WO2009001927A1 - 置換基を導入した環状化合物の製造方法及びフォトレジスト基材 - Google Patents

置換基を導入した環状化合物の製造方法及びフォトレジスト基材 Download PDF

Info

Publication number
WO2009001927A1
WO2009001927A1 PCT/JP2008/061731 JP2008061731W WO2009001927A1 WO 2009001927 A1 WO2009001927 A1 WO 2009001927A1 JP 2008061731 W JP2008061731 W JP 2008061731W WO 2009001927 A1 WO2009001927 A1 WO 2009001927A1
Authority
WO
WIPO (PCT)
Prior art keywords
cyclic compound
production
substituent introduced
photoresist substrate
formula
Prior art date
Application number
PCT/JP2008/061731
Other languages
English (en)
French (fr)
Inventor
Takanori Owada
Hirotoshi Ishii
Akinori Yomogita
Mitsuru Shibata
Norio Tomotsu
Original Assignee
Idemitsu Kosan Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Idemitsu Kosan Co., Ltd. filed Critical Idemitsu Kosan Co., Ltd.
Priority to JP2009520647A priority Critical patent/JPWO2009001927A1/ja
Publication of WO2009001927A1 publication Critical patent/WO2009001927A1/ja

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00—Preparation of carboxylic acid esters
    • C07C67/30—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group
    • C07C67/31—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by introduction of functional groups containing oxygen only in singly bound form
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/14—The ring being saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2602/00—Systems containing two condensed rings
    • C07C2602/36—Systems containing two condensed rings the rings having more than two atoms in common
    • C07C2602/42—Systems containing two condensed rings the rings having more than two atoms in common the bicyclo ring system containing seven carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/56—Ring systems containing bridged rings
    • C07C2603/58—Ring systems containing bridged rings containing three rings
    • C07C2603/70—Ring systems containing bridged rings containing three rings containing only six-membered rings
    • C07C2603/74—Adamantanes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/92—Systems containing at least three condensed rings with a condensed ring system consisting of at least two mutually uncondensed aromatic ring systems, linked by an annular structure formed by carbon chains on non-adjacent positions of the aromatic system, e.g. cyclophanes

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)

Abstract

　下記式（Ｉ）で表される構造を有する環状化合物と下記式（II）で表される化合物を縮合反応させて、式（Ｉ）の化合物に置換基（Ｒ基）を１つ以上導入した化合物を製造する方法において、縮合反応に、ナトリウム又はセシウムを含む無機塩基を使用することを特徴とするＲ基導入環状化合物の製造方法。
PCT/JP2008/061731 2007-06-28 2008-06-27 置換基を導入した環状化合物の製造方法及びフォトレジスト基材 WO2009001927A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009520647A JPWO2009001927A1 (ja) 2007-06-28 2008-06-27 置換基を導入した環状化合物の製造方法及びフォトレジスト基材

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007169992 2007-06-28
JP2007-169992 2007-06-28

Publications (1)

Publication Number Publication Date
WO2009001927A1 true WO2009001927A1 (ja) 2008-12-31

Family

ID=40185736

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/061731 WO2009001927A1 (ja) 2007-06-28 2008-06-27 置換基を導入した環状化合物の製造方法及びフォトレジスト基材

Country Status (3)

Country Link
JP (1) JPWO2009001927A1 (ja)
TW (1) TW200914417A (ja)
WO (1) WO2009001927A1 (ja)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11322656A (ja) * 1998-05-11 1999-11-24 Jsr Corp 新規なカリックスアレーン誘導体およびカリックスレゾルシナレーン誘導体、ならびに感光性組成物
JP2004191913A (ja) * 2002-10-15 2004-07-08 Idemitsu Kosan Co Ltd フォトレジスト基材及びその組成物
WO2005097725A1 (ja) * 2004-04-05 2005-10-20 Idemitsu Kosan Co., Ltd. カリックスレゾルシナレン化合物、フォトレジスト基材及びその組成物
WO2006129574A1 (ja) * 2005-06-01 2006-12-07 Idemitsu Kosan Co., Ltd. カリックスレゾルシナレン化合物、並びに、それからなるフォトレジスト基材及びその組成物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11322656A (ja) * 1998-05-11 1999-11-24 Jsr Corp 新規なカリックスアレーン誘導体およびカリックスレゾルシナレーン誘導体、ならびに感光性組成物
JP2004191913A (ja) * 2002-10-15 2004-07-08 Idemitsu Kosan Co Ltd フォトレジスト基材及びその組成物
WO2005097725A1 (ja) * 2004-04-05 2005-10-20 Idemitsu Kosan Co., Ltd. カリックスレゾルシナレン化合物、フォトレジスト基材及びその組成物
WO2006129574A1 (ja) * 2005-06-01 2006-12-07 Idemitsu Kosan Co., Ltd. カリックスレゾルシナレン化合物、並びに、それからなるフォトレジスト基材及びその組成物

Also Published As

Publication number Publication date
JPWO2009001927A1 (ja) 2010-08-26
TW200914417A (en) 2009-04-01

Similar Documents

Publication Publication Date Title
WO2008051826A3 (en) Purines as pkc-theta inhibitors
WO2009062059A3 (en) Isomeric purinones and 1h-imidazopyridinones as pkc-theta inhibitors
WO2008129912A1 (ja) フェニル基置換１，３，５－トリアジン化合物、その製造方法、およびこれを構成成分とする有機電界発光素子
WO2007125547A3 (en) Novel process for statins and its pharmaceutically acceptable salts thereof
WO2007109080A3 (en) Deuterated hepatitis c protease inhibitors
NO20084583L (no) Makrosykliske kinase-inhibitorer
MX2010001605A (es) Metodo para producir olefinas fluoradas.
GB0521508D0 (en) Organic compounds
WO2008153154A1 (ja) 環状化合物、フォトレジスト基材及びフォトレジスト組成物
NO20082116L (no) Kjemisk fremgangsmate for fremstilling av en amido-fenoksybenzosyreforbindelse
WO2008058235A3 (en) Processes for the preparation of cinacalcet
WO2007053192A3 (en) Multipodal tethers for high-density attachment of redox-active moieties to substrates
WO2007003295A3 (de) Verfahren zur herstellung von 3-arylmethylthio- und 3-heteroarylmethylthio-4,5- dihydro-isoxazolin-derivaten
MX2009001816A (es) Procedimiento para la produccion de acido d,l-2-hidroxi-4-alquilti o butirico.
WO2006094755A8 (en) Polyvinylammonium compound, method of manufacturing same, acidic solution containing said compound and method of electrolytically depositing a copper deposit
WO2009066735A1 (ja) ２－アザアダマンタン類の製造方法
BRPI0512310A (pt) compostos quìmicos
WO2006023889A3 (en) A method for preparing irbesartan and intermediates thereof
WO2009074741A3 (fr) Nouveau procede de synthese du ranelate de strontium et de ses hydrates
UY30185A1 (es) Método para la producción preferencial de isómeros geométricos y método de aislamiento
TW200619213A (en) A process for the preparation of organic compounds
WO2008145673A3 (de) Verfahren zur herstellung von 4-formylaminopiperidinderivaten
WO2006034092A8 (en) Process for production of piperidine derivatives
WO2002072779A3 (en) Nucleic acid labeling compounds
WO2006122020A3 (en) Process for production of 4-biphenylyazetidin-2-ones

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08790696

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2009520647

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 08790696

Country of ref document: EP

Kind code of ref document: A1