WO2009121337A3 - Formulierung zur generativen herstellung von biokompatiblen, strahlungshärtenden medizintechnischen produkten, insbesondere ohrpassstücken, mit verringerter verfärbung - Google Patents

Formulierung zur generativen herstellung von biokompatiblen, strahlungshärtenden medizintechnischen produkten, insbesondere ohrpassstücken, mit verringerter verfärbung Download PDF

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Publication number
WO2009121337A3
WO2009121337A3 PCT/DE2009/000414 DE2009000414W WO2009121337A3 WO 2009121337 A3 WO2009121337 A3 WO 2009121337A3 DE 2009000414 W DE2009000414 W DE 2009000414W WO 2009121337 A3 WO2009121337 A3 WO 2009121337A3
Authority
WO
WIPO (PCT)
Prior art keywords
formulation
radiation
earpieces
hardening
biocompatible
Prior art date
Application number
PCT/DE2009/000414
Other languages
English (en)
French (fr)
Other versions
WO2009121337A2 (de
Inventor
Martin Klare
Frank Gischer
Original Assignee
Dreve Prodimed Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dreve Prodimed Gmbh filed Critical Dreve Prodimed Gmbh
Publication of WO2009121337A2 publication Critical patent/WO2009121337A2/de
Publication of WO2009121337A3 publication Critical patent/WO2009121337A3/de

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/07—Aldehydes; Ketones
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/067—Polyurethanes; Polyureas
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nanotechnology (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Ceramic Engineering (AREA)
  • Composite Materials (AREA)
  • Inorganic Chemistry (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Dental Preparations (AREA)

Abstract

Strahlungshärtende, biokompatible Formulierung zur generativen Herstellung mittels Stereolithographie von Medizinprodukten, insbesondere Ohrpassstücken, mit verringerter Gelbfärbung der Objekte, bestehend aus einer Formulierung mit: a) mindestens einem oder mehreren Urethanpoly(meth)acrylate, b) mindestens einem oder mehrerer (PoIy)(meth)acrylate, c) mindestens Hydroxycyclohexylphenylketon in einer Konzentration >075 m% und <7,5 m%, und gegebenenfalls eines oder mehrer weiterer für den relevanten Strahlungsbereich nutzbaren Initiatoren, d) mindestens einem oder mehrerer bzw. einer Kombination anaerober und oder aerober Stabilisatoren, e) und mit mindestens einer Konzentration von > 5 m% und <25 m% an oberflächenmodifizierten Nanopartikeln, f) 0,0001-5 m% an Farbpigmenten, g) 0-5 m% an üblichen Additiven wie UV-Stabilisatoren oder Verlaufsadditiven, wobei der Anteil der Komponenten a) bis g) zusammen 100 m% beträgt und die Gesamtformulierung eine Viskosität <10 Pas bei 23°C besitzt.
PCT/DE2009/000414 2008-04-02 2009-04-01 Formulierung zur generativen herstellung von biokompatiblen, strahlungshärtenden medizintechnischen produkten, insbesondere ohrpassstücken, mit verringerter verfärbung WO2009121337A2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102008017106A DE102008017106A1 (de) 2008-04-02 2008-04-02 Verfahren und Formulierung zur generativen Herstellung von biokompatiblen, strahlungshärtenden medizintechnischen Produkten, insbesondere Ohrpassstücken, mit verringerter Verfärbung
DE102008017106.9 2008-04-02

Publications (2)

Publication Number Publication Date
WO2009121337A2 WO2009121337A2 (de) 2009-10-08
WO2009121337A3 true WO2009121337A3 (de) 2010-03-18

Family

ID=41051396

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2009/000414 WO2009121337A2 (de) 2008-04-02 2009-04-01 Formulierung zur generativen herstellung von biokompatiblen, strahlungshärtenden medizintechnischen produkten, insbesondere ohrpassstücken, mit verringerter verfärbung

Country Status (2)

Country Link
DE (1) DE102008017106A1 (de)
WO (1) WO2009121337A2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6407988B2 (ja) * 2013-06-26 2018-10-17 モメンティブ パフォーマンス マテリアルズ ゲーエムベーハー 光硬化性コーティング組成物およびその使用
WO2018183438A1 (en) * 2017-03-28 2018-10-04 Ford Global Technologies, Llc Stabilized additive manufacturing articles
US11542384B2 (en) 2017-03-28 2023-01-03 Ford Global Technologies, Llc Stabilized additive manufacturing articles
DE102019105816A1 (de) 2019-03-07 2020-09-10 Mühlbauer Technology Gmbh Stereolithographisch hergestellte dentale Formteile und Verfahren zur Herstellung aus photopolymerisierbaren Kompositharz-Zusammensetzungen

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10009477A1 (de) * 2000-01-25 2001-08-09 Dreve Otoplastik Gmbh Otoplastik
DE102004050868A1 (de) * 2004-10-18 2006-04-20 Dreve Otoplastik Gmbh Niedrigviskose, strahlungshärtbare Formulierung zur Herstellung von Ohrpassstücken

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69315003T2 (de) 1992-07-17 1998-03-12 Ethicon Inc Strahlenhärtbare Urethan-Acrylatprepolymere und vernetzte Polymere
DE102004034416A1 (de) 2004-07-15 2006-02-02 "Stiftung Caesar" (Center Of Advanced European Studies And Research) Flüssige, strahlunghärtende Zusammensetzungen

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10009477A1 (de) * 2000-01-25 2001-08-09 Dreve Otoplastik Gmbh Otoplastik
DE102004050868A1 (de) * 2004-10-18 2006-04-20 Dreve Otoplastik Gmbh Niedrigviskose, strahlungshärtbare Formulierung zur Herstellung von Ohrpassstücken

Also Published As

Publication number Publication date
WO2009121337A2 (de) 2009-10-08
DE102008017106A1 (de) 2009-10-08

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