WO2009020081A1 - 排ガス処理方法およびその装置 - Google Patents

排ガス処理方法およびその装置 Download PDF

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Publication number
WO2009020081A1
WO2009020081A1 PCT/JP2008/063918 JP2008063918W WO2009020081A1 WO 2009020081 A1 WO2009020081 A1 WO 2009020081A1 JP 2008063918 W JP2008063918 W JP 2008063918W WO 2009020081 A1 WO2009020081 A1 WO 2009020081A1
Authority
WO
WIPO (PCT)
Prior art keywords
exhaust gas
cylindrical wall
gas treating
inner face
thermal decomposition
Prior art date
Application number
PCT/JP2008/063918
Other languages
English (en)
French (fr)
Inventor
Akifumi Nishiwaki
Toshitada Shimozaki
Original Assignee
Akifumi Nishiwaki
Toshitada Shimozaki
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Akifumi Nishiwaki, Toshitada Shimozaki filed Critical Akifumi Nishiwaki
Publication of WO2009020081A1 publication Critical patent/WO2009020081A1/ja

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/005—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by heat treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Treating Waste Gases (AREA)

Abstract

　排ガス処理装置Ａ１の筒状壁３によって囲まれている排ガス処理用のチャンバ１内に排ガスを導入させて、この排ガスを加熱して熱分解するときに、チャンバ１内にバリア形成用の気体を導入させて筒状壁３の内面に沿わせて流れさせることにより、筒状壁３の内面を上記気体の流れによって覆う。このことによって、筒状壁３が高温腐食すること、および熱分解時に生成された粉体が筒状壁３の内面に付着して堆積することが好適に抑制される。
PCT/JP2008/063918 2007-08-03 2008-08-03 排ガス処理方法およびその装置 WO2009020081A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-202779 2007-08-03
JP2007202779A JP2009034636A (ja) 2007-08-03 2007-08-03 排ガス処理方法およびその装置

Publications (1)

Publication Number Publication Date
WO2009020081A1 true WO2009020081A1 (ja) 2009-02-12

Family

ID=40341315

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/063918 WO2009020081A1 (ja) 2007-08-03 2008-08-03 排ガス処理方法およびその装置

Country Status (2)

Country Link
JP (1) JP2009034636A (ja)
WO (1) WO2009020081A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107429913A (zh) * 2015-03-30 2017-12-01 爱德华兹有限公司 辐射式燃烧器
CN108136310A (zh) * 2015-09-01 2018-06-08 爱德华兹有限公司 减排装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5699022B2 (ja) * 2011-04-07 2015-04-08 岩谷産業株式会社 排ガス処理装置及び排ガス処理方法
KR101876443B1 (ko) * 2017-11-16 2018-08-09 청해이엔브이 주식회사 전자기유도가열식 가스제거장치 및 이를 구비한 복합가스 처리시스템

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001502604A (ja) * 1996-12-31 2001-02-27 エーティーエムアイ エコシス コーポレーション 半導体製造排気の酸化処理のための排気流処理システム
JP2002153726A (ja) * 2000-11-21 2002-05-28 Akiji Nishiwaki 排ガス処理装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001502604A (ja) * 1996-12-31 2001-02-27 エーティーエムアイ エコシス コーポレーション 半導体製造排気の酸化処理のための排気流処理システム
JP2002153726A (ja) * 2000-11-21 2002-05-28 Akiji Nishiwaki 排ガス処理装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107429913A (zh) * 2015-03-30 2017-12-01 爱德华兹有限公司 辐射式燃烧器
US20180073732A1 (en) * 2015-03-30 2018-03-15 Edwards Limited Radiant burner
JP2018510317A (ja) * 2015-03-30 2018-04-12 エドワーズ リミテッド 放射バーナー
CN107429913B (zh) * 2015-03-30 2020-11-24 爱德华兹有限公司 辐射式燃烧器
CN108136310A (zh) * 2015-09-01 2018-06-08 爱德华兹有限公司 减排装置
CN108136310B (zh) * 2015-09-01 2021-10-29 爱德华兹有限公司 减排装置

Also Published As

Publication number Publication date
JP2009034636A (ja) 2009-02-19

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