DE102008016923A1 - Vorrichtung zur Plasmabehandlung von Werkstücken - Google Patents
Vorrichtung zur Plasmabehandlung von Werkstücken Download PDFInfo
- Publication number
- DE102008016923A1 DE102008016923A1 DE102008016923A DE102008016923A DE102008016923A1 DE 102008016923 A1 DE102008016923 A1 DE 102008016923A1 DE 102008016923 A DE102008016923 A DE 102008016923A DE 102008016923 A DE102008016923 A DE 102008016923A DE 102008016923 A1 DE102008016923 A1 DE 102008016923A1
- Authority
- DE
- Germany
- Prior art keywords
- seal
- plasma
- chamber
- workpiece
- workpieces
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45578—Elongated nozzles, tubes with holes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102008016923A DE102008016923A1 (de) | 2008-03-31 | 2008-03-31 | Vorrichtung zur Plasmabehandlung von Werkstücken |
PCT/DE2009/000370 WO2009121324A1 (fr) | 2008-03-31 | 2009-03-13 | Dispositif de traitement de pièces au plasma |
DE112009001341T DE112009001341A5 (de) | 2008-03-31 | 2009-03-13 | Vorrichtung zur Plasmabehandlung von Werkstücken |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102008016923A DE102008016923A1 (de) | 2008-03-31 | 2008-03-31 | Vorrichtung zur Plasmabehandlung von Werkstücken |
Publications (1)
Publication Number | Publication Date |
---|---|
DE102008016923A1 true DE102008016923A1 (de) | 2009-10-01 |
Family
ID=40910042
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE102008016923A Pending DE102008016923A1 (de) | 2008-03-31 | 2008-03-31 | Vorrichtung zur Plasmabehandlung von Werkstücken |
DE112009001341T Withdrawn DE112009001341A5 (de) | 2008-03-31 | 2009-03-13 | Vorrichtung zur Plasmabehandlung von Werkstücken |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE112009001341T Withdrawn DE112009001341A5 (de) | 2008-03-31 | 2009-03-13 | Vorrichtung zur Plasmabehandlung von Werkstücken |
Country Status (2)
Country | Link |
---|---|
DE (2) | DE102008016923A1 (fr) |
WO (1) | WO2009121324A1 (fr) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011110162A1 (fr) * | 2010-03-12 | 2011-09-15 | Khs Corpoplast Gmbh & Co Kg | Procédé et dispositif de traitement au plasma de pièces |
DE102010023119A1 (de) * | 2010-06-07 | 2011-12-22 | Khs Corpoplast Gmbh | Vorrichtung zur Plasmabehandlung von Werkstücken |
WO2017102280A3 (fr) * | 2015-12-14 | 2018-01-04 | Khs Gmbh | Procédé et dispositif de traitement par plasma de récipients |
DE102022119836A1 (de) | 2022-08-08 | 2024-02-08 | Khs Gmbh | Positionier- und Dichtvorrichtung für das Halten und Abdichten eines Werkstückes in einer Plasmakammer einer Plasmabeschichtungsvorrichtung |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1995022413A1 (fr) | 1994-02-16 | 1995-08-24 | The Coca-Cola Company | Recipients creux a revetement interieur inerte ou impermeable applique par reaction superficielle au plasma ou polymerisation superficielle |
WO1999017334A1 (fr) | 1997-09-30 | 1999-04-08 | Tetra Laval Holdings & Finance S.A. | Procede et appareil pour le traitement de la surface interieure de bouteilles en plastique, dans un procede active par plasma |
EP1010773A1 (fr) | 1997-02-19 | 2000-06-21 | Kirin Beer Kabushiki Kaisha | Procede et appareil pour produire un recipient plastique presentant un pelliculage en carbone |
WO2000058631A1 (fr) | 1999-03-30 | 2000-10-05 | Sidel | Machine a carrousel pour le traitement de corps creux comportant un circuit de distribution de pression perfectionne |
WO2001031680A1 (fr) | 1999-10-25 | 2001-05-03 | Sidel Actis Services | Circuit de vide pour un dispositif de traitement d'un recipient a l'aide d'un plasma a basse pression |
DE19957744A1 (de) * | 1999-12-01 | 2001-06-07 | Tetra Laval Holdings & Finance | Vorrichtung zum Abdichten des Stirnrandes eines Behälterhalses |
WO2003100121A2 (fr) * | 2002-05-24 | 2003-12-04 | Schott Ag | Dispositif d'application de revetement multiplace et procede d'application de revetement par plasma |
DE10300734A1 (de) * | 2003-01-11 | 2004-07-22 | Sig Technology Ltd. | Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken |
DE102004020185A1 (de) | 2004-04-22 | 2005-11-24 | Schott Ag | Gaslanze für die Innenbeschichtung von Hohlkörpern |
US20070102888A1 (en) * | 2003-03-31 | 2007-05-10 | Nichias Corporation | Ring-shaped metal gasket |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3403317A1 (de) * | 1984-01-31 | 1985-08-01 | Siemens AG, 1000 Berlin und 8000 München | Vorrichtung zur halterung der die mit substraten bestueckten boote tragenden quarzueberrohre an horizontalen einschwebvorrichtungen von niederdruckphasenbeschichtungsanlagen |
DE19722205A1 (de) * | 1997-05-27 | 1998-12-03 | Leybold Systems Gmbh | Verfahren und Vorrichtung zur Beschichtung von Kunststoff- oder Glasbehältern mittels eines PCVD-Beschichtungsverfahrens |
DE10221461B4 (de) * | 2002-05-15 | 2004-05-06 | Schott Glas | Vorrichtung und Verwendung einer Vorrichtung zum Aufnehmen und Vakuumabdichten eines Behältnisses mit einer Öffnung |
DE10224546A1 (de) * | 2002-05-24 | 2003-12-04 | Sig Technology Ltd | Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken |
-
2008
- 2008-03-31 DE DE102008016923A patent/DE102008016923A1/de active Pending
-
2009
- 2009-03-13 WO PCT/DE2009/000370 patent/WO2009121324A1/fr active Application Filing
- 2009-03-13 DE DE112009001341T patent/DE112009001341A5/de not_active Withdrawn
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1995022413A1 (fr) | 1994-02-16 | 1995-08-24 | The Coca-Cola Company | Recipients creux a revetement interieur inerte ou impermeable applique par reaction superficielle au plasma ou polymerisation superficielle |
EP1010773A1 (fr) | 1997-02-19 | 2000-06-21 | Kirin Beer Kabushiki Kaisha | Procede et appareil pour produire un recipient plastique presentant un pelliculage en carbone |
US6294226B1 (en) * | 1997-02-19 | 2001-09-25 | Kirin Beer Kabushiki Kaisha | Method and apparatus for producing plastic container having carbon film coating |
WO1999017334A1 (fr) | 1997-09-30 | 1999-04-08 | Tetra Laval Holdings & Finance S.A. | Procede et appareil pour le traitement de la surface interieure de bouteilles en plastique, dans un procede active par plasma |
WO2000058631A1 (fr) | 1999-03-30 | 2000-10-05 | Sidel | Machine a carrousel pour le traitement de corps creux comportant un circuit de distribution de pression perfectionne |
WO2001031680A1 (fr) | 1999-10-25 | 2001-05-03 | Sidel Actis Services | Circuit de vide pour un dispositif de traitement d'un recipient a l'aide d'un plasma a basse pression |
DE19957744A1 (de) * | 1999-12-01 | 2001-06-07 | Tetra Laval Holdings & Finance | Vorrichtung zum Abdichten des Stirnrandes eines Behälterhalses |
WO2003100121A2 (fr) * | 2002-05-24 | 2003-12-04 | Schott Ag | Dispositif d'application de revetement multiplace et procede d'application de revetement par plasma |
DE10300734A1 (de) * | 2003-01-11 | 2004-07-22 | Sig Technology Ltd. | Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken |
US20070102888A1 (en) * | 2003-03-31 | 2007-05-10 | Nichias Corporation | Ring-shaped metal gasket |
DE102004020185A1 (de) | 2004-04-22 | 2005-11-24 | Schott Ag | Gaslanze für die Innenbeschichtung von Hohlkörpern |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011110162A1 (fr) * | 2010-03-12 | 2011-09-15 | Khs Corpoplast Gmbh & Co Kg | Procédé et dispositif de traitement au plasma de pièces |
US9371585B2 (en) | 2010-03-12 | 2016-06-21 | Khs Corpoplast Gmbh | Method and device for plasma-treating workpieces |
DE102010023119A1 (de) * | 2010-06-07 | 2011-12-22 | Khs Corpoplast Gmbh | Vorrichtung zur Plasmabehandlung von Werkstücken |
WO2017102280A3 (fr) * | 2015-12-14 | 2018-01-04 | Khs Gmbh | Procédé et dispositif de traitement par plasma de récipients |
DE102015121773B4 (de) | 2015-12-14 | 2019-10-24 | Khs Gmbh | Verfahren und Vorrichtung zur Plasmabehandlung von Behältern |
US11660361B2 (en) | 2015-12-14 | 2023-05-30 | Khs Gmbh | Method and device for the plasma processing of containers |
DE102022119836A1 (de) | 2022-08-08 | 2024-02-08 | Khs Gmbh | Positionier- und Dichtvorrichtung für das Halten und Abdichten eines Werkstückes in einer Plasmakammer einer Plasmabeschichtungsvorrichtung |
Also Published As
Publication number | Publication date |
---|---|
WO2009121324A1 (fr) | 2009-10-08 |
DE112009001341A5 (de) | 2011-03-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
OM8 | Search report available as to paragraph 43 lit. 1 sentence 1 patent law | ||
8181 | Inventor (new situation) |
Inventor name: SIEBELS, SOENKE, 22303 HAMBURG, DE |
|
R081 | Change of applicant/patentee |
Owner name: KHS CORPOPLAST GMBH, DE Free format text: FORMER OWNER: KHS CORPOPLAST GMBH & CO. KG, 20539 HAMBURG, DE Effective date: 20110504 |