WO2010058164A1 - Réacteur à colonne à bulles pour suspension épaisse - Google Patents

Réacteur à colonne à bulles pour suspension épaisse Download PDF

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Publication number
WO2010058164A1
WO2010058164A1 PCT/GB2009/002698 GB2009002698W WO2010058164A1 WO 2010058164 A1 WO2010058164 A1 WO 2010058164A1 GB 2009002698 W GB2009002698 W GB 2009002698W WO 2010058164 A1 WO2010058164 A1 WO 2010058164A1
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WO
WIPO (PCT)
Prior art keywords
reactor
tube
gas
gas distributor
slurry
Prior art date
Application number
PCT/GB2009/002698
Other languages
English (en)
Other versions
WO2010058164A8 (fr
Inventor
Manfred Rupel
Thomas Gutermuth
Dag Schanke
Pal Soraker
Original Assignee
Gtl.F1 Ag,
Rees, David Christopher
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US13/130,041 priority Critical patent/US9039980B2/en
Priority to JP2011543811A priority patent/JP5734871B6/ja
Priority to AU2009317051A priority patent/AU2009317051A1/en
Application filed by Gtl.F1 Ag,, Rees, David Christopher filed Critical Gtl.F1 Ag,
Priority to PL09756343T priority patent/PL2367616T3/pl
Priority to EP09756343.1A priority patent/EP2367616B1/fr
Publication of WO2010058164A1 publication Critical patent/WO2010058164A1/fr
Publication of WO2010058164A8 publication Critical patent/WO2010058164A8/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/20—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with liquid as a fluidising medium
    • B01J8/22—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with liquid as a fluidising medium gas being introduced into the liquid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/231—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
    • B01F23/23105—Arrangement or manipulation of the gas bubbling devices
    • B01F23/2312—Diffusers
    • B01F23/23121—Diffusers having injection means, e.g. nozzles with circumferential outlet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F33/00—Other mixers; Mixing plants; Combinations of mixers
    • B01F33/40—Mixers using gas or liquid agitation, e.g. with air supply tubes
    • B01F33/406—Mixers using gas or liquid agitation, e.g. with air supply tubes in receptacles with gas supply only at the bottom
    • B01F33/4062—Mixers using gas or liquid agitation, e.g. with air supply tubes in receptacles with gas supply only at the bottom with means for modifying the gas pressure or for supplying gas at different pressures or in different volumes at different parts of the bottom
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/24—Stationary reactors without moving elements inside
    • B01J19/2455—Stationary reactors without moving elements inside provoking a loop type movement of the reactants
    • B01J19/246—Stationary reactors without moving elements inside provoking a loop type movement of the reactants internally, i.e. the mixture circulating inside the vessel such that the upward stream is separated physically from the downward stream(s)
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/26—Nozzle-type reactors, i.e. the distribution of the initial reactants within the reactor is effected by their introduction or injection through nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/1818—Feeding of the fluidising gas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/20—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with liquid as a fluidising medium
    • B01J8/22—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with liquid as a fluidising medium gas being introduced into the liquid
    • B01J8/224—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with liquid as a fluidising medium gas being introduced into the liquid the particles being subject to a circulatory movement
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/20—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with liquid as a fluidising medium
    • B01J8/22—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with liquid as a fluidising medium gas being introduced into the liquid
    • B01J8/224—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with liquid as a fluidising medium gas being introduced into the liquid the particles being subject to a circulatory movement
    • B01J8/226—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with liquid as a fluidising medium gas being introduced into the liquid the particles being subject to a circulatory movement internally, i.e. the particles rotate within the vessel
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C1/00—Preparation of hydrocarbons from one or more compounds, none of them being a hydrocarbon
    • C07C1/02—Preparation of hydrocarbons from one or more compounds, none of them being a hydrocarbon from oxides of a carbon
    • C07C1/04—Preparation of hydrocarbons from one or more compounds, none of them being a hydrocarbon from oxides of a carbon from carbon monoxide with hydrogen
    • C07C1/0405—Apparatus
    • C07C1/041—Reactors
    • C07C1/0415—Reactors with moving catalysts
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10G—CRACKING HYDROCARBON OILS; PRODUCTION OF LIQUID HYDROCARBON MIXTURES, e.g. BY DESTRUCTIVE HYDROGENATION, OLIGOMERISATION, POLYMERISATION; RECOVERY OF HYDROCARBON OILS FROM OIL-SHALE, OIL-SAND, OR GASES; REFINING MIXTURES MAINLY CONSISTING OF HYDROCARBONS; REFORMING OF NAPHTHA; MINERAL WAXES
    • C10G2/00—Production of liquid hydrocarbon mixtures of undefined composition from oxides of carbon
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10G—CRACKING HYDROCARBON OILS; PRODUCTION OF LIQUID HYDROCARBON MIXTURES, e.g. BY DESTRUCTIVE HYDROGENATION, OLIGOMERISATION, POLYMERISATION; RECOVERY OF HYDROCARBON OILS FROM OIL-SHALE, OIL-SAND, OR GASES; REFINING MIXTURES MAINLY CONSISTING OF HYDROCARBONS; REFORMING OF NAPHTHA; MINERAL WAXES
    • C10G2/00—Production of liquid hydrocarbon mixtures of undefined composition from oxides of carbon
    • C10G2/30—Production of liquid hydrocarbon mixtures of undefined composition from oxides of carbon from carbon monoxide with hydrogen
    • C10G2/32—Production of liquid hydrocarbon mixtures of undefined composition from oxides of carbon from carbon monoxide with hydrogen with the use of catalysts
    • C10G2/34—Apparatus, reactors
    • C10G2/342—Apparatus, reactors with moving solid catalysts
    • C10G2/344—Apparatus, reactors with moving solid catalysts according to the "fluidised-bed" technique
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00796—Details of the reactor or of the particulate material
    • B01J2208/00893—Feeding means for the reactants
    • B01J2208/00911—Sparger-type feeding elements

Definitions

  • the present invention relates to a gas distributor arrangement in a three phase reactor or slurry bubble column reactor (SBCR).
  • SBCR slurry bubble column reactor
  • SBCRs are employed to conduct many chemical reactions, particularly reactions in which the reactants are gaseous, the products include liquids, and a solid catalyst is required.
  • the gaseous reactants are introduced into a slurry of finely divided catalyst in a liquid medium which may contain a liquid reaction product.
  • the gas introduction is achieved using a gas distributor.
  • a gas distributor for a slurry bubble column should satisfy some important requirements, which include:
  • a slurry bubble column reactor comprising a reactor vessel having a gas outlet and a liquid outlet, and a gas distributor arrangement in the region of the bottom of the vessel when in its orientation for use, the gas distributor arrangement comprising an upper gas distributor, a lower gas distributor spaced from the upper distributor to a position nearer the bottom of the vessel and a tube open at both ends and with its longitudinal axis extending generally vertically when the vessel is in its orientation for use, the tube being arranged so that the upper gas distributor is located close to or in the vicinity of the upper open end of the tube, and the lower gas distributor is located at a level close to the lower end of the tube, whereby in use gas from the lower sparger rings rises into the tube, reduces the density of the slurry, and causes the slurry in the tube to rise.
  • a difference in density is established between the slurry outside the tube and the slurry inside the tube by means of the gas from the lower distributor entering the tube, and this in turn causes slurry outside the tube to flow downwards thereby sweeping the inside wall of the vessel, and then upwards through the tube as the gas from the lower distributor is entrained.
  • the system avoids difficulties associated with control of the gas nozzle pressures brought about by having a series of gas manifolds with their respective nozzles at difference heights at the bottom of the reactor, which will then have to overcome different hydrostatic pressures.
  • Independent control of the pressure to the two gas distributors means that gas can be injected through the upper gas distributor at a lower pressure than through the lower gas distributor, if desired, or even through the lower gas distributor alone.
  • the upper gas distributor comprises a manifold arrangement with a plurality of upper nozzles.
  • the manifold arrangement may comprise one or more pipes each having a plurality of upper nozzles.
  • the manifold arrangement comprises a plurality of generally circular or part-circular concentric pipes each having a plurality of upper nozzles arranged along its length.
  • the concentric pipes are tubular toroids or toroid sections.
  • the upper nozzles all lie in a common generally horizontal plane, with height variations typically ⁇ 100mm.
  • the diameter of the openings of the upper gas nozzles is equal to or greater than 5 mm.
  • the openings of the upper nozzles are arranged so that the principal axis of the jets of gas produced has an inclination of 90° or less below horizontal.
  • the upper gas distributor is connected to an upper gas supply arrangement, which gives a supply pressure to each of the nozzles with a variation between nozzle supply pressure of less than 100% of the average nozzle pressure drop.
  • the lower gas distributor comprises a manifold arrangement with a plurality of lower nozzles.
  • the manifold arrangement comprises one or more pipes, each having a plurality of lower nozzles.
  • the manifold arrangement comprises a plurality of generally circular or part- circular concentric pipes each having a plurality of lower nozzles arranged along its length.
  • the concentric pipes are tubular toroids or toroid sections.
  • the lower nozzles all lie in a common generally horizontal plane, with variations typically ⁇ 100mm.
  • the diameter of the openings of the lower nozzle is equal to or greater than 5mm.
  • the lower gas distributor is connected to a lower gas supply arrangement, which gives a supply pressure to each of the nozzles with a variation between nozzle supply pressure of less than 100% of the average nozzle pressure drop.
  • the upper and lower gas distributors together cover from 30 to 100% of the cross-sectional area of the reactor , preferably from 40 to 80%.
  • the lower gas distributor represents from 2 to 12% of the cross- sectional area of the reactor, preferably from 5 to 8%.
  • the lower gas distributor is arranged to supply 4 to 20% of the gas flow to the reactor, preferably from 8 to 15%.
  • the tube is cylindrical and arranged generally in the reactor with its longitudinal axis substantially vertical.
  • the upper gas distributor is at a position between Im above the top of the tube and 50% of the tube length below the top of the tube.
  • the lower gas distributor is between 0.3m beneath and 0.3m above the bottom of the tube.
  • the cross-sectional area of this is sufficient so that the average slurry velocity through this gap is slower than 5 m/s to avoid erosion of reactor bottom and attrition of catalyst particles. The velocity should however be >0.5 m/s to avoid settling of catalyst at bottom.
  • the reactor vessel is generally cylindrical but at the bottom, there is a curved portion extending from the main cylindrical wall, a part-conical portion extending from the curved position, and a curved base.
  • the bottom of the tube is at substantially the position where the part-conical portion joins the curved base.
  • the invention also extends to a method of conducting a chemical reaction involving gaseous reactants which comprises supplying the gaseous reactants to a reactor as described above, by way of the upper and lower gas distributors, in which method, the reactor contains a volume of slurry comprising a liquid phase and solid catalyst particles, and the catalyst particles are maintained in suspension in the slurry by rising gas bubbles from the gas distributors.
  • the gas flowing through each individual nozzle exerts a dynamic pressure of less than 15 000 kg/m s 2 , more preferably less than 10,000 kg/ms 2 , for example a pressure in the range 200 to 8,000 kg/ms 2 .
  • the method may be applied to a Fischer-Tropsch synthesis reaction, for example, one in which the reaction temperature is in the range 150 to 300 0 C, the reaction temperature is in the range 200 to 26O 0 C, and the reaction pressure is in the range 1 to 100 bar. Preferably, the temperature is in the range 210 to 25O 0 C and the pressure is preferably in the range 10 to 50 bar.
  • the invention also extends to methods of operating the reactors according to the invention to carry out reactions, to the products of those reactions and to further methods comprising various post-processing operations and to the products of such further methods.
  • Figure 1 is a schematic section of the bottom of a reactor vessel according to the invention.
  • Figure 2 is a top plan view of a lower gas distributor
  • Figure 3 is an amplified section through a part of the lower gas distributor
  • Figure 4 is a top plan view of part of the upper gas distributor
  • Figure 5 is a section through a simple nozzle
  • Figure 6 is a section through an alternative form of nozzle.
  • a slurry bubble column reactor comprises a vessel 11, an upper gas distributor or sparger 12, a lower gas distributor or sparger 13 and a tube 14.
  • the vessel 11 is generally cylindrical and has a gas outlet at the top (not shown) and a liquid product outlet (not shown). At the bottom, the vessel 11 has a curved portion 15, a part conical section 16 and a curved base 17.
  • the tube 14 is a cylinder, open at the top 18 and bottom 19.
  • the upper sparger 12 will be described in greater detail below with reference to Figure 4 but includes a series of concentric tubular gas distribution rings 21 which surround the tube 14 and are located at a level just below and close to the open top 18 and just at the position where the curved portion 15 of the vessel meets the part-conical section 16.
  • the lower sparger 13 will be described in greater detail below with reference to figures 2 and 3, but includes a series of concentric tubular gas distribution rings 22 which are located within the circumference of the tube 14 and at a level close to but beneath the open bottom 19.
  • the lower sparger 13 includes a main gas feed pipe 23, three equispaced radially extending manifolds 24 connected to the feed pipe 23 and beneath the manifolds 24, the rings 22.
  • the rings 22 are connected to the manifolds 24 by means of respective gas supply tubes 25. It will be appreciated that while three rings 22 are shown, there could be fewer or more, depending on various factors, such as the dimensions of the reactor and the rings themselves.
  • the upper sparger 12 is shown in Figure 4. It consists of a main gas feed ring outside the reactor (not shown), three radically extending manifolds 26 connected to the main gas feed ring through the vessel wall 11, and beneath the manifolds 26, the rings 21.
  • the rings 21 are connected to the manifolds 26 by means of respective gas supply tubes (not shown) in a similar fashion to the lower sparger 13. It will be appreciated that while seven rings 21 are shown in Figure 4, there could be fewer or more, depending on various factors, such as the dimensions of the reactor and the rings 21 themselves. It will also be appreciated that a gas feed ring arrangement similar to that used for the upper sparger 12 could be used for the lower sparger 13, in place of the main gas feed pipe 23.
  • Each of the rings 21, 22 is formed with a series of nozzles which are generally equispaced along the ring 21, 22, and are also similarly spaced from the nozzles on adjacent rings.
  • the nozzles are shown in more detail in Figures 5 and 6.
  • Figure 5 shows a nozzle in the form of a simple hole 27 in a ring 21.
  • Figure 6 shows an alternative nozzle in the form of a hole 28 in a ring 21 covered by a cowl 29 which has an aperture 31.
  • the hole 27 or the aperture 31 faces downwards, 90° or less below the horizontal.
  • the L/D-ratio for the nozzle should be >1, where L is the length of the nozzle and D is the diameter of the nozzle.
  • the length L is the depth of the hole, i.e. the thickness of the ring wall.
  • the reactant gas is conveyed to the upper and lower feed pipes and enters the upper manifolds 26 and the lower manifolds 24. It then enters the respective rings 21, 22 via the respective tubes, and is injected into the slurry in the reactor vessel 11 through the nozzles. In this way, each nozzle produces a downward gas jet into the slurry. The jets near the vessel bottom create motion of the slurry near the surface of the reactor vessel 11 to prevent the catalyst from settling and keep the catalyst in motion in that area.
  • the two spargers can be designed without the need for a very narrow window for the distance between the reactor wall and the nozzles.
  • Even with feeding gas only in the inner part of the reactor a sufficient slurry circulation can be maintained to avoid sedimentation of catalyst outside the tube.
  • the pressure drop can be kept low over the spargers due to operation at low gas velocity in sparger nozzles, but still maintain even distribution of gas, thus reducing attrition of the catalyst.
  • fable 1 below shows some examples for a reactor of 10 m ID.
  • the slurry residence time below the top sparger outside tube should be as short as possible.
  • Table 1 shows calculated cases for some variations of tube diameter, gap area, fraction of feed gas to the bottom sparger and bottom and top sparger coverage. The calculations are based on Bernoulli's equations for calculating the driving force for the circulation.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • General Chemical & Material Sciences (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

L'invention porte sur un réacteur (11) à colonne à bulles pour suspension épaisse doté d'un dispositif de distribution de gaz comprenant un dispositif d'arrosage supérieur (12), un dispositif d'arrosage inférieur (13) et un tube à extrémités ouvertes (14). Le gaz provenant du dispositif d'arrosage inférieur (13) entre dans le tube (14) et réduit la densité de la suspension épaisse dans le tube (14) et entre dans la densité de la suspension épaisse dans le tube (14). La différence de densité de suspension épaisse fait monter la suspension épaisse dans le tube (14), ce qui fait descendre la suspension épaisse à l'extérieur du tube (14), ce qui maintient la circulation et le rinçage du catalyseur de la paroi du réacteur.
PCT/GB2009/002698 2008-11-18 2009-11-18 Réacteur à colonne à bulles pour suspension épaisse WO2010058164A1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
US13/130,041 US9039980B2 (en) 2008-11-18 2009-11-10 Slurry bubble column reactor
JP2011543811A JP5734871B6 (ja) 2008-11-18 2009-11-10 スラリー泡カラム反応器
AU2009317051A AU2009317051A1 (en) 2008-11-18 2009-11-10 Slurry bubble column reactor
PL09756343T PL2367616T3 (pl) 2008-11-18 2009-11-18 Reaktor z kolumną barbotażową do zawiesiny
EP09756343.1A EP2367616B1 (fr) 2008-11-18 2009-11-18 Réacteur à colonne à bulles pour suspension épaisse

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB0821094.0 2008-11-18
GB0821094.0A GB2465554B (en) 2008-11-18 2008-11-18 Slurry bubble column reactor

Publications (2)

Publication Number Publication Date
WO2010058164A1 true WO2010058164A1 (fr) 2010-05-27
WO2010058164A8 WO2010058164A8 (fr) 2015-07-02

Family

ID=40194840

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/GB2009/002698 WO2010058164A1 (fr) 2008-11-18 2009-11-18 Réacteur à colonne à bulles pour suspension épaisse

Country Status (7)

Country Link
US (1) US9039980B2 (fr)
EP (1) EP2367616B1 (fr)
KR (1) KR101654804B1 (fr)
AU (1) AU2009317051A1 (fr)
GB (1) GB2465554B (fr)
PL (1) PL2367616T3 (fr)
WO (1) WO2010058164A1 (fr)

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CN114225844A (zh) * 2021-11-11 2022-03-25 华南理工大学 一种多级浆态床反应器及其工作方法

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GB2444055B (en) * 2006-11-23 2011-11-23 Gtl F1 Ag Gas to liquids plant with consecutive Fischer-Tropsch reactors and hydrogen make-up
GB2466315B (en) 2008-12-22 2013-01-09 Gtl F1 Ag Apparatus and method for conducting a Fischer-Tropsch synthesis reaction
GB2471338B (en) 2009-06-26 2014-12-24 Gtl F1 Ag Apparatus and process for three-phase reacton
DE102009052670B4 (de) * 2009-11-12 2017-10-05 Sartorius Stedim Biotech Gmbh Begasungsvorrichtung für Bioreaktoren
NL2010005C2 (en) * 2012-12-18 2014-06-23 Pwn Technologies B V Reactor vessel for suspending media particles in a fluid.
JP2014136767A (ja) * 2013-01-17 2014-07-28 Japan Oil Gas & Metals National Corp 炭化水素合成反応装置
JP6145348B2 (ja) * 2013-07-30 2017-06-07 新日鉄住金エンジニアリング株式会社 炭化水素合成用の反応器
CN104722233A (zh) * 2013-08-23 2015-06-24 薛应东 一种搅拌器
CN108603123B (zh) * 2015-08-19 2020-06-09 沙索技术有限公司 一种浆态鼓泡塔反应器的运行方法
EP3423182A4 (fr) 2016-02-29 2019-09-11 Uop Llc Procédé de fluidification de catalyseur usé
US20230356166A1 (en) * 2020-02-12 2023-11-09 Hindustan Petroleum Corporation Limited Gas distributor for bubble column reactor
KR20220039181A (ko) 2020-09-22 2022-03-29 주식회사 엘지화학 올리고머 제조 장치

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WO2006097905A1 (fr) * 2005-03-17 2006-09-21 Sasol Technology (Proprietary) Limited Procede d'exploitation d'un reacteur a combustible en suspension a trois phases
WO2007086612A1 (fr) * 2006-01-30 2007-08-02 Nippon Steel Engineering Co., Ltd. Réacteur de synthèse d'hydrocarbures du type colonne à bulles

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US9039980B2 (en) 2015-05-26
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JP5734871B2 (ja) 2015-06-17
WO2010058164A8 (fr) 2015-07-02
KR20110106856A (ko) 2011-09-29
KR101654804B1 (ko) 2016-09-06
GB0821094D0 (en) 2008-12-24
AU2009317051A1 (en) 2010-05-27
GB2465554B (en) 2013-03-13
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US20110313062A1 (en) 2011-12-22
PL2367616T3 (pl) 2013-12-31

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