JP2017112230A - Imprint device and article manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an imprint device capable of enhancing degree of freedom in forming a mold into a convex shape.SOLUTION: The mold 5 includes: a deforming part 510; and a support part 520 which encloses the deforming part 510 to support the deforming part 510. A pressure control unit 40 controls the pressure in a space SP at the second face side of the mold 5 held by a mold holding part 70 to deform the deforming part 510 of the mold 5. A suction part 90 sucks an outer area of the deforming part 510. Thereby, the degree of freedom to deform the deforming part 510 of the mold 5 using the pressure control unit 40 is improved.SELECTED DRAWING: Figure 6

Description

  The present invention relates to an imprint apparatus and an article manufacturing method.

  Imprint technology is attracting attention as a technology that replaces photolithography technology. Imprint technology supplies imprint material onto a substrate and cures the imprint material while the mold is in contact with the imprint material, thereby transferring the mold pattern to the imprint material on the substrate. It is. A mold is also called a mold or a template. In Patent Document 1, when the front side of the template is brought into contact with the imprint material on the substrate and when the template is separated from the cured imprint material, pressure is applied to the back side of the template to apply the template to the substrate. It is described that a convex shape is formed.

JP 2010-221374 A

  In the system in which the mold is deformed into a convex shape only by applying pressure to the space on the back side of the mold (template), the degree of freedom of control for deforming the mold into a convex shape is low. Therefore, there may be a limit in shortening the filling time of the imprint material into the mold pattern and reducing the defects of the pattern transferred to the imprint material. Further, when the mold is separated from the pattern transferred to the imprint material, the pattern may fall down or the mold may be damaged.

  The present invention has been made in light of the above problem recognition, and an object thereof is to increase the degree of freedom of control for deforming a mold into a convex shape.

  One aspect of the present invention relates to an imprint apparatus in which a mold is brought into contact with an imprint material supplied on a substrate and the imprint material is cured by light irradiation. The mold includes a deformable portion and the deformable portion. A support portion that surrounds the portion and supports the deformation portion, wherein the deformation portion includes a first surface provided with a mesa portion on which a pattern is formed, and a second surface opposite to the first surface. And the second surface includes a central region that is a region opposite to a region where the mesa portion is present, and an outer region outside the central region, and the imprint apparatus includes the mold of the mold A light irradiating unit for irradiating light to an imprint material between the substrate and the mold through a central region; a mold holding unit for holding the mold by holding the supporting unit of the mold; and the mold holding A pressure control unit that deforms the deformation unit by controlling the pressure of the space on the second surface side of the mold held by the light source so as not to prevent light irradiation to the central region by the light irradiation unit And a suction part that sucks the outer region of the mold.

  ADVANTAGE OF THE INVENTION According to this invention, the freedom degree of control which deform | transforms a mold into convex shape can be raised.

FIG. 2 is a diagram illustrating the configuration and operation of an imprint apparatus according to an embodiment of the present invention. FIG. 2 is a diagram illustrating the configuration and operation of an imprint apparatus according to an embodiment of the present invention. FIG. 2 is a diagram illustrating the configuration and operation of an imprint apparatus according to an embodiment of the present invention. The figure which illustrates a shot layout. The figure which shows the structural example of a mold. The figure which illustrates the structure arrange | positioned at a mold holding part and its periphery. FIG. 2 is a diagram illustrating the configuration and operation of an imprint apparatus according to an embodiment of the present invention. The figure explaining control of the shape of the deformation | transformation part of a mold by an adsorption | suction part. The figure explaining control of the shape of the deformation | transformation part of a mold by an adsorption | suction part. The figure which shows a comparative example. The figure which shows the other example of independent control of adsorption | suction of the several adsorption pad by an adsorption | suction control part. The figure which shows the other structural example of an adsorption | suction part.

  Hereinafter, the present invention will be described through exemplary embodiments thereof with reference to the accompanying drawings.

  1 to 3 schematically show the configuration and operation of an imprint apparatus 100 according to an embodiment of the present invention. The imprint apparatus 100 brings the mold 5 into contact with the imprint material supplied on the substrate 1 and cures the imprint material by light irradiation. The imprint material may be a photocurable composition that cures when irradiated with light. The imprint material may mean a cured state or an uncured state. The photocurable composition can contain at least a polymerizable compound and a photopolymerization initiator. Further, the photocurable composition may additionally contain a non-polymerizable compound or a solvent. The non-polymerizable compound may be at least one selected from the group of, for example, a sensitizer, a hydrogen donor, an internal release agent, a surfactant, an antioxidant, and a polymer component. The light for curing the imprint material can be, for example, light (for example, infrared rays, visible rays, ultraviolet rays) having a wavelength selected from a range of 10 nm to 1 mm.

  In this specification and the accompanying drawings, directions are shown in an XYZ coordinate system in which a direction parallel to the surface of the substrate 1 is an XY plane. In the XYZ coordinate system, the directions parallel to the X, Y, and Z axes are the X, Y, and Z directions, respectively, and rotation around the X axis, rotation around the Y axis, and rotation around the Z axis are θX and θY, respectively. , ΘZ. The control or drive related to the X axis, Y axis, and Z axis means control or drive related to the direction parallel to the X axis, the direction parallel to the Y axis, and the direction parallel to the Z axis, respectively. The control or drive related to the θX axis, θY axis, and θZ axis relates to rotation around an axis parallel to the X axis, rotation around an axis parallel to the Y axis, and rotation around an axis parallel to the Z axis. Means control or drive. The position is information that can be specified based on the coordinates of the X axis, Y axis, and Z axis, and the posture is information that can be specified by relative rotation with respect to the θX axis, θY axis, and θZ axis. Positioning means controlling position and / or attitude.

  The imprint apparatus 100 includes a drive unit DRVU that relatively drives the substrate 1 and the mold 5 in order to control the relative positions and postures of the substrate 1 and the mold 5. The drive unit DRVU drives at least one of the substrate 1 and the mold 5 so that the relative position between the substrate 1 and the mold 5 is adjusted. The drive unit DRVU can include, for example, a substrate drive unit 20 for positioning the substrate 1 and a mold drive unit 30 for positioning the mold 5. In one example, the substrate driving unit 20 drives the substrate 1 about a plurality of axes (for example, three axes of X axis, Y axis, and θZ axis), and the mold driving unit 30 holds a mold holding unit 70 that holds the mold 5. To drive the mold 5 about a plurality of axes (for example, six axes of X axis, Y axis, Z axis, θX axis, θY axis, and θZ axis). The substrate driving unit 20 can include, for example, a fine movement stage 22 that holds and finely moves the substrate 1, a coarse movement stage 23 that coarsely moves the fine movement stage 22, and a base frame 24 that supports the coarse movement stage 23. The drive unit DRVU adjusts the relative position between the substrate 1 and the mold 5 with respect to the X axis, Y axis, θX axis, θY axis, and θZ axis, and also adjusts the relative position between the substrate 1 and the mold 5 with respect to the Z axis. . The adjustment of the relative position between the substrate 1 and the mold 5 with respect to the Z axis includes an operation of contact and separation between the imprint material on the substrate 1 and the mold 5.

  In addition, the imprint apparatus 100 can include a light irradiation unit 6, a dispenser (supply unit) 7, a tank 8, a tube 9, a moving mechanism 10, an alignment scope 11, and a surface plate 12. The light irradiation unit 6 cures the imprint material by irradiating the imprint material between the substrate 1 and the mold 5 through the mold 5 with light. The dispenser 7 is a supply unit that supplies a liquid (uncured) imprint material onto the substrate 1. The tank 8 stores an imprint material. The imprint material accommodated in the tank 8 is supplied to the dispenser 7 through the tube 9. The moving mechanism 10 can move the dispenser 7 to a plurality of positions. The plurality of positions may include, for example, a supply position for performing an operation of supplying the imprint material to the substrate 1, a maintenance position for maintaining the dispenser 7, and a cleaning position for cleaning the dispenser 7. The alignment scope 11 outputs information indicating a relative position and rotation between the shot region and the mold 5 by detecting an alignment mark provided in the shot region of the substrate 1 and an alignment mark provided in the mold 5. . The surface plate 12 supports the light irradiation unit 6, the dispenser 7, the tank 8, the tube 9, the moving mechanism 10, and the alignment scope 11.

  5A and 5B illustrate the configuration of the mold 5. The mold 5 includes a deformable portion (diaphragm) 510 and a support portion 520 that surrounds the deformable portion 510 and supports the deformable portion 510. The deformable portion 510 has a first surface S1 provided with a mesa portion 512 on which a pattern to be transferred to the imprint material on the substrate 1 is provided, and a second surface S2 opposite to the first surface S1. Yes. The second surface S2 can include a central region CR that is a region opposite to the region where the mesa portion 512 is present, and an outer region OR outside the central region CR. The deformation part 510 may have a circular shape. The mesa unit 512 may have a rectangular shape having two sides LS constituting the first opposite side and two sides SS constituting the second opposite side. The two sides LS constituting the first opposite side may be long sides, and the two sides SS constituting the second opposite side may be short sides. The mold 5 can be made of a light transmissive material (for example, quartz). In one example, the mold 5 may have a length of 152 mm, a width of 152 mm, and a thickness of 6.35 mm.

  FIGS. 6A and 6B exemplify a structure that is disposed around the mold holding unit 70 and its periphery. The mold holding unit 70 holds the mold 5. For example, the mold 5 may be held by vacuum suction, but may be configured to hold the mold 5 by other methods (for example, a mechanical chuck). The mold driving unit 30 drives the mold 5 by driving the mold holding unit 70. The mold holding part 70 can include a frame part 72 having a holding surface MHS that holds the mold 5 and a facing part 74 that faces the outer region OR of the mold 5 in a state where the mold holding part 70 holds the mold 5. Further, the mold holding unit 70 may include a light transmission unit 76 disposed inside the facing unit 74. The light transmission unit 76 transmits the light from the light irradiation unit 70 so as to enter the central region CR of the mold 5. Thereby, the light from the light irradiation unit 70 is irradiated to the imprint material between the substrate 1 and the mold 5 through the central region CR of the mold 5.

  The imprint apparatus 100 includes a pressure control unit 40. The pressure control unit 40 deforms the deforming unit 510 of the mold 5 by controlling the pressure of the space SP on the second surface S2 side of the mold 5 held by the mold holding unit 70. The pressure control unit 40 communicates with the space SP via the flow path 42. The channel 42 can include a communication hole provided in the mold holding unit 70. When the pressure control unit 40 makes the pressure of the space SP higher than the pressure of the external space (the space on the first surface S1 side), as illustrated in FIG. 6B, the deforming unit 510 is moved to the external space side. It is deformed to form a convex shape. In one example, the pressure control unit 40 can control the pressure of the space SP within a range of −30 kPa to 30 kPa as a gauge pressure. The pressure control unit 40 can include a sensor that detects the pressure of the space SP. In this case, the pressure of the space SP can be controlled based on the output of the sensor.

  The imprint apparatus 100 further includes a suction unit 90. The adsorption unit 90 is disposed so as not to prevent the light irradiation unit 6 from irradiating the central region CR of the mold 5 with light, and adsorbs the outer region OR on the second surface S2 of the deformation unit 510 of the mold 5. By adsorbing the outer region OR of the deformed portion OR by the adsorbing portion 90, the degree of freedom of deformation of the deformable portion 510 of the mold 5 by the pressure control unit 40 is improved. Alternatively, from another point of view, the shape of the deformable portion 510 of the mold 5 is controlled by the pressure control unit 40 and the suction unit 90. The imprint apparatus 100 may further include a suction control unit 80 that controls suction of the outer region OR of the mold 5 by the suction unit 90. In one example, the adsorption unit 90 adsorbs the outer region OR by vacuum adsorption, and the adsorption control unit 80 provides a pressure for adsorption to the adsorption unit 90 via the pressure line 82. The suction unit 90 may include a plurality of suction pads, and the suction control unit 80 may be configured to independently control the suction of the outer region OR by the plurality of suction pads.

  The imprint apparatus 100 may further include an actuator 110 that controls the shape of the deformation portion 510 of the mold 5 by moving the suction portion 90. By providing the actuator 110, the degree of freedom in controlling the shape of the deformable portion 510 of the mold 5 can be further improved. The actuator 110 can be disposed between the suction part 90 and the facing part 74 of the mold holding part 70. The actuator 110 can be composed of, for example, a piezoelectric element or a cylinder (for example, an air cylinder). The actuator 110 may be configured to control the position of the suction unit 90 or to apply a force to the suction unit 90, for example. The imprint apparatus 100 can further include a bellows 120 (elastic portion) that connects the suction portion 90 and the facing portion 74 of the mold holding portion 70. In this case, the actuator 110 and the pressure line 82 can be disposed in the bellows 120. The bellows 120 provides a function of reinforcing the actuator 110 and / or a function of guiding the translation of the actuator 110. The bellows 120 is an example of an elastic part, and the actuator 110 can be arranged in parallel with the bellows 120 as an elastic part. The actuator 110 is advantageous for absorbing the tolerance when the position of the second surface S2 of the mold 5 with respect to the mold holding surface MHS has a tolerance with respect to the designed position. That is, the actuator can be used to adjust the position of the suction unit 90 according to the tolerance.

  The imprint apparatus 100 further adjusts the shape (two-dimensional shape in the XY plane) of the pattern (in other aspects, the pattern area of the mesa portion 512) formed in the mesa portion 512 of the mold 5. A shape adjusting mechanism 60 may be provided. The imprint apparatus 100 adjusts the shape of the pattern (the pattern region of the mesa unit 512 in another aspect) formed on the mesa unit 512 of the mold 5 by the shape adjusting mechanism 60 according to the shape of the shot region of the substrate 1. sell.

  Hereinafter, an imprint method by the imprint apparatus 100 will be described with reference to FIGS. As illustrated in FIG. 4, the substrate 1 has a plurality of shot regions. In FIG. 4, the order in which imprinting is to be performed is given to shot areas as 1, 2, 3,. This imprint method is controlled by a control unit (not shown). As illustrated in FIG. 4, the substrate 1 has a plurality of shot regions. In FIG. 4, the order in which imprinting is to be performed is given to shot areas as 1, 2, 3,. The shot area can include one or more chip areas.

  1 to 3 exemplarily illustrate an imprint procedure performed by the imprint apparatus 100. In step S <b> 210, the substrate 1 is loaded on the fine movement stage 22 of the substrate driving unit 20. In step S <b> 220, the substrate drive unit 20 positions the shot area to be imprinted on the substrate 1 below the dispenser 7. In step S230, the imprint material IM is supplied to the shot area to be imprinted by the dispenser 7 while the substrate 1 is scanned by the substrate driving unit 20. In step S <b> 240, the shot area to be imprinted on the substrate 1 is positioned under the mold 5 by the substrate driving unit 20.

  In step S250, as illustrated in FIG. 7A, the pressure of the space SP on the second surface S2 side of the mold 5 is controlled by the pressure control unit 40, and the deformation unit 512 of the mold 5 is controlled by the suction unit 90. The outer region OR is adsorbed. As described above, the degree of freedom of deformation of the deformable portion 512 of the mold 5 is improved by adsorbing the outer region OR of the deformable portion 512 of the mold 5 by the adsorbing portion 90. Here, the degree of freedom of deformation of the deformable portion 512 of the mold 5 may be further increased by operating the actuator 110. Also, in step S250, the relative position between the substrate 1 and the mold 5 is changed by the drive unit DRVU so that the mesa unit 512 of the mold 5 contacts the imprint material IM on the shot area to be imprinted. In one example, in step S250, the mold 5 is lowered by the mold driving unit 30 of the driving unit DRVU so that the mesa unit 512 of the mold 5 contacts the imprint material IM. At this time, the alignment scope 11 can be used to detect the relative position and rotation between the alignment mark provided in the shot area to be imprinted on the substrate 1 and the alignment mark provided on the mold 5. Then, based on this relative position and rotation, the shot area to be imprinted and the mold 5 are positioned by the drive unit DRVU. The pressure in the space SP can be lowered by the pressure control unit 40 in accordance with the lowering of the mold 30 by the mold driving unit 30. Accordingly, the deformed portion 510 of the mold 5 can be gradually controlled to be flat as the mold 30 is lowered.

  In step S260, as illustrated in FIG. 7C, the light irradiation unit 6 irradiates the imprint material under the mesa unit 512 of the mold 5 with the light L through the central region CR of the mold 5. The imprint material is cured by this light irradiation, and the pattern of the mesa portion 512 of the mold 5 is transferred to the imprint material. In step S270, as illustrated in FIG. 7D, the mesa unit 512 of the mold 5 is separated from the cured imprint material IM over the shot region to be imprinted by the driving unit DRVU. The relative position between the substrate 1 and the mold 5 is changed. In one example, in step S270, the mold 5 is separated from the cured imprint material on the shot area to be imprinted by the mold driving unit 30 of the driving unit DRVU. In step S270, the pressure of the space SP on the second surface S2 side of the mold 5 is controlled by the pressure control unit 40, and the outer region OR of the deformed portion 512 of the mold 5 can be adsorbed by the adsorbing unit 90. Accordingly, the deformed portion 512 of the mold 5 is deformed so as to form a convex shape toward the substrate 1, and the convex shape is controlled. The above operation is one imprint cycle, and such a cycle is performed for a plurality of shot regions of the substrate 1.

  Hereinafter, control of the shape of the deformed portion 510 of the mold 5 by the suction portion 90 will be described with reference to FIGS. 8 and 9. The suction unit 90 can include a plurality of suction pads. In the example shown in FIGS. 8 and 9, the suction unit 90 includes a pair of suction pads 90a and 90a and a pair of suction pads 90b and 90b. The pair of suction pads 90 a and 90 a are disposed so as to face each other at positions on the outer sides of the two sides LS that constitute the first opposite side of the rectangular shape of the mesa portion 512 of the mold 5. The pair of suction pads 90b and 90b are disposed so as to face each other at positions on the outer sides of the two sides SS constituting the second opposing side of the rectangular shape of the mesa portion 512 of the mold 5. In one example, the pair of first suction pads 90a, 90a (or the region where the pair of first suction pads 90a, 90a sucks the deforming portion 510) may be parallel to each other. Similarly, in the pair of second suction pads 90b, 90b (or the region where the pair of first suction pads 90b, 90b sucks the deforming portion 510), the portions facing each other are parallel to each other.

  FIG. 8 shows a period during which the distance between the mold 5 and the substrate 1 is reduced in order to bring the mesa portion 512 of the deformable portion 510 of the mold 5 into contact with the imprint material on the substrate 1 (hereinafter referred to as a contact driving period). Operation | movement of the adsorption | suction part 90 in at least one part period is typically shown. In FIG. 8, the suction pads 90 a and 90 b with cross hatching suck the outer region OR of the deformed portion 510 of the mold 5. In the contact driving period, as schematically shown in FIG. 8, the outer region OR of the deformed portion 510 of the mold 5 is sucked by the pair of first suction pads 90a and 90a and the pair of second suction pads 90b and 90b. Period may be included. In FIG. 8, a thick line 800 schematically illustrates contour lines of the deformed portion 510 of the mold 5 that has been deformed into a convex shape by the pressure control unit 40. A contour line is a line constituted by a set of points having the same position in the Z direction of the deformable portion 510. The contour line 800 may include a portion parallel to each side of the rectangular shape of the mesa portion 510.

  FIG. 10 shows a contour line 820 of the deformable portion 510 when the suction portion 90 is not provided (or when the suction portion 90 is not operated) as a comparative example. When the suction part 90 is not provided (or when the suction part 90 is not operated), the contour line 820 tends to have a shape that follows the outer shape of the deformation part 510 (circular shape in this example). Therefore, for example, the protrusion amount at the four corners of the mesa portion 512 (the protrusion amount toward the substrate 1) is the smallest. Therefore, the four corners of the mesa portion 512 are the slowest in contact with the imprint material. This means that the filling of the imprint material into the concave pattern formed in the mesa 512 is the slowest at the four corners of the mesa 512.

  On the other hand, as shown in FIG. 8, when the suction unit 90 (90a, 90a, 90b, 90b) is operated, the contour line 800 includes a pair of first suction pads 90a, 90a and a pair of second suction pads 90b, There is a tendency to follow the shape of the figure composed of 90b. Therefore, the problem that the filling of the imprint material into the concave pattern of the mesa 512 at the four corners of the mesa 512 can be reduced. This is advantageous for reducing the filling time of the imprint material into the concave pattern for the entire area of the mesa portion 512.

  As described above, by providing the adsorbing portion 90, the degree of freedom of shape control of the contour line 800 of the deforming portion 510 deformed into a convex shape by the pressure control portion 40 is improved. Imprint material filling time can be shortened.

  FIG. 9 shows at least a part of a period during which the distance between the mold 5 and the substrate 1 is increased in order to separate the mesa portion 510 of the mold 5 from the imprint material on the substrate 1 (hereinafter, a separation driving period). Operation | movement of the adsorption | suction part 90 in a period is typically shown. In FIG. 9, the suction pads 90 b and 90 b with cross hatching suck the outer region OR of the deformed portion 510 of the mold 5, and the suction pads 90 a and 90 a with no cross hatching are attached to the mold 5. The outer region OR of the deformed portion 510 is not adsorbed. The suction control unit 80 is configured to be able to independently control the suction of the outer region OR of the deforming unit 510 by the plurality of suction pads 90a, 90a, 90b, 90b. In the separation drive period, as schematically shown in FIG. 9, the outer region OR is not sucked by the pair of first suction pads 90a and 90a, and the outer region OR is sucked by the pair of second suction pads 90b and 90b. May include a period during which In FIG. 9, a thick line 810 schematically shows contour lines of the deformed portion 510 of the mold 5 that has been deformed into a convex shape by the pressure control unit 40. The contour line 810 can include a portion parallel to each side of the rectangular shape of the mesa portion 510. The length of each contour line 810 in the mesa portion 512 is the boundary between the already separated portion and the portion not yet separated in the process of separating the mesa portion 512 from the cured imprint material on the substrate 1. Can be understood as the length of the part. As schematically shown in FIG. 9, the boundary is formed in a straight line extending in a direction parallel or perpendicular to the side of the mesa portion 512 having a rectangular shape.

  In the comparative example schematically shown in FIG. 10, after the circular contour line 820 is accommodated in the mesa portion 512, the boundary between the already separated portion and the portion not yet separated becomes circular. sell. For example, the length of the boundary at the moment when the circular contour line 820 falls within the mesa portion 512 is the length of the short side SS × π (circumference ratio). On the other hand, in the example shown in FIG. 9, the length of the contour line 810 after the contour line 810 enters the mesa portion 512 is the length of the short side SS × 2. Therefore, the example shown in FIG. 9 has a shorter contour line length than the comparative example shown in FIG. 10, and therefore the maximum force required for separation is small. This is advantageous because defects in the separation of the mold 5 from the cured imprint material are reduced. In addition, the fact that the boundary is a straight line extending in a direction parallel or perpendicular to the side of the mesa portion 512 having a rectangular shape is advantageous for reducing the collapse of the pattern formed by the cured imprint material. is there. This is because the pattern often extends in a linear direction extending in a direction parallel or perpendicular to the sides of the rectangular mesa portion 512.

  FIG. 11 shows another example of independent control of suction of a plurality of suction pads 90a, 90a, 90b, 90b by the suction control unit 80. The shot area arranged in the peripheral area of the substrate 1 may not have a rectangular shape. Such a shot area can be referred to as a missing shot area. The independent control of the suction of the plurality of suction pads 90a, 90a, 90b, 90b by the suction controller 80 is advantageous for the shape control of the deformed portion 510 of the mold 5 in the imprint for the chipped shot region. In imprinting on a missing shot area, when the mesa 512 is brought into contact with the imprint material on the missing shot area, it is preferable that the center of the missing shot area is close to the lowest point of the deformed portion 510 deformed into a convex shape. . In the example schematically shown in FIG. 11, the outer region OR of the deformed portion 510 is adsorbed only by one of the pair of adsorbing pads 90b and 90b, and is not adsorbed by the pair of adsorbing pads 90a and 90a. By such control, a degree of freedom can be given to shape control of the deformable portion 510 of the mold 5.

  FIG. 12 shows an example in which the configuration of the suction unit 90 is further simplified. In the example shown in FIG. 12, the degree of freedom in controlling the shape of the deformable portion 510 of the mold 5 is lower than in the examples shown in FIGS. 8, 9, and 11, but the configuration of the suction portion 90 is simplified. In the example shown in FIG. 12, the suction portion 90 has a frame shape so as to surround the central region CR of the deformable portion 510 of the mold 5 over the entire circumference.

  Hereinafter, a manufacturing method for manufacturing an article using the imprint apparatus 100 will be exemplarily described. A method for manufacturing a device (semiconductor integrated circuit element, liquid crystal display element, etc.) as an article includes a step of forming a pattern on a substrate (wafer, glass plate, film-like substrate) using the above-described imprint apparatus. Further, the manufacturing method may include a step of processing (for example, etching) the substrate on which the pattern is formed. In the case of manufacturing other articles such as patterned media (recording media) and optical elements, the manufacturing method may include other processes for processing a substrate on which a pattern is formed instead of etching. The article manufacturing method of this embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article as compared with the conventional method.

100: imprint apparatus, 1: substrate, 5: mold, 6: light irradiation unit, 7: dispenser (supply unit), 8: tank, 9: tube, 10: moving mechanism, 11: alignment scope, 12: surface plate , 22: fine movement stage, 23: coarse movement stage, 24: base frame, DRVU: drive unit, 30: mold drive unit, 40: pressure control unit, 60: shape adjusting mechanism, 70: mold holding unit, 72: frame unit 74: Opposing part, 80: Adsorption control part, 90: Adsorption part, 90a, 90b: Adsorption pad, 110: Actuator, 120: Bellows, 510: Deformation part, 512: Mesa part, 520: Support part, CR: Center Area, OR: outer area, SP: space, MHS: mold holding surface

Claims (11)

An imprint apparatus for bringing a mold into contact with an imprint material supplied on a substrate and curing the imprint material by light irradiation,
The mold includes a deformable portion and a support portion that surrounds the deformable portion and supports the deformable portion. The deformable portion includes a first surface on which a mesa portion on which a pattern is formed is provided; A second surface opposite to the first surface, the second surface includes a central region that is a region opposite to a region where the mesa portion is present, and an outer region outside the central region,
The imprint apparatus includes:
A light irradiation unit configured to irradiate light to the imprint material between the substrate and the mold through the central region of the mold;
A mold holding part for holding the mold by holding the support part of the mold;
A pressure control unit that deforms the deforming unit by controlling the pressure of the space on the second surface side of the mold held by the mold holding unit;
An adsorbing part that is arranged so as not to interfere with the irradiation of light to the central area by the light irradiating part, and adsorbs the outer area of the mold,
An imprint apparatus characterized by that. An actuator for controlling the shape of the deforming portion by moving the suction portion;
The imprint apparatus according to claim 1. The mold holding part includes a frame part having a mold holding surface for holding the mold, and a facing part facing the outer region of the mold in a state where the mold holding part holds the mold,
The actuator is disposed between the suction portion and the facing portion.
The imprint apparatus according to claim 2. It further comprises an elastic part that connects the adsorbing part and the opposing part,
The actuator is arranged in parallel with the elastic part,
The imprint apparatus according to claim 3. The suction part includes a plurality of suction pads,
The imprint apparatus according to claim 1, wherein the apparatus is an imprint apparatus. A suction control unit for independently controlling suction by the plurality of suction pads;
The imprint apparatus according to claim 5. The mesa portion has a rectangular shape having two sides constituting the first opposite side and two sides constituting the second opposite side,
The plurality of suction pads include a pair of first suction pads disposed to face each other at positions outside the two sides constituting the first opposite side, and two sides constituting the second opposite side A pair of second suction pads disposed to face each other at positions outside the
The imprint apparatus according to claim 5 or 6, wherein The pair of first suction pads have mutually opposite portions parallel to each other, and the pair of second suction pads have mutually opposite portions parallel to each other,
The imprint apparatus according to claim 7. The first opposite side is a long side, the second opposite side is a short side,
A period in which the distance between the mold and the substrate is reduced in order to bring the mesa portion into contact with the imprint material on the substrate is determined by the pair of first suction pads and the pair of second suction pads. Including the period during which the area is adsorbed,
During the period in which the distance between the mold and the substrate is increased in order to separate the mesa portion from the imprint material on the substrate, the outer region is not sucked by the pair of first suction pads, Including a period in which the outer region is sucked by a pair of second suction pads;
The imprint apparatus according to claim 7 or 8. The adsorption part has a frame shape surrounding the central region over the entire circumference,
The imprint apparatus according to claim 1, wherein the apparatus is an imprint apparatus. Forming a pattern on a substrate using the imprint apparatus according to any one of claims 1 to 10,
Processing the substrate on which the pattern is formed;
An article manufacturing method comprising:

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