WO2010041822A4 - Tampon à polir présentant un tissu à mailles tricoté comme base - Google Patents

Tampon à polir présentant un tissu à mailles tricoté comme base Download PDF

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Publication number
WO2010041822A4
WO2010041822A4 PCT/KR2009/005130 KR2009005130W WO2010041822A4 WO 2010041822 A4 WO2010041822 A4 WO 2010041822A4 KR 2009005130 W KR2009005130 W KR 2009005130W WO 2010041822 A4 WO2010041822 A4 WO 2010041822A4
Authority
WO
WIPO (PCT)
Prior art keywords
polishing
polishing pad
present
mesh fabric
fabric
Prior art date
Application number
PCT/KR2009/005130
Other languages
English (en)
Korean (ko)
Other versions
WO2010041822A2 (fr
WO2010041822A3 (fr
Inventor
김명묵
Original Assignee
Kim Myung Mook
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kim Myung Mook filed Critical Kim Myung Mook
Priority to CN2009801403878A priority Critical patent/CN102186629A/zh
Priority to EP09819329A priority patent/EP2340915A2/fr
Priority to US13/122,956 priority patent/US20110195646A1/en
Publication of WO2010041822A2 publication Critical patent/WO2010041822A2/fr
Publication of WO2010041822A3 publication Critical patent/WO2010041822A3/fr
Publication of WO2010041822A4 publication Critical patent/WO2010041822A4/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/02—Backings, e.g. foils, webs, mesh fabrics

Definitions

  • the present invention relates to a polishing pad, and more particularly, to a polishing pad which comprises a surface of a fiber yarn which is woven in a net shape and in which a fiber yarn is woven densely to form a flat surface and a mesh formed between the surface portion and the tricot mesh fabric,
  • the abrasive yarn is attached to a flat surface portion of one side or both sides of the coat mesh fabric.
  • the rough surface of the product is polished, and then sandpaper is used for polishing of such a rough surface.
  • Such a sandpaper is used not only for wood but also for surface polishing of stone, synthetic resin, metal material and the like.
  • wood is used for the sake of convenience.
  • the above-described conventional sandpaper is obtained by attaching a polishing cloth to the surface of a paper or fabric, and it is usually attached to an electric sander of a vibration type in a sandwich manner or by using a loop- When a surface of a wooden furniture is polished by using such a conventional sandpaper (polishing pad), fine dusts are generated.
  • a surface of a wooden furniture is polished by using such a conventional sandpaper (polishing pad)
  • fine dusts are generated.
  • the environment of the workplace becomes very poor due to being floated to the atmosphere or accumulated on the surface of the workpiece, and the worker's body, especially the respiratory system and the eyes, are adversely affected, There was a problem.
  • Korean Utility Model Registration No. 436999 discloses a polishing pad developed by the present applicant in order to overcome the above problems in that a fiber yarn is attached to a surface of one side of a mesh fabric woven in a net shape, .
  • the utility model registration No. 436999 has an excellent effect that the dust generated during polishing is sucked through the mesh of the netting to increase the polishing efficiency and to prevent scattering of the dust, And thus the durability is weak due to the resistance force generated during the polishing.
  • the dust-absorbing method instead of the dust suction method, the dust generated during polishing is caught in the mesh formed with a very small size, Of course, it is not easy to remove the dust adhered to the mesh.
  • the present invention has been made in view of the above-mentioned problems, and it is an object of the present invention to provide a polishing pad which can be used not only as a dust suction method but also as a general polishing pad or a belt- To thereby improve the polishing performance, and to provide an improved polishing pad capable of repeated use for a long time.
  • a fiber yarn is woven into a net shape, the fiber yarn is densely woven to form a flat surface, and a tricot mesh fabric And a Velcro fabric adhered to the other side of the tricot mesh fabric so as to be attached to the abrasive pad holder surface of the power tool (sander)
  • the present invention provides a polishing pad detachably attached to a male-type male velcro formed on a polishing pad.
  • an epoxy coating layer is formed on the flat surface of the tricot mesh fabric at one side of the tricot mesh fabric to improve adhesion to the polishing cloth, and then a polishing sheet is adhered to the surface of the polishing cloth.
  • a top coating layer made of a phenol resin and calcium stearate An antifouling coating layer is formed.
  • a tricot mesh fabric in which a fiber yarn is woven in a net shape, the fiber yarn is woven densely to form a flat surface and a mesh formed between the surface portion and the tricot mesh fabric,
  • a double-sided polishing pad comprising a polishing layer on which flat surfaces on both sides of a fabric are adhered with a polishing agent by an adhesive.
  • the polishing pad of the present invention can provide a polishing pad having excellent abrasion resistance and excellent durability because the abrasive yarn is excellent in adhesion strength because the abrasive yarn is attached to the wide and wide surface of the tricot mesh fabric of the base material.
  • the dust generated during polishing is collected in an external dust suction device through a mesh having a relatively deep and large area formed in the tricot mesh fabric itself or is collected in a pocket- The dust is not retained on the polishing surface and the polishing performance is excellent. Since the dust can be easily removed from the mesh after polishing, the polishing pad can be used repeatedly.
  • FIG. 1 is a perspective view and a partially enlarged view of a polishing pad according to an embodiment of the present invention
  • FIG. 2 is an enlarged perspective view of a polishing pad according to an embodiment of the present invention
  • Figure 3 is a micrograph of a tricot mesh fabric, a substrate used in the polishing pad of the present invention
  • FIG. 5 is a sectional view showing a polishing pad laminated structure according to another embodiment of the present invention.
  • FIG. 6 is a photomicrograph of a polishing pad according to the present invention.
  • FIGS. 1 to 4 are views showing a polishing pad according to an embodiment of the present invention and actual photographs.
  • a fiber yarn is woven in a net shape
  • a tricot mesh fabric 10 having a mesh 14 formed between the surface portion 12 and the surface portion 12.
  • the tricot mesh fabric 10 has a flat surface portion on one side of the tricot mesh fabric 10, A polishing layer 20 to which an abrasive yarn is adhered and an upper layer 30 made of a velcro fabric adhered to the other side of the tricot mesh fabric 10.
  • An upper layer 30 (generally referred to as a loop type arm velcro) 30 made of a known velcro fabric in the polishing pad 1 of this embodiment is detachably attachable to an annular male Velcro formed on the surface of a polishing pad holder of a power tool .
  • the upper layer is not limited to the velcro fabric.
  • a durable fabric, a synthetic resin sheet, or an adhesive / non-adhesive paper may be attached to the upper surface of a substrate (tricot mesh fabric) It should be understood that the present invention is not limited to the above-described embodiments, and various modifications may be made without departing from the scope of the present invention.
  • the tricot mesh fabric 10 is a known fabric used as an inner skin of a sports garment requiring air permeability.
  • the woven shape of the tricot mesh fabric 10 may be natural or synthetic fibers (12) forming a flat and wide surface (a width of at least 1 mm to a maximum of 3 mm) and an elliptical mesh (14) formed independently between the surface portions (12)
  • the size of the mesh 14 is also very large, about 1 to 3 mm in diameter.
  • the surface portion 12 is woven so as to occupy an area of 50% or more with respect to the total area, so that the actual polishing area formed by the polishing layer attached to the surface portion is 50% Or more, so that the polishing performance can be improved.
  • the weave pattern of the tricot mesh fabric is not limited to the drawings, and the mesh 14 may be woven in various sizes.
  • the tricot mesh fabric 10 has a thickness of about 0.3 mm to 0.5 mm, so that the depth of the mesh 14 is at least 0.3 mm to 0.5 mm.
  • the tricot mesh fabric The polishing cloth is adhered to the surface portion 12 of one side surface of the polishing cloth 10 by an adhesive to form a polishing cloth layer 20 and a top coating layer is further formed on the polishing cloth layer 20 so that the depth of the mesh cloth 14 becomes deeper.
  • the volume of the mesh 14 increases, whereby the dust 14 generated during polishing can be sufficiently absorbed or accommodated in the mesh 14.
  • the first advantage of the present invention is that since the polishing yarn is entirely attached to the face portion 12 of the tricot mesh fabric 10, the polishing pad having the conventional net-like base is provided with a polishing yarn on the outside of the thin fiber strands,
  • the present invention is advantageous in that since the abrasive yarn is stably attached to the surface portion 12 forming the wide surface, the abrasive yarn is easily separated from the abrasive yarn during the actual abrading operation And the durability of the polishing pad is thereby improved.
  • Another advantage of the present invention is that the polishing surface of the actual polishing pad can be improved by allowing the surface with the polishing yarn to occupy 50% or more of the area of the entire polishing pad, thereby shortening the time required for the polishing operation There is.
  • a further advantage of the present invention is that the size of the mesh 14 is smaller than that of the net of the Korean Utility Model Registration No. 436999 of the present applicant, The grinding performance is rapidly deteriorated and repeated use is difficult.
  • the size of the mesh 14 is relatively large, the volume is large as described above, The dust can easily be discharged to the external dust suction device through the mesh of the time, and the dust adhered to the mesh can be easily removed when it is used as a polishing pad instead of the suction type.
  • the present invention can minimize the scattering of dust during polishing as well as improve the polishing performance, and has the advantage that it can be reused repeatedly.
  • the method of attaching the abrasive yarn is the same as the method described in Korean Utility Model Registration No. 436999 of the applicant of the present invention. This is because the epoxy coating layer for improving the adhesive strength is formed on the surface portion 12 of the tricot mesh fabric 10, It is preferable that a top coat layer made of a phenol resin is formed on the polishing layer and an antifouling coating layer made of calcium stearate is further formed on the top coat layer.
  • FIG. 5 illustrates another embodiment of the present invention.
  • a double-sided polishing pad which comprises a face 12, which is woven into a net shape and in which a fiber yarn is tightly woven to form a flat face, And a tricot mesh fabric (10) having a mesh (14) formed between the surface portions (12) of the tricot mesh fabric (10) (20).
  • the formation of the abrasive quartz is the same as the formation of the first embodiment described above, so that a detailed description thereof will be omitted.
  • the polishing cloth 20 is formed on both the upper and lower surfaces of the tricot mesh fabric 10 serving as a base material, so that the upper and lower surfaces are all used for polishing,
  • Such a double-sided polishing pad is suitable for use as an abrasive tool or a waterproofing work for mounting a polishing pad in a clip type.
  • FIG. 6 is an enlarged photograph of a real polishing pad on which a polishing yarn is attached on a surface portion 12 excluding the mesh 14 on the tricot mesh fabric, showing that the surface of the polishing multilayer 20 is roughly formed And the surface roughness of the abrasive quartz layer 20 can be variously adjusted by selecting the particle size of the abrasive yarn to be attached.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Laminated Bodies (AREA)
  • Knitting Of Fabric (AREA)

Abstract

La présente invention concerne un tampon à polir qui présente une base tricotée en forme de filet avec des mailles pour absorber et évacuer de la poussière générée pendant le polissage vers un dispositif d'aspiration de poussière externe ou pour stocker la poussière dans un système de poche, améliorant ainsi l'efficacité du polissage. Le tampon à polir selon la présente invention est pourvu d'une poudre à polir fermement fixée sur un côté de la base formé en une grande surface afin d'améliorer la durabilité du tampon à polir. Le tampon à polir, selon un mode de réalisation de la présente invention, comporte un tissu à mailles tricoté (10), dont des parties de plan (12) sont formées en tricotant, en forme de filet, des fils de fibre de façon dense, et dont les mailles (14) sont formées entre les parties de plan (12), une couche de poudre à polir (20) formée en fixant une poudre à polir sur les parties de plan d'un côté du tissu à mailles tricoté (10) avec un adhésif, et une couche supérieure (30) faite de tissu Velcro et fixée à l'autre côté du tissu à mailles tricoté (10). Le tampon à polir selon la présente invention est fixé de façon détachable au tissu Velcro à crochet mâle formé à la surface d'un support de tampon à polir d'un outil électrique (ponceuse).
PCT/KR2009/005130 2008-10-10 2009-09-10 Tampon à polir présentant un tissu à mailles tricoté comme base WO2010041822A2 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN2009801403878A CN102186629A (zh) 2008-10-10 2009-09-10 以经编网眼织物为基底的磨光片
EP09819329A EP2340915A2 (fr) 2008-10-10 2009-09-10 Tampon à polir présentant un tissu à mailles tricoté comme base
US13/122,956 US20110195646A1 (en) 2008-10-10 2009-09-10 Polishing pad having a tricot mesh faberic as a base

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR2020080013538U KR200448556Y1 (ko) 2008-10-10 2008-10-10 트리코트 메시 패브릭을 기재로 하는 연마패드
KR20-2008-0013538 2008-10-10

Publications (3)

Publication Number Publication Date
WO2010041822A2 WO2010041822A2 (fr) 2010-04-15
WO2010041822A3 WO2010041822A3 (fr) 2010-07-01
WO2010041822A4 true WO2010041822A4 (fr) 2010-08-19

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2009/005130 WO2010041822A2 (fr) 2008-10-10 2009-09-10 Tampon à polir présentant un tissu à mailles tricoté comme base

Country Status (4)

Country Link
US (1) US20110195646A1 (fr)
KR (1) KR200448556Y1 (fr)
CN (1) CN102186629A (fr)
WO (1) WO2010041822A2 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9522454B2 (en) * 2012-12-17 2016-12-20 Seagate Technology Llc Method of patterning a lapping plate, and patterned lapping plates
US20150335356A1 (en) * 2014-05-22 2015-11-26 Rodge Brooks Skin Treatment Apparatus
US10145869B2 (en) 2014-12-22 2018-12-04 Battelle Memorial Institute Remote leak and failure detection of electrical water heaters through temperature and power monitoring
JP7245493B2 (ja) * 2018-11-14 2023-03-24 国立大学法人九州工業大学 研磨装置
CN114454101A (zh) * 2022-03-03 2022-05-10 徐占文 一种抛光轮及其制造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004291180A (ja) * 2003-03-27 2004-10-21 Riken Corundum Co Ltd 研磨布紙およびその製造方法、並びに製造装置
KR100581614B1 (ko) * 2004-12-23 2006-05-23 주식회사 썬텍인더스트리 정밀연마용 클리닝 테이프
KR100809874B1 (ko) * 2006-03-23 2008-03-06 엠.씨.케이 (주) 망사를 이용한 연마포
KR200436999Y1 (ko) * 2006-11-23 2007-10-23 김명묵 망체를 기재로 하는 연마패드

Also Published As

Publication number Publication date
KR20100004087U (ko) 2010-04-20
KR200448556Y1 (ko) 2010-04-21
WO2010041822A2 (fr) 2010-04-15
CN102186629A (zh) 2011-09-14
WO2010041822A3 (fr) 2010-07-01
US20110195646A1 (en) 2011-08-11

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