WO2009037941A1 - 基板の処理方法及び基板の処理システム - Google Patents

基板の処理方法及び基板の処理システム Download PDF

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Publication number
WO2009037941A1
WO2009037941A1 PCT/JP2008/064913 JP2008064913W WO2009037941A1 WO 2009037941 A1 WO2009037941 A1 WO 2009037941A1 JP 2008064913 W JP2008064913 W JP 2008064913W WO 2009037941 A1 WO2009037941 A1 WO 2009037941A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
substrate processing
cassette
processing apparatus
processing
Prior art date
Application number
PCT/JP2008/064913
Other languages
English (en)
French (fr)
Inventor
Wataru Tsukinoki
Yuichi Yamamoto
Original Assignee
Tokyo Electron Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2008153422A external-priority patent/JP5065167B2/ja
Application filed by Tokyo Electron Limited filed Critical Tokyo Electron Limited
Priority to US12/733,614 priority Critical patent/US8731701B2/en
Priority to CN2008801081121A priority patent/CN101802978B/zh
Priority to KR1020107005732A priority patent/KR101443420B1/ko
Publication of WO2009037941A1 publication Critical patent/WO2009037941A1/ja

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67276—Production flow monitoring, e.g. for increasing throughput
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67769—Storage means

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Automation & Control Theory (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

　カセット載置部にカセットが載置された後、制御装置から基板の処理装置に、カセット内の基板の処理の開始を指示する。その後、制御装置から基板の処理装置に、基板が処理終了時に搬送されるカセット載置部のカセットを指示する。基板の残りの処理工程数が予め定められた設定数になったときに、その基板の処理終了時の搬送先のカセットが指示されていない場合には、基板の処理装置から警告が出される。当該警告は、基板の処理装置から制御装置に通知され、制御装置は、基板の搬送先のカセットを指示する。
PCT/JP2008/064913 2007-09-20 2008-08-21 基板の処理方法及び基板の処理システム WO2009037941A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US12/733,614 US8731701B2 (en) 2007-09-20 2008-08-21 Substrate treatment method and substrate treatment system
CN2008801081121A CN101802978B (zh) 2007-09-20 2008-08-21 基板处理方法和基板处理系统
KR1020107005732A KR101443420B1 (ko) 2007-09-20 2008-08-21 기판의 처리 방법 및 기판의 처리 시스템

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007243457 2007-09-20
JP2007-243457 2007-09-20
JP2008153422A JP5065167B2 (ja) 2007-09-20 2008-06-11 基板の処理方法及び基板の処理システム
JP2008-153422 2008-06-11

Publications (1)

Publication Number Publication Date
WO2009037941A1 true WO2009037941A1 (ja) 2009-03-26

Family

ID=40467762

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/064913 WO2009037941A1 (ja) 2007-09-20 2008-08-21 基板の処理方法及び基板の処理システム

Country Status (1)

Country Link
WO (1) WO2009037941A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109716250A (zh) * 2016-09-20 2019-05-03 株式会社斯库林集团 基板处理管理装置、基板处理管理方法及基板处理管理程序

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002260995A (ja) * 2001-03-05 2002-09-13 Tokyo Electron Ltd 基板処理装置及び基板処理装置における基板回収方法
JP2003037148A (ja) * 2001-07-25 2003-02-07 Tokyo Electron Ltd 処理システム及び被処理体の管理方法
JP2004087795A (ja) * 2002-08-27 2004-03-18 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理システム
JP2004214350A (ja) * 2002-12-27 2004-07-29 Dainippon Screen Mfg Co Ltd 基板処理システム、基板処理装置、および、基板処理システムの管理方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002260995A (ja) * 2001-03-05 2002-09-13 Tokyo Electron Ltd 基板処理装置及び基板処理装置における基板回収方法
JP2003037148A (ja) * 2001-07-25 2003-02-07 Tokyo Electron Ltd 処理システム及び被処理体の管理方法
JP2004087795A (ja) * 2002-08-27 2004-03-18 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理システム
JP2004214350A (ja) * 2002-12-27 2004-07-29 Dainippon Screen Mfg Co Ltd 基板処理システム、基板処理装置、および、基板処理システムの管理方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109716250A (zh) * 2016-09-20 2019-05-03 株式会社斯库林集团 基板处理管理装置、基板处理管理方法及基板处理管理程序

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