WO2011093934A8 - Procédé pour améliorer le dépôt de substrats non conducteurs - Google Patents
Procédé pour améliorer le dépôt de substrats non conducteurs Download PDFInfo
- Publication number
- WO2011093934A8 WO2011093934A8 PCT/US2010/056121 US2010056121W WO2011093934A8 WO 2011093934 A8 WO2011093934 A8 WO 2011093934A8 US 2010056121 W US2010056121 W US 2010056121W WO 2011093934 A8 WO2011093934 A8 WO 2011093934A8
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- conductive substrates
- plating
- improving plating
- laser
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
- C23C18/1607—Process or apparatus coating on selected surface areas by direct patterning
- C23C18/1612—Process or apparatus coating on selected surface areas by direct patterning through irradiation means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2026—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by radiant energy
- C23C18/204—Radiation, e.g. UV, laser
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2073—Multistep pretreatment
- C23C18/2086—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
- H05K3/185—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method by making a catalytic pattern by photo-imaging
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
- H05K2201/0203—Fillers and particles
- H05K2201/0206—Materials
- H05K2201/0236—Plating catalyst as filler in insulating material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09009—Substrate related
- H05K2201/09118—Moulded substrate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
- H05K2203/0786—Using an aqueous solution, e.g. for cleaning or during drilling of holes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/10—Using electric, magnetic and electromagnetic fields; Using laser light
- H05K2203/107—Using laser light
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax, thiol
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Inorganic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Chemically Coating (AREA)
- Electroplating Methods And Accessories (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
La présente invention concerne un procédé de traitement d'un substrat thermoplastique activé par laser dans lequel est dispersé un composé métallique. Le substrat est au contact d'une composition aqueuse comprenant : (i) un composé organique fonctionnel de thiol; (ii) un agent de surface à base d'alcool éthoxylé; et (iii) une gomme xanthique. L'utilisation de la composition de traitement, lorsque le substrat est ensuite activé par laser puis subit un dépôt par placage anélectrolytique, permet d'éliminer sensiblement le dépôt parasite du substrat.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP10844919.0A EP2529395B1 (fr) | 2010-01-26 | 2010-11-10 | Procédé pour améliorer le dépôt de substrats non conducteurs |
JP2012549985A JP5612127B2 (ja) | 2010-01-26 | 2010-11-10 | 非伝導性基材の改善されためっき方法 |
CN2010800622688A CN102714163A (zh) | 2010-01-26 | 2010-11-10 | 非导体基材镀敷的改良方法 |
ES10844919T ES2742198T3 (es) | 2010-01-26 | 2010-11-10 | Procedimiento para mejorar la galvanización en sustratos no conductores |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/693,548 | 2010-01-26 | ||
US12/693,548 US8974869B2 (en) | 2010-01-26 | 2010-01-26 | Method for improving plating on non-conductive substrates |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2011093934A1 WO2011093934A1 (fr) | 2011-08-04 |
WO2011093934A8 true WO2011093934A8 (fr) | 2012-08-23 |
Family
ID=44309157
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2010/056121 WO2011093934A1 (fr) | 2010-01-26 | 2010-11-10 | Procédé pour améliorer le dépôt de substrats non conducteurs |
Country Status (7)
Country | Link |
---|---|
US (2) | US8974869B2 (fr) |
EP (1) | EP2529395B1 (fr) |
JP (1) | JP5612127B2 (fr) |
CN (1) | CN102714163A (fr) |
ES (1) | ES2742198T3 (fr) |
TW (1) | TW201129714A (fr) |
WO (1) | WO2011093934A1 (fr) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20130033091A (ko) * | 2011-09-26 | 2013-04-03 | 에더트로닉스코리아 (주) | 무선통신기기에 설치되는 내장형 안테나 모듈 및 이의 제조방법 |
EP2581469B1 (fr) * | 2011-10-10 | 2015-04-15 | Enthone, Inc. | Solution d'activation aqueuse et procédé pour le dépôt autocatalytique de cuivre sur des substrats structurés directement par laser |
KR20160021107A (ko) * | 2013-06-18 | 2016-02-24 | 가부시끼가이샤 제이씨유 | 무전해 금속 도금의 브릿지 방지액 및 이를 이용한 프린트 배선판의 제조방법 |
JP6230625B2 (ja) * | 2014-01-14 | 2017-11-15 | 太陽インキ製造株式会社 | 立体回路基板およびこれに用いるソルダーレジスト組成物 |
KR101737566B1 (ko) | 2014-09-11 | 2017-05-18 | 주식회사 엘지화학 | 도전성 패턴 형성용 조성물, 이를 사용한 도전성 패턴 형성 방법과, 도전성 패턴을 갖는 수지 구조체 |
WO2016043540A1 (fr) * | 2014-09-17 | 2016-03-24 | 주식회사 엘지화학 | Composition pour la formation de tracés conducteurs, et structure en résine présentant un tracé conducteur |
WO2016043542A1 (fr) * | 2014-09-17 | 2016-03-24 | 주식회사 엘지화학 | Composition pour la formation d'un motif conducteur, et structure en résine possédant un motif conducteur |
KR101774041B1 (ko) | 2014-09-17 | 2017-09-01 | 주식회사 엘지화학 | 도전성 패턴 형성용 조성물 및 도전성 패턴을 가지는 수지 구조체 |
KR101698160B1 (ko) * | 2014-09-17 | 2017-01-19 | 주식회사 엘지화학 | 도전성 패턴 형성용 조성물 및 도전성 패턴을 갖는 수지 구조체 |
WO2016043541A1 (fr) * | 2014-09-17 | 2016-03-24 | 주식회사 엘지화학 | Composition pour la formation d'un motif conducteur, et structure en résine possédant un motif conducteur |
US9777380B2 (en) | 2015-07-07 | 2017-10-03 | Board Of Regents, The University Of Texas System | Multi-layered 3D printed laser direct structuring for electrical interconnect and antennas |
US9970114B2 (en) | 2016-09-13 | 2018-05-15 | Rohm And Haas Electronic Materials Llc | Shielding coating for selective metallization |
US9850578B1 (en) | 2016-09-13 | 2017-12-26 | Rohm And Haas Electronic Materials Llc | Shielding coating for selective metallization |
US9797043B1 (en) | 2016-09-13 | 2017-10-24 | Rohm And Haas Electronic Materials Llc | Shielding coating for selective metallization |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3900320A (en) * | 1971-09-30 | 1975-08-19 | Bell & Howell Co | Activation method for electroless plating |
US5051312A (en) * | 1990-03-29 | 1991-09-24 | E. I. Du Pont De Nemours And Company | Modification of polymer surfaces |
US5476580A (en) * | 1993-05-17 | 1995-12-19 | Electrochemicals Inc. | Processes for preparing a non-conductive substrate for electroplating |
JP3112949B2 (ja) | 1994-09-23 | 2000-11-27 | シーメンス エヌ フェー | ポリマースタッドグリッドアレイ |
JP2002348680A (ja) | 2001-05-22 | 2002-12-04 | Sharp Corp | 金属膜パターンおよびその製造方法 |
DE10132092A1 (de) | 2001-07-05 | 2003-01-23 | Lpkf Laser & Electronics Ag | Leiterbahnstrukturen und Verfahren zu ihrer Herstellung |
CN1326435C (zh) * | 2001-07-05 | 2007-07-11 | Lpkf激光和电子股份公司 | 导体轨道结构的制造方法 |
US7614145B2 (en) | 2001-09-05 | 2009-11-10 | Zeon Corporation | Method for manufacturing multilayer circuit board and resin base material |
JP4277685B2 (ja) * | 2002-01-10 | 2009-06-10 | 東レ株式会社 | 二軸配向熱可塑性樹脂フィルム |
ATE350884T1 (de) | 2002-07-18 | 2007-01-15 | Festo Ag & Co | Spritzgegossener leiterträger und verfahren zu seiner herstellung |
EP1550739B1 (fr) | 2002-09-09 | 2010-04-28 | Sumitomo Electric Industries, Ltd. | Article en resine polyester plaque et son procede de production |
DE10312628A1 (de) | 2003-03-21 | 2004-10-07 | Friz Biochem Gmbh | Verfahren und Vorrichtung zum Benetzen eines Substrats mit einer Flüssigkeit |
CN1799293A (zh) * | 2003-06-05 | 2006-07-05 | 詹诺普蒂克自动化技术有限公司 | 用于结构化地金属化聚合的和陶瓷的基材的方法以及在该方法中使用的可活性化的化合物 |
DE102004017440A1 (de) | 2004-04-08 | 2005-11-03 | Enthone Inc., West Haven | Verfahren zur Behandlung von laserstrukturierten Kunststoffoberflächen |
US20060083939A1 (en) * | 2004-10-20 | 2006-04-20 | Dunbar Meredith L | Light activatable polyimide compositions for receiving selective metalization, and methods and compositions related thereto |
US7160583B2 (en) * | 2004-12-03 | 2007-01-09 | 3M Innovative Properties Company | Microfabrication using patterned topography and self-assembled monolayers |
WO2006085669A1 (fr) | 2005-02-08 | 2006-08-17 | Fujifilm Corporation | Procédé de formation de motif métallique, motif métallique obtenu ainsi, carte à circuit imprimé utilisant ledit motif et carte à circuit tft utilisant ledit motif |
US7358921B2 (en) | 2005-12-01 | 2008-04-15 | Harris Corporation | Dual polarization antenna and associated methods |
US20080171181A1 (en) | 2007-01-11 | 2008-07-17 | Molex Incorporated | High-current traces on plated molded interconnect device |
US20090123656A1 (en) | 2007-11-13 | 2009-05-14 | Ernest Long | Composition and method for controlling galvanic corrosion in printed circuit boards |
US20090239079A1 (en) | 2008-03-18 | 2009-09-24 | Mark Wojtaszek | Process for Preventing Plating on a Portion of a Molded Plastic Part |
EP2124514A1 (fr) * | 2008-05-23 | 2009-11-25 | Nederlandse Centrale Organisatie Voor Toegepast Natuurwetenschappelijk Onderzoek TNO | Préparation d'un motif métallique sur un substrat plastique |
US8747599B2 (en) | 2008-05-29 | 2014-06-10 | Chidella Krishna Sastry | Process for making self-patterning substrates and the product thereof |
-
2010
- 2010-01-26 US US12/693,548 patent/US8974869B2/en active Active
- 2010-11-10 CN CN2010800622688A patent/CN102714163A/zh active Pending
- 2010-11-10 ES ES10844919T patent/ES2742198T3/es active Active
- 2010-11-10 WO PCT/US2010/056121 patent/WO2011093934A1/fr active Application Filing
- 2010-11-10 EP EP10844919.0A patent/EP2529395B1/fr active Active
- 2010-11-10 JP JP2012549985A patent/JP5612127B2/ja active Active
- 2010-11-29 TW TW099141148A patent/TW201129714A/zh unknown
-
2013
- 2013-01-15 US US13/741,446 patent/US9067238B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
EP2529395A1 (fr) | 2012-12-05 |
US20130136869A1 (en) | 2013-05-30 |
ES2742198T3 (es) | 2020-02-13 |
US20110183082A1 (en) | 2011-07-28 |
US9067238B2 (en) | 2015-06-30 |
EP2529395A4 (fr) | 2015-05-06 |
WO2011093934A1 (fr) | 2011-08-04 |
JP5612127B2 (ja) | 2014-10-22 |
JP2013518180A (ja) | 2013-05-20 |
US8974869B2 (en) | 2015-03-10 |
CN102714163A (zh) | 2012-10-03 |
EP2529395B1 (fr) | 2019-08-07 |
TW201129714A (en) | 2011-09-01 |
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