WO2009037814A1 - 光起電力素子およびその製造方法 - Google Patents
光起電力素子およびその製造方法 Download PDFInfo
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- WO2009037814A1 WO2009037814A1 PCT/JP2008/002496 JP2008002496W WO2009037814A1 WO 2009037814 A1 WO2009037814 A1 WO 2009037814A1 JP 2008002496 W JP2008002496 W JP 2008002496W WO 2009037814 A1 WO2009037814 A1 WO 2009037814A1
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- Prior art keywords
- thin films
- layer
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- crystalline
- amorphous thin
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- 238000004519 manufacturing process Methods 0.000 title 1
- 239000010409 thin film Substances 0.000 abstract 10
- 229910021417 amorphous silicon Inorganic materials 0.000 abstract 3
- 239000010408 film Substances 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 1
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- H01L31/0376—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors
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- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PIN type, e.g. amorphous silicon PIN solar cells
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- H01L31/02—Details
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- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
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- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/546—Polycrystalline silicon PV cells
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- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
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- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
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- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Energy (AREA)
- Photovoltaic Devices (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
光起電力素子(10)は、p層(3)、i層(4)、n層(5)および電極(6)を透明導電膜(2)が形成された絶縁基板(1)上に順次積層した構造からなる。p層(3)は、p型a-Si:Hからなり、n層(5)は、n型a-Si:Hからなる。i層(4)は、複数の非晶質薄膜(41)と複数の結晶薄膜(42)とからなる。そして、複数の非晶質薄膜(41)および複数の結晶薄膜(42)は、非晶質薄膜(41)および結晶薄膜(42)が相互に接するように絶縁基板(1)に略垂直な方向に積層される。非晶質薄膜(41)は、i型a-Si:Hからなり、結晶薄膜(42)は、i型poly-Siからなる。そして、i層(4)は、300nm~1000nmの膜厚を有し、非晶質薄膜(41)および結晶薄膜(42)の各々は、10nm~20nmの膜厚を有する。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007245287A JP2009076742A (ja) | 2007-09-21 | 2007-09-21 | 光起電力素子およびその製造方法 |
JP2007-245287 | 2007-09-21 |
Publications (1)
Publication Number | Publication Date |
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WO2009037814A1 true WO2009037814A1 (ja) | 2009-03-26 |
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ID=40467643
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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PCT/JP2008/002496 WO2009037814A1 (ja) | 2007-09-21 | 2008-09-10 | 光起電力素子およびその製造方法 |
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JP (1) | JP2009076742A (ja) |
WO (1) | WO2009037814A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101100109B1 (ko) * | 2009-06-12 | 2011-12-29 | 한국철강 주식회사 | 광기전력 장치의 제조 방법 |
KR101106480B1 (ko) * | 2009-06-12 | 2012-01-20 | 한국철강 주식회사 | 광기전력 장치의 제조 방법 |
US9105769B2 (en) | 2013-09-12 | 2015-08-11 | International Business Machines Corporation | Shallow junction photovoltaic devices |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08172208A (ja) * | 1994-12-16 | 1996-07-02 | Crystal Device:Kk | 超格子装置およびその製造方法 |
JPH10242493A (ja) * | 1997-02-28 | 1998-09-11 | Mitsubishi Heavy Ind Ltd | 太陽電池 |
JP2002076027A (ja) * | 2000-09-01 | 2002-03-15 | Japan Science & Technology Corp | 有機共蒸着膜の製造方法 |
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2007
- 2007-09-21 JP JP2007245287A patent/JP2009076742A/ja active Pending
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2008
- 2008-09-10 WO PCT/JP2008/002496 patent/WO2009037814A1/ja active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08172208A (ja) * | 1994-12-16 | 1996-07-02 | Crystal Device:Kk | 超格子装置およびその製造方法 |
JPH10242493A (ja) * | 1997-02-28 | 1998-09-11 | Mitsubishi Heavy Ind Ltd | 太陽電池 |
JP2002076027A (ja) * | 2000-09-01 | 2002-03-15 | Japan Science & Technology Corp | 有機共蒸着膜の製造方法 |
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Publication number | Publication date |
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JP2009076742A (ja) | 2009-04-09 |
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