WO2009122992A1 - Mémoire magnétorésistive - Google Patents
Mémoire magnétorésistive Download PDFInfo
- Publication number
- WO2009122992A1 WO2009122992A1 PCT/JP2009/056053 JP2009056053W WO2009122992A1 WO 2009122992 A1 WO2009122992 A1 WO 2009122992A1 JP 2009056053 W JP2009056053 W JP 2009056053W WO 2009122992 A1 WO2009122992 A1 WO 2009122992A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- magnetization
- layer
- film
- magnetic layer
- magnetoresistive
- Prior art date
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Classifications
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/14—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements
- G11C11/15—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements using multiple magnetic layers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B61/00—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
- H10B61/20—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors
- H10B61/22—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors of the field-effect transistor [FET] type
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/10—Magnetoresistive devices
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- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Hall/Mr Elements (AREA)
- Mram Or Spin Memory Techniques (AREA)
Abstract
La mémoire magnétorésistive selon l’invention comprend des éléments magnétorésistifs (1). Chaque élément magnétorésistif (1) présente une première couche magnétique (10), une deuxième couche magnétique (20), et une troisième couche magnétique (30). La direction de la magnétisation de la première couche magnétique (10) est fixée dans une première direction. La deuxième couche magnétique (20) est connectée à la première couche magnétique (10) par l'intermédiaire d'une couche non magnétique (41) et présente une première surface (S1) qui est en contact avec la couche non magnétique (41) et une deuxième surface (S2) opposée à la première surface (S1). La troisième couche magnétique (30) est formée sur la deuxième surface (S2) et couplée de manière magnétique à la deuxième couche magnétique (20). La direction de la magnétisation de la troisième couche magnétique (30) est fixée dans une direction différente de celle de la première direction. La direction de la magnétisation de la deuxième couche magnétique (20) est une deuxième direction qui n'est ni parallèle ni antiparallèle à la première direction dans la deuxième surface (S2), et varie à partir de la deuxième direction vers une direction parallèle ou antiparallèle à la première direction à mesure que la distance augmente à partir de la deuxième surface (S2) vers la première surface (S1).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008097049 | 2008-04-03 | ||
JP2008-097049 | 2008-04-03 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009122992A1 true WO2009122992A1 (fr) | 2009-10-08 |
Family
ID=41135372
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2009/056053 WO2009122992A1 (fr) | 2008-04-03 | 2009-03-26 | Mémoire magnétorésistive |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO2009122992A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012146984A (ja) * | 2011-01-13 | 2012-08-02 | Crocus Technology Sa | 分極層を備える磁気トンネル接合 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002261352A (ja) * | 2000-12-07 | 2002-09-13 | Commiss Energ Atom | 記憶機能を有する磁気スピン極性化および磁化回転装置および当該装置を用いた書き込み方法 |
JP2003115621A (ja) * | 2001-10-05 | 2003-04-18 | Canon Inc | トンネル磁気抵抗効果素子およびその作製方法 |
JP2004165441A (ja) * | 2002-11-13 | 2004-06-10 | Toshiba Corp | 磁気抵抗効果素子及び磁気メモリ |
JP2005150303A (ja) * | 2003-11-13 | 2005-06-09 | Toshiba Corp | 磁気抵抗効果素子および磁気メモリ |
JP2008028362A (ja) * | 2006-06-22 | 2008-02-07 | Toshiba Corp | 磁気抵抗素子及び磁気メモリ |
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2009
- 2009-03-26 WO PCT/JP2009/056053 patent/WO2009122992A1/fr active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002261352A (ja) * | 2000-12-07 | 2002-09-13 | Commiss Energ Atom | 記憶機能を有する磁気スピン極性化および磁化回転装置および当該装置を用いた書き込み方法 |
JP2003115621A (ja) * | 2001-10-05 | 2003-04-18 | Canon Inc | トンネル磁気抵抗効果素子およびその作製方法 |
JP2004165441A (ja) * | 2002-11-13 | 2004-06-10 | Toshiba Corp | 磁気抵抗効果素子及び磁気メモリ |
JP2005150303A (ja) * | 2003-11-13 | 2005-06-09 | Toshiba Corp | 磁気抵抗効果素子および磁気メモリ |
JP2008028362A (ja) * | 2006-06-22 | 2008-02-07 | Toshiba Corp | 磁気抵抗素子及び磁気メモリ |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012146984A (ja) * | 2011-01-13 | 2012-08-02 | Crocus Technology Sa | 分極層を備える磁気トンネル接合 |
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