WO2011092276A1 - Électrode pour réacteur de fabrication de silicium polycristallin - Google Patents
Électrode pour réacteur de fabrication de silicium polycristallin Download PDFInfo
- Publication number
- WO2011092276A1 WO2011092276A1 PCT/EP2011/051191 EP2011051191W WO2011092276A1 WO 2011092276 A1 WO2011092276 A1 WO 2011092276A1 EP 2011051191 W EP2011051191 W EP 2011051191W WO 2011092276 A1 WO2011092276 A1 WO 2011092276A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- reactor
- electrode
- electrode body
- elastic elements
- sealing element
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
Definitions
- the present invention relates to an electrode for a reactor for producing polycrystalline silicon.
- a plurality of electrodes is distributed on a bottom of the reactor.
- filament rods made of high-purity silicon are attached, wherein the filament rods, the required power supply is supplied via an electrode body, so that the filament rods obtain a temperature required for the deposition of polycrystalline silicon temperature.
- the polycrystalline silicon is deposited in reactors on the filament rods.
- the processes differ essentially by the reaction partners, from which the polycrystalline silicon is deposited on the filament rods.
- trichlorosilane SiHCl 3
- SiHCl 3 trichlorosilane
- U.S. Patent Application 2009/0081380 A1 discloses a reactor for producing polycrystalline silicon.
- Polycrystalline silicon deposits on a filament rod made of ultra-pure silicon.
- the ultra-pure silicon rods are attached in an electrode, which are also arranged distributed at the bottom of the reactor.
- a plurality of inlet nozzles for the reaction gas is provided at the bottom of the reactor.
- the outlet opening of the inlet nozzles is higher than the mounting plane of the filament rods in the electrode.
- the electrodes are designed according to the embodiment shown in European Patent Application EP 2 108 619 and fastened to the reactor bottom.
- the invention has for its object to design an electrode for holding the filament rods for the deposition of polycrystalline silicon such that during the ongoing production process and regardless of the prevailing production conditions a tightness of the electrode from the reactor interior is ensured to the environment.
- a plurality of electrodes are mounted in a bottom of the reactor.
- the electrodes carry filament rods, which sit in an electrode body and via which the power is supplied to the electrodes or filament rods.
- the electrode body itself is with several elastic elements in the direction of Top side of the bottom of the reactor mechanically biased.
- a radially encircling sealing element is used between the top of the bottom of the reactor and a parallel to the top of the bottom ring of the electrode body.
- the sealing element itself is shielded in the region between the top of the bottom of the reactor and the parallel ring of the electrode body of a ceramic ring.
- the bottom of the reactor can be designed as a bottom with a gap or with two spaces. In the event that only a gap is formed in the reactor bottom, cooling water is conducted in this intermediate space. Likewise, the conversion of the reactor is designed as a double wall, so as to achieve a cooling of the reactor interior. In the event that the reactor bottom consists of two spaces, gas is fed to the inlet nozzles in one of the intermediate spaces. In the other intermediate space, as already mentioned above, the cooling water required for the cooling of the interior of the reactor is conducted.
- the electrode body extends along a longitudinal axis at least to beyond an underside of the bottom.
- the radially encircling sealing element is designed in such a way that it also surrounds the electrode body at least likewise beyond the underside of the bottom.
- the bottom of the reactor has multiple apertures extending from the top of the reactor bottom to the bottom of the reactor bottom. In these openings, the electrode body sits together with the sealing element.
- the openings of course have a wall to the interstices of the reactor floor. Thus, it is ensured that the cooling water or the reaction gas does not come into contact with the electrodes.
- the plurality of elastic elements are held by means of a threaded pin on the electrode body.
- the elastic elements are supported at the top of the bottom of the soil.
- two elastic elements are mounted offset by 180 ° C to each other on the electrode body.
- the elastic elements, which bias the electrodes relative to the reactor bottom, are designed as helical springs.
- the radially encircling sealing element consists of a material with a low thermal expansion.
- the material of the radially encircling sealing element preferably consists of PTFE.
- the electrode body has in the direction of a longitudinal axis a cavity into which cooling water can be supplied via a feed line.
- a pipe is guided, via which, in conjunction with a discharge, the heated cooling water is discharged.
- the cooling is necessary since, depending on the process used for the production of polycrystalline silicon in the interior of the reactor, a temperature of 800 to 1200 ° C is present.
- the electrodes are cooled with the supplied cooling water to a temperature of 150 ° C.
- the cooling should be regulated to +/- 20 ° C.
- the reactor is cooled to a corresponding temperature by the double-walled design of the reactor.
- Figure 1 shows a perspective and partially sectional view of a
- FIG. 2 shows a sectional view of the electrode according to the invention, in which the
- Reinst silicon rods are attached for the deposition of polycrystalline silicon.
- FIG. 3 shows a side view of the electrode according to the invention, which in the
- FIG. 4 shows a perspective view of the electrode according to the invention, which is used in the process for producing polycrystalline silicon.
- FIG. 5 shows an enlarged view of that marked A in FIG.
- FIG. 6 shows an enlarged view of that marked B in FIG.
- FIG. 1 shows a perspective and partially sectioned view of a reactor 10, which is used for the production of polycrystalline silicon.
- the reactor 10 is known from the prior art and is used for the production of polycrystalline silicon after the monosilane process.
- the reactor 10 has a bottom 12 carrying a plurality of nozzles 40. Fresh reaction gas, to which hydrogen has been added, is introduced into the interior 50 of the reactor 10 through the nozzles 40.
- a plurality of filament rods 60 are mounted in dedicated electrodes 6. At the filament rods 60, the polycrystalline silicon is deposited during the process.
- a gas discharge 51 is formed via an inner tube 52.
- the inner tube 52 has a gas inlet opening 53 into which the partially consumed reaction gas enters. This exhaust gas or partially consumed reaction gas is present at a certain operating pressure. The pressure depends on the manufacturing process used.
- the reactor, the supply lines and the discharge lines for the reaction gas are double-walled, thereby achieving a corresponding cooling.
- the gas inlet opening 53 for the inner tube 52 is clearly spaced from the top 13 of the bottom 12 of the reactor 10. This spacing is therefore necessary to ensure that fresh reaction gas entering the reactor interior 50 does not immediately exit through the gas inlet opening 53 of the inner tube 52 again.
- the reactor wall 58 and the inner tube 52 are double-walled and can be cooled with water.
- the inner tube 52 is passed through the bottom 12 of the reactor. From the discharge line 51, the spent reaction gas is passed to a recycling system (not shown here). Likewise, a feed line 54 for fresh reaction gas is provided on the bottom 12 of the reactor 10.
- the bottom 12 of the reactor 10 is constructed of two spaces.
- fresh reaction gas is supplied, which distributes uniformly to the nozzles 40 at the bottom 12 of the reactor 10, so that the reaction gas enters the interior 50 of the reactor 10 via the upper side 13 of the bottom 12 of the reactor 10.
- cooling water is guided, so that the bottom 12 of the reactor 10 can be cooled to a certain temperature or maintained at this temperature.
- FIG. 2 shows a sectional view of the electrode 6, which is arranged in the bottom 12 of the reactor 10.
- the electrode 6 has an elongated shape and extends over the top 13 and the bottom 14 of the bottom 12 of the reactor 10.
- the electrode 6 consists of an electrode body 14 in which the filament rods 16 are supported.
- the bottom 12 of the reactor 10 has a plurality of holders for one of the plurality of electrodes 6.
- the holders are formed as apertures 16 in the bottom 12 of the reactor 10 and through the apertures 16 extend the electrodes 6.
- the electrode body 4 has an upper side 13 of the Bottom 12 of the reactor 10 parallel ring 7. Between the parallel ring 7 and the top 13 of the bottom 12 of the reactor 10, a radially encircling sealing element 3 is inserted.
- the radial sealing element 3 also extends along the longitudinal axis of the electrode body and Also protrudes beyond the bottom 14 of the bottom 12 of the reactor 10.
- a plurality of elastic elements 2 are attached to the electrode body 4. These elastic elements 2 are configured in such a way that they bias the electrode body 4 in the direction of the upper side 13 of the bottom 12 of the reactor 10.
- the radially encircling sealing element 3 is preferably made of PTFE.
- a ceramic ring 15 is provided on the upper side 13 of the bottom 12 of the reactor 10. The ceramic ring 15 thus surrounds the radially encircling sealing element 3, which would protrude into the reactor interior 50.
- the electrode body 4 has a cavity 22 along the longitudinal axis L of the electrode body 4.
- the cavity 22 can be supplied via a supply line 20 cooling water.
- a tube 23 is guided, via which, in conjunction with a discharge line 21, the heated cooling water can be removed from the electrode 4.
- FIG. 3 shows a side view of the electrode 6 according to the invention and its installation in the bottom 12 of the reactor 10.
- the electrode 6 has a height H along its longitudinal axis L and a width B in the interior 50 of the reactor 10.
- the ceramic sleeve 15 On the upper side 13 of the bottom 12 of FIG Reactor 10 sits the ceramic sleeve 15, with which the radially encircling sealing element (not shown here) is substantially protected from temperature influences from the interior of the reactor.
- the opening 16 extends through which the electrode 6 from the top 13 of the bottom 12 of the reactor 10 to the bottom 14 of the bottom 12 of the reactor 10 is guided.
- an adjustment 25 is provided for fixing and clamping the electrode 6, an adjustment 25 is provided.
- cooling water is supplied via a supply line 20 and discharged via a discharge line 21.
- the bottom 12 of the reactor 10 is formed with a gap. In this space, the cooling water for the cooling of the bottom 12 of the reactor 10 is guided.
- FIG. 4 shows a perspective view of the electrode 6 according to the invention, which is used in a reactor 10 for the production of polycrystalline silicon.
- the holder 27 of the electrode 6 for the filament rods 60 is provided above the radially encircling ring 7 of the electrode 6, the holder 27 of the electrode 6 for the filament rods 60 is provided.
- the electrode 6 is supported relative to the underside 14 of the bottom 12 of the reactor 10.
- the supply line 20 is provided for the cooling water and the discharge 21 for the heated in the interior of the electrode 6 cooling water.
- FIG. 5 shows an enlarged view of the area marked A in FIG.
- the elastic elements 2 are arranged in 180 ° C opposite.
- the elastic elements 2 are designed as helical springs.
- the elastic elements 2 are held on the electrode body 4 via threaded pins 29.
- a support 28 is provided between the top 30 of the elastic elements 2 and the bottom 14 of the bottom 12 of the reactor 10.
- the elastic body 2 are thus supported with the top 30 against the bottom 14 of the bottom 12 of the reactor 10 from.
- the underside 32 of the elastic elements 2 is supported relative to the electrode body 4.
- the adjusting element 25 is provided for the support of the elastic elements 2 with their underside 32 on the electrode body 4.
- the elastic element 2 is designed as a helical spring and held on the electrode body 4 by means of a threaded pin 29. Characterized in that the adjusting element is provided on the electrode body 4, one reaches a tension or a bias voltage of the elastic elements 2, so that the radially encircling light element 3 between the top 13 of the bottom 12 of the reactor 10 and the parallel thereto ring 7 of the electrode body 4th is clamped and thus causes a seal.
- This tension is always ensured that regardless of the different expansion coefficients of the different materials of the electrode 6 is always a tightness is ensured, so that no reaction gas from the interior 50 of the reactor 10 passes to the outside.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Abstract
L'invention concerne une électrode (6) destinée à un réacteur (10) pour la fabrication de silicium polycristallin. Plusieurs électrodes (6) sont fixées dans le fond (12) du réacteur (10). Les électrodes (6) portent des barres de type filaments (60) en silicium extra-pur. Le corps (4) de l'électrode est précontraint mécaniquement en direction (5) du côté supérieur (13) du fond (12) du réacteur (10) au moyen de plusieurs éléments élastiques (2). Un élément d'étanchéité (3) périphérique radial est placé entre le côté supérieur (13) du fond (12) du réacteur (10) et une bague (7) du corps (4) de l'électrode, cette bague (7) étant parallèle au côté supérieur (13) du fond (12).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102010000270.4 | 2010-02-01 | ||
DE102010000270A DE102010000270A1 (de) | 2010-02-01 | 2010-02-01 | Elektrode für einen Reaktor zur Herstellung von polykristallinem Silizium |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2011092276A1 true WO2011092276A1 (fr) | 2011-08-04 |
Family
ID=44315814
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2011/051191 WO2011092276A1 (fr) | 2010-02-01 | 2011-01-28 | Électrode pour réacteur de fabrication de silicium polycristallin |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE102010000270A1 (fr) |
WO (1) | WO2011092276A1 (fr) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20130011581A1 (en) * | 2011-07-06 | 2013-01-10 | Wacker Chemie Ag | Protective device for electrode holders in cvd reactors |
DE102013204926A1 (de) | 2013-03-20 | 2014-09-25 | Wacker Chemie Ag | Vorrichtung zum Schutz einer Elektrodendichtung in einem Reaktor zur Abscheidung von polykristallinem Silicium |
DE102013214800A1 (de) | 2013-07-29 | 2015-01-29 | Wacker Chemie Ag | Vorrichtung zur Isolierung und Abdichtung von Elektrodenhalterungen in CVD Reaktoren |
DE102014223415A1 (de) | 2014-11-17 | 2016-05-19 | Wacker Chemie Ag | Vorrichtung zur Isolierung und Abdichtung von Elektrodenhalterungen in CVD Reaktoren |
DE102015220127A1 (de) | 2015-10-15 | 2017-04-20 | Wacker Chemie Ag | Vorrichtung zur Isolierung und Abdichtung von Elektrodenhalterungen in CVD Reaktoren |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2432383A1 (de) * | 1973-11-22 | 1976-01-22 | Siemens Ag | Reaktionsgefaess zum abscheiden von halbleitermaterial auf erhitzte traegerkoerper |
US20040074609A1 (en) * | 2002-05-23 | 2004-04-22 | Andreas Fischer | Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode |
US20090081380A1 (en) | 2007-09-20 | 2009-03-26 | Mitsubishi Materials Corporation | Reactor for polycrystalline silicon and polycrystalline silicon production method |
EP2108619A2 (fr) | 2008-03-21 | 2009-10-14 | Mitsubishi Materials Corporation | Réacteur en silicone polycristalline |
EP2138459A1 (fr) * | 2008-06-24 | 2009-12-30 | Mitsubishi Materials Corporation | Appareil de production de silicium polycristallin |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5481886B2 (ja) * | 2008-03-27 | 2014-04-23 | 三菱マテリアル株式会社 | 多結晶シリコン製造装置 |
JP5338574B2 (ja) * | 2008-09-09 | 2013-11-13 | 三菱マテリアル株式会社 | 多結晶シリコン製造装置 |
-
2010
- 2010-02-01 DE DE102010000270A patent/DE102010000270A1/de not_active Ceased
-
2011
- 2011-01-28 WO PCT/EP2011/051191 patent/WO2011092276A1/fr active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2432383A1 (de) * | 1973-11-22 | 1976-01-22 | Siemens Ag | Reaktionsgefaess zum abscheiden von halbleitermaterial auf erhitzte traegerkoerper |
US20040074609A1 (en) * | 2002-05-23 | 2004-04-22 | Andreas Fischer | Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode |
US20090081380A1 (en) | 2007-09-20 | 2009-03-26 | Mitsubishi Materials Corporation | Reactor for polycrystalline silicon and polycrystalline silicon production method |
EP2108619A2 (fr) | 2008-03-21 | 2009-10-14 | Mitsubishi Materials Corporation | Réacteur en silicone polycristalline |
EP2138459A1 (fr) * | 2008-06-24 | 2009-12-30 | Mitsubishi Materials Corporation | Appareil de production de silicium polycristallin |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20130011581A1 (en) * | 2011-07-06 | 2013-01-10 | Wacker Chemie Ag | Protective device for electrode holders in cvd reactors |
EP2544215A3 (fr) * | 2011-07-06 | 2013-02-20 | Wacker Chemie AG | Dispositif de protection de supports d'électrodes dans des réacteurs CVD |
DE102013204926A1 (de) | 2013-03-20 | 2014-09-25 | Wacker Chemie Ag | Vorrichtung zum Schutz einer Elektrodendichtung in einem Reaktor zur Abscheidung von polykristallinem Silicium |
DE102013214800A1 (de) | 2013-07-29 | 2015-01-29 | Wacker Chemie Ag | Vorrichtung zur Isolierung und Abdichtung von Elektrodenhalterungen in CVD Reaktoren |
WO2015014589A1 (fr) * | 2013-07-29 | 2015-02-05 | Wacker Chemie Ag | Dispositif pour isoler et étanchéifier des porte-électrodes dans des réacteurs cvd |
DE102014223415A1 (de) | 2014-11-17 | 2016-05-19 | Wacker Chemie Ag | Vorrichtung zur Isolierung und Abdichtung von Elektrodenhalterungen in CVD Reaktoren |
WO2016078938A1 (fr) | 2014-11-17 | 2016-05-26 | Wacker Chemie Ag | Dispositif d'isolement et d'étanchéité de supports d'électrode dans des réacteurs cvd |
US10550466B2 (en) | 2014-11-17 | 2020-02-04 | Wacker Chemie Ag | Device for insulating and sealing electrode holders in CVD reactors |
DE102015220127A1 (de) | 2015-10-15 | 2017-04-20 | Wacker Chemie Ag | Vorrichtung zur Isolierung und Abdichtung von Elektrodenhalterungen in CVD Reaktoren |
WO2017064011A1 (fr) | 2015-10-15 | 2017-04-20 | Wacker Chemie Ag | Dispositif d'isolement et d'étanchéité de supports d'électrode dans des réacteurs cvd |
US10562778B2 (en) | 2015-10-15 | 2020-02-18 | Wacker Chemie Ag | Device for insulating and sealing electrode holders in CVD reactors |
Also Published As
Publication number | Publication date |
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DE102010000270A1 (de) | 2011-08-04 |
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