WO2009121324A1 - Dispositif de traitement de pièces au plasma - Google Patents

Dispositif de traitement de pièces au plasma Download PDF

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Publication number
WO2009121324A1
WO2009121324A1 PCT/DE2009/000370 DE2009000370W WO2009121324A1 WO 2009121324 A1 WO2009121324 A1 WO 2009121324A1 DE 2009000370 W DE2009000370 W DE 2009000370W WO 2009121324 A1 WO2009121324 A1 WO 2009121324A1
Authority
WO
WIPO (PCT)
Prior art keywords
seal
plasma
chamber
workpiece
workpieces
Prior art date
Application number
PCT/DE2009/000370
Other languages
German (de)
English (en)
Inventor
Sönke SIEBELS
Original Assignee
Khs Corpoplast Gmbh & Co. Kg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Khs Corpoplast Gmbh & Co. Kg filed Critical Khs Corpoplast Gmbh & Co. Kg
Priority to DE112009001341T priority Critical patent/DE112009001341A5/de
Publication of WO2009121324A1 publication Critical patent/WO2009121324A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45578—Elongated nozzles, tubes with holes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

Definitions

  • the invention relates to a device for plasma treatment of workpieces, which has at least one evacuatable plasma chamber for receiving the workpieces and in which the plasma chamber is arranged in the region of a treatment station, and in which the plasma chamber is bounded by a chamber bottom, a chamber lid and a lateral chamber wall and a seal for acting on a mouth edge of the inserted into the plasma chamber workpiece.
  • Such devices are used, for example, to provide plastics with surface coatings.
  • such devices are already known to coat inner or outer surfaces of containers intended for packaging liquids.
  • facilities for plasma sterilization are known.
  • PCT WO 95/22413 describes a plasma chamber for the internal coating of PET bottles.
  • the bottles to be coated are raised by a movable floor in a plasma chamber and brought in the area of a bottle mouth with an adapter in combination. Through the adapter, an evacuation of the bottle interior can take place.
  • a hollow gas lance is inserted through the adapter into the interior of the bottles to supply process gas. Ignition of the plasma occurs using a microwave.
  • EP-OS 10 10 773 a feeder is described to evacuate a bottle interior and to supply with process gas.
  • PCT-WO 01/31680 a plasma chamber is described in which the bottles are introduced by a movable lid which has been previously connected to a mouth region of the bottles.
  • PCT-WO 00/58631 likewise already shows the arrangement of plasma stations on a rotating wheel and, for such an arrangement, describes a group-wise assignment of vacuum pumps and plasma stations in order to assist a favorable evacuation of the chambers as well as the interior spaces of the bottles.
  • the coating of several containers in a common plasma station or a common cavity is mentioned.
  • the hitherto known devices are not yet sufficiently adapted to be used for mass production, in which both a low coating price per workpiece and a high production speed must be achieved.
  • a negative pressure is generally generated in the interior of the container than in a region surrounding the container of the plasma chamber. It is therefore necessary to seal the container in the mouth area.
  • a seal is typically used in a support member for the container, against which an edge surrounding the mouth of the container is clamped.
  • a material for this seal usually a silicone is used.
  • seal is formed at least in the region of the workpiece zuwendbaren expansion of metal and arranged resiliently.
  • the metallic gasket according to the invention has considerable resistance to exposure to plasma and reactive gases. A wear-related replacement can be avoided thereby. It is only necessary to carry out a cleaning of the seal at certain time intervals, with such cleaning work also having to be made anyway with regard to the further components. Due to the resilient properties sufficient sealing is ensured at a substantially smooth-surfaced edge of the mouth portion.
  • Permanently elastic resilient properties can be provided by the fact that the seal is at least partially formed of a spring steel.
  • a coating of bottle-like workpieces is supported by the fact that the seal is formed like a ring.
  • the metallic seal is arranged in a metallic holding element.
  • Sufficient mobility of the seal can be assisted in that a spacer element is arranged between a contact surface of the retaining element and the seal.
  • Resulting elastic properties can be increased by the fact that the spacer element is made of plastic.
  • a high material resistance can be achieved in that the spacer element is formed of metal.
  • a resilient mobility of the seal is supported by the fact that, starting from a lateral boundary of the retaining recess, the seal extends further in the direction of a recess of the retaining element than the spacer element.
  • Fig. 1 is a schematic diagram of a plurality of plasma chambers, which are arranged on a rotating plasma wheel and in which the plasma wheel is coupled to input and output wheels.
  • FIG. 2 shows an arrangement similar to FIG. 1, in which the plasma stations are each equipped with two plasma chambers, 3 is a perspective view of a plasma bath with a plurality of plasma chambers,
  • FIG. 4 is a perspective view of a plasma station with a cavity
  • FIG. 5 is a front view of the apparatus of FIG. 4 with the plasma chamber closed
  • FIG. 6 shows a cross section according to section line VI-VI in Fig. 5,
  • Fig. 7 is an enlarged sectional view of a connecting element for supporting the workpiece in the plasma chamber and an insertable into the workpiece gas lance and
  • Fig. 8 is a sectional enlarged view of a seal with associated container mouth.
  • FIG. 1 shows a plasma module (1), which is provided with a rotating plasma wheel (2). Along a circumference of the plasma wheel (2) a plurality of plasma stations (3) are arranged. The plasma stations (3) are provided with cavities (4) or plasma chambers (17) for receiving workpieces (5) to be treated.
  • the workpieces (5) to be treated are supplied to the plasma module (1) in the region of an input (6) and forwarded via a separating wheel (7) to a transfer wheel (8) equipped with positionable support arms (9).
  • the support arms (9) are arranged pivotable relative to a base (10) of the transfer wheel (8), so that a change in the distance of the workpieces (5) relative to each other can be performed.
  • the input wheel (11) transfers the workpieces (5) to be treated to the plasma wheel (2).
  • the treated workpieces (5) are removed from the area of the plasma wheel (2) by an output wheel (12) and transferred to the area of an output line (13).
  • the plasma stations (3) are each equipped with two cavities (4) or plasma chambers (17).
  • two workpieces (5) can be treated simultaneously.
  • this is thought to delimit the partial cavities at least by separate Mikrowelleneinkopplept against each other.
  • Fig. 3 shows a perspective view of a plasma module (1) with partially constructed plasma wheel (2).
  • the plasma stations (3) are arranged on a support ring (14), which as part of a
  • Rotary connection is formed and stored in the region of a machine base (15).
  • the plasma stations (3) each have one
  • Plasma chambers (17) have cylindrical chamber walls (18) and microwave generators (19).
  • a rotary distributor (20) is arranged, via which the plasma stations (3) are supplied with resources and energy.
  • ring lines (21) can be used.
  • Fig. 4 shows a plasma station (3) in a perspective view. It can be seen that the station frame (16) is provided with guide rods (23) on which a carriage (24) for holding the cylindrical chamber wall (18) is guided. Fig. 4 shows the carriage (24) with chamber wall (18) in a raised state, so that the workpiece (5) is released.
  • the microwave generator (19) is connected via a deflection (25) and an adapter (26) to a coupling channel (27), which opens into the plasma chamber (17).
  • the microwave generator (19) coupled both directly in the region of the chamber lid (31) and via a spacer element to the chamber lid (31) with a predeterminable distance to the chamber lid (31) and thus in a larger surrounding area of the chamber lid (31) ,
  • the adapter (26) has the function of a transition element and the coupling channel (27) is formed as a coaxial conductor.
  • a quartz glass window is arranged in the region of an opening of the coupling channel (27) in the chamber lid (31) .
  • the deflection (25) is designed as a waveguide.
  • the workpiece (5) is positioned by a holding element (28), which is arranged in the region of a chamber bottom (29).
  • the chamber bottom (29) is formed as part of a chamber base (30).
  • Another variant is to attach the chamber base (30) directly to the station frame (16). In such an arrangement, it is also possible, for example, to make the guide rods (23) in two parts in the vertical direction.
  • FIG. 5 shows a front view of the plasma station (3) according to FIG. 3 in a closed state of the plasma chamber (17).
  • the carriage (24) with the cylindrical chamber wall (18) is in this case lowered relative to the positioning in Fig. 4, so that the chamber wall (18) has moved against the chamber bottom (29). In this positioning state, the plasma coating can be performed.
  • the coupling channel (27) opens into a chamber lid (31) having a laterally projecting flange (32).
  • a seal (33) is arranged, which is acted upon by an inner flange (34) of the chamber wall (18).
  • a further seal (35) is arranged in a lower region of the chamber wall (18), in order to ensure a seal here relative to the chamber bottom (29).
  • the chamber wall (18) surrounds the cavity (4), so that both an interior of the cavity (4) and an interior of the workpiece (5) can be evacuated.
  • a hollow gas lance (36) is arranged in the region of the chamber base (30) and can be moved into the interior of the workpiece (5).
  • this is supported by a lance carriage (37) which can be positioned along the guide rods (23).
  • a process gas channel (38) Within the lance carriage (37) extends a process gas channel (38), which is coupled in the raised position shown in Fig. 6 with a gas port (39) of the chamber base (30).
  • a thrust plate (45) mounted on the gas lance (36) is guided against the outer flange (44) and pushes the retainer (28) into its upper end position.
  • an interior of the workpiece (5) is insulated from the interior of the cavity (4).
  • the compression spring (43) the holding element (28) shifts the compression spring (43) the holding element (28) relative to the guide sleeve (41) such that a connection between the interior of the workpiece (5) and the interior of the cavity (4) is provided.
  • the workpiece (5) into a plasma chamber (17) immovable relative to the associated support structure. It is also possible, as an alternative to the illustrated coating of the workpieces (5) with their mouths in the vertical direction down to perform a coating of the workpieces with their mouths in the vertical direction upwards. In particular, it is intended to perform a coating of bottle-shaped workpieces (5).
  • Such bottles are also preferably formed from a thermoplastic material. Preferably, the use of PET or PP is intended. According to a further preferred embodiment, the coated bottles serve to receive drinks.
  • a typical treatment process is explained below using the example of a coating process and carried out such that first the workpiece (5) using the input wheel (11) is transported to the plasma wheel (2) and that in a pushed-up state of the sleeve-like chamber wall (18) the insertion of the workpiece (5) into the plasma station (3). After completion of the insertion process, the chamber wall (18) is lowered into its sealed positioning and initially carried out simultaneously an evacuation of both the cavity (4) and an interior of the workpiece (5).
  • the lance (36) is retracted into the interior of the workpiece (5) and by a displacement of the holding element (28) a foreclosure of the interior of the workpiece (5) relative to the interior of the cavity ( 4).
  • the gas lance (36) already in sync with the beginning eva ku réelle the interior of the cavity in the workpiece (5) to move into.
  • the pressure in the interior of the workpiece (5) is then further lowered.
  • it is also intended to carry out the positioning movement of the gas lance (36) at least partially already parallel to the positioning of the chamber wall (18).
  • gas is introduced into the interior of the workpiece (5) and ignited with the aid of the microwave generator (19) the plasma.
  • the gas lance (36) is again removed from the interior of the workpiece (5) and the plasma chamber (17) and the interior of the workpiece (5) are vented. After reaching the ambient pressure within the cavity (4), the chamber wall (18) is raised again to perform a removal of the coated workpiece (5) and an input of a new workpiece to be coated (5).
  • a positioning of the chamber wall (18), the sealing element (28) and / or the gas lance (36) can be carried out using different drive units.
  • the cam control may for example be designed such that along a circumference of the plasma wheel (2) control cams are arranged along which cam rollers are guided. The cam rollers are coupled to the respective components to be positioned.
  • FIG. 7 shows a seal (47) in a transition region, from the holding element (28) to an opening region (46) of the workpiece (5).
  • the mouth region (46) of the container-like workpiece (5) protrudes into a holder recess (48) of the holding element (48) into which the seal (47) is inserted.
  • the mouth region (46) adjoins the seal (47) with a mouth edge (49).
  • the seal (47) is formed at least in the region of its the mouth edge (49) facing extension of metal, preferably made of stainless steel.
  • Fig. 8 shows an enlarged view of a cross section through the seal (47) with associated mouth region (46).
  • the seal (47) is designed to be relatively thin and in the direction of a longitudinal axis (50) which extends through the recess (40) in the region of the retaining element (28).
  • the seal (47) protrudes into the recess (40) in a bearing area acted upon by the mouth section (46) in such a way that when the seal (47) is acted upon by the mouth region (46) in the direction of the longitudinal axis (50) Bending deformation of the seal (47) is possible.
  • the spacer (51) ensures that the seal to a support surface (52) of the Halterausaus- (48) has a sufficient distance to allow the elastic deformation of the seal (47).
  • the seal (47) and the spacer element (51) in one piece.
  • the spacer element (51) is also thought to realize the spacer element (51) as a bent flange of the seal (47) or to provide no annular formation of the spacer element (51), but to bend only individual segment regions of the seal (47).
  • a material for the spacer element (51) is for example silicone in question. But it is also possible to form the spacer element (51) made of metal, in particular is also intended here to a use of stainless steel.
  • the above-described metallic configuration of the seal (47) at least in the region of its workable extension comprises both an unprotected metallic surface of the seal (47) and the use of coatings in the region of at least part of the surface of the seal (47). It is intended in particular to the use of a ceramic coating.
  • the seal (47) made of a resilient metallic material
  • this is intended to the use of elastomeric or elastic base elements.
  • the base member is formed as an O-ring of an elastomeric material, preferably rubber.
  • an O-ring of an elastomeric material preferably of rubber, can thus be positioned both below and above the seal (47).
  • the dimensioning and arrangement of the base or elements is such that they are not in the direct plasma stream. Material impairments caused by plasma exposure can be minimized.

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

L'invention concerne un dispositif de traitement de pièces (5) au plasma. La pièce (5) est introduite dans une chambre (17) d'un poste de traitement (3) dans laquelle un vide au moins partiel peut être créé. La chambre à plasma (17) est délimitée par un fond (29), un plafond (31) et une paroi latérale (18). Un joint (47) destiné à être appliqué contre le bord d'ouverture (49) de la pièce (5) introduite dans la chambre à plasma (17) est disposé dans la région de la chambre à plasma (17). Ce joint (47) se compose de métal et est disposé de façon élastique au moins dans la région qui peut s'étendre en direction de la pièce (5).
PCT/DE2009/000370 2008-03-31 2009-03-13 Dispositif de traitement de pièces au plasma WO2009121324A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE112009001341T DE112009001341A5 (de) 2008-03-31 2009-03-13 Vorrichtung zur Plasmabehandlung von Werkstücken

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102008016923.4 2008-03-31
DE102008016923A DE102008016923A1 (de) 2008-03-31 2008-03-31 Vorrichtung zur Plasmabehandlung von Werkstücken

Publications (1)

Publication Number Publication Date
WO2009121324A1 true WO2009121324A1 (fr) 2009-10-08

Family

ID=40910042

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2009/000370 WO2009121324A1 (fr) 2008-03-31 2009-03-13 Dispositif de traitement de pièces au plasma

Country Status (2)

Country Link
DE (2) DE102008016923A1 (fr)
WO (1) WO2009121324A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010012501A1 (de) 2010-03-12 2011-09-15 Khs Corpoplast Gmbh Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken
DE102010023119A1 (de) * 2010-06-07 2011-12-22 Khs Corpoplast Gmbh Vorrichtung zur Plasmabehandlung von Werkstücken
DE102015121773B4 (de) 2015-12-14 2019-10-24 Khs Gmbh Verfahren und Vorrichtung zur Plasmabehandlung von Behältern
DE102022119836A1 (de) 2022-08-08 2024-02-08 Khs Gmbh Positionier- und Dichtvorrichtung für das Halten und Abdichten eines Werkstückes in einer Plasmakammer einer Plasmabeschichtungsvorrichtung

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3403317A1 (de) * 1984-01-31 1985-08-01 Siemens AG, 1000 Berlin und 8000 München Vorrichtung zur halterung der die mit substraten bestueckten boote tragenden quarzueberrohre an horizontalen einschwebvorrichtungen von niederdruckphasenbeschichtungsanlagen
WO1995022413A1 (fr) * 1994-02-16 1995-08-24 The Coca-Cola Company Recipients creux a revetement interieur inerte ou impermeable applique par reaction superficielle au plasma ou polymerisation superficielle
EP0881197A2 (fr) * 1997-05-27 1998-12-02 Leybold Systems GmbH Appareil et procédé de revêtement d'un récipiant en verre ou en plastique au moyen de plasma CVD
WO2001040072A1 (fr) * 1999-12-01 2001-06-07 Tetra Laval Holdings & Finance S.A. Dispositif pour etancheifier le bord d'about d'un col de recipient
US20030217527A1 (en) * 2002-05-15 2003-11-27 Andreas Luttringhaus-Henkel Device for holding and vacuum-sealing a container having an opening
DE10224395A1 (de) * 2002-05-24 2003-12-04 Sig Technology Ltd Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1010773A4 (fr) 1997-02-19 2004-08-25 Kirin Brewery Procede et appareil pour produire un recipient plastique presentant un pelliculage en carbone
CN1196168C (zh) 1997-09-30 2005-04-06 利乐拉瓦尔集团及财务有限公司 利用等离子增强法处理塑料瓶内表面的方法及设备
FR2791598B1 (fr) 1999-03-30 2001-06-22 Sidel Sa Machine a carrousel pour le traitement de corps creux comportant un circuit de distribution de pression perfectionne et distributeur pour une telle machine
FR2799994B1 (fr) 1999-10-25 2002-06-07 Sidel Sa Dispositif pour le traitement d'un recipient a l'aide d'un plasma a basse pression comportant un circuit de vide perfectionne
WO2003100121A2 (fr) * 2002-05-24 2003-12-04 Schott Ag Dispositif d'application de revetement multiplace et procede d'application de revetement par plasma
DE10300734A1 (de) * 2003-01-11 2004-07-22 Sig Technology Ltd. Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken
US20070102888A1 (en) * 2003-03-31 2007-05-10 Nichias Corporation Ring-shaped metal gasket
DE102004020185B4 (de) 2004-04-22 2013-01-17 Schott Ag Verfahren und Vorrichtung für die Innenbeschichtung von Hohlkörpern sowie Verwendung der Vorrichtung

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3403317A1 (de) * 1984-01-31 1985-08-01 Siemens AG, 1000 Berlin und 8000 München Vorrichtung zur halterung der die mit substraten bestueckten boote tragenden quarzueberrohre an horizontalen einschwebvorrichtungen von niederdruckphasenbeschichtungsanlagen
WO1995022413A1 (fr) * 1994-02-16 1995-08-24 The Coca-Cola Company Recipients creux a revetement interieur inerte ou impermeable applique par reaction superficielle au plasma ou polymerisation superficielle
EP0881197A2 (fr) * 1997-05-27 1998-12-02 Leybold Systems GmbH Appareil et procédé de revêtement d'un récipiant en verre ou en plastique au moyen de plasma CVD
WO2001040072A1 (fr) * 1999-12-01 2001-06-07 Tetra Laval Holdings & Finance S.A. Dispositif pour etancheifier le bord d'about d'un col de recipient
US20030217527A1 (en) * 2002-05-15 2003-11-27 Andreas Luttringhaus-Henkel Device for holding and vacuum-sealing a container having an opening
DE10224395A1 (de) * 2002-05-24 2003-12-04 Sig Technology Ltd Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken

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