第1支持手段に対して被転写体を介して第2支持手段より加えられる力と同じ強さであり、第1支持手段から被転写体へ向かう方向の力を第1支持手段に加えることなどにより、第1支持手段の固定を行なってもよい。 According to this aspect, the fixing means fixes the position of the first support means so that the first support means does not move by the force applied from the second support means to the first support means via the transfer target. To do. For example, the fixing means holds the first support means with a stronger force than the force applied from the second support means to the first support means via the transfer medium, thereby suppressing the movement of the first support means. . Further, the fixing means has the same strength as the force applied from the second support means to the first support means via the transfer target, and the force in the direction from the first support means toward the transfer target is the first. The first support means may be fixed by adding to the support means.
 このように構成することで、第1支持手段が第2支持手段に押されて移動してしまうことを防ぎ、該第1支持手段及び第2支持手段の移動に伴って、狭持される被転写体が移動することを好適に抑制出来る。このため、転写動作又は離型動作中に被転写体が移動してしまうことで、適切な転写が行なえなくなることを好適に抑制出来る。 By configuring in this way, the first support means is prevented from being pushed and moved by the second support means, and the object to be held is held as the first support means and the second support means move. It can suppress suitably that a transfer body moves. For this reason, it is possible to suitably prevent the transfer from being performed during the transfer operation or the release operation so that appropriate transfer cannot be performed.
 本発明の転写装置に係る第1実施形態の他の態様では、前記第1の方向と前記第2の方向は、互いの反対の方向である。 In another aspect of the first embodiment according to the transfer device of the present invention, the first direction and the second direction are opposite to each other.
 この態様では、第1支持手段に支持される被転写体を、第2支持手段が第1支持手段方向に押圧することで被転写体を狭持し、好適な保持を実現出来る。このため、比較的簡単な構成で、被転写体を強固に保持することが出来る。 In this aspect, the object to be transferred supported by the first support means is pressed in the direction of the first support means by the second support means, so that the object to be transferred can be held and a suitable holding can be realized. For this reason, it is possible to hold the transfer object firmly with a relatively simple configuration.
 本発明の転写装置に係る第1実施形態の他の態様では、前記被転写体は貫通孔を有するディスク基板であり、前記第1支持手段は、前記ディスク基板の一方の面の前記貫通孔の周辺部と接触して前記被転写体を支持し、前記第2支持手段は、前記ディスク基板の他方の面の前記貫通孔の周辺部において力を加える。 In another aspect of the first embodiment of the transfer apparatus according to the present invention, the transfer target is a disk substrate having a through hole, and the first support means is configured to provide the through hole on one surface of the disk substrate. The second support means applies a force at the peripheral portion of the through hole on the other surface of the disk substrate in contact with the peripheral portion to support the transferred object.
 この態様によれば、第1支持手段と第2支持手段とは、被転写体に形成される貫通孔の周辺部において接触し且つ支持することで被転写体の保持を行なう。ここに、貫通孔とは、被転写体の一の表面から反対側の他の表面まで連続的に形成される開口部である。 According to this aspect, the first support means and the second support means make contact with and support the peripheral portion of the through hole formed in the transfer body to hold the transfer body. Here, the through-hole is an opening formed continuously from one surface of the transfer target to the other surface on the opposite side.
 この態様では、第1支持手段により一方の面の貫通孔の周辺部分を支持されるディスク状の被転写体を、反対側の面の貫通孔の周辺部分から第2支持手段が第1支持手段方向に押圧することで被転写体を狭持する。このため、比較的簡単な構成で、被転写体を強固に保持することが出来る。 In this aspect, the first support means is configured such that the first support means supports the peripheral portion of the through hole on one surface, and the second support means is the first support means from the peripheral portion of the through hole on the opposite surface. The object to be transferred is held by pressing in the direction. For this reason, it is possible to hold the transfer object firmly with a relatively simple configuration.
 本発明の転写装置に係る第1実施形態の他の態様では、前記第1支持手段を移動する第1駆動手段と、前記第2支持手段を移動する第2駆動手段とを更に備え、前記第2駆動手段は、前記第2支持手段を前記被転写体方向に移動させることで、前記被転写体を前記第1支持手段に押圧し、前記被転写体を前記第1支持手段に固定する。 In another aspect of the first embodiment of the transfer apparatus of the present invention, the transfer device further includes a first drive unit that moves the first support unit, and a second drive unit that moves the second support unit. The second driving unit moves the second support unit in the direction of the transfer target, thereby pressing the transfer target against the first support and fixing the transfer target to the first support.
 この態様によれば、第1駆動手段により移動される第1支持手段が第1の方向より被転写体を支持し、第2駆動手段により移動される第2支持手段が第2の方向より被転写体を支持することで、被転写体の保持が実現される。本態様の第1駆動手段は、第1支持手段を移動可能に構成されるアクチュエータなどを含む構成であり、第2駆動手段は、同様に第2支持手段を移動可能に構成されるアクチュエータなどを含む構成である。 According to this aspect, the first supporting means moved by the first driving means supports the transfer target body from the first direction, and the second supporting means moved by the second driving means is covered by the second direction. By supporting the transfer body, it is possible to hold the transfer body. The first driving means of this aspect includes an actuator configured to move the first support means, and the second driving means includes an actuator configured to move the second support means in the same manner. It is the composition which includes.
 このような構成においては、第1駆動手段における第1支持手段を移動させる機構と、第2駆動手段における第2支持手段を移動させる機構との間の差異などにより必ずしも適切な保持が実施されない場合がある。例えば、機構の間の差異に起因して、双方の支持手段による押圧力に差が生じる場合、押圧力の大きい一方の支持手段によって被転写体及び他方の支持手段が押されることとなる。このとき、被転写体には大きな押圧力が作用することとなり、被転写体の材質や構造によっては歪みなどの損傷が生じる虞がある。 In such a configuration, proper holding is not always performed due to a difference between a mechanism for moving the first support means in the first drive means and a mechanism for moving the second support means in the second drive means. There is. For example, if there is a difference in the pressing force between the two support means due to the difference between the mechanisms, the transfer medium and the other support means are pushed by the one support means having a large pressing force. At this time, a large pressing force acts on the member to be transferred, and there is a possibility that damage such as distortion may occur depending on the material and structure of the member to be transferred.
 他方で、本態様では、第1駆動手段と第2駆動手段との機構に差異が生じる場合であっても、第1駆動手段により移動される第1支持手段の位置を固定した上で、第2駆動手段により移動される第2支持手段で被転写体を第1支持手段に押しつけることで固定を行なっている。このため、被転写体に加えられる力は、基本的には第2駆動手段によるものとなり、過剰な力の作用により被転写体に歪みや損傷が生じることを好適に抑制出来る。 On the other hand, in this aspect, even if a difference occurs in the mechanism between the first drive means and the second drive means, the position of the first support means moved by the first drive means is fixed, The fixing is performed by pressing the transfer medium against the first support means by the second support means moved by the two drive means. For this reason, the force applied to the transfer object is basically due to the second driving means, and it is possible to suitably suppress the transfer object from being distorted or damaged by the action of excessive force.
 また、第1駆動手段は、第1駆動手段自体の動作、又は第1駆動手段により移動される第1支持手段の動作を制動し、第1支持手段を固定するための制動部を備えて構成されていてもよい。このような制動部とは、例えば第1駆動手段のアクチュエータに設けられる電磁ブレーキなどであり、電流の供給に応じてアクチュエータ内の回転子に摩擦力を付加し、アクチュエータ駆動を制動することで第1支持手段を固定する。 The first driving means includes a braking unit for braking the operation of the first driving means itself or the operation of the first supporting means moved by the first driving means, and fixing the first supporting means. May be. Such a braking unit is, for example, an electromagnetic brake or the like provided in the actuator of the first drive means, and applies a frictional force to the rotor in the actuator in response to the supply of current to brake the actuator drive. 1 Support means is fixed.
 また、第2駆動手段は、第2支持手段が被転写体に加える力の制御を行なうための、制御部を備えていてもよい。このような制御部は、例えば、第2駆動手段のアクチュエータへの供給電流を調整することで、第2駆動手段のアクチュエータの回転トルクを制御し、第2支持手段が加える力を制御する。 Further, the second driving means may include a control unit for controlling the force applied by the second support means to the transfer target. Such a control part controls the rotational torque of the actuator of the 2nd drive means by adjusting the electric current supplied to the actuator of the 2nd drive means, for example, and controls the force which a 2nd support means applies.
 また本態様における第1駆動手段及び第2駆動手段の夫々は、上述した各種動作が実現可能な限りにおいてその構成に制限を受けるものではなく、上述した以外の構成であってもよく、何らかの公知の構成であってもよい。 In addition, each of the first driving unit and the second driving unit in this aspect is not limited to the configuration as long as the various operations described above can be realized, and may have a configuration other than the above, and any known It may be configured as follows.
 本発明の転写装置に係る第1実施形態の他の態様では、前記第2支持手段が前記被転写体に加える力を制御する制御手段を更に備える。 In another aspect of the first embodiment of the transfer apparatus of the present invention, the transfer device further includes control means for controlling the force applied to the transfer target by the second support means.
 この態様によれば、制御手段により、第2支持手段が被転写体に加える力が、典型的には予め設定される閾値を超えないよう制御される。このため、本態様によれば、第1の方向に位置を固定した第1支持手段を配置し、第1の方向とは反対の方向から押圧力を適宜調整された第2支持手段によって被転写体を押圧することで、被転写体を挟み込むことによって保持が可能となる。 According to this aspect, the control unit controls the force applied by the second support unit to the transfer target so that it typically does not exceed a preset threshold value. For this reason, according to this aspect, the first support means whose position is fixed in the first direction is arranged, and the object to be transferred is transferred by the second support means in which the pressing force is appropriately adjusted from the direction opposite to the first direction. By pressing the body, the object to be transferred can be held by being sandwiched.
 この態様においては、第2支持手段が被転写体に加える力は、好適には、被転写体を充分に保持可能であるとともに、第1支持手段と第2支持手段とにより狭持される被転写体に歪みや損傷の生じない程度に設定される。従って、このような力の上限となる閾値は、少なくとも被転写体の材質や構造などの特性に応じて、被転写体に歪みや損傷が生じる上限となる力に対し充分余裕を持って設定されることが好ましい。 In this aspect, the force that the second support means applies to the transfer target is preferably capable of holding the transfer target sufficiently and being held between the first support and the second support. It is set to such an extent that distortion and damage do not occur on the transfer body. Therefore, the threshold value that is the upper limit of such force is set with a sufficient margin for the upper limit force that causes distortion or damage to the transferred body, at least according to the characteristics of the material and structure of the transferred body. It is preferable.
 このように構成することで、第1支持手段と第2支持手段とにより挟み込まれる方向の厚さの異なる複数種の被転写体の夫々に対しても、常に適切な押圧力による保持を実現出来る。 With such a configuration, it is possible to always hold the plurality of types of transferred objects having different thicknesses in the direction sandwiched between the first support means and the second support means by appropriate pressing force. .
 本発明の転写装置に係る第1実施形態の他の態様では、前記制御手段は、前記第2支持手段が前記被転写体から所定の距離まで接近するように前記第2支持手段の位置制御を行ない、且つ前記第2支持手段が前記所定の距離まで接近した後に、前記第2支持手段の押圧力の制御を開始する。 In another aspect of the first embodiment of the transfer apparatus of the present invention, the control means controls the position of the second support means so that the second support means approaches a predetermined distance from the transfer target. And after the second support means approaches the predetermined distance, control of the pressing force of the second support means is started.
 この態様によれば、制御手段は、第2支持手段が被転写体から所定の距離まで接近するまでは、第2支持手段が被転写体に加える力(言い換えれば、第2支持手段が被転写体方向に進むための推力など)の制御を開始しない。このため、制御手段は、第2支持手段が被転写体から所定の距離まで接近するまでは、例えば第2支持手段の位置に基づく位置制御により、第2支持手段の移動を制御する。 According to this aspect, the control means is configured such that the force that the second support means applies to the transferred body until the second support means approaches a predetermined distance from the transferred body (in other words, the second support means is transferred to the transferred body). Do not start control of thrust to move in the body direction. Therefore, the control unit controls the movement of the second support unit by, for example, position control based on the position of the second support unit until the second support unit approaches a predetermined distance from the transfer target.
 このように構成することで、第2支持手段が被転写体の近傍まで接近するまでは、制御手段の位置制御により移動する。また、所定の距離まで接近したときに制御手段は、第2支持手段に対して、上述のように制御された力を被転写体に加えるよう、動作を制御する。 With this configuration, the second support unit moves by position control of the control unit until it approaches the vicinity of the transfer target. Further, when approaching to a predetermined distance, the control unit controls the operation so that the force controlled as described above is applied to the second support unit.
 本発明の転写装置に係る第2実施形態は、第1モールドに形成されたパターンを被転写体の第1の面に転写し、且つ第2モールドに形成されたパターンを前記被転写体の第2の面に転写する転写装置であって、前記被転写体を保持する被転写体保持手段と、前記被転写体を第1の方向から支持する第1支持手段と、前記第1支持手段に支持された前記被転写体に対して、前記第1の方向とは異なる第2の方向から前記被転写体に力を加えることで、前記被転写体を前記第1支持手段に固定する第2支持手段と、前記第2支持手段が前記被転写体に力を加えている間、前記第1支持手段の位置を固定する固定手段とを備える。 In the second embodiment of the transfer apparatus of the present invention, the pattern formed on the first mold is transferred to the first surface of the transfer object, and the pattern formed on the second mold is transferred to the first surface of the transfer object. A transfer device for transferring to the second surface, a transfer object holding means for holding the transfer object, a first support means for supporting the transfer object from a first direction, and a first support means. A second force fixing the transferred body to the first support means by applying a force to the transferred body from a second direction different from the first direction with respect to the supported transferred body. A support unit; and a fixing unit that fixes a position of the first support unit while the second support unit applies a force to the transfer target.
 本発明の転写装置に係る第2実施形態によれば、第1モールドを保持する第1モールド保持手段と、第2モールドを保持する第2モールド保持手段との二つのモールドを保持する手段を有する。これらの二つのモールドのうち第1モールドは被転写体の第1の面に、第2モールドは被転写体の第2の面に密着して押圧されることで、夫々のモールドに形成されたパターンの転写が被転写体の両面に行なわれる。このとき、夫々の押圧は相前後して行なわれてもよく、また同時に行なわれてもよい。例えば、第1の面と第2の面とが互いに反対側に設けられる被転写体を用いる場合、第1モールドと第2モールドとで被転写体を挟み込み、両面から押圧することで同時に転写を行なってもよい。 According to the second embodiment of the transfer apparatus of the present invention, it has means for holding two molds, a first mold holding means for holding the first mold and a second mold holding means for holding the second mold. . Of these two molds, the first mold was pressed against the first surface of the transferred body and the second mold was pressed against the second surface of the transferred body, thereby forming each mold. Pattern transfer is performed on both sides of the transfer object. At this time, each pressing may be performed in succession, or may be performed simultaneously. For example, when using a transfer object in which the first surface and the second surface are provided on opposite sides, the transfer object is sandwiched between the first mold and the second mold, and the transfer is performed simultaneously by pressing from both surfaces. You may do it.
 更に、本発明の転写装置に係る第2実施形態によれば、上述した本発明の転写装置に係る第1実施形態と同様の各種効果を享受することが出来る。 Furthermore, according to the second embodiment of the transfer device of the present invention, various effects similar to those of the first embodiment of the transfer device of the present invention described above can be enjoyed.
 尚、本発明の転写装置に係る第3実施形態においても、上述した本発明の転写装置に係る第1実施形態の各種態様と同様の各種態様を採ることが可能である。 In the third embodiment related to the transfer device of the present invention, it is possible to adopt various aspects similar to the various aspects of the first embodiment related to the transfer apparatus of the present invention described above.
 本発明の転写装置に係る第3実施形態は、制御装置からの指示に応じて動作し、モールドに形成されたパターンを被転写体に転写する転写装置であって、前記制御装置の指示に応じて、前記被転写体を第1の方向から支持する第1支持手段と、前記制御装置の指示に応じて、前記第1支持手段に支持された前記被転写体に対して、前記第1の方向とは異なる第2の方向から前記被転写体に力を加えることで、前記被転写体を前記第1支持手段に固定する第2支持手段と、前記制御装置の指示に応じて、前記第2支持手段が前記被転写体に力を加えている間、前記第1支持手段の位置を固定する固定手段とを備える。 The third embodiment according to the transfer device of the present invention is a transfer device that operates in accordance with an instruction from a control device and transfers a pattern formed on a mold to a transfer target, and in response to an instruction from the control device. The first support means for supporting the transfer body from the first direction, and the first transfer means supported by the first support means in response to an instruction from the control device A second support means for fixing the transfer body to the first support means by applying a force to the transfer body from a second direction different from the direction; and the second support means according to an instruction from the control device. And a fixing unit that fixes the position of the first supporting unit while the supporting unit applies a force to the transfer target.
 本発明の転写装置に係る第3実施形態によれば、当該転写装置に接続される制御装置からの指示に基づき、上述の本発明の転写装置に係る第1実施形態における各部と同様の動作が実施可能である。このため、本発明の転写装置に係る第3実施形態によれば、上述した本発明の転写装置に係る第1実施形態と同様の各種効果を享受することが出来る。 According to the third embodiment of the transfer device of the present invention, operations similar to those in the first embodiment of the transfer device of the present invention described above are performed based on instructions from a control device connected to the transfer device. It can be implemented. For this reason, according to 3rd Embodiment which concerns on the transfer apparatus of this invention, the various effects similar to 1st Embodiment which concerns on the transfer apparatus of this invention mentioned above can be enjoyed.
 尚、本発明の転写装置に係る第3実施形態においても、上述した本発明の転写装置に係る第1実施形態の各種態様と同様の各種態様を採ることが可能である。 In the third embodiment related to the transfer device of the present invention, it is possible to adopt various aspects similar to the various aspects of the first embodiment related to the transfer apparatus of the present invention described above.
 本発明の転写方法に係る第1実施形態は、モールドに形成されたパターンを被転写体に転写する転写装置における転写方法であって、第1支持手段を用いて、前記被転写体を第1の方向から支持する第1支持工程と、前記第1支持手段に支持された前記被転写体に対して、前記第1の方向とは異なる第2の方向から前記被転写体に力を加えることで、前記被転写体を前記第1支持手段に固定する第2支持工程と、前記第2支持工程において前記被転写体に力を加えている間、前記第1支持手段の位置を固定する固定工程とを備える。 1st Embodiment which concerns on the transfer method of this invention is a transfer method in the transfer apparatus which transfers the pattern formed in the mold to a to-be-transferred body, Comprising: The said to-be-transferred object is 1st using a 1st support means. Applying a force to the transferred object from a second direction different from the first direction with respect to the first supporting step of supporting from the first direction and the transferred object supported by the first supporting means. And a second supporting step for fixing the transferred body to the first supporting means, and a fixing for fixing the position of the first supporting means while applying a force to the transferred body in the second supporting step. A process.
 本発明の転写方法に係る第1実施形態によれば、上述した本発明の転写装置に係る第1実施形態と同様の各種効果を享受することが出来る。 According to the first embodiment of the transfer method of the present invention, various effects similar to those of the first embodiment of the transfer apparatus of the present invention described above can be enjoyed.
 尚、本発明の転写方法に係る第1実施形態においても、上述した本発明の転写装置に係る第1実施形態の各種態様と同様の各種態様を採ることが可能である。 In the first embodiment related to the transfer method of the present invention, it is possible to adopt various aspects similar to the various aspects of the first embodiment related to the transfer apparatus of the present invention described above.
 本発明の転写方法に係る第2実施形態は、第1モールドに形成されたパターンを被転写体の第1の面に転写し、且つ第2モールドに形成されたパターンを前記被転写体の第2の面に転写する転写装置における転写方法であって、第1支持手段を用いて、前記被転写体を第1の方向から支持する第1支持工程と、前記第1支持手段に支持された前記被転写体に対して、前記第1の方向とは異なる第2の方向から前記被転写体に力を加えることで、前記被転写体を前記第1支持手段に固定する第2支持工程と、前記第2支持工程において前記被転写体に力を加えている間、前記第1支持手段の位置を固定する固定工程とを備える。 In the second embodiment of the transfer method of the present invention, the pattern formed on the first mold is transferred to the first surface of the transfer object, and the pattern formed on the second mold is transferred to the first surface of the transfer object. A transfer method in a transfer device for transferring to a second surface, wherein a first support step is used to support the transfer object from a first direction by using a first support means, and the first support means supports the transfer object. A second support step of fixing the transferred body to the first support means by applying a force to the transferred body from a second direction different from the first direction with respect to the transferred body; A fixing step of fixing the position of the first support means while applying a force to the transfer target in the second support step.
 本発明の転写方法に係る第2実施形態によれば、上述した本発明の転写装置に係る第2実施形態と同様の各種効果を享受することが出来る。 According to the second embodiment of the transfer method of the present invention, various effects similar to those of the second embodiment of the transfer apparatus of the present invention described above can be enjoyed.
 尚、本発明の転写方法に係る第2実施形態においても、上述した本発明の転写装置に係る第1実施形態の各種態様と同様の各種態様を採ることが可能である。 In the second embodiment related to the transfer method of the present invention, it is possible to adopt various aspects similar to the various aspects of the first embodiment related to the transfer apparatus of the present invention described above.
 本発明のコンピュータプログラムに係る実施形態は、モールドに形成されたパターンを被転写体に転写する転写装置を動作させるためのコンピュータプログラムであって、第1支持手段を用いて、前記被転写体を第1の方向から支持する第1支持工程と、前記第1支持手段に支持された前記被転写体に対して、前記第1の方向とは異なる第2の方向から前記被転写体に力を加えることで、前記被転写体を前記第1支持手段に固定する第2支持工程と、前記第2支持工程において前記被転写体に力を加えている間、前記第1支持手段の位置を固定する固定工程とを前記転写装置に実行させる。 An embodiment according to the computer program of the present invention is a computer program for operating a transfer device that transfers a pattern formed on a mold to a transfer object, and the transfer object is transferred using a first support means. A force is applied to the transferred object from a second direction different from the first direction, with respect to the first supporting step of supporting from the first direction and the transferred object supported by the first supporting means. In addition, the position of the first support means is fixed while a force is applied to the transfer object in the second support process, and a second support process for fixing the transfer object to the first support means. And a fixing process to be executed by the transfer device.
 本発明のコンピュータプログラムに係る実施形態によれば、当該コンピュータプログラムを格納するROM、CD-ROM、DVD-ROM、ハードディスク等の記録媒体から、当該コンピュータプログラムをコンピュータに読み込んで実行させれば、或いは、当該コンピュータプログラムを、通信手段を介してコンピュータにダウンロードさせた後に実行させれば、上述した本発明の転写方法に係る実施形態における各種動作を転写装置に比較的簡単に実行させることが出来る。 According to the embodiment of the computer program of the present invention, the computer program is read from a recording medium such as a ROM, a CD-ROM, a DVD-ROM, and a hard disk that stores the computer program, and executed. If the computer program is executed after being downloaded to a computer via communication means, the transfer device can execute the various operations in the above-described transfer method according to the present invention relatively easily.
 尚、本発明のコンピュータプログラムに係る実施形態においても、上述した本発明の転写方法に係る第1実施形態の各種態様と同様の各種態様を採ることが可能である。 In the embodiment relating to the computer program of the present invention, it is possible to adopt various aspects similar to the various aspects of the first embodiment relating to the transfer method of the present invention described above.
 以上説明したように、本発明の転写装置に係る第1の実施形態、第2の実施形態及び第3の実施形態は、第1支持手段と、第2支持手段と、固定手段とを備える。本発明の転写方法に係る第1の実施形態及び第2の実施形態は、第1支持工程と、第2支持工程と、固定工程とを備える。本発明のコンピュータプログラムに係る実施形態は、第1支持工程と、第2支持工程と、固定工程とを転写装置に実行させる。従って、様々な厚さを有する種々の被転写体に対して、損傷が生じることが無いよう、適切に保持の態様を調節可能となる。 As described above, the first embodiment, the second embodiment, and the third embodiment according to the transfer apparatus of the present invention include the first support means, the second support means, and the fixing means. The first and second embodiments according to the transfer method of the present invention include a first support step, a second support step, and a fixing step. The embodiment according to the computer program of the present invention causes the transfer apparatus to execute the first support process, the second support process, and the fixing process. Therefore, it is possible to appropriately adjust the holding mode so that various transfer materials having various thicknesses are not damaged.
 本発明の転写装置及び方法並びにコンピュータプログラムに係る各種実施形態の作用及び他の利得について、以下に示す実施例を用いてより詳細に説明する。 The operation and other gains of various embodiments relating to the transfer apparatus and method and the computer program of the present invention will be described in more detail with reference to the following examples.
 以下、図面を参照して、本発明の実施例について説明する。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.
 (1)基本構成例
 先ず、図1を参照して、本発明の転写装置の基本的な構成について説明する。図1は、本発明の転写装置の一実施例である、ディスクリートトラックメディア(DTM)やビットパターンドメディア(BPM)などのハードディスク製造工程に用いられるインプリント装置1の構成を概略的に示す模式図である。
(1) Basic Configuration Example First, the basic configuration of the transfer apparatus of the present invention will be described with reference to FIG. FIG. 1 is a schematic diagram schematically showing a configuration of an imprint apparatus 1 used in a manufacturing process of a hard disk such as a discrete track medium (DTM) or a bit patterned medium (BPM), which is an embodiment of a transfer apparatus of the present invention. FIG.
 図1に示すインプリント装置1は、UV照射により硬化する転写層を備える被転写体に対してモールド上のパターンを転写するUV式の転写装置である。また、インプリント装置1は、転写する凹凸などのパターンが形成される下側モールド200a及び上側モールド200bを用いて、被転写体である基板300の下面に形成される下側転写層301a及び上面に形成される上側転写層301bの両方に対して転写を行なう構成である。 The imprint apparatus 1 shown in FIG. 1 is a UV-type transfer apparatus that transfers a pattern on a mold to a transfer target having a transfer layer that is cured by UV irradiation. Further, the imprint apparatus 1 uses the lower mold 200a and the upper mold 200b on which patterns such as unevenness to be transferred are formed, and the lower transfer layer 301a and the upper surface formed on the lower surface of the substrate 300 that is a transfer target. In this configuration, transfer is performed on both of the upper transfer layer 301b formed on the substrate.
 尚、図1には、下側モールド200a、上側モールド200b及び基板300の夫々が設置された状態のインプリント装置1が図示されている。 1 shows the imprint apparatus 1 in a state where the lower mold 200a, the upper mold 200b, and the substrate 300 are installed.
 下側モールド200aは、図2(a)に示されるように、中心部にセンターホールを有する円盤状又は円盤に準じた形状であり、パターン面のセンターホール近傍に凹凸などのパターンが形成されるパターン領域が構成される。各モールドの少なくともパターン領域に相当する部位は、例えば石英ガラスなど、UV光を透過し、好適にはUV光の照射による形質変化などの影響が生じ難い材質により構成される。尚、便宜上パターン面のパターン領域外を非パターン領域と記載する。尚、上側モールド200bも下側モールド200aと同様の構成である。また、下側モールド200a及び上側モールド200bのパターン面には、後述する離型時においてモールドと基板の離型性向上を目的とした表面処理、例えば、シランカップリング剤等による表面処理を施し、単分子から数分子程度の厚さを有する離型層が形成されている。 As shown in FIG. 2A, the lower mold 200a has a disk shape having a center hole in the center or a shape similar to the disk, and a pattern such as irregularities is formed near the center hole on the pattern surface. A pattern area is constructed. At least a portion corresponding to the pattern region of each mold is made of a material that transmits UV light, such as quartz glass, and is preferably hardly affected by a change in character due to irradiation with UV light. For convenience, the outside of the pattern area on the pattern surface is referred to as a non-pattern area. The upper mold 200b has the same configuration as the lower mold 200a. Further, the pattern surface of the lower mold 200a and the upper mold 200b is subjected to a surface treatment for the purpose of improving mold releasability of the mold and the substrate at the time of mold release described later, for example, a surface treatment with a silane coupling agent or the like, A release layer having a thickness of a single molecule to several molecules is formed.
 本実施例では、下側モールド200aは、本発明の「モールド」又は「第2モールド」の一具体例であり、上側モールド200bは、本発明の「モールド」又は「第1モールド」の一具体例である。 In this embodiment, the lower mold 200a is a specific example of the “mold” or “second mold” of the present invention, and the upper mold 200b is a specific example of the “mold” or “first mold” of the present invention. It is an example.
 基板300は、中心部にモールドのセンターホールより径の小さいセンターホールを有する円盤状の形状であり、例えば、ガラス基板の下面及び上面にUV照射により硬化する材質より成る下側転写層301a及び上側転写層301bが塗布されたものである。 The substrate 300 has a disk shape having a center hole having a diameter smaller than that of the center hole of the mold at the center. For example, the lower transfer layer 301a and the upper transfer layer 301a made of a material that is cured by UV irradiation are formed on the lower and upper surfaces of the glass substrate. The transfer layer 301b is applied.
 インプリント装置1は、図1に示すように下側基台110aを含む下側機構部Aと、上側基台110bを含む上側機構部Bと、下側基台110a及び上側基台110bを連結するボールネジ101と、該ボールネジを回転させるアクチュエータ104と、下側機構部A及び上側機構部Bの動作を制御する制御部102と、該制御部102に対してユーザの指示を入力可能な操作部103とを備えて構成される。 As shown in FIG. 1, the imprint apparatus 1 connects a lower mechanism part A including a lower base 110a, an upper mechanism part B including an upper base 110b, and the lower base 110a and the upper base 110b. A ball screw 101 that rotates, an actuator 104 that rotates the ball screw, a control unit 102 that controls the operation of the lower mechanism unit A and the upper mechanism unit B, and an operation unit that can input user instructions to the control unit 102 103.
 下側機構部Aは、下側基台110aの上面に設けられ、下側センターピン120aと、下側UV照射部130aと、下側センターピン駆動部140aと、下側載置台150aと、下側モールド保持部152aと、下側モールドクランプ153aとを備えて構成される。下側モールドクランプ153aは複数設けられており、後述する図2(C)に示される位置に配置されている。 The lower mechanism A is provided on the upper surface of the lower base 110a, and includes a lower center pin 120a, a lower UV irradiation unit 130a, a lower center pin driving unit 140a, a lower mounting table 150a, A side mold holding part 152a and a lower mold clamp 153a are provided. A plurality of lower mold clamps 153a are provided, and are arranged at positions shown in FIG.
 下側基台110aは、ボード上の部材であって、下側載置台150aと下側開口部151aとが設けられると共に、ボールネジ101がねじ込まれるネジ溝が切られているネジ穴部が存在する。 The lower base 110a is a member on the board. The lower base 110a is provided with a lower mounting table 150a and a lower opening 151a, and has a screw hole portion in which a screw groove into which the ball screw 101 is screwed is cut. .
 下側センターピン120aは、本発明の「被転写体保持手段」の一具体例を構成する部材であって、夫々径の異なる円柱状の先端部121a、基板支持部122a及びモールド支持部123aを有する部材である。下側センターピン120aは、下端が後述する下側センターピン駆動部140aに連結され、後述する下側載置台150aのセンターホール及び下側開口部151aを貫通する態様で、後述する下側モールド保持面Saに対して垂直となるよう支持されている。 The lower center pin 120a is a member that constitutes a specific example of the “transfer object holding unit” of the present invention, and includes a cylindrical tip portion 121a, a substrate support portion 122a, and a mold support portion 123a having different diameters. It is a member having. The lower center pin 120a is connected to a lower center pin driving unit 140a, which will be described later, and penetrates a center hole and a lower opening 151a of the lower mounting table 150a, which will be described later. It is supported so as to be perpendicular to the surface Sa.
 下側センターピン120aの先端部121aの径は基板支持部122a及び後述する基板300のセンターホールの夫々の径より小さい。また、基板支持部122aの径は、基板300のセンターホールの径より大きく、モールド支持部123a、後述する下側モールド200a及び上側モールド200bのセンターホールの夫々の径より小さい。また、モールド支持部123aの径は、下側モールド200a及び上側モールド200bのセンターホールの径より大きく、且つ下側載置台150aのセンターホール及び下側開口部151aの夫々の径より小さい。 The diameter of the tip 121a of the lower center pin 120a is smaller than the diameter of the substrate support 122a and the center hole of the substrate 300 described later. The diameter of the substrate support portion 122a is larger than the diameter of the center hole of the substrate 300, and smaller than the diameters of the center holes of the mold support portion 123a, the lower mold 200a and the upper mold 200b described later. Moreover, the diameter of the mold support part 123a is larger than the diameters of the center holes of the lower mold 200a and the upper mold 200b and smaller than the diameters of the center hole and the lower opening 151a of the lower mounting table 150a.
 下側UV照射部130aは、不図示の信号線などを介して制御部102と電気的に接続されており、制御部102から供給される制御信号に応じて基板300の下側転写層301aを硬化させるUV光を下側開口部151a及び後述する下側載置台150aのUV光透過領域を介して、基板300の下側転写層301aに照射する。尚、下側UV照射部130aは、転写動作におけるUV光の照射時など、必要時以外は退避している構成であってもよい。 The lower UV irradiation unit 130a is electrically connected to the control unit 102 via a signal line (not shown), and the lower transfer layer 301a of the substrate 300 is applied in accordance with a control signal supplied from the control unit 102. The lower transfer layer 301a of the substrate 300 is irradiated with UV light to be cured through the lower opening 151a and the UV light transmission region of the lower mounting table 150a described later. The lower UV irradiation unit 130a may be configured to be retracted except when necessary, such as when UV light is irradiated in the transfer operation.
 下側センターピン駆動部140aは、下側機構部Aにおける本発明の「被転写体保持手段」の一具体例の一部を構成し、制御部102から供給される制御信号に応じて、下側センターピン120aを軸方向、つまり下側載置台150aの下側モールド保持面Saに垂直な方向に移動する。 The lower center pin driving unit 140a constitutes a part of a specific example of the “transfer object holding unit” of the present invention in the lower mechanism unit A, and the lower center pin driving unit 140a corresponds to a lower control signal supplied from the controller 102. The side center pin 120a is moved in the axial direction, that is, in a direction perpendicular to the lower mold holding surface Sa of the lower mounting table 150a.
 また、下側センターピン駆動部140aは、後述する転写動作の後の下側モールド200aと基板300との離型時に、下側センターピン120aを垂直上方向に移動させることで基板300を下側モールド200aから離型させる構成であり、本実施例における「離型手段」又は「第2離型手段」の一具体例でもある。 In addition, the lower center pin driving unit 140a moves the lower center pin 120a vertically upward when releasing the lower mold 200a and the substrate 300 after a transfer operation described later. The mold 200a is released from the mold 200a, and is also a specific example of "release means" or "second release means" in this embodiment.
 本実施例の下側センターピン駆動部140aは、下側圧力センサ141aを備えて構成される。下側圧力センサ141aは、本実施例の下側機構部Aにおける「検出手段」の一具体例であって、下側センターピン駆動部140aに接続される下側センターピン120aにかかる圧力を検出し、検出した圧力情報を制御部102へ送信する。ここで、下側センターピン120aにかかる圧力とは、下側モールド200aに密着させた基板300に接する下側センターピン120aが上方向に移動するのに抵抗する力を一例とし、典型的には、下側モールド200aと基板300の密着面に作用する力により下側センターピン120aにかかる圧力を示す趣旨である。 The lower center pin driving unit 140a of the present embodiment includes a lower pressure sensor 141a. The lower pressure sensor 141a is a specific example of “detecting means” in the lower mechanism portion A of the present embodiment, and detects the pressure applied to the lower center pin 120a connected to the lower center pin driving portion 140a. Then, the detected pressure information is transmitted to the control unit 102. Here, the pressure applied to the lower center pin 120a is, for example, a force that resists the upward movement of the lower center pin 120a in contact with the substrate 300 in close contact with the lower mold 200a. In other words, the pressure applied to the lower center pin 120a due to the force acting on the contact surface between the lower mold 200a and the substrate 300 is shown.
 下側載置台150aは、下側モールド200aを保持するための平坦な下側モールド保持面Saを有し、該下側モールド保持面Saには、中心部にセンターホールが設けられると共に、下側モールド保持部152aと下側モールドクランプ153aとが設けられる。また、下側載置台150aの下側モールド保持面Saは、典型的には、下側モールド200aのパターン領域より広く構成されている。下側載置台150aは、下側モールド200aを基板300に合わせて位置合わせするために、下側モールド保持面Sa方向にアライメント調整可能に構成される。 The lower mounting table 150a has a flat lower mold holding surface Sa for holding the lower mold 200a, and the lower mold holding surface Sa is provided with a center hole in the center portion, and a lower side. A mold holding part 152a and a lower mold clamp 153a are provided. Further, the lower mold holding surface Sa of the lower mounting table 150a is typically configured wider than the pattern area of the lower mold 200a. The lower mounting table 150a is configured to be capable of alignment adjustment in the direction of the lower mold holding surface Sa in order to align the lower mold 200a with the substrate 300.
 下側載置台150aのうち、少なくとも載置される下側モールド200aのパターンが形成される領域に対応する領域は、例えば石英ガラスなどのUV光を透過し、且つUV光の照射により形質変化などの生じ難い材質により構成されるUV光透過領域である。尚、下側基台110aの開口部151aは、下側載置台150aのUV光透過領域に対応する領域に形成されている。 Of the lower mounting table 150a, at least the region corresponding to the region where the pattern of the lower mold 200a to be mounted is formed is transparent to UV light such as quartz glass, and has a phenotypic change by irradiation with UV light. This is a UV light transmission region made of a material that is difficult to generate. The opening 151a of the lower base 110a is formed in a region corresponding to the UV light transmission region of the lower mounting table 150a.
 下側モールド保持部152aは、下側機構部Aにおける本発明の「モールド保持手段」又は「第2モールド保持手段」の一具体例であって、真空吸着などにより下側モールド200aを保持するための吸着溝155aを有する吸着部154aと、該吸着部154aを支持する弾性部材156aとを備える。 The lower mold holding part 152a is a specific example of the "mold holding means" or "second mold holding means" of the present invention in the lower mechanism part A, and holds the lower mold 200a by vacuum suction or the like. A suction portion 154a having a suction groove 155a and an elastic member 156a that supports the suction portion 154a.
 図2(b)は、下側載置台150aを上方(より具体的には、下側モールド保持面Saに対して垂直上方。以降、垂直上方向又は単に上方と記載し、垂直下方については、垂直下方向又は下方と記載する)から見た場合の各部の配置を示す模式図である。 FIG. 2B shows the lower mounting table 150a upward (more specifically, vertically upward with respect to the lower mold holding surface Sa. Hereinafter, the vertical upper direction or simply upward will be described. It is a schematic diagram which shows arrangement | positioning of each part at the time of seeing from the perpendicular | vertical downward direction or the downward direction.
 吸着部154aは、図2(b)に示されるように、載置される下側モールド200aの外周縁部において吸着を行なうように、下側モールド保持面Saの対応する領域に形成される溝内に配置される。吸着部154aは、接触部において下側モールド200aを傷つけないように、例えば、柔軟な樹脂製の部材などで構成されることが好ましい。 As shown in FIG. 2B, the suction portion 154a is a groove formed in a corresponding region of the lower mold holding surface Sa so as to perform suction at the outer peripheral edge portion of the lower mold 200a to be placed. Placed inside. The suction portion 154a is preferably configured with, for example, a flexible resin member so as not to damage the lower mold 200a at the contact portion.
 吸着溝155aは、接続される真空ポンプなどの減圧機構(不図示)の動作により、溝内の気圧が低減されることで下側モールド200aを吸着部154aに吸着可能に構成される。 The suction groove 155a is configured to be able to suck the lower mold 200a to the suction portion 154a by reducing the atmospheric pressure in the groove by the operation of a decompression mechanism (not shown) such as a connected vacuum pump.
 弾性部材156aは、下側モールド保持面Saに形成される溝内に配置され、吸着部154aを支持する。弾性部材156aは、樹脂などの弾性を有する部材、又はバネなどの機械的な構造により吸着部154aと下側載置台150aとの間に弾性力を付勢可能な構成である。弾性部材156aの存在により、吸着部154aは、例えば後述する下側モールドクランプ153aによって垂直下方に押圧されることで、該押圧のための力と、弾性部材156aからの弾性力とが釣り合う位置まで移動する。 The elastic member 156a is disposed in a groove formed in the lower mold holding surface Sa and supports the suction portion 154a. The elastic member 156a is configured to be able to bias an elastic force between the adsorbing portion 154a and the lower mounting table 150a by a member having elasticity such as a resin or a mechanical structure such as a spring. Due to the presence of the elastic member 156a, the suction portion 154a is pressed vertically downward by, for example, a lower mold clamp 153a to be described later, so that the force for pressing and the elastic force from the elastic member 156a are balanced. Moving.
 尚、下側モールド保持部152a及び下側載置台150aの形状は、後述する下側モールド200aの変形に適した形状であることが好ましく、このような形状については、後に詳述する。 In addition, it is preferable that the shape of the lower mold holding part 152a and the lower mounting table 150a is a shape suitable for deformation of the lower mold 200a described later, and such a shape will be described in detail later.
 下側モールドクランプ153aは、下側機構部Aにおける本発明の「モールド保持手段」又は「第2モールド保持手段」の一具体例であって、下側載置台150aにおける下側モールド200aが載置される位置より更に外周縁部に、複数設けられているクランプ機構である。下側モールドクランプ153aは、制御部102からの制御信号に応じた圧力で下側モールド200aの非パターン領域を下方に向けて押圧することで下側モールド200aを保持可能な構成である。また、下側モールドクランプ153aは、制御部102からの制御信号に応じて、下側モールド200aを保持するために必要な押圧力より強い力で下側モールド200aを押圧することで、下側モールド保持部152aの弾性部材156aと共に下側モールド200aを弾性変形させることが可能である。以下、モールドを保持するための押圧力を保持力と記載し、モールドを変形させるための押圧力を変形力と記載する。 The lower mold clamp 153a is a specific example of the “mold holding unit” or the “second mold holding unit” of the present invention in the lower mechanism portion A, and the lower mold 200a on the lower mounting table 150a is placed on the lower mold clamp 153a. A plurality of clamping mechanisms are provided on the outer peripheral edge portion further than the position to be provided. The lower mold clamp 153a is configured to hold the lower mold 200a by pressing the non-pattern area of the lower mold 200a downward with pressure according to a control signal from the control unit 102. Further, the lower mold clamp 153a presses the lower mold 200a with a force stronger than the pressing force required to hold the lower mold 200a in accordance with a control signal from the control unit 102, thereby lowering the lower mold. The lower mold 200a can be elastically deformed together with the elastic member 156a of the holding portion 152a. Hereinafter, the pressing force for holding the mold is described as holding force, and the pressing force for deforming the mold is described as deformation force.
 ここで、図2(c)を参照して下側モールドクランプ153aの構造と配置について説明する。図2(c)は、下側モールド200aを押圧している状態の下側モールドクランプ153aを垂直上方向から見た場合の模式図に、更に後述する上側モールドクランプ153bの配置位置を重ねて示した図である。下側モールドクランプ153aは、下側モールド200aを押圧するために、円盤形状に合わせて下側モールド200aと同心円上に配置される複数の円弧状の部材より構成される。 Here, the structure and arrangement of the lower mold clamp 153a will be described with reference to FIG. FIG. 2C is a schematic view of the lower mold clamp 153a in a state where the lower mold 200a is being pressed as viewed from the vertically upward direction, and further illustrates the arrangement position of the upper mold clamp 153b described later. It is a figure. The lower mold clamp 153a is composed of a plurality of arc-shaped members arranged concentrically with the lower mold 200a in accordance with the disk shape in order to press the lower mold 200a.
 上側モールドクランプ153bも同様の円上に配置される複数の円弧状の部材より構成される。また、図2(c)に示されるように、下側モールドクランプ153aと上側モールドクランプ153bとは、夫々の円弧状の扇形の部材が互いに入れ違いとなり、両者を下側モールド保持面Saと平行な面上に投影する場合でも、互いに重ならないように配置されている。 The upper mold clamp 153b is also composed of a plurality of arc-shaped members arranged on the same circle. Further, as shown in FIG. 2C, the lower mold clamp 153a and the upper mold clamp 153b are configured such that respective arc-shaped fan-shaped members are mutually inserted and are parallel to the lower mold holding surface Sa. Even when projecting onto a surface, they are arranged so as not to overlap each other.
 続いて、図1に戻り、上側機構部Bについて説明する。 Subsequently, returning to FIG. 1, the upper mechanism B will be described.
 上側機構部Bは、上側基台110bの下面に設けられ、上側センターピン120bと、上側UV照射部130bと、上側センターピン駆動部140bと、上側載置台150bと、上側モールド保持部152bと、上側モールドクランプ153bとを備えて構成される。 The upper mechanism B is provided on the lower surface of the upper base 110b, and includes an upper center pin 120b, an upper UV irradiation unit 130b, an upper center pin driving unit 140b, an upper mounting table 150b, an upper mold holding unit 152b, And an upper mold clamp 153b.
 上側基台110bは、ボード上の部材であって、上側載置台150bと上側開口部151bとが設けられると共に、ボールネジ101がねじ込まれるネジ溝が切られているネジ穴部が存在する。 The upper base 110b is a member on the board, and is provided with an upper mounting table 150b and an upper opening 151b, and there is a screw hole portion in which a screw groove into which the ball screw 101 is screwed is cut.
 上側センターピン120bは、本発明の「被転写体保持手段」の一具体例を構成する部材であって、下側センターピン120aの基板支持部122aと同程度の径の先端部を有する円柱状の部材である。上側センターピン120bは、上端が後述する上側センターピン駆動部140bに連結され、後述する上側載置台150bのセンターホール及び上側開口部151bを貫通する態様で、下側モールド保持面Sa及び後述する上側モールド保持面Sbに対して垂直となるよう支持されている。 The upper center pin 120b is a member that constitutes a specific example of the “transfer object holding unit” of the present invention, and has a cylindrical shape having a tip portion having a diameter similar to that of the substrate support portion 122a of the lower center pin 120a. It is a member. The upper center pin 120b is connected to an upper center pin driving unit 140b, which will be described later, and penetrates a center hole and an upper opening 151b of the upper mounting table 150b, which will be described later. It is supported so as to be perpendicular to the mold holding surface Sb.
 上側UV照射部130bは、不図示の信号線などを介して制御部102と電気的に接続されており、制御部102から供給される制御信号に応じて基板300の上側転写層301bを硬化させるUV光を上側開口部151b及び後述する上側載置台150bのUV光透過領域を介して、基板300の上側転写層301bに照射する。尚、上側UV照射部130bは、転写動作におけるUV光の照射時など、必要時以外は退避している構成であってもよい。 The upper UV irradiation unit 130b is electrically connected to the control unit 102 via a signal line (not shown) and the like, and the upper transfer layer 301b of the substrate 300 is cured in accordance with a control signal supplied from the control unit 102. The upper transfer layer 301b of the substrate 300 is irradiated with UV light through the upper opening 151b and a UV light transmission region of the upper mounting table 150b described later. The upper UV irradiation unit 130b may be retracted except when necessary, such as when UV light is irradiated in the transfer operation.
 上側センターピン駆動部140bは、上側機構部Bにおける本発明の「被転写体保持手段」の一具体例の一部を構成し、制御部102から供給される制御信号に応じて、上側センターピン120bを軸方向、つまり上側載置台150bの上側モールド保持面Sbに垂直な方向に移動する。 The upper center pin driving unit 140b constitutes a part of a specific example of the “transfer object holding unit” of the present invention in the upper mechanism unit B, and the upper center pin driving unit 140b corresponds to a control signal supplied from the control unit 102. 120b is moved in the axial direction, that is, in a direction perpendicular to the upper mold holding surface Sb of the upper mounting table 150b.
 また、上側センターピン駆動部140bは、後述する転写動作の後の上側モールド200bと基板300との離型時に、上側センターピン120bを垂直下方向に押圧することで、基板300の垂直方向の位置を固定する構成であり、本実施例における「離型手段」又は「第1離型手段」の一部を構成する。 Further, the upper center pin driving unit 140b presses the upper center pin 120b in the vertical downward direction when the upper mold 200b and the substrate 300 after the transfer operation described later are released, thereby causing the vertical position of the substrate 300 to move. Is configured to constitute a part of the “release means” or the “first release means” in the present embodiment.
 本実施例の上側センターピン駆動部140bは、上側圧力センサ141bを備えて構成される。上側圧力センサ141bは、本実施例の上側機構部Bにおける「検出手段」の一具体例であって、上側センターピン駆動部140bに接続される上側センターピン120bにかかる圧力を検出し、検出した圧力情報を制御部102へ送信する。ここで、上側センターピン120bにかかる圧力とは、上側モールド200bに密着させた基板300に接する上側センターピン120bが下方向に移動するのに抵抗する力を一例とし、典型的には、上側モールド200bと基板300の密着面に作用する力により上側センターピン120bにかかる圧力を示す趣旨である。 The upper center pin driving unit 140b according to the present embodiment includes an upper pressure sensor 141b. The upper pressure sensor 141b is a specific example of “detection means” in the upper mechanism B of the present embodiment, and detects and detects the pressure applied to the upper center pin 120b connected to the upper center pin driving unit 140b. The pressure information is transmitted to the control unit 102. Here, the pressure applied to the upper center pin 120b is, for example, a force that resists the downward movement of the upper center pin 120b in contact with the substrate 300 in close contact with the upper mold 200b. The purpose is to indicate the pressure applied to the upper center pin 120b by the force acting on the contact surface between 200b and the substrate 300.
 上側載置台150bは、上側モールド200bを保持するための平坦な上側モールド保持面Sbを有し、該上側モールド保持面Sbには、中心部にセンターホールが設けられると共に、上側モールド保持部152bと上側モールドクランプ153bとが設けられる。また、上側載置台150bの上側モールド保持面Sbは、典型的には、上側モールド200bのパターン領域より広く構成されている。上側載置台150bは、上側モールド200bを基板300に合わせて位置合わせするために、上側モールド保持面Sb方向にアライメント調整可能に構成される。 The upper mounting table 150b has a flat upper mold holding surface Sb for holding the upper mold 200b. The upper mold holding surface Sb is provided with a center hole in the center portion, and the upper mold holding portion 152b. An upper mold clamp 153b is provided. In addition, the upper mold holding surface Sb of the upper mounting table 150b is typically configured to be wider than the pattern region of the upper mold 200b. The upper mounting table 150b is configured to be capable of alignment adjustment in the direction of the upper mold holding surface Sb in order to align the upper mold 200b with the substrate 300.
 上側載置台150bのうち、少なくとも載置される上側モールド200bのパターンが形成される領域に対応する領域は、例えば石英ガラスなどのUV光を透過し、且つUV光の照射により形質変化などの生じ難い材質により構成されるUV光透過領域である。尚、上側基台110bの開口部151bは、上側載置台150bのUV光透過領域に対応する領域に形成されている。 Of the upper mounting table 150b, at least a region corresponding to a region where the pattern of the upper mold 200b to be mounted is formed transmits UV light such as quartz glass, and changes in characteristics are caused by irradiation of the UV light. This is a UV light transmission region made of a difficult material. The opening 151b of the upper base 110b is formed in a region corresponding to the UV light transmission region of the upper mounting table 150b.
 上側モールド保持部152bは、上側機構部Bにおける本発明の「モールド保持手段」又は「第1モールド保持手段」の一具体例であって、真空吸着などにより上側モールド200bを保持するための吸着溝155bを有する吸着部154bと、該吸着部154bを支持する弾性部材156bとを備える。尚、吸着部154b、吸着溝155b及び弾性部材156bの夫々は、上側機構部Aの吸着部154a、吸着溝155a及び弾性部材156aと同様の構成である。 The upper mold holding part 152b is a specific example of the “mold holding means” or “first mold holding means” of the present invention in the upper mechanism part B, and is a suction groove for holding the upper mold 200b by vacuum suction or the like. A suction portion 154b having 155b and an elastic member 156b that supports the suction portion 154b are provided. Each of the suction portion 154b, the suction groove 155b, and the elastic member 156b has the same configuration as the suction portion 154a, the suction groove 155a, and the elastic member 156a of the upper mechanism portion A.
 上側モールドクランプ153bは、上側機構部Bにおける本発明の「モールド保持手段」又は「第1モールド保持手段」の一具体例であって、上側載置台150bにおける上側モールド200bが載置される位置より更に外周縁部に設けられるクランプ機構である。下側モールドクランプ同様に、上側モールドクランプ153bも複数設けられている。上側モールドクランプ153bは、制御部102からの制御信号に応じた圧力で上側モールド200bの非パターン領域を上方に向けて押圧することで上側モールド200bを保持可能な構成である。また、上側モールドクランプ153bは、制御部102からの制御信号に応じて、上側モールド200bを保持するために必要な押圧力より強い力で上側モールド200bを押圧することで、上側モールド保持部152bの弾性部材156bと共に上側モールド200bを弾性変形させることが可能である。 The upper mold clamp 153b is a specific example of the “mold holding unit” or the “first mold holding unit” of the present invention in the upper mechanism B, and is from a position where the upper mold 200b on the upper mounting table 150b is mounted. Furthermore, it is a clamp mechanism provided at the outer peripheral edge. Similar to the lower mold clamp, a plurality of upper mold clamps 153b are also provided. The upper mold clamp 153b is configured to hold the upper mold 200b by pressing the non-pattern area of the upper mold 200b upward with pressure according to a control signal from the control unit 102. Further, the upper mold clamp 153b presses the upper mold 200b with a force stronger than the pressing force necessary to hold the upper mold 200b in accordance with a control signal from the control unit 102, so that the upper mold holding unit 152b The upper mold 200b can be elastically deformed together with the elastic member 156b.
 制御部102は、例えばCPU(Central Processing Unit)などの情報処理装置であって、操作部103より供給されるユーザの指示を示す入力信号に応じて、下側機構部Aの下側UV照射部130a、下側センターピン駆動部140a及び下側モールドクランプ153a、上側機構部Bの上側UV照射部130b、上側センターピン駆動部140a及び上側モールドクランプ153b、並びにアクチュエータ104の各部の動作を制御する制御信号を供給する。 The control unit 102 is an information processing device such as a CPU (Central Processing Unit), for example, and the lower UV irradiation unit of the lower mechanism unit A according to an input signal indicating a user instruction supplied from the operation unit 103. 130a, the lower center pin driving unit 140a and the lower mold clamp 153a, the upper UV irradiation unit 130b of the upper mechanism B, the upper center pin driving unit 140a and the upper mold clamp 153b, and the control for controlling the operation of each part of the actuator 104. Supply the signal.
 操作部103は、ユーザにより指示を入力可能な複数のボタン又はキーボードなどにより構成され、入力されたユーザの指示に応じた入力信号を制御部102に供給する。制御部102では、入力信号に応じて、内部メモリなどに格納される動作処理プログラムなどを読み込むことにより、指示に応じた制御信号を生成し、各部に供給する。 The operation unit 103 includes a plurality of buttons or a keyboard that can input an instruction by the user, and supplies an input signal corresponding to the input user instruction to the control unit 102. The control unit 102 reads an operation processing program stored in an internal memory or the like according to the input signal, generates a control signal according to the instruction, and supplies the control signal to each unit.
 アクチュエータ104は、制御部102より供給される制御信号に応じて、上側載置台150bを下側載置台150aに対して接近又は離隔方向に移動可能なモータなどの機構である。具体的には、アクチュエータ104は、制御部102から供給される制御信号に応じてボールネジ101を回転させることにより、該ボールネジ101に契合する上側基台110bを、上側載置台150bと下側載置台150aとの平行な位置関係を維持したまま、垂直方向に移動する。このとき、例えばボールネジ101は、下側基台110aと上側基台110bとの四隅を夫々連結するように4本設けられており、アクチュエータ104も夫々対応するボールネジ101を回転させるべく複数設けられている。 The actuator 104 is a mechanism such as a motor that can move the upper mounting table 150b toward or away from the lower mounting table 150a in accordance with a control signal supplied from the control unit 102. Specifically, the actuator 104 rotates the ball screw 101 in accordance with a control signal supplied from the control unit 102, whereby the upper base 110b engaged with the ball screw 101 is changed to the upper mounting base 150b and the lower mounting base. It moves in the vertical direction while maintaining the parallel positional relationship with 150a. At this time, for example, four ball screws 101 are provided so as to connect the four corners of the lower base 110a and the upper base 110b, and a plurality of actuators 104 are also provided to rotate the corresponding ball screws 101. Yes.
 このようなアクチュエータ104の動作によれば、上側基台110bを垂直上方向に移動することで、上側載置台150bが下側載置台150aから離間し、上側基台110bを垂直下方向に移動することで、上側載置台150bが下側載置台150aに近接する。 According to such an operation of the actuator 104, by moving the upper base 110b in the vertical upward direction, the upper mounting base 150b is separated from the lower mounting base 150a, and the upper base 110b is moved in the vertical downward direction. Thus, the upper mounting table 150b comes close to the lower mounting table 150a.
 アクチュエータ140は、後述する転写動作において、上側載置台150bを垂直下方向に移動させることで、上側モールド200bと基板300とを相互に押圧させ、更に下側モールド200aと基板300とを相互に押圧する。 The actuator 140 moves the upper mounting table 150b vertically downward in a transfer operation described later, thereby pressing the upper mold 200b and the substrate 300 to each other, and further pressing the lower mold 200a and the substrate 300 to each other. To do.
 また、アクチュエータ104は、本発明の「離型手段」又は「第1離型手段」の一具体例でもあり、後述する転写動作の後の上側モールド200bと基板300との離型時に、上側モールド200bを保持した状態で上側載置台150bを垂直上方向に移動させることで上側モールド200bを基板300から離型させる。 The actuator 104 is also a specific example of the “mold release unit” or “first mold release unit” of the present invention. When the upper mold 200b and the substrate 300 after the transfer operation described later are released, the upper mold is used. The upper mold 200b is released from the substrate 300 by moving the upper mounting table 150b in the vertical upward direction while holding 200b.
 図3は、下側基台110a、下側機構部A及び周辺の構成を垂直上方向から見た場合の模式透過図である。尚、図3には、下側載置台150aに設けられる下側モールド保持部152a及び下側モールドクランプ153aについては図示していない。 FIG. 3 is a schematic transmission diagram when the lower base 110a, the lower mechanism A, and the surrounding configuration are viewed from the vertically upward direction. Note that FIG. 3 does not show the lower mold holding portion 152a and the lower mold clamp 153a provided on the lower mounting table 150a.
 図3に示されるように、インプリント装置1では、正方形の下側基台110aの四隅にポールネジ101が4本螺合されている。 As shown in FIG. 3, in the imprint apparatus 1, four pole screws 101 are screwed into the four corners of the lower base 110a of the square.
 下側基台110aの四隅に配されるポールネジ101の夫々には、アクチュエータ104が夫々接続されており、制御部102からの制御信号に基づいて、ポールネジの回転を行う。 The actuator 104 is connected to each of the pole screws 101 arranged at the four corners of the lower base 110a, and the pole screws are rotated based on a control signal from the control unit 102.
 尚、上側基台110b及び上側機構部Bについても、下側基台110a及び下側機構部Aと同様の構成であり、正方形の上側基台110bの四隅に、下側基台110aから垂直上方に伸びる4本のポールネジ101が螺合されている。 The upper base 110b and the upper mechanism B are also configured in the same manner as the lower base 110a and the lower mechanism A, and are vertically upward from the lower base 110a at the four corners of the square upper base 110b. Four pole screws 101 extending in the direction are screwed together.
 続いて、図4を参照して、本実施例におけるセンターピン駆動部140a及び140bの構造について、制御部102の制御に基づく動作と共に説明する。ここに、図4は、センターピン駆動部140aの詳細な構成例を示す模式図である。 Subsequently, the structure of the center pin driving units 140a and 140b in the present embodiment will be described together with the operation based on the control of the control unit 102 with reference to FIG. FIG. 4 is a schematic diagram showing a detailed configuration example of the center pin driving unit 140a.
 図4(a)に示されるように、本実施例のセンターピン駆動部140aは、モータ141と、シャフト142と、電磁石143と、ブレーキ板144と、ディスク145とを備える。モータ141は、供給される電流に応じて、少なくとも回転数制御及びトルク制御可能な態様で回転する。シャフト142は、モータ141の回転軸と共回り可能に契合されるとともに、回転に応じてセンターピン120を軸方向に移動可能に螺合されている。電磁石143は、供給される電流に応じて磁界を生じる例えば電磁コイルなどである。ブレーキ板144は、電磁石143に磁界が生じていない場合、不図示の弾性部材などによりディスク145に押圧され、摩擦により該ディスク145の回転を制動するとともに、電磁石143に磁界が生じている場合、該電磁石143方向に引かれてディスク145から離間する。ディスク145は、モータ141の回転に伴って回転するよう、シャフト142と共回り可能に契合される。また、制御部102は、モータ141に供給する電流量を調整することで、モータ141のトルク出力を制御してもよい。このように構成すれば、典型的にはモータ141のトルク出力に応じて変化する下側センターピン120aの押圧力を好適に制御することが出来る。 As shown in FIG. 4A, the center pin drive unit 140a of this embodiment includes a motor 141, a shaft 142, an electromagnet 143, a brake plate 144, and a disk 145. The motor 141 rotates in a manner capable of at least rotational speed control and torque control in accordance with the supplied current. The shaft 142 is engaged so as to be able to rotate together with the rotation shaft of the motor 141 and is screwed so that the center pin 120 can be moved in the axial direction according to the rotation. The electromagnet 143 is, for example, an electromagnetic coil that generates a magnetic field according to a supplied current. When a magnetic field is not generated in the electromagnet 143, the brake plate 144 is pressed against the disk 145 by an unillustrated elastic member or the like to brake the rotation of the disk 145 by friction, and when a magnetic field is generated in the electromagnet 143, The electromagnet 143 is pulled away from the disk 145. The disk 145 is engaged with the shaft 142 so as to be able to rotate together with the rotation of the motor 141. In addition, the control unit 102 may control the torque output of the motor 141 by adjusting the amount of current supplied to the motor 141. If comprised in this way, the pressing force of the lower center pin 120a which changes typically according to the torque output of the motor 141 can be controlled suitably.
 このような構成により、下側センターピン120aは、垂直方向の移動及び固定を実現出来る。尚、センターピン駆動部140aは、不図示の位置センサなどにより検出される下側センターピン120aの位置を制御部102に通知するよう構成されていてもよい。制御部102は、このように通知される位置情報や、その他何らかの情報に応じて、下側センターピン120aの位置を検出し、該下側センターピン120aを移動または固定するようモータ141の回転及び電磁石143の磁界を制御する。このため、下側センターピン120aの適切な位置制御が可能となる。 With this configuration, the lower center pin 120a can be moved and fixed in the vertical direction. The center pin driving unit 140a may be configured to notify the control unit 102 of the position of the lower center pin 120a detected by a position sensor (not shown) or the like. The control unit 102 detects the position of the lower center pin 120a according to the position information notified in this way or some other information, and rotates the motor 141 to move or fix the lower center pin 120a. The magnetic field of the electromagnet 143 is controlled. For this reason, it is possible to appropriately control the position of the lower center pin 120a.
 また、センターピン駆動部140aの他の構成例として、図4(b)に示されるセンターピン駆動部140’aが採用されてもよい。図4(b)に示されるように、センターピン駆動部140’aは、モータ141と、シャフト142と、ブレーキ146とを備える。尚、図4(b)において図4(a)と同様の構成については、同じ番号を付して説明を省略している。ブレーキ146は、電気的または機械的なブレーキ機構であって、制御部102からの制御信号に基づいて、シャフト142に押圧され、摩擦により該シャフト142の回転を制動し、下側センターピン120aの移動を制動する。 Further, as another configuration example of the center pin driving unit 140a, a center pin driving unit 140'a shown in FIG. 4B may be employed. As shown in FIG. 4B, the center pin drive unit 140'a includes a motor 141, a shaft 142, and a brake 146. In FIG. 4B, the same components as those in FIG. 4A are denoted by the same reference numerals and description thereof is omitted. The brake 146 is an electrical or mechanical brake mechanism, and is pressed against the shaft 142 based on a control signal from the control unit 102, brakes the rotation of the shaft 142 by friction, and the lower center pin 120a Brakes movement.
 このような構成により、図示せす上側センターピン120bにより被転写体300を介して下側センターピン120aに圧力がかかったとしても、ブレーキ146の制動作用により下側センターピンが所定位置で確実に固定される。従って、転写時あるいは離型時に被転写体の中心穴付近の位置を確実に固定出来る。 With such a configuration, even when pressure is applied to the lower center pin 120a via the transfer body 300 by the upper center pin 120b shown in the drawing, the lower center pin is reliably in a predetermined position by the braking action of the brake 146. Fixed. Therefore, the position near the center hole of the transfer object can be reliably fixed at the time of transfer or release.
 尚、上側センターピン120b及びセンターピン駆動部140bも、特に記載しない点については、下側センターピン120a及びセンターピン駆動部140aと同様の構成を採るものとする。 Note that the upper center pin 120b and the center pin drive unit 140b also have the same configuration as that of the lower center pin 120a and the center pin drive unit 140a unless otherwise specified.
 (2)基本動作例
 続いて、図5から図8を参照してインプリント装置1の実施する転写動作の一連の流れについて説明する。図5は、インプリント装置1による転写動作の一連の流れを示すフローチャートである。図6から図7は、転写動作中の各工程におけるインプリント装置1の各部の動作を示す模式図である。図8は、転写動作中の下側センターピン120a及び上側センターピン120bの垂直方向における位置の変化を示すグラフである。
(2) Basic Operation Example Next, a series of transfer operations performed by the imprint apparatus 1 will be described with reference to FIGS. FIG. 5 is a flowchart showing a series of transfer operations by the imprint apparatus 1. 6 to 7 are schematic views showing the operation of each part of the imprint apparatus 1 in each process during the transfer operation. FIG. 8 is a graph showing changes in the position of the lower center pin 120a and the upper center pin 120b in the vertical direction during the transfer operation.
 ここでは、図6から図7に示されるインプリント装置1の各部の動作を参照しながら、図5のフローチャートに示される動作の流れを説明する。尚、図6から図7では、図1に示される模式図と同様の構成については同一の番号を付して説明しており、また説明される動作に対して関連の薄い部材については一部図示を省略している。 Here, the flow of the operation shown in the flowchart of FIG. 5 will be described with reference to the operation of each part of the imprint apparatus 1 shown in FIGS. In FIGS. 6 to 7, the same components as those in the schematic diagram shown in FIG. 1 are denoted by the same reference numerals, and some of the thin members related to the operation to be described are partially described. The illustration is omitted.
 転写動作の流れにおいて、先ず、上側モールド200b、下側モールド200a及び基板300のいずれも設置されていない初期状態のインプリント装置1(図6[状態1])に対して、上側モールド200bが取り付けられる(ステップS101)。より詳細には、ステップS101において、先ず、不図示のモールド搬送装置などの動作により、上側モールド200bが、下側センターピン120aの先端部121aが上側モールド200bのセンターホールを貫通する形で、下側センターピン120aのモールド支持部123a上に設置される(図6[状態2])。 In the flow of the transfer operation, first, the upper mold 200b is attached to the initial imprint apparatus 1 (FIG. 6 [state 1]) in which none of the upper mold 200b, the lower mold 200a, and the substrate 300 is installed. (Step S101). More specifically, in step S101, first, the upper mold 200b is moved by the operation of a mold conveying device (not shown) such that the tip 121a of the lower center pin 120a penetrates the center hole of the upper mold 200b. It is installed on the mold support part 123a of the side center pin 120a (FIG. 6 [state 2]).
 続いて、制御部102は、アクチュエータ104を動作させて、上側載置台150bの上側モールド保持面Sbが上側モールド200bの上面(つまり、パターン面の裏面)に接するように、上側載置台150bを垂直下方向に移動させる。上側載置台150bと上側モールド200bとが接触した後に、制御部102は、不図示の減圧手段などを動作させて、上側載置台150bの吸着部154bに上側モールド200bを吸着させ、保持させる。更に、上側モールドクランプ153bに対して制御信号を送信し、上側モールド200bを垂直上方向へ押圧させることで上側載置台150bに固定させる(図6[状態3])。その後、制御部102は、アクチュエータ104を動作させて、上側載置台150bを垂直上方向の初期位置まで移動させる(図6[状態4])。 Subsequently, the control unit 102 operates the actuator 104 to vertically move the upper mounting table 150b so that the upper mold holding surface Sb of the upper mounting table 150b is in contact with the upper surface of the upper mold 200b (that is, the back surface of the pattern surface). Move down. After the upper mounting table 150b and the upper mold 200b come into contact with each other, the control unit 102 operates a decompression unit (not shown) to adsorb and hold the upper mold 200b on the adsorption unit 154b of the upper mounting table 150b. Further, a control signal is transmitted to the upper mold clamp 153b, and the upper mold 200b is pressed vertically upward to be fixed to the upper mounting table 150b (FIG. 6 [State 3]). Thereafter, the control unit 102 operates the actuator 104 to move the upper mounting table 150b to the initial position in the vertical upward direction (FIG. 6 [state 4]).
 続いて、インプリント装置1に対して、下側モールド200aが取り付けられる(ステップS102)。より詳細には、ステップS102において、先ず、不図示のモールド搬送装置などの動作により、下側モールド200aが、下側センターピン120aの先端部121aが下側モールド200aのセンターホールを貫通する形で、下側センターピン120aのモールド支持部123a上に設置される(図6[状態5])。 Subsequently, the lower mold 200a is attached to the imprint apparatus 1 (step S102). More specifically, in step S102, first, the lower mold 200a is moved in such a manner that the front end portion 121a of the lower center pin 120a penetrates the center hole of the lower mold 200a by an operation of a not-shown mold conveyance device or the like. Then, the lower center pin 120a is installed on the mold support part 123a (FIG. 6 [state 5]).
 続いて、制御部102は、下側センターピン駆動部140aを動作させて、下側載置台150aの下側モールド保持面Saが下側モールド200aの下面(つまり、パターン面の裏面)に接するように、下側センターピン120aを垂直下方向に移動させる。下側載置台150aと下側モールド200aとが接触した後に、制御部102は、不図示の真空ポンプなどからなる減圧手段などを動作させて、下側載置台150aの吸着部154aに上側モールド200aを吸着させ、保持させる。更に、下側モールドクランプ153aに対して制御信号を送信し、下側モールド200aを垂直下方向へ押圧させることで下側載置台150aに固定させる(図6[状態6])。 Subsequently, the control unit 102 operates the lower center pin driving unit 140a so that the lower mold holding surface Sa of the lower mounting table 150a contacts the lower surface of the lower mold 200a (that is, the back surface of the pattern surface). The lower center pin 120a is moved vertically downward. After the lower mounting table 150a and the lower mold 200a come into contact with each other, the control unit 102 operates a decompression means such as a vacuum pump (not shown) to cause the upper mold 200a to move to the suction unit 154a of the lower mounting table 150a. Is adsorbed and retained. Further, a control signal is transmitted to the lower mold clamp 153a, and the lower mold 200a is pressed vertically downward to be fixed to the lower mounting table 150a (FIG. 6 [State 6]).
 次に、不図示の基板搬送装置などの動作により、基板300が、下側センターピン120aの先端部121aが基板300のセンターホールを貫通する形で、下側センターピン120aの基板支持部122a上に設置される(ステップS103、図6[状態7])。このとき、必要に応じて、制御部102は、下側モールド200a及び上側モールド200bと基板300の位置合わせを行なってもよい。 Next, by the operation of a substrate transfer device (not shown), the substrate 300 is placed on the substrate support portion 122a of the lower center pin 120a so that the tip 121a of the lower center pin 120a penetrates the center hole of the substrate 300. (Step S103, FIG. 6 [State 7]). At this time, the control unit 102 may align the lower mold 200a and the upper mold 200b with the substrate 300 as necessary.
 続いて制御部102は、下側モールドクランプ153aに対して制御信号を送信し、下側モールド200aを押圧する力を保持力から徐々に変形力まで増大させ、下側モールド200aを変形させる。 Subsequently, the control unit 102 transmits a control signal to the lower mold clamp 153a, and gradually increases the force pressing the lower mold 200a from the holding force to the deforming force, thereby deforming the lower mold 200a.
 同時に又は相前後して、制御部102は、上側モールドクランプ153bに対して制御信号を送信し、上側モールド200bを押圧する力を押圧力から徐々に変形力まで増大させ、上側モールド200bを変形させる(ステップS104、図6[状態8])。 At the same time or before and after, the control unit 102 transmits a control signal to the upper mold clamp 153b, and gradually increases the force pressing the upper mold 200b from the pressing force to the deformation force, thereby deforming the upper mold 200b. (Step S104, FIG. 6 [State 8]).
 続いて、制御部102は、下側センターピン駆動部140aを動作させて下側センターピン120aを垂直下方向に移動させ、支持される基板300の下側転写層301aと下側モールド200aのパターン面とを接触させる(ステップS105、図7[状態9])。更に、制御部102は、アクチュエータ104を動作させて、上側載置台150bを垂直下方向に移動し、上側モールド200bのパターン面と、基板300の上側転写層301bとを接触させる(図7[状態10])。 Subsequently, the control unit 102 operates the lower center pin driving unit 140a to move the lower center pin 120a vertically downward, and the pattern of the lower transfer layer 301a and the lower mold 200a to be supported is supported. The surface is brought into contact (step S105, FIG. 7 [state 9]). Further, the control unit 102 operates the actuator 104 to move the upper mounting table 150b vertically downward to bring the pattern surface of the upper mold 200b into contact with the upper transfer layer 301b of the substrate 300 (FIG. 7 [state] 10]).
 上述したように、モールドに撓みなどの変形が生じている場合、モールドが転写層に接触する際には、変形により傾斜が生じているモールドのパターン面のうち、転写層に近い側から順次接触する。例えば、モールドクランプの押圧力によって、モールドのパターン面のうち、中心部が転写層により近づくように撓ませている場合、転写層との接触時にモールドは中心部から周縁部に向けて順次接触する。 As described above, when deformation such as bending occurs in the mold, when the mold comes into contact with the transfer layer, contact is sequentially made from the side closer to the transfer layer on the pattern surface of the mold that is inclined due to deformation. To do. For example, when the central part of the pattern surface of the mold is bent by the pressing force of the mold clamp so as to be closer to the transfer layer, the mold sequentially contacts the peripheral part from the central part when contacting the transfer layer. .
 尚、各モールドの変形及び基板300との接触は、上述した順序で行なわれてもよく、また、下側モールド200aの変形、下側モールド200aと基板300との接触、上側モールド200bの変形、上側モールド200bと基板300との接触の順序で片側から行なってもよい。 The deformation of each mold and the contact with the substrate 300 may be performed in the above-described order. Also, the deformation of the lower mold 200a, the contact between the lower mold 200a and the substrate 300, the deformation of the upper mold 200b, You may perform from one side in the order of contact with the upper mold 200b and the board | substrate 300. FIG.
 各モールドと基板300との接触後に制御部102は、下側モールドクランプ153a及び上側モールドクランプ153bに対して制御信号を送信し、各モールドを押圧する押圧力を変形力から保持力まで徐々に低減させ、各モールドの変形を解除する(ステップS106、図7[状態11])。 After the contact between each mold and the substrate 300, the control unit 102 transmits a control signal to the lower mold clamp 153a and the upper mold clamp 153b, and gradually reduces the pressing force pressing each mold from the deformation force to the holding force. The deformation of each mold is released (step S106, FIG. 7 [state 11]).
 次に、制御部102は、アクチュエータ104を動作させて上側載置台150bを垂直下方向に移動させ、上側モールド200bを基板300の上面の上側転写層301bに、下側モールド200aを基板300の下面の下側転写層301aに夫々所定の押圧力で押圧させる(ステップS107)。更に、制御部102は、押圧状態を維持したまま、基板300の下側転写層301a及び上側転写層301bを硬化させるために、下側UV照射部130a及び上側UV照射部130bよりUV光を照射させる。この動作により、各モールドの表面に形成されたパターンに合わせて基板300の下側転写層301a及び上側転写層301bが硬化し、パターンが転写される(ステップS108)。尚、押圧時の圧力や押圧時間、並びにUV照射の強度及び照射時間は、転写層の特性に応じて適宜設定されることが好ましい。 Next, the control unit 102 operates the actuator 104 to move the upper mounting table 150 b vertically downward, and the upper mold 200 b is moved to the upper transfer layer 301 b on the upper surface of the substrate 300, and the lower mold 200 a is moved to the lower surface of the substrate 300. The lower transfer layer 301a is pressed with a predetermined pressing force (step S107). Further, the control unit 102 emits UV light from the lower UV irradiation unit 130a and the upper UV irradiation unit 130b in order to cure the lower transfer layer 301a and the upper transfer layer 301b of the substrate 300 while maintaining the pressed state. Let By this operation, the lower transfer layer 301a and the upper transfer layer 301b of the substrate 300 are cured in accordance with the pattern formed on the surface of each mold, and the pattern is transferred (step S108). In addition, it is preferable that the pressure and pressing time during pressing, the intensity of UV irradiation, and the irradiation time are appropriately set according to the characteristics of the transfer layer.
 所定の押圧時間及びUV照射などの転写に係る一連の動作が終了した後、下側モールド200a及び上側モールド200bを基板300から離型させる離型処理が実施される。 After a series of operations related to transfer such as a predetermined pressing time and UV irradiation is completed, a mold release process for releasing the lower mold 200a and the upper mold 200b from the substrate 300 is performed.
 離型動作において、制御部102は、先ず、上側載置台150bを押圧させているアクチュエータ104の動作を停止させて、各モールドと基板300との間の押圧状態を解除する。同時に又は相前後して、制御部102は、所定の圧力で上側センターピンの先端部が基板300を垂直下方向に押圧するように上側センターピン駆動部140bを動作させる(ステップS109、図7[状態12])。 In the mold release operation, the control unit 102 first stops the operation of the actuator 104 that presses the upper mounting table 150b, and releases the pressing state between each mold and the substrate 300. At the same time or before and after, the control unit 102 operates the upper center pin driving unit 140b so that the tip of the upper center pin presses the substrate 300 vertically downward at a predetermined pressure (Step S109, FIG. 7 [ State 12]).
 このとき、基板300は、下側センターピン120aと上側センターピン120bとの間で狭持される態様となる。制御部102は、狭持される基板300に過剰な圧力が付加されないよう、下側センターピン駆動部140a及び上側センターピン駆動部140bの夫々の駆動の態様を制御する。 At this time, the substrate 300 is sandwiched between the lower center pin 120a and the upper center pin 120b. The control unit 102 controls the driving modes of the lower center pin driving unit 140a and the upper center pin driving unit 140b so that excessive pressure is not applied to the sandwiched substrate 300.
 ここで、図8を参照して、制御部102による制御の下、下側センターピン駆動部140a及び上側センターピン駆動部140bの夫々の動作によって移動する下側センターピン120a及び上側センターピン120bの位置の変化について説明する。 Here, referring to FIG. 8, under the control of the control unit 102, the lower center pin 120a and the upper center pin 120b that are moved by the operations of the lower center pin driving unit 140a and the upper center pin driving unit 140b, respectively. A change in position will be described.
 先ず、制御部102は、離型動作の開始時より、下側センターピン駆動部140aに対して下側センターピン120aの位置を固定する位置制御を行なう。具体的には、制御部102は、下側センターピン駆動部140a内のブレーキ機構(例えば、電磁石143又はブレーキ146など)に対して電力を供給することなどにより、下側センターピン駆動部140aの駆動を停止させ、下側センターピン120aの移動が生じないよう固定する。また、制御部102は、より単純に下側センターピン駆動部140aに対して供給する電力量を制御することで、該下側センターピン120aの固定を行なってもよい。 First, the control unit 102 performs position control for fixing the position of the lower center pin 120a with respect to the lower center pin driving unit 140a from the start of the mold release operation. Specifically, the control unit 102 supplies electric power to the brake mechanism (for example, the electromagnet 143 or the brake 146) in the lower center pin driving unit 140a, and the like. The driving is stopped and the lower center pin 120a is fixed so as not to move. Further, the control unit 102 may fix the lower center pin 120a by more simply controlling the amount of power supplied to the lower center pin driving unit 140a.
 下側センターピン120aの固定を行なう一方で、制御部102は、上側センターピン120bの先端部が基板300に接する位置(図8、上側センターピン基板保持位置)まで垂直下方向に移動させるよう、上側センターピン駆動部140bに対して位置制御を行なう。 While fixing the lower center pin 120a, the control unit 102 moves vertically downward to a position where the tip of the upper center pin 120b contacts the substrate 300 (FIG. 8, upper center pin substrate holding position). Position control is performed on the upper center pin driving unit 140b.
 上側センターピン120bの先端部が基板300に接する位置まで移動した後、制御部102は、上側センターピン駆動部140bの動作の態様を、上側センターピン120bの位置に応じた位置制御から、上側センターピン120bが垂直下方向に及ぼす押圧力に応じたトルク制御に切り替える。かかるトルク制御では、センターピン駆動部140bは、上側センターピン120が基板300を垂直下方向へ押圧する押圧力が所定の閾値を越えないよう、駆動トルクが制御される。 After the tip of the upper center pin 120b has moved to a position where it contacts the substrate 300, the control unit 102 changes the operation mode of the upper center pin driving unit 140b from the position control according to the position of the upper center pin 120b to the upper center pin. The torque control is switched according to the pressing force exerted by the pin 120b in the vertical downward direction. In such torque control, the center pin drive unit 140b controls the drive torque so that the pressing force with which the upper center pin 120 presses the substrate 300 vertically downward does not exceed a predetermined threshold.
 このときの押圧力の閾値とは、例えば上側センターピン120bの押圧により、狭持される基板300に歪みや損傷が生じる押圧力に対して充分低く設定される上限値となる。 The threshold value of the pressing force at this time is an upper limit value that is set sufficiently low with respect to the pressing force that causes distortion or damage to the substrate 300 held by the pressing of the upper center pin 120b, for example.
 このため、上側センターピン120は、基板300に接触した後に、閾値を越えない押圧力で基板300を垂直下方向に押圧することで、位置が固定される下側センターピン120aとの間で基板300を狭持する。 For this reason, after the upper center pin 120 is in contact with the substrate 300, the substrate 300 is pressed between the lower center pin 120a whose position is fixed by pressing the substrate 300 vertically downward with a pressing force that does not exceed the threshold value. Hold 300.
 続いて、制御部102は、上述のステップS104と同様の動作で、下側モールド200a及び上側モールド200bの変形を行なう(ステップS110、図7[状態13])。このとき、各モールドクランプの押圧力は、保持力から徐々に変形力まで増大するよう制御される。 Subsequently, the control unit 102 performs deformation of the lower mold 200a and the upper mold 200b by the same operation as the above-described step S104 (step S110, FIG. 7 [state 13]). At this time, the pressing force of each mold clamp is controlled to gradually increase from the holding force to the deformation force.
 モールドの変形に応じて、図7[状態13]に示されるように、各モールドと基板300との密着面の一部が剥離し、間隙が生じる。密着面にこのような間隙が存在する場合、該間隙が続く離型における離型開始点となり、モールドと基板の転写層との間に作用する密着力は低減される。 Dependent on the deformation of the mold, as shown in FIG. 7 [State 13], a part of the contact surface between each mold and the substrate 300 is peeled off, resulting in a gap. When such a gap exists on the contact surface, it becomes a mold release start point in the subsequent mold release, and the adhesion force acting between the mold and the transfer layer of the substrate is reduced.
 続いて、制御部102は、上側センターピン120bアクチュエータ104を動作させて、上側載置台150bを垂直上方向の初期位置に移動させる。このとき、上側モールド200bは、上側載置台150bに保持された状態で垂直上方向に移動し、一方で基板300は上側センターピン120bにより垂直下方向に押圧される(言い換えれば、固定される)ため、上側モールド200bと基板300の上側転写層301bとが離型する(ステップS111、図7[状態14])。尚、このとき制御部102は、下側センターピン120aの位置を固定するとともに、上側センターピン120bが基板300を垂直下方向に押圧する力をトルク制御により制御している。 Subsequently, the control unit 102 operates the upper center pin 120b actuator 104 to move the upper mounting table 150b to the initial position in the vertical upward direction. At this time, the upper mold 200b moves vertically upward while being held by the upper mounting table 150b, while the substrate 300 is pressed vertically downward (in other words, fixed) by the upper center pin 120b. Therefore, the upper mold 200b and the upper transfer layer 301b of the substrate 300 are released (Step S111, FIG. 7 [State 14]). At this time, the control unit 102 fixes the position of the lower center pin 120a and controls the force with which the upper center pin 120b presses the substrate 300 in the vertical downward direction by torque control.
 次に、制御部102は、基板300を狭持する上側センターピン120bと下側センターピン120aとを、基板300を保持した状態を維持したまま垂直上方向の下側センターピン120aの初期位置まで移動させ、下側モールド200aと基板300とを離型させる(ステップS112、図7[状態15])。具体的には、図8に示されるように、制御部102は、下側センターピン120aが下側センターピン初期位置まで移動するよう下側センターピン駆動部140aの位置制御を行なう。他方で、制御部102は、上側センターピン120bが下側センターピン初期位置に対応する位置(つまり、下側センターピン初期位置より、基板300の厚さ分上方)まで移動するよう、上側センターピン駆動部140aの動作の態様をトルク制御から位置制御へ切り替える。 Next, the control unit 102 holds the upper center pin 120b and the lower center pin 120a holding the substrate 300 up to the initial position of the lower center pin 120a in the vertical upward direction while maintaining the state in which the substrate 300 is held. The lower mold 200a and the substrate 300 are released from each other (step S112, FIG. 7 [state 15]). Specifically, as shown in FIG. 8, the control unit 102 controls the position of the lower center pin driving unit 140a so that the lower center pin 120a moves to the lower center pin initial position. On the other hand, the control unit 102 moves the upper center pin 120b so as to move to a position corresponding to the lower center pin initial position (that is, above the lower center pin initial position by the thickness of the substrate 300). The mode of operation of the drive unit 140a is switched from torque control to position control.
 離型後に、制御部102は、上側モールドクランプ153b及び下側モールドクランプ153aの押圧力を、夫々モールドを保持するための保持力に変更し、下側モールド200a及び上側モールド200bの変形を解除する(ステップS113、図7[状態16])。 After the mold release, the control unit 102 changes the pressing force of the upper mold clamp 153b and the lower mold clamp 153a to the holding force for holding the mold, and releases the deformation of the lower mold 200a and the upper mold 200b. (Step S113, FIG. 7 [State 16]).
 下側モールド200a及び上側モールド200bより離型された基板300は、不図示の基板搬送装置などの動作により、下側センターピン120aから取り外される(ステップS114)。尚、続けて別の基板300に対して同一の下側モールド200a及び上側モールド200bを用いて転写を行なう場合(ステップS115:No)、基板300を配置するステップS103からステップS114までの各工程を繰り返し実行する。全ての転写が終了した後(ステップS115:Yes)、不図示のモールド搬送装置などの動作により、下側モールド200aが取り外され(ステップS116)、上側モールド200bが取り外される(ステップS117)。 The substrate 300 released from the lower mold 200a and the upper mold 200b is removed from the lower center pin 120a by an operation of a substrate transfer device (not shown) (step S114). In addition, when performing transfer using the same lower mold 200a and upper mold 200b for another substrate 300 (step S115: No), the steps from step S103 to step S114 for placing the substrate 300 are performed. Run repeatedly. After all the transfer is completed (step S115: Yes), the lower mold 200a is removed (step S116) and the upper mold 200b is removed (step S117) by an operation of a mold conveyance device (not shown).
 以上に示した一連の動作により、本発明の転写装置に係る実施例であるインプリント装置1によれば、基板300の転写面301a及び301bに対して下側モールド200a及び上側モールド200bの表面に形成されたパターンが転写される。 Through the series of operations described above, according to the imprint apparatus 1 which is an embodiment of the transfer apparatus of the present invention, the lower mold 200a and the upper mold 200b are placed on the surfaces of the transfer surfaces 301a and 301b of the substrate 300. The formed pattern is transferred.
 特に、本実施例においては、離型動作時に、制御部102の制御の下、位置を固定される下側センターピン120aと、所定の押圧力により基板300を押圧する上側センターピン120bとにより基板300が狭持される。このため、基板300は、過剰な押圧力の付加による損傷などから好適に保護される。また、厚さや材質の異なる基板を用いる場合、該基板の特性に応じて上側センターピン120bのトルク制御における閾値などを変更することで、該基板に対して適切な保持を実現することが出来る。 In particular, in this embodiment, the substrate is formed by the lower center pin 120a whose position is fixed under the control of the control unit 102 and the upper center pin 120b that presses the substrate 300 with a predetermined pressing force during the mold release operation. 300 is pinched. For this reason, the board | substrate 300 is suitably protected from the damage by the addition of excessive pressing force, etc. In addition, when using substrates of different thicknesses and materials, appropriate holding of the substrate can be realized by changing a threshold value or the like in torque control of the upper center pin 120b according to the characteristics of the substrate.
 このように基板300が適切に保持されるため、制御部102は、上側モールド200bを固定した上側ステージ150bを垂直上方向に移動させることで、比較的容易に上側モールド200bと基板300との離型を実現することが出来る。また、制御部102は、基板300を保持した状態を維持したまま、下側センターピン120a及び上側センターピン120bを垂直上方向に移動させることで、比較的容易に下側モールド200aと基板300との離型を実現することが出来る。 Since the substrate 300 is appropriately held in this manner, the control unit 102 moves the upper stage 150b, to which the upper mold 200b is fixed, in the vertical upward direction, so that the upper mold 200b and the substrate 300 can be separated relatively easily. A mold can be realized. Further, the control unit 102 moves the lower center pin 120a and the upper center pin 120b in the vertical upward direction while maintaining the state of holding the substrate 300, so that the lower mold 200a and the substrate 300 can be relatively easily moved. Can be realized.
 (3)第1変形例
 続いて、本発明に係る転写装置の第1変形例であるインプリント装置1’の基本的な構成について、図9を参照して説明する。図9は、本発明の転写装置の第1変形例であるインプリント装置1’の構成を概略的に示す模式図である。
(3) First Modification Next, a basic configuration of an imprint apparatus 1 ′, which is a first modification of the transfer apparatus according to the present invention, will be described with reference to FIG. FIG. 9 is a schematic diagram schematically showing a configuration of an imprint apparatus 1 ′ which is a first modification of the transfer apparatus of the present invention.
 図9に示すインプリント装置1は、被転写体である基板300’の下面に構成される(言い換えれば、下方に面して配置される)下側転写層301aに対して、下側モールド200aに形成されたパターンを転写する転写装置である。尚、本変形例及び図9において、図1に示されるインプリント装置1と同様の構成については、同一の番号を付して説明を省略している。 The imprint apparatus 1 shown in FIG. 9 has a lower mold 200a with respect to a lower transfer layer 301a configured on the lower surface of a substrate 300 ′ that is a transfer target (in other words, arranged facing downward). 2 is a transfer device for transferring a pattern formed on the substrate. Note that, in this modification and FIG. 9, the same components as those of the imprint apparatus 1 shown in FIG.
 インプリント装置1は、図1に示すように下側基台110aを含む下側機構部Aと、上側基台110bを含む上側機構部B’と、下側基台110a及び上側基台110bを連結するボールネジ101と、該ボールネジを回転させるアクチュエータ104と、下側機構部A及び上側機構部Bの動作を制御する制御部102と、該制御部102に対してユーザの指示を入力可能な操作部103とを備えて構成される。 As shown in FIG. 1, the imprint apparatus 1 includes a lower mechanism part A including a lower base 110a, an upper mechanism part B ′ including an upper base 110b, a lower base 110a and an upper base 110b. A ball screw 101 to be connected, an actuator 104 for rotating the ball screw, a control unit 102 for controlling the operation of the lower mechanism unit A and the upper mechanism unit B, and an operation capable of inputting a user instruction to the control unit 102 Unit 103.
 尚、図9に示されるインプリント装置1’は、下側モールド200a及び基板300’の夫々が設置された状態が図示されている。下側モールド200aは、パターンが形成される表面が上向きとなるよう下側機構部Aの下側載置台150aに保持されている。また、上側基台110bは、下側載置台150aの下側モールド保持面Saに対して凸部を形成するように押圧部120bを有する。 The imprint apparatus 1 ′ shown in FIG. 9 shows a state where the lower mold 200 a and the substrate 300 ′ are installed. The lower mold 200a is held on the lower mounting table 150a of the lower mechanism portion A so that the surface on which the pattern is formed faces upward. Further, the upper base 110b has a pressing portion 120b so as to form a convex portion with respect to the lower mold holding surface Sa of the lower mounting table 150a.
 下側機構部Aは、図1に示されるインプリント装置1の下側機構部Aと同様の構成を備える。 The lower mechanism part A has the same configuration as the lower mechanism part A of the imprint apparatus 1 shown in FIG.
 他方、本変形例の上側機構部B’は、上側基台110bの下面に設けられ、押圧部112bと、上側センターピン120bと、上側センターピン駆動部140bとを備えて構成される。 On the other hand, the upper mechanism part B 'of the present modification is provided on the lower surface of the upper base 110b, and includes a pressing part 112b, an upper center pin 120b, and an upper center pin driving part 140b.
 押圧部112bは、上側基台110bの下面において下向きに凸部を形成するように設けられる部位であって、転写動作時には、アクチュエータ104の動作により基板300’を下方に押圧することで、下側モールド200aに対して密着させる。押圧部112bは、上側センターピン120bが配置されるためのセンターホールを有する。また、押圧部112bは平坦であり、好適には少なくとも基板300’の下側転写層301aが形成される領域より広い下面を有する。 The pressing portion 112b is a portion provided to form a convex portion downward on the lower surface of the upper base 110b. During the transfer operation, the pressing portion 112b presses the substrate 300 ′ downward by the operation of the actuator 104, so that the lower side Adhere to the mold 200a. The pressing part 112b has a center hole for placing the upper center pin 120b. The pressing portion 112b is flat and preferably has a lower surface that is wider than at least a region where the lower transfer layer 301a of the substrate 300 'is formed.
 このようなインプリント装置1’によれば、アクチュエータ104が上側基台110bを垂直下方向に移動することで、押圧部112bの下面が基板300’を垂直下方に押圧する。このため、基板300’の下側転写層301aが下側モールド200aのパターン面に密着され、パターンの転写が行なわれる。また、アクチュエータ102が上側基台110bを垂直上方向に移動することで、下側モールド200aと基板300’との相互の押圧のための押圧力が解除される。 According to such an imprint apparatus 1 ', the actuator 104 moves the upper base 110b vertically downward, so that the lower surface of the pressing portion 112b presses the substrate 300' vertically downward. Therefore, the lower transfer layer 301a of the substrate 300 'is brought into close contact with the pattern surface of the lower mold 200a, and the pattern is transferred. Further, the actuator 102 moves the upper base 110b vertically upward, so that the pressing force for mutual pressing between the lower mold 200a and the substrate 300 'is released.
 その後、制御部102の制御の下、下側センターピン120aと上側センターピン120bとが基板300’を保持した状態で垂直上方向に移動させることで、基板300’が下側モールド200aより離型する。 Thereafter, under the control of the control unit 102, the lower center pin 120a and the upper center pin 120b are moved vertically upward while holding the substrate 300 ′, so that the substrate 300 ′ is released from the lower mold 200a. To do.
 インプリント装置1’においても、離型動作時には、制御部102の制御の下、下側センターピン120aの位置が制御されるとともに、上側センターピン120bが基板300を押圧する力がトルク制御により制御される。このような位置制御及びトルク制御によれば、基板300が下側センターピン120a及び上側センターピン120bにより過剰な力で狭持されることで歪みや損傷が生じることを好適に抑制出来る。 Also in the imprint apparatus 1 ′, during the mold release operation, the position of the lower center pin 120a is controlled under the control of the control unit 102, and the force with which the upper center pin 120b presses the substrate 300 is controlled by torque control. Is done. According to such position control and torque control, it is possible to suitably suppress the occurrence of distortion and damage due to the substrate 300 being held between the lower center pin 120a and the upper center pin 120b with an excessive force.
 このため、インプリント装置1’によれば、上述したインプリント装置1と同等の効果を享受しつつ、基板300’の転写層301aに対して下側モールド200a表面に形成されたパターンを転写することが出来る。 For this reason, according to the imprint apparatus 1 ′, the pattern formed on the surface of the lower mold 200a is transferred to the transfer layer 301a of the substrate 300 ′ while enjoying the same effect as the imprint apparatus 1 described above. I can do it.
 (4)その他の変形例
 続いて、本発明に係る転写装置のその他の変形例について、図10及び図11を参照して説明する。
(4) Other Modifications Next, other modifications of the transfer device according to the present invention will be described with reference to FIGS.
 図10は、本発明の転写装置の第2変形例であるインプリント装置1’’及び制御装置400の構成を概略的に示す模式図である。尚、本変形例及び図10において、図1に示されるインプリント装置1と同様の構成については、同一の番号を付して説明を省略している。 FIG. 10 is a schematic diagram schematically showing a configuration of an imprint apparatus 1 ″ and a control apparatus 400, which is a second modification of the transfer apparatus of the present invention. Note that, in this modification and FIG. 10, the same components as those of the imprint apparatus 1 shown in FIG.
 インプリント装置1’’は、図1に示されるインプリント装置1において、制御部102と操作部103とを備えない構成である。その他の部位については、インプリント装置1と同等であってよい。 The imprint apparatus 1 ″ has a configuration that does not include the control unit 102 and the operation unit 103 in the imprint apparatus 1 illustrated in FIG. 1. Other parts may be equivalent to the imprint apparatus 1.
 制御装置400は、インプリント装置1の制御部102及び操作部103と同等の構成である制御部102’及び操作部103’を備え、インプリント装置1’’の各部に対して電気的に接続される。個の構成では、制御装置400の制御部102’がインプリント装置1’’の各部に対して制御信号を供給することなどにより、動作の制御を行なう。 The control device 400 includes a control unit 102 ′ and an operation unit 103 ′ having the same configuration as the control unit 102 and the operation unit 103 of the imprint apparatus 1, and is electrically connected to each unit of the imprint apparatus 1 ″. Is done. In this configuration, the control unit 102 ′ of the control device 400 controls the operation by supplying a control signal to each unit of the imprint apparatus 1 ″.
 本発明の転写装置の第2変形例によれば、インプリント装置1’’と制御装置400とを離隔した位置に夫々配置しながら、上述したインプリント装置1により得られる効果と同等の効果を享受することが出来る。 According to the second modification of the transfer device of the present invention, the imprinting device 1 ″ and the control device 400 are arranged at separate positions, and the same effect as that obtained by the imprinting device 1 described above is obtained. You can enjoy it.
 また、第3変形例として、1つの制御装置400が複数のインプリント装置に接続され、夫々のインプリント装置の動作の制御を行なう装置構成がある。本変形例では、図11(a)に示されるように、n個のインプリント装置1’’-1、2、…nに対して1つの制御装置400が設けられ、該制御装置400が各インプリント装置1’’-1、2、…nに対して制御信号の供給などを行なうことで、各インプリント装置の動作の制御を行なう。具体的には、1つの制御装置400は、複数のn個のインプリント装置1’’-1、2、…nに対して制御信号の供給などを行うことで、図5乃至図8に示される転写動作に係る各工程を実施させるよう、集中的に制御する。 As a third modification, there is a device configuration in which one control device 400 is connected to a plurality of imprint devices and controls the operation of each imprint device. In this modified example, as shown in FIG. 11A, one control device 400 is provided for n imprint devices 1 ″ -1, 2,... The operation of each imprint apparatus is controlled by supplying control signals to the imprint apparatuses 1 ″ -1, 2,... N. Specifically, one control device 400 supplies control signals to a plurality of n imprint devices 1 ″ -1, 2,... N, and the like, as shown in FIGS. Centralized control is performed so that each process related to the transfer operation is performed.
 また、第4変形例として、複数のインプリント装置に対して夫々接続される複数の制御部に対して、1つの操作部により、動作を制御するためのユーザの指示の入力を行なう装置構成がある。本変形例では、図11(b)に示されるように、n個のインプリント装置1’’-1、2、…nに対して、夫々個別の制御部102’-1、2、…nが接続され、各インプリント装置1''-1、2、…nの動作の制御が行なわれている。また、操作部103’は、各制御部102’-1、2、…nの夫々に対して接続され、ユーザの操作による指示の入力を行なっている。 Further, as a fourth modified example, there is an apparatus configuration in which a user's instruction for controlling operations is input by a single operation unit to a plurality of control units respectively connected to a plurality of imprint apparatuses. is there. In this modification, as shown in FIG. 11B, for each of the n imprint apparatuses 1 ″ -1, 2,... N, the individual control units 102′-1, 2,. Are connected to control the operation of each imprint apparatus 1 ″ -1, 2,... N. The operation unit 103 ′ is connected to each of the control units 102 ′-1, 2,... N, and inputs an instruction by a user operation.
 具体的には、ユーザは、1つの操作部103’を用いることで各インプリント装置1''-1、2、…nにおける動作開始、動作停止、また転写を行う基板枚数などの設定を集中的に行うことが出来、操作部103’は、設定された指示内容を各インプリント装置1''-1、2、…nの制御部102'-1、2、…nに夫々入力する。
各インプリント装置1''-1、2、…nの制御部102'-1、2、…nは、入力された指示に基づき、夫々対応するインプリント装置1''-1、2、…nに図5乃至図8に示される転写動作に係る各工程を実施させるよう制御信号の供給などを行う。
Specifically, the user concentrates settings such as operation start, operation stop, and the number of substrates to be transferred in each imprint apparatus 1 ″ -1, 2,... N by using one operation unit 103 ′. The operation unit 103 ′ inputs the set instruction contents to the control units 102′-1, 2,... N of the imprint apparatuses 1 ″ -1, 2,.
The control units 102′-1, 2,... N of the respective imprint apparatuses 1 ″ -1, 2,... N respectively correspond to the corresponding imprint apparatuses 1 ″ -1, 2,. A control signal is supplied so that n performs each step related to the transfer operation shown in FIGS.
 本発明の転写装置の第3及び第4の変形例によれば、複数のインプリント装置1''-1、2、…nの夫々に対して1つの制御装置400、又は操作部103’によりユーザの指示を入力可能となる。このため、多くのインプリント装置が同時に稼働することが要求される工場などにおいて、集中的な管理が可能となる。また、装置構成やコストの面でも有益である。
上述した実施例ではUV式のインプリント装置を例に説明したが、これに限定されず、他の方式、例えば熱式のインプリント装置にも適用可能である。
According to the third and fourth modifications of the transfer device of the present invention, one control device 400 or operation unit 103 ′ is used for each of the plurality of imprint devices 1 ″ -1, 2,. User instructions can be input. For this reason, centralized management is possible in a factory where many imprint apparatuses are required to operate simultaneously. Moreover, it is useful also in terms of apparatus configuration and cost.
In the above-described embodiments, the UV type imprint apparatus has been described as an example.
 本発明は、上述した実施例に限られるものではなく、請求の範囲及び明細書全体から読み取れる発明の要旨又は思想に反しない範囲で適宜変更可能であり、そのような変更を伴なう転写装置及び方法並びにコンピュータプログラムなどもまた本発明の技術的範囲に含まれるものである。 The present invention is not limited to the above-described embodiments, and can be appropriately changed without departing from the gist or concept of the invention that can be read from the claims and the entire specification, and a transfer apparatus accompanying such a change. And methods, computer programs, and the like are also included in the technical scope of the present invention.
1 インプリント装置、
101 ボールネジ、
102 制御部、
103 操作部、
104 アクチュエータ、
110a 下側基台、
110b 上側基台、
120a 下側センターピン、
120b 上側センターピン、
130a UV照射部、
130b UV照射部、
140a センターピン駆動部、
140b センターピン駆動部、
150a 下側ステージ、
150b 上側ステージ、
151a 下側開口部、
151b 上側開口部、
152a 下側モールド保持部、
152b 上側モールド保持部、
153a 下側モールドクランプ、
153b 上側モールドクランプ、
154a 吸着部、
154b 吸着部、
155a 吸着溝、
155b 吸着溝、
156a 弾性部材、
156b 弾性部材、
200a 下側モールド、
200b 上側モールド、
300 基板、
301a 転写層、
301b 転写層。
1 imprint device,
101 ball screw,
102 control unit,
103 operation unit,
104 actuator,
110a Lower base,
110b upper base,
120a Lower center pin,
120b upper center pin,
130a UV irradiation unit,
130b UV irradiation unit,
140a Center pin drive unit,
140b center pin drive unit,
150a lower stage,
150b upper stage,
151a lower opening,
151b upper opening,
152a Lower mold holding part,
152b Upper mold holding part,
153a Lower mold clamp,
153b Upper mold clamp,
154a adsorption part,
154b adsorption part,
155a suction groove,
155b suction groove,
156a elastic member,
156b elastic member,
200a lower mold,
200b Upper mold,
300 substrates,
301a transfer layer,
301b Transfer layer.

Claims (12)

  1.  モールドに形成されたパターンを被転写体に転写する転写装置であって、
     前記被転写体を第1の方向から支持する第1支持手段と、
     前記第1支持手段に支持された前記被転写体に対して、前記第1の方向とは異なる第2の方向から前記被転写体に力を加えることで、前記被転写体を前記第1支持手段に固定する第2支持手段と、
     前記第2支持手段が前記被転写体に力を加えている間、前記第1支持手段の位置を固定する固定手段と
     を備えることを特徴とする転写装置。
    A transfer device for transferring a pattern formed on a mold to a transfer target,
    First support means for supporting the transfer object from a first direction;
    A force is applied to the transfer object from a second direction different from the first direction with respect to the transfer object supported by the first support means, thereby supporting the transfer object to the first support. Second support means fixed to the means;
    A transfer device comprising: fixing means for fixing a position of the first support means while the second support means applies a force to the transfer target.
  2.  前記固定手段は、前記第2支持手段によって加えられる力により前記第1支持手段が移動しないよう、前記第1支持手段の位置を固定することを特徴とする請求項1に記載の転写装置。 2. The transfer apparatus according to claim 1, wherein the fixing means fixes the position of the first support means so that the first support means does not move due to a force applied by the second support means.
  3.  前記第1の方向と前記第2の方向は、互いの反対の方向であることを特徴とする請求項1又は2に記載の転写装置。 3. The transfer apparatus according to claim 1, wherein the first direction and the second direction are directions opposite to each other.
  4.  前記被転写体は貫通孔を有するディスク基板であり、
     前記第1支持手段は、前記ディスク基板の一方の面の前記貫通孔の周辺部と接触して前記被転写体を支持し、
     前記第2支持手段は、前記ディスク基板の他方の面の前記貫通孔の周辺部において力を加えることを特徴とする請求項1に記載の転写装置。
    The transfer object is a disk substrate having a through hole,
    The first support means supports the transferred body in contact with a peripheral portion of the through hole on one surface of the disk substrate,
    The transfer device according to claim 1, wherein the second support unit applies a force at a peripheral portion of the through hole on the other surface of the disk substrate.
  5.  前記第1支持手段を移動する第1駆動手段と、
     前記第2支持手段を移動する第2駆動手段とを更に備え、
     前記第2駆動手段は、前記第2支持手段を前記被転写体方向に移動させることで、前記被転写体を前記第1支持手段に押圧し、前記被転写体を前記第1支持手段に固定することを特徴とする請求項1に記載の転写装置。
    First drive means for moving the first support means;
    A second drive means for moving the second support means;
    The second driving unit moves the second support unit in the direction of the transfer target, thereby pressing the transfer target to the first support and fixing the transfer target to the first support. The transfer device according to claim 1, wherein:
  6.  前記第2支持手段が前記被転写体に加える力を制御する制御手段を更に備えることを特徴とする請求項1に記載の転写装置。 2. The transfer apparatus according to claim 1, further comprising a control unit that controls a force applied by the second support unit to the transfer target.
  7.  前記制御手段は、前記第2支持手段が前記被転写体から所定の距離まで接近した後に、前前記第2支持手段が前記被転写体に加える力を制御することを開始することを特徴とする請求項6に記載の転写装置。 The control means starts to control the force applied by the previous second support means to the transferred body after the second supporting means approaches a predetermined distance from the transferred body. The transfer device according to claim 6.
  8.  第1モールドに形成されたパターンを被転写体の第1の面に転写し、且つ第2モールドに形成されたパターンを前記被転写体の第2の面に転写する転写装置であって、
     前記被転写体を保持する被転写体保持手段と、
     前記被転写体を第1の方向から支持する第1支持手段と、
     前記第1支持手段に支持された前記被転写体に対して、前記第1の方向とは異なる第2の方向から前記被転写体に力を加えることで、前記被転写体を前記第1支持手段に固定する第2支持手段と、
     前記第2支持手段が前記被転写体に力を加えている間、前記第1支持手段の位置を固定する固定手段と
     を備えることを特徴とする転写装置。
    A transfer device for transferring a pattern formed on a first mold to a first surface of a transfer object and transferring a pattern formed on a second mold to a second surface of the transfer object;
    A transferred object holding means for holding the transferred object;
    First support means for supporting the transfer object from a first direction;
    A force is applied to the transfer object from a second direction different from the first direction with respect to the transfer object supported by the first support means, thereby supporting the transfer object to the first support. Second support means fixed to the means;
    A transfer device comprising: fixing means for fixing a position of the first support means while the second support means applies a force to the transfer target.
  9.  制御装置からの指示に応じて動作し、モールドに形成されたパターンを被転写体に転写する転写装置であって、
     前記制御装置の指示に応じて、前記被転写体を第1の方向から支持する第1支持手段と、
     前記制御装置の指示に応じて、前記第1支持手段に支持された前記被転写体に対して、前記第1の方向とは異なる第2の方向から前記被転写体に力を加えることで、前記被転写体を前記第1支持手段に固定する第2支持手段と、
     前記制御装置の指示に応じて、前記第2支持手段が前記被転写体に力を加えている間、前記第1支持手段の位置を固定する固定手段と
     を備えることを特徴とする転写装置。
    A transfer device that operates according to an instruction from a control device and transfers a pattern formed on a mold to a transfer target,
    First support means for supporting the transfer object from a first direction in accordance with an instruction from the control device;
    In response to an instruction from the control device, a force is applied to the transfer object from a second direction different from the first direction with respect to the transfer object supported by the first support means. Second support means for fixing the transfer object to the first support means;
    A transfer device comprising: fixing means for fixing a position of the first support means while the second support means applies a force to the transfer target body in accordance with an instruction from the control device.
  10.  モールドに形成されたパターンを被転写体に転写する転写装置における転写方法であって、
     第1支持手段を用いて、前記被転写体を第1の方向から支持する第1支持工程と、
     前記第1支持手段に支持された前記被転写体に対して、前記第1の方向とは異なる第2の方向から前記被転写体に力を加えることで、前記被転写体を前記第1支持手段に固定する第2支持工程と、
     前記第2支持工程において前記被転写体に力を加えている間、前記第1支持手段の位置を固定する固定工程と
     を備えることを特徴とする転写方法。
    A transfer method in a transfer device for transferring a pattern formed on a mold to a transfer target,
    A first support step of supporting the transfer object from a first direction using a first support means;
    A force is applied to the transfer object from a second direction different from the first direction with respect to the transfer object supported by the first support means, thereby supporting the transfer object to the first support. A second support step for fixing to the means;
    A fixing step of fixing a position of the first support means while applying a force to the transfer target in the second support step.
  11.  第1モールドに形成されたパターンを被転写体の第1の面に転写し、且つ第2モールドに形成されたパターンを前記被転写体の第2の面に転写する転写装置における転写方法であって、
     第1支持手段を用いて、前記被転写体を第1の方向から支持する第1支持工程と、
     前記第1支持手段に支持された前記被転写体に対して、前記第1の方向とは異なる第2の方向から前記被転写体に力を加えることで、前記被転写体を前記第1支持手段に固定する第2支持工程と、
     前記第2支持工程において前記被転写体に力を加えている間、前記第1支持手段の位置を固定する固定工程と
     を備えることを特徴とする転写方法。
    A transfer method in a transfer apparatus for transferring a pattern formed on a first mold to a first surface of a transfer object and transferring a pattern formed on a second mold to a second surface of the transfer object. And
    A first support step of supporting the transfer object from a first direction using a first support means;
    A force is applied to the transfer object from a second direction different from the first direction with respect to the transfer object supported by the first support means, thereby supporting the transfer object to the first support. A second support step for fixing to the means;
    A fixing step of fixing a position of the first support means while applying a force to the transfer target in the second support step.
  12. コンピュータプログラム
     モールドに形成されたパターンを被転写体に転写する転写装置を動作させるためのコンピュータプログラムであって、
     第1支持手段を用いて、前記被転写体を第1の方向から支持する第1支持工程と、
     前記第1支持手段に支持された前記被転写体に対して、前記第1の方向とは異なる第2の方向から前記被転写体に力を加えることで、前記被転写体を前記第1支持手段に固定する第2支持工程と、
     前記第2支持工程において前記被転写体に力を加えている間、前記第1支持手段の位置を固定する固定工程と
     を前記転写装置に実行させることを特徴とするコンピュータプログラム。
    A computer program for operating a transfer device for transferring a pattern formed on a mold to a transfer object,
    A first support step of supporting the transfer object from a first direction using a first support means;
    A force is applied to the transfer object from a second direction different from the first direction with respect to the transfer object supported by the first support means, thereby supporting the transfer object to the first support. A second support step for fixing to the means;
    A computer program causing the transfer apparatus to execute a fixing step of fixing a position of the first support means while applying a force to the transfer target in the second support step.
PCT/JP2010/055248 2010-03-25 2010-03-25 Transfer apparatus and method, and computer program WO2011118005A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/JP2010/055248 WO2011118005A1 (en) 2010-03-25 2010-03-25 Transfer apparatus and method, and computer program

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2010/055248 WO2011118005A1 (en) 2010-03-25 2010-03-25 Transfer apparatus and method, and computer program

Publications (1)

Publication Number Publication Date
WO2011118005A1 true WO2011118005A1 (en) 2011-09-29

Family

ID=44672596

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2010/055248 WO2011118005A1 (en) 2010-03-25 2010-03-25 Transfer apparatus and method, and computer program

Country Status (1)

Country Link
WO (1) WO2011118005A1 (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03141052A (en) * 1989-10-25 1991-06-17 Nec Corp Method and device for reproducing optical recording carrier
JP2000246810A (en) * 1999-03-03 2000-09-12 Sharp Corp Device and method for producing optical element
JP2007095248A (en) * 2005-08-30 2007-04-12 Sony Corp Optical disk manufacturing method and its manufacturing apparatus
JP2008012859A (en) * 2006-07-07 2008-01-24 Hitachi High-Technologies Corp Imprinting device and imprinting method
JP2008155522A (en) * 2006-12-25 2008-07-10 Fuji Electric Device Technology Co Ltd Imprinting method and apparatus for it
JP2008221552A (en) * 2007-03-12 2008-09-25 Hitachi High-Technologies Corp Microstructure transfer device, stamper and manufacturing method of microstructure
JP2009241274A (en) * 2008-03-28 2009-10-22 Toshiba Corp Imprinting method and stamper

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03141052A (en) * 1989-10-25 1991-06-17 Nec Corp Method and device for reproducing optical recording carrier
JP2000246810A (en) * 1999-03-03 2000-09-12 Sharp Corp Device and method for producing optical element
JP2007095248A (en) * 2005-08-30 2007-04-12 Sony Corp Optical disk manufacturing method and its manufacturing apparatus
JP2008012859A (en) * 2006-07-07 2008-01-24 Hitachi High-Technologies Corp Imprinting device and imprinting method
JP2008155522A (en) * 2006-12-25 2008-07-10 Fuji Electric Device Technology Co Ltd Imprinting method and apparatus for it
JP2008221552A (en) * 2007-03-12 2008-09-25 Hitachi High-Technologies Corp Microstructure transfer device, stamper and manufacturing method of microstructure
JP2009241274A (en) * 2008-03-28 2009-10-22 Toshiba Corp Imprinting method and stamper

Similar Documents

Publication Publication Date Title
JP5299736B2 (en) Film sticking device
CA2611436C (en) Method and device for nano-imprinting
KR102388886B1 (en) Imprinting device
KR101374001B1 (en) Imprint apparatus and method of manufacturing article
TW201006659A (en) Pattern forming method
JP4761026B2 (en) Element transfer device, element transfer method, and display device manufacturing method
KR101771838B1 (en) Detaching apparatus
WO2011155035A1 (en) Transfer device
WO2011118006A1 (en) Transfer apparatus and method, and computer program
JP2017112230A (en) Imprint device and article manufacturing method
WO2011118005A1 (en) Transfer apparatus and method, and computer program
JP5744423B2 (en) Imprint apparatus, imprint method, and device manufacturing method
WO2011141996A1 (en) Transfer device and method, and computer program
KR101005582B1 (en) Alignment module for substrate and lithography apparatus having the alignment module
WO2011141995A1 (en) Transfer device and method, and computer program
JP2012099789A (en) Imprint device and manufacturing method of article
JP5052660B2 (en) MOLD, MOLD MANUFACTURING METHOD, AND MOLD TRANSFER METHOD
JP5792829B2 (en) Pressure disc, laminating apparatus and laminating method
JP4608028B2 (en) Mold and manufacturing method thereof
WO2010086983A1 (en) Transfer device
JP2009045757A (en) Fixing device for transfer mold and method for removing substrate
JP4098292B2 (en) Magnetic transfer device holding unit, magnetic transfer device, and method of manufacturing magnetic recording medium
WO2010082297A1 (en) Transfer equipment
JP2016207950A (en) Imprinting device
JP2016111213A (en) Stage apparatus, lithography apparatus, and manufacturing method of article

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 10848398

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 10848398

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: JP