WO2011046373A3 - 비접촉 타입의 발광 다이오드 - Google Patents
비접촉 타입의 발광 다이오드 Download PDFInfo
- Publication number
- WO2011046373A3 WO2011046373A3 PCT/KR2010/007038 KR2010007038W WO2011046373A3 WO 2011046373 A3 WO2011046373 A3 WO 2011046373A3 KR 2010007038 W KR2010007038 W KR 2010007038W WO 2011046373 A3 WO2011046373 A3 WO 2011046373A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- light emitting
- electrode
- emitting diode
- clad layer
- layer
- Prior art date
Links
- 238000005530 etching Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/08—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a plurality of light emitting regions, e.g. laterally discontinuous light emitting layer or photoluminescent region integrated within the semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/16—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous
- H01L33/18—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous within the light emitting region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
Abstract
전극과 클래드층 사이가 비접촉인 발광 다이오드가 개시된다. 기판 상에 제1 전극을 형성하고, 제1 전극 상부에 제1 클래드층을 형성한다. 제1 클래드층 상부에 형성된 절연층을 선택적으로 식각하여 다수의 핀 홀들을 형성한다. 핀 홀 내부에는 광활성층을 형성하고, 광활성층 상부에 제2 클래드층을 형성한다. 제2 전극은 절연층 상부에 형성되고, 제2 클래드층과 제2 전극이 비접촉 상태가 된다. 이를 통해 고전압의 전원을 발광 다이오드에 인가할 수 있다. 또한, 좁은 면적에 다수의 개별적인 발광구조를 실현하여 높은 휘도를 획득할 수 있다.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2009-0098566 | 2009-10-16 | ||
KR1020090098566A KR101593693B1 (ko) | 2009-10-16 | 2009-10-16 | 비접촉 타입의 발광 다이오드 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2011046373A2 WO2011046373A2 (ko) | 2011-04-21 |
WO2011046373A3 true WO2011046373A3 (ko) | 2011-07-14 |
Family
ID=43876711
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2010/007038 WO2011046373A2 (ko) | 2009-10-16 | 2010-10-14 | 비접촉 타입의 발광 다이오드 |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR101593693B1 (ko) |
WO (1) | WO2011046373A2 (ko) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR970013441A (ko) * | 1995-08-21 | 1997-03-29 | 빈센트 비. 인그라시아 | 유기 발광 다이오드 매트릭스 제조 방법 |
US5953362A (en) * | 1997-12-15 | 1999-09-14 | Pamulapati; Jagadeesh | Strain induce control of polarization states in vertical cavity surface emitting lasers and method of making same |
JP2000236111A (ja) * | 1999-02-15 | 2000-08-29 | Matsushita Electric Works Ltd | 光源装置 |
KR20040029301A (ko) * | 2001-08-22 | 2004-04-06 | 소니 가부시끼 가이샤 | 질화물 반도체소자 및 질화물 반도체소자의 제조방법 |
US20090242914A1 (en) * | 2008-03-26 | 2009-10-01 | Foxconn Technology Co., Ltd. | Led assembly with high heat dissipating capability |
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2009
- 2009-10-16 KR KR1020090098566A patent/KR101593693B1/ko active IP Right Grant
-
2010
- 2010-10-14 WO PCT/KR2010/007038 patent/WO2011046373A2/ko active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR970013441A (ko) * | 1995-08-21 | 1997-03-29 | 빈센트 비. 인그라시아 | 유기 발광 다이오드 매트릭스 제조 방법 |
US5953362A (en) * | 1997-12-15 | 1999-09-14 | Pamulapati; Jagadeesh | Strain induce control of polarization states in vertical cavity surface emitting lasers and method of making same |
JP2000236111A (ja) * | 1999-02-15 | 2000-08-29 | Matsushita Electric Works Ltd | 光源装置 |
KR20040029301A (ko) * | 2001-08-22 | 2004-04-06 | 소니 가부시끼 가이샤 | 질화물 반도체소자 및 질화물 반도체소자의 제조방법 |
US20090242914A1 (en) * | 2008-03-26 | 2009-10-01 | Foxconn Technology Co., Ltd. | Led assembly with high heat dissipating capability |
Also Published As
Publication number | Publication date |
---|---|
KR101593693B1 (ko) | 2016-02-15 |
KR20110041640A (ko) | 2011-04-22 |
WO2011046373A2 (ko) | 2011-04-21 |
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