WO2010041822A4 - Polishing pad having a tricot mesh fabric as a base - Google Patents

Polishing pad having a tricot mesh fabric as a base Download PDF

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Publication number
WO2010041822A4
WO2010041822A4 PCT/KR2009/005130 KR2009005130W WO2010041822A4 WO 2010041822 A4 WO2010041822 A4 WO 2010041822A4 KR 2009005130 W KR2009005130 W KR 2009005130W WO 2010041822 A4 WO2010041822 A4 WO 2010041822A4
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WO
WIPO (PCT)
Prior art keywords
polishing
polishing pad
present
mesh fabric
fabric
Prior art date
Application number
PCT/KR2009/005130
Other languages
French (fr)
Korean (ko)
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WO2010041822A3 (en
WO2010041822A2 (en
Inventor
김명묵
Original Assignee
Kim Myung Mook
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kim Myung Mook filed Critical Kim Myung Mook
Priority to US13/122,956 priority Critical patent/US20110195646A1/en
Priority to CN2009801403878A priority patent/CN102186629A/en
Priority to EP09819329A priority patent/EP2340915A2/en
Publication of WO2010041822A2 publication Critical patent/WO2010041822A2/en
Publication of WO2010041822A3 publication Critical patent/WO2010041822A3/en
Publication of WO2010041822A4 publication Critical patent/WO2010041822A4/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/02—Backings, e.g. foils, webs, mesh fabrics

Definitions

  • the present invention relates to a polishing pad, and more particularly, to a polishing pad which comprises a surface of a fiber yarn which is woven in a net shape and in which a fiber yarn is woven densely to form a flat surface and a mesh formed between the surface portion and the tricot mesh fabric,
  • the abrasive yarn is attached to a flat surface portion of one side or both sides of the coat mesh fabric.
  • the rough surface of the product is polished, and then sandpaper is used for polishing of such a rough surface.
  • Such a sandpaper is used not only for wood but also for surface polishing of stone, synthetic resin, metal material and the like.
  • wood is used for the sake of convenience.
  • the above-described conventional sandpaper is obtained by attaching a polishing cloth to the surface of a paper or fabric, and it is usually attached to an electric sander of a vibration type in a sandwich manner or by using a loop- When a surface of a wooden furniture is polished by using such a conventional sandpaper (polishing pad), fine dusts are generated.
  • a surface of a wooden furniture is polished by using such a conventional sandpaper (polishing pad)
  • fine dusts are generated.
  • the environment of the workplace becomes very poor due to being floated to the atmosphere or accumulated on the surface of the workpiece, and the worker's body, especially the respiratory system and the eyes, are adversely affected, There was a problem.
  • Korean Utility Model Registration No. 436999 discloses a polishing pad developed by the present applicant in order to overcome the above problems in that a fiber yarn is attached to a surface of one side of a mesh fabric woven in a net shape, .
  • the utility model registration No. 436999 has an excellent effect that the dust generated during polishing is sucked through the mesh of the netting to increase the polishing efficiency and to prevent scattering of the dust, And thus the durability is weak due to the resistance force generated during the polishing.
  • the dust-absorbing method instead of the dust suction method, the dust generated during polishing is caught in the mesh formed with a very small size, Of course, it is not easy to remove the dust adhered to the mesh.
  • the present invention has been made in view of the above-mentioned problems, and it is an object of the present invention to provide a polishing pad which can be used not only as a dust suction method but also as a general polishing pad or a belt- To thereby improve the polishing performance, and to provide an improved polishing pad capable of repeated use for a long time.
  • a fiber yarn is woven into a net shape, the fiber yarn is densely woven to form a flat surface, and a tricot mesh fabric And a Velcro fabric adhered to the other side of the tricot mesh fabric so as to be attached to the abrasive pad holder surface of the power tool (sander)
  • the present invention provides a polishing pad detachably attached to a male-type male velcro formed on a polishing pad.
  • an epoxy coating layer is formed on the flat surface of the tricot mesh fabric at one side of the tricot mesh fabric to improve adhesion to the polishing cloth, and then a polishing sheet is adhered to the surface of the polishing cloth.
  • a top coating layer made of a phenol resin and calcium stearate An antifouling coating layer is formed.
  • a tricot mesh fabric in which a fiber yarn is woven in a net shape, the fiber yarn is woven densely to form a flat surface and a mesh formed between the surface portion and the tricot mesh fabric,
  • a double-sided polishing pad comprising a polishing layer on which flat surfaces on both sides of a fabric are adhered with a polishing agent by an adhesive.
  • the polishing pad of the present invention can provide a polishing pad having excellent abrasion resistance and excellent durability because the abrasive yarn is excellent in adhesion strength because the abrasive yarn is attached to the wide and wide surface of the tricot mesh fabric of the base material.
  • the dust generated during polishing is collected in an external dust suction device through a mesh having a relatively deep and large area formed in the tricot mesh fabric itself or is collected in a pocket- The dust is not retained on the polishing surface and the polishing performance is excellent. Since the dust can be easily removed from the mesh after polishing, the polishing pad can be used repeatedly.
  • FIG. 1 is a perspective view and a partially enlarged view of a polishing pad according to an embodiment of the present invention
  • FIG. 2 is an enlarged perspective view of a polishing pad according to an embodiment of the present invention
  • Figure 3 is a micrograph of a tricot mesh fabric, a substrate used in the polishing pad of the present invention
  • FIG. 5 is a sectional view showing a polishing pad laminated structure according to another embodiment of the present invention.
  • FIG. 6 is a photomicrograph of a polishing pad according to the present invention.
  • FIGS. 1 to 4 are views showing a polishing pad according to an embodiment of the present invention and actual photographs.
  • a fiber yarn is woven in a net shape
  • a tricot mesh fabric 10 having a mesh 14 formed between the surface portion 12 and the surface portion 12.
  • the tricot mesh fabric 10 has a flat surface portion on one side of the tricot mesh fabric 10, A polishing layer 20 to which an abrasive yarn is adhered and an upper layer 30 made of a velcro fabric adhered to the other side of the tricot mesh fabric 10.
  • An upper layer 30 (generally referred to as a loop type arm velcro) 30 made of a known velcro fabric in the polishing pad 1 of this embodiment is detachably attachable to an annular male Velcro formed on the surface of a polishing pad holder of a power tool .
  • the upper layer is not limited to the velcro fabric.
  • a durable fabric, a synthetic resin sheet, or an adhesive / non-adhesive paper may be attached to the upper surface of a substrate (tricot mesh fabric) It should be understood that the present invention is not limited to the above-described embodiments, and various modifications may be made without departing from the scope of the present invention.
  • the tricot mesh fabric 10 is a known fabric used as an inner skin of a sports garment requiring air permeability.
  • the woven shape of the tricot mesh fabric 10 may be natural or synthetic fibers (12) forming a flat and wide surface (a width of at least 1 mm to a maximum of 3 mm) and an elliptical mesh (14) formed independently between the surface portions (12)
  • the size of the mesh 14 is also very large, about 1 to 3 mm in diameter.
  • the surface portion 12 is woven so as to occupy an area of 50% or more with respect to the total area, so that the actual polishing area formed by the polishing layer attached to the surface portion is 50% Or more, so that the polishing performance can be improved.
  • the weave pattern of the tricot mesh fabric is not limited to the drawings, and the mesh 14 may be woven in various sizes.
  • the tricot mesh fabric 10 has a thickness of about 0.3 mm to 0.5 mm, so that the depth of the mesh 14 is at least 0.3 mm to 0.5 mm.
  • the tricot mesh fabric The polishing cloth is adhered to the surface portion 12 of one side surface of the polishing cloth 10 by an adhesive to form a polishing cloth layer 20 and a top coating layer is further formed on the polishing cloth layer 20 so that the depth of the mesh cloth 14 becomes deeper.
  • the volume of the mesh 14 increases, whereby the dust 14 generated during polishing can be sufficiently absorbed or accommodated in the mesh 14.
  • the first advantage of the present invention is that since the polishing yarn is entirely attached to the face portion 12 of the tricot mesh fabric 10, the polishing pad having the conventional net-like base is provided with a polishing yarn on the outside of the thin fiber strands,
  • the present invention is advantageous in that since the abrasive yarn is stably attached to the surface portion 12 forming the wide surface, the abrasive yarn is easily separated from the abrasive yarn during the actual abrading operation And the durability of the polishing pad is thereby improved.
  • Another advantage of the present invention is that the polishing surface of the actual polishing pad can be improved by allowing the surface with the polishing yarn to occupy 50% or more of the area of the entire polishing pad, thereby shortening the time required for the polishing operation There is.
  • a further advantage of the present invention is that the size of the mesh 14 is smaller than that of the net of the Korean Utility Model Registration No. 436999 of the present applicant, The grinding performance is rapidly deteriorated and repeated use is difficult.
  • the size of the mesh 14 is relatively large, the volume is large as described above, The dust can easily be discharged to the external dust suction device through the mesh of the time, and the dust adhered to the mesh can be easily removed when it is used as a polishing pad instead of the suction type.
  • the present invention can minimize the scattering of dust during polishing as well as improve the polishing performance, and has the advantage that it can be reused repeatedly.
  • the method of attaching the abrasive yarn is the same as the method described in Korean Utility Model Registration No. 436999 of the applicant of the present invention. This is because the epoxy coating layer for improving the adhesive strength is formed on the surface portion 12 of the tricot mesh fabric 10, It is preferable that a top coat layer made of a phenol resin is formed on the polishing layer and an antifouling coating layer made of calcium stearate is further formed on the top coat layer.
  • FIG. 5 illustrates another embodiment of the present invention.
  • a double-sided polishing pad which comprises a face 12, which is woven into a net shape and in which a fiber yarn is tightly woven to form a flat face, And a tricot mesh fabric (10) having a mesh (14) formed between the surface portions (12) of the tricot mesh fabric (10) (20).
  • the formation of the abrasive quartz is the same as the formation of the first embodiment described above, so that a detailed description thereof will be omitted.
  • the polishing cloth 20 is formed on both the upper and lower surfaces of the tricot mesh fabric 10 serving as a base material, so that the upper and lower surfaces are all used for polishing,
  • Such a double-sided polishing pad is suitable for use as an abrasive tool or a waterproofing work for mounting a polishing pad in a clip type.
  • FIG. 6 is an enlarged photograph of a real polishing pad on which a polishing yarn is attached on a surface portion 12 excluding the mesh 14 on the tricot mesh fabric, showing that the surface of the polishing multilayer 20 is roughly formed And the surface roughness of the abrasive quartz layer 20 can be variously adjusted by selecting the particle size of the abrasive yarn to be attached.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Laminated Bodies (AREA)
  • Knitting Of Fabric (AREA)

Abstract

The present invention relates to a polishing pad having a base knitted into a net with meshes for absorbing and discharging dust generated during polishing to an external dust suction device or for storing the dust in a pocket system, thereby improving polishing efficiency. The polishing pad of the present invention is provided with polishing powder firmly bonded onto one side of the base formed into a wide area to improve the durability of the polishing pad. The polishing pad according to one embodiment of the present invention comprises a tricot mesh fabric (10) having plane portions (12) formed by densely knitting fiber yarns into a net and meshes (14) formed between the plane portions (12), a polishing powder layer (20) formed by bonding polishing powder to the plane portions at one side of the tricot mesh fabric (10) with an adhesive, and an upper layer (30) made of Velcro fabric and attached to the other side of the tricot mesh fabric (10). The polishing pad of the present invention is detachably fastened to the male hook Velcro formed at the surface of a polishing pad holder of an electric power tool (sander).

Description

트리코트 메시 패브릭을 기재로 하는 연마패드Polishing pad based on tricot mesh fabric
본 발명은 연마패드에 관한 것으로, 상세히는 섬유사가 망상으로 직조되되 섬유사가 치밀하게 직조되어 납작한 면을 형성하는 면부와 이 면부 사이에 형성되는 그물눈을 갖는 트리코트 메시 패브릭을 기재로 하고, 이 트리코트 메시 패브릭 일측면 또는 양측면의 납작한 면부에 연마사가 부착된 것이다.The present invention relates to a polishing pad, and more particularly, to a polishing pad which comprises a surface of a fiber yarn which is woven in a net shape and in which a fiber yarn is woven densely to form a flat surface and a mesh formed between the surface portion and the tricot mesh fabric, The abrasive yarn is attached to a flat surface portion of one side or both sides of the coat mesh fabric.
일반적으로 목재를 사용하여 가구를 비롯한 여러 제품을 제작할 때 거친 제품 표면을 다듬은 후 도장(塗裝)을 하게 되는데, 이러한 거친 표면의 연마시에는 사포를 사용하고 있다.Generally, when making various products such as furniture by using wood, the rough surface of the product is polished, and then sandpaper is used for polishing of such a rough surface.
이러한 사포는 목재뿐만 아니라 석재·합성수지·금속재 등의 표면 연마에도 사용되고 있으나, 이하에서는 편의상 목재를 예로 들어 설명하기로 한다.Such a sandpaper is used not only for wood but also for surface polishing of stone, synthetic resin, metal material and the like. Hereinafter, wood is used for the sake of convenience.
상기한 종래의 사포는 종이 또는 직물의 표면에 연마사를 부착한 것이며, 이는 통상 진동방식의 전동 샌더에 끼움 방식으로 부착하여 사용하거나 또는 연마사가 부착된 종이 또는 직물의 이면에 루프 형태의 암 벨크로 직물을 부착하여 회전방식 샌더의 연마패드 홀더에 형성된 수 벨크로에 분리가능하게 부착하여 사용하는데, 이러한 종래의 사포(연마패드)를 사용하여 목제 가구 등의 표면을 연마할 경우에는, 미세한 분진이 발생하여 대기중으로 부상하거나 피가공물의 표면 위에 쌓이게 됨으로써 작업장의 환경이 매우 열악해지게 됨은 물론 작업자의 신체 특히, 호흡기와 눈에 악영향을 미치게 됨으로써 작업성의 저하와 함께 작업자가 이러한 연마작업 자체를 기피하게 되는 문제가 있었다.The above-described conventional sandpaper is obtained by attaching a polishing cloth to the surface of a paper or fabric, and it is usually attached to an electric sander of a vibration type in a sandwich manner or by using a loop- When a surface of a wooden furniture is polished by using such a conventional sandpaper (polishing pad), fine dusts are generated. In this case, The environment of the workplace becomes very poor due to being floated to the atmosphere or accumulated on the surface of the workpiece, and the worker's body, especially the respiratory system and the eyes, are adversely affected, There was a problem.
최근에는 샌더의 연마패드 홀더에 분진의 흡인을 위한 구멍을 천공하고 연마패드에도 홀더의 구멍과 일치되는 위치에 구멍을 천공하여 연마시 발생하는 분진이 대기중으로 부상하기 전에 진공방식으로 흡입 제거할 수 있도록 한 장치가 개발되어 사용되고 있는데, 종래 종이나 직물을 기재로 하는 연마패드에 구멍을 천공하여 사용할 경우에는 인위적인 구멍의 천공에 의해 연마패드의 찢어짐이 발생할 우려가 있고, 이 구멍이 타공된 부분에 의해 의도하지 않은 연마상태 즉, 피연마물의 표면에 스크래치가 발생할 우려가 많았으며, 분진이 연마패드 표면에 부착된 연마사와 연마사 사이의 골에 끼이게 되어 연마패드의 연마성능이 급격하게 저하되는 등 연마작업의 효율성이 저하되는 문제점이 있었다.In recent years, a hole for suctioning dust has been drilled in a polishing pad holder of a sander, and a hole has been drilled in the polishing pad at a position coincident with the hole of the holder, so that the dust generated during polishing can be sucked and removed by vacuum method However, when a hole is perforated in a polishing pad made of a conventional paper or fabric, there is a risk of tearing of the polishing pad due to perforation of an artificial hole. There is a possibility that scratches will be generated on the surface of the object to be polished and dust is trapped in the corrugation between the polishing cloth adhering to the surface of the polishing pad and the polishing cloth and the abrasive performance of the polishing pad is drastically deteriorated There is a problem that the efficiency of the polishing work, etc., is lowered.
대한민국 실용신안등록 제436999호는 상기한 문제점을 해소하기 위하여 본 출원인이 개발한 연마패드인데, 이는 섬유사가 망상으로 직조된 망체의 일측 표면에 연마사를 부착하고, 망체의 타측에는 암 벨크로를 일체로 직조한 것이다.Korean Utility Model Registration No. 436999 discloses a polishing pad developed by the present applicant in order to overcome the above problems in that a fiber yarn is attached to a surface of one side of a mesh fabric woven in a net shape, .
한편, 실용신안등록 제436999호는 연마시 발생한 분진이 망체의 그물눈을 통해 흡인되어 연마효율을 높임과 아울러 분진의 비산을 방지할 수 있는 우수한 효과가 있는 반면, 연마사가 망체의 가느다란 섬유사 표면에 부착되어 있어 연마시 발생하는 저항력에 의해 쉽게 탈락함으로써 내구성이 약한 문제점이 있었으며, 분진을 흡입하는 방식이 아닌 용도로 사용할 경우에는 연마시 발생한 분진이 매우 작은 크기로 형성된 그물눈에 끼이게 되어 연마성능의 저하는 물론 그물눈에 끼인 분진을 털어내는 것이 용이하지 않는 단점이 있었다.On the other hand, the utility model registration No. 436999 has an excellent effect that the dust generated during polishing is sucked through the mesh of the netting to increase the polishing efficiency and to prevent scattering of the dust, And thus the durability is weak due to the resistance force generated during the polishing. In case of using the dust-absorbing method instead of the dust suction method, the dust generated during polishing is caught in the mesh formed with a very small size, Of course, it is not easy to remove the dust adhered to the mesh.
본 발명은 상기와 같은 종래의 문제점을 감안하여 안출된 것으로, 본 발명의 목적은 분진 흡입방식 외에도 일반 연마패드나 벨트형 연마패드로도 사용할 수 있으며, 연마시 발생한 분진을 연마면으로부터 신속하게 제거함으로써 연마성능을 높일 수 있으며, 장시간 반복 사용이 가능한 개선된 구조의 연마패드를 제공하는 데 있다.SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems, and it is an object of the present invention to provide a polishing pad which can be used not only as a dust suction method but also as a general polishing pad or a belt- To thereby improve the polishing performance, and to provide an improved polishing pad capable of repeated use for a long time.
상기한 목적을 달성하기 위하여 본 발명의 일 실시 예에서는 섬유사가 망상으로 직조되되 섬유사가 치밀하게 직조되어 납작한 면을 형성하는 면부 및 이 면부 사이에 형성되는 그물눈을 갖는 트리코트 메시 패브릭(tricot mesh fabric)과, 이 트리코트 메시 패브릭 일측면의 납작한 면부에 연마사가 접착제로 부착되는 연마사층과, 상기 트리코트 메시 패브릭 타측면에 부착되는 벨크로 직물을 포함하여 이루어져 전동공구(샌더)의 연마패드 홀더 표면에 형성된 고리 형태의 수 벨크로에 분리가능하게 부착되어 사용되는 연마패드를 제공한다.In order to accomplish the above object, according to an embodiment of the present invention, a fiber yarn is woven into a net shape, the fiber yarn is densely woven to form a flat surface, and a tricot mesh fabric And a Velcro fabric adhered to the other side of the tricot mesh fabric so as to be attached to the abrasive pad holder surface of the power tool (sander) The present invention provides a polishing pad detachably attached to a male-type male velcro formed on a polishing pad.
본 발명의 바람직한 실시 예에서 상기 트리코트 메시 패브릭 일측면의 납작한 면부에는 연마사와의 접착력 향상을 위한 에폭시 코팅층이 형성된 후 연마사가 접착되며, 연마사층의 표면에는 페놀수지로 이루어진 탑 코팅층과 스테아린산칼슘으로 이루어진 방오성 코팅층이 형성된다.In a preferred embodiment of the present invention, an epoxy coating layer is formed on the flat surface of the tricot mesh fabric at one side of the tricot mesh fabric to improve adhesion to the polishing cloth, and then a polishing sheet is adhered to the surface of the polishing cloth. A top coating layer made of a phenol resin and calcium stearate An antifouling coating layer is formed.
본 발명의 다른 실시 예에서는 섬유사가 망상으로 직조되되 섬유사가 치밀하게 직조되어 납작한 면을 형성하는 면부 및 이 면부 사이에 형성되는 그물눈을 갖는 트리코트 메시 패브릭(tricot mesh fabric)과, 이 트리코트 메시 패브릭 양측면의 납작한 면부에 연마사가 접착제로 부착되는 연마사층으로 이루어지는 양면형 연마패드를 제공한다.According to another embodiment of the present invention, there is provided a tricot mesh fabric in which a fiber yarn is woven in a net shape, the fiber yarn is woven densely to form a flat surface and a mesh formed between the surface portion and the tricot mesh fabric, There is provided a double-sided polishing pad comprising a polishing layer on which flat surfaces on both sides of a fabric are adhered with a polishing agent by an adhesive.
본 발명의 연마패드는 기재인 트리코트 메시 패브릭의 납작하고 넓은 면부에 연마사가 부착되므로 부착력이 우수하여 연마사가 쉽게 떨어지지 않는 내구성이 우수한 연마패드를 제공할 수 있으며, 상기 면부는 연마패드의 전체 면적에 대하여 50% 이상의 면적을 형성하게 되므로 연마성능도 우수하며, 연마시 발생한 분진은 트리코트 메시 패브릭 자체에 형성된 비교적 깊고 넓은 면적을 갖는 그물눈을 통해 외부의 분진흡입장치에 수거되거나 포켓 형태의 그물눈 자체에 머물게 되므로 연마면에서 분진이 체류하지 않아 연마성능이 우수하며, 연마 후 그물눈에서 분진을 쉽게 제거할 수 있으므로 연마패드의 반복 사용이 가능한 등의 우수한 효과를 갖는다.The polishing pad of the present invention can provide a polishing pad having excellent abrasion resistance and excellent durability because the abrasive yarn is excellent in adhesion strength because the abrasive yarn is attached to the wide and wide surface of the tricot mesh fabric of the base material. The dust generated during polishing is collected in an external dust suction device through a mesh having a relatively deep and large area formed in the tricot mesh fabric itself or is collected in a pocket- The dust is not retained on the polishing surface and the polishing performance is excellent. Since the dust can be easily removed from the mesh after polishing, the polishing pad can be used repeatedly.
도 1은 본 발명의 일 실시 예에 의한 연마패드의 사시도 및 부분 확대도,1 is a perspective view and a partially enlarged view of a polishing pad according to an embodiment of the present invention,
도 2는 본 발명의 일 실시 예에 의한 연마패드의 요부 확대 사시도,FIG. 2 is an enlarged perspective view of a polishing pad according to an embodiment of the present invention, FIG.
도 3은 본 발명의 연마패드에 사용된 기재인 트리코트 메시 패브릭의 현미경사진,Figure 3 is a micrograph of a tricot mesh fabric, a substrate used in the polishing pad of the present invention,
도 4는 본 발명의 연마패드 적층구조를 도시한 단면도,4 is a cross-sectional view showing the polishing pad laminated structure of the present invention,
도 5는 본 발명의 다른 실시 예에 의한 연마패드 적층구조를 도시한 단면도,5 is a sectional view showing a polishing pad laminated structure according to another embodiment of the present invention,
도 6은 본 발명에 의한 연마패드의 실물 현미경사진이다.6 is a photomicrograph of a polishing pad according to the present invention.
도 1 내지 도 4는 본 발명의 일 실시 예에 의한 연마패드를 도시한 도면 및 실물사진으로, 본 실시 예에 의한 연마패드(1)는 섬유사가 망상으로 직조되되 섬유사가 치밀하게 직조되어 납작한 면을 형성하는 면부(12) 및 이 면부(12) 사이에 형성되는 그물눈(14)을 갖는 트리코트 메시 패브릭(tricot mesh fabric; 10)과, 이 트리코트 메시 패브릭(10) 일측면의 납작한 면부에 연마사가 접착제로 부착되는 연마사층(20)과, 상기 트리코트 메시 패브릭(10) 타측면에 부착되는 벨크로 직물로 이루어진 상부층(30)을 포함하여 이루어져 있다.1 to 4 are views showing a polishing pad according to an embodiment of the present invention and actual photographs. In the polishing pad 1 according to the present embodiment, a fiber yarn is woven in a net shape, And a tricot mesh fabric 10 having a mesh 14 formed between the surface portion 12 and the surface portion 12. The tricot mesh fabric 10 has a flat surface portion on one side of the tricot mesh fabric 10, A polishing layer 20 to which an abrasive yarn is adhered and an upper layer 30 made of a velcro fabric adhered to the other side of the tricot mesh fabric 10.
본 실시 예의 연마패드(1)에서 공지의 벨크로 직물로 이루어진 상부층(30; 통상, 루프형의 암 벨크로를 의미)은 도시 안 된 전동공구의 연마패드 홀더 표면에 형성된 고리 형태의 수 벨크로에 분리가능하게 부착되어 사용된다.An upper layer 30 (generally referred to as a loop type arm velcro) 30 made of a known velcro fabric in the polishing pad 1 of this embodiment is detachably attachable to an annular male Velcro formed on the surface of a polishing pad holder of a power tool .
한편, 본 발명에서 상기 상부층은 벨크로 직물에만 한정되는 것이 아니며, 이외에도 연마사가 부착된 기재(트리코트 메시 패브릭)의 상면에 내구성을 갖는 직물이나 합성수지 시트 또는 접착/비접착식의 종이를 부착하여 길다란 띠 형태로 재단하여 벨트형 연마패드로 사용하거나 일반 샌드페이퍼 형태의 연마패드로도 제작할 수 있음은 물론이며, 이와 같은 변형 또한 이하에 기재되는 본 발명의 권리범위에 속함은 자명하다.In the present invention, the upper layer is not limited to the velcro fabric. In addition, a durable fabric, a synthetic resin sheet, or an adhesive / non-adhesive paper may be attached to the upper surface of a substrate (tricot mesh fabric) It should be understood that the present invention is not limited to the above-described embodiments, and various modifications may be made without departing from the scope of the present invention.
본 실시 예에서 상기 트리코트 메시 패브릭(10)은 통풍성을 필요로 하는 스포츠 의류의 내피 등으로 사용되는 공지된 직물인데, 그 직조형태는 도 3의 현미경사진에서 알 수 있는 바와 같이 천연 또는 합성 섬유사가 치밀하게 직조되어 납작하고 폭이 넓은 면(최소 1mm~최대 3mm의 폭)을 형성하는 면부(12) 및 이 면부(12) 사이에 독립적으로 형성되는 타원형의 그물눈(14)을 갖고 있으며, 이 그물눈(14)의 크기도 직경이 약 1~3mm정도로 매우 크게 형성되어 있다.In the present embodiment, the tricot mesh fabric 10 is a known fabric used as an inner skin of a sports garment requiring air permeability. The woven shape of the tricot mesh fabric 10 may be natural or synthetic fibers (12) forming a flat and wide surface (a width of at least 1 mm to a maximum of 3 mm) and an elliptical mesh (14) formed independently between the surface portions (12) The size of the mesh 14 is also very large, about 1 to 3 mm in diameter.
바람직하기에 상기 면부(12)는 전체 면적에 대하여 50% 이상의 면적을 차지하도록 직조되는 것이 바람직하며, 이에 의해 면부에 부착되는 연마사층이 형성하는 실제 연마면적이 연마패드의 전체 면적에 대하여 50% 이상을 차지하도록 함으로써 연마성능을 제고할 수 있다.Preferably, the surface portion 12 is woven so as to occupy an area of 50% or more with respect to the total area, so that the actual polishing area formed by the polishing layer attached to the surface portion is 50% Or more, so that the polishing performance can be improved.
본 발명에서 상기 트리코트 메시 패브릭의 직조형태는 첨부된 도면에만 한정되지 않으며, 그물눈(14)의 크기 또한 다양하게 직조하여 사용할 수 있음은 물론이다.In the present invention, the weave pattern of the tricot mesh fabric is not limited to the drawings, and the mesh 14 may be woven in various sizes.
또한, 본 실시 예에서 상기 트리코트 메시 패브릭(10)은 직조 두께가 약 0.3mm~0.5mm 정도이므로 상기 그물눈(14)의 깊이도 최소 0.3mm~0.5mm를 형성하게 되며, 트리코트 메시 패브릭(10) 일측면의 면부(12)에 연마사가 접착제로 부착되어 연마사층(20)을 형성하고, 이 연마사층(20) 위에 탑 코팅층이 더 형성되므로 그물눈(14)의 깊이는 이보다 더 깊어지게 되어 그물눈(14)의 용적이 증가하게 되는 것이며, 이에 의해 연마중 발생한 분진을 그물눈(14)에서 충분히 흡수하거나 수용할 수 있다.In this embodiment, the tricot mesh fabric 10 has a thickness of about 0.3 mm to 0.5 mm, so that the depth of the mesh 14 is at least 0.3 mm to 0.5 mm. The tricot mesh fabric The polishing cloth is adhered to the surface portion 12 of one side surface of the polishing cloth 10 by an adhesive to form a polishing cloth layer 20 and a top coating layer is further formed on the polishing cloth layer 20 so that the depth of the mesh cloth 14 becomes deeper The volume of the mesh 14 increases, whereby the dust 14 generated during polishing can be sufficiently absorbed or accommodated in the mesh 14.
본 발명의 첫 번째 장점은 트리코트 메시 패브릭(10)의 면부(12)에 연마사가 전체적으로 부착되므로 기존의 망체를 기재로 하는 연마패드에서는 가느다란 섬유 가닥의 외측에 연마사가 부착되어 연마작업시 연마사가 받게 되는 마찰력에 의해 결합상태가 쉽게 와해되던 것과는 달리, 본 발명은 연마사가 넓은 면을 형성하고 있는 면부(12)에 안정적으로 부착되어 있으므로 견고한 연마사층을 형성하며 실제 연마작업시 연마사가 쉽게 떨어지지 않는 것이며, 이에 의해 연마패드의 내구성이 향상된 점에 있다.The first advantage of the present invention is that since the polishing yarn is entirely attached to the face portion 12 of the tricot mesh fabric 10, the polishing pad having the conventional net-like base is provided with a polishing yarn on the outside of the thin fiber strands, The present invention is advantageous in that since the abrasive yarn is stably attached to the surface portion 12 forming the wide surface, the abrasive yarn is easily separated from the abrasive yarn during the actual abrading operation And the durability of the polishing pad is thereby improved.
또, 본 발명의 또 다른 장점은 연마사가 부착된 면이 전체 연마패드의 면적에 대하여 50% 이상을 차지하도록 함으로써 실제 연마패드의 연마성능을 제고할 수 있어 연마작업에 소요되는 시간을 단축할 수 있는 데 있다. Another advantage of the present invention is that the polishing surface of the actual polishing pad can be improved by allowing the surface with the polishing yarn to occupy 50% or more of the area of the entire polishing pad, thereby shortening the time required for the polishing operation There is.
본 발명의 추가적인 장점은 상기 그물눈(14)의 크기가 본 출원인의 대한민국 실용신안등록 제436999호의 망체의 경우 망체를 이루는 섬유사와 섬유사 사이의 간격이 조밀하여 그물눈의 크기가 상당히 작아 이 그물눈의 용적이 작고 분진이 끼인 경우 쉽게 빠지지 않게 되므로 연마성능이 급속하게 저하되고 반복 사용이 어려웠던 문제점이 있었던 반면, 본 발명은 그물눈(14)의 크기가 상대적으로 커서 위에서 설명한 바와 같이 용적도 넓을 뿐만 아니라 연마작업시 그물눈을 통해서 외부의 분진흡입장치로 용이하게 배출됨은 물론 흡입방식이 아닌 연마패드로 사용될 경우에는 이 그물눈에 끼였던 분진을 쉽게 털어낼 수 있다는 점에 있다.A further advantage of the present invention is that the size of the mesh 14 is smaller than that of the net of the Korean Utility Model Registration No. 436999 of the present applicant, The grinding performance is rapidly deteriorated and repeated use is difficult. On the other hand, in the present invention, since the size of the mesh 14 is relatively large, the volume is large as described above, The dust can easily be discharged to the external dust suction device through the mesh of the time, and the dust adhered to the mesh can be easily removed when it is used as a polishing pad instead of the suction type.
따라서, 본 발명은 연마성능의 향상은 물론 연마시 분진이 비산되는 것을 최소화할 수 있으며, 반복적으로 재사용이 가능한 장점을 갖는다.Accordingly, the present invention can minimize the scattering of dust during polishing as well as improve the polishing performance, and has the advantage that it can be reused repeatedly.
상기 연마사의 부착방법은 본 출원인의 대한민국 실용신안등록 제436999호에 기재된 방법과 동일한데, 이는 기재인 트리코트 메시 패브릭(10)의 면부(12)에 접착력의 향상을 위한 에폭시코팅층을 형성하고 접착제를 도포한 후 접착하는 것이 바람직하며, 연마사층 위에는 페놀수지로 이루어진 탑 코팅층을 형성하고, 여기에 추가하여 탑 코팅층 위에 스테아린산칼슘으로 이루어진 방오성 코팅층을 더 형성하는 것이 바람직하다.The method of attaching the abrasive yarn is the same as the method described in Korean Utility Model Registration No. 436999 of the applicant of the present invention. This is because the epoxy coating layer for improving the adhesive strength is formed on the surface portion 12 of the tricot mesh fabric 10, It is preferable that a top coat layer made of a phenol resin is formed on the polishing layer and an antifouling coating layer made of calcium stearate is further formed on the top coat layer.
도 5는 본 발명의 다른 실시 예를 도시한 것으로, 본 실시 예에서는 양면형의 연마패드가 개시되는바, 이는 섬유사가 망상으로 직조되되 섬유사가 치밀하게 직조되어 납작한 면을 형성하는 면부(12) 및 이 면부(12) 사이에 형성되는 그물눈(14)을 갖는 트리코트 메시 패브릭(tricot mesh fabric; 10)과, 이 트리코트 메시 패브릭(10) 상하 양측면의 납작한 면부에 연마사가 접착제로 부착되는 연마사층(20)으로 이루어져 있다.FIG. 5 illustrates another embodiment of the present invention. In this embodiment, a double-sided polishing pad is disclosed, which comprises a face 12, which is woven into a net shape and in which a fiber yarn is tightly woven to form a flat face, And a tricot mesh fabric (10) having a mesh (14) formed between the surface portions (12) of the tricot mesh fabric (10) (20).
본 실시 예에서 상기 연마사층의 형성은 상술한 첫 번째 실시 예의 형성방법과 동일하므로 이에 대한 중복되는 설명은 생략한다.In this embodiment, the formation of the abrasive quartz is the same as the formation of the first embodiment described above, so that a detailed description thereof will be omitted.
본 실시 예에 의한 양면형 연마패드는 기재인 트리코트 메시 패브릭(10)의 상하 양면에 연마사층(20)이 형성되어 상면과 하면을 모두 연마작업에 사용함으로써 최소의 비용으로 최대의 연마작업이 가능하게 되며, 이와 같은 양면형 연마패드는 클립 타입으로 연마패드를 장착하는 연마공구나 수작업용으로 사용하기에 적합하다.In the double-sided polishing pad according to the present embodiment, the polishing cloth 20 is formed on both the upper and lower surfaces of the tricot mesh fabric 10 serving as a base material, so that the upper and lower surfaces are all used for polishing, Such a double-sided polishing pad is suitable for use as an abrasive tool or a waterproofing work for mounting a polishing pad in a clip type.
도 6은 트리코트 메시 패브릭 위의 그물눈(14)을 제외한 면부(12) 위에 연마사가 부착된 실물 연마패드를 확대하여 촬영한 사진으로, 연마사층(20)의 표면이 거칠게 형성되어 있음을 보여주고 있으며, 이 연마사층(20)의 표면 거칠기는 부착되는 연마사의 입자크기를 선택하는 것에 의해 다양하게 조절할 수 있다.FIG. 6 is an enlarged photograph of a real polishing pad on which a polishing yarn is attached on a surface portion 12 excluding the mesh 14 on the tricot mesh fabric, showing that the surface of the polishing multilayer 20 is roughly formed And the surface roughness of the abrasive quartz layer 20 can be variously adjusted by selecting the particle size of the abrasive yarn to be attached.

Claims (4)

  1. 섬유사가 망상으로 직조되되 섬유사가 치밀하게 직조되어 납작한 면을 형성하는 면부(12) 및 이 면부(12) 사이에 형성되는 그물눈(14)을 갖는 트리코트 메시 패브릭(tricot mesh fabric; 10)과, 이 트리코트 메시 패브릭(10) 일측면의 납작한 면부에 연마사가 접착제로 부착되는 연마사층(20)과, 상기 트리코트 메시 패브릭(10) 타측면에 부착되는 상부층(30)을 포함하여 이루어지는 것을 특징으로 하는 트리코트 메시 패브릭을 기재로 하는 연마패드.A tricot mesh fabric (10) having a mesh portion (12) and a mesh portion (14) formed between the mesh portion (12) and the mesh portion (12) A polishing layer 20 on which an abrasive yarn is adhered to a flat surface portion of one side of the tricot mesh fabric 10 and an upper layer 30 attached to the other side of the tricot mesh fabric 10 Wherein the abrasive pad is a tricot mesh fabric.
  2. 청구항 1에 있어서,The method according to claim 1,
    상기 상부층(30)은 직물이나 합성수지 시트 또는 접착식이나 비접착식 종이 중에서 선택되는 것을 특징으로 하는 트리코트 메시 패브릭을 기재로 하는 연마패드.Wherein the top layer (30) is selected from a fabric, a synthetic resin sheet, or an adhesive or non-adhesive paper.
  3. 청구항 2에 있어서,The method of claim 2,
    상기 상부층(30)은 벨크로 직물인 것을 특징으로 하는 트리코트 메시 패브릭을 기재로 하는 연마패드.Wherein the top layer (30) is a velcro fabric.
  4. 섬유사가 망상으로 직조되되 섬유사가 치밀하게 직조되어 납작한 면을 형성하는 면부(12) 및 이 면부(12) 사이에 형성되는 그물눈(14)을 갖는 트리코트 메시 패브릭(tricot mesh fabric; 10)과, 이 트리코트 메시 패브릭(10) 상하 양측면의 납작한 면부에 연마사가 접착제로 부착되는 연마사층(20)을 포함하여 이루어지는 것을 특징으로 하는 트리코트 메시 패브릭을 기재로 하는 연마패드.A tricot mesh fabric (10) having a mesh portion (12) and a mesh portion (14) formed between the mesh portion (12) and the mesh portion (12) And a polishing layer (20) on which the polishing cloth is adhered to the flat surface portions of both upper and lower sides of the tricot mesh fabric (10) with an adhesive.
PCT/KR2009/005130 2008-10-10 2009-09-10 Polishing pad having a tricot mesh fabric as a base WO2010041822A2 (en)

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US13/122,956 US20110195646A1 (en) 2008-10-10 2009-09-10 Polishing pad having a tricot mesh faberic as a base
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EP09819329A EP2340915A2 (en) 2008-10-10 2009-09-10 Polishing pad having a tricot mesh fabric as a base

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KR2020080013538U KR200448556Y1 (en) 2008-10-10 2008-10-10 A grinding pad using tricot mesh fabric as basement

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US9522454B2 (en) * 2012-12-17 2016-12-20 Seagate Technology Llc Method of patterning a lapping plate, and patterned lapping plates
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US10145869B2 (en) 2014-12-22 2018-12-04 Battelle Memorial Institute Remote leak and failure detection of electrical water heaters through temperature and power monitoring
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JP2004291180A (en) * 2003-03-27 2004-10-21 Riken Corundum Co Ltd Coated abrasive, and method and apparatus for manufacturing the same
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CN102186629A (en) 2011-09-14

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