WO2009034924A1 - 磁気粘性研磨用スラリー組成物 - Google Patents

磁気粘性研磨用スラリー組成物 Download PDF

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Publication number
WO2009034924A1
WO2009034924A1 PCT/JP2008/066065 JP2008066065W WO2009034924A1 WO 2009034924 A1 WO2009034924 A1 WO 2009034924A1 JP 2008066065 W JP2008066065 W JP 2008066065W WO 2009034924 A1 WO2009034924 A1 WO 2009034924A1
Authority
WO
WIPO (PCT)
Prior art keywords
slurry composition
polishing
dispersion medium
polishing slurry
magnetorheological polishing
Prior art date
Application number
PCT/JP2008/066065
Other languages
English (en)
French (fr)
Inventor
Takahiko Okazaki
Original Assignee
Bando Chemical Industries, Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bando Chemical Industries, Ltd. filed Critical Bando Chemical Industries, Ltd.
Publication of WO2009034924A1 publication Critical patent/WO2009034924A1/ja

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1472—Non-aqueous liquid suspensions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Soft Magnetic Materials (AREA)

Abstract

本発明は、長期間に渡って磁性粒子や砥粒の分離・沈降が生じず、かつ、錆の発生を防止できるため、貯蔵安定性及び研磨品質安定性に優れるとともに、研磨加工時の摩擦熱による分散媒の揮発を抑制できるため長寿命であり、更には研磨後に容易に水洗浄が可能であるため取扱いも容易である、磁気粘性研磨用スラリー組成物を提供することを目的とするものであり、本発明の磁気粘性研磨用スラリー組成物は、分散媒、磁性粒子及び砥粒を含む磁気粘性研磨用スラリー組成物であって、上記分散媒は、水酸基価３００～８００ＫＯＨｍｇ／ｇの水溶性多価アルコールであることを特徴とする。
PCT/JP2008/066065 2007-09-10 2008-09-05 磁気粘性研磨用スラリー組成物 WO2009034924A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007234684 2007-09-10
JP2007-234684 2007-09-10

Publications (1)

Publication Number Publication Date
WO2009034924A1 true WO2009034924A1 (ja) 2009-03-19

Family

ID=40451932

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/066065 WO2009034924A1 (ja) 2007-09-10 2008-09-05 磁気粘性研磨用スラリー組成物

Country Status (1)

Country Link
WO (1) WO2009034924A1 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014083647A (ja) * 2012-10-25 2014-05-12 Avanstrate Inc ガラス基板研磨用磁性流動体
WO2015152383A1 (ja) * 2014-04-04 2015-10-08 株式会社フジミインコーポレーテッド 硬質材料の研磨用組成物
WO2016052161A1 (ja) * 2014-09-29 2016-04-07 株式会社フジミインコーポレーテッド 硬質金属材料研磨用砥粒、研磨用組成物および硬質金属製品製造方法
CN113977361A (zh) * 2021-10-29 2022-01-28 哈尔滨工业大学 一种基于激光辐照降低磁流变液粘度的小球头磁流变抛光工艺方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH058169A (ja) * 1991-07-02 1993-01-19 Daido Steel Co Ltd 湿式磁気研磨方法および研磨材
JP2002256246A (ja) * 2001-02-28 2002-09-11 Kansai Paint Co Ltd 熱硬化型接着剤
JP2007045878A (ja) * 2005-08-08 2007-02-22 Utsunomiya Univ 磁性砥粒
JP2007167969A (ja) * 2005-12-19 2007-07-05 Fdk Corp スクラッチ加工方法およびその加工装置
JP2007227525A (ja) * 2006-02-22 2007-09-06 Fujifilm Corp 貴金属用研磨液、及び、化学的機械的研磨方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH058169A (ja) * 1991-07-02 1993-01-19 Daido Steel Co Ltd 湿式磁気研磨方法および研磨材
JP2002256246A (ja) * 2001-02-28 2002-09-11 Kansai Paint Co Ltd 熱硬化型接着剤
JP2007045878A (ja) * 2005-08-08 2007-02-22 Utsunomiya Univ 磁性砥粒
JP2007167969A (ja) * 2005-12-19 2007-07-05 Fdk Corp スクラッチ加工方法およびその加工装置
JP2007227525A (ja) * 2006-02-22 2007-09-06 Fujifilm Corp 貴金属用研磨液、及び、化学的機械的研磨方法

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014083647A (ja) * 2012-10-25 2014-05-12 Avanstrate Inc ガラス基板研磨用磁性流動体
WO2015152383A1 (ja) * 2014-04-04 2015-10-08 株式会社フジミインコーポレーテッド 硬質材料の研磨用組成物
CN106164208A (zh) * 2014-04-04 2016-11-23 福吉米株式会社 硬质材料的研磨用组合物
JPWO2015152383A1 (ja) * 2014-04-04 2017-04-13 株式会社フジミインコーポレーテッド 硬質材料の研磨用組成物
WO2016052161A1 (ja) * 2014-09-29 2016-04-07 株式会社フジミインコーポレーテッド 硬質金属材料研磨用砥粒、研磨用組成物および硬質金属製品製造方法
CN113977361A (zh) * 2021-10-29 2022-01-28 哈尔滨工业大学 一种基于激光辐照降低磁流变液粘度的小球头磁流变抛光工艺方法
CN113977361B (zh) * 2021-10-29 2022-08-16 哈尔滨工业大学 一种基于激光辐照降低磁流变液粘度的小球头磁流变抛光工艺方法

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