WO2009110341A1 - 表面清浄性を有する機能性部材 - Google Patents
表面清浄性を有する機能性部材 Download PDFInfo
- Publication number
- WO2009110341A1 WO2009110341A1 PCT/JP2009/053188 JP2009053188W WO2009110341A1 WO 2009110341 A1 WO2009110341 A1 WO 2009110341A1 JP 2009053188 W JP2009053188 W JP 2009053188W WO 2009110341 A1 WO2009110341 A1 WO 2009110341A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- carbon material
- functional member
- fluororesin
- surface portion
- carbon
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2327/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
- C08J2327/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
- C08J2327/12—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
Definitions
- the present invention relates to a functional member having surface cleanliness used in, for example, a semiconductor manufacturing apparatus.
- wafers Some semiconductor manufacturing apparatuses process semiconductor wafers (hereinafter simply referred to as “wafers”) using chemicals or the like. It is necessary to use a component having chemical resistance as a component member of such an apparatus, and currently, a fluorine resin having excellent chemical resistance is used for such a member.
- the fluororesin since the fluororesin has a relatively low mechanical strength, when it is used as a member of a semiconductor manufacturing apparatus, it is necessary to take measures such as increasing the thickness of the fluororesin or reinforcing it with metal. Moreover, since the fluororesin has a large coefficient of thermal expansion, there are cases where thermal expansion must be taken into account when used at high temperatures.
- a technique for incorporating PTFE into carbon fiber is disclosed (see, for example, Japanese Patent Application Laid-Open No. 2003-41083). If this technique is used, thermal expansion can be suppressed and mechanical strength can be improved by the carbon fibers contained in the fluororesin.
- an object of the present invention is to provide a functional member having improved surface cleanliness while maintaining the functional strength inherent to a fluororesin member containing a carbon material, and a method for producing the same. To do. It is another object of the present invention to provide a semiconductor manufacturing apparatus that can suppress contamination of a semiconductor substrate.
- the functional member is made of a fluororesin containing a carbon material, and the content of the carbon material in the surface portion of the functional member is the inside of the functional member.
- a functional member having surface cleanliness is provided, which is characterized by being significantly smaller than the carbon material content.
- a member having a predetermined shape formed of a fluororesin containing a carbon material is prepared, and the member is exposed to an oxidizing gas and is present on a surface portion of the member.
- a semiconductor manufacturing apparatus comprising the functional member of the present invention.
- the carbon material is contained because the carbon material content in the surface portion of the functional member is significantly smaller than the carbon material content in the functional member. It is possible to provide a functional member that improves the cleanliness of the surface portion while maintaining the mechanical strength inherent to the fluororesin.
- the carbon material on the surface portion of the member can be removed by exposing the member formed of the fluororesin containing the carbon material to an oxidizing gas. Therefore, it is possible to provide a functional member that improves the cleanliness of the surface portion while maintaining the mechanical strength inherently possessed by the fluororesin containing the carbon material.
- the functional member having improved surface portion cleanliness since the functional member having improved surface portion cleanliness is provided, contamination of the semiconductor substrate with the carbon material can be suppressed.
- FIG. 1 (a) and FIG.1 (b) are the top views and longitudinal cross-sectional views of the member which concern on 1st Embodiment.
- FIG. 2A and FIG. 2B are a plan view and a longitudinal sectional view of the functional member according to the first embodiment.
- FIG. 3 is a photograph of the sample before the experiment according to the example.
- FIG. 4 is a schematic configuration diagram of an experimental apparatus for processing a sample according to the example.
- FIG. 5 is a photograph of the sample after the experiment according to the example.
- FIG. 6 is an AA cross-sectional photograph of FIG.
- FIG. 7 is an enlarged photomicrograph of part B of FIG.
- FIG. 8 is an enlarged photomicrograph of part C of FIG.
- FIG. 9 is an enlarged photomicrograph of part D in FIG.
- FIGS. 1A and 1B are a plan view and a longitudinal sectional view of a member according to the present embodiment
- FIGS. 2A and 2B are functional members according to the present embodiment. It is the top view and longitudinal cross-sectional view of these.
- a pre-treatment member 1 having a predetermined shape and from which a carbon material 2 described below is not removed is prepared.
- the member 1 is composed of a fluororesin 3 containing a carbon material 2.
- Examples of the carbon material 2 include carbon fiber, carbon powder, and a mixture thereof.
- fluororesin 3 examples include tetrafluoroethylene / perfluoroalkyl vinyl ether copolymer (PFA), polytetrafluoroethylene (PTFE), tetrafluoroethylene / hexafluoropropylene copolymer (FEP), tetrafluoroethylene / hexa
- PFA tetrafluoroethylene / perfluoroalkyl vinyl ether copolymer
- PTFE polytetrafluoroethylene
- FEP tetrafluoroethylene / hexafluoropropylene copolymer
- EPE fluoropropylene / perfluoroalkyl vinyl ether copolymer
- ETFE tetrafluoroethylene / ethylene copolymer
- the carbon material 2 is contained almost uniformly in the fluororesin 3. That is, the carbon material 2 exists on both the surface portion 1 a and the inside 1 b of the member 1.
- Such a member 1 can be manufactured by various methods. Specifically, for example, when the fluororesin 3 is PFA, the carbon material 2 is mixed with the PFA material, and oblique molding is performed to produce the member 1 made of PFA containing the carbon material 2. it can. Further, when the fluororesin is PTFE, the carbon material 2 is mixed with the PTFE powder and sintered, whereby the member 1 made of PTFE containing the carbon material 2 can be produced.
- the member 1 is exposed to an oxidizing gas containing ozone and water vapor.
- an oxidizing gas containing ozone and water vapor.
- the carbon material 2 is oxidized by ozone and water vapor, becomes carbon dioxide, and leaves the fluororesin 3, and the carbon material 2 is removed from the fluororesin 3.
- the oxidizing gas may be composed only of ozone.
- the C—C bond of the carbon material 2 is cut by the oxidation of ozone and water vapor, but the C—C bond and the C—F bond in the fluororesin 3 are not cut by the oxidizing power of ozone. It is considered that even if the fluororesin 3 is exposed to, only the carbon material 2 is removed and the composition of the fluororesin 3 is not affected.
- the removal of the carbon material 2 is performed so as to remove only the carbon material 2 present on the surface portion 1 a of the member 1. That is, since the removal of the carbon material 2 depends on the time of exposure to the oxidizing gas, the depth at which the carbon material 2 is removed can be controlled by controlling this time. Therefore, by controlling the exposure time to the oxidizing gas, it is possible to remove only the carbon material 2 present on the surface portion 1 a of the member 1 and leave the carbon material 2 present in the inside 1 b of the member 1.
- the functional member 4 shown in FIGS. 2A and 2B is manufactured. Since the carbon material 2 of the surface portion 4a is removed from the functional member 4, the content of the carbon material 2 is significantly smaller in the surface portion 4a of the functional member 4 than in the interior 4b of the functional member 4. It has become.
- the “content ratio” means the content ratio of carbon fiber or carbon powder when the carbon material 2 is composed of, for example, carbon fiber alone or carbon powder alone, and the carbon material 2 is a mixture of carbon fiber and carbon powder. In the case where it is composed of, it means the content ratio relative to the total amount of carbon fiber and carbon powder.
- the carbon material 2 on the surface portion 4a of the functional member 4 is substantially removed.
- substantially means not only that the carbon material 2 on the surface portion 4a is completely removed, but also includes a case where the carbon material 2 on the surface portion 4a remains slightly. .
- the holes 4c are formed at the locations where the carbon material 2 was present, so the surface portion 4a becomes porous.
- the member 1 formed by the fluororesin 3 containing the carbon material 2 is exposed to the oxidizing gas, and the carbon material 2 on the surface portion 1a of the member 1 is removed. It is possible to provide the functional member 4 that improves the cleanliness of the surface portion 4a while maintaining the mechanical strength and the thermal expansion coefficient that the fluororesin 3 containing 2 essentially has.
- this functional member 4 when this functional member 4 is used in a semiconductor manufacturing apparatus (not shown), the carbon material 2 is hardly eluted from the surface portion 4a by a chemical solution or the like. As a result, contamination of a wafer (not shown) that is a semiconductor substrate can be suppressed.
- the removal rate of the carbon material 2 can be increased as compared with using ozone alone. That is, when using ozone alone, only oxygen radicals act, but when using ozone and water vapor, hydroxyl radicals having a strong oxidizing power act in addition to oxygen radicals. Thereby, the removal rate of the carbon material 2 can be increased.
- the carbon material 2 on the entire surface portion 1a of the member 1 can be removed. That is, it is conceivable that the periphery of the fluororesin 3 is coated or wrapped with a fluororesin that does not contain the carbon material 2, but when the fluororesin 3 is processed after coating or lapping, the processed portion is fluorine. The surface of the resin 3 is exposed, and the carbon material is exposed. It is difficult to further coat or wrap the surface of this part.
- the carbon material 2 on the entire surface portion 1a of the member 1 is removed by subsequent exposure to an oxidizing gas. can do.
- the functional member 4 After removing the carbon material 2 from the surface portion 1 a of the member 1, the functional member 4 is heated to near the softening temperature of the fluororesin 3. By this heating, the hole 4c of the surface portion 4a of the functional member 4 is closed.
- the carbon material 2 is removed and then heated to near the softening temperature of the fluororesin 3 to close the hole 4c, so that the carbon material 2 remaining in the interior 4b of the functional member 4 Elution by a chemical solution or the like can be further suppressed.
- the present invention is not limited to the description of the above embodiment, and the structure, material, arrangement of each member, and the like can be changed as appropriate without departing from the gist of the present invention.
- the example which uses the functional member 4 for a semiconductor manufacturing apparatus was demonstrated, a use is not restricted to the member used for a semiconductor manufacturing apparatus. That is, the functional member 4 can be used for various mechanical structures.
- FIG. 3 is a photograph of the sample before the experiment according to the example
- FIG. 4 is a schematic configuration diagram of an experimental apparatus for processing the sample according to the example
- FIG. 5 is an experiment according to the example.
- 6 is a photograph of a later sample
- FIG. 6 is an AA cross-sectional photograph of FIG. 5
- FIG. 7 is an enlarged micrograph of part B of FIG. 6
- FIG. 8 is an enlarged microscope of part C of FIG.
- FIG. 9 is a photomicrograph in which the portion D in FIG. 6 is enlarged.
- the experimental apparatus 10 shown in FIG. 4 was used for the experiment.
- the experimental apparatus 10 mainly includes a chamber 11 for processing the sample S, an ozone generator 12 for generating ozone, a water vapor generator 13 for generating water vapor, an ozone generator 12 and a water vapor generator 13.
Abstract
Description
以下、図面を参照しながら本発明の第1の実施の形態について説明する。図1(a)および図1(b)は本実施の形態に係る部材の平面図および縦断面図であり、図2(a)および図2(b)は本実施の形態に係る機能性部材の平面図および縦断面図である。
以下、本発明の第2の実施の形態について説明する。なお、上記第1の実施の形態と重複する内容については、説明を省略する。
まず、PFAに炭素繊維を含有させた試料を用意した。通常、PFAは半透明であるが、PFA全体に炭素繊維が含有されているため、試料は図3に示されるように黒色となっていた。この試料を個片化して実験に使用した。
実験には、図4に示される実験装置10を使用した。実験装置10は、主に、試料Sを処理するためのチャンバー11、オゾンを発生させるためのオゾン発生器12、水蒸気を発生させるための水蒸気発生器13、オゾン発生器12および水蒸気発生器13で発生したオゾンおよび蒸気の流量を調節するためのバルブ14、チャンバー11内の圧力を調節するためのバルブ15、チャンバー11から排気されたオゾンを分解するためのオゾン分解器16、および排気系17等から構成されている。
チャンバー11内に試料Sを入れて、温度105℃、圧力75KPaに維持した。また、オゾン発生器12でオゾンを発生させるとともに水蒸気発生器13で水蒸気を発生させ、オゾン9%volおよび水蒸気4.5cc/minとなるようにバルブ14で調節して、これらをチャンバー11に供給した。なお、オゾンおよび水蒸気を供給した時間は30時間であった。
図5および図6に示されるように試料の表面部は、白濁色となっていた。これは、試料の表面部の炭素繊維が除去されたためであると考えられる。一方、図5に示されるように試料の内部は、黒色のままであった。これは、試料の内部の炭素繊維が残存しているためであると考えられる。
Claims (10)
- 炭素材料を含有するフッ素樹脂からなる機能性部材であって、
前記機能性部材の表面部における前記炭素材料の含有率が、前記機能性部材の内部における前記炭素材料の含有率より有意に小さいことを特徴とする、表面清浄性を有する機能性部材。 - 前記炭素材料が前記機能性部材の表面部から実質的に除去されている、請求項1に記載の機能性部材。
- 前記フッ素樹脂がテトラフルオロエチレン・パーフルオロアルキルビニルエーテル共重合体またはポリテトラフルオロエチレンである、請求項1に記載の機能性部材。
- 炭素材料を含有するフッ素樹脂によって形成された、所定形状を有する部材を用意し、
前記部材を、酸化性ガスに曝して、前記部材の表面部に存在する前記炭素材料を除去することを特徴とする、表面清浄性を有する機能性部材の製造方法。 - 前記部材の表面部に存在する前記炭素材料を除去した後、前記部材を加熱する、請求項4に記載の機能性部材の製造方法。
- 前記炭素材料が炭素繊維および炭素粉末の少なくともいずれかである、請求項4に記載の機能性部材の製造方法。
- 前記フッ素樹脂がテトラフルオロエチレン・パーフルオロアルキルビニルエーテル共重合体またはポリテトラフルオロエチレンである、請求項4に記載の機能性部材の製造方法。
- 前記酸化性ガスがオゾンを含んでいる、請求項4に記載の機能性部材の製造方法。
- 前記酸化性ガスが水蒸気を含んでいる、請求項8に記載の機能性部材の製造方法。
- 請求項1に記載の機能性部材を具備することを特徴とする、半導体製造装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/677,173 US8313536B2 (en) | 2008-03-04 | 2009-02-23 | Functional member having surface cleanliness |
JP2010501852A JP5254309B2 (ja) | 2008-03-04 | 2009-02-23 | 表面清浄性を有する機能性部材 |
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JP2008053606 | 2008-03-04 | ||
JP2008-053606 | 2008-03-04 |
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WO2009110341A1 true WO2009110341A1 (ja) | 2009-09-11 |
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PCT/JP2009/053188 WO2009110341A1 (ja) | 2008-03-04 | 2009-02-23 | 表面清浄性を有する機能性部材 |
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US (1) | US8313536B2 (ja) |
JP (1) | JP5254309B2 (ja) |
TW (1) | TWI408742B (ja) |
WO (1) | WO2009110341A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022187782A1 (en) | 2021-03-04 | 2022-09-09 | Dupont Polymers, Inc. | Composite material and method for forming the composite material |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH08512355A (ja) * | 1993-07-14 | 1996-12-24 | グリーン,トウィード オブ デラウェア インコーポレイテッド | ペルフルオロエラストマー組成物及び方法 |
WO2001079337A1 (fr) * | 2000-04-19 | 2001-10-25 | Daikin Industries, Ltd. | Objet moule de fluoroelastomere a excellente capacite de demoulage, et son procede de production |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
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US4434355A (en) * | 1981-07-17 | 1984-02-28 | Minolta Camera Kabushiki Kaisha | Offset prevention layer for heat roller fixing device |
GB9200181D0 (en) * | 1992-01-07 | 1992-02-26 | Whitford Plastics | Non-stick coatings |
JP2003041083A (ja) | 2001-07-25 | 2003-02-13 | Du Pont Mitsui Fluorochem Co Ltd | 変性ポリテトラフルオロエチレン組成物 |
JP3948313B2 (ja) * | 2002-02-28 | 2007-07-25 | 日立電線株式会社 | 摺動部材 |
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2009
- 2009-02-23 JP JP2010501852A patent/JP5254309B2/ja not_active Expired - Fee Related
- 2009-02-23 WO PCT/JP2009/053188 patent/WO2009110341A1/ja active Application Filing
- 2009-02-23 US US12/677,173 patent/US8313536B2/en active Active
- 2009-03-02 TW TW098106686A patent/TWI408742B/zh active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08512355A (ja) * | 1993-07-14 | 1996-12-24 | グリーン,トウィード オブ デラウェア インコーポレイテッド | ペルフルオロエラストマー組成物及び方法 |
WO2001079337A1 (fr) * | 2000-04-19 | 2001-10-25 | Daikin Industries, Ltd. | Objet moule de fluoroelastomere a excellente capacite de demoulage, et son procede de production |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022187782A1 (en) | 2021-03-04 | 2022-09-09 | Dupont Polymers, Inc. | Composite material and method for forming the composite material |
Also Published As
Publication number | Publication date |
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US8313536B2 (en) | 2012-11-20 |
JP5254309B2 (ja) | 2013-08-07 |
US20100204393A1 (en) | 2010-08-12 |
TWI408742B (zh) | 2013-09-11 |
JPWO2009110341A1 (ja) | 2011-07-14 |
TW201001523A (en) | 2010-01-01 |
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