WO2010038344A1 - Dispositif d'alimentation en gaz - Google Patents

Dispositif d'alimentation en gaz Download PDF

Info

Publication number
WO2010038344A1
WO2010038344A1 PCT/JP2009/003585 JP2009003585W WO2010038344A1 WO 2010038344 A1 WO2010038344 A1 WO 2010038344A1 JP 2009003585 W JP2009003585 W JP 2009003585W WO 2010038344 A1 WO2010038344 A1 WO 2010038344A1
Authority
WO
WIPO (PCT)
Prior art keywords
flow path
valve
flow
block
gas supply
Prior art date
Application number
PCT/JP2009/003585
Other languages
English (en)
Japanese (ja)
Inventor
守谷修司
Original Assignee
東京エレクトロン株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 東京エレクトロン株式会社 filed Critical 東京エレクトロン株式会社
Publication of WO2010038344A1 publication Critical patent/WO2010038344A1/fr

Links

Images

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K27/00—Construction of housing; Use of materials therefor
    • F16K27/003—Housing formed from a plurality of the same valve elements

Definitions

  • the present invention relates to a gas supply apparatus that supplies process gas, purge gas, and the like used in a semiconductor manufacturing process.
  • Semiconductor manufacturing apparatuses such as a dry etching apparatus and a CVD (Chemical Vapor Deposition) apparatus are provided with a gas supply device.
  • the gas supply apparatus supplies a process gas necessary for a semiconductor manufacturing process such as etching and chemical vapor deposition to the semiconductor manufacturing apparatus, and the semiconductor manufacturing apparatus executes a semiconductor manufacturing process such as etching and chemical vapor deposition using the process gas.
  • the gas supply device exhausts the process gas having corrosivity and toxicity by supplying a purge gas such as nitrogen gas to the semiconductor manufacturing apparatus.
  • FIG. 6 is a side view schematically showing a configuration of a conventional gas supply device.
  • a pre-filter 104 In the gas supply device, a pre-filter 104, a manual valve 105, a pressure regulating valve 106, a pressure detecting device 107, a check valve 108, a three-way valve 109, and a mass flow controller 110 are arranged in order from the upstream side (left side in the figure).
  • a process gas supply line is provided.
  • the manual valve 105, the pressure adjustment valve 106, the pressure detection device 107, the three-way valve 109, and the mass flow controller 110 are each unitized, and each unit is connected to each other by a plurality of joint blocks 2a to 2f that also serve as support legs. ing. V-shaped flow paths are formed inside the joint blocks 2a to 2f, and the adjacent units communicate with each other through the flow paths.
  • the process gas supplied through the most upstream prefilter 104 is regulated by the pressure adjustment valve 106 when the manual valve 105 is opened, and the pressure detection device 107 is controlled. Then, the three-way valve 109 is reached, and the three-way valve 109 is sent to the semiconductor manufacturing apparatus (not shown) from the joint 2f provided on the most downstream side via the mass flow controller 110. Further, by switching the three-way valve 109, the purge gas that has reached the three-way valve 109 from a purge gas supply line (not shown) is sent to the semiconductor manufacturing apparatus via the mass flow controller 110.
  • Patent Document 1 discloses a gas supply device that includes a flow channel block in which joint blocks 2a to 2f shown in FIG. 6 are integrally formed and in which various valve devices are mounted on the flow channel block. According to Patent Document 1, the gas supply device can be reduced in size and weight.
  • the gas supply device according to Patent Document 1 has a configuration in which various unitized valve devices are mounted on the flow path block, there is still a waste of components at the connection between the valve device and the flow path block. It has occurred. That is, the valve device has to include an inflow path and an outflow path for drawing the gas flowing through the flow path block into the valve apparatus.
  • An object of the present invention is to provide a gas supply device that eliminates a component for drawing gas from a flow path block into a valve device and can be made smaller and lighter than a conventional device.
  • a gas supply device includes a flow path block in which a gas flow path is formed, and a plurality of valve devices that open and close the flow path by seating or retracting a valve body with respect to the valve seat.
  • the gas supply apparatus is provided with a plurality of the valve devices in the flow path block, and the valve seat is provided in the middle of the flow path.
  • the valve seat is provided in the middle of the flow path formed in the flow path block, and the plurality of valve devices mounted on the flow path block seat the valve body on the valve seat.
  • the channel is opened and closed by being withdrawn. Therefore, the flow of gas flowing through the flow path can be directly controlled. This eliminates the need for a flow path for drawing gas into the valve device mounted on the flow path block.
  • the valve device includes a valve driving member that seats or retracts the valve body with respect to a valve seat, a cylindrical housing that houses the valve driving member, and the housing
  • the flow path block has a female screw threaded into the male thread of the housing body on the inner circumferential surface, and has a housing screw fitting recess that communicates with the flow path. It is characterized by that.
  • the housing of the valve device is screwed into the housing screw fitting recess formed in the flow path block. Therefore, the gas supply device according to the present invention is smaller than the conventional gas supply device in which the valve device is mounted outside the flow path block.
  • the flow path block includes a first flow path block on which the plurality of valve devices are mounted, and a second flow detachably connected to a downstream side of the first flow path block. And a flow rate control device that is mounted on the second flow path block and controls the flow rate of the gas.
  • the first flow path block on which a plurality of valve devices are mounted and the second flow path block on which a flow rate control device is mounted can be separated.
  • the connection part of a 1st flow path block and a 2nd flow path block is open
  • the second flow path block includes a main flow path through which the gas flowing in from the first flow path block flows, a first branch path branched in the middle of the main flow path, In the middle of the main flow path, it is fitted between the second branch path branched from the first branch path downstream and the first and second branch paths of the main flow path.
  • the flow control device detects a flow rate of the gas flowing through the flow pipe and the flow pipe connected to the first branch path and the second branch path.
  • a control valve driving means for moving a control valve for controlling the flow rate of the gas with respect to the main flow path according to a detection result of the flow rate detecting means.
  • gas flows from the first channel block into the main channel of the second channel block.
  • Part of the gas that has flowed into the main flow path flows from the first branch path into the flow pipe of the flow control device, and the gas that has flowed through the flow pipe flows into the main flow path again through the second branch path.
  • the flow rate detection means provided in the flow rate control device detects the flow rate of the gas flowing through the flow pipe, and the control valve drive means moves the control valve relative to the main flow path based on the detection result of the flow rate detection means. Control the flow rate. Since it is configured to directly control the flow rate of the gas flowing through the main flow path, the gas is drawn from the flow path block to the flow rate control device as in the prior art. Compared to the configuration that performs flow control, the number of necessary components is reduced.
  • a gas supply device includes a pressure detection device that is mounted on the flow channel block and includes a detection unit housing that houses a pressure detection unit that detects the pressure of gas flowing through the flow channel.
  • the pressure detection device includes a male screw formed on an outer periphery of the detection unit container, and the flow path block has a female screw on an inner peripheral surface to which the male screw of the detection unit container is screwed. It is characterized by comprising a detecting portion receiving body threaded recess that communicates with the flow path.
  • the detection unit housing of the pressure detection device is screwed into the detection unit housing screw fitting recess formed in the flow path block. Therefore, the gas supply device according to the present invention is smaller than the conventional gas supply device in which the pressure detection device is placed outside the flow path block.
  • the component for drawing gas from the flow path block to the valve device can be eliminated, and the gas supply device can be made smaller and lighter than the conventional gas supply device.
  • FIG. 1 is an exploded side sectional view schematically showing a configuration of a gas supply device according to an embodiment of the present invention
  • FIG. 2 is a side sectional view schematically showing a configuration of the gas supply device.
  • a gas supply apparatus according to an embodiment of the present invention includes a flow path block 1 that constitutes a so-called surface mount type integrated gas supply system, on the downstream side (right side in FIG. 1) of the flow path block 1.
  • Semiconductor device manufacturing apparatuses such as CVD, sputtering apparatus, plasma etching apparatus, etc. (not shown) are connected by piping, and a process gas supply source for supplying process gas is connected by piping on the upstream side of the flow path block 1 (left side in FIG. 1). ing.
  • the flow path block 1 includes, in order from the upstream side, a first flow path block 2 on which a prefilter 4, a manual valve 5, a pressure adjustment valve 6, a pressure detection device 7, a check valve 8 and a three-way valve 9 are mounted,
  • the second flow path block 3 is detachably connected to the downstream side of the one flow path block 2 with a bolt, and the second flow path block 3 includes a mass flow controller (flow rate control device) for controlling the flow rate of gas. 10 is mounted.
  • the manual valve 5, the pressure regulating valve 6, the check valve 8 and the three-way valve 9 constitute a plurality of valve devices.
  • the first flow path block 2 has a substantially rectangular parallelepiped shape, a substantially rectangular installation surface to be installed, a front side and a back side on the long side of the installation surface, and an upstream side surface provided on the short side of the installation surface And a downstream side surface portion and an upper surface portion substantially parallel to the installation surface.
  • the first flow path block 2 has a housing screw fitting recess 21 having a circular shape in plan view with an internal thread 21a formed on the inner peripheral surface, and the manual valve 5 is screwed into the container screw fitting recess 21. ing.
  • the pressure adjusting valve 6 is screwed into a housing screw fitting recess 22
  • the pressure detection device 7 is screwed into a housing screw fitting recess (detecting part housing screw fitting recess) 23
  • a container screw fitting recess 24 for screwing the check valve 8 and a container screw fitting recess 25 for screwing the three-way valve 9 are juxtaposed in this order downstream from the container screw fitting recess 21 on the upper surface portion.
  • Internal threads 22a, 23a, 24a, 25a are formed on the inner peripheral surfaces of the respective housing screw fitting recesses 22, 23, 24, 25, and the pressure regulating valve 6, the pressure detecting device 7, the check valve 8 and three-way Each valve 9 is screwed.
  • An input port for allowing process gas to flow into the block protrudes from the upstream side surface, and a prefilter 4 is inserted into the input port.
  • a process gas inflow passage 26 a that allows the process gas to flow into the housing screw fitting recess 21 through the input port and the housing screw fitting recess 21.
  • V-shaped flow paths 26b, 26c, 26d, and 26e that connect the adjacent housing screw fitting recesses 21, 22, 23, 24, and 25, a purge gas supply source
  • a purge gas inflow passage 26 f is formed which communicates the container screw fitting recess 25 and allows purge gas to flow into the container screw fitting recess 25.
  • an outlet for allowing process gas or purge gas to flow out from the first flow path block 2 to the second flow path block 3 is formed in the downstream side surface portion.
  • a V-shaped flow path 26g for allowing the process gas or the purge gas to flow out is formed through the outlet and the container screw fitting recess 25.
  • the first flow path block 2 has a bolt insertion concave portion 27 having a substantially T-shape in a plan view or a bottom view in which a bolt head for connection to the second flow path block 3 is inserted from above and below. Is formed.
  • the various channels, recesses, and the like of the first channel block 2 are preferably formed by automatic processing using an NC lathe or the like.
  • FIG. 3 is a side sectional view schematically showing the configuration of the manual valve 5, the check valve 8 and the three-way valve 9 mounted on the first flow path block 2.
  • the manual valve 5 includes a screw mechanism (not shown) and a rod-shaped valve driving member 52 that moves forward and backward by the screw mechanism and a cylindrical container 51 that forms a valve chamber.
  • a male screw 51 a is formed on the outer peripheral surface of the container 51 so as to be screwed into the container screw fitting recess 21.
  • a valve body 52 a is formed at the lower end of the valve drive member 52, and the valve body 52 a is biased upward by a biasing spring 53.
  • the manual valve 5 is provided with an operation unit 56 that applies a driving force to the screw mechanism and moves the valve body 52 a up and down at the upper part of the housing 51.
  • a hole portion in which the process gas inflow passage 26a communicates is formed at the substantially central portion of the bottom surface of the housing screw fitting recess 21, and a valve seat 21b is provided at the periphery of the hole portion.
  • the valve seat 21b is made of Teflon (registered trademark), and is fitted to a step portion formed on the inner peripheral edge of the hole portion.
  • the valve seat 21b can be attached and detached.
  • a V-shaped flow path 26b communicates with the bottom surface of the housing screw fitting recess 21 and outside the valve seat 21b.
  • a diaphragm 55 and a diaphragm presser 54 are fitted in the bottom of the housing screw fitting recess 21.
  • the diaphragm 55 is held by the housing 51 screwed into the housing screw fitting recess 21, and the valve body 52a advanced by the operation of the screw mechanism presses the diaphragm 55 against the valve seat 21b. It is configured to close.
  • the check valve 8 has the same configuration as that of the manual valve 5 and includes a rod-shaped valve drive member 82 that moves back and forth in the vertical direction by a pneumatic actuator and a cylindrical container 81 that forms a valve chamber.
  • a male screw 81 a is formed on the outer peripheral surface of the container 81 so as to be screwed into the container screw fitting recess 24.
  • a valve body 82 a is formed at the lower end of the valve drive member 82, and the valve body 82 a is biased upward by a biasing spring 83.
  • a hole is formed in the substantially central portion of the bottom surface of the housing screw fitting recess 24, and a valve seat 24 b is formed at the periphery of the hole. Is provided.
  • the valve seat 24b has the same configuration as the valve seat 21b, and is fitted to a step portion formed on the inner peripheral edge of the hole portion.
  • a hole portion in which a V-shaped flow path 26e communicates is formed on the bottom surface of the housing screw fitting concave portion 24 and outside the valve seat 24b.
  • a diaphragm 85 and a diaphragm presser 84 are fitted into the bottom of the housing screw fitting recess 24, and the diaphragm 85 is held by a housing 81 screwed into the housing screw fitting recess 24.
  • the three-way valve 9 houses a rod-like valve drive member 92 that moves up and down by a pneumatic actuator and includes a cylindrical housing 91 that constitutes a valve chamber.
  • a male screw 91a is formed on the outer peripheral surface so as to be screwed into the housing screw fitting recess 25.
  • a valve body 92 a is formed at the lower end of the valve drive member 92, and the valve body 92 a is biased upward by a biasing spring 93.
  • a hole portion where the purge gas inflow passage 26f communicates is formed at a substantially central portion of the bottom surface of the housing screw fitting recess 25, and a valve seat 25b is provided at the periphery of the hole portion.
  • the valve seat 25b has the same configuration as the valve seat 21b, and is fitted to a step portion formed on the inner peripheral edge of the hole portion.
  • holes that communicate with the V-shaped channels 26e and 26g are formed on the bottom surface of the housing screw fitting recess 25 and on the outer side of the valve seat 25b.
  • a diaphragm 95 and a diaphragm presser 94 are fitted into the bottom of the housing screw fitting recess 25, and the diaphragm 95 is held by a housing 91 that is screwed into the housing screw fitting recess 25.
  • the check valve 8 When the check valve 8 is closed, that is, when the valve body 82a is retracted upward, the V-shaped flow paths 26e, 26g and the purge gas inflow path 26f are in communication, and the purge gas in the purge gas inflow path 26f enters the container 91. be introduced. Since the check valve 8 is in the closed state, the purge gas introduced into the container 91 does not flow backward to the upstream side but is supplied to the downstream side through the V-shaped flow path 26g.
  • FIG. 4 is a side sectional view schematically showing the configuration of the pressure regulating valve 6 mounted on the first flow path block 2.
  • the pressure regulating valve 6 includes a cylindrical upper housing body 62 and a lower housing body 61 that house a valve driving member 65 that moves up and down by a screw mechanism, and a biasing spring 64 that biases the valve driving member 65 upward.
  • a columnar operation portion 63 provided on the upper portion of the upper container 62.
  • the operating portion 63 has a cylindrical member 63a having a male screw on its outer peripheral surface and projects downward, and is screwed into a female screw 62a formed on the inner peripheral surface of the upper housing 62 to constitute a screw mechanism. .
  • the lower housing 61 has a step portion formed on the inner peripheral surface of the upper end, and a diaphragm 67 and a diaphragm presser 66 are internally fitted so as to divide the valve chamber into upper and lower portions, and are locked to the step portion. .
  • the upper housing body 62 and the lower housing body 61 are screwed and fixed by screw portions formed on the outer peripheral surface, and hold the diaphragm 67 and the diaphragm retainer 66.
  • the housing screw fitting recess 22 protrudes upward from the substantially central portion of the bottom surface, and includes a cylindrical protrusion 22c having a valve chamber 22d therein.
  • the cylindrical protruding portion 22c has a stepped portion at the tip, and a valve seat 22b is fitted into the stepped portion, and the pressure adjusting nozzle body 68 is screwed into the tip of the cylindrical protruding portion 22c. Is held by.
  • a valve body 69 seated on or withdraws from the valve seat 22b is disposed, and the valve body 69 is biased upward by a biasing spring 69b.
  • the valve body 69 has a drive rod 69a extending upward from the upper end, and the drive rod 69a is inserted through a hole formed in the valve seat 22b and the nozzle body 68 so as to be able to advance and retract in the vertical direction. Yes.
  • the bottom of the valve chamber 22d communicates with the V-shaped channel 26c.
  • the nozzle body 68 has a hollow, generally cylindrical shape with curved corners, and a hole 68b into which a process gas flows is formed on the side surface.
  • the flow path of the valve seat 22b is enlarged. Further, when the operation portion 63 rotates in the reverse direction and the valve control member 65 is retracted by the screw mechanism, the drive portion 69a and the valve body 69 advance upward, and the flow path of the valve seat 22b is reduced. Thus, the gas pressure is adjusted by enlarging or reducing the flow path of the valve seat 22b.
  • the pressure detection device 7 shown in FIGS. 1 and 2 is, for example, a diaphragm type pressure sensor.
  • the accommodating body 71 of the pressure detecting device 7 accommodates a diaphragm (not shown) that separates the accommodating body 71 in the vertical direction, and the diaphragm is configured to be deformed in the vertical direction according to the pressure of the gas introduced into the accommodating body 71.
  • the container 71 houses a strain gauge that detects deformation of the diaphragm.
  • the strain gauge is a resistor whose electric resistance changes according to the deformation of the diaphragm, and the pressure detection device 7 detects the pressure by detecting the change in the electric resistance of the resistor.
  • FIG. 5 is a schematic diagram showing the configuration of the mass flow controller 10 mounted on the second flow path block 3.
  • the second flow path block 3 has a substantially rectangular parallelepiped shape that is substantially the same shape as the first flow path block 2 in a side view, and includes an installation surface, an upstream side surface portion, a downstream side surface portion, and an upper surface portion.
  • a process gas or purge gas from the first flow path block 2 flows into the second flow path block 3 to form a main flow path 31 that flows therethrough, and further branches upward in the middle of the main flow path 31.
  • a branch forward path 32 and a branch return path 33 branched downstream from the branch forward path 32 are formed.
  • a bypass laminar flow member (rectifying member) 38 that rectifies the process gas or purge gas flowing into the main flow path 31 is fitted between the branch forward path 32 and the branch return path 33 of the main flow path 31.
  • the second flow path block 3 includes a large-diameter concave portion 35 having a circular shape in plan view and a small-diameter concave portion 36 formed on the bottom surface of the large-diameter concave portion 35 on the downstream side of the upper surface portion.
  • the surface and the main flow path 31 communicate with each other through a communication pipe 34.
  • an output port through which the process gas or purge gas flows out projects from the downstream side surface of the second flow path block 3, and the output port and the peripheral surface of the small diameter recess 36 communicate with each other through an outflow path 37. Furthermore, a bolt hole 39 is provided on the upstream side surface of the second flow path block 3, and the first flow path block 2 and the second flow path block 3 are connected and fixed by bolts.
  • the mass flow controller 10 includes a flow pipe 10a connected to the branch forward path 32 and the branch return path 33, a heating resistor 10b wound on the upstream side and the downstream side of the flow pipe 10a, a heating resistor 10b, and a plurality of heating resistors 10b.
  • a bridge circuit 10c configured with electrical resistance and outputting a voltage corresponding to the mass flow rate flowing through the flow pipe 10a, an amplifier circuit 10d for amplifying the voltage output from the bridge circuit 10c, and amplified by the amplifier circuit 10d
  • the comparison control circuit 10e that compares the set voltage and the set voltage and outputs a voltage proportional to the comparison result, and a control valve 10h at the lower end are provided, and the control expands and contracts according to the comparison result of the comparison control circuit 10e.
  • a valve drive member 10f and a valve chamber 10g provided with a control valve 10h are provided.
  • the valve chamber 10g has a columnar outer shape fitted in the large-diameter recess 35.
  • the valve chamber 10g communicates with the communication pipe 34 and the small-diameter recess 36 inside the valve chamber 10g. And the flow path area between the small diameter recessed parts 36 is comprised so that it may change.
  • the heating resistor 10b and the bridge circuit 10c function as flow rate detection means, and the comparison control circuit 10e and the control valve drive member 10f function as control valve drive means.
  • valve seats 21b, 22b, 24b, and 25b which are functional parts of the manual valve 5, the pressure regulating valve 6, the check valve 8, and the three-way valve 9, are passed through the first flow path.
  • the components for drawing gas from the flow path block 1 to various valve devices can be eliminated, and the gas supply device can be made smaller and lighter than the conventional gas supply device.
  • the manufacturing cost of a gas supply apparatus can be reduced by size reduction and weight reduction.
  • the manual valve 5, the pressure adjustment valve 6, the pressure detection device 7, the check valve 8 and the three-way valve 9 are screwed into the first flow path block 2, thereby providing a gas supply as compared with the conventional gas supply device.
  • the apparatus can be further downsized.
  • the first flow path block 2 equipped with the manual valve 5, the pressure regulating valve 6, the pressure detection device 7, the check valve 8 and the three-way valve 9 and the second flow path block 3 equipped with the mass flow controller 10 are attached and detached. Since it is configured, the bypass laminar flow member 38 necessary for the flow rate control can be easily incorporated into the second flow path block 3. Furthermore, when the mass flow controller 10 breaks down, the portion of the mass flow controller 10 can be removed from other valve devices, and maintenance management including the bypass laminar flow member 38 can be easily performed.
  • the configuration provided with the pressure regulating valve is exemplified.
  • the detection result of the pressure detection device is given to the mass flow controller, and the mass flow controller controls the mass flow rate in consideration of the influence of the pressure fluctuation.
  • the pressure regulating valve 6 may be abolished.
  • a mass flow controller incorporating a pressure sensor has also been put into practical use. When the mass flow controller is mounted on the first flow path block, both the pressure adjustment valve and the pressure detection device may be eliminated.
  • the gas supply device may be configured by appropriately changing the valve device provided in the first flow path block by integrating the functions of the valve devices.

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Valve Housings (AREA)

Abstract

L'invention porte sur un dispositif d'alimentation en gaz de dimension et de poids inférieurs à ceux des dispositifs classiques. Un dispositif d'alimentation en gaz comprend : un bloc de trajet d'écoulement (1) dans lequel est formé un trajet de flux d'entrée de gaz traité (26a), des trajets d'écoulement en forme de V (26b, 26c, 26d, 26e, 26g), et un trajet de flux d'entrée de gaz de purge (26f) ; une vanne manuelle (5) pour ouvrir et fermer chacun des trajets d'écoulement en amenant un élément de vanne à être disposé sur un siège de vanne et séparé de celui-ci, une vanne de régulation de pression (6) ; un clapet anti-retour (8) ; et une vanne à trois voies (9). Les dispositifs de vanne sont montés sur le bloc de trajet (1) le long des trajets d'écoulement. Les sièges de vanne (21b, 22b, 24b, 25b) des dispositifs de vanne sont disposés au milieu des trajets d'écoulement respectifs.
PCT/JP2009/003585 2008-09-30 2009-07-29 Dispositif d'alimentation en gaz WO2010038344A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008255083A JP2010084854A (ja) 2008-09-30 2008-09-30 ガス供給装置
JP2008-255083 2008-09-30

Publications (1)

Publication Number Publication Date
WO2010038344A1 true WO2010038344A1 (fr) 2010-04-08

Family

ID=42073133

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2009/003585 WO2010038344A1 (fr) 2008-09-30 2009-07-29 Dispositif d'alimentation en gaz

Country Status (2)

Country Link
JP (1) JP2010084854A (fr)
WO (1) WO2010038344A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI651486B (zh) * 2013-12-05 2019-02-21 Ｃｋｄ股份有限公司 流體供給控制裝置
CN113728187A (zh) * 2019-04-26 2021-11-30 株式会社富士金 流路形成区块以及具备流路形成区块的流体控制装置
US20220199431A1 (en) * 2019-04-15 2022-06-23 Lam Research Corporation Modular-component system for gas delivery

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6404101B2 (ja) * 2013-12-05 2018-10-10 Ckd株式会社 配管継手、流体供給制御装置、及び配管接続構造
JP6186275B2 (ja) * 2013-12-27 2017-08-23 株式会社フジキン 流体制御装置
JP6527684B2 (ja) 2014-10-31 2019-06-05 株式会社フジキン バルブ、流体制御装置、半導体制御装置、および半導体製造方法
KR101604367B1 (ko) 2015-11-04 2016-03-17 주식회사 제이에스티앤랩 제어밸브 교체용 바이패스/블록킹 장치
JP6121039B1 (ja) * 2016-07-22 2017-04-26 大宝製袋株式会社 底ガゼット付き袋体の製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03111914A (ja) * 1989-09-26 1991-05-13 Rintetsuku:Kk 質量流量制御器
JPH05172265A (ja) * 1991-05-31 1993-07-09 Motoyama Seisakusho:Kk ガス制御装置
JPH06193756A (ja) * 1992-12-25 1994-07-15 Tokyo Electron Ltd 流量制御装置
JPH10300000A (ja) * 1997-02-28 1998-11-13 Benkan Corp 集積化ガス制御装置
JPH11351500A (ja) * 1998-06-05 1999-12-24 Hitachi Metals Ltd 集積形流体制御装置
JP2003097752A (ja) * 2002-07-19 2003-04-03 Fujikin Inc 流体制御装置用継手部材およびその製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03111914A (ja) * 1989-09-26 1991-05-13 Rintetsuku:Kk 質量流量制御器
JPH05172265A (ja) * 1991-05-31 1993-07-09 Motoyama Seisakusho:Kk ガス制御装置
JPH06193756A (ja) * 1992-12-25 1994-07-15 Tokyo Electron Ltd 流量制御装置
JPH10300000A (ja) * 1997-02-28 1998-11-13 Benkan Corp 集積化ガス制御装置
JPH11351500A (ja) * 1998-06-05 1999-12-24 Hitachi Metals Ltd 集積形流体制御装置
JP2003097752A (ja) * 2002-07-19 2003-04-03 Fujikin Inc 流体制御装置用継手部材およびその製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI651486B (zh) * 2013-12-05 2019-02-21 Ｃｋｄ股份有限公司 流體供給控制裝置
US20220199431A1 (en) * 2019-04-15 2022-06-23 Lam Research Corporation Modular-component system for gas delivery
US11996301B2 (en) * 2019-04-15 2024-05-28 Lam Research Corporation Modular-component system for gas delivery
CN113728187A (zh) * 2019-04-26 2021-11-30 株式会社富士金 流路形成区块以及具备流路形成区块的流体控制装置

Also Published As

Publication number Publication date
JP2010084854A (ja) 2010-04-15

Similar Documents

Publication Publication Date Title
WO2010038344A1 (fr) Dispositif d'alimentation en gaz
KR101570253B1 (ko) 모듈식 직렬 유체 조절기
TWI386578B (zh) 避免一質量流量控制器涉及一質量流量控制器陣列中之干擾的方法
US6026849A (en) High pressure regulated flow controller
KR102370283B1 (ko) 스로틀 밸브
RU2593420C2 (ru) Взаимозаменяемое клапанное устройство для использования в регуляторах расхода текучей среды
JP5990566B2 (ja) バルブカートリッジを有する背圧調節バルブ
KR101690810B1 (ko) 인-라인 압력 조절기
CA2758978C (fr) Regulateur de pression
KR20140009103A (ko) 모듈식 인라인형 유체조절기
US20210239230A1 (en) Piezoelectric driven valve, pressure-type flow rate control device, and vaporization supply device
JP5399269B2 (ja) 気体膜分離装置の一体型掃気制御装置
CN103711964B (zh) 自对准阀塞
US10683945B2 (en) Compressed natural gas (CNG) pressure regulator
JP2017083981A (ja) 自力式調整弁
US5465750A (en) Two-stage regulator
JP5833722B1 (ja) 自力式調整弁
JP5085404B2 (ja) 流量制御装置
JP7409500B2 (ja) 比抵抗値調整装置及び比抵抗値調整方法
JP7309127B2 (ja) 自動水栓装置
JP3932520B2 (ja) 定流量電磁弁
JPS6151191B2 (fr)
JP4874059B2 (ja) 圧力操作システム
JP6679362B2 (ja) 水栓
JP4644452B2 (ja) ガス供給システム

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 09817388

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 09817388

Country of ref document: EP

Kind code of ref document: A1