WO2009004795A1 - 熱インプリント用樹脂溶液、熱インプリント用樹脂薄膜およびこれらの製造方法 - Google Patents

熱インプリント用樹脂溶液、熱インプリント用樹脂薄膜およびこれらの製造方法 Download PDF

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Publication number
WO2009004795A1
WO2009004795A1 PCT/JP2008/001730 JP2008001730W WO2009004795A1 WO 2009004795 A1 WO2009004795 A1 WO 2009004795A1 JP 2008001730 W JP2008001730 W JP 2008001730W WO 2009004795 A1 WO2009004795 A1 WO 2009004795A1
Authority
WO
WIPO (PCT)
Prior art keywords
thin film
resin
resin solution
thermal imprint
production
Prior art date
Application number
PCT/JP2008/001730
Other languages
English (en)
French (fr)
Inventor
Yoshiaki Takaya
Takuro Satsuka
Go Nagai
Yoshihisa Hayashida
Takahisa Kusuura
Anupam Mitra
Original Assignee
Maruzen Petrochemical Co., Ltd.
Scivax Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Maruzen Petrochemical Co., Ltd., Scivax Corporation filed Critical Maruzen Petrochemical Co., Ltd.
Priority to US12/667,337 priority Critical patent/US20100189984A1/en
Priority to EP08790129A priority patent/EP2174983A4/en
Publication of WO2009004795A1 publication Critical patent/WO2009004795A1/ja

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/01—Hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L45/00—Compositions of homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic ring system; Compositions of derivatives of such polymers

Abstract

　熱インプリントプロセスに実質的に適用可能な樹脂溶液、その薄膜およびこれらの製造方法を提供する。熱インプリント用途に供される薄膜を形成するための熱インプリント用樹脂溶液であって、熱可塑性樹脂と当該樹脂を溶解する少なくとも１種類以上の溶剤とを含み、粒径０．２μｍ以上の異物の含有量が３０００個／ｃｍ３未満に調製する。また、この熱インプリント用樹脂溶液から薄膜を形成する際、薄膜の残存揮発分を０．２５％以下にする。
PCT/JP2008/001730 2007-07-04 2008-07-02 熱インプリント用樹脂溶液、熱インプリント用樹脂薄膜およびこれらの製造方法 WO2009004795A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US12/667,337 US20100189984A1 (en) 2007-07-04 2008-07-02 Thermal-imprinting resin solution, thermal-imprinting resin thin film, and method of manufacturing those
EP08790129A EP2174983A4 (en) 2007-07-04 2008-07-02 RESIN SOLUTION FOR HEAT PRESENTATIONS, RESIN THIN FILM FOR HEAT PRESERVATIONS, AND METHOD FOR PRODUCING THE RESIN SOLUTION AND RESIN THIN FILM

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007175962A JP5394619B2 (ja) 2007-07-04 2007-07-04 熱インプリント方法
JP2007-175962 2007-07-04

Publications (1)

Publication Number Publication Date
WO2009004795A1 true WO2009004795A1 (ja) 2009-01-08

Family

ID=40225860

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/001730 WO2009004795A1 (ja) 2007-07-04 2008-07-02 熱インプリント用樹脂溶液、熱インプリント用樹脂薄膜およびこれらの製造方法

Country Status (5)

Country Link
US (1) US20100189984A1 (ja)
EP (1) EP2174983A4 (ja)
JP (1) JP5394619B2 (ja)
KR (1) KR20100050498A (ja)
WO (1) WO2009004795A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015201652A (ja) * 2009-08-07 2015-11-12 綜研化学株式会社 インプリント用樹脂製モールドおよびその製造方法
CN113150422A (zh) * 2021-04-20 2021-07-23 新沂崚峻光电科技有限公司 一种纳米压印膜层的制备方法

Citations (9)

* Cited by examiner, † Cited by third party
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JPS6460048A (en) 1987-08-31 1989-03-07 Omron Tateisi Electronics Co Telephone set
US5772905A (en) 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
JP2001194532A (ja) 1999-10-27 2001-07-19 Kanegafuchi Chem Ind Co Ltd 光学フィルムおよびその製造方法
JP2003082017A (ja) 2001-09-12 2003-03-19 Maruzen Petrochem Co Ltd 環状オレフィン系共重合体の製造方法
JP2005272845A (ja) 2005-03-23 2005-10-06 Fuji Photo Film Co Ltd ポリマー溶液の濾過方法及び溶液製膜方法
JP2006205723A (ja) 2004-12-28 2006-08-10 Jsr Corp 樹脂成形体の表面加工方法、樹脂成形体および光学材料
JP2006346820A (ja) * 2005-06-16 2006-12-28 Yamagata Fujitsu Ltd ナノホール構造体及びその製造方法、スタンパ及びその製造方法、磁気記録媒体及びその製造方法、並びに、磁気記録装置及び磁気記録方法
WO2007029606A1 (ja) * 2005-09-06 2007-03-15 Toray Industries, Inc. 光拡散フィルムおよびそれを用いた面光源
WO2007066712A1 (ja) * 2005-12-09 2007-06-14 Scivax Corporation 熱インプリント用樹脂

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GB533353A (en) * 1938-05-04 1941-02-11 Kodak Ltd Improvements in or relating to resinous compositions
GB9608952D0 (en) * 1995-09-22 1996-07-03 Bnfl Fluorchem Ltd Coating compositions
JPH1060048A (ja) * 1996-08-23 1998-03-03 Nippon Zeon Co Ltd 環状オレフィン系重合体及びその製造方法
US6255396B1 (en) * 1999-09-09 2001-07-03 Baxter International Inc. Cycloolefin blends and method for solvent bonding polyolefins
JP2001194527A (ja) * 2000-01-14 2001-07-19 Fuji Photo Film Co Ltd ノルボルネン系樹脂組成物及び位相差板
US7034332B2 (en) * 2004-01-27 2006-04-25 Hewlett-Packard Development Company, L.P. Nanometer-scale memory device utilizing self-aligned rectifying elements and method of making
JP2006182011A (ja) * 2004-11-30 2006-07-13 Asahi Glass Co Ltd 光硬化性樹脂成型用モールドおよび該モールドを用いる硬化物の製造方法
US20090137771A1 (en) * 2005-08-11 2009-05-28 Satoshi Moriyama Resin composition

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6460048A (en) 1987-08-31 1989-03-07 Omron Tateisi Electronics Co Telephone set
US5772905A (en) 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
JP2001194532A (ja) 1999-10-27 2001-07-19 Kanegafuchi Chem Ind Co Ltd 光学フィルムおよびその製造方法
JP2003082017A (ja) 2001-09-12 2003-03-19 Maruzen Petrochem Co Ltd 環状オレフィン系共重合体の製造方法
JP2006205723A (ja) 2004-12-28 2006-08-10 Jsr Corp 樹脂成形体の表面加工方法、樹脂成形体および光学材料
JP2005272845A (ja) 2005-03-23 2005-10-06 Fuji Photo Film Co Ltd ポリマー溶液の濾過方法及び溶液製膜方法
JP2006346820A (ja) * 2005-06-16 2006-12-28 Yamagata Fujitsu Ltd ナノホール構造体及びその製造方法、スタンパ及びその製造方法、磁気記録媒体及びその製造方法、並びに、磁気記録装置及び磁気記録方法
WO2007029606A1 (ja) * 2005-09-06 2007-03-15 Toray Industries, Inc. 光拡散フィルムおよびそれを用いた面光源
WO2007066712A1 (ja) * 2005-12-09 2007-06-14 Scivax Corporation 熱インプリント用樹脂

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
JOURNAL OFMICROMECHANICS AND MICROENGINEERING, vol. 15, no. 2, 2005, pages 296 - 300
MATERIALS SCIENCE & ENGINEERING C, vol. 23, no. 1-2, 15 January 2003 (2003-01-15), pages 23 - 31
See also references of EP2174983A4

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015201652A (ja) * 2009-08-07 2015-11-12 綜研化学株式会社 インプリント用樹脂製モールドおよびその製造方法
CN113150422A (zh) * 2021-04-20 2021-07-23 新沂崚峻光电科技有限公司 一种纳米压印膜层的制备方法

Also Published As

Publication number Publication date
EP2174983A4 (en) 2010-11-03
EP2174983A1 (en) 2010-04-14
US20100189984A1 (en) 2010-07-29
JP2009013273A (ja) 2009-01-22
KR20100050498A (ko) 2010-05-13
JP5394619B2 (ja) 2014-01-22

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