WO2009057700A1 - 転写方法及び転写装置 - Google Patents

転写方法及び転写装置 Download PDF

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Publication number
WO2009057700A1
WO2009057700A1 PCT/JP2008/069769 JP2008069769W WO2009057700A1 WO 2009057700 A1 WO2009057700 A1 WO 2009057700A1 JP 2008069769 W JP2008069769 W JP 2008069769W WO 2009057700 A1 WO2009057700 A1 WO 2009057700A1
Authority
WO
WIPO (PCT)
Prior art keywords
coating
transfer
die
coating film
film
Prior art date
Application number
PCT/JP2008/069769
Other languages
English (en)
French (fr)
Inventor
Mitsuaki Serizawa
Masayuki Yagi
Original Assignee
Toshiba Kikai Kabushiki Kaisha
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Kikai Kabushiki Kaisha filed Critical Toshiba Kikai Kabushiki Kaisha
Priority to KR1020107009448A priority Critical patent/KR101187162B1/ko
Priority to EP08843423.8A priority patent/EP2208608B1/en
Priority to US12/740,816 priority patent/US20100229790A1/en
Publication of WO2009057700A1 publication Critical patent/WO2009057700A1/ja

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/04—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
    • B29C59/046—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts for layered or coated substantially flat surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/026—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2035—Exposure; Apparatus therefor simultaneous coating and exposure; using a belt mask, e.g. endless
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/263—Preparing and using a stamper, e.g. pressing or injection molding substrates
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/265—Apparatus for the mass production of optical record carriers, e.g. complete production stations, transport systems

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)

Abstract

繰出部（４０）から繰出されたベースフィルム（４１）に間欠塗工部（１０）の塗工ダイ（２０）から樹脂を間欠的に吐出してベースフィルム（４１）に間欠的に塗布膜（４３）を形成する。この間欠的に形成された塗布膜（４３）は、この塗布膜（４３）の塗工動作と同期して作動する転写部（４４）へ移動し、型ロール（４６）に設けられた型（４５）により転写される。転写された塗布膜（４３）は、紫外線照射装置（４８）により硬化され、巻取部（４９）に巻き取られる。
PCT/JP2008/069769 2007-10-30 2008-10-30 転写方法及び転写装置 WO2009057700A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020107009448A KR101187162B1 (ko) 2007-10-30 2008-10-30 전사 방법 및 전사 장치
EP08843423.8A EP2208608B1 (en) 2007-10-30 2008-10-30 Transfer method and transfer device
US12/740,816 US20100229790A1 (en) 2007-10-30 2008-10-30 Transfer method and transfer apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-281043 2007-10-30
JP2007281043A JP4836922B2 (ja) 2007-10-30 2007-10-30 転写方法及び転写装置

Publications (1)

Publication Number Publication Date
WO2009057700A1 true WO2009057700A1 (ja) 2009-05-07

Family

ID=40591084

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/069769 WO2009057700A1 (ja) 2007-10-30 2008-10-30 転写方法及び転写装置

Country Status (6)

Country Link
US (1) US20100229790A1 (ja)
EP (1) EP2208608B1 (ja)
JP (1) JP4836922B2 (ja)
KR (1) KR101187162B1 (ja)
TW (1) TW200940324A (ja)
WO (1) WO2009057700A1 (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5483251B2 (ja) * 2009-07-10 2014-05-07 株式会社ニコン パターン形成装置、パターン形成方法、デバイス製造装置、及びデバイス製造方法
JP5962058B2 (ja) * 2012-02-28 2016-08-03 富士ゼロックス株式会社 レンズ製造装置
JP2015085659A (ja) * 2013-11-01 2015-05-07 Ｊｘ日鉱日石エネルギー株式会社 凹凸パターンを有する帯状のフィルム部材の製造方法及び製造装置
JP2015181981A (ja) * 2014-03-20 2015-10-22 Ｊｘ日鉱日石エネルギー株式会社 帯状のフィルム基材上に不連続なパターンを有する塗膜を形成するための塗布装置及び塗膜形成方法
JP6157391B2 (ja) * 2014-03-20 2017-07-05 Ｊｘｔｇエネルギー株式会社 帯状のフィルム基材上に不連続な塗膜を形成するための塗布装置及び塗布方法
JP2015181979A (ja) * 2014-03-20 2015-10-22 Ｊｘ日鉱日石エネルギー株式会社 帯状のフィルム基材の長手方向及び幅方向において不連続な塗膜を形成できる塗布装置及び塗膜形成方法
WO2015064685A1 (ja) * 2013-11-01 2015-05-07 Ｊｘ日鉱日石エネルギー株式会社 帯状のフィルム基材上に不連続なパターンを有する塗膜を形成するための塗布装置、及び凹凸パターンを有する帯状のフィルム部材の製造方法
JP2017030188A (ja) 2015-07-30 2017-02-09 東芝機械株式会社 フィルムのパターン転写装置およびフィルムのパターン転写方法
US10073718B2 (en) * 2016-01-15 2018-09-11 Intel Corporation Systems, methods and devices for determining work placement on processor cores
JP6606449B2 (ja) * 2016-03-23 2019-11-13 東芝機械株式会社 転写装置および転写方法
JP6751602B2 (ja) * 2016-06-23 2020-09-09 洋治 杉山 転写加工方法、転写加工装置、及び転写加工製品
JP7217440B2 (ja) * 2019-05-15 2023-02-03 パナソニックＩｐマネジメント株式会社 フィルム構造体の製造方法および製造装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002045762A (ja) 2000-08-04 2002-02-12 Toshiba Mach Co Ltd 基材表面に間欠的に塗布剤を塗布する装置
JP2003181918A (ja) * 2001-12-19 2003-07-03 Dainippon Printing Co Ltd 賦型用ローラ、賦型された表面を有する積層フィルムの製造方法、および賦型された積層フィルム
JP2005035119A (ja) * 2003-07-18 2005-02-10 Fuji Photo Film Co Ltd エンボスロールの製法及び該エンボスロールを使用した転写シートの製法
JP2006503694A (ja) * 2002-10-23 2006-02-02 スリーエム イノベイティブ プロパティズ カンパニー 膨張可能チャンバ装置を備えた塗布ダイ
JP2007260485A (ja) * 2006-03-27 2007-10-11 Toray Ind Inc 塗布方法、塗布装置および液晶ディスプレイ用部材の製造方法
JP2008194976A (ja) * 2007-02-14 2008-08-28 Hitachi Maxell Ltd 光学シート用成形体の製造方法、光学シート用成形体の製造装置、及び光学シート用成形体

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JP4772465B2 (ja) * 2004-11-26 2011-09-14 パナソニック株式会社 薄膜の間欠塗工方法
US7611582B2 (en) * 2005-02-25 2009-11-03 The Procter & Gamble Company Apparatus and method for the transfer of a fluid to a moving web material
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Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002045762A (ja) 2000-08-04 2002-02-12 Toshiba Mach Co Ltd 基材表面に間欠的に塗布剤を塗布する装置
JP2003181918A (ja) * 2001-12-19 2003-07-03 Dainippon Printing Co Ltd 賦型用ローラ、賦型された表面を有する積層フィルムの製造方法、および賦型された積層フィルム
JP2006503694A (ja) * 2002-10-23 2006-02-02 スリーエム イノベイティブ プロパティズ カンパニー 膨張可能チャンバ装置を備えた塗布ダイ
JP2005035119A (ja) * 2003-07-18 2005-02-10 Fuji Photo Film Co Ltd エンボスロールの製法及び該エンボスロールを使用した転写シートの製法
JP2007260485A (ja) * 2006-03-27 2007-10-11 Toray Ind Inc 塗布方法、塗布装置および液晶ディスプレイ用部材の製造方法
JP2008194976A (ja) * 2007-02-14 2008-08-28 Hitachi Maxell Ltd 光学シート用成形体の製造方法、光学シート用成形体の製造装置、及び光学シート用成形体

Also Published As

Publication number Publication date
JP4836922B2 (ja) 2011-12-14
EP2208608A4 (en) 2014-09-24
TW200940324A (en) 2009-10-01
KR101187162B1 (ko) 2012-09-28
EP2208608B1 (en) 2020-08-26
KR20100077185A (ko) 2010-07-07
JP2009107193A (ja) 2009-05-21
US20100229790A1 (en) 2010-09-16
EP2208608A1 (en) 2010-07-21

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