WO2009066395A1 - プラズマ処理装置 - Google Patents

プラズマ処理装置 Download PDF

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Publication number
WO2009066395A1
WO2009066395A1 PCT/JP2007/072664 JP2007072664W WO2009066395A1 WO 2009066395 A1 WO2009066395 A1 WO 2009066395A1 JP 2007072664 W JP2007072664 W JP 2007072664W WO 2009066395 A1 WO2009066395 A1 WO 2009066395A1
Authority
WO
WIPO (PCT)
Prior art keywords
pipe line
reaction pipe
electrolyte solution
supply means
gas
Prior art date
Application number
PCT/JP2007/072664
Other languages
English (en)
French (fr)
Inventor
Ryohei Itatani
Original Assignee
Adtec Plasma Technology Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Adtec Plasma Technology Co., Ltd. filed Critical Adtec Plasma Technology Co., Ltd.
Priority to PCT/JP2007/072664 priority Critical patent/WO2009066395A1/ja
Priority to JP2009542451A priority patent/JP5194026B2/ja
Publication of WO2009066395A1 publication Critical patent/WO2009066395A1/ja

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B01D53/326—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 in electrochemical cells
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analytical Chemistry (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Treating Waste Gases (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

　上下方向にのびる反応管路４と、反応管路の軸方向に、反応管路の内部空間が介在するように間隔をあけて配置された一対の放電電極５、６と、一対の放電電極に電圧を印加する電源１３と、反応管路の上部から水Ｗを供給し、反応管路の内壁面に沿って流し、反応管路の下端開口２から排出させる給水手段９、１８と、被処理ガスＧを反応管路内に流入させ、反応管路内を通過させる被処理ガス供給手段８と、反応管路の上部から反応管路内に電解液を供給する電解液供給手段１１、１１ａと、電源および電解液供給手段を制御し、電解液供給手段から電解液を供給して一対の放電電極間に電流路を形成した後、電解液供給手段からの電解液の供給を停止して電流路を遮断することによって放電を誘発させる制御手段１４を備える。反応管路内における被処理ガスの流入部の近傍に、隘路部１５およびその下側に続く拡張部１６が設けられる。
PCT/JP2007/072664 2007-11-22 2007-11-22 プラズマ処理装置 WO2009066395A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
PCT/JP2007/072664 WO2009066395A1 (ja) 2007-11-22 2007-11-22 プラズマ処理装置
JP2009542451A JP5194026B2 (ja) 2007-11-22 2007-11-22 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2007/072664 WO2009066395A1 (ja) 2007-11-22 2007-11-22 プラズマ処理装置

Publications (1)

Publication Number Publication Date
WO2009066395A1 true WO2009066395A1 (ja) 2009-05-28

Family

ID=40667232

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/072664 WO2009066395A1 (ja) 2007-11-22 2007-11-22 プラズマ処理装置

Country Status (2)

Country Link
JP (1) JP5194026B2 (ja)
WO (1) WO2009066395A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013024247A1 (en) * 2011-08-17 2013-02-21 Edwards Limited Apparatus for treating a gas stream
JP2013107048A (ja) * 2011-11-22 2013-06-06 Clean Technology Co Ltd 排ガス処理装置の起動方法
CN111587477A (zh) * 2017-11-22 2020-08-25 Ｃｓｋ股份有限公司 气体处理设备

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5701525B2 (ja) * 2010-07-09 2015-04-15 エドワーズ株式会社 除害装置及び除害システム

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3069700B1 (ja) * 1999-07-22 2000-07-24 静岡大学長 放電容器及びその放電容器を備えたプラズマラジカル生成装置
JP2000346565A (ja) * 1999-06-10 2000-12-15 Yoshikazu Kumihigashi 急速冷却塔
WO2001091896A1 (fr) * 2000-05-29 2001-12-06 Three Tec Co., Ltd. Appareil de traitement d'objets et dispositif a plasma dote de cet appareil

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4107959B2 (ja) * 2002-12-27 2008-06-25 株式会社アドテック プラズマ テクノロジー 放電の始動方法、この始動方法を利用した被処理物の処理方法、及びこの始動方法を利用した被処理物の処理装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000346565A (ja) * 1999-06-10 2000-12-15 Yoshikazu Kumihigashi 急速冷却塔
JP3069700B1 (ja) * 1999-07-22 2000-07-24 静岡大学長 放電容器及びその放電容器を備えたプラズマラジカル生成装置
WO2001091896A1 (fr) * 2000-05-29 2001-12-06 Three Tec Co., Ltd. Appareil de traitement d'objets et dispositif a plasma dote de cet appareil

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013024247A1 (en) * 2011-08-17 2013-02-21 Edwards Limited Apparatus for treating a gas stream
US9512518B2 (en) 2011-08-17 2016-12-06 Edwards Limited Apparatus for treating a gas stream
TWI563117B (en) * 2011-08-17 2016-12-21 Edwards Ltd Apparatus for treating a gas stream
JP2013107048A (ja) * 2011-11-22 2013-06-06 Clean Technology Co Ltd 排ガス処理装置の起動方法
CN111587477A (zh) * 2017-11-22 2020-08-25 Ｃｓｋ股份有限公司 气体处理设备
CN111587477B (zh) * 2017-11-22 2024-02-02 Ｃｓｋ股份有限公司 气体处理设备

Also Published As

Publication number Publication date
JPWO2009066395A1 (ja) 2011-03-31
JP5194026B2 (ja) 2013-05-08

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