JP2016207950A - Imprinting device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve the transfer quality of a minute pattern in an imprinting device.SOLUTION: An imprinting device comprises: a stage having an elastic area in a place where a substrate 8 coated with a transfer body 7 is placed; a thin-plate-like mold 4 that is flexible, has minute patterns on a first face 4a facing the stage, and is held with predetermined tension; a pressing roll 2 that is able to press a second face 4b opposite the first face 4a; and a holding member 3 that holds a portion of the thin-plate-like mold 4 after pressing by the pressing roll 2 is released. The pressing roll 2 is fed in a feed direction X while pressing the substrate 8 via the thin-plate-like mold 4. Thereby, the minute patterns on the thin-plate-like mold 4 are sequentially transferred to the transferred body 7. In the elastic area 6, the higher the pressure applied to the substrate 8 by the pressing roll 2, the thicker, and the lower the pressure, the thinner.SELECTED DRAWING: Figure 5

Description

  The present invention relates to an imprint apparatus for forming a fine pattern.

  In recent years, in optical components used in products such as displays and lighting, the reflection and diffraction of light is controlled by forming fine patterns (nanometer (nm) order to micron (μm) order) that exhibit special optical characteristics. Therefore, it is desired to realize a device that exhibits a new function that has not existed before. As a method for forming such a fine pattern, in recent years, imprint technology has attracted attention in addition to photolithography technology and electron beam lithography technology. The imprint technique is a technique for transferring a fine pattern of a mold by pressing a mold having a fine pattern formed on the surface thereof against a transfer target.

  Specific methods include a thermal imprint method and a UV imprint method. In the thermal imprint method, a thermoplastic resin as a transfer object is applied onto a substrate, the thermoplastic resin is heated to a glass transition temperature or higher and softened, and a mold is pressed against the softened thermoplastic resin. It has the process of transferring the fine pattern of a mold, and the process of cooling and hardening a thermoplastic resin.

  In the UV imprint method, a UV curable resin as a transfer target is applied onto a substrate, pressed against an uncured UV curable resin, and a process of transferring a fine pattern of the mold; A step of curing the UV curable resin by irradiating the UV curable resin with UV light.

  The thermal imprint method has an advantage that the material to be transferred has a wide selectivity, but has a disadvantage that a throughput is low because a heating step and a cooling step of the thermosetting resin are required. On the other hand, in the UV imprint method, since the material of the transfer object is limited to the UV curable resin, the selectivity of the material is narrower than that of the thermal imprint method, but the heating process and the cooling process are not required. Transfer can be completed in tens of seconds, and the throughput is very high. Which of the thermal imprinting method and the UV imprinting method is adopted depends on the device to be applied, but when there is no problem caused by the material, the UV imprinting method is considered suitable as a mass production method.

  As a method for forming a fine pattern, as shown in FIG. 10, a flat mold 14 on which a fine pattern is formed is applied with pressure in a vertical direction against the UV curable resin 7 applied to the surface of the substrate 8. Thus, a flat plate type imprint for transferring a fine pattern of the flat plate mold 14 to the UV curable resin 7 is generally used.

  However, in this method, since the flat plate mold 14 and the UV curable resin 7 are in contact with each other, there is a high possibility that minute bubbles remain inside the fine pattern of the flat plate mold 14 to cause a transfer defect. In order to suppress such transfer defects due to air bubbles, it is necessary to perform imprinting in a vacuum environment. In that case, an apparatus cost for the vacuum apparatus is required, and in order to reach a predetermined degree of vacuum Since a certain time is required, there is a problem that the throughput is lowered.

  In Patent Document 1, in order to solve the above problems, a roll-type UV imprint method as shown in FIG. 11 is adopted. In this system, the thin plate-shaped mold 4 on which a fine pattern is formed is sent in the feeding direction X while being pressed in the pressing direction Y by the pressing roll 2 against the UV curable resin 7 applied to the substrate 8. The fine pattern of the thin plate mold 4 is sequentially transferred to the UV curable resin 7. The UV curable resin 7 is cured by being irradiated with UV light 11 by a UV irradiator 10 installed behind the pressing roll 2.

  According to this method, since the thin plate-shaped mold 4 is sequentially pressed by sending the pressing roll 2 to the substrate 8, air easily escapes in the feeding direction X of the pressing roll 2, and the fine pattern of the thin plate-shaped mold 4. Can be formed without trapping air inside. Furthermore, since the pressing area between the thin plate mold 4 and the substrate 8 has a linear shape, the pressure for transfer can be reduced. In addition, since processing under atmospheric pressure is possible, a large vacuum device is not required.

JP 2014-54735 A

  However, in the roll pressurization type imprint system described in Patent Document 1, when pressure is applied to the UV curable resin 7 by the press roll 2 via the thin plate mold 4, as shown in FIG. The pressure is concentrated on both end portions E of the substrate 8 in the axial direction Z of the pressing roll 2. For this reason, the press roll 2 is warped in the pressing direction Y. As a result, since the pressure applied to the central portion in the axial direction Z is reduced, the film thickness of the UV curable resin 7 is increased in the central portion, or a gap is formed between the thin plate-shaped mold 4 and the UV curable resin 7. As a result, the transfer quality of the fine pattern is degraded.

  Further, for example, when the substrate 8 is circular as shown in FIG. 13, when the pressing roll 2 is fed from the end (starting point S) in the feeding direction X toward the center, the substrate 8 and the thin plate mold Since the contact area with the substrate gradually increases, the pressure applied to the substrate 8 gradually decreases. On the other hand, when the pressing roll 2 is fed from the center toward the end (end point F) in the feeding direction X, the contact area between the substrate 8 and the thin plate mold is gradually reduced, so that the pressure applied to the substrate 8 is large. Become. As a result, the thickness of the UV curable resin 7 is thin at the start point S and the end point F of the substrate 8 and the central portion is thick, and the transfer quality of the fine pattern is deteriorated.

  In view of the above-described conventional problems, an object of the present invention is to improve the transfer quality of a fine pattern by suppressing variations in film thickness of a transfer target after transfer of the fine pattern.

  The imprint apparatus of the present invention has a stage having an elastic region at a place on which a substrate coated with a transfer object is placed, has flexibility, and has a fine pattern on a first surface facing the stage, A thin plate mold held at a predetermined tension, a pressure roll capable of pressing the second surface opposite to the first surface of the thin plate mold, and the thin plate mold after the pressure by the pressure roll is released The pressing roll is fed in a feeding direction perpendicular to the axial direction and the pressing direction of the pressing roll while pressing the substrate through the thin plate mold. Thus, the fine pattern of the thin plate mold is sequentially transferred to the transfer target, and the elastic region is thicker at a portion where the pressure applied to the substrate by the pressing roll is larger, and the pressure is smaller. Thin it and said more had place.

  According to the imprint apparatus of the present invention, the elastic region in the pressing direction of the pressing roll is thicker at a portion where the pressure applied to the substrate by the pressing roll is larger, and is thinner at a portion where the pressure is smaller. Variations in the thickness of the body can be suppressed, which makes it possible to improve the transfer quality of the fine pattern.

It is side surface sectional drawing of the imprint apparatus in Embodiment 1 of this invention. It is the upper side figure and side surface sectional drawing of a thin plate-shaped mold in Embodiment 1 of this invention. It is a figure explaining the imprint method in Embodiment 1 of this invention. It is a figure explaining the imprint method in Embodiment 1 of this invention. It is the upper side figure and side sectional drawing of the stage of the imprint apparatus in Embodiment 1 of this invention. It is the upper side figure and side sectional drawing of the stage of the imprint apparatus in Embodiment 2 of this invention. It is a top view explaining the flow of the resin when the contact width between the thin plate mold and the resin is constant. It is the upper side figure and side sectional drawing of the stage of the imprint apparatus in Embodiment 3 of this invention. It is an imprint method in Embodiment 3 of this invention, Comprising: It is a top view explaining the flow of resin when the contact width of a thin plate mold and resin differs. It is a schematic diagram of a general imprint technique. 2 is a cross-sectional view of an imprint apparatus described in Patent Document 1. FIG. It is the upper side figure and side surface sectional drawing of the imprint apparatus of patent document 1 at the time of mounting a rectangular substrate. It is the upper side figure and side surface sectional drawing of the imprint apparatus of patent document 1 at the time of mounting a circular board | substrate.

(Embodiment 1)
Hereinafter, the configuration of the imprint apparatus according to Embodiment 1 of the present invention will be described with reference to the drawings. As shown in FIG. 1, an imprint apparatus 1 according to an embodiment of the present invention includes a pressing roll 2, a holding roll 3, a thin plate mold 4, a stage 5, a UV irradiator 10, and a control unit 20. With. The imprint apparatus 1 according to the embodiment of the present invention employs a roll-type UV imprint method.

  The pressing roll 2 has a cylindrical shape and has an axis at the center thereof, and is rotatable around the axis. Further, the pressing roll 2 is movable in a plane perpendicular to the axial direction Z, that is, in the direction X and the direction Y. The holding roll 3 is also cylindrical, has an axis at the center thereof, is rotatable around the axis, and the axial direction is parallel to the axial direction Z of the pressing roll 2. Similarly to the pressing roll 2, the holding roll 3 can also move on a plane perpendicular to the axial direction. For example, the holding roll 3 is held in the same unit as the pressing roll 2, and is synchronized with the movement of the pressing roll 2 while maintaining a constant interval between the axis center of the holding roll 3 and the axis center of the pressing roll 2. Then move. However, the pressing roll 2 and the holding roll 3 do not need to be held by a common unit, and may be held by different units as long as they move in synchronization with each other. For example, as shown in FIG. 1, the pressing roll 2 and the holding roll 3 are connected to the control unit 20, and the control unit 20 controls the pressing roll 2 and the holding roll 3 to move in synchronization.

  As shown in FIGS. 1 and 2, the thin plate mold 4 has a thin plate shape and is provided between the pressing roll 2 and the holding roll 3 and the stage 5. As shown in FIG. 2, the thin plate-shaped mold 4 has a first surface 4a facing the stage 5 and a second surface 4b opposite to the first surface 4a, and a pattern area of a certain area of the first surface 4a. 12, a fine pattern 13 is formed. Moreover, as shown in FIG. 1, as for the thin plate-shaped mold 4, one end is hold | maintained at the movable holding | maintenance part 9a, and the other end is hold | maintained at the fixed holding | maintenance part 9b. By moving the movable holding portion 9a, the tension applied to the thin plate mold 4 and the angle of the thin plate mold 4 with respect to the stage 5 can be arbitrarily adjusted. Note that both ends of the thin plate mold 4 may be held by the movable holding portion 9a. The thin plate-shaped mold 4 is a material having UV transparency and flexibility, and is, for example, a PET film, but is not limited thereto.

  The stage 5 has an elastic region 6 where the substrate 8 coated with the UV curable resin 7 is placed, and the elastic region 6 faces the first surface 4 a of the thin plate mold 4. The material of the elastic region 6 is different from that of the other regions of the stage 5, for example, acrylonitrile butadiene rubber is used, and its Young's modulus is about 1 MPa. For example, SUS (304) is used as the material of the portion other than the elastic region 6 of the stage 5, and its Young's modulus is sufficiently larger than the Young's modulus of the elastic region 6 and is about 200 Gpa. The thickness of the elastic region 6, that is, the length in the pressing direction Y has a distribution in the feeding direction X and the axial direction Z. Details will be described later. Further, suction holes 16 are provided in the stage 5 and in the elastic region 6 so that the substrate 8 can be sucked from the stage 5 side through the elastic region 6.

  A UV irradiator 10 capable of irradiating collimated UV light on the second surface 4 b side of the thin plate-shaped mold 4 is applied to the UV curable resin 7 through the thin plate-shaped mold 4 from between the pressing roll 2 and the holding roll 3. 11 can be irradiated. The UV irradiator 10 is connected to the control unit 20 and moves in synchronization with the movement of the pressing roll 2 and the holding roll 3. The UV irradiator 10 is, for example, an LED, but is not limited thereto.

  3 and 4 are views showing a process of molding the UV curable resin 7 applied on the substrate 8 by the imprint apparatus according to the present embodiment. 3 is a schematic view from above, and FIG. 4 is a schematic cross-sectional view. For the sake of simplicity, the holding roll, the suction hole, the control unit, and the UV irradiator are omitted in FIG. 3, and the holding roll, the suction hole, and the control unit are omitted in FIG. The same reference numerals are given to the same or corresponding parts as those in FIGS.

  First, the substrate 8 on which the UV curable resin 7 has been applied in advance is placed on the elastic region 6 so that the UV curable resin 7 and the first surface 4a of the thin plate mold 4 face each other. At this time, the substrate 8 is aligned at a predetermined position and is sucked and held by the suction holes. Then, the pressing roll 2 is moved in the pressing direction Y while holding the thin plate mold 4 at a predetermined tension and angle. Thereby, the pressing roll 2 contacts and presses the thin plate-shaped mold 4, and the flexible thin plate-shaped mold 4 is deformed along the movement of the pressing roll 2. As the pressing roll 2 moves in the pressing direction Y, pressure is applied perpendicularly to the substrate 8 placed on the elastic region 6. At this time, the magnitude of the pressure is measured by a load cell (not shown), and when the measured pressure reaches a predetermined pressure, the pressing roll 2 is moved in the feed direction X. When the pressing roll 2 moves in the feed direction X, the pressing roll 2 rotates under the influence of the frictional force with the thin plate mold 4. Then, the fine pattern 13 formed on the thin plate-shaped mold 4 is sequentially transferred in contact with the UV curable resin 7 on the substrate 8.

  FIG. 5 is a top view and a side sectional view of the stage 5 when the rectangular substrate 8 coated with the UV curable resin 7 is placed in the imprint apparatus 1 according to the first embodiment. In the imprint apparatus 1 according to the present embodiment, the elastic region 6 is thicker at a portion where the pressure applied to the substrate 8 by the pressing roll 2 is larger, and thinner at a portion where the pressure is smaller. Thereby, the pressure applied to the substrate 8 can be made uniform, and the transfer quality of the fine pattern can be improved. Details will be described below.

  In the case of a conventional imprint apparatus having no elastic region, as shown in FIG. 12, there are power points at both ends E in the axial direction Z of the pressing roll 2, so that pressure is applied to both ends E in the axial direction Z of the substrate 8. The pressure is reduced in the central portion in the axial direction Z of the substrate 8. As a result, the pressing roll 2 is warped in the pressing direction Y, and the film thickness of the UV curable resin 7 is increased at the center, or a gap is formed between the thin plate-shaped mold 4 and the UV curable resin 7. As a result, the transfer quality of the fine pattern is deteriorated.

  On the other hand, in the imprint apparatus 1 according to the present embodiment, the elastic region 6 is provided on the stage 5 on which the substrate 8 is placed, and the elastic region 6 has a thickness distribution. That is, the pressure applied to the substrate 8 by the pressing roll 2 is absorbed by the elastic region 6, but by thickening the elastic region 6 in an area where the pressure is high, the pressure applied to the substrate 8 is greatly relieved, On the other hand, in the area where the pressure is low, the thickness of the elastic region 6 is reduced to reduce the relaxation of the pressure applied to the substrate 8.

  When the substrate 8 is rectangular, as shown in FIG. 5, the elastic region 6 is formed so as to become thinner from both ends in the axial direction Z toward the center. For example, the thickness of the thinnest part at the center is about 5 mm, and the thickness of the thickest part at both ends is about 30 mm. Therefore, in the area near both ends E in the axial direction Z, the pressure is greatly relaxed by the thick elastic region 6, and in the area near the center in the axial direction Z, the pressure relaxation is reduced, and the pressure applied to the substrate 8. Can be made uniform in the axial direction Z. Thus, by preventing the pressing roll 2 from warping in the pressing direction Y, the film thickness variation of the UV curable resin 7 after the transfer of the fine pattern can be suppressed, and as a result, the transfer quality of the fine pattern can be improved. It is.

In addition, in the part where the thickness of the elastic region 6 is thin, the part of the stage 5 other than the elastic region 6 is formed so as to be raised, so that the place on which the substrate 8 is placed can be a flat surface.
(Embodiment 2)
In the first embodiment, the case where the substrate is rectangular has been described, but in the second embodiment, the case where the substrate is circular is described with reference to FIGS. Hereinafter, only the points of the imprint apparatus according to the second embodiment that are different from those of the first embodiment will be described. In the case where the substrate 8 is circular, when the pressing roll 2 is fed in the feeding direction X while pressing the substrate 8, the area where the substrate 8 and the thin plate mold contact changes.

  Here, in the case of the conventional imprint apparatus having no elastic region, as shown in FIG. 13, when the pressing roll 2 is fed from the end (starting point S) in the feeding direction X toward the center, Since the contact area with the thin plate mold gradually increases, the pressure applied to the substrate 8 decreases sequentially. On the other hand, when the pressing roll 2 is fed from the central portion toward the end portion (end point F) in the feeding direction X, the contact area between the substrate 8 and the thin plate mold gradually decreases, so that the pressure applied to the substrate 8 is large. Become. As a result, the thickness of the UV curable resin 7 is thin at the start point S and the end point F of the substrate 8 and the central portion is thick, and the transfer quality of the fine pattern is deteriorated.

  FIG. 6 is a top view and a side sectional view of the stage 5 when the circular substrate 8 coated with the UV curable resin 7 is placed in the imprint apparatus according to the second embodiment. According to the imprint apparatus in the present embodiment, the elastic region 6 is formed so as to become thinner from both ends (start point S and end point F) in the feed direction X toward the center. Thereby, in the area near the start point S and the end point F, the pressure applied from the pressure roll 2 to the substrate 8 is greatly relieved by the thick elastic region 6, and in the area near the center, the pressure is applied from the pressure roll 2 to the substrate by the thin elastic region 6. The pressure applied to the substrate 8 can be reduced and the pressure applied to the substrate 8 can be made uniform in the pressing direction X. Therefore, the film thickness variation of the UV curable resin 7 after the transfer of the fine pattern can be suppressed, and the transfer quality of the fine pattern can be improved.

  In FIG. 6, the elastic region 6 has a case where the thickness in the axial direction Z is constant. However, the elastic region 6 is not limited to this, and as in Embodiment 1, from both ends in the axial direction Z to the center. You may form so that it may become thin toward it. Thereby, it is possible to prevent the pressing roll 2 from warping in the pressing direction Y and to improve the transfer quality of the fine pattern.

Further, in FIG. 6, a mode in which the protruding portion 5 a is provided around the elastic region 6 of the stage 5, that is, around the place where the substrate 8 is placed, is not limited to this, and the first embodiment is not limited thereto. It is good also as an aspect which the periphery does not have a protrusion part similarly to. In addition, the imprint apparatus according to Embodiment 1 may have a protrusion 5a. By providing the protrusion 5a around the elastic region 6, the substrate can be easily positioned.
(Embodiment 3)
Next, an imprint apparatus and an imprint method according to Embodiment 3 of the present invention will be described with reference to FIGS. In the first embodiment, the distribution of the thickness of the elastic region in the axial direction Z is described so that the pressure applied from the pressing roll 2 to the substrate 8 is made uniform. On the other hand, in the third embodiment, by distributing the thickness of the elastic region 6 in the axial direction Z, the pressure applied from the pressing roll 2 to the both ends E of the substrate 8 in the axial direction Z is changed to that of the substrate 8. This is different from the first embodiment in that the pressure is larger than the pressure applied to the region. Hereinafter, only differences from the first embodiment will be described for the third embodiment, and the other configurations are the same as those of the first embodiment, and thus the description thereof is omitted. 7 to 9, the thin plate mold is omitted for the sake of simplicity. 7-9, the same code | symbol is attached | subjected to the part which is the same as FIG.

  FIG. 7 shows a state in which the UV curable resin 7 on the substrate 8 is washed away when the pressure applied from the pressing roll 2 to the substrate 8 is equalized, not the imprint method according to the third embodiment. is there. In this case, the contact width 15 in the feed direction X between the thin plate mold and the UV curable resin 7 is constant in the axial direction Z of the pressing roll 2. Since the UV curable resin 7 swept away by the pressing roll 2 gradually spreads radially at both ends E in the axial direction Z of the substrate 8, the UV curable resin 7 flows out of the substrate 8. The UV curable resin 7 that has flowed out is cured on the stage on which the substrate 8 is placed, and the substrate 8 and the stage are fixed, and the substrate 8 may not be taken out of the stage 5.

  FIG. 8 shows a stage of the imprint apparatus according to the third embodiment of the present invention. When the elastic region 6 of the stage 5 is divided into a central region 61 in the axial direction Z and a region 62 at both ends, the regions 62 at both ends are thinned from the central side in the axial direction Z toward both ends E. It is formed. In this case, the pressure applied to the substrate 8 by the pressing roll 2 is increased at both end portions E in the axial direction Z. Therefore, as shown in FIG. 9, contact between the thin plate mold and the UV curable resin 7 in the axial direction of the pressing roll. The width 15 also increases in the vicinity of both end portions E in the axial direction Z. In other words, in the cross section perpendicular to the feeding direction X of the pressing roll, the elastic region 6 is thinned at both ends E of the pressing roll 2 so that the stress applied to both ends E of the pressing roll 2 increases. It is configured. With such a configuration, in the axial direction Z, the contact width 15 between the thin plate-shaped mold and the transfer target can be increased from the center of the pressing roll 2 toward both ends E.

  When the pressing roll 2 is fed in the feeding direction X, the UV curable resin 7 is easily pushed toward the center in the axial direction Z at both end portions E of the substrate 8, and the UV curable resin 7 moves to the outside of the substrate 8. Flowing out can be avoided.

  Further, the central region 61 of the elastic region 6 is formed so as to become thinner from both ends E side in the axial direction Z toward the center. Thereby, in the center part of the press roll 2, the thickness of the elastic area | region 6 is set thinly, and the relief | moderation of the pressure applied to the board | substrate 8 in the center area | region 61 is made small, UV curable resin 7 after fine pattern transfer is carried out. Variation in film thickness can be suppressed, and as a result, the transfer quality of the fine pattern can be improved.

  In FIG. 8, the case where the thickness of the elastic region 6 in the feed direction X is constant is depicted, but when the substrate is circular, the pressure applied to the substrate 8 is made uniform in the feed direction X. Therefore, as in the second embodiment, the elastic region 6 is preferably formed so as to become thinner from both ends in the feeding direction X toward the center.

  Further, in FIG. 8, as in the case of the second embodiment, a mode in which the protruding portion 5 a is provided around the elastic region 6 of the stage 5 is not limited thereto, but is the same as in the first embodiment. It is good also as an aspect which does not have a protrusion part in circumference | surroundings. By providing the protrusion 5a around the elastic region 6, the substrate can be easily positioned.

  In the first to third embodiments, it has been described that the transfer quality of the fine pattern is improved by giving a distribution to the thickness of the elastic region 6, but the present invention is not limited to this, and the Young's modulus of the elastic region 6 is distributed. It is possible to improve the transfer quality of a fine pattern by providing That is, for an area where the pressure applied to the substrate 8 is large, the Young's modulus of the elastic region 6 is reduced to greatly relax the pressure, and for an area where the pressure applied to the substrate 8 is small, the elastic region 6 The Young's modulus is increased to reduce the pressure relaxation. Thereby, the film thickness of the UV curable resin 7 after fine pattern transfer can be made uniform, and the transfer quality of the fine pattern can be improved.

  In the first to third embodiments, the UV irradiator 10 is described as irradiating the UV curable resin 7 with UV light through the thin plate-shaped mold 4 having UV transparency, but is not limited thereto. Instead, the thin plate-shaped mold 4 may be configured to use a light irradiator that irradiates light other than UV by using a resin that is transmissive to light other than UV, is cured with light other than UV.

  The thermal imprint method may be adopted without being limited to the optical imprint method. In the case of the thermal imprinting method, the thin plate mold 4 is not limited to a material having optical transparency. Further, as the material of the transfer object, a thermosetting resin or a thermoplastic resin is used instead of the photo-curing resin. When using a thermosetting resin, it is necessary to provide a mechanism for heating the thermosetting resin instead of the light irradiator. For example, a heater is provided inside the stage 5, and the heater heats the thermosetting resin via the substrate 8. The heater may be provided on the second surface 4b side of the thin plate-shaped mold 4 instead of being provided inside the stage 5, and the thermosetting resin may be heated using near infrared rays or the like.

  Moreover, when using a thermoplastic resin, it is necessary to provide further the mechanism which cools a thermoplastic resin in addition to the above heating mechanisms instead of a light irradiation device. For example, the thermoplastic resin can be cooled via the surface of the pressing roll 2 and the thin plate-shaped mold 4 by providing a cooling flow path in the pressing roll 2 and flowing cooling water or a cooling gas in the cooling flow path. .

  In addition, although the imprint apparatus in Embodiment 1-3 described providing the cylindrical holding roll 3, it is not restricted to this, The part of the thin plate-shaped mold 4 after the press by the press roll 2 is cancelled | released Can be held so as not to leave the UV curable resin 7 or the like, instead of the holding roll 3, a non-cylindrical holding member may be used.

  The present invention is useful for an imprint apparatus that can improve the transfer quality of a fine pattern.

DESCRIPTION OF SYMBOLS 1 Imprint apparatus 2 Press roll 3 Holding roll 4 Thin plate mold 5 Stage 6 Elastic area 7 UV curable resin 8 Substrate 9a Movable holding part 10 UV irradiator 11 UV light 12 Pattern area 13 Fine pattern 14 Flat mold 15 Contact width 16 Adsorption Hole

Claims (6)

A stage having an elastic region at the place where the substrate to which the transfer target is applied is placed;
A thin plate-like mold having flexibility, having a fine pattern on the first surface facing the stage, and being held at a predetermined tension;
A pressing roll capable of pressing the second surface opposite to the first surface of the thin plate mold,
A holding member for holding a portion of the thin plate mold after the pressing by the pressing roll is released,
The pressing roll is fed in a feeding direction perpendicular to the direction of the axis of the pressing roll and the pressing direction while pressing the substrate through the thin plate mold, whereby the fine pattern of the thin plate mold is transferred to the pressing roll. Sequentially transferred to the transfer target,
The imprint apparatus is characterized in that the elastic region is thicker at a portion where the pressure applied to the substrate by the pressing roll is larger and thinner at a portion where the pressure is smaller. The imprint apparatus according to claim 1, wherein the elastic region is formed so as to become thinner from both ends in the axial direction of the pressing roll toward the center. A stage having an elastic region for placing a substrate coated with a transfer object;
A thin plate-like mold having flexibility, having a fine pattern on the first surface facing the stage, and being held at a predetermined tension;
A pressing roll capable of pressing the second surface opposite to the first surface of the thin plate mold,
A holding member for holding a portion of the thin plate mold after the pressing by the pressing roll is released,
The pressing roll is fed in a feeding direction perpendicular to the direction of the axis of the pressing roll and the pressing direction while pressing the substrate through the thin plate mold, whereby the fine pattern of the thin plate mold is transferred to the pressing roll. Sequentially transferred to the transfer target,
The central region in the axial direction of the pressing roll of the elastic region is formed so as to become thinner from both end sides in the axial direction of the elastic region toward the center,
The imprint apparatus according to claim 1, wherein regions of both ends of the elastic region in the axial direction are formed so as to become thinner from a center side of the elastic region in the axial direction toward both ends. The imprint apparatus according to claim 1, wherein the elastic region is formed so as to become thinner from both ends in the feeding direction of the pressing roll toward the center. A stage having an elastic region at the place where the substrate to which the transfer target is applied is placed;
A thin plate-like mold having flexibility, having a fine pattern on the first surface facing the stage, and being held at a predetermined tension;
A pressing roll capable of pressing the second surface opposite to the first surface of the thin plate mold,
A holding member for holding a portion of the thin plate mold after the pressing by the pressing roll is released,
The pressing roll is fed in a feeding direction perpendicular to the direction of the axis of the pressing roll and the pressing direction while pressing the substrate through the thin plate mold, whereby the fine pattern of the thin plate mold is transferred to the pressing roll. Sequentially transferred to the transfer target,
The imprint apparatus is characterized in that the elastic region has a smaller Young's modulus at a portion where the pressure applied to the substrate by the pressing roll is larger, and a larger Young's modulus at a portion where the pressure is smaller. A light irradiator disposed on the second surface side of the mold and capable of irradiating light toward the stage;
The imprint apparatus according to claim 1, wherein the mold is a light-transmitting material.