WO2010041822A3 - Polishing pad having a tricot mesh fabric as a base - Google Patents

Polishing pad having a tricot mesh fabric as a base Download PDF

Info

Publication number
WO2010041822A3
WO2010041822A3 PCT/KR2009/005130 KR2009005130W WO2010041822A3 WO 2010041822 A3 WO2010041822 A3 WO 2010041822A3 KR 2009005130 W KR2009005130 W KR 2009005130W WO 2010041822 A3 WO2010041822 A3 WO 2010041822A3
Authority
WO
WIPO (PCT)
Prior art keywords
polishing pad
polishing
mesh fabric
present
tricot mesh
Prior art date
Application number
PCT/KR2009/005130
Other languages
French (fr)
Korean (ko)
Other versions
WO2010041822A4 (en
WO2010041822A2 (en
Inventor
김명묵
Original Assignee
Kim Myung Mook
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kim Myung Mook filed Critical Kim Myung Mook
Priority to EP09819329A priority Critical patent/EP2340915A2/en
Priority to US13/122,956 priority patent/US20110195646A1/en
Priority to CN2009801403878A priority patent/CN102186629A/en
Publication of WO2010041822A2 publication Critical patent/WO2010041822A2/en
Publication of WO2010041822A3 publication Critical patent/WO2010041822A3/en
Publication of WO2010041822A4 publication Critical patent/WO2010041822A4/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/02—Backings, e.g. foils, webs, mesh fabrics

Abstract

The present invention relates to a polishing pad having a base knitted into a net with meshes for absorbing and discharging dust generated during polishing to an external dust suction device or for storing the dust in a pocket system, thereby improving polishing efficiency. The polishing pad of the present invention is provided with polishing powder firmly bonded onto one side of the base formed into a wide area to improve the durability of the polishing pad. The polishing pad according to one embodiment of the present invention comprises a tricot mesh fabric (10) having plane portions (12) formed by densely knitting fiber yarns into a net and meshes (14) formed between the plane portions (12), a polishing powder layer (20) formed by bonding polishing powder to the plane portions at one side of the tricot mesh fabric (10) with an adhesive, and an upper layer (30) made of Velcro fabric and attached to the other side of the tricot mesh fabric (10). The polishing pad of the present invention is detachably fastened to the male hook Velcro formed at the surface of a polishing pad holder of an electric power tool (sander).
PCT/KR2009/005130 2008-10-10 2009-09-10 Polishing pad having a tricot mesh fabric as a base WO2010041822A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP09819329A EP2340915A2 (en) 2008-10-10 2009-09-10 Polishing pad having a tricot mesh fabric as a base
US13/122,956 US20110195646A1 (en) 2008-10-10 2009-09-10 Polishing pad having a tricot mesh faberic as a base
CN2009801403878A CN102186629A (en) 2008-10-10 2009-09-10 Polishing pad having a tricot mesh fabric as a base

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20-2008-0013538 2008-10-10
KR2020080013538U KR200448556Y1 (en) 2008-10-10 2008-10-10 A grinding pad using tricot mesh fabric as basement

Publications (3)

Publication Number Publication Date
WO2010041822A2 WO2010041822A2 (en) 2010-04-15
WO2010041822A3 true WO2010041822A3 (en) 2010-07-01
WO2010041822A4 WO2010041822A4 (en) 2010-08-19

Family

ID=42101051

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2009/005130 WO2010041822A2 (en) 2008-10-10 2009-09-10 Polishing pad having a tricot mesh fabric as a base

Country Status (4)

Country Link
US (1) US20110195646A1 (en)
KR (1) KR200448556Y1 (en)
CN (1) CN102186629A (en)
WO (1) WO2010041822A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9522454B2 (en) * 2012-12-17 2016-12-20 Seagate Technology Llc Method of patterning a lapping plate, and patterned lapping plates
US20150335356A1 (en) * 2014-05-22 2015-11-26 Rodge Brooks Skin Treatment Apparatus
US10145869B2 (en) 2014-12-22 2018-12-04 Battelle Memorial Institute Remote leak and failure detection of electrical water heaters through temperature and power monitoring
JP7245493B2 (en) * 2018-11-14 2023-03-24 国立大学法人九州工業大学 Polishing equipment
CN114454101A (en) * 2022-03-03 2022-05-10 徐占文 Polishing wheel and manufacturing method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004291180A (en) * 2003-03-27 2004-10-21 Riken Corundum Co Ltd Coated abrasive, and method and apparatus for manufacturing the same
KR100581614B1 (en) * 2004-12-23 2006-05-23 주식회사 썬텍인더스트리 Precision abrasive cleaning tape
KR200436999Y1 (en) * 2006-11-23 2007-10-23 김명묵 A grinding pad using net at basement

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100809874B1 (en) * 2006-03-23 2008-03-06 엠.씨.케이 (주) Polishing pad utilized netting thread

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004291180A (en) * 2003-03-27 2004-10-21 Riken Corundum Co Ltd Coated abrasive, and method and apparatus for manufacturing the same
KR100581614B1 (en) * 2004-12-23 2006-05-23 주식회사 썬텍인더스트리 Precision abrasive cleaning tape
KR200436999Y1 (en) * 2006-11-23 2007-10-23 김명묵 A grinding pad using net at basement

Also Published As

Publication number Publication date
CN102186629A (en) 2011-09-14
KR200448556Y1 (en) 2010-04-21
WO2010041822A4 (en) 2010-08-19
WO2010041822A2 (en) 2010-04-15
KR20100004087U (en) 2010-04-20
US20110195646A1 (en) 2011-08-11

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