WO2008126570A1 - オプティカルインテグレータ、照明光学装置、露光装置、およびデバイス製造方法 - Google Patents

オプティカルインテグレータ、照明光学装置、露光装置、およびデバイス製造方法 Download PDF

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Publication number
WO2008126570A1
WO2008126570A1 PCT/JP2008/054399 JP2008054399W WO2008126570A1 WO 2008126570 A1 WO2008126570 A1 WO 2008126570A1 JP 2008054399 W JP2008054399 W JP 2008054399W WO 2008126570 A1 WO2008126570 A1 WO 2008126570A1
Authority
WO
WIPO (PCT)
Prior art keywords
optical
wavefront splitting
optical axis
splitting elements
exposure apparatus
Prior art date
Application number
PCT/JP2008/054399
Other languages
English (en)
French (fr)
Inventor
Naonori Kita
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to EP08721815A priority Critical patent/EP2128892A4/en
Priority to KR1020097012247A priority patent/KR101506748B1/ko
Priority to US12/529,614 priority patent/US8638420B2/en
Publication of WO2008126570A1 publication Critical patent/WO2008126570A1/ja

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0905—Dividing and/or superposing multiple light beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0966—Cylindrical lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Microscoopes, Condenser (AREA)

Abstract

二次元的に並列配置された複数の波面分割要素を有する本発明のオプティカルインテグレータでは、波面分割要素の入射面の光軸中心に斜め入射した光線群が、光軸と平行に波面分割要素から射出されるように構成されている。そして、複数の波面分割要素のうち、所要数の波面分割要素（１００Ａ）では、当該波面分割要素（１００Ａ）の少なくとも１つの曲面状の光学面（１００ａ，１００ｂ）が、当該波面分割要素（１００Ａ）の入射面（１００ａ）の光軸中心（１００ａａ）を通り且つ光軸ＡＸｅと直交する所定方向（ｘ方向）の軸線（１０４）を中心として傾いて形成されている。
PCT/JP2008/054399 2007-03-16 2008-03-11 オプティカルインテグレータ、照明光学装置、露光装置、およびデバイス製造方法 WO2008126570A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP08721815A EP2128892A4 (en) 2007-03-16 2008-03-11 OPTICAL INTEGRATOR, OPTICAL LIGHTING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
KR1020097012247A KR101506748B1 (ko) 2007-03-16 2008-03-11 광학 적분기, 조명 광학 장치, 노광 장치, 및 디바이스 제조 방법
US12/529,614 US8638420B2 (en) 2007-03-16 2008-03-11 Optical integrator, illuminating optical device, exposure apparatus and device manufacturing method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-069234 2007-03-16
JP2007069234A JP5035747B2 (ja) 2007-03-16 2007-03-16 オプティカルインテグレータ、照明光学装置、露光装置、およびデバイス製造方法

Publications (1)

Publication Number Publication Date
WO2008126570A1 true WO2008126570A1 (ja) 2008-10-23

Family

ID=39863714

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/054399 WO2008126570A1 (ja) 2007-03-16 2008-03-11 オプティカルインテグレータ、照明光学装置、露光装置、およびデバイス製造方法

Country Status (6)

Country Link
US (1) US8638420B2 (ja)
EP (1) EP2128892A4 (ja)
JP (1) JP5035747B2 (ja)
KR (1) KR101506748B1 (ja)
TW (1) TWI439816B (ja)
WO (1) WO2008126570A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010192868A (ja) * 2009-02-17 2010-09-02 Nikon Corp 均一化ユニット、照明光学系、露光装置、およびデバイス製造方法
US9341953B2 (en) 2006-02-17 2016-05-17 Carl Zeiss Smt Gmbh Microlithographic illumination system
JP2018512611A (ja) * 2015-03-12 2018-05-17 フィリップス ライティング ホールディング ビー ヴィ 光ビーム成形装置、及び前記光ビーム成形装置を用いるスポットライト

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010073801A1 (ja) * 2008-12-25 2010-07-01 株式会社 ニコン 照明光学系、露光装置及びデバイスの製造方法
GB2493721A (en) * 2011-08-15 2013-02-20 Raytec Ltd Illumination beam adjustment apparatus

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JPH06302494A (ja) * 1993-04-14 1994-10-28 Canon Inc 投影露光装置及びそれを用いた半導体素子の製造方法
JPH0794403A (ja) * 1993-09-20 1995-04-07 Canon Inc 照明装置及びそれを用いた投影露光装置
JPH09127418A (ja) * 1995-10-27 1997-05-16 Nikon Corp 照明光学系
JPH10319321A (ja) * 1997-03-14 1998-12-04 Nikon Corp 照明装置及び該照明装置を用いた投影露光装置並びに該投影露光装置を用いたデバイスの製造方法及び該投影露光装置の製造方法
JP2000114163A (ja) * 1998-10-09 2000-04-21 Canon Inc 投影露光装置及びそれを用いたデバイスの製造方法
JP2000150375A (ja) * 1992-09-04 2000-05-30 Nikon Corp 露光方法及び半導体素子の製造方法
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JP2006134932A (ja) * 2004-11-02 2006-05-25 Nikon Corp 可変スリット装置、照明光学装置、露光装置、及び露光方法

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JP2006134932A (ja) * 2004-11-02 2006-05-25 Nikon Corp 可変スリット装置、照明光学装置、露光装置、及び露光方法

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9341953B2 (en) 2006-02-17 2016-05-17 Carl Zeiss Smt Gmbh Microlithographic illumination system
JP2010192868A (ja) * 2009-02-17 2010-09-02 Nikon Corp 均一化ユニット、照明光学系、露光装置、およびデバイス製造方法
JP2018512611A (ja) * 2015-03-12 2018-05-17 フィリップス ライティング ホールディング ビー ヴィ 光ビーム成形装置、及び前記光ビーム成形装置を用いるスポットライト

Also Published As

Publication number Publication date
JP5035747B2 (ja) 2012-09-26
US8638420B2 (en) 2014-01-28
EP2128892A1 (en) 2009-12-02
TW200842519A (en) 2008-11-01
TWI439816B (zh) 2014-06-01
US20100103398A1 (en) 2010-04-29
EP2128892A4 (en) 2011-04-27
JP2008235361A (ja) 2008-10-02
KR101506748B1 (ko) 2015-03-27
KR20100014265A (ko) 2010-02-10

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