WO2010110535A3 - Procédé de modélisation de la courbe de distribution de réflectance, système de mesure d'épaisseur et réflectomètre de mesure d'épaisseur utilisant ce système - Google Patents
Procédé de modélisation de la courbe de distribution de réflectance, système de mesure d'épaisseur et réflectomètre de mesure d'épaisseur utilisant ce système Download PDFInfo
- Publication number
- WO2010110535A3 WO2010110535A3 PCT/KR2010/001131 KR2010001131W WO2010110535A3 WO 2010110535 A3 WO2010110535 A3 WO 2010110535A3 KR 2010001131 W KR2010001131 W KR 2010001131W WO 2010110535 A3 WO2010110535 A3 WO 2010110535A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- reflectance
- distribution curve
- intensity
- wavelength
- reflectance distribution
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0608—Height gauges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02012—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal intensity variation
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/56—Cameras or camera modules comprising electronic image sensors; Control thereof provided with illuminating means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012501920A JP5424143B2 (ja) | 2009-03-23 | 2010-02-26 | 反射度分布曲線のモデリング方法及びこれを利用した厚さ測定方法、ならびに厚さ測定反射計 |
CN201080013587XA CN102362146B (zh) | 2009-03-23 | 2010-02-26 | 反射度分布曲线的建模方法及应用该方法的厚度检测方法以及厚度检测反射仪 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2009-0024362 | 2009-03-23 | ||
KR1020090024362A KR101107507B1 (ko) | 2009-03-23 | 2009-03-23 | 반사도분포곡선의 모델링방법 및 이를 이용하는 두께 측정방법, 두께 측정 반사계 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2010110535A2 WO2010110535A2 (fr) | 2010-09-30 |
WO2010110535A3 true WO2010110535A3 (fr) | 2010-12-09 |
Family
ID=42781626
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2010/001131 WO2010110535A2 (fr) | 2009-03-23 | 2010-02-26 | Procédé de modélisation de la courbe de distribution de réflectance, système de mesure d'épaisseur et réflectomètre de mesure d'épaisseur utilisant ce système |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5424143B2 (fr) |
KR (1) | KR101107507B1 (fr) |
CN (1) | CN102362146B (fr) |
TW (1) | TWI428557B (fr) |
WO (1) | WO2010110535A2 (fr) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101537854B1 (ko) * | 2013-09-23 | 2015-07-21 | 에스엔유 프리시젼 주식회사 | 두께 측정 장치 및 이를 이용한 두께 측정 방법 |
CN104111235B (zh) * | 2014-07-11 | 2016-10-05 | 北京大学 | 一种测量二维薄膜材料复折射率谱的方法 |
KR101650319B1 (ko) * | 2015-03-06 | 2016-08-24 | 에스엔유 프리시젼 주식회사 | 컬러 카메라를 이용한 두께 측정방법 및 두께 측정장치 |
JP6568041B2 (ja) * | 2016-10-25 | 2019-08-28 | 株式会社ブルービジョン | 光源装置及び撮像システム |
JP6550101B2 (ja) * | 2017-07-13 | 2019-07-24 | Jfeテクノリサーチ株式会社 | 膜厚測定方法及び膜厚測定装置 |
KR102210348B1 (ko) | 2019-07-25 | 2021-02-01 | (주)지엘테크 | 초점위치와 광축의 조정이 가능한 반사계 |
CN110763657B (zh) * | 2019-11-20 | 2022-05-13 | 江苏赛诺格兰医疗科技有限公司 | 用于反射材料反射率测试系统的光电数字转换系统 |
US11624607B2 (en) | 2020-01-06 | 2023-04-11 | Tokyo Electron Limited | Hardware improvements and methods for the analysis of a spinning reflective substrates |
US20240200934A1 (en) * | 2021-04-23 | 2024-06-20 | Yamaha Hatsudoki Kabushiki Kaisha | Measurement device and board inspection device |
US11738363B2 (en) | 2021-06-07 | 2023-08-29 | Tokyo Electron Limited | Bath systems and methods thereof |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09292207A (ja) * | 1996-04-25 | 1997-11-11 | Olympus Optical Co Ltd | 膜厚検査装置 |
JP2001153620A (ja) * | 1999-11-29 | 2001-06-08 | Dainippon Screen Mfg Co Ltd | 膜厚測定装置および膜厚測定方法 |
KR100490325B1 (ko) * | 2001-09-21 | 2005-05-17 | 케이맥(주) | 2차원형 검출기를 이용한 박막 특성 측정 장치 및 그 측정 방법 |
KR100624542B1 (ko) * | 2004-03-04 | 2006-09-19 | 다이니폰 스크린 세이조우 가부시키가이샤 | 막 두께 측정 방법 및 장치 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3932836B2 (ja) * | 2001-07-27 | 2007-06-20 | 株式会社日立製作所 | 薄膜の膜厚計測方法及びその装置並びにそれを用いたデバイスの製造方法 |
US7286242B2 (en) * | 2001-09-21 | 2007-10-23 | Kmac | Apparatus for measuring characteristics of thin film by means of two-dimensional detector and method of measuring the same |
JP2003168666A (ja) * | 2001-12-03 | 2003-06-13 | Nikon Corp | 膜層状態測定方法、膜層状態測定装置、研磨装置及び半導体デバイスの製造方法 |
JP2007212477A (ja) * | 2007-05-01 | 2007-08-23 | Toshiba Corp | 成膜量測定方法及び成膜量測定装置 |
-
2009
- 2009-03-23 KR KR1020090024362A patent/KR101107507B1/ko active IP Right Grant
-
2010
- 2010-02-26 JP JP2012501920A patent/JP5424143B2/ja not_active Expired - Fee Related
- 2010-02-26 CN CN201080013587XA patent/CN102362146B/zh active Active
- 2010-02-26 WO PCT/KR2010/001131 patent/WO2010110535A2/fr active Application Filing
- 2010-03-01 TW TW099105813A patent/TWI428557B/zh active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09292207A (ja) * | 1996-04-25 | 1997-11-11 | Olympus Optical Co Ltd | 膜厚検査装置 |
JP2001153620A (ja) * | 1999-11-29 | 2001-06-08 | Dainippon Screen Mfg Co Ltd | 膜厚測定装置および膜厚測定方法 |
KR100490325B1 (ko) * | 2001-09-21 | 2005-05-17 | 케이맥(주) | 2차원형 검출기를 이용한 박막 특성 측정 장치 및 그 측정 방법 |
KR100624542B1 (ko) * | 2004-03-04 | 2006-09-19 | 다이니폰 스크린 세이조우 가부시키가이샤 | 막 두께 측정 방법 및 장치 |
Also Published As
Publication number | Publication date |
---|---|
JP2012521560A (ja) | 2012-09-13 |
TWI428557B (zh) | 2014-03-01 |
KR101107507B1 (ko) | 2012-01-31 |
KR20100105976A (ko) | 2010-10-01 |
JP5424143B2 (ja) | 2014-02-26 |
CN102362146A (zh) | 2012-02-22 |
WO2010110535A2 (fr) | 2010-09-30 |
CN102362146B (zh) | 2013-10-16 |
TW201035518A (en) | 2010-10-01 |
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