WO2008117706A1 - Al-Ni-B系合金スパッタリングターゲット - Google Patents
Al-Ni-B系合金スパッタリングターゲット Download PDFInfo
- Publication number
- WO2008117706A1 WO2008117706A1 PCT/JP2008/055035 JP2008055035W WO2008117706A1 WO 2008117706 A1 WO2008117706 A1 WO 2008117706A1 JP 2008055035 W JP2008055035 W JP 2008055035W WO 2008117706 A1 WO2008117706 A1 WO 2008117706A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- sputtering target
- al3ni
- alloy sputtering
- compound
- alloy
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C21/00—Alloys based on aluminium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/04—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of aluminium or alloys based thereon
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008516659A JPWO2008117706A1 (ja) | 2007-03-28 | 2008-03-19 | Al−Ni−B系合金スパッタリングターゲット |
TW097110948A TW200905003A (en) | 2007-03-28 | 2008-03-27 | Al-Ni-B based alloy sputtering target |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007083710 | 2007-03-28 | ||
JP2007-083710 | 2007-03-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008117706A1 true WO2008117706A1 (ja) | 2008-10-02 |
Family
ID=39788442
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/055035 WO2008117706A1 (ja) | 2007-03-28 | 2008-03-19 | Al-Ni-B系合金スパッタリングターゲット |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPWO2008117706A1 (ja) |
KR (1) | KR20090031500A (ja) |
CN (1) | CN101542010A (ja) |
TW (1) | TW200905003A (ja) |
WO (1) | WO2008117706A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011023287A (ja) * | 2009-07-17 | 2011-02-03 | Nippon Seiki Co Ltd | 有機elパネルの製造方法 |
JP2018204099A (ja) * | 2017-04-11 | 2018-12-27 | ザ・ボーイング・カンパニーThe Boeing Company | 銅、リチウム、及び少なくとも1種のアルカリ土類金属又は希土類金属の添加物を含むアルミニウム合金、及びその製造方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003089864A (ja) * | 2001-09-18 | 2003-03-28 | Mitsui Mining & Smelting Co Ltd | アルミニウム合金薄膜及びその薄膜を有する配線回路並びにその薄膜を形成するターゲット材 |
WO2006117954A1 (ja) * | 2005-04-26 | 2006-11-09 | Mitsui Mining & Smelting Co., Ltd. | Al-Ni-B合金配線材料及びそれを用いた素子構造 |
-
2008
- 2008-03-19 WO PCT/JP2008/055035 patent/WO2008117706A1/ja active Application Filing
- 2008-03-19 CN CNA2008800002387A patent/CN101542010A/zh active Pending
- 2008-03-19 JP JP2008516659A patent/JPWO2008117706A1/ja not_active Withdrawn
- 2008-03-19 KR KR1020087026735A patent/KR20090031500A/ko not_active Application Discontinuation
- 2008-03-27 TW TW097110948A patent/TW200905003A/zh unknown
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003089864A (ja) * | 2001-09-18 | 2003-03-28 | Mitsui Mining & Smelting Co Ltd | アルミニウム合金薄膜及びその薄膜を有する配線回路並びにその薄膜を形成するターゲット材 |
WO2006117954A1 (ja) * | 2005-04-26 | 2006-11-09 | Mitsui Mining & Smelting Co., Ltd. | Al-Ni-B合金配線材料及びそれを用いた素子構造 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011023287A (ja) * | 2009-07-17 | 2011-02-03 | Nippon Seiki Co Ltd | 有機elパネルの製造方法 |
JP2018204099A (ja) * | 2017-04-11 | 2018-12-27 | ザ・ボーイング・カンパニーThe Boeing Company | 銅、リチウム、及び少なくとも1種のアルカリ土類金属又は希土類金属の添加物を含むアルミニウム合金、及びその製造方法 |
US11846010B2 (en) | 2017-04-11 | 2023-12-19 | The Boeing Company | Aluminum alloy with additions of copper, lithium and at least one alkali or rare earth metal, and method of manufacturing the same |
Also Published As
Publication number | Publication date |
---|---|
CN101542010A (zh) | 2009-09-23 |
KR20090031500A (ko) | 2009-03-26 |
JPWO2008117706A1 (ja) | 2010-07-15 |
TW200905003A (en) | 2009-02-01 |
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