WO2008111536A1 - パターン状の微粒子膜およびパターン状の微粒子膜の製造方法 - Google Patents
パターン状の微粒子膜およびパターン状の微粒子膜の製造方法 Download PDFInfo
- Publication number
- WO2008111536A1 WO2008111536A1 PCT/JP2008/054215 JP2008054215W WO2008111536A1 WO 2008111536 A1 WO2008111536 A1 WO 2008111536A1 JP 2008054215 W JP2008054215 W JP 2008054215W WO 2008111536 A1 WO2008111536 A1 WO 2008111536A1
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- WIPO (PCT)
- Prior art keywords
- fine particle
- patterned
- film
- fine particles
- particle film
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- 239000010419 fine particle Substances 0.000 title abstract 11
- 238000000034 method Methods 0.000 title abstract 2
- 238000005859 coupling reaction Methods 0.000 abstract 4
- 150000001875 compounds Chemical class 0.000 abstract 2
- 125000000524 functional group Chemical group 0.000 abstract 2
- 239000010410 layer Substances 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 239000002356 single layer Substances 0.000 abstract 2
- 239000007822 coupling agent Substances 0.000 abstract 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
- B05D1/185—Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0801—General processes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
- C09D7/62—Additives non-macromolecular inorganic modified by treatment with other compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/165—Monolayers, e.g. Langmuir-Blodgett
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/265—Selective reaction with inorganic or organometallic reagents after image-wise exposure, e.g. silylation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
- B01J2219/00583—Features relative to the processes being carried out
- B01J2219/00603—Making arrays on substantially continuous surfaces
- B01J2219/00605—Making arrays on substantially continuous surfaces the compounds being directly bound or immobilised to solid supports
- B01J2219/00612—Making arrays on substantially continuous surfaces the compounds being directly bound or immobilised to solid supports the surface being inorganic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
- B01J2219/00583—Features relative to the processes being carried out
- B01J2219/00603—Making arrays on substantially continuous surfaces
- B01J2219/00605—Making arrays on substantially continuous surfaces the compounds being directly bound or immobilised to solid supports
- B01J2219/00623—Immobilisation or binding
- B01J2219/00626—Covalent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
- B01J2219/00583—Features relative to the processes being carried out
- B01J2219/00603—Making arrays on substantially continuous surfaces
- B01J2219/00605—Making arrays on substantially continuous surfaces the compounds being directly bound or immobilised to solid supports
- B01J2219/00632—Introduction of reactive groups to the surface
- B01J2219/00637—Introduction of reactive groups to the surface by coating it with another layer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2203/00—Other substrates
- B05D2203/30—Other inorganic substrates, e.g. ceramics, silicon
- B05D2203/35—Glass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
- B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/50—Multilayers
- B05D7/52—Two layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/50—Multilayers
- B05D7/56—Three layers or more
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/02—Elements
- C08K3/08—Metals
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5435—Silicon-containing compounds containing oxygen containing oxygen in a ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/04—Ingredients treated with organic substances
- C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Crystallography & Structural Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Composite Materials (AREA)
- Laminated Bodies (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Chemically Coating (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Paints Or Removers (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
Abstract
微粒子本来の機能を損なうことなく、任意の基材表面にパターン状に絶縁性微粒子を1層のみ並べたパターン状の単層微粒子膜、および複数層累積したパターン状の積層微粒子膜、ならびにそれらの製造方法を提供する。 パターン状の微粒子膜1、3は、第1の官能基を有する第1の膜化合物の形成するパターン状の被膜で被覆された基材14の表面に、第1の官能基とカップリング反応により結合を形成する第1のカップリング反応基を有する第1のカップリング剤の形成する被膜で被覆された反応性微粒子42が配列した微粒子層が、カップリング反応により形成される結合を介して1層結合固定されている。あるいは、さらにその上に第1のカップリング反応基と反応する膜化合物の被膜で被覆された微粒子34および反応性微粒子42が交互に結合固定されている。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/530,553 US8568862B2 (en) | 2007-03-09 | 2008-03-07 | Patterned fine particle film structures |
US14/054,673 US9200012B2 (en) | 2007-03-09 | 2013-10-15 | Patterned fine particle film structures |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-060548 | 2007-03-09 | ||
JP2007060548A JP5028619B2 (ja) | 2007-03-09 | 2007-03-09 | パターン状の微粒子膜およびパターン状の微粒子膜の製造方法 |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/530,553 A-371-Of-International US8568862B2 (en) | 2007-03-09 | 2008-03-07 | Patterned fine particle film structures |
US14/054,673 Division US9200012B2 (en) | 2007-03-09 | 2013-10-15 | Patterned fine particle film structures |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008111536A1 true WO2008111536A1 (ja) | 2008-09-18 |
Family
ID=39759474
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/054215 WO2008111536A1 (ja) | 2007-03-09 | 2008-03-07 | パターン状の微粒子膜およびパターン状の微粒子膜の製造方法 |
Country Status (3)
Country | Link |
---|---|
US (2) | US8568862B2 (ja) |
JP (1) | JP5028619B2 (ja) |
WO (1) | WO2008111536A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110102117A1 (en) * | 2008-06-13 | 2011-05-05 | Alessandro Chiolerio | Process for the production of macroscopic nanostructured permanent magnets with high density of magnetic energy and corresponding magnets |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008276889A (ja) * | 2007-05-02 | 2008-11-13 | Kagawa Univ | 磁気記録媒体および磁気記録媒体の製造方法ならびにそれを用いた磁気記録読取装置 |
JP5430093B2 (ja) * | 2008-07-24 | 2014-02-26 | デクセリアルズ株式会社 | 導電性粒子、異方性導電フィルム、及び接合体、並びに、接続方法 |
US9966096B2 (en) | 2014-11-18 | 2018-05-08 | Western Digital Technologies, Inc. | Self-assembled nanoparticles with polymeric and/or oligomeric ligands |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1166654A (ja) * | 1997-08-18 | 1999-03-09 | Hitachi Ltd | 微細構造の作製法、微細構造、磁気センサ、磁気記録媒体および光磁気記録媒体 |
JPH11350153A (ja) * | 1998-06-09 | 1999-12-21 | Mitsuboshi Belting Ltd | 金属微粒子修飾基板の製造方法 |
JP2001184620A (ja) * | 1999-12-27 | 2001-07-06 | Toshiba Corp | 記録媒体および記録媒体の製造方法 |
US6420086B1 (en) * | 1999-02-19 | 2002-07-16 | Micron Technology, Inc. | Methods of forming patterned constructions, methods of patterning semiconductive substrates, and methods of forming field emission displays |
JP2003168606A (ja) * | 2001-01-24 | 2003-06-13 | Matsushita Electric Ind Co Ltd | 微粒子配列体とその製造方法及びこれを用いたデバイス |
JP2007118276A (ja) * | 2005-10-26 | 2007-05-17 | Kagawa Univ | 単層微粒子膜と累積微粒子膜およびそれらの製造方法。 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6805904B2 (en) * | 2002-02-20 | 2004-10-19 | International Business Machines Corporation | Process of forming a multilayer nanoparticle-containing thin film self-assembly |
EP1510861A1 (en) * | 2003-08-26 | 2005-03-02 | Sony International (Europe) GmbH | Method for patterning organic materials or combinations of organic and inorganic materials |
US7964380B2 (en) * | 2005-01-21 | 2011-06-21 | Argylia Technologies | Nanoparticles for manipulation of biopolymers and methods of thereof |
-
2007
- 2007-03-09 JP JP2007060548A patent/JP5028619B2/ja active Active
-
2008
- 2008-03-07 WO PCT/JP2008/054215 patent/WO2008111536A1/ja active Application Filing
- 2008-03-07 US US12/530,553 patent/US8568862B2/en not_active Expired - Fee Related
-
2013
- 2013-10-15 US US14/054,673 patent/US9200012B2/en not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1166654A (ja) * | 1997-08-18 | 1999-03-09 | Hitachi Ltd | 微細構造の作製法、微細構造、磁気センサ、磁気記録媒体および光磁気記録媒体 |
JPH11350153A (ja) * | 1998-06-09 | 1999-12-21 | Mitsuboshi Belting Ltd | 金属微粒子修飾基板の製造方法 |
US6420086B1 (en) * | 1999-02-19 | 2002-07-16 | Micron Technology, Inc. | Methods of forming patterned constructions, methods of patterning semiconductive substrates, and methods of forming field emission displays |
JP2001184620A (ja) * | 1999-12-27 | 2001-07-06 | Toshiba Corp | 記録媒体および記録媒体の製造方法 |
JP2003168606A (ja) * | 2001-01-24 | 2003-06-13 | Matsushita Electric Ind Co Ltd | 微粒子配列体とその製造方法及びこれを用いたデバイス |
JP2007118276A (ja) * | 2005-10-26 | 2007-05-17 | Kagawa Univ | 単層微粒子膜と累積微粒子膜およびそれらの製造方法。 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110102117A1 (en) * | 2008-06-13 | 2011-05-05 | Alessandro Chiolerio | Process for the production of macroscopic nanostructured permanent magnets with high density of magnetic energy and corresponding magnets |
Also Published As
Publication number | Publication date |
---|---|
US20140045126A1 (en) | 2014-02-13 |
US20100143665A1 (en) | 2010-06-10 |
JP2008222788A (ja) | 2008-09-25 |
US9200012B2 (en) | 2015-12-01 |
JP5028619B2 (ja) | 2012-09-19 |
US8568862B2 (en) | 2013-10-29 |
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