WO2009001927A1 - 置換基を導入した環状化合物の製造方法及びフォトレジスト基材 - Google Patents

置換基を導入した環状化合物の製造方法及びフォトレジスト基材 Download PDF

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Publication number
WO2009001927A1
WO2009001927A1 PCT/JP2008/061731 JP2008061731W WO2009001927A1 WO 2009001927 A1 WO2009001927 A1 WO 2009001927A1 JP 2008061731 W JP2008061731 W JP 2008061731W WO 2009001927 A1 WO2009001927 A1 WO 2009001927A1
Authority
WO
WIPO (PCT)
Prior art keywords
cyclic compound
production
substituent introduced
photoresist substrate
formula
Prior art date
Application number
PCT/JP2008/061731
Other languages
English (en)
French (fr)
Inventor
Takanori Owada
Hirotoshi Ishii
Akinori Yomogita
Mitsuru Shibata
Norio Tomotsu
Original Assignee
Idemitsu Kosan Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Idemitsu Kosan Co., Ltd. filed Critical Idemitsu Kosan Co., Ltd.
Priority to JP2009520647A priority Critical patent/JPWO2009001927A1/ja
Publication of WO2009001927A1 publication Critical patent/WO2009001927A1/ja

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00—Preparation of carboxylic acid esters
    • C07C67/30—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group
    • C07C67/31—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by introduction of functional groups containing oxygen only in singly bound form
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/14—The ring being saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2602/00—Systems containing two condensed rings
    • C07C2602/36—Systems containing two condensed rings the rings having more than two atoms in common
    • C07C2602/42—Systems containing two condensed rings the rings having more than two atoms in common the bicyclo ring system containing seven carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/56—Ring systems containing bridged rings
    • C07C2603/58—Ring systems containing bridged rings containing three rings
    • C07C2603/70—Ring systems containing bridged rings containing three rings containing only six-membered rings
    • C07C2603/74—Adamantanes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/92—Systems containing at least three condensed rings with a condensed ring system consisting of at least two mutually uncondensed aromatic ring systems, linked by an annular structure formed by carbon chains on non-adjacent positions of the aromatic system, e.g. cyclophanes

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Materials For Photolithography (AREA)

Abstract

　下記式（Ｉ）で表される構造を有する環状化合物と下記式（II）で表される化合物を縮合反応させて、式（Ｉ）の化合物に置換基（Ｒ基）を１つ以上導入した化合物を製造する方法において、縮合反応に、ナトリウム又はセシウムを含む無機塩基を使用することを特徴とするＲ基導入環状化合物の製造方法。
PCT/JP2008/061731 2007-06-28 2008-06-27 置換基を導入した環状化合物の製造方法及びフォトレジスト基材 WO2009001927A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009520647A JPWO2009001927A1 (ja) 2007-06-28 2008-06-27 置換基を導入した環状化合物の製造方法及びフォトレジスト基材

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007169992 2007-06-28
JP2007-169992 2007-06-28

Publications (1)

Publication Number Publication Date
WO2009001927A1 true WO2009001927A1 (ja) 2008-12-31

Family

ID=40185736

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/061731 WO2009001927A1 (ja) 2007-06-28 2008-06-27 置換基を導入した環状化合物の製造方法及びフォトレジスト基材

Country Status (3)

Country Link
JP (1) JPWO2009001927A1 (ja)
TW (1) TW200914417A (ja)
WO (1) WO2009001927A1 (ja)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11322656A (ja) * 1998-05-11 1999-11-24 Jsr Corp 新規なカリックスアレーン誘導体およびカリックスレゾルシナレーン誘導体、ならびに感光性組成物
JP2004191913A (ja) * 2002-10-15 2004-07-08 Idemitsu Kosan Co Ltd フォトレジスト基材及びその組成物
WO2005097725A1 (ja) * 2004-04-05 2005-10-20 Idemitsu Kosan Co., Ltd. カリックスレゾルシナレン化合物、フォトレジスト基材及びその組成物
WO2006129574A1 (ja) * 2005-06-01 2006-12-07 Idemitsu Kosan Co., Ltd. カリックスレゾルシナレン化合物、並びに、それからなるフォトレジスト基材及びその組成物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11322656A (ja) * 1998-05-11 1999-11-24 Jsr Corp 新規なカリックスアレーン誘導体およびカリックスレゾルシナレーン誘導体、ならびに感光性組成物
JP2004191913A (ja) * 2002-10-15 2004-07-08 Idemitsu Kosan Co Ltd フォトレジスト基材及びその組成物
WO2005097725A1 (ja) * 2004-04-05 2005-10-20 Idemitsu Kosan Co., Ltd. カリックスレゾルシナレン化合物、フォトレジスト基材及びその組成物
WO2006129574A1 (ja) * 2005-06-01 2006-12-07 Idemitsu Kosan Co., Ltd. カリックスレゾルシナレン化合物、並びに、それからなるフォトレジスト基材及びその組成物

Also Published As

Publication number Publication date
TW200914417A (en) 2009-04-01
JPWO2009001927A1 (ja) 2010-08-26

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