WO2009072352A1 - 洗浄液及び洗浄方法 - Google Patents

洗浄液及び洗浄方法 Download PDF

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Publication number
WO2009072352A1
WO2009072352A1 PCT/JP2008/068568 JP2008068568W WO2009072352A1 WO 2009072352 A1 WO2009072352 A1 WO 2009072352A1 JP 2008068568 W JP2008068568 W JP 2008068568W WO 2009072352 A1 WO2009072352 A1 WO 2009072352A1
Authority
WO
WIPO (PCT)
Prior art keywords
cleaning
cleaning liquid
liquid
disclosed
solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/068568
Other languages
English (en)
French (fr)
Inventor
Tomoya Kumagai
Jun Koshiyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of WO2009072352A1 publication Critical patent/WO2009072352A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • C11D1/66—Non-ionic compounds
    • C11D1/72—Ethers of polyoxyalkylene glycols
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/20—Organic compounds containing oxygen
    • C11D3/2072—Aldehydes-ketones
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/43—Solvents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)

Abstract

　安全性が高く洗浄性能にも優れた洗浄液及びこれを用いた洗浄方法を提供する。 　光学レンズ部とウェーハステージ上に載置した露光対象物との間を液浸媒体で満たして露光を行う液浸露光装置の洗浄に使用される洗浄液として、（ａ）界面活性剤、及び（ｂ）ラクトン系溶剤を含有し、（ｂ）ラクトン系溶剤の含有量が６０質量％以上である洗浄液を用いる。この洗浄液は、さらに、（ｃ）液浸媒体、（ｄ）水溶性有機溶剤、（ｅ）炭化水素系溶剤を含有していてもよい。
PCT/JP2008/068568 2007-12-05 2008-10-14 洗浄液及び洗浄方法 Ceased WO2009072352A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007314589A JP2009141050A (ja) 2007-12-05 2007-12-05 洗浄液及び洗浄方法
JP2007-314589 2007-12-05

Publications (1)

Publication Number Publication Date
WO2009072352A1 true WO2009072352A1 (ja) 2009-06-11

Family

ID=40717533

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/068568 Ceased WO2009072352A1 (ja) 2007-12-05 2008-10-14 洗浄液及び洗浄方法

Country Status (3)

Country Link
JP (1) JP2009141050A (ja)
TW (1) TW200925795A (ja)
WO (1) WO2009072352A1 (ja)

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0468095A (ja) * 1990-07-09 1992-03-03 Asahi Chem Ind Co Ltd フラックス洗浄剤
JPH0665769A (ja) * 1992-08-18 1994-03-08 Mitsubishi Kasei Corp 脱脂洗浄剤
JPH07331292A (ja) * 1994-06-15 1995-12-19 Tonen Corp 洗浄液組成物
JP2001164291A (ja) * 1999-12-09 2001-06-19 Japan Energy Corp ワックス・ピッチ用洗浄液組成物
JP2003082390A (ja) * 2001-09-12 2003-03-19 Neos Co Ltd レンズ及びプリズム製造工程用洗浄剤組成物
JP2005079222A (ja) * 2003-08-29 2005-03-24 Nikon Corp 光学部品の洗浄機構を搭載した液浸投影露光装置及び液浸光学部品洗浄方法
JP2007123775A (ja) * 2005-10-31 2007-05-17 Tokyo Ohka Kogyo Co Ltd 洗浄液および洗浄方法
WO2007060971A1 (ja) * 2005-11-22 2007-05-31 Tokyo Ohka Kogyo Co., Ltd. ホトリソグラフィ用洗浄液およびこれを用いた露光装置の洗浄方法
JP2007150102A (ja) * 2005-11-29 2007-06-14 Fujitsu Ltd 露光装置及び光学素子の洗浄方法

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0468095A (ja) * 1990-07-09 1992-03-03 Asahi Chem Ind Co Ltd フラックス洗浄剤
JPH0665769A (ja) * 1992-08-18 1994-03-08 Mitsubishi Kasei Corp 脱脂洗浄剤
JPH07331292A (ja) * 1994-06-15 1995-12-19 Tonen Corp 洗浄液組成物
JP2001164291A (ja) * 1999-12-09 2001-06-19 Japan Energy Corp ワックス・ピッチ用洗浄液組成物
JP2003082390A (ja) * 2001-09-12 2003-03-19 Neos Co Ltd レンズ及びプリズム製造工程用洗浄剤組成物
JP2005079222A (ja) * 2003-08-29 2005-03-24 Nikon Corp 光学部品の洗浄機構を搭載した液浸投影露光装置及び液浸光学部品洗浄方法
JP2007123775A (ja) * 2005-10-31 2007-05-17 Tokyo Ohka Kogyo Co Ltd 洗浄液および洗浄方法
WO2007060971A1 (ja) * 2005-11-22 2007-05-31 Tokyo Ohka Kogyo Co., Ltd. ホトリソグラフィ用洗浄液およびこれを用いた露光装置の洗浄方法
JP2007150102A (ja) * 2005-11-29 2007-06-14 Fujitsu Ltd 露光装置及び光学素子の洗浄方法

Also Published As

Publication number Publication date
JP2009141050A (ja) 2009-06-25
TW200925795A (en) 2009-06-16

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